CN105154819A - Method for preparing reflective film on the surface of ultra light reflective mirror - Google Patents
Method for preparing reflective film on the surface of ultra light reflective mirror Download PDFInfo
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- CN105154819A CN105154819A CN201510576536.2A CN201510576536A CN105154819A CN 105154819 A CN105154819 A CN 105154819A CN 201510576536 A CN201510576536 A CN 201510576536A CN 105154819 A CN105154819 A CN 105154819A
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- mirror
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- ultralight
- ion beam
- reflective film
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Abstract
The invention discloses a method for preparing a reflective film on the surface of an ultra light reflective mirror. The method comprises the following steps: (1) mirror surface treatment: subjecting the surface of the ultra light reflective mirror to dust blowing with dry gas and cleaning the surface with ethanol or acetone; (2) vacuum gas removal: fixing and heating the ultra light reflective mirror treated by the step (1) in vacuum; (3) ion beam cleaning: feeding argon or mixture gas of argon and oxygen at the state of vacuum, and performing ion beam cleaning on the ultras light reflective mirror; (4) reflective film deposition; plating the mirror surface of the ultra light reflective mirror with chrome or nickel chrome alloy layer, and then plating the mirror surface with nickel or silver layer. The reflective mirror substrate is subjected to technical means such as chemical cleaning, vacuum gas removal, ion beam cleaning and reflective film deposition, so as to effectively increase the compactness and adhesion of the reflective film, and solve the technical problem in preparing the reflective film on the surface of the substrate of the carbon fiber reinforced resin matrix composite material reflective mirror.
Description
Technical field
The present invention relates to field of surface engineering technique, especially a kind of ultralight reflecting mirror material carbon fiber enhancement resin base composite material, in order to realize its surface reflection function, preparing the method for reflectance coating on carbon fiber enhancement resin base composite material mirror base surface.
Background technology
Due to carbon fiber enhancement resin base composite material have that proportion is little, specific tenacity and specific modulus high, and the feature such as Heat stability is good, be the ideal material manufacturing ultralight speculum, but one deck reflecting material must be prepared on mirror base surface and could realize reflection function.Large due to carbon fiber enhancement resin base composite material surface irregularity and with reflecting material performance difference, matching is poor, therefore prepares reflecting material on carbon fiber enhancement resin base composite material mirror base surface and has great difficulty, correlative study report is seldom.The present invention proposes the method adopting vacuum ionic coating technology to prepare reflectance coating in mirror surface, have no correlative study report.
Summary of the invention
The present invention is directed to the deficiencies in the prior art, propose a kind of method that ultralight mirror surface prepares reflectance coating, easy and simple to handle, prepare reflectance coating on carbon fiber enhancement resin base composite material mirror base surface.
In order to realize foregoing invention object, the invention provides following technical scheme: a kind of ultralight mirror surface prepares the method for reflectance coating, comprises the following steps:
(1), mirror process: blow point process with the surface of dry gas to ultralight speculum, with ethanol or acetone cleaning minute surface;
(2), vacuum stripping: the ultralight speculum after (1) processing through step is fixed on heating under vacuum;
, ion beam cleaning: logical argon gas or argon gas and oxygen mixture under vacuum conditions, ion beam cleaning is carried out to ultralight speculum;
(4), deposition of reflective film: chromium plating or nickel-chrome alloy layer on the minute surface of ultralight speculum, then nickel plating or silver layer.
Further, step (1) in dry gas be pure nitrogen gas.
Further, step (2) in low vacuum in 5 × 10
-3pa, Heating temperature is 100 DEG C ~ 140 DEG C.
Further, step (3) in vacuum tightness be 2 × 10
-2pa ~ 5 × 10
-2pa.
Compared with prior art, the present invention has the following advantages: utilize technique means such as mirror base matting, vacuum stripping, ion beam cleaning and deposition of reflective films, effectively improve compactness and the sticking power of reflectance coating, solve the technical barrier preparing reflectance coating on carbon fiber enhancement resin base composite material mirror base surface.
(1) improve compactness and the sticking power of carbon fiber enhancement resin base composite material mirror surface reflective coating, be convenient to follow-up polishing.
(2) application demand of the thicker reflective coating of vacuum method preparation is achieved.
(3) the present invention is easy to repetition, is applicable to scale production.
Embodiment
Describe the present invention below in conjunction with embodiment, the description of this part is only exemplary and explanatory, should not have any restriction to protection scope of the present invention.
Ultralight mirror surface prepares a method for reflectance coating, comprises the following steps:
(1), mirror process: adopt pure nitrogen to blow point process to mirror base, adopt analytical pure dehydrated alcohol (or acetone) to carry out matting to mirror surface;
(2), vacuum stripping: mirror base is fixed in vacuum chamber on work rest, opens forevacuum pump and high-vacuum pump successively and vacuum tightness is evacuated to vacuum is better than 5 × 10
-3pa, opens well heater and is heated to 100 DEG C ~ 140 DEG C to vacuum chamber, carry out vacuum stripping process to mirror base;
(3), ion beam cleaning: pass into Ar(or Ar+O in vacuum chamber
2) gas, keep vacuum tightness to be 2 × 10
-2pa ~ 5 × 10
-2pa; Opening grid bias power supply, is-100V ~-200V by bias adjustment; Open ion source, setting operating voltage is 2.0kV ~ 3.0kV simultaneously, and the ion beam cleaning time is 20min ~ 30min, carries out ion beam cleaning to speculum;
, deposition of reflective film: open Cr(or NiCr) target, setting working current is 60A ± 10A, plating Cr(or NiCr) transition layer 10min ~ 30min; Open Ni(or Ag) target, setting working current is 60A ± 10A, plating Ni(or Ag) film accumulation 10h ~ 15h, often plate 10min ~ 30min and open ion source bombardment 10min, complete reflecting film deposition.
The present invention utilizes the good and bonding strength advantages of higher of the rete compactness of vacuum ion plating deposition techniques, reflectance coating preparation research is carried out on carbon fiber enhancement resin base composite material mirror base surface, matting is particularly adopted to remove mirror base surface contaminant, reflectance coating purity is improved by vacuum stripping, adopt ion beam cleaning mirror surface to improve its surfactivity, thus improve the bonding strength between reflectance coating and mirror base.Adopt present method invention to prepare reflectance coating on ultralight carbon fiber enhancement resin base composite material surface, there is the advantages such as rete compactness is good, bonding strength is high, thickness uniform, controllable, reach engineer applied level.
The present invention adopts vacuum ion membrane plating equipment to realize, and the starting material of employing mainly contain high-purity Cr(or NiCr) target, high-purity N i(or Ag) target, high-purity N
2gas, Ar gas, high-purity O
2gas and carbon fiber enhancement resin base composite material mirror base etc.
embodiment 1
(1) matting: adopt pure nitrogen to blow point process to mirror base, adopt analytical pure dehydrated alcohol to carry out matting to mirror surface.
(2) vacuum stripping: be fixed in vacuum chamber on work rest by mirror base, opens forevacuum pump successively and high-vacuum pump is evacuated to vacuum tightness to 1 × 10 to vacuum
-3pa, opens well heater and is heated to 100 DEG C to vacuum chamber, carry out vacuum stripping process to mirror base;
(3) ion beam cleaning: pass into Ar gas in vacuum chamber, keeps vacuum tightness to be 2 × 10
-2pa; Opening grid bias power supply, is-200V by bias adjustment; Open ion source, setting operating voltage is 2.0kV simultaneously, and the ion beam cleaning time is 30min, carries out ion beam cleaning to speculum;
(4) deposition of reflective film: open Cr target, setting working current is 60A, plating Cr transition layer 30min; Open Ni target, setting working current is 60A, and plating Ni film accumulation 10h, often plates 30min and open ion source bombardment 10min, complete reflecting film deposition.
(5) its effect is that the conductive metal film thickness prepared is about 30 μm.
embodiment 2
(1) matting: adopt pure nitrogen to blow point process to mirror base, adopt analytical pure acetone to carry out matting to mirror surface.
(2) vacuum stripping: be fixed in vacuum chamber on work rest by mirror base, opens forevacuum pump successively and high-vacuum pump is evacuated to vacuum tightness to 5 × 10 to vacuum
-3pa, opens well heater and is heated to 140 DEG C to vacuum chamber, carry out vacuum stripping process to mirror base;
(3) ion beam cleaning: pass into Ar+O in vacuum chamber
2gas, keeps vacuum tightness to be 4 × 10
-2pa; Opening grid bias power supply, is-100V by bias adjustment; Open ion source, setting operating voltage is 3.0kV simultaneously, and the ion beam cleaning time is 20min, carries out ion beam cleaning to speculum;
(4) deposition of reflective film: open NiCr target, setting working current is 70A, plating NiCr transition layer 20min; Open Ag target, setting working current is 70A, and plating Ag film accumulation 15h, often plates 10min and open ion source bombardment 10min, complete reflecting film deposition.
(5) its effect is that the conductive metal film thickness prepared is about 50 μm.
embodiment 3
(1) matting: adopt pure nitrogen to blow point process to mirror base, adopt analytical pure dehydrated alcohol to carry out matting to mirror surface.
(2) vacuum stripping: be fixed in vacuum chamber on work rest by mirror base, opens forevacuum pump and high-vacuum pump successively and is evacuated to vacuum tightness to vacuum and is better than 3 × 10
-3pa, opens well heater and is heated to 120 DEG C to vacuum chamber, carry out vacuum stripping process to mirror base;
(3) ion beam cleaning: pass into Ar gas in vacuum chamber, keeps vacuum tightness to be 3 × 10
-2pa; Opening grid bias power supply, is-150V by bias adjustment; Open ion source, setting operating voltage is 2.5kV simultaneously, and the ion beam cleaning time is 25min, carries out ion beam cleaning to speculum;
(4) deposition of reflective film: open Cr target, setting working current is 50A, plating Cr transition layer 30min; Open Ni target, setting working current is 70A, and plating Ni film accumulation 15h, often plates 30min and open ion source bombardment 10min, complete reflecting film deposition.
(5) its effect is that the conductive metal film thickness prepared is about 40 μm.
The above is only the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the premise without departing from the principles of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (4)
1. ultralight mirror surface prepares a method for reflectance coating, comprises the following steps:
(1), mirror process: blow point process with the surface of dry gas to ultralight speculum, with ethanol or acetone cleaning minute surface;
(2), vacuum stripping: the ultralight speculum after (1) processing through step is fixed on heating under vacuum;
, ion beam cleaning: logical argon gas or argon gas and oxygen mixture under vacuum conditions, ion beam cleaning is carried out to ultralight speculum;
(4), deposition of reflective film: chromium plating or nickel-chrome alloy layer on the minute surface of ultralight speculum, then nickel plating or silver layer.
2. ultralight mirror surface prepares the method for reflectance coating as claimed in claim 1, it is characterized in that: step (1) middle dry gas is pure nitrogen gas.
3. ultralight mirror surface prepares the method for reflectance coating as claimed in claim 1, it is characterized in that: step (2) in low vacuum in 5 × 10
-3pa, Heating temperature is 100 DEG C ~ 140 DEG C.
4. ultralight mirror surface prepares the method for reflectance coating as claimed in claim 1, it is characterized in that: step (3) middle vacuum tightness is 2 × 10
-2pa ~ 5 × 10
-2pa.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510576536.2A CN105154819A (en) | 2015-09-11 | 2015-09-11 | Method for preparing reflective film on the surface of ultra light reflective mirror |
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|---|---|---|---|
| CN201510576536.2A CN105154819A (en) | 2015-09-11 | 2015-09-11 | Method for preparing reflective film on the surface of ultra light reflective mirror |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109628973A (en) * | 2019-01-22 | 2019-04-16 | 陕西赛科顺舟工贸有限公司 | A kind of plating membrane coat and its technique receiving ability with superpower wireless telecommunications |
| CN109786951A (en) * | 2018-12-20 | 2019-05-21 | 兰州空间技术物理研究所 | A kind of thermoelectricity protection integrated membrane structure |
| CN111844831A (en) * | 2020-07-06 | 2020-10-30 | 大连理工大学 | Manufacturing method of light base material thin-wall reflector |
| CN114196916A (en) * | 2021-12-16 | 2022-03-18 | 西湖大学 | Preparation method of metal reflector and metal reflector |
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| US4877505A (en) * | 1987-08-26 | 1989-10-31 | Balzers Aktiengesellschaft | Method and apparatus for application of coatings on substrates |
| CN101962748A (en) * | 2010-10-26 | 2011-02-02 | 中国航天科技集团公司第五研究院第五一○研究所 | Method for plating conductive film on surface of polytetrafluoroethylene by adopting arc ion plating technology |
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| US4877505A (en) * | 1987-08-26 | 1989-10-31 | Balzers Aktiengesellschaft | Method and apparatus for application of coatings on substrates |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109786951A (en) * | 2018-12-20 | 2019-05-21 | 兰州空间技术物理研究所 | A kind of thermoelectricity protection integrated membrane structure |
| CN109628973A (en) * | 2019-01-22 | 2019-04-16 | 陕西赛科顺舟工贸有限公司 | A kind of plating membrane coat and its technique receiving ability with superpower wireless telecommunications |
| CN111844831A (en) * | 2020-07-06 | 2020-10-30 | 大连理工大学 | Manufacturing method of light base material thin-wall reflector |
| CN114196916A (en) * | 2021-12-16 | 2022-03-18 | 西湖大学 | Preparation method of metal reflector and metal reflector |
| CN114196916B (en) * | 2021-12-16 | 2024-05-07 | 西湖大学 | Preparation method of metal reflector and metal reflector |
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