CN114059014A - 具有电感耦合放电清洗功能的样品台 - Google Patents
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Abstract
本发明公开了一种具有电感耦合放电清洗功能的样品台，包括样品架，所述样品架下方设有等离子体源机构，所述等离子体源机构包括绝缘壳体、容纳于所述绝缘壳体的电感线圈；所述绝缘壳体具有与样品台外部连通的开口，所述电感线圈的输出引线穿过所述开口并与样品台外部的射频电源连接。本发明可以在样品沉积前直接对样品表面进行清洗，去除污染，无需取出再清洗，样品薄膜沉积效果更佳，避免造成二次污染。此外，相对于样品架加负偏压的方案，本发明采用电感线圈激发产生的电感耦合等离子体密度更高，且该等离子体主要聚集在样品上方，对样品清洗效果更佳。
Description
技术领域
本发明涉及真空镀膜技术领域，具体是一种具有电感耦合放电清洗功能的样品台。
背景技术
样品台广泛应用于材料镀膜领域领域，比如真空蒸镀、磁控溅射、脉冲激光沉积、分子束外延等真空镀膜设备中，样品台用于放置样品。目前的样品台一般不带等离子体清洗功能。如果样品在放置过程中被污染了只能从真空室中取出后用超声波清洗机进行清洗，或者用酒精、丙酮等化学试剂清洗，这样操作麻烦而且容易造成样品二次污染。如果样品属于金属样品，暴露在大气环境下容易被氧化，用超声波清洗机、酒精、丙酮等办法很难去除样品表面的氧化层，达不到清洗效果。
少部分样品台增加了等离子体清洗功能，采用的方式一般是在样品架上加负偏压，接射频电源后在真空腔内激发产生电容耦合等离子体。但该等离子体密度低，且由于真空腔壁都是零电位，激发产生的电容耦合等离子体不集中，扩散在整个真空腔内，样品清洗效果一般。
发明内容
本发明的目的在于提供一种具有电感耦合放电清洗功能的样品台，以解决上述背景技术中提出的问题，在样品台原有基础上增加等离子体清洗功能，既能避免单独清洗造成的二次污染，又能提高清洗效果。
为实现上述目的，本发明提供如下技术方案：
一种具有电感耦合放电清洗功能的样品台，包括样品架，所述样品架下方设有等离子体源机构，所述等离子体源机构包括绝缘壳体、容纳于所述绝缘壳体的电感线圈；所述绝缘壳体具有与样品台外部连通的开口，所述电感线圈的输出引线穿过所述开口并与样品台外部的射频电源连接。
作为本发明进一步的方案：所述绝缘壳体包括防护盖、密封连接在防护盖下方的支撑座、密封连接在所述支撑座侧边的转接头，所述电感线圈设于防护盖、支撑座之间，所述转接头即所述开口。
作为本发明进一步的方案：所述支撑座的上端面开设有用于容纳电感线圈的容置槽。
作为本发明进一步的方案：所述电感线圈产生的等离子体可完全覆盖样品。
作为本发明进一步的方案：所述支撑座的材质为陶瓷。
作为本发明进一步的方案：所述防护盖的材质为玻璃。
作为本发明进一步的方案：所述样品架下端面设有旋转电机。
作为本发明进一步的方案：所述旋转电机贯穿所述防护盖和支撑座设置。
与现有技术相比，本发明的有益效果是：
本发明通过在样品架下方设置等离子体源机构，可实现在样品镀膜前直接对样品表面进行清洗，无需取出再清洗，样品薄膜沉积效果更佳，避免造成二次污染。此外，相对于样品架加负偏压的方案，本发明采用电感线圈激发产生的电感耦合等离子体密度更高，且该等离子体主要聚集在样品上方，对样品清洗效果更佳。
本发明中的绝缘壳体包括陶瓷材质的支撑座、玻璃材质的防护盖以及不锈钢材质的转接头，陶瓷和玻璃、陶瓷和不锈钢易于真空钎焊，而且陶瓷绝缘性好、导热性佳，可避免电感线圈负荷过大，影响工作效率，玻璃防护盖有利于电感线圈防污的同时，便于工作人员即时查看其工作状态。
附图说明
图1为本发明侧剖示意图；
图2为本发明实施例中的侧剖示意图；
图3为本发明实施例中的结构示意图；
图4为本发明实施例中的俯视图；
图5为本发明实施例中的支撑座、电感线圈和转接头连接关系示意图；
图中：1-样品、2-样品架、3-电感线圈、4-旋转电机、5-绝缘壳体、51-防护盖、52-支撑座、521-容置槽、53-转接头。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
在本发明的描述中，需要说明的是，术语“上”、“下”、“左”、“右”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，或者是该发明产品使用时惯常摆放的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。
请参阅图1-4，本发明实施例中，一种具有电感耦合放电清洗功能的样品台，包括样品架2，样品1放置在样品架2上，与现有技术相同，样品1及样品架2处于真空室中。在该样品架2下方设置有等离子体源机构，该等离子源机构包括绝缘壳体、容纳于所述绝缘壳体中的电感线圈3。该绝缘壳体为非金属材料，具体的材质不做限定，只要是不阻碍电感线圈3在样品架2上方激发产生电感耦合等离子体即可，使等离子体尽量穿过绝缘壳体并且聚集在样品1上方即可；绝缘壳体的外形亦无限制，可以是一体成型的绝缘材料，也可以通过几种不同材质的部件拼接在一起。本实施例中，将绝缘壳体设置为防护盖51、支撑座52以及转接头53，三者通过真空钎焊进行密封连接，将电感线圈3容置于支撑座52与防护盖51之间进行固定，并将电感线圈的输出引线通过转接头53与真空室外部的射频电源连接。防护盖51盖合在支撑座52上方，转接头53连接在支撑座52侧边，密封连接的防护盖51、支撑座52以及转接头53使电感线圈3与真空室隔绝开来。其中，防护盖51采用玻璃材质，支撑座52采用陶瓷材质，转接头53采用不锈钢材质，三者易于真空钎焊，而且陶瓷绝缘性好、导热性佳，可避免电感线圈3负荷过大，影响工作效率；玻璃防护盖有利于电感线圈3防污的同时，便于工作人员即时查看其工作状态。
需要特别说明的是，所述电感线圈3的类型不做限制，可以为圆柱形、平板型、凹腔型、多电感组合或其他产生电感耦合等离子体的布置方式；电感线圈3的匝数也不做限制，视具体样品架2的大小和射频匹配阻抗而定。此外，电感线圈3的覆盖面积尽量覆盖样品架2下方，从而保证样品1被电感耦合等离子体全覆盖。
进一步的，为了更好地固定电感线圈3，支撑座52的上端面开设有与电感线圈3相匹配的容置槽521，电感线圈3嵌在此容置槽521中，并通过防护盖51进行防护，该防护盖51设置为玻璃，主要作用是防污以及方便查看电感线圈3的工作状态。
进一步的，所述样品架2下端面固设有旋转电机4，防护盖51和支撑座52中心开设同轴的通孔，供旋转电机4穿过。需要指出的是，防护盖51和支撑座52的所有接触面(包括通孔处)均经过真空钎焊密封处理。样品台上的样品1需要进行表面清洗时，电感线圈3通过射频电源的驱动，在样品1上方激发产生电感耦合等离子体，该等离子体密度高，且主要聚集在样品1上方，可以对样品1表面进行较好的清洗。同时旋转电机4驱动样品架2及上面的样品1匀速旋转，使得样品1表面清洗更均匀，效果更佳。需要说明的是，在样品清洗时，防护盖51、支撑座52、电感线圈3均不发生移动。
本发明在使用时，将样品1放置在样品架2上，当需要清洗样品1时，打开电源并调整至合适的输出状态，使电感线圈3处于通电状态，样品1上方激发产生等离子体，此时旋转电机4带动样品架2和样品1匀速旋转，样品1清洗完毕后关闭电源，之后进行正常镀膜。
虽然本说明书按照实施方式加以描述，但并非每个实施方式仅包含一个独立的技术方案，说明书的这种叙述方式仅仅是为清楚起见，本领域技术人员应当将说明书作为一个整体，各实施例中的技术方案也可以经适当组合，形成本领域技术人员可以理解的其他实施方式。
故以上所述仅为本申请的较佳实施例，并非用来限定本申请的实施范围；即凡依本申请的权利要求范围所做的各种等同变换，均为本申请权利要求的保护范围。
Claims (8)
1.一种具有电感耦合放电清洗功能的样品台，包括样品架(2)，其特征在于，所述样品架(2)下方设有等离子体源机构，所述等离子体源机构包括绝缘壳体、容纳于所述绝缘壳体(5)中的电感线圈(3)；所述绝缘壳体(5)具有与样品台外部连通的开口，所述电感线圈(3)的输出引线穿过所述开口并与样品台外部的射频电源连接。
2.根据权利要求1所述的具有电感耦合放电清洗功能的样品台，其特征在于，所述绝缘壳体包括防护盖(51)、密封连接在防护盖(51)下方的支撑座(52)、密封连接在支撑座(52)侧边的转接头(53)，所述电感线圈(3)设于防护盖(51)、支撑座(52)之间，所述转接头(53)即所述开口。
3.根据权利要求2所述的具有电感耦合放电清洗功能的样品台，其特征在于，所述支撑座(52)的上端面开设有用于容纳电感线圈(3)的容置槽(521)。
4.根据权利要求1所述的具有电感耦合放电清洗功能的样品台，其特征在于，所述电感线圈(3)产生的等离子体可完全覆盖样品(1)。
5.根据权利要求2所述的具有电感耦合放电清洗功能的样品台，其特征在于，所述支撑座(52)的材质为陶瓷。
6.根据权利要求2所述的具有电感耦合放电清洗功能的样品台，其特征在于，所述防护盖(51)的材质为玻璃。
7.根据权利要求1所述的具有电感耦合放电清洗功能的样品台，其特征在于，所述样品架(2)下端面设有旋转电机(4)。
8.根据权利要求7所述的具有电感耦合放电清洗功能的样品台，其特征在于，所述旋转电机(4)贯穿所述防护盖(51)和支撑座(52)设置。
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Application publication date: 20220218 Assignee: Hefei Zhizhen Precision Equipment Co.,Ltd. Assignor: HEFEI INNOVATION RESEARCH INSTITUTE, BEIHANG University Contract record no.: X2022980017635 Denomination of invention: Sample table with inductive coupling discharge cleaning function License type: Exclusive License Record date: 20221011 |
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