CN113960897B - Developing device and method - Google Patents
Developing device and method Download PDFInfo
- Publication number
- CN113960897B CN113960897B CN202111291709.8A CN202111291709A CN113960897B CN 113960897 B CN113960897 B CN 113960897B CN 202111291709 A CN202111291709 A CN 202111291709A CN 113960897 B CN113960897 B CN 113960897B
- Authority
- CN
- China
- Prior art keywords
- developing
- storage tank
- tank
- developing solution
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention provides a developing device and a developing method. In the developing process, a liquid inlet pipe valve of the developing tank is opened, and a circulating pump extracts developing liquid from the storage tank to enter the developing tank, so that the developing liquid gradually covers the substrate to be developed. When the liquid surface reaches the overflow pipe, the developer returns from the overflow pipe to the storage tank, and circulates in the developer tank and the storage tank. After development is finished, the liquid inlet pipe valve of the developing tank is closed, and the liquid outlet pipe valve is opened. The developing solution rapidly returns to the storage tank through the liquid discharge pipe and is used for next development. The storage tank is provided with a developer concentration detector, and the inflow of the developer stock solution and the outflow of the old developer are controlled in a closed loop manner, so that the concentration of the developer is maintained within a set range. The temperature control unit is connected with the storage tank. The developing solution of the invention contacts each position on the surface of the substrate to be developed simultaneously, and maintains stable concentration and temperature of the developing solution, without completely replacing the developing solution each time, thereby improving the developing efficiency, uniformity and stability.
Description
Technical Field
The invention belongs to the technical field of micro-nano manufacturing, and particularly relates to a developing device and a developing method.
Background
In the field of micro-nano fabrication, micro-nano structures on the surface of a substrate are typically formed by exposure, development and etching. Along with the smaller and smaller feature size of the micro-nano structure, the shape requirement is higher and higher, and the development link is also higher and higher in the micro-nano manufacturing process. Development uniformity, reaction time, and development rate all affect the shape quality of the surface microstructure.
The developing nozzle described in CN103809390a is horizontally stretched by moving a fixing bracket adjusting block on a developing tube fixing bracket, and a plurality of spray holes are uniformly distributed on the developing nozzle, so that the residence time of the developing solution on the wafer is not different, the wafer is uniformly covered, and the developing uniformity is provided. The device and the method in CN104849968A adopt the scheme of simultaneously supplying the developing solutions with different concentrations, so that the quality of the developing solution reacted off by the whole developing substrate surface is consistent, and a single developing solution circulating solution supply system is adopted, so that a solution supply tank is not required to be switched, and the developing efficiency is improved.
Disclosure of Invention
The invention provides a developing device and a developing method. In the developing process, the developing solution gradually covers the surface to be developed from the back surface of the substrate and circulates. The developing solution simultaneously contacts each position on the surface of the substrate to be developed, and the concentration and the temperature of the developing solution are kept stable.
To achieve the object, the present invention provides a developing device comprising: a developing tank, a developing solution storage tank and a temperature control unit.
The developing tank is used for placing a substrate to be developed, and the developing solution is contacted with the substrate to be developed after entering;
the developing solution storage tank is used for storing developing solution, and the developing solution can circularly flow in the developing tank and the storage tank;
and a temperature control unit for controlling the temperature of the developing solution.
The substrate to be developed is placed on the substrate holder in the developing tank. During development, the circulating pump continuously pumps the developing solution from the storage tank to the developing tank. Along with the rising of the liquid level, the developing solution gradually covers the surface of the substrate to be developed, and a developing reaction occurs. Finally, the liquid level contacts the overflow pipe on the side wall of the developing tank, and the developing solution returns to the storage tank from the developing tank and continuously circulates in the two tank bodies, so that the local concentration drop of the developing solution on the surface of the substrate to be developed is avoided.
After development is finished, a circulating pump in the developing tank is closed, a drain pipe valve is opened, and the developing solution rapidly returns to the storage tank from the developing tank. The storage tank is provided with a developing solution concentration detector for detecting the developing solution concentration C in real time. When the concentration of the developing solution is reduced to the set range C L The valve of the liquid inlet tube valve of the developing solution in the storage tank is opened, unused developing solution enters the storage tank, the valve of the liquid outlet tube valve of the old developing solution is opened, the old developing solution is discharged out of the storage tank, and the concentration of the developing solution is increased until reaching a preset concentration value C U . At this time, the developer liquid inlet pipe and the drain pipe valve are closed. The circulating pump, the liquid inlet pipe and the liquid outlet pipe valve in the developing tank and the liquid inlet pipe and the liquid outlet pipe valve in the storage tank can be accurately controlled through an automatic system.
The temperature control unit is arranged below the storage tank, so that the temperature of the developing solution is stabilized in a certain range, and the consistency of the developing environment is ensured.
Further, the apparatus is divided into three parts of a developing tank, a developing solution storage tank, and a temperature control unit. The developing tank is connected with the storage tank, and the developing solution can circulate in the two tank bodies. The temperature control unit is connected with the storage tank and can control the temperature of the developing solution in the storage tank.
Further, the developing tank in the device is provided with a substrate fixing device, so that the position and the posture of the substrate are kept unchanged in the developing process.
Further, a circulation pump is installed in the developing tank in the apparatus, the developing solution can be pumped from the storage tank to the developing tank, and the liquid inlet is arranged below the substrate fixing position.
Further, the developing tank in the device is provided with an overflow pipe on the side surface, the overflow pipe is connected with the storage tank, and the pipe orifice is higher than the substrate fixing position. When the liquid level is higher than the fixed height of the substrate, the developing solution enters the storage tank through the overflow pipe. The overflow pipe can be a plurality of pipelines which are symmetrically distributed around the substrate to be developed, or can be in other modes such as annular grooving and the like, so long as the developing solution overflows uniformly along all directions.
Further, a liquid discharge pipe is arranged on the bottom surface of the developing tank in the device, and after development is finished, the developing solution can be rapidly discharged from the developing tank to the storage tank.
Further, the storage tank in the device is internally provided with a developing solution concentration detector, so that the developing solution concentration can be detected in real time.
Further, a storage tank in the device is internally provided with a developing solution inlet pipe and a liquid outlet pipe. New developing solution enters the storage tank through the liquid inlet pipe, and old developing solution is discharged through the liquid discharge pipe. The concentration of the developing solution is controlled by controlling the inlet amount of the new developing solution.
Further, a temperature control unit in the device is connected with the storage tank and can control the temperature of the developing solution in the storage tank.
Further, all pipeline valves in the circulating pump, the developing tank and the storage tank in the device can be accurately controlled through an automatic system. Therefore, the contact time of the developer with the substrate can be strictly controlled.
In order to achieve the object, the invention provides a developing method, which fixes a substrate to be developed in a developing tank, and a developing solution enters the developing tank from the lower part of the substrate to gradually cover the surface of the substrate to start developing. The developer solution continuously flows, and the concentration of the developer solution on the surface of the substrate is kept relatively stable. The method comprises the following specific steps:
step 1: fixing the substrate to be developed on a developing tank substrate fixing device, wherein the surface to be developed is parallel to the horizontal plane;
step 2: the developing solution enters the developing tank from below the fixed height of the substrate, the liquid level gradually rises, and finally the liquid level completely covers the surface of the substrate to be developed;
step 3: the developer returns to the storage tank from the overflow pipe of the developing tank and returns to the developing tank from the storage tank, and continuously and circularly flows. The temperature control unit maintains the temperature of the developing solution stable within a certain range.
Step 4: the concentration detector in the developer solution storage tank detects the concentration of the developer solution in real time. When the concentration of the developing solution is reduced to a concentration value P1, new developing solution enters the storage tank, and old developing solution is discharged from the storage tank until the concentration of the developing solution returns to a concentration value P2. The concentration value P2 is higher than the concentration value P1.
Step 5: after the preset development time is reached, the developer returns to the storage tank from the liquid discharge pipe of the development tank, and the subsequent development is recycled.
Compared with the prior art, the invention has the advantages that:
(1) The developing solution of the invention contacts and breaks away from the surface of the substrate to be developed simultaneously, and the developing time at different positions is kept consistent;
(2) The developing solution continuously and circularly flows, so that the concentration distribution of the developing solution on the surface of the substrate to be developed is kept consistent;
(3) The developing solution provided by the invention has the advantages of constant temperature, real-time concentration monitoring, closed-loop control and stable developing rate.
Drawings
Fig. 1 is a schematic view of a developing device according to the present invention.
FIG. 2 is a flow chart of a developing method according to the present invention.
Fig. 3 is a control flow chart of the present invention.
In the figure: 1 is a substrate to be developed; 2 is a substrate fixing device; 3 is an overflow pipe; 4 is a circulating pump; 5 is a developing tank liquid inlet pipe; 6 is a liquid inlet pipe of the circulating pump; 7 is a liquid discharge pipe of the developing tank; 8 is a liquid inlet pipe of the storage tank; 9 is a liquid discharge pipe of the storage tank; 10 is a developer concentration detector; 11 is a temperature control unit.
Detailed Description
The present invention will be further described in detail below with reference to specific embodiments and with reference to the accompanying drawings, in order to make the objects, technical solutions and advantages of the present invention more apparent.
Fig. 1 is a schematic view showing a structure of a developing device of the present invention, the device comprising: a developing tank, a developing solution storage tank and a temperature control unit. The substrate 1 to be developed is placed on the substrate fixture 2. In the development, the circulation pump 4 continuously pumps the developer from the storage tank to the developing tank. As the liquid level rises, the developing solution gradually covers the surface of the substrate 1 to be developed, and a developing reaction occurs. Along with the rising of the liquid level, the liquid level contacts the overflow pipe 3 on the side wall of the developing tank, and the developing solution returns to the storage tank from the developing tank and continuously circulates in the two tank bodies, so that the local concentration of the developing solution on the surface of the substrate 1 to be developed is prevented from being reduced.
After the development is finished, the circulating pump 4 in the development tank is closed, the valve of the discharge pipe 7 of the development tank is opened, and the development liquid rapidly returns to the storage tank from the development tank. The storage tank is provided with a developer concentration detector 10 for detecting the concentration of the developer in real time. When the concentration of the developing solution is reduced to a set range, the valve of the liquid inlet pipe 8 of the storage tank is opened, unused developing solution enters the storage tank, the valve of the liquid outlet pipe 9 of the storage tank is opened, old developing solution is discharged out of the storage tank, and the concentration of the developing solution is increased until reaching a preset concentration value. At this time, the valves of the reservoir inlet pipe 8 and the reservoir outlet pipe 9 are closed. The valves of the circulating pump 4, the developing tank liquid inlet pipe 5, the developing tank liquid discharge pipe 7, the storage tank liquid inlet pipe 8 and the storage tank liquid discharge pipe 9 can be accurately controlled through an automatic system. The temperature control unit 11 is arranged below the storage tank, so that the temperature of the developing solution is stabilized in a certain range, and the consistency of the developing environment is ensured.
The substrate fixing device 2 ensures that the developing surface is parallel to the horizontal plane after the substrate 1 to be developed is loaded. The height of the mouth of the liquid inlet pipe 5 of the developing tank is required to be lower than the surface of the substrate 1 to be developed after clamping, so that the liquid level of the developing liquid is gradually raised, and meanwhile, the liquid level of the developing liquid contacts the surface of the substrate 1 to be developed, thereby ensuring the developing uniformity. The overflow pipe 3 in the developing tank may be a plurality of pipes uniformly distributed around the substrate 1 to be developed, or may be in other forms such as annular grooves, so long as it can ensure uniform flow in all directions when the developer overflows. The developer tank drain pipe 7 is installed on the bottom surface of the developer tank, so that the developer solution can quickly return to the storage tank. The storage tank is provided with a developer concentration detector 10 for detecting the concentration of the developer in real time. New developing solution enters the storage tank through the liquid inlet pipe 8 of the storage tank, and old developing solution flows out of the storage tank through the liquid outlet pipe 9 of the storage tank. The temperature control unit 11 is connected to the storage tank to maintain the temperature of the developer, and may be a constant temperature water chamber, a constant temperature air chamber, or other temperature control devices.
The valves of the circulating pump 4 and the liquid inlet pipe 5 of the developing tank are precisely controlled by an automatic system. Therefore, the contact time of the developer with the substrate can be strictly controlled. By controlling the opening times of the reservoir inlet pipe 8 and the reservoir outlet pipe 9, the developer concentration can be maintained in a certain range.
The control flow is shown in fig. 3, and the specific steps are as follows:
step (1), developing is started;
step (2), judging the developing concentration C is less than or equal to C L The method comprises the steps of carrying out a first treatment on the surface of the If yes, turning to the step (3), otherwise turning to the step (5);
step (3), opening a storage tank liquid inlet pipe 8 and a storage tank liquid outlet pipe 9;
step (4), judging that the concentration C of the developing solution is more than or equal to Cu, if so, turning to step (5), and if not, turning to step (3);
step (5), closing a storage tank liquid inlet pipe 8 and a storage tank liquid outlet pipe 9;
step (6), judging that the development time is over; if yes, go to step (7); if not, turning to the step (2);
and (7) finishing the development.
Fig. 2 shows a flowchart of a developing method of the present invention, including the steps of:
step 1: fixing the substrate 1 to be developed on a developing tank substrate fixing device 2, wherein the surface to be developed is parallel to the horizontal plane;
step 2: the developing solution enters the developing tank from below the fixed height of the substrate, the liquid level gradually rises, and finally the liquid level completely covers the surface of the substrate 1 to be developed;
step 3: the developer returns to the storage tank from the overflow pipe 3 of the developing tank, and returns to the developing tank from the storage tank, and continuously circulates. The temperature control unit maintains the temperature of the developing solution stable within a certain range.
Step 4: the concentration detector 10 in the developer storage tank detects the developer concentration in real time. When the concentration of the developing solution is reduced to a concentration value P1, new developing solution enters the storage tank, and old developing solution is discharged from the storage tank until the concentration of the developing solution returns to a concentration value P2. The concentration value P2 is higher than the concentration value P1.
Step 5: after the preset development time is reached, the developer returns to the storage tank from the developer tank liquid discharge pipe 7, and the subsequent development is reused.
The foregoing is merely illustrative of the embodiments of the present invention, and the scope of the present invention is not limited thereto, and any person skilled in the art will appreciate that modifications and substitutions are within the scope of the present invention, and the scope of the present invention is defined by the appended claims.
Claims (11)
1. A developing device, characterized in that: the device includes, developing tank, developer solution reservoir and temperature control unit, wherein:
the developing tank is used for placing a substrate to be developed, and the developing solution is contacted with the substrate (1) to be developed after entering;
the developing solution storage tank is used for storing developing solution, and the developing solution can circularly flow in the developing tank and the storage tank;
a temperature control unit (11) for controlling the temperature of the developer;
the substrate (1) to be developed is placed on a substrate fixing device (2) in a developing tank, during development, a circulating pump (4) continuously extracts developing solution from a storage tank to the developing tank, the developing solution gradually covers the surface of the substrate (1) to be developed along with the rising of the liquid level, a developing reaction occurs, finally, the liquid level contacts an overflow pipe (3) on the side wall of the developing tank, the developing solution returns to the storage tank from the developing tank and continuously circulates in two tank bodies, and the local concentration drop of the developing solution on the surface of the substrate (1) to be developed is avoided;
after development is finished, a circulating pump in the developing tank is closed, a valve of a liquid discharge pipe (7) of the developing tank is opened, developing solution rapidly returns to a storage tank from the developing tank, a developing solution concentration detector (10) is arranged in the storage tank, the developing solution concentration is detected in real time, when the developing solution concentration is reduced to a set range, a valve of a liquid inlet pipe (8) of the storage tank is opened, unused developing solution enters the storage tank, a valve of a liquid discharge pipe (9) of the storage tank is opened, old developing solution is discharged from the storage tank, the developing solution concentration is increased until reaching a preset concentration value, and at the moment, the valves of a liquid inlet pipe (5) and the liquid discharge pipe (7) of the developing tank are closed; valves of a circulating pump liquid inlet pipe (6), a developing tank liquid inlet pipe (5) and a developing tank liquid discharge pipe (7), a storage tank liquid inlet pipe (8) and a storage tank liquid discharge pipe (9) can be accurately controlled through an automatic system;
a temperature control unit (11) is arranged below the storage tank to stabilize the temperature of the developing solution in a certain range, so that the consistency of the developing environment is ensured.
2. A developing apparatus according to claim 1, wherein: the device is divided into three parts, namely a developing tank, a developing solution storage tank and a temperature control unit (11), wherein the developing tank is connected with the storage tank, the developing solution can circularly flow in the two tank bodies, and the temperature control unit is connected with the storage tank and can control the temperature of the developing solution in the storage tank.
3. A developing apparatus according to claim 1, wherein: the developing tank in the device is provided with a substrate fixing device (2) to ensure that the position and the posture of the substrate are kept unchanged in the developing process.
4. A developing apparatus according to claim 1, wherein: the developing tank in the device is provided with a circulating pump (4) which can pump the developing solution from the storage tank to the developing tank, and the liquid inlet is arranged below the height of the substrate fixing position.
5. A developing apparatus according to claim 1, wherein: the developing tank in the device is provided with an overflow pipe (3) on the side face, the overflow pipe (3) is connected with the storage tank, the pipe orifice is higher than the substrate fixing position (2), when the liquid level is higher than the substrate fixing height, the developing solution enters the storage tank through the overflow pipe (3), the overflow pipe (3) is provided with a plurality of pipelines, and the developing solution is uniformly overflowed along all directions by symmetrically distributing around the substrate (1) to be developed or in an annular slotting mode.
6. A developing apparatus according to claim 1, wherein: the bottom surface of the developing tank in the device is provided with a developing tank liquid discharge pipe (7), and after development is finished, developing liquid can be rapidly discharged from the developing tank to the storage tank.
7. A developing apparatus according to claim 1, wherein: the storage tank in the device is internally provided with a developing solution concentration detector (10) which can detect the concentration of the developing solution in real time.
8. A developing apparatus according to claim 1, wherein: the device comprises a storage tank, wherein a storage tank liquid inlet pipe (8) and a storage tank liquid outlet pipe (7) are arranged in the storage tank, new developing liquid enters the storage tank through the storage tank liquid inlet pipe (8), old developing liquid is discharged through the storage tank liquid outlet pipe (9), and the concentration of the developing liquid is controlled by controlling the entering quantity of the new developing liquid.
9. A developing apparatus according to claim 1, wherein: the temperature control unit (11) in the device is connected with the storage tank and can control the temperature of the developing solution in the storage tank.
10. A developing apparatus according to claim 1, wherein: all pipeline valves in a circulating pump (4), a developing tank and a storage tank in the device can be accurately controlled through an automatic system, and the contact time of the developing solution and the substrate can be strictly controlled.
11. A developing method using the developing device according to claim 1, characterized in that: the method is characterized in that a substrate to be developed is fixed in a developing tank, developing solution enters the developing tank from the lower part of the substrate, gradually covers the surface of the substrate, starts to develop, continuously flows, and keeps the concentration of the developing solution on the surface of the substrate relatively stable, and comprises the following specific steps:
step 1: fixing a substrate (1) to be developed on a developing tank substrate fixing device (2), wherein the surface to be developed is parallel to a horizontal plane;
step 2: the developing solution enters the developing tank from below the fixed height of the substrate, the liquid level gradually rises, and finally the liquid level completely covers the surface of the substrate to be developed;
step 3: the developer returns to the storage tank from the overflow pipe (3) of the developer and returns to the developer from the storage tank, and continuously and circularly flows, and the temperature control unit maintains the temperature of the developer to be stable in a certain range;
step 4: a concentration detector (10) in the developing solution storage tank detects the concentration of the developing solution in real time, when the concentration of the developing solution is reduced to a concentration value P1, new developing solution enters the storage tank, old developing solution is discharged out of the storage tank until the concentration of the developing solution returns to a concentration value P2, and the concentration value P2 is higher than the concentration value P1;
step 5: after the preset development time is reached, the developer returns to the storage tank from the developer tank liquid discharge pipe (7), and the subsequent development is recycled.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111291709.8A CN113960897B (en) | 2021-11-03 | 2021-11-03 | Developing device and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111291709.8A CN113960897B (en) | 2021-11-03 | 2021-11-03 | Developing device and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113960897A CN113960897A (en) | 2022-01-21 |
| CN113960897B true CN113960897B (en) | 2023-09-19 |
Family
ID=79468972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111291709.8A Active CN113960897B (en) | 2021-11-03 | 2021-11-03 | Developing device and method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113960897B (en) |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63267497A (en) * | 1987-04-23 | 1988-11-04 | Mitsubishi Kasei Corp | Continuous treatment of waste liquid |
| JPH07140671A (en) * | 1993-06-29 | 1995-06-02 | Dainippon Screen Mfg Co Ltd | Substrate developing device |
| JPH07303893A (en) * | 1995-01-17 | 1995-11-21 | Mitsubishi Chem Corp | Continuous treatment of waste solution |
| CN101403868A (en) * | 2008-11-07 | 2009-04-08 | 清溢精密光电（深圳）有限公司 | Constant temperature method and device for mask plate developing solution |
| CN201556029U (en) * | 2009-11-25 | 2010-08-18 | 陕西科技大学 | Device for controlling consistency of developer of PS-plate developing machine |
| CN103207542A (en) * | 2012-01-13 | 2013-07-17 | 昆山允升吉光电科技有限公司 | Device for maintaining developing solution stability |
| CN104115069A (en) * | 2012-02-20 | 2014-10-22 | 富士胶片株式会社 | Method for concentrating plate-making process effluent, and method for recycling plate-making process effluent |
| CN105573067A (en) * | 2016-01-28 | 2016-05-11 | 信利（惠州）智能显示有限公司 | Temperature control device for developing solution |
| CN206684478U (en) * | 2017-05-04 | 2017-11-28 | 上海和辉光电有限公司 | Overflow developer solution recycling system |
| JP2019071482A (en) * | 2019-01-30 | 2019-05-09 | 株式会社平間理化研究所 | Developing liquid managing method and device |
| CN210835585U (en) * | 2019-09-09 | 2020-06-23 | 红板（江西）有限公司 | PCB developing system |
| CN113369949A (en) * | 2021-07-08 | 2021-09-10 | 中国科学院光电技术研究所 | Planing processing device for large-rise convex spherical surface micro-lens array |
-
2021
- 2021-11-03 CN CN202111291709.8A patent/CN113960897B/en active Active
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63267497A (en) * | 1987-04-23 | 1988-11-04 | Mitsubishi Kasei Corp | Continuous treatment of waste liquid |
| JPH07140671A (en) * | 1993-06-29 | 1995-06-02 | Dainippon Screen Mfg Co Ltd | Substrate developing device |
| JPH07303893A (en) * | 1995-01-17 | 1995-11-21 | Mitsubishi Chem Corp | Continuous treatment of waste solution |
| CN101403868A (en) * | 2008-11-07 | 2009-04-08 | 清溢精密光电（深圳）有限公司 | Constant temperature method and device for mask plate developing solution |
| CN201556029U (en) * | 2009-11-25 | 2010-08-18 | 陕西科技大学 | Device for controlling consistency of developer of PS-plate developing machine |
| CN103207542A (en) * | 2012-01-13 | 2013-07-17 | 昆山允升吉光电科技有限公司 | Device for maintaining developing solution stability |
| CN104115069A (en) * | 2012-02-20 | 2014-10-22 | 富士胶片株式会社 | Method for concentrating plate-making process effluent, and method for recycling plate-making process effluent |
| CN105573067A (en) * | 2016-01-28 | 2016-05-11 | 信利（惠州）智能显示有限公司 | Temperature control device for developing solution |
| CN206684478U (en) * | 2017-05-04 | 2017-11-28 | 上海和辉光电有限公司 | Overflow developer solution recycling system |
| JP2019071482A (en) * | 2019-01-30 | 2019-05-09 | 株式会社平間理化研究所 | Developing liquid managing method and device |
| CN210835585U (en) * | 2019-09-09 | 2020-06-23 | 红板（江西）有限公司 | PCB developing system |
| CN113369949A (en) * | 2021-07-08 | 2021-09-10 | 中国科学院光电技术研究所 | Planing processing device for large-rise convex spherical surface micro-lens array |
Non-Patent Citations (3)
| Title |
|---|
| 全自动硅片显影设备的研究;郭帝江 第;山西电子技术(第3期);全文 * |
| 大矢高凸柱面的超精密车削轨迹计算方法研究;雷茸粮 等;光电工程;第48卷(第3期);全文 * |
| 显影系统供液设计研究;郑如意 等;电子工业专用设备(第279期);全文 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113960897A (en) | 2022-01-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI565840B (en) | Electrolyte loop with pressure regulation for separated anode chamber of electroplating system | |
| CN102956470B (en) | Substrate treating apparatus | |
| US10699910B2 (en) | Substrate liquid treatment apparatus, substrate liquid treatment method and storage medium | |
| US20200090967A1 (en) | Substrate Processing Apparatus, Substrate Processing Method, and Recording Medium | |
| CN113960897B (en) | Developing device and method | |
| US20110014379A1 (en) | Developing apparatus, resist pattern forming method and storage medium | |
| US10295903B2 (en) | Substrate processing method, substrate processing apparatus and storage medium | |
| KR20220129805A (en) | Chemical liquid providing unit and substrate treating apparatus including the same | |
| KR100872870B1 (en) | Circulation nozzle and chemicals supplying apparatus having the same | |
| JP2001217219A (en) | Method and device for treating liquid | |
| CN209785883U (en) | Liquid mixing device | |
| KR100741478B1 (en) | Heat exchanger type thermostat for processing liquid of semiconductor manufacturing line | |
| KR100432495B1 (en) | An etching apparatus of silicon wafer | |
| KR20160148798A (en) | Chemical supplying apparatus, substrate treating apparatus and substrate treating method | |
| KR100268417B1 (en) | Slurry supply system of cmp equipment for semiconductor device | |
| JP4034285B2 (en) | Temperature control system and temperature control method | |
| JP3259412B2 (en) | Wafer cleaning method | |
| CN111696883A (en) | Liquid mixing device and concentration adjusting method thereof | |
| JP7454986B2 (en) | Substrate processing method and substrate processing apparatus | |
| KR100861834B1 (en) | Apparatus for auto cleaning a di-water control system and method thereof | |
| KR20090044818A (en) | Constant temperature water circulator | |
| JP3715874B2 (en) | Substrate processing equipment | |
| TW202141614A (en) | Processing liquid temperature control method, substrate processing method, processing liquid temperature control apparatus, and substrate processing system | |
| JP2002176028A (en) | Device and method for wet-machining semiconductor wafer | |
| KR100966105B1 (en) | Coating apparatus for optical lenses |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |