CN114137645A - Diffractive optical element, preparation method thereof and design method of master diffraction pattern - Google Patents
Diffractive optical element, preparation method thereof and design method of master diffraction pattern Download PDFInfo
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Abstract
The application provides a diffraction optical element and a preparation method thereof, and a design method of a master diffraction pattern, which relate to the technical field of diffraction optics and comprise the steps of providing a transparent substrate; forming a first grating structure layer on one side surface of the transparent substrate through a first master plate; and forming a second grating structure layer on the transparent substrate with the first grating structure layer through a second master plate, wherein a first preset diffraction pattern on the first master plate is different from a second preset diffraction pattern on the second master plate, and at least one of the first grating structure layer and the second grating structure layer is a one-dimensional grating structure layer. The first grating structure layer and the second grating structure layer are combined to form a preset array lattice. After the double-layer grating structure layer is adopted, the decomposed lattice has the characteristics of less lattice, regular shape and the like, the design and processing difficulty of the diffraction optical element is greatly reduced, high-performance beam splitting is obtained, and the good beam splitting uniformity of the two-dimensional lattice is kept.
Description
Technical Field
The application relates to the technical field of diffraction optics, in particular to a diffraction optical element, a preparation method thereof and a design method of a master diffraction pattern.
Background
The Diffractive Optical Element (DOE) is an optical beam splitting device, and optical index parameters related to the DOE product include overall beam efficiency, light intensity of a zero-order diffraction order and uniformity degree of optical intensity of each diffraction order. The degree of uniformity is an important design index, i.e. the degree of uniformity of optical intensity of each diffraction order, and is defined as the ratio of the highest and lowest difference values to the sum value of light intensity in each diffraction order, and the lower the index value, the better the performance is represented.
The diffractive optical element irradiates a light source on the receiving screen after beam splitting, and when the field angle of the beam splitting is too large and the effective diffraction order on the receiving screen is too large, the beam splitting is produced and processed according to the conventional design (namely, the DOE with a single-layer structure), and the index almost hardly reaches the usable standard.
Disclosure of Invention
An object of the embodiments of the present application is to provide a diffractive optical element, a method for manufacturing the same, and a method for designing a diffraction pattern of a master mask, in which a first grating structure layer and a second grating structure layer are formed on a transparent substrate to split a light beam, so that uniformity of optical intensity of diffraction orders can be improved.
In one aspect of the embodiments of the present application, a method for manufacturing a diffractive optical element is provided, including providing a transparent substrate; forming a first grating structure layer on one side surface of the transparent substrate through a first master plate; and forming a second grating structure layer on the transparent substrate with the first grating structure layer through a second master plate, wherein a first preset diffraction pattern on the first master plate is different from a second preset diffraction pattern on the second master plate, and at least one of the first grating structure layer and the second grating structure layer is a one-dimensional grating structure layer.
In another aspect of the embodiments of the present application, a method for designing a diffraction pattern of a master is provided, including: will input light intensity I0And an input phase phi0Substitution formula
Fourier transform is carried out to obtain output light intensity ItAnd an output phase phit(ii) a Wherein the input light intensity is1, the input phase takes a value randomly between 0 and pi, i is a coefficient
Calculating the output light intensity ItWith the target light intensity ImDifference value of (I)c(ii) a Will be a formula
Fourier transform and binarization are carried out to obtain target input light intensity I0mAnd target input phase phi0m(ii) a When the output light intensity ItWith the target light intensity ImDifference value of (I)cLess than the preset light intensity value according to the formula
Calculating the binary phase phi of each coordinate pointt0And obtaining a preset diffraction pattern.
Optionally, the formula
Fourier transform and binarization are carried out to obtain target input light intensity I0mAnd target input phase phi0mThereafter, the method further comprises: when the output light intensity ItWith the target light intensity ImDifference value of (I)cGreater than or equal to the preset light intensity value, the formula
Fourier transform to obtain modified input light intensity IrAnd correcting the input phase phir(ii) a For the corrected input phase phirBinaryzation is carried out to obtain the circulating input light intensity InAnd a cyclic input phase phin(ii) a Will circulate the input light intensity InAnd a cyclic input phase phinSubstitution formula
Fourier transform to obtain output light intensity ItAnd outputs a binary phase phit(ii) a Wherein i is a coefficient
Calculating the output light intensity ItWith the target light intensity ImDifference value of (I)c(ii) a When the output light intensity ItWith the target light intensity ImDifference value of (I)cLess than the preset value of light intensity, the formula
Fourier transform to obtain target input light intensity I0mAnd target input phase phi0m(ii) a According to the formula
Calculating the binary phase phi of each coordinate pointt0And obtaining a preset diffraction pattern.
Optionally, the formula
Calculating the binary phase phi of each coordinate pointt0After obtaining the predetermined diffraction pattern, the method further includes: comparing the light intensity distribution of each coordinate point position of the preset diffraction pattern with the light intensity distribution of each coordinate point position corresponding to the target diffraction pattern; when the light intensity distribution of the coordinate point position of the preset diffraction pattern exceeds the light intensity distribution threshold of the corresponding coordinate point position of the target diffraction pattern, correcting the target light intensity ImAnd obtaining the light intensity distribution scheme of each coordinate point.
Optionally, when the light intensity distribution of the coordinate point position of the preset diffraction pattern exceeds the light intensity distribution threshold of the corresponding coordinate point position of the target diffraction pattern, the target light intensity I is correctedmAnd obtaining the light intensity distribution scheme of each coordinate point position comprises the following steps: adjusting the target light intensity Im＝I0X 1/cos (theta), theta is the included angle between the direction of each point in the target lattice and the propagation direction of the light beam.
In another aspect of embodiments of the present application, there is provided a diffractive optical element including: the grating structure comprises a transparent substrate, wherein a first grating structure layer and a second grating structure layer are sequentially formed on the transparent substrate, at least one of the first grating structure layer and the second grating structure layer is a one-dimensional grating structure layer, and a light beam incident into the transparent substrate passes through the first grating structure layer and the second grating structure layer to emit a preset array diffraction light spot.
Optionally, the surface pattern of the one-dimensional grating structure layer is a stripe periodic grating pattern.
Optionally, a filling layer is formed between the first grating structure layer and the second grating structure layer.
Optionally, an optical film is plated between the transparent substrate and the first grating structure layer, and/or an optical film is plated on one side of the transparent substrate, which is far away from the first grating structure layer.
Optionally, refractive index differences are provided between the first grating structure layer and the filling layer, and between the second grating structure layer and the filling layer, respectively, and the refractive index difference is greater than or equal to 0.2.
According to the diffraction optical element and the preparation method thereof and the design method of the diffraction pattern of the master mask, a first grating structure layer and a second grating structure layer are sequentially formed on a transparent substrate, at least one of the first grating structure layer and the second grating structure layer is a one-dimensional grating structure layer, the other layer is a one-dimensional grating structure layer or a two-dimensional grating structure layer, a stripe grating pattern is formed on the one-dimensional grating structure layer, a complex pattern is formed on the two-dimensional grating structure layer, and the patterns can be obtained through an algorithm; the first grating structure layer generates a corresponding dot matrix pattern, the second grating structure layer generates a corresponding dot matrix pattern, when the first grating structure layer and the second grating structure layer are combined on the transparent substrate, the dot matrixes generated by the first grating structure layer and the second grating structure layer are combined to form a preset array dot matrix, and a preset array diffraction light spot can be received on the receiving screen. Equivalently, the formed preset array lattice is disassembled into two simple lattices, and the two simple lattices can be obtained through the first grating structure layer and the second grating structure layer respectively. After the double-layer grating structure layer is adopted, the decomposed lattice has the characteristics of less lattice, regular shape and the like, so that the difficulty in designing and processing the diffraction optical element is greatly reduced, and high-performance beam splitting can be obtained through the diffraction optical element, so that the two-dimensional lattice also has better beam splitting uniformity.
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In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are required to be used in the embodiments of the present application will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered as limiting the scope, and that those skilled in the art can also obtain other related drawings based on the drawings without inventive efforts.
Fig. 1 is a schematic structural diagram of a diffractive optical element provided in this embodiment;
fig. 2 is one of optical path diagrams of the diffractive optical element provided in the present embodiment;
FIG. 3 is a diagram illustrating a predetermined dot matrix disassembly process;
FIG. 4 is a schematic diagram of a diffraction micro-nano structure pattern corresponding to FIG. 3;
fig. 5 is a flowchart of a method for manufacturing the diffractive optical element provided in this embodiment;
FIG. 6 is a flow chart of a method for designing a diffraction pattern of a master provided by the present embodiment;
FIG. 7 is a second optical path diagram of the diffractive optical element provided in this embodiment;
fig. 8 is a diffraction pattern of an example 3 x 5DOE and its corresponding dot pattern;
FIG. 9 is a three-dimensional view of the diffraction pattern of FIG. 8;
fig. 10 is one of schematic diagrams of a first grating structure layer and a second grating structure layer of the diffractive optical element structure provided in the present embodiment;
FIG. 11 is a corresponding dot matrix diagram of FIG. 10;
fig. 12 is a second schematic diagram of the first grating structure layer and the second grating structure layer of the diffractive optical element structure provided in this embodiment;
FIG. 13 is a corresponding dot matrix diagram of FIG. 12;
fig. 14 is a third schematic diagram of the first grating structure layer and the second grating structure layer of the diffractive optical element structure provided in this embodiment;
fig. 15 is a corresponding dot matrix diagram of fig. 14.
Icon: 100-diffractive optical elements; 101-a transparent substrate; 110-a first grating structure layer; 120-a second grating structure layer; 130-a filling layer; 200-receive screen.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application.
In the description of the present application, it should be noted that the terms "inside", "outside", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or orientations or positional relationships that the products of the application usually place when using, and are only used for convenience in describing the present application and simplifying the description, but do not indicate or imply that the devices or elements that are referred to must have a specific orientation, be constructed in a specific orientation, and operate, and thus, should not be construed as limiting the present application. Furthermore, the terms "first," "second," and the like are used merely to distinguish one description from another, and are not to be construed as indicating or implying relative importance.
It should also be noted that, unless expressly stated or limited otherwise, the terms "disposed" and "connected" are to be construed broadly, e.g., as meaning fixedly connected, detachably connected, or integrally connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood in a specific case by those of ordinary skill in the art.
The optical index parameters related to the DOE product include the overall beam efficiency, the light intensity of the zero-order diffraction order, and the uniformity degree of the optical intensity of each diffraction order. Wherein the degree of uniformity, which is defined as the ratio of the highest and lowest difference to the sum of the intensities in each diffraction order, represents the better performance the lower the index value.
The source of the uniformity requirement is still at the product end, and when the device is applied to three-dimensional detection, in order to improve the point cloud processing efficiency of depth information, each light spot projected on a receiving screen is required to keep the light intensity consistent as much as possible. The low uniformity affects the efficiency and accuracy of the receiving end in the point cloud analysis process, and even the target light spot cannot be effectively identified if the light intensity is too low.
The excessive beam splitting diffraction light (the number of diffraction orders is more than 60%) is realized under a large angle (the horizontal and vertical field angles are more than 60 degrees on average), the existing DOE adopting a single-layer structure is difficult to realize, and the requirements on the precision degree of a micro-nano structure by the design and manufacture of a DOE device adopting the single-layer structure are too high, so that the better uniformity (less than 20%) is difficult to realize. According to the experience of the industry, the uniformity of the DOE obtained under the photoetching machining scheme in the mass production mode is generally not ideal.
In order to solve the above problem, the embodiment of the present application provides a diffractive optical element 100, which emits a predetermined array diffraction spot, can improve the uniformity of the diffraction spot received on the receiving screen 200, and can reduce the preparation difficulty, and is also suitable for correction design, so that the spot actually projected on the optical screen can reach a better uniformity degree.
Specifically, referring to fig. 1, an embodiment of the present application provides a diffractive optical element 100, including: the optical grating structure comprises a transparent substrate 101, wherein a first grating structure layer 110 and a second grating structure layer 120 are sequentially formed on the transparent substrate 101, at least one of the first grating structure layer 110 and the second grating structure layer 120 is a one-dimensional grating structure layer, and a light beam incident into the transparent substrate 101 passes through the first grating structure layer 110 and the second grating structure layer 120 and then emits a preset array diffraction spot.
The material of the transparent substrate 101 may be glass, sapphire glass, resin, or plastic, and the first grating structure layer 110 and the second grating structure layer 120 are sequentially formed on the transparent substrate 101, in other words, two grating structure layers are formed on the transparent substrate 101, so that a light beam incident on the transparent substrate 101 can emit a preset array diffraction spot after passing through the first grating structure layer 110 and the second grating structure layer 120, so that the uniformity of the light spot received on the receiving screen 200 is good.
At least one of the first grating structure layer 110 and the second grating structure layer 120 is a one-dimensional grating structure layer, and the other layer may be a one-dimensional grating structure layer or a two-dimensional grating structure layer. The surface pattern of the one-dimensional grating structure layer is a strip-shaped periodic grating pattern, the two-dimensional grating structure layer is a complex pattern, and the complex pattern can be calculated by a design method of a master diffraction pattern, and the specific calculation process is described below.
The thickness of the material of the first grating structure layer 110 and the second grating structure layer 120 is 10 micrometers, wherein the effective part is a three-dimensional micro-nano structure on the top of the first grating structure layer, and the three-dimensional micro-nano structure is exactly used as an interface structure with refractive index difference between an upper layer and a lower layer, and the thickness is micrometer. A filling layer 130 is formed between the first grating structure layer 110 and the second grating structure layer 120, the second grating structure layer 120 forms a structural interface with air above in fig. 1, and the first grating structure layer 110 forms a structural interface with the filling layer 130. The three-dimensional wiener structure of the grating structure layer can adopt a two-to-eight-order multilayer step structure or a gray scale structure, and the specific pattern is obtained by optimization design under a series of specifications of wavelength of an incident light source, a target dot matrix, a field angle and the like.
The materials of the grating structure layer and the filling layer 130 have a certain refractive index difference, the refractive index difference is formed between the first grating structure layer 110 and the filling layer 130, the refractive index difference is formed between the second grating structure layer 120 and the filling layer 130, the refractive index difference is greater than or equal to 0.2, the materials forming the grating structure layer have a relatively high refractive index, and the materials forming the filling layer 130 have a relatively low refractive index; it is also possible that the material constituting the grating structure layer has a relatively low refractive index and the material constituting the filling layer 130 has a relatively high refractive index.
In addition, an optical film is plated between the transparent substrate 101 and the first grating structure layer 110, and/or an optical film is disposed on a side of the transparent substrate 101 away from the first grating structure layer 110.
The surface of the transparent substrate 101 facing away from the grating structure layer may be provided with an optical element or an optical film to expand the optical performance of the diffractive optical element 100, such as an anti-reflection film, an abrasion resistant layer, an ITO layer for protection, etc.; in addition, one side of the grating structure layer of the transparent substrate 101 may also be coated with a film to expand the optical performance of the diffractive optical element 100, or both sides of the transparent substrate 101 may be coated with optical films simultaneously to show the effect in multiples.
The module light source is incident to the diffractive optical element 100 provided by the embodiment of the application after being collimated, wherein two grating structure layers of the diffractive optical element 100 split incident light, finally, diffraction light of a preset array is formed, and a preset array diffraction light spot is formed on the receiving screen 200. For example, the light source is shown as a uniformly distributed light spot in fig. 2, wherein the module light source may be a VCSEL light source, an EEL light source, a fiber laser light source, or the like. The following description will be made of an example in which the light source is a point light source for the purpose of intuitively describing the beam splitting characteristic.
The diffraction optical element 100 that this application embodiment provided can optimize the high difficult rule dot matrix, and diffraction optical element 100 is through the periodic pattern that double-deck grating structure layer formed in order to produce the optical lattice, and the appropriate DOEs multiple dot matrix demand that becomes double-deck grating structure layer with a high difficult DOE disassembles the dot matrix scheme that becomes and handles, can reduce the degree of difficulty of technology, improves the finished product's yield. In the disassembling process, one of the grating structure layers is a one-dimensional grating structure layer, specifically, the surface pattern of the one-dimensional grating structure layer is a strip-shaped periodic grating pattern, the generated diffraction orders are arranged in a one-dimensional straight line, and are combined with the other grating structure layer to form a final preset array diffraction spot, namely an array lattice spot. As shown in fig. 3, the arrayed lattice spots on the left side of the equal sign can be disassembled into two lattice schemes on the right side of the equal sign, the two lattice schemes disassembled in fig. 3 respectively correspond to the preset patterns formed by the two grating structure layers in fig. 4, the two grating structure layers, i.e., the first grating structure layer 110 and the second grating structure layer 120, respectively generate the two lattice schemes, and the light beam sequentially passes through the first grating structure layer 110 and the second grating structure layer 120 through the transparent substrate 101 to form the leftmost arrayed lattice spots in fig. 3.
The present application shows the disassembly of three lattice schemes, and in a first realizable manner, the lattices generated by the two grating structure layers of the diffractive optical element 100 can both be connected in a straight line arrangement, and the straight lines are perpendicular to each other. One of the grating structure layers generates a lattice number of Nx1 by Ny1, and the other grating structure layer generates a lattice number of Nx2 by Ny 2. One of the grating structure layers is mainly a strip-shaped periodic grating (which can be calculated by a design method of a master diffraction pattern), a one-dimensional symmetric lattice with Nx1 or Ny1 as 1 is formed after light is incident, and the zero order is in a symmetric center. The other grating structure layer can be a complex two-dimensional grating structure layer (a complex appearance can be calculated by a design method of a master diffraction pattern), an asymmetric one-dimensional lattice is generated, the straight line direction is vertical to the former, and the zero order of the lattice is not in the symmetric center.
In a second implementation manner, the one-dimensional lattices generated by the two grating structure layers can be connected into a straight line, and the straight lines of the lattices generated by the two grating structure layers mutually form any angle and are not vertical. Let one of the lattice numbers be Nx1 Ny1, and the other lattice number be Nx2 Ny 2. One of the grating structure layers is a strip grating structure layer, the lattices generated after light beam irradiation are all one-dimensional symmetrical lattices, Nx1 or Ny1 is 1, and the zero order is required to be at the symmetrical center. The other grating structure layer can be a strip grating to generate a one-dimensional symmetrical lattice, or can be a complex morphology obtained by a design method of a master diffraction pattern, an asymmetrical one-dimensional lattice zero-order is formed and is not in a symmetrical center, Nx1 or Ny1 is 1, and a straight line formed by connecting the one-dimensional lattice forms a certain included angle with the former.
In a third implementation manner, one of the grating structure layers generates a one-dimensional symmetric lattice for the stripe grating, and the other grating structure layer generates a two-dimensional symmetric lattice calculated by a master diffraction pattern design method. One of the grating structure layers (one-dimensional strip grating) generates lattice number Nx1 by Ny1, wherein, one of Nx1 and Ny1 is required to be 1, and both are odd numbers; the other grating structure layer (the complex image calculated by the design method of the master diffraction pattern) generates a two-dimensional lattice structure with the lattice number of Nx2 Ny2, if one direction can be an odd number, the lattice is symmetrical in the direction, and the zero level is at the symmetrical center, and if the other direction is an even number, the lattice asymmetrical zero level is not at the symmetrical center.
For example, in the three realizable manners, the number of the lattice generated by one grating structure layer is Nx1 × Ny1, and Nx1 or Ny1 is 1. Taking fig. 11 as an example, one dot matrix disassembled in fig. 11 is a row and two columns, and the other dot matrix is a row and a column, and the two dot matrixes in fig. 11 both conform to the number of the row and the column, and one of the two dot matrixes is necessarily 1; one dot matrix disassembled in fig. 13 is a row and three columns, and the other dot matrix is a row and five columns, and one of the numbers of the two dot matrices in fig. 13 conforming to the row and the column is necessarily 1; in fig. 15, one dot matrix is a row and a column, and one dot matrix is a row and a column, so that the number of the first dot matrix in fig. 15 corresponding to the row and the column is 1, and therefore, in two dot matrices, only one dot matrix is required to be arranged corresponding to the row and the column is 1.
In the three realizable modes, different optical lattice arrangements can be realized by different DOE periodic morphology features. Some DOEs are symmetrical one-dimensional optical lattices generated by the periodic grating appearance, and some DOEs are odd-shaped and can generate asymmetrical optical lattice arrangement. The symmetry refers to whether the position of an optical zero-order diffraction order of the DOE periodic morphology is just symmetrically divided by a one-dimensional lattice, the symmetric division represents symmetry, and the asymmetric division represents asymmetry.
In which the period of the pattern profile of the DOE is approximately several wavelengths, the characteristic dimensions of which reach even hundreds of nanometers. In the process of designing the DOE, the present embodiment employs a GS (Gerchberg-Saxton algorithm) phase recovery algorithm to complete the optimization design process. Besides, various heuristic optimization algorithms such as Particle Swarm Optimization (PSO), Genetic Algorithm (GA) and the like can be used for designing DOE by combining electromagnetic wave calculation theory (angle spectrum theorem and the like).
As can be seen from the above, for the high-difficulty DOE multi-lattice pattern as the target pattern, the DOE multi-lattice pattern is firstly decomposed into two lattice schemes, and the two lattice schemes each have a corresponding grating structure layer pattern.
It should be emphasized that the lattice solution disassembly in the present application is not limited to the three realizable manners, and besides the above disassembly manners, it is also possible to disassemble one high-difficulty DOE multi-lattice into other two suitable lattice solutions according to specific needs, the two lattice solutions after disassembly have corresponding surface patterns of the grating structure layers, and the final light beam passes through the two grating structure layers to form diffracted light of the preset array, so as to obtain the high-difficulty DOE multi-lattice pattern. Therefore, no matter how to disassemble, as long as the difficulty of the process can be reduced and the yield of the final finished product is improved, after the double-layer grating structure layers corresponding to the two lattice schemes after disassembly, the preset DOE multi-lattice pattern with high difficulty can be obtained, and the method and the device are not specifically limited to the specific disassembly scheme. Moreover, because the preset high-difficulty DOE multi-lattice pattern is the only target, even if the preset high-difficulty DOE multi-lattice pattern is disassembled into different lattice schemes, the preset high-difficulty DOE multi-lattice pattern finally obtained is the only one through the double-layer grating structure layers corresponding to different lattices.
On the other hand, referring to fig. 5, an embodiment of the present application provides a method for manufacturing a diffractive optical element 100, including:
s100: a transparent substrate 101 is provided.
S110: a first grating structure layer 110 is formed on one side surface of the transparent substrate 101 by a first master.
The first grating structure layer 110 is first imprinted by a first master on the transparent substrate 101, and then the first grating structure layer 110 is covered with the filling layer 130 for spin-coating and filling.
S120: a second grating structure layer 120 is formed on the transparent substrate 101 on which the first grating structure layer 110 is formed by a second master.
Wherein, the first preset diffraction pattern on the first mother plate is different from the second preset diffraction pattern on the second mother plate, and at least one of the first grating structure layer 110 and the second grating structure layer 120 is a one-dimensional grating structure layer.
The second grating structure layer 120 is imprinted on the filling layer 130 by curing the glue with an ultraviolet lamp.
It should be noted that, when the first grating structure layer 110 is formed by a first master and the second grating structure layer 120 is formed by a second master, the first preset diffraction pattern on the first master corresponds to the pattern of the first grating structure layer 110, but is not necessarily the same, depending on whether a positive-shaped photoresist or a negative-shaped photoresist is used, and the second master is the same.
The master mask can be prepared by adopting DUV equipment for photoetching and re-etching or directly adopting a laser direct writing method. After the preparation of the master mask is finished, the master mask is pressed on the material of the transparent substrate 101 by adopting a nano-imprinting method, and the diffraction optical element 100 is prepared on the transparent substrate 101 by nano-imprinting twice, namely, the first grating structure layer 110 is imprinted on the transparent substrate 101 through the first master mask, then the filling layer 130 is coated, and then the second grating structure layer 120 is imprinted through the second master mask. The alignment precision can be improved by adding a mark in the imprinting process, the alignment error of the structure depends on the alignment included angle precision between wafers, and the requirement of the position error is far smaller than that of the alignment error between components in the traditional method, so that the overall optical performance of the diffractive optical element 100 can be improved.
It can be seen that how to form the first grating structure layer 110 and the second grating structure layer 120 on the transparent substrate 101 mainly depends on how to design the master, and the predetermined diffraction pattern on the master determines the pattern of the grating structure layer to generate the predetermined lattice of light spots.
Therefore, referring to fig. 6, an embodiment of the present application further provides a method for designing a master diffraction pattern, including:
s200: will input light intensity I0And an input phase phi0Substitution formula
Fourier transform is carried out to obtain output light intensity ItAnd an output phase phit(ii) a Wherein, the input light intensity is 1, and the input phase is 0 toPi is randomly selected, i is coefficient
In the embodiment of the present application, the diffractive optical element 100 is designed as a second-order structure, the height of the step is determined by the wavelength of the light source and the refractive index of the material, and the second-order overlooking structure is realized by the GS algorithm. The algorithm is applicable to both one-dimensional grating structure layers and two-dimensional grating structure layers. Because the refractive index is different due to the change of steps at each position, the phase of the light source after passing through the DOE is changed, the phase change at the position meets the approximation of a thin element and is equal to the phase of pi generated by the change of the structure, wherein lambda is the wavelength of the light source, n1 and n2 are the refractive indexes of upper and lower media of the DOE respectively, and therefore the height h meets the following equation:
the period Px, Py width and length of the DOE will be determined first from the FOV and wavelength of the lattice on the screen, satisfying the following equation:
where FOV _ H, V represents the transverse and longitudinal field of view of the lattice, nH,VRepresenting the number of points in the horizontal and vertical directions. After the DOE periods Px and Py are determined, the DOE structure is optimized by adopting a GS algorithm, and a logic diagram and an optical path diagram of algorithm optimization are shown in FIGS. 7-9.
Wherein the light source is initially set to be a uniform light source I01, the input phase phi t is random phase distribution between 0 and pi, and the lattice light intensity distribution I of the targetmAre all 1, the rest are 0.
S210: calculating the output light intensity ItWith the target light intensity ImDifference value of (I)c。
The first mother plate and the second mother plate correspond to the two disassembled dot matrix patterns respectively, and when the first mother plate is designed, the target light intensity I is obtainedmIs equal to the firstThe light intensity of the lattice pattern corresponding to the mother plate is the target light intensity I when designing the second mother platemIs the light intensity of the dot matrix pattern corresponding to the second mother plate.
S220: will be a formula
Fourier transform and binarization are carried out to obtain target input light intensity I0mAnd target input phase phi0m。
The propagation of the beam can be simplified to Fourier transform on a mathematical model, so fft and ifft are used in the optimization to simulate the propagation process.
S230: when the output light intensity ItWith the target light intensity ImDifference value of (I)cLess than the preset light intensity value according to the formula
Calculating the binary phase phi of each coordinate pointt0And obtaining a preset diffraction pattern.
S240: when the output light intensity ItWith the target light intensity ImDifference value of (I)cGreater than or equal to the preset light intensity value, the formula
Fourier transform to obtain modified input light intensity IrAnd correcting the input phase phi r.
S241: for the corrected input phase phirBinaryzation is carried out to obtain the circulating input light intensity InAnd a cyclic input phase phin。
Returning to S200, the light intensity I is circularly inputnAnd a cyclic input phase phinSubstitution formula
Fourier transform to obtain output light intensity ItAnd outputs a binary phase phit(ii) a Wherein i is a coefficient
Calculating the output light intensity ItWith the target light intensity ImDifference value of (I)cUntil when the output light intensity ItWith the target light intensity ImDifference value of (I)cLess than the preset value of light intensity, the formula
Fourier transform to obtain target input light intensity I0mAnd target input phase phi0m。
According to the formula
Calculating the binary phase phi of each coordinate pointt0And obtaining a preset diffraction pattern.
Iteration is performed by continuously modifying the light intensity and the phase distribution, so that the preset light intensity target is finally met. Thus obtaining a second-order distribution structure phi of the DOEDOEAnd the corresponding light intensity values I of the points of the lattice0mAnd obtaining a preset diffraction pattern corresponding to the lattice by the phase of each coordinate point, preparing the preset diffraction pattern on the master plate by adopting DUV equipment photoetching and then etching or laser direct writing, and forming a corresponding grating structure layer on the transparent substrate 101 through the master plate to obtain the diffractive optical element 100. The first master forms a first grating structure layer 110 and the second master forms a second grating structure layer 120.
In addition, when the light source is projected on the receiving screen 200 through the DOE, the propagation inclination angles of some diffraction orders are too large, so that pincushion distortion is generated at the position of the whole lattice arrangement, in addition, the light intensity is also changed, and the edge is weakened relative to the center. Therefore, when designing the lattice scheme, it is also necessary to perform light intensity compensation and correction on the pincushion distortion in advance (adjusting the width of the grid bars by an optimization algorithm, or performing variable adjustment on the edge of the complex image), so that the light intensity of each diffraction order on the receiving screen 200 is uniformly distributed as shown in the following table, which shows the lattice design of 3 × 5, and the light intensity distribution of the lattice after the distortion of the lattice on the receiving screen 200, as can be seen from the following table, for the lattice, when the designed light intensity is 1, the light intensity received by the receiving screen 200 may be reduced due to the distortion, and therefore, correction is required.
The specific correction process is as follows: the light intensity distribution of each coordinate point position of preset diffraction pattern and the light intensity distribution of each coordinate point position that the target diffraction pattern corresponds are compared, when the light intensity distribution of the coordinate point position of preset diffraction pattern surpassed the light intensity distribution threshold value scope that the target diffraction pattern corresponds the coordinate point position, judge that the pattern is influenced by the distortion, and the facula intensity is too strong or the light intensity of marcing is too weak and is corrected. Corrected target light intensity ImObtaining the light intensity distribution scheme of each coordinate point, and adjusting the target light intensity Im＝I0X 1/cos (theta), theta is the included angle between the direction of each spot point in the target lattice and the propagation direction of the light beam. The adjusted target light intensity ImAnd substituting the diffraction pattern into the corresponding formula and the corresponding step again, and recalculating to obtain the final preset diffraction pattern of the master plate.
Three embodiments are also provided for rectifying the present application, and in the first embodiment, as shown in fig. 10 and 11, a dual structure of the DOE is composed of a one-dimensional lateral grating of the second grating structure layer 120 corresponding to the symmetric lattice and another part of the first grating structure layer 110. The first grating structure layer 110 corresponds to other structures of the asymmetric lattice, and may also be a vertical one-dimensional grating of the symmetric lattice. In fig. 10, black represents the dielectric portions where the pits are etched away, and white represents the dielectric portions that remain unetched.
Then the first embodiment also requires that the spot array be pre-distorted first as shown in the following figure, and the first embodiment can be applied to the distortion design to make the spot intensity uniform. The following table is a light intensity correspondence table, for example, after correction, the light intensity of a certain preset coordinate point is 1.07, the light intensity of a corresponding point spot finally formed on the receiving screen 200 is 1, and other coordinate points are the same.
In the second embodiment, as shown in fig. 12 and 13, the one-dimensional dislocation lattice may be a periodic dislocation lattice or an aperiodic dislocation lattice. The periodicity of the dislocations is defined here as meaning that the lateral or longitudinal direction is composed of repeating dislocation elements. In the second embodiment, the first grating structure layer 110 is a slanted grating, and the second grating structure layer 120 is a one-dimensional grating, so that the final lattice arrangement forms a staggered arrangement, and the white representing structure in the pattern is protruded and the black representing structure is recessed. In the processing, attention needs to be paid to the alignment angles of the two DOEs, the accuracy is required to be high (less than 0.1 degree), and a fixed included angle is formed.
In a third embodiment, as shown in fig. 14 and 15, the first grating structure layer 110 is an oblique binary grating, the second grating structure layer 120 is a two-dimensional binary image, and the two-dimensional dislocation lattice function is realized by twice beam splitting. White in the pattern represents a protruding structure and black represents a recessed structure. Also here, the number of pattern steps may be two to eight steps, which is determined by the efficiency of design specifications and the ease of processing. In the processing, attention needs to be paid to the alignment angles of the two structures, the accuracy is required to be high (less than 0.1 degrees), and a fixed included angle is formed. The design of the oblique grating is consistent with the idea of the B-type dot matrix, and the design of the two-dimensional grating is the same as the design idea of the asymmetric dot matrix.
In the structural design of fig. 14, since the second grating structure layer 120 has lattice arrangement in both the vertical and horizontal directions, the matching of the FOVs of the two model lattices needs to be considered in the design of the oblique grating, so that the lattices are regularly distributed at equal intervals under a single light source.
To sum up, in the diffractive optical element 100 and the manufacturing method thereof provided in the embodiment of the present application, the first grating structure layer 110 and the second grating structure layer 120 are sequentially formed on the transparent substrate 101, at least one of the first grating structure layer 110 and the second grating structure layer 120 is a one-dimensional grating structure layer, the other layer is a one-dimensional grating structure layer or a two-dimensional grating structure layer, a stripe grating pattern is formed on the one-dimensional grating structure layer, a complex pattern is formed on the two-dimensional grating structure layer, and the patterns can be obtained by an algorithm; the first grating structure layer 110 generates a corresponding lattice pattern, the second grating structure layer 120 generates a corresponding lattice pattern, when the first grating structure layer 110 and the second grating structure layer 120 are combined on the transparent substrate 101, the respective lattices generated by the first grating structure layer 110 and the second grating structure layer 120 are combined to form a preset array lattice, and a preset array diffraction spot can be received on the receiving screen 200. Equivalently, the formed preset array lattice is disassembled into two simple lattices, which can be obtained through the first grating structure layer 110 and the second grating structure layer 120, respectively. After the double-layer grating structure layer is adopted, the decomposed lattice has the characteristics of less lattice, regular shape and the like, so that the difficulty in designing and processing the diffractive optical element 100 is greatly reduced, and high-performance beam splitting can be obtained through the diffractive optical element 100, so that the two-dimensional lattice also has better beam splitting uniformity. And subsequently, correction design can be carried out again, corresponding correction factors are set corresponding to different parameter requirements of the lens and the photosensitive device, and uniformity is improved to the maximum extent.
The above description is only an example of the present application and is not intended to limit the scope of the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (10)
1. A method of manufacturing a diffractive optical element, comprising:
providing a transparent substrate;
forming a first grating structure layer on one side surface of the transparent substrate through a first master plate;
and forming a second grating structure layer on the transparent substrate with the first grating structure layer through a second master plate, wherein a first preset diffraction pattern on the first master plate is different from a second preset diffraction pattern on the second master plate, and at least one of the first grating structure layer and the second grating structure layer is a one-dimensional grating structure layer.
2. A method of designing a master diffraction pattern, comprising:
will input light intensity I0And an input phase phi0Substitution formula
Fourier transform is carried out to obtain output light intensity ItAnd an output phase phit(ii) a Wherein, the input light intensity is 1, the input phase is randomly selected from 0 to pi, and i is a coefficient
Calculating the output light intensity ItWith the target light intensity ImDifference value of (I)c；
Will be a formula
Fourier transform and binarization are carried out to obtain target input light intensity I0mAnd target input phase phi0m；
When the output light intensity ItWith the target light intensity ImDifference value of (I)cLess than the preset light intensity value according to the formula
Calculating the binary phase phi of each coordinate pointt0And obtaining a preset diffraction pattern.
3. The method of designing a master diffraction pattern of claim 2, wherein the formula is
Fourier transform and binarization are carried out to obtain target input light intensity I0mAnd target input phaseφ0mThereafter, the method further comprises:
when the output light intensity ItWith the target light intensity ImDifference value of (I)cGreater than or equal to the preset light intensity value, the formula
Fourier transform to obtain modified input light intensity IrAnd correcting the input phase phir；
For the corrected input phase phirBinaryzation is carried out to obtain the circulating input light intensity InAnd a cyclic input phase phin；
Will circulate the input light intensity InAnd a cyclic input phase phinSubstitution formula
Fourier transform to obtain output light intensity ItAnd outputs a binary phase phit(ii) a Wherein i is a coefficient
Calculating the output light intensity ItWith the target light intensity ImDifference value of (I)c；
When the output light intensity ItWith the target light intensity ImDifference value of (I)cLess than the preset value of light intensity, the formula
Fourier transform to obtain target input light intensity I0mAnd target input phase phi0m；
According to the formula
Calculating the binary phase phi of each coordinate pointt0And obtaining a preset diffraction pattern.
4. The method of designing a master diffraction pattern according to claim 2 or 3, which isCharacterized in that said formula
Calculating the binary phase phi of each coordinate pointt0After obtaining the predetermined diffraction pattern, the method further includes:
comparing the light intensity distribution of each coordinate point position of the preset diffraction pattern with the light intensity distribution of each coordinate point position corresponding to the target diffraction pattern;
when the light intensity distribution of the coordinate point position of the preset diffraction pattern exceeds the light intensity distribution threshold of the corresponding coordinate point position of the target diffraction pattern, correcting the target light intensity ImAnd obtaining the light intensity distribution scheme of each coordinate point.
5. The method for designing a master diffraction pattern according to claim 4, wherein the target light intensity I is corrected when the light intensity distribution at the coordinate point position of the preset diffraction pattern exceeds the light intensity distribution threshold at the corresponding coordinate point position of the target diffraction patternmAnd obtaining the light intensity distribution scheme of each coordinate point position comprises the following steps:
adjusting the target light intensity Im＝I0X 1/cos (theta), theta is the included angle between the direction of each point in the target lattice and the propagation direction of the light beam.
6. A diffractive optical element produced by the method for producing a diffractive optical element according to claim 1, comprising: the grating structure comprises a transparent substrate, wherein a first grating structure layer and a second grating structure layer are sequentially formed on the transparent substrate, at least one of the first grating structure layer and the second grating structure layer is a one-dimensional grating structure layer, and a light beam incident into the transparent substrate passes through the first grating structure layer and the second grating structure layer to emit a preset array diffraction light spot.
7. The diffractive optical element according to claim 6, wherein the surface pattern of the one-dimensional grating structure layer is a stripe-shaped periodic grating pattern.
8. The diffractive optical element according to claim 6 or 7, characterized in that a filling layer is formed between the first grating structure layer and the second grating structure layer.
9. The diffractive optical element according to claim 8, wherein the first grating structure layer and the filler layer and the second grating structure layer and the filler layer have refractive index differences, respectively, and the refractive index difference is not less than 0.2.
10. The diffractive optical element according to claim 6, characterized in that an optical film is plated between the transparent substrate and the first grating structure layer and/or an optical film is plated on a side of the transparent substrate remote from the first grating structure layer.
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| PCT/CN2021/142666 WO2023097850A1 (en) | 2021-12-03 | 2021-12-29 | Diffractive optical element and preparation method therefor, and method for designing master diffraction pattern |
| PCT/CN2022/136316 WO2023098897A1 (en) | 2021-12-03 | 2022-12-02 | Diffractive optical element, manufacturing method therefor, and design method for micro-nano structure of master |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060181770A1 (en) * | 2005-02-15 | 2006-08-17 | K Laser Technology, Inc. | Rear projection screen with spatial varying diffusing angle |
| CN101187709A (en) * | 2007-11-30 | 2008-05-28 | 中国科学院上海光学精密机械研究所 | Iso-light intensity beam-splitting grating for eliminating zero-order diffraction spectrum point |
| CN101443712A (en) * | 2006-05-11 | 2009-05-27 | 剑桥实业有限公司 | Phase retrieval and phase hologram synthesis |
| CN110161679A (en) * | 2019-04-26 | 2019-08-23 | 清华大学 | A kind of design method expanding diffraction image |
| CN111812758A (en) * | 2020-07-21 | 2020-10-23 | 欧菲微电子技术有限公司 | Diffractive optical element, manufacturing method thereof, optical system under screen and electronic equipment |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4006362B2 (en) * | 2002-06-17 | 2007-11-14 | キヤノン株式会社 | Diffractive optical element and optical system having the same |
| JP5464327B2 (en) * | 2009-07-22 | 2014-04-09 | 大日本印刷株式会社 | Diffraction structure display |
| CN106624354B (en) * | 2017-02-21 | 2018-09-21 | 长春理工大学 | Interfere micro-nano technology device and method based on the multi-beam laser of Darman raster and speculum |
| CN106933027B (en) * | 2017-04-28 | 2020-07-07 | 河南科技大学 | Design method of annular vortex array mask plate with controllable vortex number |
| TWI649586B (en) * | 2017-07-20 | 2019-02-01 | Benq Materials Corporation | Light weight guiding film and manufacturing method thereof |
| WO2020080169A1 (en) * | 2018-10-15 | 2020-04-23 | Ａｇｃ株式会社 | Diffractive optical element and illumination optical system |
| CN113330339B (en) * | 2019-01-31 | 2023-10-20 | Ａｇｃ株式会社 | Diffraction optical element, projection device using the diffraction optical element, and measurement device |
| CN109814256A (en) * | 2019-02-25 | 2019-05-28 | 中国科学院光电技术研究所 | A kind of one chip intensity amendment type lattice structure light DOE device and design method |
| CN111781733A (en) * | 2020-06-09 | 2020-10-16 | 北京理工大学 | Multilayer complex field imaging method and device based on light wave modulation and phase recovery |
| CN111812773A (en) * | 2020-07-27 | 2020-10-23 | 宁波舜宇奥来技术有限公司 | Diffraction light waveguide and preparation method thereof |
| CN214225473U (en) * | 2021-03-01 | 2021-09-17 | 浙江舜宇光学有限公司 | Double-layer diffraction element and imprinting master plate thereof |
| CN114137645B (en) * | 2021-12-03 | 2023-10-24 | 浙江水晶光电科技股份有限公司 | Diffraction optical element, preparation method thereof and design method of master plate diffraction pattern |
-
2021
- 2021-12-03 CN CN202111465867.0A patent/CN114137645B/en active Active
- 2021-12-29 WO PCT/CN2021/142666 patent/WO2023097850A1/en unknown
-
2022
- 2022-12-02 WO PCT/CN2022/136316 patent/WO2023098897A1/en unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060181770A1 (en) * | 2005-02-15 | 2006-08-17 | K Laser Technology, Inc. | Rear projection screen with spatial varying diffusing angle |
| CN101443712A (en) * | 2006-05-11 | 2009-05-27 | 剑桥实业有限公司 | Phase retrieval and phase hologram synthesis |
| CN101187709A (en) * | 2007-11-30 | 2008-05-28 | 中国科学院上海光学精密机械研究所 | Iso-light intensity beam-splitting grating for eliminating zero-order diffraction spectrum point |
| CN110161679A (en) * | 2019-04-26 | 2019-08-23 | 清华大学 | A kind of design method expanding diffraction image |
| CN111812758A (en) * | 2020-07-21 | 2020-10-23 | 欧菲微电子技术有限公司 | Diffractive optical element, manufacturing method thereof, optical system under screen and electronic equipment |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023098897A1 (en) * | 2021-12-03 | 2023-06-08 | 浙江水晶光电科技股份有限公司 | Diffractive optical element, manufacturing method therefor, and design method for micro-nano structure of master |
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