CN114163842A - 不对称颜料 - Google Patents
不对称颜料 Download PDFInfo
- Publication number
- CN114163842A CN114163842A CN202111372150.1A CN202111372150A CN114163842A CN 114163842 A CN114163842 A CN 114163842A CN 202111372150 A CN202111372150 A CN 202111372150A CN 114163842 A CN114163842 A CN 114163842A
- Authority
- CN
- China
- Prior art keywords
- fabry
- pigment
- dielectric layer
- perot structure
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000049 pigment Substances 0.000 title claims abstract description 138
- 238000000034 method Methods 0.000 claims abstract description 32
- 230000003287 optical effect Effects 0.000 claims description 67
- 239000000463 material Substances 0.000 claims description 51
- 230000005291 magnetic effect Effects 0.000 claims description 33
- 238000000151 deposition Methods 0.000 claims description 23
- 239000003086 colorant Substances 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 22
- 239000007788 liquid Substances 0.000 claims description 17
- -1 hafnium nitride Chemical class 0.000 claims description 12
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 8
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 5
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 4
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 4
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 claims description 4
- 239000005083 Zinc sulfide Substances 0.000 claims description 3
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 3
- QCCDYNYSHILRDG-UHFFFAOYSA-K cerium(3+);trifluoride Chemical compound [F-].[F-].[F-].[Ce+3] QCCDYNYSHILRDG-UHFFFAOYSA-K 0.000 claims description 3
- WHJFNYXPKGDKBB-UHFFFAOYSA-N hafnium;methane Chemical compound C.[Hf] WHJFNYXPKGDKBB-UHFFFAOYSA-N 0.000 claims description 3
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 claims description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 3
- 239000000395 magnesium oxide Substances 0.000 claims description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 3
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 claims description 3
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 3
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 claims description 2
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims description 2
- 229910001632 barium fluoride Inorganic materials 0.000 claims description 2
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 2
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 2
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 2
- 229910003437 indium oxide Inorganic materials 0.000 claims description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 2
- MMKQUGHLEMYQSG-UHFFFAOYSA-N oxygen(2-);praseodymium(3+) Chemical compound [O-2].[O-2].[O-2].[Pr+3].[Pr+3] MMKQUGHLEMYQSG-UHFFFAOYSA-N 0.000 claims description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 2
- 229910003447 praseodymium oxide Inorganic materials 0.000 claims description 2
- 229910001954 samarium oxide Inorganic materials 0.000 claims description 2
- 229940075630 samarium oxide Drugs 0.000 claims description 2
- OJIKOZJGHCVMDC-UHFFFAOYSA-K samarium(iii) fluoride Chemical compound F[Sm](F)F OJIKOZJGHCVMDC-UHFFFAOYSA-K 0.000 claims description 2
- FKTOIHSPIPYAPE-UHFFFAOYSA-N samarium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Sm+3].[Sm+3] FKTOIHSPIPYAPE-UHFFFAOYSA-N 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 2
- 229910001887 tin oxide Inorganic materials 0.000 claims description 2
- 239000004408 titanium dioxide Substances 0.000 claims description 2
- XRADHEAKQRNYQQ-UHFFFAOYSA-K trifluoroneodymium Chemical compound F[Nd](F)F XRADHEAKQRNYQQ-UHFFFAOYSA-K 0.000 claims description 2
- 239000011787 zinc oxide Substances 0.000 claims description 2
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 2
- VFLXBUJKRRJAKY-UHFFFAOYSA-N 13768-86-0 Chemical compound O=[Se](=O)=O VFLXBUJKRRJAKY-UHFFFAOYSA-N 0.000 claims 1
- 229910001940 europium oxide Inorganic materials 0.000 claims 1
- AEBZCFFCDTZXHP-UHFFFAOYSA-N europium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Eu+3].[Eu+3] AEBZCFFCDTZXHP-UHFFFAOYSA-N 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
- 230000009977 dual effect Effects 0.000 description 35
- 239000006096 absorbing agent Substances 0.000 description 34
- 229910052751 metal Inorganic materials 0.000 description 20
- 239000002184 metal Substances 0.000 description 20
- 239000000203 mixture Substances 0.000 description 19
- 239000010936 titanium Substances 0.000 description 16
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 11
- 239000000956 alloy Substances 0.000 description 11
- 229910045601 alloy Inorganic materials 0.000 description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 10
- 229910052719 titanium Inorganic materials 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
- 239000011651 chromium Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 229910052804 chromium Inorganic materials 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 6
- 239000000696 magnetic material Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 235000013980 iron oxide Nutrition 0.000 description 4
- 239000010955 niobium Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000005294 ferromagnetic effect Effects 0.000 description 3
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000012797 qualification Methods 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 238000001429 visible spectrum Methods 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N 3-methyl-2-pentanone Chemical compound CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 239000004812 Fluorinated ethylene propylene Substances 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 2
- 238000007766 curtain coating Methods 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000003302 ferromagnetic material Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 229910000856 hastalloy Inorganic materials 0.000 description 2
- 229910001026 inconel Inorganic materials 0.000 description 2
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052755 nonmetal Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229920009441 perflouroethylene propylene Polymers 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- PJGSXYOJTGTZAV-UHFFFAOYSA-N pinacolone Chemical compound CC(=O)C(C)(C)C PJGSXYOJTGTZAV-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910021341 titanium silicide Inorganic materials 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 229910002518 CoFe2O4 Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910019589 Cr—Fe Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910017060 Fe Cr Inorganic materials 0.000 description 1
- 229910002544 Fe-Cr Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 229910017163 MnFe2O4 Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003264 NiFe2O4 Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910018594 Si-Cu Inorganic materials 0.000 description 1
- 229910008465 Si—Cu Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910001361 White metal Inorganic materials 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 238000000231 atomic layer deposition Methods 0.000 description 1
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- 239000000788 chromium alloy Substances 0.000 description 1
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 1
- NVIVJPRCKQTWLY-UHFFFAOYSA-N cobalt nickel Chemical compound [Co][Ni][Co] NVIVJPRCKQTWLY-UHFFFAOYSA-N 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
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- 150000001993 dienes Chemical class 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000002902 ferrimagnetic material Substances 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910001512 metal fluoride Inorganic materials 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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Abstract
本申请涉及不对称颜料。公开了一种不对称颜料,其包括第一法布里‑珀罗结构;和第二法布里‑珀罗结构;其中第一法布里‑珀罗结构和第二法布里‑珀罗结构具有在+/‑45度内的相似的色相角。还公开了其他不对称颜料以及制造所公开的颜料的方法。
Description
本申请是申请日为2018年11月16日、申请号为201880085211.6、发明名称为“不对称颜料”的申请的分案申请。
发明领域
本公开内容总体上涉及不对称颜料,该不对称颜料可以(i)包括一定角度的可见的颜色(visible color at angle),(ii)变色(color shift),并且(iii)具有小的颜料尺寸。还公开了制造不对称颜料的方法。
发明背景
从隐藏的角度来看,在反射峰处具有2倍或4倍四分之一波长厚度的光学厚度的基于通过干涉变色的变色磁性颜料可以是有吸引力的,因为薄片(flake)是薄的。然而,这些薄片具有若干缺点。特别地,一定角度的颜色可能不太可见,因为看到该颜色所需的倾斜角是高的。在大多数照明条件下,高倾斜角导致低光反射。此外,薄片难以破碎成小的颜料尺寸,因为不透明的磁芯结合低的每薄片重量(per flake weight)是相对坚固的。
以前,为了获得在高倾斜角时可见并且例如在薄片中易于改变的强烈的颜色(strong color),制造了具有光学厚层的对称颜料。然而,具有光学较厚层的颜料制造起来更昂贵。为了最小化成本,制造了具有光学较薄层的颜料。然而,具有光学较薄层的颜料不产生强烈的颜色效果并且例如在薄片中难以改变,因为它们具有高的相对金属含量和低的重量与表面比。尽管具有光学较薄层的颜料制造起来较便宜,但它们呈现出低的颜色效果和/或变色效果,并且是在变色着色剂中可见的较大尺寸的薄片。
双腔设计颜料(dual cavity design pigment)可以实现采用2倍四分之一波长或4倍四分之一波长单腔设计无法实现的颜色。然而,生产并不简单,并且双腔设计颜料是相对厚的、重的且昂贵的。
发明概述
在一个方面中,公开了一种不对称颜料,该不对称颜料包括第一法布里-珀罗结构(Fabry-Perot structure);和第二法布里-珀罗结构;其中第一法布里-珀罗结构和第二法布里-珀罗结构具有在+/-45度内的相似的色相角(hue angle);并且其中第一法布里-珀罗结构和第二法布里-珀罗结构的平均厚度是1:1.5至1:2.5的比。
在另一个方面中,公开了一种不对称颜料,该不对称颜料包括法布里-珀罗结构;和双腔;其中法布里-珀罗结构和双腔具有在+/-45度内的相似的色相角。
在另外的方面中,公开了一种形成不对称颜料的方法,该方法包括在基底上沉积第一法布里-珀罗结构;以及在第一法布里-珀罗结构上沉积第二法布里-珀罗结构;其中第一法布里-珀罗结构和第二法布里-珀罗结构具有在+/-45度内的相似的色相角。
在另外的方面中,公开了一种用于制造颜料的方法,该方法包括在基底上沉积法布里-珀罗结构;以及在法布里-珀罗结构上沉积双腔;其中法布里-珀罗结构和双腔具有在+/-45度内的相似的色相角。
在另一个方面中,公开了一种用于制造颜料的方法,该方法包括在基底上沉积双腔;以及在双腔上沉积法布里-珀罗结构;其中法布里-珀罗结构和双腔具有在+/-45度内的相似的色相角。
本发明还涉及以下方面:
1.一种不对称颜料,包括:
第一法布里-珀罗结构;和
第二法布里-珀罗结构;
其中所述第一法布里-珀罗结构和所述第二法布里-珀罗结构具有在+/-45度内的相似的色相角;
并且其中所述第一法布里-珀罗结构和所述第二法布里-珀罗结构的平均厚度是1:1.5至1:2.5的比。
2.如方面1所述的颜料,其中所述第一法布里-珀罗结构和所述第二法布里-珀罗结构各自独立地包括反射体层、介电层和吸收剂层。
3.如方面1所述的颜料,其中所述第一法布里-珀罗结构和所述第二法布里-珀罗结构中的每一种的光学厚度是不同的。
4.如方面1所述的颜料,其中所述第一法布里-珀罗结构包括范围从约200nm至约400nm的2倍四分之一波长光学厚度。
5.如方面1所述的颜料,其中所述第一法布里-珀罗结构和所述第二法布里-珀罗结构能够各自独立地包括范围从约400nm至约600nm的4倍四分之一波长光学厚度。
6.如方面1所述的颜料,其中所述第二法布里-珀罗结构包括范围从约600nm至约800nm的6倍四分之一波长光学厚度。
7.如方面1所述的颜料,其中所述第一法布里-珀罗结构包括范围从约200nm至约400nm的2倍四分之一波长光学厚度;并且
其中所述第二法布里-珀罗结构包括范围从约400nm至约600nm的4倍四分之一波长光学厚度。
8.如方面1所述的颜料,其中所述第一法布里-珀罗结构包括范围从约400nm至约600nm的4倍四分之一波长光学厚度;并且
其中所述第二法布里-珀罗结构包括范围从约600nm至约800nm的6倍四分之一波长光学厚度。
9.如方面1所述的颜料,还包括布置在所述第一法布里-珀罗结构和所述第二法布里-珀罗结构之间的含磁性层。
10.一种变色着色剂,包含:
方面1所述的颜料;和
液体介质。
11.一种不对称颜料,包括:
法布里-珀罗结构;和
双腔;
其中所述法布里-珀罗结构和所述双腔具有在+/-45度内的相似的色相角。
12.如方面11所述的颜料,还包括布置在所述法布里-珀罗结构和所述双腔之间的含磁性层。
13.如方面11所述的颜料,其中所述法布里-珀罗结构包括范围从约200nm至约400nm的2倍四分之一波长光学厚度。
14.如方面11所述的颜料,其中所述法布里-珀罗结构包括范围从约400nm至约600nm的4倍四分之一波长光学厚度。
15.如方面11所述的颜料,其中所述双腔包括反射体层以及交替的介电层和吸收剂层的堆叠。
16.如方面15所述的颜料,其中所述交替的介电层和吸收剂层的堆叠能够包括第一介电层、第一吸收剂层、第二介电层和第二吸收剂层。
17.如方面15所述的颜料,其中所述第一介电层和所述第二介电层能够各自独立地包括选自2倍四分之一波长光学厚度、4倍四分之一波长光学厚度和6倍四分之一波长光学厚度的四分之一波长光学厚度。
18.如方面15所述的颜料,其中所述双腔包括具有范围从约200nm至约400nm的2倍四分之一波长光学厚度的第一介电层;以及
具有范围从约400nm至约600nm的4倍四分之一波长光学厚度的第二介电层。
19.如方面18所述的颜料,其中所述双腔包括具有范围从约400nm至约600nm的4倍四分之一波长光学厚度的第一介电层;以及
具有范围从约600nm至约800nm的6倍四分之一波长光学厚度的第二介电层。
20.一种变色着色剂,包含:
方面14所述的不对称颜料;以及液体介质。
各种实施方案的另外的特征和优点将部分地在以下的描述中阐述,并且部分地从描述中将是明显的或者可以通过实践各种实施方案而得知。各种实施方案的目的和其他优点将借助于在本文的描述中特别指出的元件和组合来实现和获得。
附图简述
本公开内容可以从详述和附图中以其若干方面和实施方案被更充分地理解,在附图中:
图1是根据本发明的方面的不对称颜料的横截面图;
图2A是根据本发明的方面的法布里-珀罗结构的横截面;
图2B是根据本发明的另一个方面的法布里-珀罗结构的横截面;
图2C是根据本发明的另一个方面的法布里-珀罗结构的横截面;
图3是根据本发明的另一个方面的不对称颜料的横截面图;
图4A是根据本发明的另一个方面的不对称颜料的横截面图;
图4B是根据本发明的另一个方面的不对称颜料的横截面图;
图4C是根据本发明的另一个方面的不对称颜料的横截面图;
图5A是根据本发明的方面的双腔的横截面;
图5B是根据本发明的另一个方面的双腔的横截面;
图5C是根据本发明的另一个方面的双腔的横截面;以及
图6是图示出色相角的L.*a*b*图。
在整个本说明书和附图中,相同的参考数字标识相同的元件。
发明详述
应理解,前述的一般描述和以下的详述两者仅仅是示例性的和解释性的,并且意图提供对本教导的各种实施方案的解释。
在其广泛和变化的实施方案中,本文公开了颜料10,例如不对称颜料,以及制造颜料10的方法。颜料10可以与液体介质掺混以形成变色着色剂。在一个方面中,不对称设计可能导致较低的一定角度的色度(chromaticity),这导致颜色向深色偏移。对于磁性对齐的颜料(magnetically aligned pigment),这可能是有吸引力的方面,因为它可能导致具有丰富颜色的区域被示出比对称颜料情况下少得多的颜色的区域包围或邻接。有色区域可能看起来随着视角的变化而移动。
图1、图3和图4A-图4C图示出了根据多个实例的多种颜料10,例如呈薄片、箔或片材的形式的光学器件。尽管这些图以特定的顺序图示出特定的层,但本领域普通技术人员将理解,颜料10可以以任何顺序包括任何数目的层。另外,任何特定层的组成可以与任何其他层的组成相同或不同。还设想的是,本文公开的颜料10可以包括另外的层,例如中间层(intermediate layer)或中间层(intervening layer)。还设想的是,颜料10的层可以被表面改性,例如通过氧化。将理解的是,所公开的颜料10可以是尺寸上不对称的,即,与颜料10的相对侧(其可以是较厚的,例如物理上或光学上较厚的)相比,颜料的一侧可以是较薄的,例如可以是物理上和/或光学上不太厚的。
本文公开的颜料10可以提供成本和颜色效果之间的平衡。也就是说,颜料10是不对称的,在一侧上具有光学上较薄的层,即以便实现较低的成本,并且在相对侧上具有光学上较厚的层,即以便实现较强烈的一定角度的颜色效果。不对称设计可以导致比光学上较薄的对称薄片更高的每薄片重量,并且可以改善颜料破碎成颜料薄片。此外,包括颜料10的变色着色剂可以具有每薄片重量的均匀分布,以便避免在制备、储存或应用阶段在涂料或油墨载体中重量引起的分离。例如,在变色着色剂中使用颜料10可以导致颜料10的任一侧朝上的50/50可能性,因为变色着色剂中存在的所有颜料10可以具有相同的重量。例如,颜料10中的一些可以采用例如第一法布里-珀罗结构20侧朝上放置,并且颜料10中的一些可以采用第二法布里-珀罗结构20'侧朝上放置。在另一个方面中,颜料10中的一些可以采用法布里-珀罗结构20(例如2倍或4倍四分之一波长堆叠(stack))侧朝上放置,并且颜料10中的一些可以采用双腔26侧朝上放置。
颜料10可以是不对称的,包括光学上较薄的侧面和光学上较厚的侧面。如图1中所示,在一个方面中,颜料10包括第一法布里-珀罗结构20;和第二法布里-珀罗结构20';其中第一法布里-珀罗结构和第二法布里-珀罗结构具有在+/-45度内的相似的色相角;并且其中第一法布里-珀罗结构和第二法布里-珀罗结构的平均厚度是1:1.5至1:2.5的比。第一法布里-珀罗结构和第二法布里-珀罗结构的平均厚度是2:2.5至2:3.5的比,例如,1:2.5至1:3.5的比。在另一个方面中,不对称颜料可以包括第一法布里-珀罗结构;和第二法布里-珀罗结构;其中第一法布里-珀罗结构和第二法布里-珀罗结构具有在+/-45度内的相似的色相角。法布里-珀罗结构(第一法布里-珀罗结构20、第二法布里-珀罗结构20'、第三法布里-珀罗结构20”等)可以各自独立地包括反射体层14、介电层12和吸收剂层18,如图2A-图2C中所示。将理解的是,任何两个法布里-珀罗结构20都可以被用于形成颜料10,只要每个法布里-珀罗结构20具有不同的光学厚度。
在一个方面中,第一法布里-珀罗结构20和第二法布里-珀罗结构20'中的每一种的光学厚度可以是不同的。例如,第一法布里-珀罗结构20可以包括范围从约200nm至约400nm的2倍四分之一波长光学厚度(quarter wave optical thickness)或者范围从约400nm至约600nm的4倍四分之一波长光学厚度。作为另外的实例,第二法布里-珀罗结构20'可以包括范围从约400nm至约600nm的4倍四分之一波长光学厚度或者范围从约600nm至约800nm的6倍四分之一波长光学厚度。
诸如图1中所示的,不对称颜料10可以包括第一法布里-珀罗结构20,该第一法布里-珀罗结构20包括范围从约200nm至约400nm的2倍四分之一波长光学厚度;以及第二法布里-珀罗结构20',该第二法布里-珀罗结构20'包括范围从约400nm至约600nm的4倍四分之一波长光学厚度。
在另一个方面中,不对称颜料10可以包括第一法布里-珀罗结构20,该第一法布里-珀罗结构20包括范围从约400nm至约600nm的4倍四分之一波长光学厚度;以及第二法布里-珀罗结构20',该第二法布里-珀罗结构20'包括范围从约600nm至约800nm的6倍四分之一波长光学厚度。
不对称颜料10可以与液体介质组合以形成变色着色剂。变色着色剂可以是例如油墨或涂料。液体介质的非限制性实例可以包括溶剂,例如乙酸酯,例如乙酸乙酯、乙酸丙酯和乙酸丁酯;丙酮;水;酮,例如二甲基酮(DMK)、甲基乙基酮(MEK)、仲丁基甲基酮(SBMK)、叔丁基甲基酮(TBMK)、环戊酮和茴香醚;二醇和二醇衍生物,例如丙二醇甲醚(propyleneglycol methyl ether)和丙二醇甲醚乙酸酯(propylene glycol methyl etheracetate);醇,例如异丙醇和二丙酮醇;酯,例如丙二酸酯;杂环溶剂,例如n-甲基吡咯烷酮;烃,例如甲苯和二甲苯;聚结溶剂(coalescing solvent),例如乙二醇醚;以及其混合物。在一个方面中,液体介质可以以相对于变色着色剂的总重量的按重量计范围从约0%至约99.9%、例如从约0.005%至约99%并且作为另外的实例从约0.05%至约90%的量存在。
每种公开的示例性颜料10可以被改变,例如被机械地改变,例如通过破碎,以形成薄片、箔或片材。颜料10可以被形成为尺寸范围从约2微米至约40微米的薄片、箔或片材。颜料10可以具有20微米的D50(50%的颜料大于20微米并且50%的颜料更小),4微米的D0.01(99.9%的颜料大于4微米),以及80微米的D99.99(0.01%的颜料小于80微米)。具有在5微米至15微米D50范围内的小颜料尺寸的颜料10可以导致较少的粒状印刷物,但是这种薄片尺寸在不使用不对称配置的情况下可能难以用强干涉色(strong interference color)例如金色、橙色和红色来实现,因为在基于空气的研磨系统中光学上较薄、较轻重量的薄片的碰撞冲击较低。在一个方面中,颜料10可以具有约11微米的D50,并且可以具有强干涉色。
颜料10可以各自具有相似(在加或减45度内)的色相角,例如如图6中所示的。对于颜料10的每一侧通过添加剂掺混导致第三种颜色的另外两种明显不同的颜色不在范围内。通常制造在每一侧上都具有稍微不同的介电厚度的变色干涉颜料,以允许对色度和色相进行混合控制。这不在本发明的范围内。这种微小的厚度差异可能导致不同的色相角,但不会显著影响一定角度的颜色或破碎特性。
在一些实例中,颜料10可以呈现出光学干涉。可选择地,在一些实例中,颜料10不能呈现出光学干涉。在一个方面中,颜料10可以利用干涉来产生颜色。在另一个方面中,颜料10不能利用干涉来产生颜色。
在另外的方面中,不对称颜料10可以包括夹在第一法布里-珀罗结构20和第二法布里-珀罗结构20'之间的含磁性层(magnetic-containing layer)16,如图3中所示。在一个方面中,含磁性层16可以夹在第二法布里-珀罗结构20'和第三法布里-珀罗结构20”之间(未示出)。不对称颜料10可以包括夹在法布里-珀罗结构20和双腔之间的含磁性层16,如图4C中所示。如本文中更全面地论述的,反射体层14和/或吸收剂层18可以各自独立地包括含磁性材料,该含磁性材料也可以充当用于任何法布里-珀罗结构20、20'或20”的含磁性层16。
含磁性层16可以包括导磁(magnetic permeable)材料、磁定向材料(magneticorientable material)、磁性材料及其组合。磁性材料,例如铁磁材料和亚铁磁材料,包括但不限于镍、钴、铁、钆、铽、镝、铒及其掺混物、合金或氧化物。掺混物或合金的其他实例包括但不限于Fe/Si、Fe/Ni、Fe/Co、Fe/Ni/Mo、Fe/Cr、Ni/Cr及其组合。在一个方面中,含磁性层16可以包含含氧化铁颗粒的聚合物。还可以使用SmCo5型、NdCo5型、Sm2Co17型、Nd2Fe14B型、Sr6Fe2O3型、TbFe2型、Al—Ni—Co型的硬磁体(hard magnet)及其组合,以及Fe3O4型、NiFe2O4型、MnFe2O4型、CoFe2O4型的尖晶石铁氧体(spinel ferrite)或者YIG型或GdIG型的石榴石及其组合。在一个方面中,磁性材料可以是铁素体不锈钢。磁性材料可以关于其反射性质或吸收性质以及其磁性性质来选择。含磁性层16可以由具有磁性颗粒和非磁性颗粒的材料,或非磁性介质内的磁性颗粒形成,例如由沉积在基底上的钴掺杂的氧化锌膜形成。含磁性层16可以是不同的层,或者可以用作反射体层14或吸收剂层18。
虽然可以使用此宽范围的磁性材料,但在一个方面中,可以使用“软”磁体。如本文使用的,术语“软磁体”指的是呈现出铁磁性质但在暴露于磁力之后具有大体上零的剩磁的任何材料。软磁体可以示出对所施加的磁场的快速响应,但具有非常低的磁性特征(矫顽场(Hc)=0.05奥斯特-300奥斯特(Oe))或零磁性特征,或者在磁场被除去之后保持非常低的磁力线。类似地,如本文使用的,术语“硬磁体”(还被称为永久磁体)指的是在暴露于磁化力之后呈现出铁磁性质并且具有持久的剩磁的任何材料。铁磁材料是具有大体上大于1的导磁率并且呈现出磁滞性质的任何材料。在一个方面中,任何磁性材料可以被用于含磁性层16中,只要该材料能够使颜料10在磁场中定向。
含磁性层16可以具有范围从约10nm至约100nm,例如从约35nm至约45nm,并且作为另外的实例约40nm的厚度。含磁性层16可以被沉积至一定厚度,使得含磁性层16是大体上不透明的。在一个方面中,含磁性层16可以被沉积至一定厚度,使得含磁性层16不是大体上不透明的。
含磁性层16可以使用常规的沉积工艺形成,所述常规的沉积工艺例如物理气相沉积技术;以及溅射,包括磁控溅射;热蒸发;电子束蒸发;以及阴极电弧蒸发(cathodic arcevaporation)。在一个方面中,含磁性层16还可以使用液体涂布工艺形成。
在另一个方面中,不对称颜料10可以包括法布里-珀罗结构20和双腔26,如图4A-图4C中所示的,其中法布里-珀罗结构和双腔具有在+/-45度内的相似的色相角。法布里-珀罗结构20可以如关于图1和图2A-图2C所描述的。
双腔26可以包括反射体层14,以及交替的介电层12和吸收剂层18的堆叠,如图5A-图5C中所示。例如,交替的介电层12和吸收剂层18的堆叠可以包括第一介电层12、第一吸收剂层18、第二介电层12'和第二吸收剂层18'。交替的介电层12和吸收剂层18的堆叠可以包括任何数目的每一层。
第一介电层12可以包括选自2倍四分之一波长光学厚度、4倍四分之一波长光学厚度和6倍四分之一波长光学厚度的四分之一波长光学厚度。第二介电层12'可以包括选自2倍四分之一波长光学厚度、4倍四分之一波长光学厚度和6倍四分之一波长光学厚度的四分之一波长光学厚度。
如图5A中所示的,双腔26可以包括第一介电层12,该第一介电层12具有范围从约200nm至约400nm的2倍四分之一波长光学厚度;以及第二介电层12',该第二介电层12'具有范围从约200nm至约400nm的2倍四分之一波长光学厚度。在另一个方面中,如图5B中所示的,双腔26可以包括第一介电层12,该第一介电层12具有范围从约200nm至约400nm的2倍四分之一波长光学厚度;以及第二介电层12',该第二介电层12'具有范围从约400nm至约600nm的4倍四分之一波长光学厚度。在另外的方面中,如图5C中所示的,双腔26可以包括第一介电层12,该第一介电层12具有范围从约400nm至约600nm的4倍四分之一波长光学厚度;以及第二介电层12',该第二介电层12'具有范围从约600nm至约800nm的6倍四分之一波长光学厚度。
法布里-珀罗结构20和/或双腔26的反射体层14可以是宽带反射体(widebandreflector),例如光谱和朗伯反射体(spectral and Lambertian reflector)(例如白色TiO2)。反射体层14可以各自独立地包括金属、非金属和/或金属掺混物或合金。除非另有说明,否则本文使用的术语“金属”或“金属层”意图包括所有金属、金属掺混物和合金、纯金属或含金属合金的材料、化合物、组合物和/或层。
在一个实例中,用于反射体层14的材料可以包括具有在期望的光谱范围内的反射特性的任何材料,例如,具有在期望的光谱范围内的范围从50%至100%的反射率(reflectance)的任何材料。反射材料的实例可以是铝,铝具有良好的反射率特性,是廉价的并且易于形成为薄层或沉积为薄层。其他材料也可以代替铝被使用。例如,铜、银、金、铂、钯、镍、钴、铌、铬、锡以及这些或其他金属的组合、掺混物或合金可以被用作反射材料。在一个方面中,用于反射体层14的材料可以是白色金属或浅色金属。在其他实例中,反射体层14可以包括但不限于过渡金属和镧系金属及其组合;以及金属碳化物、金属氧化物、金属氮化物、金属硫化物、其组合或这些材料中的一种或更多种和金属的混合物。
反射体层14的厚度可以是范围从约5nm至约5000nm,尽管此范围不应当被视为限制性的。例如,可以选择较低的厚度,使得反射体层14提供0.8的最大透射率。另外或可选择地,对于包括铝的反射体层14,在约550nm的波长处,最小光密度(OD)可以是从约0.1至约4。
为了获得足够的光密度和/或实现期望的效果,取决于反射体层14的组成,可能需要较高或较低的最小厚度。在一些实例中,上限可以是约5000nm、约4000nm、约3000nm、约1500nm、约200nm和/或约100nm。在一个方面中,反射体层14的厚度可以是范围从约10nm至约5000nm,例如,从约15nm至约4000nm、从约20nm至约3000nm、从约25nm至约2000nm、从约30nm至约1000nm、从约40nm至约750nm、或从约50nm至约500nm,例如从约60nm至约250nm或从约70nm至约200nm。
在一个方面中,法布里-珀罗结构20和/或双腔26的介电层12可以被布置在反射体层14上。介电层12可以具有大于或小于约1.5的折射率。例如,介电层12可以具有约1.5的折射率。介电层12的折射率可以被选择以提供所需的颜色行进(color travel)程度,其中颜色行进可以被定义为在L*a*b*颜色空间中测量的色相角随着视角的变化。
光学厚度是众所周知的光学参数,其被定义为乘积ηd,其中η是层的折射率并且d是层的物理厚度。典型地,层的光学厚度用等于4ηd/λ的四分之一波长光学厚度(QWOT)来表示,其中λ是QWOT条件出现时的波长。介电层12的光学厚度可以是范围从在约200nm的设计波长下约2倍QWOT至在约700nm的设计波长下约9倍QWOT,并且例如在200nm-800nm下2倍-6倍QWOT,这取决于期望的变色。用于介电层12的合适的材料包括具有“高”折射率的那些材料,所述“高”折射率在本文中被定义为大于约1.65;以及具有“低”折射率的那些材料,所述“低”折射率在本文中被定义为约1.65或更低。出于本说明书的目的,鉴定(qualification)2倍、4倍或6倍四分之一波长鉴定(quarter wave qualification)是基于图6进行的,该图6绘制了在法线角度(normal angle)色相角相对介电厚度。作为实例,在140nm(2倍四分之一波长)、280nm(4倍四分之一波长)和430nm(6倍四分之一波长)的光学厚度下获得了金色(约90度色相角)。由于低色度或低亮度,用特定的四分之一波长数获得的一些颜色对人眼不太有吸引力,但是可见光谱中的大多数颜色可以用至少2倍四分之一波长数来制成。在大于2倍四分之一波长时,可见光谱中有多个反射峰,并且这影响在特定色相角处的色度。2倍四分之一波长的绿色具有很低的色度,并且这种颜色通常被制成为4倍或6倍四分之一波长堆叠。6倍四分之一波长的绿色具有在蓝色中的反射峰,并因此当被制成为蓝绿色(blue-ishgreen)时将具有较高的色度。品红色或红色作为2倍或4倍四分之一波长堆叠效果很好,但不如6倍四分之一波长堆叠效果好,因为它具有无吸引力的低亮度。
用于介电层12的合适的高折射率材料的实例包括硫化锌(ZnS)、氧化锌(ZnO)、氧化锆(ZrO2)、二氧化钛(TiO2)、碳(C)、氧化铟(In2O3)、氧化铟锡(ITO)、五氧化二钽(Ta2O5)、氧化铈(CeO2)、氧化钇(Y2O3)、氧化铓(Eu2O3)、铁氧化物例如铁(II,III)氧化物(Fe3O4)和氧化铁(Fe2O3)、氮化铪(HfN)、碳化铪(HfC)、氧化铪(HfO2)、氧化镧(La2O3)、氧化镁(MgO)、氧化钕(Nd2O3)、氧化镨(Pr6O11)、氧化钐(Sm2O3)、三氧化二锑(Sb2O3)、碳化硅(SiC)、氮化硅(Si3N4)、一氧化硅(SiO)、三氧化二硒(Se2O3)、氧化锡(SnO2)、三氧化钨(WO3)、其组合及类似材料。
用于介电层12的合适的低折射率材料包括二氧化硅(SiO2),氧化铝(Al2O3),金属氟化物例如氟化镁(MgF2)、氟化铝(AlF3)、氟化铈(CeF3)、氟化镧(LaF3)、氟化铝钠(sodiumaluminum fluoride)(例如Na3AlF6或Na5Al3F14)、氟化钕(NdF3)、氟化钐(SmF3)、氟化钡(BaF2)、氟化钙(CaF2)、氟化锂(LiF)、其组合,或具有约1.65或更低的折射率的任何其他低折射率材料。例如,有机单体和聚合物可以被用作低折射率材料,包括二烯或烯烃,例如丙烯酸酯(例如甲基丙烯酸酯)、全氟烯烃、聚四氟乙烯(Teflon(特氟隆))、氟化乙烯丙烯(FEP)、其组合及类似材料。
介电层12可以被沉积或印刷或以其他方式涂布为具有预定层数的介电堆叠。在该实例中,堆叠可以包括低折射率材料的一个或更多个层和高折射率材料的一个或更多个层。具有低折射率材料的层(低折射率层)和具有高折射率材料的层(高折射率层)可以交替。例如,高折射率层可以被沉积或印刷在反射体层14上。然后,低折射率层可以被沉积在其相应的高折射率层上。该过程可以根据需要被重复多次,以产生介电层12。交替层可以以任何顺序堆叠,例如,层可以以(H/L)n、(H/L)nH或L(H/L)n的顺序堆叠,其中H表示较高折射率层,并且L表示较低折射率层。交替的低折射率层和高折射率层的数目(n)可以是范围从约2个至超过约75个,例如从约10个至约50个交替层,或者例如从约5个至约25个交替层。在一个方面中,介电堆叠可以包括在组成上交替的液体涂布印刷的层(liquid coatingprinted layer),该液体涂布印刷的层增加了另一层中的有效折射率。可以使用任何数目的不同材料来印刷任何数目的层。以这种方式,通过控制每个介电层12的层厚度和折射率,定制光学设计是可能的。
在每个方面中,介电层12可以是透明层或者可以是有色层。介电层12的性能可以基于介电层12中存在的材料的选择来确定。据信,基于介电层12的组成,介电层12可以在光的透射、反射和吸收方面获得高性能。在一个方面中,介电层12可以包括允许较宽范围的材料被配置成增加对介电层12的光学性能的控制的组合物。在一个方面中,介电层12可以改进以下性质中的至少一种:金属层的薄片处理、腐蚀、对齐和环境性能。
介电层可以具有范围从约130nm至约450nm的标称光学厚度(nominal opticalthickness)。介电层12的厚度可以被用来确定总体颜色。当与标称光学厚度的偏差变化太大时,不同的区域或薄片具有不同的或甚至互补的颜色,并且当掺混时,观察到色度的损失。
吸收剂层18可以被布置在介电层12上。吸收剂层18可以独立地包括金属、非金属或金属掺混物或合金。在一个实例中,用于吸收剂层18的材料可以包括任何吸收剂材料,所述吸收剂材料包括选择性吸收性材料和非选择性吸收性材料两者。例如,吸收剂层18可以由沉积至一定厚度的非选择性吸收性金属材料形成,在该厚度,该层是至少部分地吸收性的或半透明的。非选择性吸收性材料的实例可以是灰色金属(gray metal),例如铬或镍。选择性吸收性材料的实例可以是铜或金。在一个方面中,吸收性材料可以是铬。合适的吸收剂材料的非限制性实例包括金属吸收剂,例如铬、铝、银、镍、钯、铂、钛、钒、钴、铁、锡、钨、钼、铑、铌、铜;以及其他吸收剂,例如碳、石墨、硅、锗、金属陶瓷、氧化铁或其他金属氧化物、在介电基质中混合的金属以及能够在可见光谱中充当均匀的或选择性的吸收剂的其他物质。上文吸收剂材料的各种组合、混合物、化合物或合金可以用于形成吸收剂层18。
上文吸收剂材料的合适的合金的实例可以包括因科镍(Inconel)(Ni—Cr—Fe)、不锈钢、哈氏合金(Hastalloy)(Ni—Mo—Fe;Ni—Mo—Fe—Cr;Ni—Si—Cu)和基于钛的合金例如与碳混合的钛(Ti/C)、与钨混合的钛(Ti/W)、与铌混合的钛(Ti/Nb)以及与硅混合的钛(Ti/Si)及其组合。用于吸收剂层18的合适的化合物的其他实例包括但不限于基于钛的化合物,例如硅化钛(TiSi2)、硼化钛(TiB2)及其组合。可选择地,吸收剂层18可以包括沉积在Ti的基质中的基于钛的合金,或者可以包括沉积在基于钛的合金或掺混物的基质中的Ti。例如,吸收剂层18可以包括铬。
吸收剂层18还可以由磁性材料,例如钴镍合金或掺混物或者铁铬合金或掺混物形成。这可以通过减少所需的材料的数目来简化磁性变色装置或结构的制造。
取决于吸收剂层材料的光学常数和期望的峰位移,吸收剂层18可以被形成为具有在从约1nm至约50nm的范围内,例如从约5nm至约10nm的范围内的物理厚度。如果颜料10中存在多于一个吸收剂层18,则吸收剂层18可以包含相同的材料或不同的材料,例如图5C中所示的,并且对于每一层可以具有相同或不同的物理厚度。
还公开了一种如本文所描述的用于制造颜料10的方法。该方法可以包括在基底上沉积第一法布里-珀罗结构20;以及在第一法布里-珀罗结构20上沉积第二法布里-珀罗结构20'。在另一个方面中,该方法可以包括在基底上沉积第二法布里-珀罗结构20';以及在第二法布里-珀罗结构20'上沉积第一法布里-珀罗结构20。
在另一个方面中,用于制造颜料10的方法可以包括在基底上沉积双腔26;以及在双腔26上沉积法布里-珀罗结构20。在另一个方面中,用于制造颜料10的方法可以包括在基底上沉积法布里-珀罗结构20;以及在法布里-珀罗结构20上沉积双腔26。
基底可以由柔性材料制成。基底可以是可以接收沉积层的任何合适的材料。合适的基底材料的非限制性实例包括聚合物网(polymer web),例如聚对苯二甲酸乙二醇酯(PET)、玻璃、硅片等。基底可以包括释放层。
颜料10的任何层或全部层可以通过常规沉积工艺被沉积到基底上,所述常规沉积工艺例如物理气相沉积、化学气相沉积、薄膜沉积、原子层沉积等,包括修改的技术,例如等离子体增强和流化床(plasma enhanced and fluidized bed)。这些层中的一个或更多个可以使用液体涂布工艺、使用例如槽模设备(slot die apparatus)来沉积。液体涂布工艺包括但不限于:以单层和多层涂布的槽珠(slot-bead)涂布工艺、滑珠(slide bead)涂布工艺、槽幕(slot curtain)涂布工艺、滑幕(slide curtain)涂布工艺,张力网槽(tensionedweb slot)涂布工艺、凹版印刷涂布工艺、辊涂工艺以及将液体施加到基底上以形成随后被干燥和/或固化的液体层或膜的其他液体涂布和印刷工艺。与其他沉积技术例如气相沉积相比,液体涂布工艺可以允许组合物以较快的速率转移。
然后,基底可以从沉积层释放,以产生颜料10,例如如图1、图3和图4A-图4C中所示。在一个方面中,基底可以被冷却以脆化相关联的释放层。在另一个方面中,释放层可以例如通过用光子能量或电子束能量加热和/或固化以增加交联度被脆化,这将能够实现剥离。然后,沉积层可以被机械地剥离,例如通过将表面急剧弯曲或涂刷(brushing)。使用已知技术,可以将释放层和剥离层定尺寸成颜料10,例如呈薄片、箔或片材的形式的光学器件。
在另一个方面中,沉积层可以从基底转移至另一个表面。沉积层可以被冲压或切割以产生具有明确限定的尺寸和形状的大薄片。
还公开了一种用于形成不对称颜料的方法,该方法包括:在基底上沉积第一法布里-珀罗结构;以及在第一法布里-珀罗结构上沉积第二法布里-珀罗结构;其中第一法布里-珀罗结构和第二法布里-珀罗结构具有在+/-45度内的相似的色相角。
还公开了一种用于制造颜料的方法,该方法包括在基底上沉积法布里-珀罗结构;以及在法布里-珀罗结构上沉积双腔;其中法布里-珀罗结构和双腔具有在+/-45度内的相似的色相角。
还公开了一种用于制造颜料的方法,该方法包括在基底上沉积双腔;以及在双腔上沉积法布里-珀罗结构;其中法布里-珀罗结构和双腔具有在+/-45度内的相似的色相角。
从前面的描述中,本领域技术人员可以理解本教导可以以多种形式被实施。因此,虽然已经结合其特定的实施方案和实例描述了这些教导,但本教导的真实范围不应当被如此限制。可以做出多种变化和修改,而不偏离本文教导的范围。
此范围公开内容将被广泛地解释。意图本公开内容公开实现本文公开的装置、活动和机械动作的等效物、设备(means)、系统和方法。对于所公开的每种装置、颜料、方法、设备、机械元件或机构,意图本公开内容也涵盖在其公开内容中,并且教导用于实践本文公开的许多方面、机构和装置的等效物、设备、系统和方法。另外,本公开内容涉及涂层及其许多方面、特征和元件。这样的装置在其使用和操作中可以是动态的,本公开内容意图涵盖使用该装置和/或制造的颜料的等效物、设备、系统和方法,以及其与本文公开的操作和功能的描述和精神一致的许多方面。本申请的权利要求同样将被广泛地解释。
在本文中,本发明的描述在其许多实施方案中本质上仅仅是示例性的,并且因此,不偏离本发明的主旨的变化意图在本发明的范围内。这样的变化不应被视为偏离本发明的精神和范围。
Claims (20)
1.一种不对称颜料,包括:
第一法布里-珀罗结构,其包括第一介电层;和
第二法布里-珀罗结构,其包括第二介电层;
其中所述第一法布里-珀罗结构具有与所述第二法布里-珀罗结构的物理厚度不同的物理厚度。
2.如权利要求1所述的不对称颜料,还包括在所述第一法布里-珀罗结构和所述第二法布里-珀罗结构之间的含磁性层。
3.如权利要求1所述的不对称颜料,其中所述第一介电层和所述第二介电层中的至少一个包括高折射率材料。
4.如权利要求3所述的不对称颜料,其中所述高折射率材料选自硫化锌、氧化锌、氧化锆、二氧化钛、碳、氧化铟、氧化铟锡、五氧化二钽、氧化铈、氧化钇、氧化铕、铁氧化物、氧化铁、氮化铪、碳化铪、氧化铪、氧化镧、氧化镁、氧化钕、氧化镨、氧化钐、三氧化二锑、碳化硅、氮化硅、一氧化硅、三氧化二硒、氧化锡、三氧化钨及其组合。
5.如权利要求1所述的不对称颜料,其中所述第一介电层和所述第二介电层中的至少一个包括低折射率材料。
6.如权利要求5所述的不对称颜料,其中所述低折射率材料选自二氧化硅、氧化铝、氟化镁、氟化铝、氟化铈、氟化镧、氟化铝钠、氟化钕、氟化钐、氟化钡、氟化钙、氟化锂及其组合。
7.如权利要求1所述的不对称颜料,其中所述第一介电层和所述第二介电层中的至少一个包括氟化镁。
8.如权利要求1所述的不对称颜料,其中所述第一介电层和所述第二介电层中的至少一个是介电堆叠。
9.如权利要求1所述的不对称颜料,其中所述第一介电层和所述第二介电层中的至少一个是透明层。
10.如权利要求1所述的不对称颜料,其中所述第一介电层和所述第二介电层中的至少一个是有色层。
11.如权利要求1所述的不对称颜料,其中所述不对称颜料具有20微米的D50。
12.一种不对称颜料,包括:
第一法布里-珀罗结构,其包括第一介电层;和
第二法布里-珀罗结构,其包括第二介电层;
其中所述第一法布里-珀罗结构具有与所述第二法布里-珀罗结构的光学厚度不同的光学厚度。
13.如权利要求12所述的不对称颜料,其中所述第一法布里-珀罗结构包括范围从200nm至400nm的2倍四分之一波长光学厚度。
14.如权利要求12所述的不对称颜料,其中所述第一法布里-珀罗结构和所述第二法布里-珀罗结构能够各自独立地包括范围从400nm至600nm的4倍四分之一波长光学厚度。
15.如权利要求12所述的不对称颜料,其中所述第二法布里-珀罗结构包括范围从600nm至800nm的6倍四分之一波长光学厚度。
16.一种用于制造不对称颜料的方法,包括:
在基底上沉积第一法布里-珀罗结构;以及
在所述第一法布里-珀罗结构上沉积第二法布里-珀罗结构;其中所述第一法布里-珀罗结构具有与所述第二法布里-珀罗结构的物理厚度不同的物理厚度。
17.如权利要求16所述的方法,还包括从沉积的法布里-珀罗结构释放所述基底以形成不对称颜料。
18.一种变色着色剂,包含:
权利要求1-11中任一项所述的不对称颜料;和液体介质。
19.如权利要求18所述的变色着色剂,其中所述不对称颜料被均匀地分布在所述液体介质中。
20.一种变色着色剂,包含:
权利要求12-15中任一项所述的不对称颜料;以及液体介质。
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US15/820,181 US10899930B2 (en) | 2017-11-21 | 2017-11-21 | Asymmetric pigment |
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CN201880085211.6A CN111556885B (zh) | 2017-11-21 | 2018-11-16 | 不对称颜料 |
PCT/US2018/061595 WO2019103937A1 (en) | 2017-11-21 | 2018-11-16 | Asymmetric pigment |
CN202111372150.1A CN114163842B (zh) | 2017-11-21 | 2018-11-16 | 不对称颜料 |
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EP (1) | EP3714006A4 (zh) |
CN (2) | CN111556885B (zh) |
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US20210102072A1 (en) * | 2019-10-08 | 2021-04-08 | Viavi Solutions Inc. | Composition including dual cavity color shifting pigments |
EP4065647A4 (en) * | 2019-11-29 | 2023-12-27 | Viavi Solutions Inc. | COMPOSITION COMPRISING A CHROMATICALLY VARIABLE PIGMENT HAVING A DIFFERENT PARTICLE SIZE |
US20230201872A1 (en) | 2020-05-26 | 2023-06-29 | Sicpa Holding Sa | Magnetic assemblies and methods for producing optical effect layers comprising oriented platelet-shaped magnetic or magnetizable pigment particles |
CA3187940A1 (en) | 2020-06-23 | 2021-12-30 | Sicpa Holding Sa | Methods for producing optical effect layers comprising magnetic or magnetizable pigment particles |
AR123354A1 (es) | 2020-09-02 | 2022-11-23 | Sicpa Holding Sa | Marca de seguridad, método y dispositivo para leer la marca de seguridad, documento de seguridad marcado con la marca de seguridad y método y sistema para verificar dicho documento de seguridad |
AR123351A1 (es) | 2020-09-02 | 2022-11-23 | Sicpa Holding Sa | Documentos o artículos de seguridad que comprenden capas de efecto óptico que comprenden partículas de pigmento magnéticas o magnetizables y métodos para producir dichas capas de efecto óptico |
TW202239482A (zh) | 2021-03-31 | 2022-10-16 | 瑞士商西克帕控股有限公司 | 用於產生包含磁性或可磁化顏料粒子且展現一或更多個標記的光學效應層之方法 |
AU2022289987A1 (en) | 2021-06-11 | 2024-01-18 | Sicpa Holding Sa | Optical effect layers comprising magnetic or magnetizable pigment particles and methods for producing said optical effect layers |
WO2023161464A1 (en) | 2022-02-28 | 2023-08-31 | Sicpa Holding Sa | Methods for producing optical effect layers comprising magnetic or magnetizable pigment particles and exhibiting one or more indicia |
WO2024028408A1 (en) | 2022-08-05 | 2024-02-08 | Sicpa Holding Sa | Methods for producing optical effect layers comprising magnetic or magnetizable pigment particles and exhibiting one or more indicia |
WO2024208695A1 (en) | 2023-04-03 | 2024-10-10 | Sicpa Holding Sa | Apparatuses and processes for producing optical effects layers |
EP4338854A2 (en) | 2023-12-20 | 2024-03-20 | Sicpa Holding SA | Processes for producing optical effects layers |
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CN111556885B (zh) | 2021-12-03 |
TWI700338B (zh) | 2020-08-01 |
WO2019103937A1 (en) | 2019-05-31 |
EP3714006A4 (en) | 2021-08-04 |
TWI715418B (zh) | 2021-01-01 |
US20210147688A1 (en) | 2021-05-20 |
TW201925363A (zh) | 2019-07-01 |
US20190153233A1 (en) | 2019-05-23 |
US10899930B2 (en) | 2021-01-26 |
CN111556885A (zh) | 2020-08-18 |
EP3714006A1 (en) | 2020-09-30 |
TW202020064A (zh) | 2020-06-01 |
CN114163842B (zh) | 2024-07-16 |
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