CN113964164A - Display substrate, manufacturing method thereof and display device - Google Patents
Display substrate, manufacturing method thereof and display device Download PDFInfo
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- CN113964164A CN113964164A CN202111221865.7A CN202111221865A CN113964164A CN 113964164 A CN113964164 A CN 113964164A CN 202111221865 A CN202111221865 A CN 202111221865A CN 113964164 A CN113964164 A CN 113964164A
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- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
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Abstract
The embodiment of the application provides a display substrate, a manufacturing method of the display substrate and a display device. The display substrate comprises a plurality of sub-pixel units arranged in an array, wherein each sub-pixel unit comprises a light emitting area and a non-light emitting area; the display substrate also comprises a substrate and a filter layer, wherein the filter layer is positioned on one side of the substrate; the part of the filter layer positioned in the non-luminous area comprises a first color filter layer and a second color filter layer which are arranged in a laminated mode, and the colors of the first color filter layer and the second color filter layer are different. The display substrate provided by the embodiment of the application can simultaneously shield light in short wavelength and long wavelength ranges, and can enhance the stability of the thin film transistor.
Description
Technical Field
The application relates to the technical field of display, in particular to a display substrate, a manufacturing method thereof and a display device.
Background
At present, an organic light-Emitting Diode (OLED) display panel has the advantages of high contrast, thin thickness, wide viewing angle, fast response speed, applicability to a flexible panel, and wide application temperature range, and is considered as a new application technology of a next-generation flat panel display.
The organic light emitting diode display panel comprises a plurality of thin film transistors, and the thin film transistors are sensitive to light, so that the stability of the thin film transistors is influenced, and the display performance of the organic light emitting diode display panel is further influenced.
Disclosure of Invention
The application provides a display substrate, a manufacturing method thereof and a display device aiming at the defects of the prior art, and aims to solve the technical problem that the illumination stability of a thin film transistor is poor in the prior art.
In a first aspect, an embodiment of the present application provides a display substrate, including a plurality of sub-pixel units arranged in an array, where each sub-pixel unit includes a light emitting region and a non-light emitting region, and further including:
a substrate base plate;
the filter layer is positioned on one side of the substrate, the part of the filter layer positioned in the non-luminous area comprises a first color filter layer and a second color filter layer which are arranged in a laminated mode, and the colors of the first color filter layer and the second color filter layer are different.
Optionally, the color of the first color filter layer is blue, and the color of the second color filter layer is red;
optionally, the portion of the filter layer located in the light emitting area includes a blue filter layer, a green filter layer, and a red filter layer; the orthographic projection of the substrate base plate and the orthographic projection of the red filter layer on the substrate base plate are not overlapped.
Optionally, the thickness of the blue filter layer, the thickness of the green filter layer and the red filter layer
The orthographic projection of the blue filter layer on the substrate base plate and the thickness of the green filter layer on the filter layer are both first thicknesses;
the thickness of the first color filter layer is a second thickness, and the thickness of the second color filter layer is a third thickness;
the second thickness is equal to the third thickness, and the sum of the second thickness and the third thickness is equal to the first thickness.
Optionally, the display substrate further includes a thin film transistor located on one side of the filter layer close to the substrate, and an orthographic projection of the thin film transistor on the substrate is located in the non-light-emitting region;
the thin film transistor comprises a shading layer positioned on one side of the substrate, and a semiconductor layer, a grid layer and a source drain layer which are sequentially positioned on one side, far away from the substrate, of the shading layer.
Optionally, the display substrate further comprises: the electroluminescent layer is positioned on one side of the substrate base plate, and the electroluminescent layer and the second electrode layer are sequentially positioned on one side of the first electrode layer, which is far away from the substrate base plate;
the filter layer is located on one side, close to the substrate base plate, of the first electrode layer, or the filter layer is located on one side, far away from the substrate base plate, of the second electrode layer.
In a second aspect, an embodiment of the present application provides a display device, including the display substrate of the first aspect.
In a third aspect, an embodiment of the present application provides a method for manufacturing a display substrate, where the display substrate includes a plurality of sub-pixel units arranged in an array, and each sub-pixel unit includes a light-emitting area and a non-light-emitting area, and includes:
providing a substrate base plate;
and manufacturing a filter layer on one side of the substrate, wherein the part of the filter layer positioned in the non-luminous area comprises a first color filter layer and a second color filter layer which are arranged in a laminated manner, and the colors of the first color filter layer and the second color filter layer are different.
Optionally, the manufacturing the filter layer on one side of the substrate includes:
forming a blue color resistance layer on one side of the substrate, and performing a composition process by adopting a half-tone mask to form a blue filter layer and a first color filter layer, wherein the orthographic projection of the blue filter layer on the substrate is positioned in the light emitting region;
forming a green color resistance layer on one side of the substrate base plate, forming a green filter layer through a composition process, wherein the orthographic projection of the green filter layer on the substrate base plate is positioned in the light emitting area, and the orthographic projection of the green filter layer on the substrate base plate is not overlapped with the orthographic projection of the blue filter layer on the substrate base plate;
forming a red color resistance layer on one side of the substrate, and performing a composition process by adopting a half-tone mask to form a red filter layer and a second color filter layer, wherein the orthographic projection of the red filter layer on the substrate is positioned in the light emitting region, and the orthographic projection of the blue filter layer on the substrate, the orthographic projection of the green filter layer on the substrate and the orthographic projection of the red filter layer on the substrate are not overlapped with each other.
Optionally, the manufacturing method further includes:
manufacturing a flat layer on one side of the filter layer away from the substrate;
and sequentially manufacturing a first electrode layer, an electroluminescent layer and a second electrode layer on one side of the flat layer, which is far away from the substrate base plate.
The beneficial technical effects brought by the technical scheme provided by the embodiment of the application comprise:
in the embodiment of the invention, the non-luminous area comprises the first color filter layer and the second color filter layer which are arranged in a laminated manner, and the colors of the first color filter layer and the second color filter layer are different, so that when light irradiates the display substrate, the part of the filter layer positioned in the non-luminous area can simultaneously play a role in blocking light in different wavelength ranges, and the influence of illumination on the stability of the thin film transistor is reduced or eliminated; for example, the color of the first color filter layer may be blue, and may block light in a long wavelength (570nm-780nm) range; the color of the second color filter layer can be red, and can block light in a short wavelength range (380nm-570nm), so that the embodiment of the invention utilizes the double-layer superposition of the first color filter layer and the second color filter layer to shield light, thereby simultaneously shielding light in the short wavelength range and the long wavelength range, and ensuring the stability of the thin film transistor.
Additional aspects and advantages of the present application will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the present application.
Drawings
The foregoing and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
FIG. 1 is a schematic structural diagram of a display substrate according to an embodiment of the present disclosure;
FIG. 2 is a schematic structural diagram of a sub-pixel unit according to an embodiment of the present disclosure;
fig. 3 is a schematic structural diagram of a thin film transistor according to an embodiment of the present disclosure;
FIG. 4 is a schematic flow chart illustrating a method for fabricating a display substrate according to an embodiment of the present disclosure;
fig. 5 is a schematic structural diagram of a manufacturing process of a filter layer according to an embodiment of the present disclosure.
In the figure:
1-a display substrate; 11-a sub-pixel unit; 111-a light emitting region; 112-a non-light emitting area; 12-a substrate base plate; 13-a filter layer; 131-a first color filter layer; 132-a second color filter layer; 133-blue filter layer; 134-green filter layer; 135-a red filter layer; 14-a thin film transistor; 141-a light-shielding layer; 142-a semiconductor layer; 143-gate layer; 144-source drain layer; 145-a buffer layer; 146-a gate insulating layer; 147-an interlayer insulating layer; 148-a passivation layer; 15-flat layer.
Detailed Description
Reference will now be made in detail to the present application, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar parts or parts having the same or similar functions throughout. In addition, if a detailed description of the known art is not necessary for illustrating the features of the present application, it is omitted. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present application and are not to be construed as limiting the present application.
It will be understood by those within the art that, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the prior art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
As used herein, the singular forms "a", "an", "the" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof. It will be understood that when an element is referred to as being "connected" or "coupled" to another element, it can be directly connected or coupled to the other element or intervening elements may also be present. Further, "connected" or "coupled" as used herein may include wirelessly connected or wirelessly coupled. As used herein, the term "and/or" includes all or any element and all combinations of one or more of the associated listed items.
Thin film transistors in an organic light emitting diode display panel are sensitive to light, which affects the stability thereof. In order to reduce the influence of light on the stability of the thin film transistor, a red color film layer is usually formed on the thin film transistor, but the red color film layer can only block light in a short wavelength range (380nm-570nm) and has no blocking effect on light in a long wavelength range (570nm-780nm), so that the stability of the thin film transistor cannot be improved to a great extent.
In view of the above technical problems, the present application provides a display substrate, a display device, and a method for manufacturing the display substrate to enhance the stability of a thin film transistor.
In a first aspect, as shown in fig. 1, the present application provides a display substrate 1, which includes a plurality of sub-pixel units 11 arranged in an array, where each sub-pixel unit 11 includes an emitting region 111 and a non-emitting region 112, and specifically, each sub-pixel unit 11 includes an emitting region 111 and a non-emitting region 112 located around the emitting region 111 and adjacent to the emitting region 111.
Optionally, as shown in fig. 2, the display substrate 1 further includes a substrate 12 and a filter layer 13, and the filter layer 13 is located on one side of the substrate 12; the portion of the filter layer 13 in the non-light emitting region 112 includes a first color filter layer 131 and a second color filter layer 132 which are stacked, and the first color filter layer 131 and the second color filter layer 132 are different in color.
In the embodiment of the invention, since the non-light-emitting region 112 includes the first color filter layer 131 and the second color filter layer 132 which are stacked, and the colors of the first color filter layer 131 and the second color filter layer 132 are different, when light irradiates the display substrate, the portion of the filter layer in the non-light-emitting region can simultaneously function as blocking light in different wavelength ranges, thereby reducing or eliminating the influence of light on the stability of the thin film transistor.
Alternatively, the color of the first color filter layer 131 is blue, and the color of the second color filter layer 132 is red.
The first color filter layer 131 is blue in color, and can block light in a long wavelength range (570nm to 780 nm); the color of the second color filter layer 132 is red, which can block light in the short wavelength range (380nm-570nm), and thus the embodiment of the invention utilizes the double-layer overlapping of the first color filter layer 131 and the second color filter layer 132 to shield light, thereby achieving the purpose of shielding light in the short wavelength range and the long wavelength range at the same time, and ensuring the stability of the thin film transistor.
As shown in fig. 2, the portion of the filter layer 13 in the light emitting region 111 includes a blue filter layer 133, a green filter layer 134, and a red filter layer 135; the orthographic projection of the blue filter layer 133 on the base substrate 12, the orthographic projection of the green filter layer 134 on the base substrate 12, and the orthographic projection of the red filter layer 135 on the base substrate 12 do not overlap each other, that is: an orthogonal projection of the blue filter layer 133 on the base substrate 12 does not overlap with an orthogonal projection of the green filter layer 134 on the base substrate 12 and an orthogonal projection of the red filter layer 135 on the base substrate 12, an orthogonal projection of the green filter layer 134 on the base substrate 12 does not overlap with an orthogonal projection of the blue filter layer 133 on the base substrate 12 and an orthogonal projection of the red filter layer 135 on the base substrate 12, and an orthogonal projection of the red filter layer 135 on the base substrate 12 does not overlap with an orthogonal projection of the blue filter layer 133 on the base substrate 12 and an orthogonal projection of the green filter layer 134 on the base substrate 12.
Alternatively, as shown in fig. 2, the thickness of the blue filter layer 133, the thickness of the green filter layer 134, and the thickness of the red filter layer 135 are all first thicknesses, i.e., the thickness of the blue filter layer 133, the thickness of the green filter layer 134, and the thickness of the red filter layer 135 are all equal; the thickness of the first color filter layer 131 is a second thickness, and the thickness of the second color filter layer 132 is a third thickness; the second thickness is equal to the third thickness, and the sum of the second thickness and the third thickness is equal to the first thickness, that is, the thickness of the first color filter layer 131 is half of the thickness of the blue filter layer 133.
In the embodiment of the present invention, the sum of the first thickness of the portion of the filter layer 13 located in the light emitting region 111 and the second thickness and the third thickness of the portion located in the non-light emitting region 112 are equal, so that the flatness of the display substrate is ensured on the basis of achieving the effect of shielding both short wavelength and long wavelength light, and the subsequent film layer is conveniently manufactured.
Optionally, the display substrate 1 in the embodiment of the present application further includes a thin film transistor located on the side of the filter layer 13 close to the base substrate 12, where when the display substrate 1 is a bottom emission type display substrate, an orthographic projection of the thin film transistor on the base substrate 12 is located in a non-light-emitting region, and when the display substrate 1 is a top emission type display substrate, the orthographic projection of the thin film transistor on the base substrate 12 may be located in both the non-light-emitting region and the light-emitting region.
Referring to fig. 3, the thin film transistor 14 includes a light-shielding layer 141 on a side of the substrate 12, and a semiconductor layer 142, a gate layer 143, and a source-drain layer 144 in this order on a side of the light-shielding layer 141 away from the substrate 12.
With continued reference to fig. 3, the tft 14 further includes a buffer layer 145 on a side of the semiconductor layer 142 adjacent to the light-shielding layer 141, a gate insulating layer 146 on a side of the gate layer 143 adjacent to the semiconductor layer 142, an interlayer insulating layer 147 on a side of the source-drain layer 144 adjacent to the gate layer 143, and a passivation layer 148 on a side of the source-drain layer 144 away from the gate layer 143.
Specifically, the source drain layer 144 is electrically connected to the semiconductor layer 142 through a via hole penetrating the interlayer insulating layer 147. In the embodiment of the present application, a top gate type thin film transistor is taken as an example for description, but in actual design, the thin film transistor may also be a bottom gate type thin film transistor or other types of thin film transistors; when the thin film transistor is a top gate thin film transistor, as shown in fig. 3, the ambient light incident from the lower side of the substrate is shielded by the light shielding layer 141, and the ambient light incident from the upper side of the substrate is shielded by the portion of the filter layer located in the non-light emitting region in the embodiment of the present application, so that the irradiation of the ambient light to the semiconductor layer 142 can be avoided or reduced, and the stability of the thin film transistor is further ensured.
Optionally, the display substrate 1 in the embodiment of the present application further includes: a first electrode layer positioned on one side of the substrate base plate 12, an electroluminescent layer and a second electrode layer which are sequentially positioned on one side of the first electrode layer far away from the substrate base plate 12; the filter layer 13 is positioned on one side of the first electrode layer close to the substrate base plate 12, or the filter layer 13 is positioned on one side of the second electrode layer far from the substrate base plate 12; specifically, when the display substrate 1 is a bottom emission type display substrate, the filter layer 13 is located on the side of the first electrode layer close to the base substrate 12; when the display substrate 1 is a top emission type display substrate, the filter layer 13 is located on the side of the second electrode layer away from the substrate 12.
Specifically, the first electrode may be a transparent electrode, such as ITO (Indium tin oxide), the second electrode may be a metal electrode, the first electrode may be an anode or a cathode, and the second electrode may be a cathode or an anode.
Optionally, the light emitted by the electroluminescent layer is the first primary color light, the second primary color light and the third primary color light, or the light emitted by the electroluminescent layer is the first primary color light, the second primary color light, the third primary color light and white light.
The colors of the first primary color, the second primary color and the third primary color are different from each other, and may be red, blue, green, or other combinations.
It should be noted that, the light emitted by the electroluminescent layer corresponds to the color of the portion of the filter layer 13 in the light emitting region 111, specifically, when the first, second and third primary colors of the electroluminescent layer are respectively blue, green and red, the position of the light emitting layer emitting the first primary color corresponds to the position of the blue filter layer, the position of the light emitting layer emitting the second primary color corresponds to the position of the green filter layer, the position of the light emitting layer emitting the third primary color corresponds to the position of the red filter layer, and when the light emitted by the electroluminescent layer is white, the white corresponds to the empty area of the filter layer 13 in the light emitting region 111.
Based on the same inventive concept, in a second aspect, the embodiments of the present application disclose a display device comprising the display substrate 1 of the first aspect.
Since the display device includes the display substrate 1 of the first aspect, the beneficial effects of the display device are the same as those of the display substrate 1 of the first aspect, and are not repeated herein.
Based on the same inventive concept, in a third aspect, the present application discloses a method for manufacturing a display substrate, where a display substrate 1 includes a plurality of sub-pixel units 11 arranged in an array, and each sub-pixel unit 11 includes an emitting region 111 and a non-emitting region 112, as shown in fig. 4, the method for manufacturing the display substrate includes:
s1: providing a substrate 12;
s2: the filter layer 13 is formed on the substrate 12 side, and a portion of the filter layer 13 located in the non-light-emitting region 112 includes a first color filter layer 131 and a second color filter layer 132 which are stacked, and the first color filter layer 131 and the second color filter layer 132 are different in color.
Specifically, the color of the first color filter layer 131 is blue, and the color of the second color filter layer 132 is red.
Alternatively, the filter layer 13 is formed on the substrate 12 side, and includes:
forming a blue color resistance layer on one side of a substrate, and performing a composition process by adopting a half-tone mask to form a blue filter layer and a first color filter layer, wherein the orthographic projection of the blue filter layer on the substrate is positioned in a light emitting region;
forming a green color resistance layer on one side of the substrate, forming a green filter layer through a composition process, wherein the orthographic projection of the green filter layer on the substrate is positioned in the light emitting region, and the orthographic projection of the green filter layer on the substrate is not overlapped with the orthographic projection of the blue filter layer on the substrate;
a red color resistance layer is formed on one side of a substrate, a composition process is carried out by adopting a half-tone mask plate to form a red filter layer and a second color filter layer, the orthographic projection of the red filter layer on the substrate is positioned in a light emitting area, the orthographic projection of the blue filter layer on the substrate, the orthographic projection of the green filter layer on the substrate and the orthographic projection of the red filter layer on the substrate are not overlapped.
A detailed process of fabricating the filter layer 13 on the substrate 12 side according to the embodiment of the present application will be described in detail below with reference to the drawings.
As shown in fig. 5(a), a blue color resist layer is formed on one side of the substrate 12, and a patterning process is performed using a halftone mask to form a blue filter layer 133 and a first color filter layer 131, wherein an orthogonal projection of the blue filter layer 133 on the substrate 12 is located in the light-emitting region 111, an orthogonal projection of the first color filter layer 131 on the substrate 12 is located in the non-light-emitting region 112, the color of the first color filter layer 131 is blue, and the thickness of the first color filter layer 131 is half of the thickness of the blue filter layer 133.
As shown in fig. 5(b), a green color resist layer is formed on the substrate 12 side, a green filter layer 134 is formed by a patterning process, an orthographic projection of the green filter layer 134 on the substrate 12 is located in the light emitting region 111, and an orthographic projection of the green filter layer 134 on the substrate 12 and an orthographic projection of the blue filter layer 133 on the substrate 12 do not overlap.
As shown in fig. 5(c), a red color resist layer is formed on one side of the substrate 12, and a patterning process is performed by using a halftone mask to form a red filter layer 135 and a second color filter layer 132, wherein an orthogonal projection of the red filter layer 135 on the substrate 12 is located in the light emitting region 111, and an orthogonal projection of the blue filter layer 133 on the substrate 12, an orthogonal projection of the green filter layer 134 on the substrate 12, and an orthogonal projection of the red filter layer 135 on the substrate 12 do not overlap each other; the orthographic projection of the second color filter layer 132 on the substrate 12 is located in the non-light emitting region 112, the color of the second color filter layer 132 is red, the thickness of the second color filter layer 132 is half of the thickness of the red filter layer 135, and the thicknesses of the first color filter layer 131 and the second color filter layer 132 are equal.
Optionally, when the display substrate in the embodiment of the present application is a bottom emission type display substrate, the method for manufacturing the display substrate further includes:
manufacturing a flat layer on one side of the filter layer away from the substrate;
and sequentially manufacturing a first electrode layer, an electroluminescent layer and a second electrode layer on one side of the flat layer, which is far away from the substrate base plate.
Specifically, as shown in fig. 5(d), a planarization layer 15 is formed on the side of the filter layer 13 away from the substrate 12, and the specific method for forming the planarization layer 15 is the same as the prior art, and is not described herein again.
Specifically, after the flat layer 15 is manufactured, a layer of ITO is manufactured as a first electrode layer on a side of the flat layer 15 away from the substrate 12, then a pixel defining layer is manufactured, and then an electroluminescent layer and a second electrode layer are manufactured.
In addition, the manufacturing method of the display substrate in the embodiment of the application further includes: before the filter layer 13 is manufactured, a pixel circuit layer is first manufactured on a substrate base substrate, the pixel circuit layer includes a plurality of thin film transistors, a specific structure of the thin film transistors can be referred to as shown in fig. 3, and a specific manufacturing method of the pixel circuit layer is similar to that of the prior art, and is not described herein again.
By applying the embodiment of the application, at least the following beneficial effects can be realized:
1. in the embodiment of the invention, the non-light-emitting area comprises the first color filter layer and the second color filter layer which are arranged in a laminated mode, and the colors of the first color filter layer and the second color filter layer are different, so that when light irradiates the display substrate, the part, located in the non-light-emitting area, of the filter layers can simultaneously play a role in blocking light in different wavelength ranges, and the influence of the light on the stability of the thin film transistor is reduced or eliminated.
2. In the embodiment of the invention, the sum of the first thickness of the part of the filter layer positioned in the luminous area and the second thickness and the third thickness of the part of the filter layer positioned in the non-luminous area is equal, so that the flatness of the display substrate is ensured on the basis of achieving the effect of shielding both short-wavelength light and long-wavelength light, and the subsequent film layer is convenient to manufacture.
Those of skill in the art will appreciate that the various operations, methods, steps in the processes, acts, or solutions discussed in this application can be interchanged, modified, combined, or eliminated. Further, other steps, measures, or schemes in various operations, methods, or flows that have been discussed in this application can be alternated, altered, rearranged, broken down, combined, or deleted. Further, steps, measures, schemes in the prior art having various operations, methods, procedures disclosed in the present application may also be alternated, modified, rearranged, decomposed, combined, or deleted.
In the description of the present application, it is to be understood that the terms "center", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience in describing the present application and simplifying the description, but do not indicate or imply that the referred device or element must have a particular orientation, be constructed in a particular orientation, and be operated, and thus should not be construed as limiting the present application.
The terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless otherwise specified.
In the description of the present application, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood in a specific case by those of ordinary skill in the art.
In the description herein, particular features, structures, materials, or characteristics may be combined in any suitable manner in any one or more embodiments or examples.
It should be understood that, although the steps in the flowcharts of the figures are shown in order as indicated by the arrows, the steps are not necessarily performed in order as indicated by the arrows. The steps are not performed in the exact order shown and may be performed in other orders unless explicitly stated herein. Moreover, at least a portion of the steps in the flow chart of the figure may include multiple sub-steps or multiple stages, which are not necessarily performed at the same time, but may be performed at different times, which are not necessarily performed in sequence, but may be performed alternately or alternately with other steps or at least a portion of the sub-steps or stages of other steps.
The foregoing is only a partial embodiment of the present application, and it should be noted that, for those skilled in the art, several modifications and decorations can be made without departing from the principle of the present application, and these modifications and decorations should also be regarded as the protection scope of the present application.
Claims (10)
1. A display substrate comprises a plurality of sub-pixel units arranged in an array, wherein each sub-pixel unit comprises a light emitting area and a non-light emitting area, and the display substrate is characterized by further comprising:
a substrate base plate;
the filter layer is positioned on one side of the substrate, the part of the filter layer positioned in the non-luminous area comprises a first color filter layer and a second color filter layer which are arranged in a laminated mode, and the colors of the first color filter layer and the second color filter layer are different.
2. The display substrate of claim 1, wherein the first color filter layer has a blue color and the second color filter layer has a red color.
3. The display substrate according to claim 1, wherein a portion of the filter layer in the light emitting region comprises a blue filter layer, a green filter layer, and a red filter layer;
the orthographic projection of the blue filter layer on the substrate base plate, the orthographic projection of the green filter layer on the substrate base plate and the orthographic projection of the red filter layer on the substrate base plate are not overlapped.
4. The display substrate according to claim 3, wherein the thickness of the blue filter layer, the thickness of the green filter layer, and the thickness of the red filter layer are all a first thickness;
the thickness of the first color filter layer is a second thickness, and the thickness of the second color filter layer is a third thickness;
the second thickness is equal to the third thickness, and the sum of the second thickness and the third thickness is equal to the first thickness.
5. The display substrate according to claim 1, further comprising a thin film transistor on a side of the filter layer adjacent to the substrate;
the thin film transistor comprises a shading layer positioned on one side of the substrate, and a semiconductor layer, a grid layer and a source drain layer which are sequentially positioned on one side, far away from the substrate, of the shading layer.
6. The display substrate according to any one of claims 1 to 5, further comprising: the electroluminescent layer is positioned on one side of the substrate base plate, and the electroluminescent layer and the second electrode layer are sequentially positioned on one side of the first electrode layer, which is far away from the substrate base plate;
the filter layer is located on one side, close to the substrate base plate, of the first electrode layer, or the filter layer is located on one side, far away from the substrate base plate, of the second electrode layer.
7. A display device comprising the display substrate according to any one of claims 1 to 6.
8. A manufacturing method of a display substrate, wherein the display substrate comprises a plurality of sub-pixel units arranged in an array, each sub-pixel unit comprises a luminous area and a non-luminous area, and the method is characterized by comprising the following steps:
providing a substrate base plate;
and manufacturing a filter layer on one side of the substrate, wherein the part of the filter layer positioned in the non-luminous area comprises a first color filter layer and a second color filter layer which are arranged in a laminated manner, and the colors of the first color filter layer and the second color filter layer are different.
9. The method according to claim 8, wherein the step of forming a filter layer on the substrate comprises:
forming a blue color resistance layer on one side of the substrate, and performing a composition process by adopting a half-tone mask to form a blue filter layer and a first color filter layer, wherein the orthographic projection of the blue filter layer on the substrate is positioned in the light emitting region;
forming a green color resistance layer on one side of the substrate base plate, forming a green filter layer through a composition process, wherein the orthographic projection of the green filter layer on the substrate base plate is positioned in the light emitting area, and the orthographic projection of the green filter layer on the substrate base plate is not overlapped with the orthographic projection of the blue filter layer on the substrate base plate;
forming a red color resistance layer on one side of the substrate, and performing a composition process by adopting a half-tone mask to form a red filter layer and a second color filter layer, wherein the orthographic projection of the red filter layer on the substrate is positioned in the light emitting region, and the orthographic projection of the blue filter layer on the substrate, the orthographic projection of the green filter layer on the substrate and the orthographic projection of the red filter layer on the substrate are not overlapped with each other.
10. The method of manufacturing according to claim 9, further comprising:
manufacturing a flat layer on one side of the filter layer away from the substrate;
and sequentially manufacturing a first electrode layer, an electroluminescent layer and a second electrode layer on one side of the flat layer, which is far away from the substrate base plate.
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| CN115172559A (en) * | 2022-06-30 | 2022-10-11 | 厦门天马微电子有限公司 | Display panel and display device |
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| CN115172559A (en) * | 2022-06-30 | 2022-10-11 | 厦门天马微电子有限公司 | Display panel and display device |
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