CN214225473U - Double-layer diffraction element and imprinting master plate thereof - Google Patents
Double-layer diffraction element and imprinting master plate thereof Download PDFInfo
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- CN214225473U CN214225473U CN202120444619.7U CN202120444619U CN214225473U CN 214225473 U CN214225473 U CN 214225473U CN 202120444619 U CN202120444619 U CN 202120444619U CN 214225473 U CN214225473 U CN 214225473U
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Abstract
The utility model relates to a double-deck diffraction element and impression mother board thereof, double-deck diffraction element, include: a base layer (11), a first diffraction layer (12) provided on the base layer (11), and a second diffraction layer (13) provided so as to be fitted to the first diffraction layer (12); the total thickness n of the first diffraction layer (12) and the second diffraction layer (13) satisfies: n is less than or equal to 40 mu m; the spacing between the first diffraction layer (12) and the second diffraction layer (13) is less than or equal to 1 μm. The utility model discloses a double-deck diffraction element can be under the condition that has good diffraction effect, and the thinner its volume that makes of doing can be effectively reduced, and then applicable in the optical product of difference, and application scope is wide.
Description
Technical Field
The utility model relates to an optical element field especially relates to a double-deck diffraction element and impression master plate thereof.
Background
With the development of technology, the design of diffraction elements for use in optical systems is becoming more and more common. These diffractive elements are substantially single layer diffractive elements. However, such a single-layer diffraction element can achieve high diffraction efficiency of a certain diffraction order only at a single wavelength, and the diffraction efficiency gradually decreases as the wavelength gradually deviates from the design wavelength. If the refraction-diffraction mixed optical system containing the single-layer diffraction element is used for imaging in a visible light wave band, the imaging contrast is reduced, the authenticity of the imaging color of the optical system is influenced, and the imaging quality of the optical system is greatly influenced.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a double-deck diffraction element and impression mother matrix thereof.
To achieve the above object, the present invention provides a double-layer diffraction element, including: a base layer, a first diffraction layer provided on the base layer, and a second diffraction layer provided so as to be fitted to the first diffraction layer;
the total thickness n of the first diffraction layer and the second diffraction layer satisfies: n is less than or equal to 40 mu m;
the spacing between the first and second diffractive layers is less than or equal to 1 μm.
According to an aspect of the present invention, the total thickness n of the first diffraction layer and the second diffraction layer satisfies: n is more than or equal to 30 mu m and less than or equal to 40 mu m.
According to one aspect of the present invention, the first diffractive layer is provided with microstructures thereon;
the microstructure is a nanoimprint structure.
According to one aspect of the present invention, the diffraction efficiency is greater than or equal to 85% over a broad spectral range with a wavelength band of 470nm-650 nm. According to an aspect of the invention, the refractive index n1 of the first diffraction layer satisfies: in a wide spectral range with a wave band of 470nm-650nm, n1 is more than 1.566 and less than 1.586;
the depression depth d1 of the first diffraction layer satisfies: d1 is more than 5 mu m and less than 30 mu m.
According to an aspect of the invention, the refractive index n2 of the second diffraction layer satisfies: in a wide spectral range with the wave band of 470nm-650nm, n2 is more than 1.542 and less than 1.562;
the second diffraction layer (13) has a recess depth d2 satisfying: d2 is more than 5 mu m and less than 30 mu m.
To achieve the above object, the present invention provides an imprint master for a double-layer diffraction element, including: the master plate body is arranged in an imprinting area on the master plate body;
a plurality of the stamping areas are arranged on the master plate body in an array manner;
and the embossed area is provided with an embossed microstructure matched with the microstructure on the first diffraction layer.
According to the utility model discloses an aspect, the roughness PV of master plate body satisfies: PV <20 μm.
According to one aspect of the present invention, the imprinting area comprises an active working area having the imprinting microstructure and a non-working area surrounding the active working area;
the width d of the non-working area satisfies: d is more than or equal to 0.1 and less than or equal to 0.5 mm. .
According to an aspect of the present invention, the material is PDMS.
According to the utility model discloses a scheme, the utility model discloses a double-deck diffraction element can be under the condition that has good diffraction effect, and the thinner its volume of making of doing can be effectively reduced, and then applicable in the optical product of difference, and application scope is wide.
According to the utility model discloses a scheme, the utility model discloses a good result of use of whole diffraction element has been guaranteed to the gross thickness setting on double-deck diffraction element's diffraction layer in above-mentioned within range, and the finished product yield is high and the few cost body of materials.
According to the utility model discloses a scheme has realized the utility model discloses a diffraction element can realize the maximize of diffraction efficiency in the spectral range of broad, makes the utility model discloses a diffraction efficiency is more excellent, and the performance is better.
According to the utility model discloses a scheme, with the refracting index setting on first diffraction layer and second diffraction layer in above-mentioned within range, make the utility model discloses a diffraction element has realized the high diffraction rate effect in wide spectral range, and has guaranteed that the thickness on diffraction layer can be effectively reduced, makes the utility model discloses a diffraction element's thickness is reduced by whole, and the volume is littleer.
Drawings
Fig. 1 schematically shows a structural view of a double-layer diffraction element according to an embodiment of the present invention;
fig. 2 schematically shows a flow chart for the preparation of a bilayer diffraction element according to an embodiment of the present invention;
fig. 3 schematically illustrates a graph of refractive index versus wavelength for a first diffractive layer according to an embodiment of the present invention;
fig. 4 schematically shows a graph of refractive index versus wavelength for a second diffractive layer according to an embodiment of the present invention;
fig. 5 schematically illustrates a graph of diffraction efficiency versus wavelength for a two-layer diffraction element according to an embodiment of the present invention;
fig. 6 schematically shows a structural diagram of an imprint master according to an embodiment of the present invention;
FIG. 7 schematically illustrates a block diagram of an imprinting area, according to an embodiment of the present invention;
fig. 8 schematically shows a structure view of an imprinting area according to another embodiment of the present invention;
fig. 9 schematically shows a flow chart for preparing an imprint master according to an embodiment of the present invention.
Detailed Description
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments will be briefly described below. It is obvious that the drawings in the following description are only some embodiments of the invention, and that for a person skilled in the art, other drawings can be derived from them without inventive effort.
In describing embodiments of the present invention, the terms "longitudinal," "lateral," "up," "down," "front," "back," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and other terms are used in an orientation or positional relationship shown in the associated drawings for convenience and simplicity of description, and are not intended to indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and thus are not to be construed as limiting the present invention.
The present invention will be described in detail with reference to the accompanying drawings and specific embodiments, which are not repeated herein, but the present invention is not limited to the following embodiments.
As shown in fig. 1, according to an embodiment of the present invention, the present invention provides a double-layered diffraction element, including: the diffraction grating includes a base layer 11, a first diffraction layer 12 provided on the base layer 11, and a second diffraction layer 13 provided to be fitted to the first diffraction layer 12. In the present embodiment, the total thickness n of the first diffraction layer 12 and the second diffraction layer 13 satisfies: n is less than or equal to 40 mu m. In the present embodiment, the base layer 11 may be made of a glass substrate. Through the setting, the utility model discloses a double-deck diffraction element can be under the condition that has good diffraction effect, and the thinner its volume of making of doing can be effectively reduced, and then applicable in the optical product of difference, and application scope is wide.
As shown in fig. 1, according to an embodiment of the present invention, the total thickness n of the first diffraction layer 12 and the second diffraction layer 13 satisfies: n is more than or equal to 30 mu m and less than or equal to 40 mu m. Through the setting, the utility model discloses a good result of use of whole diffraction element has been guaranteed to the gross thickness setting on double-deck diffraction element's diffraction layer in above-mentioned within range, and the finished product yield is high and the few cost bodies of materials.
Referring to fig. 1 and 2, according to an embodiment of the present invention, a microstructure 121 is disposed on the first diffraction layer 12. In this embodiment, the microstructure 121 is a nano-imprinting structure (nano-imprinting refers to transferring a micro-nano structure on a template to a material to be processed by using photoresist as an auxiliary material). The diffractive effect is achieved by the arranged microstructures 121. In the present embodiment, a spherical structure is disposed at a middle position of the first diffraction layer 12, and raised structures having regular cross sections and regularly arranged are disposed around the spherical structure, and the cross-sectional dimension of the raised structures gradually decreases in a direction away from the spherical structure or gradually decreases in a direction away from the spherical structure and the cross-sectional dimension does not change (i.e., remains the same) after decreasing to a predetermined size.
According to an embodiment of the present invention, the diffraction efficiency is greater than or equal to 85% over a broad spectral range with a wavelength range of 470nm to 650 nm.
Through the setting, realized the utility model discloses a diffraction element can realize the maximize of diffraction efficiency in the spectral range of broad, makes the utility model discloses a diffraction efficiency is more excellent, and the performance is better.
According to one embodiment of the present invention, the spacing between the first and second diffractive layers 12, 13 is less than or equal to 1 μm.
Through the setting, realized the utility model discloses a diffraction element thickness is under the more frivolous condition, and can realize the maximize of diffraction efficiency simultaneously in the spectral range of broad, makes the utility model discloses a diffraction efficiency is more excellent, and the performance is better.
According to an embodiment of the present invention, the first diffraction layer 12 is formed by imprinting with glue, and is cured and shaped after imprinting. In the present embodiment, the refractive index n1 of the first diffraction layer 12 satisfies: 1.566 < n1 < 1.586 in a broad spectral range with a wavelength band of 470nm to 650 nm. In the present embodiment, the depression depth d1 of the first diffraction layer 12 satisfies: d1 is more than 5 mu m and less than 30 mu m
According to an embodiment of the present invention, the second diffraction layer 13 is formed on the first diffraction layer 12 by covering with glue, and is shaped by curing. In the present embodiment, the refractive index n2 of the second diffraction layer 13 satisfies: 1.542 < n2 < 1.562 over a broad spectral range having a wavelength of 470nm to 650 nm. In the present embodiment, the depression depth d2 of the second diffraction layer (13) satisfies: d2 is more than 5 mu m and less than 30 mu m.
Through the aforesaid setting, set up the refracting index on first diffraction layer and second diffraction layer in above-mentioned within range, make the utility model discloses a diffraction element has realized the high diffraction rate effect in wide spectral range, and has guaranteed that the thickness on diffraction layer can be effectively reduced, makes the utility model discloses a diffraction element's thickness is reduced by whole, and the volume is littleer.
To further explain the present invention, the method for manufacturing the double-layered diffraction element of the present invention is further explained.
Step1. obtain the base layer 11 that meets the requirements and spin-coat the nanoimprint glue on the base layer 11 (see fig. 2). In this embodiment, the thickness of the nanoimprint glue is between 30 μm and 35 μm;
step2, using the imprinting master to imprint and solidify the nanoimprint glue, forming a micro-nano structure 131 in the nanoimprint glue, and forming the solidified nanoimprint glue into the first diffraction layer 12, which is shown in fig. 2.
Step3, spin-coating a second layer of nanoimprint glue on the first diffraction layer 12 obtained in step2, and curing to form a second diffraction layer 13 embedded with the first diffraction layer 12, so as to obtain a final double-layer diffraction element (double-layer DOE), as shown in fig. 2; in the present embodiment, the overall thickness of the first and second diffraction layers is between 30um and 40 um.
To further illustrate the present invention, the present invention is further illustrated by the specific examples
Referring to fig. 3, 4 and 5, in the present embodiment, according to the aforementioned setting manner, the glue used for generating the first diffraction layer is selected to be glue of model elo OM625, and the glue used for generating the second diffraction layer is selected to be glue of model Inkron IQC-114. It is right through using two kinds of glue above-mentioned the utility model discloses a double-deck DOE designs. In this embodiment, the designed and applied spectral wavelength is 555nm, and the designed and applied spectral wavelength is 470nm-650nm, and further, the height of the protrusion (i.e. the depth required for generating the protrusion) on the first diffraction layer of the double-layer DOE of the present invention can be calculated by the following formula, i.e. h ═ λ/(n1-n2) ═ 23 μm, where n1 is the refractive index of the glue of the first diffraction layer, n2 is the refractive index of the glue of the second diffraction layer, and the relationship between the diffraction efficiency and the wavelength in the designed wavelength band is as shown in fig. 5, 6, and 7.
As shown in fig. 6, according to an embodiment of the present invention, the present invention provides an imprint master for the aforementioned double-layer diffraction element, including: a master body 21, an imprint region 22 provided on the master body 21. In the present embodiment, a plurality of imprint regions 22 are provided in an array on the master body 21. Further, embossed microstructures are provided on the embossed regions 22 that match the microstructures 121 on the first diffractive layer 12.
According to the utility model discloses an embodiment, the roughness PV of master plate body 21 satisfies: PV <20 μm.
As shown in fig. 7, according to one embodiment of the present invention, the imprinting area 22 includes an active working area 221 having an imprinted microstructure and a surrounding active working area non-working area 222. In the present embodiment, the width d of the non-operating region satisfies: d is more than or equal to 0.1 and less than or equal to 0.5 mm.
In the present embodiment, the non-working region 222 may be provided in a circular ring shape (see fig. 7) or a ring shape of a regular polygon.
As shown in fig. 1, according to an embodiment of the present invention, the imprint master is made of PDMS.
For further explanation, the utility model discloses, it further explains to the preparation method of the impression master mask of the utility model.
As shown in fig. 6, 7, 8 and 9, according to an embodiment of the present invention, a plurality of imprinting areas 22 are disposed on the master body 21 of the imprinting master in a rectangular array. The number of the embossed regions can be adjusted as desired. In the present embodiment, a 6-12 inch master is used as the master body 21. The outer shape of the nip region 22 provided thereon may be a circle or a regular polygon. The formation modes of the plurality of embossed regions are all consistent, and further, one of the embossed regions is used for detailed description.
First, a substrate is obtained, and a photoresist is spin-coated on the substrate material (see fig. 9). In the present embodiment, the thickness of the substrate is 1mm to 5 mm. The flatness PV of the substrate is <20 μm. In this embodiment, the thickness of the photoresist is between 5um and 50um, and the material of the substrate can be fused quartz or soda-lime glass.
Secondly, exposing the surface of the photoresist by using a gray level exposure method, controlling exposure energy of different areas according to different design depths, forming a continuous profile on the surface of the photoresist, wherein the continuous profile is mainly used for improving the diffraction efficiency of the first diffraction layer formed by imprinting, and obtaining a continuous diffraction structure on the surface of the photoresist after developing (see fig. 9).
Thirdly, transferring the structure obtained in the second step onto metal nickel by using an electroforming process to obtain a metal master (see fig. 9).
And fourthly, further transferring the structure of the metal master formed in the third step to the stamping area 22 to obtain a stamping microstructure on the stamping area, namely an effective working area 221, which can be used as a final nano-stamping master (see fig. 9).
The foregoing is merely exemplary of embodiments of the present invention and reference should be made to the apparatus and structures herein not described in detail as it is known in the art to practice the same in general equipment and general methods.
The above description is only one embodiment of the present invention, and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A double-layer diffraction element, comprising: a base layer (11), a first diffraction layer (12) provided on the base layer (11), and a second diffraction layer (13) provided so as to be fitted to the first diffraction layer (12);
the total thickness n of the first diffraction layer (12) and the second diffraction layer (13) satisfies: n is less than or equal to 40 mu m;
the spacing between the first diffraction layer (12) and the second diffraction layer (13) is less than or equal to 1 μm.
2. The double-layer diffraction element according to claim 1, characterized in that the total thickness n of the first diffraction layer (12) and the second diffraction layer (13) satisfies: n is more than or equal to 30 mu m and less than or equal to 40 mu m.
3. The double-layer diffraction element according to claim 1, wherein the first diffraction layer (12) is provided with microstructures (121);
the microstructures (121) are nanoimprinted structures.
4. The double-layer diffraction element of claim 1, wherein the diffraction efficiency is greater than or equal to 85% over a broad spectral range in the wavelength band of 470nm to 650 nm.
5. The double-layer diffraction element according to any one of claims 1 to 4, wherein the refractive index n1 of the first diffraction layer (12) satisfies: in a wide spectral range with a wave band of 470nm-650nm, n1 is more than 1.566 and less than 1.586;
the first diffraction layer (12) has a recess depth d1 satisfying: d1 is more than 5 mu m and less than 30 mu m.
6. The double-layer diffraction element according to claim 5, wherein the refractive index n2 of the second diffraction layer (13) satisfies: in a wide spectral range with the wave band of 470nm-650nm, n2 is more than 1.542 and less than 1.562;
the second diffraction layer (13) has a recess depth d2 satisfying: d2 is more than 5 mu m and less than 30 mu m.
7. An imprint master for the double-layer diffraction element of any of claims 1 to 6, comprising: a master body (21), an imprint region (22) provided on the master body (21);
a plurality of the stamping areas (22) are arranged on the master plate body (21) in an array manner;
the embossing area (22) is provided with an embossing microstructure matched with the microstructure (121) on the first diffraction layer (12).
8. The imprint master according to claim 7, wherein the flatness PV of the master body (21) satisfies: PV <20 μm.
9. The imprint master according to claim 7 or 8, characterized in that the imprint region (22) comprises an active working region with the imprint microstructure and a non-working region surrounding the active working region;
the width d of the non-working area satisfies: d is more than or equal to 0.1 and less than or equal to 0.5 mm.
10. The imprint master of claim 7, fabricated from a PDMS material.
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| CN202120444619.7U CN214225473U (en) | 2021-03-01 | 2021-03-01 | Double-layer diffraction element and imprinting master plate thereof |
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| CN202120444619.7U CN214225473U (en) | 2021-03-01 | 2021-03-01 | Double-layer diffraction element and imprinting master plate thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023098897A1 (en) * | 2021-12-03 | 2023-06-08 | 浙江水晶光电科技股份有限公司 | Diffractive optical element, manufacturing method therefor, and design method for micro-nano structure of master |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023098897A1 (en) * | 2021-12-03 | 2023-06-08 | 浙江水晶光电科技股份有限公司 | Diffractive optical element, manufacturing method therefor, and design method for micro-nano structure of master |
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