CN114002915A - Imprint substrate and imprint method - Google Patents
Imprint substrate and imprint method Download PDFInfo
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- CN114002915A CN114002915A CN202111366654.2A CN202111366654A CN114002915A CN 114002915 A CN114002915 A CN 114002915A CN 202111366654 A CN202111366654 A CN 202111366654A CN 114002915 A CN114002915 A CN 114002915A
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- substrate
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- imprinting
- imprint
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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Abstract
The present invention provides an imprint substrate for fixing on a stage of an imprint apparatus, the imprint substrate being an imprint substrate for producing a diffractive optical element or a microlens array, the imprint substrate comprising: the functional part is used for coating photocuring or thermocuring glue, and the functional part has the active area of even thickness and surrounds the inactive area of active area, and the active area is used for being the bearing area of nanometer impression figure. The stabilizing part is fixedly arranged on the invalid region of the functional part, and the thickness of the stabilizing part is larger than that of the functional part. According to the embodiment of the invention, the gravity of the stabilizing part is utilized to resist the retraction stress in the glue curing process, the substrate is prevented from warping and deforming, the qualification rate of products is improved, and further conditions are provided for selecting large-size ultrathin substrates. Meanwhile, the invention also provides an imprinting method, which relies on the imprinting substrate to carry out nano-imprinting.
Description
Technical Field
The present invention generally relates to the field of nanoimprint technology, and more particularly, to an imprint substrate and an imprint method.
Background
Nanoimprint technology is a technology for transferring a pattern onto a substrate through a template, and can be used for processing nanoscale components, such as a diffractive optical element or a microlens array, by virtue of its high-precision characteristics. The nano-imprinting process is to form a layer of polymer material on the substrate, press the pattern on the template on the uncured polymer material layer by the mechanical force of the imprinting equipment, and form a structure completely opposite to the template pattern on the substrate after the polymer material layer is cured, so as to complete the whole imprinting process. The polymer material is usually selected from glue containing light-cured or heat-cured resin, which shrinks during the curing process, and the substrate fixed with the polymer material is also affected by the shrinkage stress of the glue. Under the condition that the structural strength of the substrate is enough, the retraction stress of the glue does not seriously affect the quality of a final product, but along with the improvement of technical development and market demand, the requirements for reducing the thickness of the substrate and improving the size of the substrate are higher and higher, and especially in the field of optical elements, large-size ultrathin elements have higher product competitiveness. However, as the thickness of the substrate is reduced and the size is increased, the structural strength of the substrate cannot resist the retraction stress of the glue, deformation and warpage can be caused, the edge of the substrate and the boundary position of the coated glue are particularly obvious, the yield of the subsequent process is reduced, and even normal operation cannot be performed, so that the product quality is seriously affected.
The statements in the background section are merely prior art as they are known to the inventors and do not, of course, represent prior art in the field.
Disclosure of Invention
Aiming at one or more defects in the prior art, the invention provides the imprinting substrate which is used for preparing the diffraction optical element or the micro-lens array, can effectively resist the retraction stress generated in the glue curing process, prevents the substrate from warping or deforming, and improves the qualification rate of products. The invention also provides an imprinting method used for matching the imprinting substrate.
In order to solve the technical problems, the invention adopts the following technical scheme:
an imprint substrate for fixing on a stage of an imprint apparatus, the imprint substrate being an imprint substrate for producing a diffractive optical element or a microlens array, the imprint substrate comprising:
the functional part is used for coating photocuring or thermocuring glue, the functional part is provided with an effective area with uniform thickness and an ineffective area surrounding the effective area, and the effective area is used as a bearing area of the nano-imprinting pattern; and
the stabilizing part is fixedly arranged on the invalid region of the functional part and protrudes out of the functional part, and the gravity of the stabilizing part is used for offsetting or partially offsetting the retraction stress of the glue curing deformation.
According to an aspect of the present invention, both surfaces of the functional portion may be flat planes, and both surfaces may be used as effective areas for carrying nanoimprinted patterns, and the stabilizing portion is disposed on one of the planes of the functional portion or on both surfaces of the functional portion.
According to an aspect of the invention, wherein the stabilizer is provided around an edge area of the functional part, a thickness of the functional part is not more than 0.55 mm, and a thickness of the stabilizer is 1 to 5 times a thickness of the functional part.
According to an aspect of the invention, wherein the functional portion has a thickness of not more than 0.3 mm.
According to an aspect of the invention, wherein the functional part is made of one or more of glass, quartz, corundum, polysilicon, diamond and plastic.
According to an aspect of the invention, wherein the functional portion is wafer glass.
According to an aspect of the invention, wherein the functional portion has a diameter of not less than 6 inches.
According to one aspect of the invention, one or more radial grooves are formed on the surface of the stabilizer part away from the functional part for discharging the glue during the stamping process.
According to an aspect of the present invention, wherein the radial groove is arc-shaped, and a curved direction of the groove coincides with a rotation direction of the spin coating process.
According to an aspect of the invention, wherein the stabilizing section is placed towards a stage of the imprint apparatus, the stabilizing section is configured to be able to keep a side of the functional section for carrying the nanoimprinted pattern parallel to the stage.
According to an aspect of the present invention, wherein the functional portion and the stabilizer portion are integrally molded of the same material.
According to one aspect of the invention, there is a smooth transition area between the functional portion and the stabilizing portion.
According to one aspect of the invention, the functional portion and the stabilizing portion are attached and adhesively secured.
According to an aspect of the invention, wherein the outer edge of the functional portion substantially coincides with the outer edge of the stabilizing portion.
According to an aspect of the present invention, the imprint substrate further includes a pad surrounded by the stabilizer, the pad being attached to the functional portion and interposed between the functional portion and the stage, for supporting the functional portion.
According to an aspect of the invention, wherein the pad plate has a through hole corresponding to a vacuum line on the stage.
The technical scheme of the invention also comprises an imprinting method, wherein the imprinting method comprises the following steps:
s101: preparing an imprinting substrate, wherein the imprinting substrate is used for preparing a diffraction optical element or a micro-lens array, the imprinting substrate is provided with a functional part and a stabilizing part, the functional part is provided with an effective area with uniform thickness and an ineffective area surrounding the effective area, the effective area is used as a bearing area of a nano-imprinting pattern, the stabilizing part is arranged on the ineffective area of the functional part and protrudes out of the functional part, and the gravity of the stabilizing part is used for offsetting or partially offsetting the retraction stress of the glue solidification deformation;
s102: fixing one side of the imprinting substrate on an objective table of the imprinting equipment;
s103: coating photo-curing or thermosetting glue on the other side of the imprinting substrate;
s104: completing imprinting on the glue by utilizing imprinting equipment;
s105: and curing the glue.
According to an aspect of the present invention, wherein the step S101 comprises: and integrally molding the functional part and the stabilizing part.
According to an aspect of the present invention, wherein the step S101 comprises: and respectively preparing the functional part and the stabilizing part, attaching the stabilizing part to the functional part, and fixing by using viscose.
According to an aspect of the present invention, wherein the step S102 comprises: the imprinting substrate is fixed on a stage of the imprinting device by means of vacuum adsorption, electrostatic adsorption or adhesive fixation.
According to an aspect of the invention, wherein the stabilizer is disposed at a side of the functional part, and a side of the functional part not having the stabilizer is adsorbed on the stage.
According to an aspect of the present invention, one or more radial grooves are opened on a side of the stabilizer portion away from the functional portion, wherein the grooves are arc-shaped, and the step S103 includes: and brushing photocuring or thermocuring glue by adopting a spin coating process, wherein the arc bending direction of the groove is consistent with the rotation direction of the spin coating process.
According to an aspect of the invention, the stabilizing portion is disposed on one side or both sides of the functional portion, and the side of the functional portion having the stabilizing portion is fixed to the stage, and the step S102 further includes placing a pad between the functional portion and the stage, or using the stage having a boss matching the effective area of the functional portion to support the imprinting substrate.
According to an aspect of the present invention, when the imprinting substrate is fixed by vacuum adsorption in the step S102, the pad has through holes corresponding to vacuum lines on the stage.
Compared with the prior art, the embodiment of the invention provides the imprinting substrate which is used for preparing the diffractive optical element or the micro-lens array, the inward shrinkage stress in the glue curing process is resisted by utilizing the gravity of the stabilizing part, the substrate is prevented from warping and deforming, the qualification rate of products is improved, and further conditions are provided for selecting large-size ultrathin substrates. Meanwhile, the invention also provides an imprinting method, which relies on the imprinting substrate to carry out nano-imprinting.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic cross-sectional view of an imprint substrate mated with an imprint apparatus with a stabilization portion facing a stage in an embodiment of the present invention;
FIG. 2 is an exploded schematic view of an imprint substrate in one embodiment of the present invention;
FIG. 3 is an exploded schematic view of an imprint substrate in one embodiment of the present invention;
FIG. 4 is a schematic cross-sectional view of an imprint substrate mated to an imprint apparatus with stabilizers facing a template in an embodiment of the present invention;
FIG. 5 is a top view of an embodiment of the present invention;
FIG. 6 is a cross-sectional view of one embodiment of the present invention;
FIG. 7 is a schematic flow chart of an imprinting method according to an embodiment of the present invention;
FIG. 8 is a schematic flow diagram of an imprinting method including removal of stabilizers according to an embodiment of the present invention.
In the figure: 1. imprinting substrate, 10, functional part, 11, active area, 12, inactive area, 20, stabilization part, 21, trench, 30, glue, 40, stage, 41, vacuum line, 50, template, 60, pad, 61, via.
Detailed Description
In the following, only certain exemplary embodiments are briefly described. As those skilled in the art will recognize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention. Accordingly, the drawings and description are to be regarded as illustrative in nature, and not as restrictive.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
In the description of the present invention, it should be noted that unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection, either mechanically, electrically, or in communication with each other; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, "above" or "below" a first feature means that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact with each other via another feature therebetween. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly above and obliquely above the second feature, or simply meaning that the first feature is at a lesser level than the second feature.
The following disclosure provides many different embodiments or examples for implementing different features of the invention. To simplify the disclosure of the present invention, the components and arrangements of specific examples are described below. Of course, they are merely examples and are not intended to limit the present invention. Furthermore, the present invention may repeat reference numerals and/or letters in the various examples, such repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed. In addition, the present invention provides examples of various specific processes and materials, but one of ordinary skill in the art may recognize applications of other processes and/or uses of other materials.
The preferred embodiments of the present invention will be described in conjunction with the accompanying drawings, and it will be understood that they are described herein for the purpose of illustration and explanation and not limitation.
Fig. 1 shows a fitting relationship of an imprint substrate 1 and an imprint apparatus according to an embodiment of the present invention, and fig. 2 and 3 show schematic structural views of the imprint substrate 1 according to an embodiment of the present invention, which are described in detail below with reference to fig. 1, 2, and 3.
As shown in fig. 1, the imprint substrate 1 in the present embodiment is used for preparing a diffractive optical element or a microlens array, and the imprint substrate 1 includes a functional portion 10 and a stable portion 20, wherein the functional portion 10 is used for coating a photo-curing or thermal-curing glue 30. As shown in fig. 2 and 3, the functional part 10 has an active area 11 with a uniform thickness and an inactive area 12 surrounding the active area 11, wherein the active area 11 is used as a carrying area for the nanoimprinted pattern, i.e., an area to which glue 30 is applied. The effective area 11 in fig. 2 and 3 is the middle area of the functional part 10, but the effective area 11 may be distributed at other positions of the functional part 10 according to different design requirements. The invalid region 12 is distributed around the effective region 11, the invalid region 12 does not need to be coated with glue 30, and is not used as a working region of a nano-imprint manufactured product, a connection foundation can be provided for the functional part 10 to be matched with other structures or equipment, for example, an optical element is prepared by using a nano-imprint technology, the invalid region 12 can be used for being matched with a mounting structure, and light rays only penetrate through the effective region 11 during normal work.
The stabilizer 20 is fixedly disposed on the ineffective area 12 of the functional part 10, and the stabilizer 20 protrudes from the functional part 10, for example, the functional part 10 is a thin sheet with uniform thickness, the stabilizer 20 is disposed on the opposite side of the functional part 10 coated with the glue 30, the side of the functional part 10 coated with the glue 30 is a flat plane, and the other side is, as shown in fig. 1, the stabilizer 20 protrudes from the plane of the functional part 10 at the position of the ineffective area 12. The weight of the stabilizer 20 is used to counteract or partially counteract the retraction stress of the curing deformation of the glue 30. After the imprinting is finished, the glue shrinks inwards in the curing process, and the substrate tilts upwards and deforms along with the shrinkage of the glue due to the fact that the glue is fixedly bonded with the substrate, and the substrate made of a material with high hardness can even break. In the present embodiment, with the stabilizer 20 thickened at the position of the ineffective area 12 of the functional part 10, the gravity of the stabilizer 20 can be used to resist the upward warping of the functional part 10, so that after the stamping is completed, the overall flatness of the functional part 10 meets the requirements of the subsequent processing. Meanwhile, the stabilizer 20 disposed in the ineffective area 12 does not affect the usability of the effective area 11, and other technical means may be adopted to remove the stabilizer 20 after the glue 30 is cured. Further, according to a preferred embodiment of the present invention, the functional part 10 and the stabilizing part 20 may be selected from the same material to facilitate processing and maintain the same thermal expansion coefficient.
According to a preferred embodiment of the present invention, both sides of the functional part 10 are flat planes, both sides can be used as the effective areas 11 for carrying the embossed patterns, and the stabilizing parts 20 are disposed on one of the planes of the functional part 10 or on both sides of the functional part 10. For example, as shown in fig. 2, the stabilizing portion 20 may be disposed on the same side of the functional portion 10 as the effective area 11, or as shown in fig. 3, the stabilizing portion 20 may be disposed on the other side of the functional portion 10 coated with the glue 30, but of course, the stabilizing portion 20 may also be disposed on both sides of the functional portion 10.
The inventors found that in actual production, the thinner the thickness of the functional portion 10 is, the greater the buckling deformation generated after the glue 30 is cured, and the most severe position of the deformation is mainly at the edge of the functional portion 10. According to a preferred embodiment of the present invention, wherein the stabilizer 20 is disposed around the edge region of the functional part 10, the thickness of the functional part 10 is not more than 0.55 mm, the thickness of the stabilizer 20 is 1-5 times the thickness of the functional part 10, the thinner the thickness of the functional part 10 is, the less strong the structural strength is to resist the retraction stress during the curing process of the glue 30, in order to ensure that the gravity of the stabilizer 20 can balance the retraction stress of the curing glue 30, in the preferred embodiment of the present invention, the thickness of the stabilizer 20 is not less than the thickness of the functional part 10, and at the same time, the thickness of the stabilizer 20 is not more than 5 times the thickness of the functional part 10 in order to avoid the processing difficulty and the waste of materials. Further, the thickness of the functional portion 10 is not more than 0.3 mm.
In some embodiments of the present invention, one or more of glass, quartz, corundum, polycrystalline silicon, diamond, and plastic are selected as the material for making the functional part 10, such as quartz glass, modified PET (poly-p-phenylene terephthalate plastic) film, polyimide film, polycarbonate film, glass coated with diamond film, sapphire, polycrystalline silicon wafer, and the like. The specific material selection of the functional part 10 can be adjusted according to the use requirement, and the deformation of the functional part 10 when the glue 30 is cured is also related to the characteristics of the material of the functional part 10. According to a preferred embodiment of the present invention, the functional portion 10 can be made of wafer glass, which is a circular sheet made of quartz, polysilicon or borosilicate, and has good flatness and optical properties. The inventor also finds that the larger the size of the wafer glass is, the more obvious the edge deformation of the wafer glass is in the process of curing the glue 30, and when the diameter of the wafer glass is not less than 6 inches, the yield of the stamped finished product is seriously reduced, and the subsequent production process and the product quality cannot be guaranteed.
The inventors found through comparative tests that the extent of warpage of the imprint substrate 1 provided with the stabilizer 20 is significantly reduced as compared with a conventional substrate.
After the imprinting is finished and the substrate is baked and cured for 100 minutes in an environment of 100 degrees celsius under the same glue, the inventors have obtained the following table after measuring the maximum warpage:
the warpage in the upper table passes through thickness clearance gauge test, and comparative example 1 and comparative example 2 all use traditional substrate, do not set up the stabilizer, and the functional unit 10 of embodiment 1-4 selects different materials and different size thickness to test, has all set up stabilizer 20 in the border position of functional unit 10, and can know from the upper table, stabilizer 20 can reduce the warpage of substrate by a wide margin, satisfies the demand of follow-up production technology completely, has improved the qualification rate of product.
As shown in fig. 5, the surface of the stabilizing portion 20 remote from the functional portion 10 is provided with one or more radial grooves 21 for draining the glue during the stamping process. When the stabilizing portion 20 is disposed on one side of the functional portion 10 coated with the glue 30, as shown in fig. 4, in the imprinting process, due to the extrusion of the template 50 and the redundancy of the glue 30 during coating, a part of the glue overflows outward, in order to prevent the stabilizing portion 20 from limiting the redundant glue in the effective area 11 of the functional portion 10 and polluting the effective area 11, in this embodiment, a radial groove 21 is formed in the stabilizing portion 20, the redundant glue is discharged by using the groove 21, so that the redundant glue is prevented from being accumulated and retained in the effective area 11, and the groove 21 can be made by using a laser or chemical etching process according to the material of the stabilizing portion 20. Further, as shown in fig. 5, according to a preferred embodiment of the present invention, the radial grooves 21 in the stabilizing portion 20 are arc-shaped, and the arc-shaped bending direction of the grooves 21 coincides with the rotation direction of the spin-coating process. The glue is coated on the effective area 11 of the functional part 10 by a spin coating process, and when the glue is applied by spin coating, in order to prevent the shortage of the glue amount and the incomplete imprint product, a certain redundancy is required to be set, and in order to facilitate the discharge of the glue, the groove 21 of the stabilizing part 20 is set to be an arc shape in accordance with the rotation direction of the spin coating process in the present embodiment.
When nano-imprinting is performed by using the imprinting substrate 1, it is necessary to ensure that the imprinting substrate 1 is fixed to the stage 40 of the imprinting apparatus, and conventional imprinting substrates all have flat shapes and can be directly fixed to the stage, and the imprinting substrate 1 in this embodiment includes the stabilizer 20. In order to ensure the imprinting quality, when the stabilizing portion 20 faces the stage 40, or both surfaces of the functional portion 10 are provided with the stabilizing portions 20, as shown in fig. 1, the stabilizing portions 20 are configured to keep the surface of the functional portion 10 for carrying the nanoimprint patterns parallel to the stage 40. For example, the thickness of the stabilizer 20 is uniform at different positions, or the stabilizer 20 has a plurality of support points in the same plane, and the plane is parallel to the plane of the effective area 11 in the functional part 10, so as to ensure that when the stabilizer 20 directly contacts the object stage 40, the plane of the object stage 40 is parallel to the plane of the effective area 11 in the functional part 10, so that the template 50 can be uniformly pressed on the glue 30.
According to a preferred embodiment of the present invention, as shown in fig. 6, the functional part 10 and the stabilizing part 20 can be integrally formed by the same material, for example, the functional part 10 and the stabilizing part 20 are both made of glass, the shape shown in fig. 6 can be obtained by a float process combined with a mold casting method, and the functional part 10 and the stabilizing part 20 can also be obtained by a CMP process (chemical mechanical polishing process), and subjected to chemical corrosion and then mechanical friction to obtain the shape shown in fig. 6, and meet the use requirements of the functional part 10 and the stabilizing part 20. For example, the functional portion 10 is made of 8-inch diameter wafer glass, and the stabilizing portion 20 is disposed at an edge position of the functional portion 10 and may be an annular region 10-15 mm wide, and a middle position of the annular region corresponds to the effective region 11 of the functional portion 10. Further, according to a preferred embodiment of the present invention, a smooth transition region is provided between the functional part 10 and the stabilizing part 20, as shown in fig. 6, for facilitating the process and preventing damage to the template 50 or the imprinting substrate 1 when the template 50 is misaligned.
In addition to the integral molding method provided in the foregoing embodiment, according to a preferred embodiment of the present invention, the functional portion 10 and the stabilizing portion 20 may be manufactured separately, the functional portion 10 and the stabilizing portion 20 are bonded and fixed by adhesive, in which case the materials of the functional portion 10 and the stabilizing portion 20 may be the same or different, as shown in fig. 2, the functional portion 10 is a wafer glass with a diameter of 8 inches, the stabilizing portion 20 is a ring structure, the width of the ring structure may be 18-30 mm, the outer diameter is also 8 inches, the space in the middle of the stabilizing portion 20 is left from the effective area 11 of the functional portion 10, and the side bonding edges of the functional portion 10 and the stabilizing portion 20 are aligned and bonded together by adhesive. After the inventor tests, the functional part 10 and the stabilizing part 20 do not need to be completely aligned at the edge, the deviation is controlled to be 0.2-1 mm, the use performance of the product is not affected, and the outer edges of the functional part and the stabilizing part are basically overlapped. According to a preferred embodiment of the present invention, the functional part 10 and the stabilizing part 20 may be bonded using a releasable adhesive, such as a UV (ultraviolet) releasable adhesive, so as to achieve separation of the functional part 10 and the stabilizing part 20 after curing of the embossed pattern on the glue 30 is completed. According to a preferred embodiment of the present invention, the stabilizing portion 20 can be cut from the same diameter of the wafer glass as the functional portion 10, so as to simplify the manufacturing process and reduce the manufacturing cost.
As shown in fig. 1, according to a preferred embodiment of the present invention, the imprint substrate 1 further includes a pad 60 surrounded by the stabilizer 20, the pad 60 being attached to the functional part 10 and interposed between the functional part 10 and the stage 40 for supporting the functional part 10. In the nanoimprint process, the template 50 extrudes the glue 30 coated on the effective area 11 of the functional part 10, when the stabilizing part 20 faces the stage 40, or when the stabilizing parts 20 are arranged on both sides of the functional part 10, the back side of the functional part 10 coated with the glue 30 does not contact with the stage 40 in a plane due to the existence of the stabilizing part 20, that is, cannot be effectively supported, in order to prevent the functional part 10 from deforming or breaking under the extrusion action of the template 50, in the embodiment, a backing plate 60 is arranged between the functional part 10 and the stage 40, the thickness of the backing plate 60 is similar to that of the stabilizing part 20, and the size and shape of the backing plate 60 are similar to those of the vacancy in the stabilizing part 20. According to a preferred embodiment of the present invention, the stage 40 fixes the imprinting substrate 1 by vacuum adsorption, and the stage 40 is provided with a plurality of vacuum lines 41 for forming a negative pressure environment between the imprinting substrate 1 and the stage 40, in order to ensure the position of the imprinting substrate 1 is fixed, when the pad 60 is disposed between the functional part 10 and the stage 40, the pad 60 is provided with through holes 61, and the positions of the through holes 61 correspond to the positions of the vacuum lines 41 on the stage 40.
Fig. 7 shows an imprint method 100 according to an embodiment of the present invention, the imprint process being performed using an imprint apparatus, the imprint method 100 including:
in step S101, an imprint substrate is prepared. The stamping substrate is used for preparing a diffraction optical element or a micro-lens array, and is provided with a functional part and a stabilizing part, wherein the functional part is provided with an active area with uniform thickness and an inactive area surrounding the active area. The active area is used as a bearing area of the nanoimprint pattern, for example, the active area is arranged on a circular area at the center of the functional part, the stabilizing part is arranged on an inactive area of the functional part, for example, the stabilizing part is located at the edge of the functional part, the stabilizing part protrudes out of the functional part, and the gravity of the stabilizing part is used for offsetting or partially offsetting the retraction stress of the solidification deformation of the glue.
The stabilizers do not serve as working areas of the product after embossing is completed, for example in diffractive optical elements or microlens arrays, light rays pass only through the functional portions, and the optical properties of the stabilizers do not affect the function and action of the product. The stabilizer and the functional part may be integrally formed of the same material, and for example, the stabilizer and the functional part may be formed of quartz glass in a pre-designed mold by a float process. The stabilizing part and the functional part can be manufactured respectively, the stabilizing part and the functional part are correspondingly attached together after the manufacturing is completed, the viscose is used for fixing, for example, the UV dissociation glue is used for bonding the functional part and the stabilizing part, only 1-3 drops of the UV dissociation glue are uniformly dripped on the central line of the stabilizing part, then the UV dissociation glue is aligned and attached to the functional part, and the heating and curing are carried out, wherein the curing temperature is 80 ℃, and the curing time is 10 minutes.
In step S102, one side of the imprint substrate is fixed on a stage of the imprint apparatus. In order to prevent the imprinted pattern from deviating from the designed position, the imprinted substrate needs to be fixedly connected with the stage, and further, the position of the effective area can be made to correspond to the position of the template of the imprinting device under the cooperation of the positioning mark or the positioning structure. The fixing mode of the objective table and the imprinting substrate can select the modes of vacuum adsorption, electrostatic adsorption or adhesive fixation, wherein the vacuum adsorption is to form a negative pressure area between the objective table and the imprinting substrate, the imprinting substrate is fixed on a specific position of the objective table by utilizing atmospheric pressure, and a vacuum line for forming negative pressure is arranged on the objective table. Electrostatic adsorption is the use of opposite charges attraction characteristics to the substrate fixed on the stage, and adhesive fixation is the use of dissociation of glue to make the substrate and the stage together.
When the stabilizing part is arranged on one side of the functional part, one side of the functional part without the stabilizing part can be adsorbed on the objective table, and the functional part has uniform thickness and a flat plane and can directly adopt the adsorption mode. When the stabilizing part faces the objective table, or the stabilizing part is arranged on two sides of the functional part, a cavity exists between the planes of the functional part and the objective table, and simultaneously, because the thickness of the functional part is thinner, the structural strength of the functional part is limited, in order to prevent the functional part from being damaged by compression, under the condition, a base plate can be placed between the functional part and the objective table, the objective table with a boss matched with the effective area of the functional part can be selected to bear the imprinting substrate, and the functional part is supported by the boss of the outer objective table. Under the condition that sets up the backing plate, when adopting the fixed impression substrate of vacuum adsorption's mode, for forming effectual adsorption affinity between assurance objective table and the impression substrate, seted up the through-hole on the backing plate to the position of through-hole corresponds with the position of vacuum line on the objective table, makes the backing plate can enough provide the support for function portion, can not hinder the vacuum line again and form the negative pressure between function portion and objective table.
In step S103, a photo-curing or thermal-curing glue is applied on the other side of the imprint substrate. When a nano-imprint process is adopted to manufacture a diffractive optical element or a micro-lens array, the photo-curing or thermosetting glue is used as a carrier for bearing an imprinted pattern, and has higher requirements on optical performance, such as the refractive index of a glue material and the thickness of a glue layer. In order to ensure the uniform thickness of the glue layer, a spin coating process may be used to coat the glue in the effective area of the functional portion, for example, the rotation speed is set to 500-. Meanwhile, in order to prevent the glue layer from covering the designed area completely, redundancy is generally set when the glue is applied by rotation, when the stabilizing part is arranged on one side of the functional part where the effective area is arranged, the stabilizing part surrounds the effective area, if redundant glue can not be discharged, in order to solve the problem that the printed pattern may be contaminated by the redundant glue during the curing process, and the product cannot meet the design requirement, in this embodiment, one side of the stabilizing portion, which is away from the functional portion, is provided with one or more radial grooves, the number and width of the grooves can be adjusted according to the redundancy of the glue and the fluidity of the glue, the depth of the grooves is adjusted according to the thickness of the glue layer, for example, seventeen grooves with the depth of 1.5 mm and the width of 1.0 mm are formed on one side of the stabilizer, and the grooves can be uniformly arranged in the circumferential direction of the stabilizer to achieve the effect of uniformly and rapidly discharging the glue allowance. Further, the grooves of the stabilizers are all arranged in the shape of an arc with the same orientation, and the bending direction of the arc is consistent with the rotation direction of the spin coating process.
In step S104, imprinting is performed on the glue using an imprinting apparatus. The imprinting equipment is fixedly provided with a template above the objective table, and after the imprinting substrate is fixed on the objective table, the effective area coated with glue corresponds to the position of the template. The template is compressed tightly on the not yet solidified glue under the drive of the imprinting equipment, the designed pattern on the template is reversely rubbed on the glue, and the glue can form a product with designed optical performance on the imprinting substrate after solidification.
In step S105, the glue is cured. According to the performance and design requirements of the glue, the glue is cured in a proper environment and time, for example, baked in a clean oven set to 100 ℃ for 100 minutes. And after the glue is cured, obtaining the element meeting the design requirement, and performing subsequent processing or sorting and packaging after the test is qualified.
Fig. 8 shows an imprinting method 200 according to still another embodiment of the present invention, wherein steps S201, S202, S203, S204 and S205 are all substantially the same as steps S101, S102, S103, S104 and S105, and after the glue is cured, step S206 may be further provided to remove the stabilizers, which may be required to remove the stabilizers because the stabilizers protrude out of the surface of the functional part, resulting in the functional part being uneven and not directly usable in a part of the equipment mechanism or in a subsequent process. According to the foregoing embodiment, the functional portion and the stabilizing portion may be integrally formed of the same material, in which case, the stabilizing portion may be removed by laser cutting, and when the stabilizing portion is located on the side where the functional portion is coated with the glue, in order to prevent the glue layer carrying the embossed pattern from being damaged, the pre-cutting coating may be performed by a vacuum coating machine, and then laser cutting may be performed, and when the stabilizing portion is located on the opposite side where the functional portion is coated with the glue, laser cutting may be performed directly. Because the effective area is not provided with the stabilizing part, the laser cutting can not interfere the optical performance of the functional part and can not influence the effect of the product. Functional portion and stable portion can also prepare respectively after paste fixedly, in order to facilitate getting rid of the stable portion, can select for use UV dissociation glue to glue joint stable portion and functional portion, after the glue solidification is accomplished, can get rid of the UV dissociation glue rapidly, take off the stable portion, can not influence the performance of functional portion equally. After the stabilizing part is removed, the subsequent procedures or sorting and packaging can be carried out.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (24)
1. An imprint substrate for fixing to a stage of an imprint apparatus,
the stamping substrate is used for preparing a diffraction optical element or a micro-lens array,
the imprint substrate includes:
the functional part is used for coating photocuring or thermocuring glue, the functional part is provided with an effective area with uniform thickness and an ineffective area surrounding the effective area, and the effective area is used as a bearing area of the nano-imprinting pattern; and
the stabilizing part is fixedly arranged on the invalid region of the functional part and protrudes out of the functional part, and the gravity of the stabilizing part is used for offsetting or partially offsetting the retraction stress of the glue curing deformation.
2. An imprinting substrate according to claim 1, wherein both sides of the functional portion are flat planes, both sides can serve as active areas for carrying nanoimprinted patterns, and the stabilizing portion is disposed on one of the planes of the functional portion or both sides of the functional portion.
3. The imprint substrate of claim 1, wherein the stabilizer is disposed around an edge region of the functional portion, a thickness of the functional portion is not greater than 0.55 mm, and a thickness of the stabilizer is 1-5 times a thickness of the functional portion.
4. An imprint substrate according to claim 3, wherein a thickness of the functional portion is not more than 0.3 mm.
5. The imprint substrate of claim 1, wherein the functional portion is made of one or more of glass, quartz, corundum, polysilicon, diamond, and plastic.
6. The imprint substrate of claim 5, wherein the functional portion is wafer glass.
7. The imprint substrate of claim 6, wherein a diameter of the functional portion is not less than 6 inches.
8. An imprinting substrate according to claim 3 or 4, wherein a surface of the stabilisation part remote from the functional part is provided with one or more radial grooves for draining glue during imprinting.
9. The imprint substrate according to claim 8, wherein the radial groove is arc-shaped, and an arc-shaped bending direction of the groove coincides with a rotation direction of a spin-coating process.
10. The imprint substrate of claim 1, wherein the stabilizer is placed toward a stage of an imprint apparatus, the stabilizer being configured to be capable of keeping a face of the functional section for carrying the nanoimprint pattern parallel to the stage.
11. The imprint substrate of any one of claims 1-7, wherein the functional portion and the stabilizing portion are integrally formed of a same material.
12. The imprint substrate of claim 11, wherein the functional portion and the stabilizing portion have a smooth transition region therebetween.
13. An imprinting substrate according to any of claims 1 to 7, wherein the functional portion and the stabilizing portion are conformed and adhesively secured.
14. An imprint substrate according to claim 13, wherein an outer edge of the functional portion substantially coincides with an outer edge of the stabilizing portion.
15. An imprint substrate according to claim 3 or 4, further comprising a pad surrounded by the stabilizer, the pad being attached to the functional portion and interposed between the functional portion and the stage for supporting the functional portion.
16. The imprint substrate of claim 15, the shim plate having through holes corresponding to vacuum lines on the stage.
17. An imprint method, comprising:
s101: preparing an imprinting substrate, wherein the imprinting substrate is used for preparing a diffraction optical element or a micro-lens array, the imprinting substrate is provided with a functional part and a stabilizing part, the functional part is provided with an effective area with uniform thickness and an ineffective area surrounding the effective area, the effective area is used as a bearing area of a nano-imprinting pattern, the stabilizing part is arranged on the ineffective area of the functional part and protrudes out of the functional part, and the gravity of the stabilizing part is used for offsetting or partially offsetting the retraction stress of the glue solidification deformation;
s102: fixing one side of the imprinting substrate on an objective table of the imprinting equipment;
s103: coating photo-curing or thermosetting glue on the other side of the imprinting substrate;
s104: completing imprinting on the glue by utilizing imprinting equipment;
s105: and curing the glue.
18. The imprint method according to claim 17, wherein the step S101 includes: and integrally molding the functional part and the stabilizing part.
19. The imprint method according to claim 17, wherein the step S101 includes: and respectively preparing the functional part and the stabilizing part, attaching the stabilizing part to the functional part, and fixing by using viscose.
20. The imprint method according to any one of claims 17 to 19, wherein the step S102 includes: the imprinting substrate is fixed on a stage of the imprinting device by means of vacuum adsorption, electrostatic adsorption or adhesive fixation.
21. The imprint method of claim 20, wherein the stabilizer is disposed on a side of the functional portion, and a side of the functional portion not having the stabilizer is adsorbed on the stage.
22. The imprinting method of claim 21, wherein the stabilizer defines one or more radial grooves on a side thereof away from the functional portion, wherein the grooves are arc-shaped, and the step S103 comprises: and brushing photocuring or thermocuring glue by adopting a spin coating process, wherein the arc bending direction of the groove is consistent with the rotation direction of the spin coating process.
23. The imprinting method of claim 20, wherein the stabilizer is disposed on one side or both sides of the functional part, the side of the functional part having the stabilizer is fixed to the stage, and the step S102 further comprises placing a pad between the functional part and the stage, or supporting the imprinting substrate with the stage having a projection matching the effective area of the functional part to support the functional part.
24. The imprinting method of claim 23, wherein the pad has a through hole corresponding to a vacuum line on the stage when the imprinting substrate is fixed by vacuum adsorption in step S102.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111366654.2A CN114002915A (en) | 2021-11-18 | 2021-11-18 | Imprint substrate and imprint method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111366654.2A CN114002915A (en) | 2021-11-18 | 2021-11-18 | Imprint substrate and imprint method |
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| CN114002915A true CN114002915A (en) | 2022-02-01 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202111366654.2A Pending CN114002915A (en) | 2021-11-18 | 2021-11-18 | Imprint substrate and imprint method |
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| CN (1) | CN114002915A (en) |
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2021
- 2021-11-18 CN CN202111366654.2A patent/CN114002915A/en active Pending
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