CN113913915B - Metal polishing passivation solution and preparation method thereof - Google Patents
Metal polishing passivation solution and preparation method thereof Download PDFInfo
- Publication number
- CN113913915B CN113913915B CN202111058961.4A CN202111058961A CN113913915B CN 113913915 B CN113913915 B CN 113913915B CN 202111058961 A CN202111058961 A CN 202111058961A CN 113913915 B CN113913915 B CN 113913915B
- Authority
- CN
- China
- Prior art keywords
- passivation solution
- auxiliary agent
- metal
- polishing passivation
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000002161 passivation Methods 0.000 title claims abstract description 81
- 238000005498 polishing Methods 0.000 title claims abstract description 69
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 52
- 239000002184 metal Substances 0.000 title claims abstract description 52
- 238000002360 preparation method Methods 0.000 title claims description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims abstract description 42
- CVSVTCORWBXHQV-UHFFFAOYSA-N creatine Chemical compound NC(=[NH2+])N(C)CC([O-])=O CVSVTCORWBXHQV-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000010935 stainless steel Substances 0.000 claims abstract description 28
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000012752 auxiliary agent Substances 0.000 claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229960003624 creatine Drugs 0.000 claims abstract description 14
- 239000006046 creatine Substances 0.000 claims abstract description 14
- 229960000583 acetic acid Drugs 0.000 claims abstract description 12
- 239000012362 glacial acetic acid Substances 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 11
- 239000000080 wetting agent Substances 0.000 claims abstract description 11
- 229910001220 stainless steel Inorganic materials 0.000 claims description 25
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 15
- 238000003756 stirring Methods 0.000 claims description 11
- FULZLIGZKMKICU-UHFFFAOYSA-N N-phenylthiourea Chemical compound NC(=S)NC1=CC=CC=C1 FULZLIGZKMKICU-UHFFFAOYSA-N 0.000 claims description 6
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 6
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 5
- 150000002191 fatty alcohols Chemical class 0.000 claims description 5
- 229920000570 polyether Polymers 0.000 claims description 5
- 229920000056 polyoxyethylene ether Polymers 0.000 claims description 5
- 229940051841 polyoxyethylene ether Drugs 0.000 claims description 5
- PMQIWLWDLURJOE-UHFFFAOYSA-N triethoxy(1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl)silane Chemical group CCO[Si](OCC)(OCC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F PMQIWLWDLURJOE-UHFFFAOYSA-N 0.000 claims description 5
- FNTBLJMVDUVHPV-UHFFFAOYSA-N 1-chloro-1-phenylthiourea Chemical compound NC(=S)N(Cl)C1=CC=CC=C1 FNTBLJMVDUVHPV-UHFFFAOYSA-N 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 238000004381 surface treatment Methods 0.000 claims description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 3
- 238000005303 weighing Methods 0.000 claims description 3
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 6
- 229910001069 Ti alloy Inorganic materials 0.000 abstract description 3
- 229910001256 stainless steel alloy Inorganic materials 0.000 abstract description 3
- 238000002791 soaking Methods 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 51
- 238000005260 corrosion Methods 0.000 description 12
- 230000007797 corrosion Effects 0.000 description 11
- 238000012360 testing method Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 239000002101 nanobubble Substances 0.000 description 2
- BPCXHCSZMTWUBW-UHFFFAOYSA-N triethoxy(1,1,2,2,3,3,4,4,5,5,8,8,8-tridecafluorooctyl)silane Chemical compound CCO[Si](OCC)(OCC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F BPCXHCSZMTWUBW-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/24—Polishing of heavy metals of iron or steel
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention relates to a metal polishing passivation solution, which consists of the following substances: 20-50g/L of glacial acetic acid, 50-75g/L of creatine citric acid, 1-2g/L of wetting agent, 0.3-0.8g/L of auxiliary agent A, 0.5-1g/L of auxiliary agent B and the balance of water. The invention thoroughly solves the technical problem of one-step polishing passivation of stainless steel and titanium alloy, completes polishing passivation in one step, does not use a tank body for soaking, has small dosage, and can form a layer of compact two-dimensional film, thereby achieving the purpose of polishing passivation. But also can be moved and used at any time without limiting the fixed place, the operation is simple and convenient, the use is flexible and mobile, and the effect is quick and efficient.
Description
Technical Field
The invention belongs to the technical field of metal surface treatment, and relates to a high-efficiency metal polishing passivation solution and a preparation method thereof.
Background
With the development of modern industry, the application range of metal materials is wider and wider, and particularly stainless steel has wider application in the fields of automobiles, buildings and household appliances due to the excellent mechanical property and corrosion resistance. And with the improvement of production technology capability and the increasing demand on product quality, the demand on surface treatment of metal materials is also gradually increased. Not only the surface roughness of the stainless steel is reduced, but also the surface defects are reduced; the surface of the metal material is required to be optimized, so that the surface of the material has luster, and the effect of beautiful decoration is realized.
The polishing of the metal surface is that after polishing treatment, the surface becomes smoother and has good reflection effect, and the metal is in a bright state, namely the metal becomes in an inert state in certain specific environment media, so that an extremely thin passivation film is generated to prevent the dissolution or corrosion of the metal. The passivation film on the surface of the stainless steel is not completely uniform and compact in the prior art, and the passivation film tends to be worst in the places where defect inclusions, chromium-poor regions, grain boundaries, dislocation and the like occur, which causes the passivation film to be damaged. The corrosion resistance of stainless steel is determined by the properties of the surface passivation film. The aim of the current research on stainless steel is to obtain stainless steel with higher strength and better wear resistance and corrosion resistance.
Disclosure of Invention
In view of the above, the present invention aims to provide a metal polishing passivation solution capable of performing polishing passivation treatment at one time, and a preparation method of the metal polishing passivation solution.
In order to achieve the above purpose, the present invention provides the following technical solutions:
1. the metal polishing passivation solution is characterized by comprising the following substances in percentage by mass: 20-50g/L of glacial acetic acid, 50-75g/L of creatine citric acid, 1-2g/L of wetting agent, 0.3-0.8g/L of auxiliary agent A, 0.5-1g/L of auxiliary agent B and the balance of water.
2. The metal polish-passivation solution according to claim 1, characterized in that it consists of, by mass volume: 20-50g/L of glacial acetic acid, 50-60g/L of creatine citric acid, 2g/L of wetting agent, 0.5-0.8g/L of auxiliary agent A, 0.5-0.7g/L of auxiliary agent B and the balance of water.
3. The metal polishing passivation solution according to claim 1 or 2, wherein the wetting agent is one or more of propylene glycol block polyether and fatty alcohol polyoxyethylene ether.
4. The metal polishing passivation solution according to claim 1 or 2, wherein the auxiliary agent a is one or more of thiourea, phenylthiourea, tolylthiourea and chlorophenyl thiourea.
5. The metal polishing passivation solution according to claim 1 or 2, wherein the auxiliary agent B is one or more of heptadecafluorodecyltriethoxysilane and tridecafluorooctyltriethoxysilane.
6. The method for preparing a metal polishing passivation solution according to any one of claims 1 to 5, wherein the specific steps of the preparation method are as follows:
a. weighing all substances according to the mass and volume of the proportioning, adding creatine and citric acid into a small amount of water, stirring to fully dissolve the creatine and citric acid, and continuously adding glacial acetic acid and stirring uniformly;
b. and adding the wetting agent and the auxiliary agent A, uniformly stirring, slowly dripping the auxiliary agent B, finally adding the rest water to fix the volume, and continuously stirring to obtain the polishing passivation solution.
7. Use of the metal polish passivation solution according to any one of claims 1 to 5 in stainless steel surface treatment.
The invention has the beneficial effects that:
the invention completes polishing passivation in one step, does not use a tank body for soaking, and has less usage amount, simplicity and convenience. Only one power supply is needed to be configured, one electrode is connected with the processed metal workpiece, one electrode is connected with the electrode (wrapped by a plurality of layers of cloth), under the action of an electric field, when the electrode contacts the processed metal workpiece (the processing position is pre-sprayed with polishing passivation solution), atomic oxygen or atomic hydrogen is generated on the surface, a large number of nano or micro-nano bubbles are generated, the surface of a matrix is stripped and flushed, surface oxides and micro-protruding parts are removed, and a layer of compact two-dimensional film is formed, so that the aim of polishing passivation is achieved. Thoroughly solves the technological problems of one-time polishing and passivation of stainless steel and titanium alloy, does not limit fixed places, can be used at any time, is simple and convenient to operate, flexible and flexible to use, and has quick and efficient effect. The wetting agent with the formula amount in the metal polishing passivation solution plays a role in wetting and penetrating, the auxiliary agent A with the formula amount is one or more of thiourea, phenylthiourea, tolylthiourea and chlorophenyl thiourea, the acid etching amount of metal can be obviously reduced, the auxiliary agent B is a gel containing silicon, and the solution fluidity is reduced under the formula amount. The efficient metal polishing passivation solution is matched with a power supply for use, improves the polishing passivation effect and speed of metal or metal alloy under the action of an electric field, and thoroughly solves the problem of metal over-corrosion.
Drawings
In order to make the objects, technical solutions and advantageous effects of the present invention more clear, the present invention provides the following drawings for description:
FIG. 1 is the appearance of a stainless steel sample treated with the metal polish passivation solution of example 1;
FIG. 2 is the appearance of a stainless steel sample treated with the metal polish passivation solution of example 2;
FIG. 3 is the appearance of a stainless steel sample treated with the metal polish passivation solution of example 1;
FIG. 4 is the appearance of a stainless steel sample treated with the metal polish passivation solution of example 1;
fig. 5 is an appearance of a stainless steel sample without polish-passivation.
Fig. 6 is a schematic diagram of the polishing passivation process.
Detailed Description
Preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The experimental methods for which specific conditions are not specified in the examples are generally conducted under conventional conditions or under conditions recommended by the manufacturer.
Example 1
The polishing passivation solution consists of the following substances in mass volume concentration: 20g/L of glacial acetic acid, 75g/L of creatine citric acid, 2g/L of propylene glycol block polyether, 0.5g/L of phenylthiourea and 0.5g/L of heptadecafluorodecyl triethoxysilane, and the solvent is water.
Weighing all substances according to the mass and volume, adding creatine and citric acid into a small amount of water according to the proportion, stirring to fully dissolve the substances, continuously adding glacial acetic acid, stirring uniformly, adding the wetting agent and the auxiliary agent A, slowly dripping the auxiliary agent B, finally adding the rest of water to fix the volume, and continuously stirring to obtain the polishing passivation solution.
The stainless steel sample is put into the metal polishing passivation solution for polishing passivation treatment, and fig. 1 shows the appearance of the stainless steel sample of the embodiment after the stainless steel sample is subjected to the metal polishing passivation solution for polishing passivation treatment, and the surface is bright, uniform and compact and has no scratches. FIG. 5 shows the appearance after unpolished passivation treatment, with a dull black surface and some scratches. Fig. 6 is a schematic diagram of the polishing passivation process.
Example 2
The polishing passivation solution consists of the following substances in mass volume concentration: 40g/L of glacial acetic acid, 60g/L of creatine citric acid, 1.5g/L of fatty alcohol polyoxyethylene ether, 0.25g/L of tolylthiourea, 0.25g/L of chlorphenylthiourea and 1g/L of tridecafluorooctyl triethoxysilane, wherein the solvent is water. The preparation method is the same as in example 1.
The stainless steel sample is put into the metal polishing passivation solution for polishing passivation treatment, and fig. 2 shows the appearance of the stainless steel sample of the embodiment after the stainless steel sample is subjected to the metal polishing passivation solution for polishing passivation treatment, and the surface is bright, uniform and compact and has no scratches.
Example 3
The polishing passivation solution consists of the following substances in mass volume concentration: 50g/L of glacial acetic acid, 50g/L of creatine citric acid, 1g/L of propylene glycol block polyether, 1g/L of fatty alcohol polyoxyethylene ether, 0.8g/L of phenylthiourea and 0.7g/L of heptadecafluorodecyl triethoxysilane, and the solvent is water. The preparation method is the same as in example 1.
The stainless steel sample is put into the metal polishing passivation solution for polishing passivation treatment, and fig. 3 shows the appearance of the stainless steel sample of the embodiment after the stainless steel sample is subjected to the metal polishing passivation solution for polishing passivation treatment, and the surface is bright, uniform and compact and has no scratch.
Example 4
The polishing passivation solution consists of the following substances in mass volume concentration: 30g/L of glacial acetic acid, 60g/L of creatine citric acid, 1g/L of propylene glycol block polyether, 1g/L of fatty alcohol polyoxyethylene ether, 0.7g/L of phenylthiourea and 0.6g/L of heptadecafluorodecyl triethoxysilane, and the solvent is water. The preparation method is the same as in example 1.
The stainless steel sample is put into the metal polishing passivation solution for polishing passivation treatment, and fig. 4 shows the appearance of the stainless steel sample of the embodiment after the stainless steel sample is subjected to the metal polishing passivation solution for polishing passivation treatment, and the surface is bright, uniform and compact and has no scratch.
Performance test analysis:
1. polishing and passivating appearance:
the metal polishing passivation solution of examples 1 to 4 was added to the test sample, and used directly, one electrode was attached to the metal workpiece to be treated, one electrode was attached to the electrode (wrapped with a multi-layer cloth), and under the action of an electric field, when the electrode was in contact with the metal workpiece to be treated (the metal polishing passivation solution was pre-sprayed at the treatment position), atomic oxygen or atomic hydrogen was generated on the surface, a large amount of nano-or micro-nano bubbles appeared, the surface of the substrate was peeled off and washed away, surface oxides and micro-protrusions were removed, and a layer of dense two-dimensional film was formed, which was bright in appearance.
2. Polishing passivation solution stability
The metal polishing passivation solutions of examples 1 to 4 and the low-temperature polishing passivation solution which is common in the market are respectively put into a closed container, and after the metal polishing passivation solution is kept at 40 ℃ for 24 hours, the appearance change of the solution is observed, and whether layering exists or not, and whether the solution is clear and transparent or not is observed.
3. Corrosion resistance
The metal polishing passivation solutions of examples 1 to 4 were added to test samples and used directly, and salt spray experiments were performed after polishing passivation. The weight loss of the test sample was measured by using a 5% brine solution at 35℃and a GB/T1771 standard, and the corrosion rate and corrosion amount were calculated.
The polishing passivation solution prepared by the invention does not contain nickel-copper heavy metal ions, and reduces environmental pollution. Table 1 shows the test results of the samples of each embodiment, and according to table 1, the polishing passivation solution is used in the invention, and the polishing passivation solution is efficient and convenient, so that the polishing passivation of stainless steel and titanium alloy can be completed at one time, and the polishing passivation solution is particularly suitable for the re-polishing passivation treatment of metal alloy, and the effectiveness of the polishing passivation solution is ensured. Table 2 is mass change data before and after corrosion resistance test. As can be seen from Table 2, after the metal surface is treated by the metal polishing passivation solution, the metal corrosion rate is reduced and the corrosion resistance is improved.
Table 1 test results
TABLE 2 Mass Change before and after Corrosion (g)
Finally, it is noted that the above-mentioned preferred embodiments are only intended to illustrate rather than limit the invention, and that, although the invention has been described in detail by means of the above-mentioned preferred embodiments, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the scope of the invention as defined by the appended claims.
Claims (5)
1. The metal polishing passivation solution is characterized by comprising the following substances in percentage by mass: 20-50g/L of glacial acetic acid, 50-75g/L of creatine citric acid, 1-2g/L of wetting agent, 0.3-0.8g/L of auxiliary agent A, 0.5-1g/L of auxiliary agent B and the balance of water; the auxiliary agent A is one or more of thiourea, phenylthiourea, tolylthiourea and chlorophenyl thiourea; the auxiliary agent B is heptadecafluorodecyl triethoxysilane or tridedecafluorooctyl triethoxysilane.
2. The metal polish-passivation solution according to claim 1, characterized in that it consists of, by mass volume: 20-50g/L of glacial acetic acid, 50-60g/L of creatine citric acid, 2g/L of wetting agent, 0.5-0.8g/L of auxiliary agent A, 0.5-0.7g/L of auxiliary agent B and the balance of water.
3. The metal polishing passivation solution according to claim 1 or 2, wherein the wetting agent is one or more of propylene glycol block polyether and fatty alcohol polyoxyethylene ether.
4. A method for preparing a metal polishing passivation solution according to any one of claims 1 to 3, characterized by the specific steps of the preparation method:
a. weighing all substances according to the mass and volume of the proportioning, adding creatine and citric acid into a small amount of water, stirring to fully dissolve the creatine and citric acid, and continuously adding glacial acetic acid and stirring uniformly;
b. and adding the wetting agent and the auxiliary agent A, uniformly stirring, slowly dripping the auxiliary agent B, finally adding the rest water to fix the volume, and continuously stirring to obtain the polishing passivation solution.
5. Use of the metal polish passivation solution according to any one of claims 1 to 3 in stainless steel surface treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111058961.4A CN113913915B (en) | 2021-09-08 | 2021-09-08 | Metal polishing passivation solution and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111058961.4A CN113913915B (en) | 2021-09-08 | 2021-09-08 | Metal polishing passivation solution and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113913915A CN113913915A (en) | 2022-01-11 |
| CN113913915B true CN113913915B (en) | 2024-04-05 |
Family
ID=79234426
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111058961.4A Active CN113913915B (en) | 2021-09-08 | 2021-09-08 | Metal polishing passivation solution and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113913915B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102168265A (en) * | 2011-03-25 | 2011-08-31 | 东北大学 | Chromium-free composite passivator and preparation method thereof |
| CN106086848A (en) * | 2016-07-19 | 2016-11-09 | 东莞市凯盟表面处理技术开发有限公司 | A kind of acid-washing stainless steel passivating solution and preparation method thereof and using method |
| JP2017082253A (en) * | 2015-10-22 | 2017-05-18 | 株式会社Ihi | Descaling treatment method of stainless steel component, and passivation treatment method |
| CN109487280A (en) * | 2018-12-26 | 2019-03-19 | 安徽笃舜智能装备有限公司 | A kind of austenitic stainless steel Cleaning and Passivation agent |
-
2021
- 2021-09-08 CN CN202111058961.4A patent/CN113913915B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102168265A (en) * | 2011-03-25 | 2011-08-31 | 东北大学 | Chromium-free composite passivator and preparation method thereof |
| JP2017082253A (en) * | 2015-10-22 | 2017-05-18 | 株式会社Ihi | Descaling treatment method of stainless steel component, and passivation treatment method |
| CN106086848A (en) * | 2016-07-19 | 2016-11-09 | 东莞市凯盟表面处理技术开发有限公司 | A kind of acid-washing stainless steel passivating solution and preparation method thereof and using method |
| CN109487280A (en) * | 2018-12-26 | 2019-03-19 | 安徽笃舜智能装备有限公司 | A kind of austenitic stainless steel Cleaning and Passivation agent |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113913915A (en) | 2022-01-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101701886B (en) | Metallographical corrosive, method for eroding copper and method for displaying metallographical organization of copper | |
| CN101738340B (en) | Method for preparing sample showing metallurgical structure of tantalum-tungsten alloy | |
| CN101880881B (en) | High aluminum zinc alloy etching agent and use method thereof | |
| CN103993319A (en) | Corrosive agent and display method for macrostructure of aluminum and aluminum copper alloys | |
| CN104630760B (en) | A kind of brass surfaces prepares the preparation method of purple chemical composition coating | |
| CN111596094A (en) | Three-dimensional etching device and method for nonmetallic inclusions in steel | |
| CN110369712B (en) | Preparation method of silver-coated copper powder | |
| CN109991254A (en) | A kind of preparation method of pure iron EBSD sample | |
| CN107462456A (en) | Method for displaying metallographic structure | |
| CN109988676A (en) | A kind of cleaning solution, preparation method and application | |
| CN113913915B (en) | Metal polishing passivation solution and preparation method thereof | |
| CN114318341B (en) | Metallographic etching method for aluminum alloy and metallographic etchant thereof | |
| CN102053090B (en) | Method for observing metallurgical structure of niobium hafnium alloy | |
| CN113373453B (en) | Cleaning method used before coating of hard alloy numerical control blade | |
| CN110954388A (en) | Metallographic corrosive agent for laser cladding layer of titanium alloy containing rare earth and tissue display method | |
| CN111537318A (en) | Metallographic phase display method of copper-gallium alloy | |
| CN106769354B (en) | Polishing method for aluminium alloy metallographic specimen | |
| CN109706459A (en) | A kind of polishing type boron sulfuric ester rust removing solution | |
| CN108318314B (en) | Metallographic corrosive, corrosion method of metallographic sample and metallographic structure display method | |
| CN106501058A (en) | Nichrome etchant and the method for displaying metallographic structure of nichrome | |
| CN111537304A (en) | Sample preparation method for Al-Li-Cu alloy and sample | |
| CN114371057A (en) | Rare earth magnesium alloy metallographic corrosive agent and preparation method of metallographic specimen thereof | |
| CN110904443B (en) | Preparation process of silver product with uniform color on surface | |
| CN114839029B (en) | Aggressive agent and method for displaying morphology of free-cutting austenitic stainless steel grain boundary and manganese sulfide | |
| CN116590780A (en) | Grain boundary display method for aggressive agent and low-alloy high-strength steel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |