CN113985698A - Double-sided nano-imprinting equipment - Google Patents
Double-sided nano-imprinting equipment Download PDFInfo
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- CN113985698A CN113985698A CN202111316485.1A CN202111316485A CN113985698A CN 113985698 A CN113985698 A CN 113985698A CN 202111316485 A CN202111316485 A CN 202111316485A CN 113985698 A CN113985698 A CN 113985698A
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- adsorption plate
- working mold
- unit
- substrate
- working
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Abstract
The invention discloses a double-sided nano-imprinting device, which comprises a conveying unit, a movable imprinting unit, a substrate and a working mold, wherein the conveying unit and the movable imprinting unit are positioned in a device cavity; the invention has the beneficial effects that: the moving block is sleeved on the guide rail, so that the fixed plate can move left and right on the guide rail along with the moving block, and the substrate is driven to move on different stations; the substrate adsorption plate and the working die adsorption plate realize the adsorption of the substrate and the working die; the colloid on the surface of the substrate is in contact with the first working mold and the second working mold, the colloid in the center is pushed to expand outwards from the center, the nano structure is filled, and double-sided nano imprinting is realized.
Description
Technical Field
The invention relates to the technical field of nanoimprint lithography, in particular to double-sided nanoimprint lithography equipment
Background
The nano-imprinting technology is a novel micro-nano processing technology, a micro-nano structure on a template is transferred to a processing substrate through nano-imprinting glue, and in order to ensure imprinting precision and alignment precision, double-sided imprinting needs to be carried out on the substrate, and further improvement needs to be carried out on imprinting equipment.
Disclosure of Invention
The invention aims to overcome the technical defects and provides double-sided nano-imprinting equipment.
The technical scheme adopted by the invention for realizing the technical purpose is as follows: a double-sided nano-imprinting device comprises a conveying unit, a movable imprinting unit, a substrate and a working mold, wherein the conveying unit and the movable imprinting unit are positioned in a device cavity;
the conveying unit further comprises a fixed plate, a guide rail, a moving block, a motor and a guide rail fixed block, wherein the fixed plate is used for moving the imprinting unit, the fixed plate is located on the moving block, the moving block is sleeved on the guide rail, and the fixed plate can move left and right on the guide rail along with the moving block;
the transmission unit also comprises a limit induction block and an infrared distance detector which are used for determining the position of the movable stamping unit;
the movable stamping unit comprises a working mold adsorption plate, a transparent area is arranged in the middle of the working mold adsorption plate, a square vacuum groove is formed in the upper surface of the working mold adsorption plate, a vacuum hole is formed in the groove of the vacuum groove, and a working mold positioning groove is formed in the outer side of the square vacuum groove;
the working die adsorption plate is connected with the lifting column through a connecting block, and the motor drives the lifting column to extend or contract to drive the working die adsorption plate to rise or fall; and a displacement platform is arranged below the motor and used for moving the adsorption plate of the working mold back and forth, and a rotating platform is arranged below the displacement platform and used for rotating the adsorption plate of the working mold.
Preferably, the vacuum adsorption plate is arranged on the lower surface of the upper fixing plate and used for adsorbing and fixing the substrate, a circular vacuum groove is formed in the lower surface of the substrate adsorption plate, and a vacuum hole is formed in the vacuum groove.
Preferably, still include work mould adsorption plate, work mould adsorption plate is located go up the lower surface of fixed plate, the lower surface of work mould adsorption plate is equipped with square vacuum tank, and square vacuum tank inslot is equipped with the vacuum hole, and the square vacuum tank outside is equipped with the work mould constant head tank.
Preferably, the device also comprises an alignment unit, wherein the alignment unit is positioned above the upper fixed plate and comprises a moving block, a limiting block, a guide rail, a fixed support rod and an alignment device, wherein the moving block is used for moving the alignment device left and right;
the alignment unit can observe the relative position of the alignment mark through the transparent substrate adsorption plate, the working mold adsorption plate, the substrate and the working mold, display an image on the liquid crystal touch screen in real time, and adjust the relative position of the movable imprinting unit according to the relative position of the alignment mark.
Preferably, the nano imprinting device further comprises an ultraviolet curing unit, wherein the ultraviolet curing unit is positioned on the lower surface of the upper fixing plate, and emits ultraviolet light to penetrate through the working mold and the substrate to cure the nano imprinting colloid.
Preferably, the substrate is provided with alignment marks, the working mold comprises a first working mold and a second working mold, the first working mold is located on the upper surface of the movable imprinting unit, the second working mold is located on the lower surface of the working mold adsorption plate, and the working mold is provided with alignment marks corresponding to the alignment marks.
The invention has the beneficial effects that: the moving block is sleeved on the guide rail, so that the fixed plate can move left and right on the guide rail along with the moving block, and the substrate is driven to move on different stations; the substrate adsorption plate and the working die adsorption plate realize the adsorption of the substrate and the working die; the colloid on the surface of the substrate is in contact with the first working mould and the second working mould to push the colloid in the center to expand outwards from the center, so that the nano structure is filled, and double-sided nano imprinting is realized.
Drawings
FIG. 1 is a schematic diagram of the apparatus of the present invention;
FIG. 2 is a top view of the apparatus of the present invention moving the imprint unit 2;
FIG. 3 is a side view of the apparatus of the present invention moving the imprint unit 2;
FIG. 4 is a schematic view showing the structure of the lower surface of the substrate adsorption plate 3 of the apparatus of the present invention;
FIG. 5 is a side view of the substrate adsorption plate 3 of the apparatus of the present invention;
FIG. 6 is a schematic view of the lower surface of the suction plate 4 of the working mold of the apparatus of the present invention;
FIG. 7 is a side view of the suction plate 4 of the working mold of the apparatus of the present invention;
FIG. 8 is a schematic illustration of the imprinting process of the apparatus of the present invention;
FIG. 9 is a schematic diagram of a substrate structure for double-sided imprinting in the apparatus of the present invention;
fig. 10-14 are schematic structural views of the double-sided embossing process of the apparatus of the present invention.
Labeled as:
1. a transfer unit; 11. an upper fixing plate; 12. a fixing plate; 13. a guide rail; 14. a moving block;
15. a motor; 16. a guide rail fixing block; 17. a limiting induction block; 18. an infrared distance detector;
2. moving the imprint unit; 21. a working mold adsorption plate; 211. a transparent region;
212. a square vacuum tank; 213. a vacuum hole; 214. a working mold locating slot; 22. connecting blocks;
23. a lifting column; 24; a motor; 25. a displacement platform; 26. rotating the platform;
3. a substrate adsorption plate; 31. a vacuum hole; 32. a vacuum tank;
4. a working mold adsorption plate; 41. a vacuum hole; 42. a square vacuum tank; 43. a working die positioning groove;
5. an alignment unit; 51. a moving block; 52. a limiting block; 53. a guide rail; 54. fixing the support rod; 55. An alignment device;
6. an ultraviolet curing unit; 7. a substrate; 71. aligning and marking;
8. working a mold; 81. a first working mold; 82. a second working mold; 83. and (6) aligning and marking.
Detailed Description
The invention is further explained below with reference to the embodiments of the drawings.
Example one
As shown in fig. 1-14:
a double-sided nanoimprinting apparatus comprising:
transfer unit 1
The transfer unit 1 is located within the device cavity. The conveying unit 1 comprises an upper fixing plate 11 fixed in the equipment cavity, an upper fixing plate 11, a substrate adsorption plate 3 fixed on the lower surface of the upper fixing plate 11, a working mold adsorption plate 4 and an ultraviolet curing unit 6.
The transfer unit further comprises a fixed plate 12 for moving the stamping unit, a guide rail 13, a moving block 14, a motor 15 and a guide rail fixing block 16. The fixed plate 12 is located on the moving block 14 and moves left and right on the guide rail 13 along with the moving block 14.
The transfer unit further comprises a limit sensor block 17 and an infrared distance detector 18 for determining the position of the moving stamping unit.
Moving the imprint unit 2
The movable imprinting unit 2 is used for adsorbing and fixing the working mold and driving the working mold to move to complete imprinting and aligning actions. The movable imprinting unit 2 includes a work mold adsorption plate 21, a transparent region 211 is disposed in the middle of the work mold adsorption plate 21, a square vacuum groove 212 is disposed on the upper surface of the work mold adsorption plate 21, a vacuum hole 213 is disposed in the vacuum groove, and a work mold positioning groove 214 is disposed outside the square vacuum groove 212.
The work die adsorption plate 21 is connected with a lifting column 23 through a connecting block 22, and a motor 24 enables the lifting column 13 to extend or contract to drive the work die adsorption plate 21 to rise or fall. A displacement platform 25 is arranged below the motor 24 and used for the front and back movement of the work die adsorption plate 21, and a rotating platform 26 is arranged below the displacement platform and used for the rotation of the work die adsorption plate 21;
substrate adsorption plate 3
The substrate adsorption plate 3 is located on the lower surface of the upper fixing plate 11. The substrate adsorption plate 3 can be made of transparent materials such as acrylic. The substrate adsorption plate 3 is used for adsorbing and fixing the substrate 7. The lower surface of the substrate adsorption plate 3 is provided with a circular vacuum groove 32, and the vacuum groove 32 is provided with a vacuum hole 31.
Working die adsorption plate 4
The work die attaching plate 4 is located on the lower surface of the upper fixing plate 11. The material of the adsorption plate of the working mould can be transparent material such as acrylic. The lower surface of the work die suction plate 4 is provided with a square vacuum groove 42, and a vacuum hole 41 is provided in the square vacuum groove 42. The square vacuum groove 42 is provided with a working mold positioning groove 43 on the outer side.
Alignment unit 5
The alignment unit is located above the upper fixing plate 11. The aligning unit 5 can observe the relative position of the alignment mark through the transparent substrate adsorption plate 3, the working mold adsorption plate 4, the substrate 7 and the working mold 8, display the image on the liquid crystal touch screen in real time, and adjust the relative position of the moving embossing unit 2 according to the relative position of the alignment mark. The aligning unit 5 comprises a moving block 51 for moving an aligning device 55 left and right, a limiting block 52, a guide rail 53, a fixed support rod 54 and the aligning device 55;
ultraviolet curing unit 6
The ultraviolet curing unit 6 is located on the lower surface of the upper fixing plate 11. After the double-sided imprinting is finished, the movable imprinting unit 2 drives the imprinted material to move to the position below the ultraviolet curing unit 6, and the ultraviolet curing unit 6 emits ultraviolet light to penetrate through the working mold 8 and the substrate 7 to cure the nano-imprinting colloid.
The substrate 7 is provided with a plurality of holes,
the substrate 7 is provided with alignment marks 71.
The working mould 8 is set in a working mould,
the working die 8 is provided with two. The first working mold 81 is located on the upper surface of the moving imprinting unit 2, and the second working mold 82 is located on the lower surface of the working mold adsorption plate 4. The working mold 8 is provided with alignment marks 83 corresponding to the alignment marks 71.
The working principle and the working process of the invention are as follows:
as shown in fig. 8-14:
and (3) double-sided stamping process:
s1 reset:
the device unit returns to the original position, the movable imprinting unit 2 moves below the substrate adsorption plate 3, and the aligning unit 5 moves above the substrate adsorption plate 3.
S2 feeding:
first working die 81:
the first working mold 81 needs to be fixed on the upper surface of the movable imprinting unit 2, the four corners of the first working mold 81 are aligned with the working mold positioning grooves 214, the square vacuum groove 212 is opened, negative pressure is generated in the vacuum groove to fix the first working mold 81, and the nanostructure surface of the first working mold 81 faces the substrate adsorption plate 3.
Second working mold 82:
the second working mold 82 is fixed on the lower surface of the working mold adsorption plate 4, the structural surface of the second working mold 82 is placed downwards, then the four corners of the second working mold 82 are flush with the working mold positioning grooves 43, the vacuum of the square vacuum groove 42 is opened, the negative pressure is formed in the groove to fix the second working mold 82, and the nano-structural surface of the second working mold 82 faces the movable imprinting unit 2.
S3 dispensing:
and after the feeding is finished, completing the preparation work and starting dispensing. The first dispensing is first performed at the center of the first working mold 81 located on the upper surface of the moving platen 2 (dispensing device is not shown).
S4 first alignment:
and starting the alignment action after the dispensing is finished. The motor 24 drives the lifting column 23 to extend, and the working mold adsorption plate 21 moves upwards to a position where the glue at the center of the first working mold 81 does not contact the substrate 7. The alignment device 55 observes the relative positions of the alignment marks 71 and 83, feeds back and displays information on the liquid crystal touch panel, and adjusts the position of the first working mold by the transfer unit 1, the displacement table 25, and the rotary table 26 based on the relative positions of the alignment marks to align the alignment marks 83 of the first working mold and the alignment marks 71 of the substrate 7 in the vertical direction.
S5 first impression:
after the alignment action is completed, the moving platen unit 2 only keeps moving up and down, and does not move any more in other orientations. The motor 24 drives the lifting column 23 to continue to extend, the work die adsorption plate 21 moves upwards to slowly contact with the substrate 7, the colloid in the center is pushed to expand outwards from the center, and the nano structure is filled.
S6 reset:
after the imprinting operation is completed, the circular vacuum groove 32 is closed and the substrate 7 is released. The imprint unit 2 is moved back to the origin position.
S7 dispensing for the second time:
the movable imprint unit adsorbs and fixes the first working mold 81 and the substrate 7, and is brought back to the original position. The glue is dropped on the center of the upper surface of the substrate 7 for the second dispensing, and the dispensing operation is completed (the dispensing device is not shown).
S8 second alignment:
the motor 15 drives the moving block 14 to move rightwards to the position right below the work die adsorption plate 4, and the infrared distance detector 18 monitors the position of the moving imprinting unit 2 in real time.
The moving block 51 moves the aligning device 55 to the right to the position right above the work die attaching plate 4.
The motor 24 drives the lifting column 23 to extend, and the work die adsorption plate 21 moves upward to a position where the glue in the center of the second work die 82 does not contact the glue on the surface of the substrate 7. The alignment device 55 observes the relative positions of the alignment marks 71 and 83, feeds back and displays information on the liquid crystal touch screen, and adjusts the position of the first working mold by the transfer unit 1, the displacement table 25, and the rotary table 26 according to the relative positions of the alignment marks to align the alignment marks 83 of the first working mold and the second working mold with the alignment marks 71 of the substrate 7 in the vertical direction.
S9 second imprinting:
after the alignment action is completed, the moving platen unit 2 only keeps moving up and down, and does not move any more in other orientations. The motor 24 drives the lifting column 23 to continue to extend, the working mold adsorption plate 21 moves upwards, the colloid on the surface of the substrate 7 slowly contacts with the second working mold 82, the colloid in the center is pushed to expand outwards from the center, and the nano structure is filled.
S10 moving:
after the imprinting is completed, the square vacuum groove 42 is closed, and the second working mold 82 is released. The motor 15 drives the moving block 14 to move to the right, and the infrared distance detector 18 monitors the position of the moving stamping unit 2 in real time.
S11 ultraviolet curing:
when the moving imprinting unit 2 moves to a position just below the ultraviolet curing unit 6, curing of the nanoimprint paste is started. The ultraviolet curing unit 6 emits ultraviolet light to cure the nano imprinting adhesive through the transparent working mold 8 and the substrate 7.
S12 separation:
the square vacuum groove 212 is closed, the second working mold 81 is released, the substrate 7 imprinted together is removed, and the first working mold 81 and the second working mold 82 are separated manually.
Claims (6)
1. The utility model provides a two-sided nanometer impression equipment, is including the transfer unit that is located the equipment cavity and remove the impression unit to and substrate, work mould, its characterized in that: the conveying unit comprises an upper fixing plate fixed in the equipment cavity, and a substrate adsorption plate, a working mold adsorption plate and an ultraviolet curing unit are fixed on the lower surface of the upper fixing plate;
the conveying unit further comprises a fixed plate, a guide rail, a moving block, a motor and a guide rail fixed block, wherein the fixed plate is used for moving the imprinting unit, the fixed plate is located on the moving block, the moving block is sleeved on the guide rail, and the fixed plate can move left and right on the guide rail along with the moving block;
the transmission unit also comprises a limit induction block and an infrared distance detector which are used for determining the position of the movable stamping unit;
the movable stamping unit comprises a working mold adsorption plate, a transparent area is arranged in the middle of the working mold adsorption plate, a square vacuum groove is formed in the upper surface of the working mold adsorption plate, a vacuum hole is formed in the groove of the vacuum groove, and a working mold positioning groove is formed in the outer side of the square vacuum groove;
the working die adsorption plate is connected with the lifting column through a connecting block, and the motor drives the lifting column to extend or contract to drive the working die adsorption plate to rise or fall; and a displacement platform is arranged below the motor and used for moving the adsorption plate of the working mold back and forth, and a rotating platform is arranged below the displacement platform and used for rotating the adsorption plate of the working mold.
2. The double-sided nanoimprinting apparatus of claim 1, characterized in that: the vacuum adsorption device is characterized by further comprising a substrate adsorption plate, wherein the substrate adsorption plate is located on the lower surface of the upper fixing plate and used for adsorbing and fixing the substrate, a circular vacuum groove is formed in the lower surface of the substrate adsorption plate, and a vacuum hole is formed in the vacuum groove.
3. The double-sided nanoimprinting apparatus of claim 1, characterized in that: still include work mould adsorption plate, work mould adsorption plate is located the lower surface of upper fixed plate, the lower surface of work mould adsorption plate is equipped with square vacuum tank, and square vacuum tank inslot is equipped with the vacuum hole, and the square vacuum tank outside is equipped with the work mould constant head tank.
4. The double-sided nanoimprinting apparatus of claim 1, characterized in that: the aligning unit is positioned above the upper fixing plate and comprises a moving block, a limiting block, a guide rail, a fixed supporting rod and an aligning device, wherein the moving block, the limiting block, the guide rail, the fixed supporting rod and the aligning device are used for moving the aligning device left and right;
the aligning unit can observe the relative position of the alignment mark through the transparent substrate adsorption plate, the working mold adsorption plate, the substrate and the working mold, display an image on the liquid crystal touch screen in real time, and adjust the relative position of the movable imprinting unit according to the relative position of the alignment mark.
5. The double-sided nanoimprinting apparatus of claim 1, characterized in that: the nano-imprinting device is characterized by further comprising an ultraviolet curing unit, wherein the ultraviolet curing unit is located on the lower surface of the upper fixing plate and emits ultraviolet light to penetrate through the working mold and the substrate to cure nano-imprinting colloid.
6. The double-sided nanoimprinting apparatus of claim 1, characterized in that: the substrate is provided with an alignment mark, the working mold comprises a first working mold and a second working mold, the first working mold is located on the upper surface of the movable imprinting unit, the second working mold is located on the lower surface of the working mold adsorption plate, and the working mold is provided with an alignment mark corresponding to the alignment mark.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111316485.1A CN113985698A (en) | 2021-11-09 | 2021-11-09 | Double-sided nano-imprinting equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111316485.1A CN113985698A (en) | 2021-11-09 | 2021-11-09 | Double-sided nano-imprinting equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113985698A true CN113985698A (en) | 2022-01-28 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111316485.1A Pending CN113985698A (en) | 2021-11-09 | 2021-11-09 | Double-sided nano-imprinting equipment |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007305647A (en) * | 2006-05-09 | 2007-11-22 | Toppan Printing Co Ltd | Nano-imprint system and nano-imprint method |
| US20110155008A1 (en) * | 2009-12-25 | 2011-06-30 | Hitachi High-Technologies Corporation | Double-sided imprint apparatus |
| WO2017059745A1 (en) * | 2015-10-10 | 2017-04-13 | 青岛理工大学 | Large-area micro-nano patterning apparatus and method |
| US20180339437A1 (en) * | 2017-05-25 | 2018-11-29 | Magic Leap, Inc. | Double-sided imprinting |
| CN214151370U (en) * | 2021-02-18 | 2021-09-07 | 青岛天仁微纳科技有限责任公司 | Nano-imprinting equipment capable of automatically carrying out double-sided imprinting |
-
2021
- 2021-11-09 CN CN202111316485.1A patent/CN113985698A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007305647A (en) * | 2006-05-09 | 2007-11-22 | Toppan Printing Co Ltd | Nano-imprint system and nano-imprint method |
| US20110155008A1 (en) * | 2009-12-25 | 2011-06-30 | Hitachi High-Technologies Corporation | Double-sided imprint apparatus |
| WO2017059745A1 (en) * | 2015-10-10 | 2017-04-13 | 青岛理工大学 | Large-area micro-nano patterning apparatus and method |
| US20180339437A1 (en) * | 2017-05-25 | 2018-11-29 | Magic Leap, Inc. | Double-sided imprinting |
| CN214151370U (en) * | 2021-02-18 | 2021-09-07 | 青岛天仁微纳科技有限责任公司 | Nano-imprinting equipment capable of automatically carrying out double-sided imprinting |
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