CN114019763A - Parallel direct writing device based on ten thousand independent controllable laser dot matrixes - Google Patents
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Abstract
The invention discloses a parallel direct writing device based on ten thousand-beam independently controllable laser dot matrix generation, which mainly comprises four same optical paths, wherein each optical path comprises a core element digital micromirror array (DMD) and a microlens array (MLA) and is used for generating thousand-beam independently controllable writing dot matrixes, an effective pixel area is equally divided into M multiplied by N sub-arrays by the DMD in the optical path, one sub-array corresponds to one sub-light spot, the M multiplied by N sub-light spots emitted from the DMD are superposed with the M multiplied by N microlens of the MLA in space to generate M multiplied by N thousand-beam focus arrays and finally imaged on an objective lens focal plane, and the generation of ten thousand-beam writing dot matrixes is finally realized through splicing four thousand-beam dot matrixes, so that high-quality complex three-dimensional microstructures can be rapidly processed, and the parallel direct writing device can be applied to the fields of super-resolution lithography and the like.
Description
Technical Field
The invention belongs to the field of micro-nano processing, and particularly relates to a parallel direct writing device and method based on ten thousand-beam laser dot matrix generation and independent control.
Background
The two-photon laser direct writing technology is always a research hotspot in the three-dimensional micro-nano processing technology by virtue of the characteristics of high resolution, true three-dimensional processing capability, low thermal influence, wide processing material and the like. With the industrial application of the laser direct writing technology, how to realize high-precision simultaneous high-speed, complex and large-area writing is a key problem which needs to be solved urgently by the current laser direct writing technology.
In order to effectively improve the laser direct writing efficiency, researchers try to improve the optical processing method, namely, multiple beams of light are adopted for parallel direct writing, and the processing speed is doubled. The document [ Opt. Lett. 45, 4698-4701 (2020) ] uses a spatial light modulator SLM to realize 12 focuses for femtosecond two-photon direct writing; the literature [ Nature Communications, 2019, 10(1) ] utilizes a high-speed digital micromirror array DMD (22.7 kHZ) to generate 3 focuses with independently controllable positions for parallel processing, and realizes the highest two-photon direct writing speed at that time. Although the parallel lithography technology based on the SLM or the DMD can independently control each beam through dynamic encoding, the number of the realized beam arrays is small, and the parallel lithography technology is still a short plate which limits the processing speed when a complex structure is processed, and particularly, the refreshing frequency of the SLM is slow, thereby further limiting the improvement of the writing speed. The document Advanced Functional Materials, 2020,30,1907795 uses a diffractive beam splitting element DOE to generate a 3 × 3 femtosecond laser writing array, the diffractive optical element has the potential to generate array points, but the number of arrays to be realized is small, and each focus cannot be controlled independently. The parallel processing method based on the microlens array [ Laser & Photonics Reviews, 2020, 14] and the interference lattice [ Applied Sciences, 2021, 11(14):6559] can realize large-area fast Laser direct writing, but because light spots cannot be independently controlled and the consistency of the lattice intensity, the quality of sub-light spots and the like are difficult to guarantee, only a single repeated structure can be processed, the uniformity error of the processed periodic structure is large, and the processing precision is in the micron order.
In conclusion, at present, hundreds or even thousands of laser lattices are difficult to realize independent regulation, the consistency of the lattice intensity and the sub-light spot quality are rapidly deteriorated along with the improvement of the number of the lattice sub-light spots, and the high-flux processing requirement of a complex large-area three-dimensional structure is difficult to meet.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provides a parallel direct writing device and a parallel direct writing method based on generation and independent control of ten thousand laser dot matrixes.
The technical solution of the invention is as follows:
the utility model provides a device is directly write in parallel based on ten thousand independent controllable laser dot matrixes produce, contain two way light, adopt the femto second laser source of different wavelength respectively, first light source and second light source promptly, first light source is divided into light beam one and light beam two through first half-wave plate and first polarization beam splitter PBS, the second light source is divided into light beam three and light beam four through second half-wave plate and second polarization beam splitter PBS, four light beam get into light path one, light path two, light path three and light path four respectively afterwards, four light path structures are identical: the four light paths respectively convert four beams of light into laser lattices with independent and controllable thousands of beams, namely a first lattice, a second lattice, a third lattice and a fourth lattice, the first lattice and the second lattice are combined by a third polarization beam splitter PBS, the combined beams are incident on a first dichroic mirror through a second sleeve lens after being combined, the three lattice and the fourth lattice are combined by a fourth polarization beam splitter PBS, the combined beams are incident on a first dichroic mirror through a third sleeve lens after being combined, the first dichroic mirror realizes the combined beams of the four lattices by reflecting the first lattice and the second lattice and transmitting the third lattice and the fourth lattice, and the four lattices are combined and then sequentially pass through a fourth sleeve lens, And the second dichroic mirror and the objective lens are finally imaged on a focal plane of the objective lens to form a multi-beam laser dot matrix in a splicing manner, the high-flux inscription of a three-dimensional complex structure is realized by combining the movement of the displacement table, and the generated fluorescence is reflected by the objective lens and the second dichroic mirror in sequence and is imaged on the CCD through the third convex lens.
Preferably, the first light source and the second light source are two femtosecond light sources with the wavelength difference of only a few nanometers, the two femtosecond light sources are irradiated by photoresist to generate polymerization reaction, and except the wavelength difference, other parameters such as pulse width, power, repetition frequency, spot caliber and the like of the two light sources are completely consistent.
Preferably, the first half-wave plate and the first polarization beam splitter PBS divide the first light source into a first light beam and a second light beam which have mutually perpendicular polarization directions and equal energy, and the second half-wave plate and the second polarization beam splitter PBS divide the second light source into a third light beam and a fourth light beam which have mutually perpendicular polarization directions and equal energy.
Preferably, the four optical paths have completely consistent structures, and are all used for generating a thousand-beam independently controllable laser dot matrix, and the generation principle is as follows: the light beam is adjusted by the first reflector to the angle of the light incident on the digital micromirror array DMD, so that the light is vertical to the window of the digital micromirror array DMD to be emitted, the digital micromirror array DMD is used for modulating the amplitude of incident light spots, specifically, the pixels of the digital micromirror array DMD are partitioned by the digital micromirror array DMD through the digital micromirror array DMD micromirror array switch control, so that the digital micromirror array DMD is divided into M multiplied by N sub-arrays, the micromirrors in the sub-arrays are in an on state, the micromirrors among the sub-arrays are in an off state and cannot reflect light along a required direction, incident laser is divided into M multiplied by N light spot arrays after the amplitude modulation of the digital micromirror array DMD, one sub-array corresponds to one sub-light spot, the M multiplied by N light spot array emitted from the digital micromirror array DMD sequentially passes through a 4F system and a second reflector which are composed of a first convex lens and a second convex lens to be imaged on the micro lens array MLA, and the digital micromirror array DMD state distribution and imaging system are reasonably designed, the aperture of the sub light spots incident to the micro lens array MLA12 is not larger than the size of the micro lenses of the micro lens array MLA, meanwhile, the distribution period of each sub light spot is basically consistent with the period of each micro lens of the micro lens array MLA, the M multiplied by N light spot array is finally overlapped with the M multiplied by N micro lenses of the micro lens array MLA one by one in space, and an M multiplied by N focal point array is formed on the focal plane of the micro lens array MLA.
Preferably, the digital micromirror array DMD includes M × N sub-arrays, each sub-array includes M × M micromirrors and corresponds to one sub-light spot, and the M × M micromirrors are switched between on and off states independently, so as to realize independent control of intensity, on and off of each sub-light spot and energy distribution of the light spot, which is specifically implemented as follows: switching all the m × m micromirrors to an off state, namely, turning off the corresponding sub-light spots; when the intensity of a certain sub light spot is higher than that of other sub light spots, part of peripheral micromirrors of the m × m micromirrors corresponding to the sub light spot can be turned off, and the light spot energy is independently reduced; when the energy distribution of the sub-light spots is not uniform, part of the micromirrors corresponding to the area with excessive light spot energy can be uniformly turned off in the m × m micromirrors, so that the energy of the area of the sub-light spots is reduced, and the energy distribution of the sub-light spots is homogenized.
Preferably, the first dot matrix and the second dot matrix are combined by a third polarization beam splitter PBS, and the combined beams pass through a second sleeve lens; combining the lattice three and the lattice four by a fourth polarization beam splitter PB, and passing the combined beams through a third sleeve lens; the first dichroic mirror reflects the wavelength of the light source and transmits the wavelength of the light source 2; two first sleeve lenses of light paths where the dot matrix I and the dot matrix II are located and the second sleeve lenses form a 4F system respectively, so that the dot matrix I and the dot matrix II are combined and are reflected by a first dichroic mirror to form a front focal plane of a fourth sleeve lens; the combined dot matrix III and dot matrix IV are transmitted by a first dichroic mirror and then combined with the dot matrix I and the dot matrix II, two first sleeve lenses of light paths where the dot matrix III and the dot matrix IV are located respectively form a 4F system with a third sleeve lens, and the dot matrix III and the dot matrix IV are respectively imaged to a front focal plane of the fourth sleeve lens through the 4F system; and finally, imaging the four dot matrixes of the front focal plane of the fourth sleeve lens on the focal plane of the objective lens through an imaging system consisting of the fourth sleeve lens and the objective lens. The first lattice (three) and the second lattice (four) have the same parameters (such as intensity, period, array size and the like) except that the polarization directions are perpendicular to each other, and the first lattice (two) and the third lattice (four) have the same parameters (such as intensity, period, array size and the like) except that the wavelength difference is a few nanometers.
Preferably, the third reflector and the fourth reflector are used for adjusting the spatial position of the lattice, so that the second lattice and the first lattice are staggered 1/2 lattice periods in the x direction, the third lattice and the first lattice are staggered 1/2 lattice periods in the y direction, the fourth lattice and the first lattice are staggered 1/2 lattice periods in the x direction and the y direction, finally, the four lattices are spliced on the focal plane of the objective lens in the spatial distribution mode to form ten thousand beams of lattices, the period of the lattices is 1/2 of the period of the lattices, and the intensity, the on-off and the energy distribution of each sub-spot of the lattices are independently controllable.
The invention has the following technical effects:
the four MLAs are used for generating four thousand-beam dot matrixes, the ten thousand-beam writing array is realized through spatial splicing, the independent control of the intensity, the switching and the energy distribution of the sub-light spots of the dot matrixes is realized through the DMD, the intensity uniformity of the ten thousand-beam dot matrixes is high, the sub-light spots of the dot matrixes can be flexibly switched on and off, the quality of the light spots is optimized, and the four MLAs have the advantages of high processing flux, flexible writing of any complex three-dimensional structure, good uniformity of the writing structure, high resolution and the like when being used for writing.
Drawings
FIG. 1 is a schematic structural diagram of a parallel direct-writing device based on ten thousand-beam independently controllable laser dot matrix generation according to the present invention;
FIG. 2 is a schematic diagram of the present invention for designing the distribution of the DMD pixel sub-arrays to achieve spatial matching with the MLA micro-lenses;
FIG. 3 is a schematic diagram of the present invention implementing independent switching of sub-spots of a dot array by integrally switching micromirrors in a DMD sub-array;
FIG. 4 is a schematic diagram of the present invention for independently controlling the intensity of sub-light spots of the dot matrix by turning off the peripheral part of micromirrors of the DMD subarray;
FIG. 5 is a schematic diagram of the present invention for achieving sub-spot energy distribution homogenization by turning off some micromirrors in the DMD sub-array corresponding to the high intensity area in the sub-spot uniformly;
fig. 6 is a schematic diagram of the present invention for realizing a ten thousand beam writing array by spatially splicing four thousand beam spot arrays.
In the figure, 1-a first light source, 2-a second light source, 3-a first half-wave plate, 4-a first polarization beam splitter PBS, 5-a second half-wave plate, 6-a second polarization beam splitter PBS, 7-a first mirror, 8-a digital micromirror array DMD, 9-a first convex lens, 10-a second convex lens, 11-a second mirror, 12-a microlens array MLA, 13-a third mirror, 14-a fourth mirror, 15-a first sleeve lens, 16-a third polarization beam splitter PBS, 17-a fourth polarization beam splitter PBS, 18-a second sleeve lens, 19-a third sleeve lens, 20-a first dichroic mirror, 21-a fourth sleeve lens, 22-a second dichroic mirror, 23-an objective lens, 24-a displacement stage, 25-third convex lens, 26-CCD.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention.
As shown in fig. 1, the present invention provides a parallel direct writing device generated based on ten thousand-beam independently controllable laser dot matrix, the device mainly comprises two paths of light, femtosecond laser sources with different wavelengths are respectively adopted, that is, a first light source 1 and a second light source 2, the first light source 1 is divided into a first light beam and a second light beam by a first half-wave plate 3 and a first polarization beam splitter PBS 4, the second light source 2 is divided into a third light beam and a fourth light beam by a second half-wave plate 5 and a second polarization beam splitter PBS 6, the four light beams then respectively enter a first light path, a second light path, a third light path and a fourth light path, and the four light paths have the same structure: the four light paths respectively convert four light beams into thousands of independently controllable laser dot matrixes, namely dot matrix one, dot matrix two, dot matrix three and dot matrix four, the dot matrix one and the dot matrix two are combined by a third polarization beam splitter PBS 16, the combined beams are incident on a first dichroic mirror 20 through a second sleeve lens 18, the dot matrix three and the dot matrix four are combined by a fourth polarization beam splitter PBS 17, the combined beams are incident on a first dichroic mirror 20 through a third sleeve lens 19, the first dichroic mirror 20 realizes the combined beams of the four dot matrixes through the reflection of the dot matrix one and the dot matrix two and the transmission of the dot matrix three and the dot matrix four, after the four lattices are combined, the combined light passes through the fourth sleeve lens 21, the second dichroic mirror 22 and the objective lens 23 in sequence, and is finally imaged on a focal plane of the objective lens 23 to be spliced to form a ten thousand-beam laser lattice, the movement of the displacement table 24 is combined to realize high-flux inscription of a three-dimensional complex structure, and the generated fluorescence is reflected by the objective lens 23 and the second dichroic mirror 22 in sequence and is imaged on the CCD 26 through the third convex lens 25.
The working process of the device of the invention is as follows:
(1) the first light source 1 is divided into a first S-polarized light beam and a second P-polarized light beam through a first half-wave plate 3 and a first polarization beam splitter 4, the first half-wave plate 3 is rotated to enable the energy of the first light beam and the energy of the second light beam to be equal, and the first light beam and the second light beam respectively enter a first light path and a second light path; the wavelength difference between the second light source 2 and the first light source 1 is only a few nanometers, other parameters such as power, pulse width, repetition frequency, aperture and the like are completely consistent, the first light source 1 and the second light source 2 irradiate certain photoresist to enable the photoresist to generate polymerization reaction simultaneously, the second light source 2 is divided into a light beam three of S polarization and a light beam four of P polarization through a second half-wave plate 5 and a second polarization beam splitter 6, the energy of the light beam three and the energy of the light beam four are equal by rotating the second half-wave plate 5, and the light beam three and the light beam four then enter a light path three and a light path four respectively.
(2) The first to fourth optical paths have the same structure, and the first reflecting mirror 7, the digital micromirror array DMD 8, the first convex lens 9, the second convex lens 10, the second reflecting mirror 11, the microlens array MLA12, the third reflecting mirror 13, the fourth reflecting mirror 14, and the first sleeve lens 15 are sequentially arranged along the light transmission direction. The digital micromirror array DMD 8 has angle requirement on incident light, and the first reflector 7 is used for adjusting the angle to enable the light to vertically exit along the window of the digital micromirror array DMD 8; the digital micromirror array DMD 8 performs amplitude modulation on incident light to change emergent light into an MXN light spot array, the light spot array forms a 4F system through a first convex lens 9 and a second convex lens 10, the light spot array is imaged on a front focal plane of the micro lens array MLA12, the state distribution of the micromirrors of the digital micromirror array DMD 8 is reasonably designed, and when the MXN light spot array is incident on the micro lens array MLA12, the MXN light spot array and the MXN microlenses coincide one by one in space and form an MXN focal plane on the micro lens array MLA12 focal plane; the focal array sequentially passes through a third reflector 13, a fourth reflector 14 and a first sleeve lens 15, and the third reflector 13 and the fourth reflector 14 are used for adjusting the spatial position distribution of the focal array.
(3) The generation of the MxN light spot array is realized through the distribution design of the micromirror state of the digital micromirror array DMD 8, and the light spot array is accurately matched with the MxN micro-lenses of the micro-lens array MLA 12. For example, the following steps are carried out: since the single micromirror and the sub-micromirror array of the digital micromirror array DMD 8 are both square, it is recommended to use the microlens array MLA12 whose edge profile of the microlens is also square; assuming that the resolution of the DMD 8 used is 1920 x 1080 and the pixel period is 10.8 μm, the microlens array MLA12 used contains 137 x 77 microlens arrays, and the size of a single microlens is 150 μm x 150 μm; the digital micromirror array DMD 8 micromirror state distribution is designed by taking the size of the microlens array MLA12 as a template, as shown in FIG. 2, each white dotted line frame represents one microlens of the microlens array MLA12, each white and black square area represents one DMD micromirror, and the white and black colors respectively represent that the micromirrors are in an 'on' state and an 'off' state; designing a digital micromirror array DMD 8 sub-micromirror array to be 14 × 14, wherein m × m =10 × 10 micromirrors in the middle of sub-arrays are in an on state, two peripheral micromirrors are in an off state, one sub-array of the digital micromirror array DMD 8 corresponds to one sub-light spot, theoretically, pixels of the digital micromirror array DMD 8 can be divided into 137 × 77 sub-arrays (1920/14 =137.1, 1080/14= 77.1) at most, namely 137 × 77=10549 parallel light spots are generated at most, and the number of actually available sub-light spots is lower than ten thousand in consideration of the loss of light spots at the edge of the array; since the sub-array size of the DMD 8 is 14 × 10.8 μm =151.2 μm, and there is a deviation of 1.2 μm from the size of the MLA12 microlens (1: 1 imaging relationship is adopted between the DMD 8 and the microlens array MLA 12), if the state distribution of the DMD 8 micromirrors is designed in a sub-array periodic arrangement manner, a situation occurs in which sub-light spots cover two microlenses of the microlens array MLA12, and each sub-light spot cannot be limited in each microlens of the microlens array MLA 12. The position distribution and the array interval of each subarray of the DMD 8 can be finely adjusted step by referring to a micro lens array MLA12 template, so that each subarray of the DMD 8 is respectively arranged in each micro lens of the micro lens array MLA12, and the accurate matching of each 8 thousand-level subarray of the DMD and each micro lens of the MLA12 is finally realized through design.
(4) Independent regulation and control of the sub light spots of the MLA12 focal point array of the micro lens array are realized through the digital micromirror array DMD 8, the independent regulation and control of the intensity and the energy distribution homogenization of the sub light spots are realized, and the specific mode is as follows: after the light spot array emitted by the digital micromirror array DMD 8 is spatially matched with each microlens of the microlens array MLA12, the sub-focus of the microlens array MLA12 corresponding to the light spot array is closed by closing the mxm micromirrors of a certain subarray of the digital micromirror array DMD 8, as shown in fig. 3; when the intensity of a sub-focus is too high compared with that of other sub-focuses, part of peripheral micromirrors of m × m micromirrors of the DMD 8 sub-array corresponding to the sub-focus can be turned off to reduce the energy of light spots, as shown in fig. 4; when the energy distribution of the sub-focus is not uniform, the partial micromirrors corresponding to the area with excessive light spot energy can be turned off uniformly among the m × m micromirrors of the corresponding DMD 8 sub-array, so that the energy of the area of the sub-focus is reduced, and the energy distribution of the sub-light spot is homogenized, as shown in fig. 5.
(5) Combining the dot matrix I and the dot matrix II respectively emitted from the first light path and the second light path by a third polarization beam splitter PBS 16, passing through a second sleeve lens 18 after the combination, and reflecting by a first dichroic mirror 20; the three dot matrixes and the four dot matrixes which respectively emit from the third light path and the fourth light path are combined through a fourth polarizing beam splitter PBS 17, the combined light beams pass through a third sleeve lens 19 and are transmitted through a first dichroic mirror 20 to be combined with the first dot matrix and the second dot matrix, the combined four light beams sequentially pass through a fourth sleeve lens 21, a second dichroic mirror 22 and an objective lens 23, thousands of dot matrixes are respectively formed on the focal plane of the objective lens 23, the four thousands of dot matrixes are finally spliced into tens of thousands of dot matrixes, and fluorescence generated during writing is reflected by the objective lens 23 and the second dichroic mirror 22 and is imaged on a CCD 26 through a third convex lens 25.
(6) Imaging process of the focal point array of the micro lens array MLA12 to the focal plane lattice of the objective lens 23: the front focal plane of the first sleeve lens 15 coincides with the rear focal plane of the MLA 12; the two first sleeve lenses 15 of the light paths of the first dot matrix and the second dot matrix form a 4F system with the second sleeve lens 18 respectively, the first dot matrix and the second dot matrix are imaged to the back focal plane of the second sleeve lens 18 through the two 4F systems respectively, the back focal plane of the second sleeve lens 18 is superposed with the front focal plane of the fourth sleeve lens 21, the fourth sleeve lens 21 and the objective lens 23 form a 4F system, and the dot matrix of the front focal plane of the fourth sleeve lens 21 is finally imaged to the focal plane of the objective lens 23; similarly, the two first sleeve lenses 15 of the light paths where the lattice three and the lattice four are located also respectively form a 4F system with the third sleeve lens 19, the rear focal plane of the third sleeve lens 19 is superposed with the front focal plane of the fourth sleeve lens 21, and the lattice three and the lattice four are finally imaged on the focal plane of the objective lens 23.
(7) Splicing four thousand-beam dot matrixes: the spatial position distribution of the multi-beam lattice is adjusted through the third reflector 13 and the fourth reflector 14, as shown in fig. 6, 1/2 lattice periods are staggered in the x direction for the second lattice and the first lattice, 1/2 lattice periods are staggered in the y direction for the third lattice and the first lattice, 1/2 lattice periods are staggered in the x direction and the y direction for the fourth lattice and the first lattice, and finally the four lattices are spliced on the focal plane of the objective lens 23 in the spatial distribution mode to form a multi-beam lattice, wherein the period of the lattice is 1/2 of one period of the lattice.
(8) The sub light spots of the multi-beam dot matrix are independently regulated and controlled through the digital micromirror array DMD 8, so that the strength, the switch and the energy distribution of the finally spliced multi-beam dot matrix are also independently controllable, and the method can be used for high-flux, high-precision and high-quality writing of any complex three-dimensional structure.
Claims (7)
1. The utility model provides a parallel direct write device based on ten thousand bundles of independently controllable laser dot matrix produce, contains two way light, adopts the femto second laser source of different wavelength respectively, first light source (1) and second light source (2), its characterized in that: the first light source (1) is divided into a first light beam and a second light beam through a first half-wave plate (3) and a first polarization beam splitter PBS (4), the second light source (2) is divided into a third light beam and a fourth light beam through a second half-wave plate (5) and a second polarization beam splitter PBS (6), the four light beams respectively enter a first light path, a second light path, a third light path and a fourth light path, and the four light paths have the same structure: including first speculum (7) that sets gradually according to light direction of advance, digital micromirror array DMD (8), first convex lens (9), second convex lens (10), second mirror (11), microlens array (12), third speculum (13), fourth speculum (14) and first sleeve lens (15), four light paths are become the independently controllable laser dot matrix of thousand bundles of light conversion respectively, namely dot matrix one, dot matrix two, dot matrix three and dot matrix four, dot matrix first and dot matrix second pass third polarization beam splitter PBS (16) close the beam, incide first dichroic mirror (20) through second sleeve lens (18) after closing on, dot matrix third and dot matrix fourth polarization beam splitter PBS (17) close the beam, incide first dichroic mirror (20) through third sleeve lens (19) after closing, first dichroic mirror (20) realize the beam that closes the beam of four dot matrixes through the reflection of one and dot matrix two and to the transmission of three and four dot matrixes After the four lattices are combined, the four lattices sequentially pass through a fourth sleeve lens (21), a second dichroic mirror (22) and an objective lens (23) and are finally imaged on a focal plane of the objective lens (23) to be spliced to form a ten-thousand-beam laser lattice, high-flux inscription of a three-dimensional complex structure is realized by combining the movement of a displacement table (24), and generated fluorescence is reflected by the objective lens (23) and the second dichroic mirror (22) and is imaged on a CCD (26) sequentially through a third convex lens (25).
2. The parallel direct-writing device based on ten thousand-beam independently controllable laser dot matrix generation according to claim 1, characterized in that: the first light source (1) and the second light source (2) are two femtosecond light sources with the wavelength difference of a few nanometers, photoresist exists to enable the two femtosecond light sources to irradiate simultaneously to generate polymerization reaction, and except the wavelength difference, other parameters of pulse width, power, repetition frequency, light spot caliber and the like of the two light sources are completely consistent.
3. The parallel direct-writing device based on ten thousand-beam independently controllable laser dot matrix generation according to claim 1, characterized in that: the first half-wave plate (3) and the first polarization beam splitter PBS (4) divide the first light source (1) into a first light beam and a second light beam which are vertical to each other in polarization direction and equal in energy, and the second half-wave plate (5) and the second polarization beam splitter PBS (6) divide the second light source (2) into a third light beam and a fourth light beam which are vertical to each other in polarization direction and equal in energy.
4. The parallel direct-writing device based on ten thousand-beam independently controllable laser dot matrix generation according to claim 1, characterized in that: the four optical paths are used for generating a thousand-beam independently controllable laser dot matrix, and specifically comprise the following steps: the light beam is adjusted by a first reflector (7) to be incident into an angle of a digital micromirror array DMD (8) so that the light is emitted perpendicular to a window of the digital micromirror array DMD (8), the digital micromirror array DMD (8) is used for modulating amplitude of incident light spots, specifically, pixels of the digital micromirror array DMD (8) are partitioned by a digital micromirror array DMD (8) micromirror switch control so that the pixels are divided into M multiplied by N sub-arrays, micromirrors in the sub-arrays are in an on state, micromirrors between the sub-arrays are in an off state and cannot reflect light along a required direction, incident laser is divided into M multiplied by N light spot arrays after being modulated by the amplitude of the digital micromirror array DMD (8), one sub-array corresponds to one sub-light spot, and the M multiplied by N light spot array emitted from the digital micromirror array DMD (8) sequentially passes through a 4F system consisting of a first convex lens (9) and a second convex lens (10), The second reflecting mirror (11) is imaged on the micro lens array MLA (12), the micro lens state distribution and imaging system of the digital micro lens array DMD (8) is reasonably designed, the aperture of sub light spots incident to the micro lens array MLA (12) is not larger than the size of micro lenses of the micro lens array MLA (12), meanwhile, the distribution period of each sub light spot is basically consistent with the period of each micro lens of the MLA (12), the MxN light spot array is finally overlapped with the NxN micro lenses of the micro lens array MLA (12) one by one in space, and an MxN focal point array is formed on the focal plane of the micro lens array MLA (12).
5. The parallel direct-writing device based on ten thousand-beam independently controllable laser dot matrix generation according to claim 1, characterized in that: the digital micromirror array DMD (8) comprises MxN sub-arrays, each sub-array comprises M xm micromirrors and corresponds to one sub-light spot, the independent on and off state switching is carried out on the M xm micromirrors, and the independent control of the intensity, the switch and the light spot energy distribution of each sub-light spot is realized, and the implementation mode is as follows: switching all the m × m micromirrors to an off state, namely, turning off the corresponding sub-light spots; when the intensity of a certain sub light spot is higher than that of other sub light spots, closing part of peripheral micromirrors of the m × m micromirrors corresponding to the sub light spot, and independently reducing the light spot energy; when the energy distribution of the sub-light spots is uneven, part of the micromirrors corresponding to the area with the excessive light spot energy are uniformly turned off in the m × m micromirrors, so that the energy of the area of the sub-light spots is reduced, and the energy distribution of the sub-light spots is homogenized.
6. The parallel direct-writing device based on ten thousand-beam independently controllable laser dot matrix generation according to claim 1, characterized in that: the first dot matrix and the second dot matrix are combined by a third polarization beam splitter PBS (16), and the combined beams pass through a second sleeve lens (18); the lattice three and the lattice four pass through a fourth polarization beam splitter prism PBS (17) for beam combination, and the combined beams pass through a third sleeve lens (19); the first dichroic mirror (20) reflects the wavelength of the light source (1) and transmits the wavelength of the second light source (2); two first sleeve lenses (15) of light paths where the first dot matrix and the second dot matrix are located respectively form a 4F system with a second sleeve lens (18), so that the first dot matrix and the second dot matrix are combined and reflected by a first dichroic mirror (2) to form an image on a front focal plane of a fourth sleeve lens (21); the combined dot matrix III and dot matrix IV are transmitted by a first dichroic mirror (20) and then combined with the dot matrix I and the dot matrix II, two first sleeve lenses (15) of light paths where the dot matrix III and the dot matrix IV are located respectively form a 4F system with a third sleeve lens (19), and the dot matrix III and the dot matrix IV are imaged to a front focal plane of a fourth sleeve lens (21) respectively through the 4F system; finally, the four dot matrixes of the front focal plane of the fourth sleeve lens (21) are imaged on the focal plane of the objective lens (23) through an imaging system consisting of the fourth sleeve lens (21) and the objective lens (23); the first lattice and the second lattice, the third lattice and the fourth lattice are completely the same except that the polarization directions are perpendicular to each other, and other parameters such as intensity, period, array size and the like are completely the same.
7. The parallel direct-writing device based on ten thousand-beam independently controllable laser dot matrix generation according to claim 1, characterized in that: the third reflector (13) and the fourth reflector (14) are used for adjusting the spatial position of the dot matrix, so that 1/2 dot matrix periods are staggered in the x direction of the second dot matrix and the first dot matrix, 1/2 dot matrix periods are staggered in the y direction of the third dot matrix and the first dot matrix, 1/2 dot matrix periods are staggered in the x direction and the y direction of the fourth dot matrix and the first dot matrix, finally the four dot matrixes are spliced on the focal plane of the objective lens (23) in the spatial distribution mode to form ten thousand-beam dot matrixes, the period of the dot matrixes is 1/2 of the period of the dot matrixes, and the intensity, the switch and the energy distribution of each sub-light spot of the dot matrixes are independently controllable.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117950283A (en) * | 2024-03-27 | 2024-04-30 | 之江实验室 | Super-resolution gray scale inscribing device and method based on independent regulation and control of thousand beams of focal spots |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000098296A (en) * | 1998-09-17 | 2000-04-07 | Sharp Corp | Projection type color picture display device |
| JP2005031280A (en) * | 2003-07-10 | 2005-02-03 | Fuji Photo Film Co Ltd | Exposure apparatus |
| CN108604050A (en) * | 2016-01-20 | 2018-09-28 | 精工爱普生株式会社 | Light supply apparatus and projecting apparatus |
| CN112859534A (en) * | 2020-12-31 | 2021-05-28 | 之江实验室 | Parallel direct-writing device and method based on edge light suppression array |
| CN113189709A (en) * | 2021-04-19 | 2021-07-30 | 之江实验室 | Input optical signal generating device for optical fiber array and photoetching system |
-
2021
- 2021-09-24 CN CN202111120476.5A patent/CN114019763B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000098296A (en) * | 1998-09-17 | 2000-04-07 | Sharp Corp | Projection type color picture display device |
| JP2005031280A (en) * | 2003-07-10 | 2005-02-03 | Fuji Photo Film Co Ltd | Exposure apparatus |
| CN108604050A (en) * | 2016-01-20 | 2018-09-28 | 精工爱普生株式会社 | Light supply apparatus and projecting apparatus |
| CN112859534A (en) * | 2020-12-31 | 2021-05-28 | 之江实验室 | Parallel direct-writing device and method based on edge light suppression array |
| CN113189709A (en) * | 2021-04-19 | 2021-07-30 | 之江实验室 | Input optical signal generating device for optical fiber array and photoetching system |
Non-Patent Citations (2)
| Title |
|---|
| 余卿;余晓芬;崔长彩;: "单光源双光路激光并行共焦测量系统设计", 光学精密工程, no. 02 * |
| 朱茜;杨西斌;李思黾;李辉;王驰;刘首鹏;简俊明;熊大曦;: "基于数字微镜器件并行共焦成像的光点阵列优化", 光学学报, no. 01 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117950283A (en) * | 2024-03-27 | 2024-04-30 | 之江实验室 | Super-resolution gray scale inscribing device and method based on independent regulation and control of thousand beams of focal spots |
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