CN114180630A - 多层纳米板状wo3及其制备方法和应用 - Google Patents
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Abstract
本发明公开了一种多层纳米板状WO3及其制备方法和应用。先将钨酸钠溶液和浓盐酸反应得到的沉淀溶解双氧水中,然后加入聚乙烯醇和超纯水制备好种子层溶液,通过旋涂溶液制备含WO3籽晶的FTO衬底,在500℃下在空气中退火2h得到种子层,将钨酸钠溶解于水中后加入盐酸得到沉淀,再加入草酸溶解后得到前驱体溶液;然后将种子层置于前驱体溶液中在180℃下进行水热反应;最后将水热得到的产物在500℃下退火,得到多层纳米板状WO3。本发明通过在前驱体溶液中添加形貌调节剂盐酸和将草酸铵替换为草酸,并调控其水热体积和降温速率成了具有多层纳米板状结构的WO3,提高其在光电催化产双氧水的选择性,选择性可达60.5%。
Description
技术领域
本发明属于光电催化材料制备领域,涉及一种多层纳米板状三氧化钨及其制备方法和应用。
背景技术
过氧化氢(H2O2)是当今最重要的化学物质之一,过氧化氢(H2O2)不仅是一种温和、环保的有机合成和环境修复氧化剂,而且是一种很有前途的新型液体燃料,因此受到越来越多的关注。全球年需求量约为400万吨。目前,全球H2O2产量的90%以上基于蒽醌氧化(AO)工艺,该工艺最早于20世纪40年代开发。管在每个AO过程中H2O2的浓度可高达~70 wt%,但仍存在许多缺点,例如发生一系列副反应,需要复杂的分离步骤来去除有机杂质,以及非常高的能耗。因此现场电化学生产H2O2,以降低运输成本和安全问题,并利用可再生电力,这一点越来越受到关注。尽管通过加氢或电化学过程中还原O2的方法在H2O2合成中取得了快速发展,但通常认为将水直接分解为H2和H2O2两种高附加值的化学品是生产H2O2的更理想且经济可行的途径。
从能耗角度考虑,光电催化(PEC)用于H2O2生产的水氧化更可持续,因为它利用光辐射作为反应的驱动力。此外,PEC工艺对H2O2生成的选择性(即 FE(H2O2))与所施加的偏压的相关性较小,而与表面的光电催化工艺相关,因为表面反应是由光生空穴在价带中积累的最大值驱动的。金属氧化物作为光催化剂是有利的,因为它们在反应和制造过程中有着不错的稳定性,且制备过程比较简易。
目前用于光电催化的金属氧化物二维薄膜的制备方法多用物理气相沉积法、化学气相沉积法和水热法等,物理和化学气相沉积的方法能够快速的生长致密的纳米薄膜,但是这种方法生长出来的大部分都是纳米颗粒或者块状结构,晶体结构或者形貌并不具备优势,例如他们的比表面积、载流子收集路径、带隙、电荷转移等方面的表现相对较差。而用水热种子层辅助原位生长的方法能够得到良好的纳米晶体结构,在各方面都能表现出不错的优势。但电催化,光催化和其他非均相催化作用发生在催化剂表面,因此晶体的形貌和结构在决定其性能方面起着至关重要的作用,不同的晶体形貌和结构对于催化的导向十分重要。
发明内容
本发明的目的在于提供一种提供双氧水产率的多层纳米板状三氧化钨的制备方法,通过水热的方法,加入表面形貌调节剂,制备具有多层纳米板状三氧化钨,多层纳米板状三氧化钨能够有效提高光电化学生产双氧水的效率,提高双氧水的选择性,以及光电性能。
实现本发明目的的技术方案如下:
一种多层纳米板状三氧化钨的制备方法,具体步骤如下:
(1)向钨酸钠溶液加入浓盐酸得到沉淀,将离心所得沉淀溶解于双氧水,然后加入超纯水和分散剂聚乙烯醇,搅拌至完全溶解,将所得溶液旋涂在干净的掺氟氧化锡导电玻璃(FTO)表面,然后置于500℃下退火得到种子层;
(2)向钨酸钠溶液加入浓盐酸得到沉淀,然后加入草酸溶解沉淀得到澄清的溶液,得到前驱体溶液;
(3)将带有种子层的FTO浸没在前驱体溶液中,且种子层朝下,在180℃下水热反应,降至一定温度后取出,并快速冷却;
(4)水洗干净后,置于500℃下退火,退火结束后降至室温,得到多层纳米板状三氧化钨。
优选地,步骤(1)中,置于500℃下退火2h。
优选地,步骤(2)中,钨酸钠与浓盐酸的摩尔比为100:3.05。
优选地,步骤(3)中,在180℃下水热反应2h。
优选地,步骤(3)中,降至80~100℃后取出,并用流水快速冷却。
优选地,步骤(4)中,置于500℃下2 h。
优选地,步骤(4)中,升温、降温速率均为15℃/min。
上述多层纳米板状三氧化钨在光电催化水氧化产双氧水上的用途。
与现有技术相比,本发明具有以下优点:
本发明通过在前驱体溶液中添加形貌调节剂Cl-(盐酸),并将草酸铵替换为草酸,并调控其水热体积和降温速率,合成了具有多层纳米板状WO3,提高其在光电催化产双氧水的选择性,由现有的25.7%提高至60.5%,光电流提升了3.1倍。
附图说明
图1为对比例1和实施例1中S-WO3和M-WO3的XRD图。
图2为对比例1和实施例1中S-WO3(a)和M-WO3(b)的SEM图。
图3为对比例1和实施例1中S-WO3(a)和M-WO3(b)的横截面FE-SEM图像。
图4为对比例1和实施例1中S-WO3和M-WO3光电阳极的电流-电压曲线。
图5为对比例1和实施例1中S-WO3(a)和M-WO3(c)的XPS O1s图。
图6为对比例1和实施例1中S-WO3和M-WO3的电化学活性面积图。
图7为对比例1和实施例1中S-WO3和M-WO3的光阳极的极化曲线,数据是无光照条件下收集的。
图8为对比例1和实施例1中在1M NaHCO3电解质中在AM 1.5G照射下S-WO3和M-WO3光阳极的PEC生成H2O2的法拉第效率。
具体实施方式
下面结合实施例和附图对本发明做进一步详述。
金属氧化物作为光催化剂是有利的,因为它们在反应和制造过程中有着较好的稳定性,且制备过程比较简易。从热力学的角度看,调节中间体的热力学过程是一种有效调节对电催化多电子转移反应中所需产物的选择性的方法。热力学上适合于水分解的氧化物却在光催化剂中光吸收差,这是因为其由O2p组成的价带非常深,因此具有大的带隙(> 3eV)。所以可见光响应型氧化物光催化剂像WO3一样,在热力学上不适合用于水分解,因为导带的电势对于E(H+/H2),0 V vs. RHE的H2析出来说太正,[反应式(1)-(2)]表明,H2O2的生成电势比水分解的电势更大。因此,对于氧化物光催化剂而言,生成H2O2的热力学要求不那么严格,所以在光电催化水氧化产H2O2上具有很大的潜力。除此之外WO3还具有良好的光电性能能够很快的达到饱和电流值,是一种十分适合水氧化产双氧水的材料之一。
O2+2H++2e-= H2O2 E(O2/ H2O2)=+0.68V vs. RHE (1)
2H2O= H2O2+2H++2e- E(H2O/H2O2)=+1.77V vs. RHE (2)
实施例1
将1.65 g Na2WO4•2H2O溶解在25mL超纯水中,然后添加3.5ml浓盐酸(32%),出现黄色沉淀。然后分离沉淀物,并在6000 rpm下离心清洗数次。加入5ml H2O2将上一步的黄色沉淀溶解,然后加入0.5g PVA,加入10ml超纯水后,将混合物在超声波浴中保持约30分钟。然后用超纯水将透明溶液稀释至30ml。然后通过旋涂溶液制备含WO3籽晶的FTO衬底,然后在500℃下在空气中退火2h,以进行随后的水热反应。
将0.33 g Na2WO4•2H2O溶解于30 mL超纯水中,然后添加3 mL浓HCl(32%),形成淡黄色沉淀。之后在磁力搅拌下向上述溶液中添加1.8 g H2C2O4•2H2O,直到溶液变透明。用超纯水将得到的澄清溶液稀释至90mL。取60mL制备的前驱体溶液转移到聚四氟乙烯内衬的不锈钢高压釜中。将含有WO3籽晶的FTO玻璃浸入并靠在聚四氟乙烯容器壁上,籽晶层朝下。将高压灭菌器密封并在180℃下保持2小时等温度降到80摄氏度时取出用冷水快速冷却至室温后,取出样品,用超纯水冲洗,然后在室温下干燥。在500℃下在空气中进一步退火2小时,命名为M-WO3。
对比例1
种子层制备方法与对实施例1相同
将0.33 g Na2WO4•2H2O溶解于30 mL超纯水中,然后加入3 mL浓HCl(32%),300秒后形成淡黄色沉淀。之后在磁力搅拌下向上述溶液中添加0.15 g (NH4)2C2O4,直到溶液变透明后用水稀释至90mL,制备好单层板状WO3的前驱体溶液。取60mL放入反应釜内衬中将一块含有WO3籽晶的FTO玻璃浸入并靠在聚四氟乙烯容器壁上,籽晶层朝下放入不锈钢高压釜,在180℃下保持2小时。冷却至室温后,取出样品,用超纯水冲洗,然后在室温下干燥。在500℃下在空气中进一步退火2小时得到S-WO3。
如图1所示,S-WO3和M-WO3晶体的两种光阳极的X射线衍射(XRD)图案中的所有衍射峰都可以被标为单斜WO3(JCPDS no. 43–1035)具有良好的指数关系,分别在23.1°、23.6°和24.4°处具有三个特征峰(002)、(020)和(200)面。XRD图显示出了两种光阳极均为WO3且具有良好的结晶性光阳极显示出强烈的(200)和(002)衍射峰,与多晶WO3参比粉末相比,更弱的(202)衍射峰,清楚地表明WO3光阳极优先沿着[200]或[002]晶向定向生长并且由(010)面控制。
通过场发射扫描电子显微镜(FE-SEM)对S-WO3和M-WO3光阳极的形貌进行了表征,结果如图2所示,清晰的展现了单层结构和多层结构,单层的板状结构片层厚度在150nm左右片层宽度在1μm左右,多层板状的结构的片层厚度明显增加多层的片层厚度在400-500nm的片层构成片层宽度也在1μm左右,但是构成单一多层结构中的单层结构的厚度小于100nm。横截面FE-SEM图像显示两个光电阳极均由致密的WO3薄膜组成,厚度约为2.5μm(图3)。
如图4所示M-WO3的光电流密度是S-WO3的3.1倍,在1.76 V vs. RHE的条件下,光电流密度为2.1 mA / cm2。图5为M-WO3和S-WO3的X射线光电子能谱(XPS)所有样品在530.3、531.5、533.2处显示三个明显的O1s峰。这三处的峰分别归因于物理吸附水、表面氧空位附近的O原子和金属氧化物中的晶格氧。其中的O1s峰值显示了多层纳米板状三氧化钨表面氧空位附近的O原子的峰值面积和物理吸附水的O的峰值面积明显增加,表明多层的结构增加了缺陷或不完整的W-O结合。而这种缺陷成为反应的活性位点使得从而提升了光电流,同时会加强对水的吸附能力的增强反应活性。
M-WO3的光电流密度不仅是S-WO3的3.1倍,而且M-WO3有更大的活性面积(图6),水氧化成H2O2的极化曲线显示出M-WO3的阴极过电势偏移120 mV(图7)。在M-WO3上生产H2O2的法拉第效率约为S-WO3的2.4倍(图8)。在相对于RHE的0.6至1.8 V的施加偏压下,M-WO3上生成H2O2的法拉第效率平均值达到60.5%。
水热生长时,因为Cl-作为一种类似于F-的封端离子发挥作用,这种封端效应会被吸附到比表面能大的晶面上进而使其无法与水热溶液接触进而达到抑制其生长的作用,使得晶体只能从俩侧生长而形成这种多层纳米板状的结构。而水热溶液中存在(NH4)+的话,他会弱化Cl-的电负性使得他无法被吸附到晶面的表面从而达到了这种单层的纳米板状结构。
Claims (9)
1.一种多层纳米板状三氧化钨的制备方法,其特征在于,具体步骤如下:
(1)向钨酸钠溶液加入浓盐酸得到沉淀,将离心所得沉淀溶解于双氧水,然后加入超纯水和分散剂聚乙烯醇,搅拌至完全溶解,将所得溶液旋涂在干净的FTO表面,然后置于500℃下退火得到种子层;
(2)向钨酸钠溶液加入浓盐酸得到沉淀,然后加入草酸溶解沉淀得到澄清的溶液,得到前驱体溶液;
(3)将带有种子层的FTO浸没在前驱体溶液中,且种子层朝下,在180℃下水热反应,降至一定温度后取出,并快速冷却;
(4)水洗干净后,置于500℃下退火,退火结束后降至室温,得到多层纳米板状三氧化钨。
2.如权利要求1所述的方法,其特征在于,步骤(1)中,置于500℃下退火2h。
3.如权利要求1所述的方法,其特征在于,步骤(2)中,钨酸钠与浓盐酸的摩尔比为100:3.05。
4.如权利要求1所述的方法,其特征在于,步骤(3)中,在180℃下水热反应2h。
5.如权利要求1所述的方法,其特征在于,步骤(3)中,降至80~100℃后取出,并用流水快速冷却。
6. 如权利要求1所述的方法,其特征在于,步骤(4)中,置于500℃下2 h。
7.如权利要求1所述的方法,其特征在于,步骤(4)中,升温、降温速率均为15℃/min。
8.如权利要求1-7任一所述的方法制备的多层纳米板状三氧化钨。
9.如权利要求1-7任一所述的方法制备的多层纳米板状三氧化钨在光电催化水氧化产双氧水上的用途。
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