CN113913915A - Metal polishing passivation solution and preparation method thereof - Google Patents
Metal polishing passivation solution and preparation method thereof Download PDFInfo
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- CN113913915A CN113913915A CN202111058961.4A CN202111058961A CN113913915A CN 113913915 A CN113913915 A CN 113913915A CN 202111058961 A CN202111058961 A CN 202111058961A CN 113913915 A CN113913915 A CN 113913915A
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- 238000002161 passivation Methods 0.000 title claims abstract description 81
- 238000005498 polishing Methods 0.000 title claims abstract description 79
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 55
- 239000002184 metal Substances 0.000 title claims abstract description 55
- 238000002360 preparation method Methods 0.000 title claims description 10
- 239000010935 stainless steel Substances 0.000 claims abstract description 25
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims abstract description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229960000583 acetic acid Drugs 0.000 claims abstract description 12
- 239000012362 glacial acetic acid Substances 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 12
- 239000000080 wetting agent Substances 0.000 claims abstract description 11
- MBBREGJRSROLGD-UHFFFAOYSA-N 2-[carbamimidoyl(methyl)amino]acetic acid;2-hydroxypropane-1,2,3-tricarboxylic acid Chemical compound NC(=N)N(C)CC(O)=O.OC(=O)CC(O)(C(O)=O)CC(O)=O MBBREGJRSROLGD-UHFFFAOYSA-N 0.000 claims abstract description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 27
- 229910001220 stainless steel Inorganic materials 0.000 claims description 21
- CVSVTCORWBXHQV-UHFFFAOYSA-N creatine Chemical compound NC(=[NH2+])N(C)CC([O-])=O CVSVTCORWBXHQV-UHFFFAOYSA-N 0.000 claims description 18
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 15
- 238000003756 stirring Methods 0.000 claims description 11
- 229960003624 creatine Drugs 0.000 claims description 9
- 239000006046 creatine Substances 0.000 claims description 9
- 239000012752 auxiliary agent Substances 0.000 claims description 8
- FULZLIGZKMKICU-UHFFFAOYSA-N N-phenylthiourea Chemical compound NC(=S)NC1=CC=CC=C1 FULZLIGZKMKICU-UHFFFAOYSA-N 0.000 claims description 6
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 6
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 5
- 229920000570 polyether Polymers 0.000 claims description 5
- 229920000056 polyoxyethylene ether Polymers 0.000 claims description 5
- 229940051841 polyoxyethylene ether Drugs 0.000 claims description 5
- PMQIWLWDLURJOE-UHFFFAOYSA-N triethoxy(1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl)silane Chemical group CCO[Si](OCC)(OCC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F PMQIWLWDLURJOE-UHFFFAOYSA-N 0.000 claims description 5
- FNTBLJMVDUVHPV-UHFFFAOYSA-N 1-chloro-1-phenylthiourea Chemical compound NC(=S)N(Cl)C1=CC=CC=C1 FNTBLJMVDUVHPV-UHFFFAOYSA-N 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims description 4
- 230000000996 additive effect Effects 0.000 claims description 4
- 238000004381 surface treatment Methods 0.000 claims description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 3
- BPCXHCSZMTWUBW-UHFFFAOYSA-N triethoxy(1,1,2,2,3,3,4,4,5,5,8,8,8-tridecafluorooctyl)silane Chemical group CCO[Si](OCC)(OCC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F BPCXHCSZMTWUBW-UHFFFAOYSA-N 0.000 claims description 3
- 238000005303 weighing Methods 0.000 claims description 3
- 229910001069 Ti alloy Inorganic materials 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 4
- 229910001256 stainless steel alloy Inorganic materials 0.000 abstract description 4
- 238000002791 soaking Methods 0.000 abstract description 2
- 238000005260 corrosion Methods 0.000 description 12
- 230000007797 corrosion Effects 0.000 description 11
- 238000012360 testing method Methods 0.000 description 6
- 239000007769 metal material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 239000002101 nanobubble Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/24—Polishing of heavy metals of iron or steel
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention relates to a metal polishing passivation solution, which consists of the following substances: glacial acetic acid 20-50g/L, creatine citrate 50-75g/L, wetting agent 1-2g/L, assistant A0.3-0.8 g/L, assistant B0.5-1 g/L, and the balance of water. The invention thoroughly solves the technical problem of one-time polishing passivation of stainless steel and titanium alloy, finishes polishing passivation in one step, does not use a groove body for soaking, has low consumption, and can form a layer of compact two-dimensional film, thereby achieving the purpose of polishing passivation. And the device is not limited to a fixed place, can be moved and used at any time, is simple and convenient to operate, is flexible and mobile to use, and has a quick and efficient effect.
Description
Technical Field
The invention belongs to the technical field of metal surface treatment, and relates to a high-efficiency metal polishing passivation solution and a preparation method thereof.
Background
With the development of modern industry, the application range of metal materials is wider and wider, and particularly stainless steel has more excellent mechanical properties and corrosion resistance, so that the metal materials can be widely applied to the fields of automobiles, buildings and household appliances. And with the improvement of production technology capability and the higher and higher requirements on product quality, the requirements on the surface treatment of metal materials are gradually improved. Not only the surface roughness of the stainless steel is reduced, but also the surface defects are reduced; the surface of the metal material needs to be optimized, so that the surface of the material has luster, and the decoration and the beauty are realized.
The metal surface polishing is that after polishing treatment, the surface becomes more flat and has good reflection effect, and is in a bright state, and the metal passivation is that the metal is changed into an inert state in certain specific environment media, and a layer of extremely thin passivation film is generated to prevent the metal from being dissolved or corroded. The passive film on the surface of stainless steel in the prior art is not completely uniform and dense, and the passive film is often the worst in performance at the places where defect inclusions, chromium-poor regions, grain boundaries, dislocations and the like occur, which leads to the destruction of the passive film. The corrosion resistance of stainless steel is determined by the properties of the surface passivation film. The current research on stainless steel aims to obtain stainless steel with higher strength and better wear resistance and corrosion resistance.
Disclosure of Invention
In view of the above, the present invention provides a passivation solution for metal polishing, which can be used for one-time passivation and polishing, and a method for preparing the passivation solution for metal polishing.
In order to achieve the purpose, the invention provides the following technical scheme:
1. the metal polishing passivation solution is characterized by comprising the following substances in parts by mass and volume: glacial acetic acid 20-50g/L, creatine citrate 50-75g/L, wetting agent 1-2g/L, assistant A0.3-0.8 g/L, assistant B0.5-1 g/L, and the balance of water.
2. The metal polishing passivation solution of claim 1, wherein the metal polishing passivation solution consists of the following substances by mass volume: glacial acetic acid 20-50g/L, creatine citrate 50-60g/L, wetting agent 2g/L, assistant A0.5-0.8 g/L, assistant B0.5-0.7 g/L, and the balance of water.
3. The metal polishing passivation solution of claim 1 or 2, wherein the wetting agent is one or more of propylene glycol block polyether and fatty alcohol-polyoxyethylene ether.
4. The metal polishing passivation solution of claim 1 or 2, wherein the additive A is one or more of thiourea, phenylthiourea, tolylthiourea and chlorophenylthiourea.
5. The metal polishing passivation solution of claim 1 or 2, wherein the auxiliary agent B is one or more of heptadecafluorodecyltriethoxysilane and tridecafluorooctyltriethoxysilane.
6. The preparation method of the metal polishing passivation solution of any one of claims 1 to 5, characterized in that the preparation method comprises the following specific steps:
a. weighing the substances according to the mass volume of the proportioning amount, adding creatine citric acid into a small amount of water, stirring to fully dissolve the creatine citric acid, and continuously adding glacial acetic acid and stirring uniformly;
b. and adding the wetting agent and the auxiliary agent A, uniformly stirring, slowly dropwise adding the auxiliary agent B, finally adding the rest water to a constant volume, and continuously stirring to obtain the polishing passivation solution.
7. Use of the metal polishing passivation solution according to any one of claims 1 to 5 in the surface treatment of stainless steel.
The invention has the beneficial effects that:
the invention completes polishing passivation in one step, does not use a tank body for soaking, has small using amount and is simple and convenient. Only one power supply is needed to be configured, an electrode is used, one electrode is connected with a processed metal workpiece, the other electrode is connected with the electrode (wrapped by multilayer cloth), under the action of an electric field, when the electrode is contacted with the processed metal workpiece (the processing position is sprayed with polishing passivation solution in advance), atomic oxygen or atomic hydrogen is generated on the surface, a large number of nano or micro-nano bubbles are generated, the surface of a matrix is stripped and washed, surface oxides and microscopic protruding parts are removed, and a compact two-dimensional film is formed, so that the purpose of polishing passivation is achieved. The problem of the one-time polishing and passivating process for stainless steel and titanium alloy is thoroughly solved, the fixed place is not limited, the stainless steel and titanium alloy can be moved and used at any time, the operation is simple and convenient, the use is flexible and flexible, and the effect is quick and efficient. The wetting agent with the formula amount in the metal polishing passivation solution plays a role in wetting and penetrating, the additive A with the formula amount is one or more of thiourea, phenylthiourea, tolylthiourea and chlorphenyl thiourea, the acid etching amount of metal can be obviously reduced, and the additive B is a silicon-containing gel, so that the fluidity of the solution is reduced under the formula amount. The high-efficiency metal polishing passivation solution is matched with a power supply for use, so that the polishing passivation effect and speed of metal or metal alloy are improved under the action of an electric field, and the over-corrosion problem of the metal is thoroughly solved.
Drawings
In order to make the object, technical scheme and beneficial effect of the invention more clear, the invention provides the following drawings for explanation:
FIG. 1 is the appearance of a stainless steel sample treated with a metal polishing passivation solution of example 1;
FIG. 2 is the appearance of a stainless steel sample treated with the metal polishing passivation solution of example 2;
FIG. 3 is the appearance of a stainless steel sample treated with the metal polish passivation solution of example 1;
FIG. 4 is the appearance of a stainless steel sample treated with the metal polish passivation solution of example 1;
fig. 5 is an appearance of a stainless steel sample without polishing passivation treatment.
FIG. 6 is a schematic diagram of the polishing passivation process.
Detailed Description
Preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The experimental procedures, in which specific conditions are not specified in the examples, are generally carried out under conventional conditions or under conditions recommended by the manufacturers.
Example 1
The polishing passivation solution consists of the following substances in mass volume concentration: glacial acetic acid 20g/L, creatine citrate 75g/L, propylene glycol block polyether 2g/L, phenylthiourea 0.5g/L, heptadecafluorodecyltriethoxysilane 0.5g/L, and water as solvent.
Weighing the substances according to the mass and volume, adding creatine citric acid into a small amount of water according to the proportion, stirring to fully dissolve the creatine citric acid, continuously adding glacial acetic acid, stirring uniformly, adding the wetting agent and the auxiliary agent A, slowly dropwise adding the auxiliary agent B, finally adding the rest water to a constant volume, and continuously stirring to obtain the polishing passivation solution.
The stainless steel sample is put into the metal polishing passivation solution for polishing and passivation, and fig. 1 shows that the stainless steel sample of the embodiment has bright, uniform and compact surface and no scratch after being subjected to polishing and passivation by the metal polishing passivation solution. FIG. 5 shows the appearance of the polished and passivated substrate, which was dull, dark and slightly scratched. FIG. 6 is a schematic diagram of the polishing passivation process.
Example 2
The polishing passivation solution consists of the following substances in mass volume concentration: glacial acetic acid 40g/L, creatine citric acid 60g/L, fatty alcohol-polyoxyethylene ether 1.5g/L, tolylthiourea 0.25g/L, chlorphenyl thiourea 0.25g/L, tridecafluorooctyl triethoxysilane 1g/L, and water as solvent. The preparation method is the same as example 1.
The stainless steel sample is put into the metal polishing passivation solution for polishing and passivation, and fig. 2 shows that the stainless steel sample of the embodiment has bright, uniform and compact surface and no scratch after being subjected to polishing and passivation by the metal polishing passivation solution.
Example 3
The polishing passivation solution consists of the following substances in mass volume concentration: 50g/L of glacial acetic acid, 50g/L of creatine citric acid, 1g/L of propylene glycol block polyether, 1g/L of fatty alcohol-polyoxyethylene ether, 0.8g/L of phenylthiourea, 0.7g/L of heptadecafluorodecyltriethoxysilane and water as a solvent. The preparation method is the same as example 1.
The stainless steel sample is put into the metal polishing passivation solution for polishing and passivation, and fig. 3 shows that the stainless steel sample of the embodiment has bright, uniform and compact surface and no scratch after being subjected to polishing and passivation by the metal polishing passivation solution.
Example 4
The polishing passivation solution consists of the following substances in mass volume concentration: 30g/L of glacial acetic acid, 60g/L of creatine citric acid, 1g/L of propylene glycol block polyether, 1g/L of fatty alcohol-polyoxyethylene ether, 0.7g/L of phenylthiourea, 0.6g/L of heptadecafluorodecyltriethoxysilane and water as a solvent. The preparation method is the same as example 1.
The stainless steel sample is put into the metal polishing passivation solution for polishing and passivation, and fig. 4 shows that the stainless steel sample of the embodiment has bright, uniform and compact surface and no scratch after being subjected to polishing and passivation by the metal polishing passivation solution.
Performance test analysis:
1. polished passivated appearance:
the metal polishing passivation solution obtained in the embodiment 1-4 is added to a test sample and directly used, one electrode is connected with a metal workpiece to be processed, the other electrode is connected with an electrode (wrapped with a plurality of layers of cloth), under the action of an electric field, when the electrode contacts the metal workpiece to be processed (metal polishing passivation solution is sprayed in advance on the processing position), atomic oxygen or atomic hydrogen is generated on the surface, a large amount of nano or micro-nano bubbles are generated, the surface of a matrix is stripped and washed, surface oxides and microscopic protruding parts are removed, a compact two-dimensional film is formed, and the appearance is bright.
2. Stability of polishing passivation solution
The metal polishing passivation solution of the embodiment 1-4 and the general low-temperature polishing passivation solution in the market are respectively put into a closed container, and after the solutions are kept for 24 hours at 40 ℃, the solutions are observed to have appearance changes, whether layering exists or not, and whether the solutions are clear and transparent or not.
3. Corrosion resistance
The metal polishing passivation solution of examples 1 to 4 was added to a test sample and used as it was, and a salt spray test was performed after polishing passivation. And (3) performing GB/T1771 standard on a saline solution with the concentration of 5% at 35 ℃, measuring the weight loss of the sample piece, and calculating the corrosion rate and the corrosion amount.
The polishing passivation solution prepared by the invention does not contain nickel-copper heavy metal ions, thereby reducing the environmental pollution. Table 1 shows the test results of the samples in the embodiments, and it can be seen from table 1 that the polishing passivation solution is used in the invention, and the polishing passivation solution is used in the invention, so that the polishing passivation solution is efficient and convenient, the polishing passivation of stainless steel and titanium alloy can be completed at one time, and the polishing passivation solution is particularly suitable for re-polishing passivation treatment using metal alloy, and ensures the effectiveness of the polishing passivation solution. Table 2 shows the mass change data before and after corrosion in the corrosion resistance test. As can be seen from Table 2, after the metal surface is treated by the metal polishing passivation solution, the metal corrosion rate is reduced, and the corrosion resistance is improved.
TABLE 1 test results
TABLE 2 Mass Change before and after Corrosion (g)
Finally, it is noted that the above-mentioned preferred embodiments illustrate rather than limit the invention, and that, although the invention has been described in detail with reference to the above-mentioned preferred embodiments, it will be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the scope of the invention as defined by the appended claims.
Claims (7)
1. The metal polishing passivation solution is characterized by comprising the following substances in parts by mass and volume: glacial acetic acid 20-50g/L, creatine citrate 50-75g/L, wetting agent 1-2g/L, assistant A0.3-0.8 g/L, assistant B0.5-1 g/L, and the balance of water.
2. The metal polishing passivation solution of claim 1, wherein the metal polishing passivation solution consists of the following substances by mass volume: glacial acetic acid 20-50g/L, creatine citrate 50-60g/L, wetting agent 2g/L, assistant A0.5-0.8 g/L, assistant B0.5-0.7 g/L, and the balance of water.
3. The metal polishing passivation solution of claim 1 or 2, wherein the wetting agent is one or more of propylene glycol block polyether and fatty alcohol-polyoxyethylene ether.
4. The metal polishing passivation solution of claim 1 or 2, wherein the additive A is one or more of thiourea, phenylthiourea, tolylthiourea and chlorophenylthiourea.
5. The metal polishing passivation solution of claim 1 or 2, wherein the auxiliary agent B is heptadecafluorodecyltriethoxysilane or tridecafluorooctyltriethoxysilane.
6. The preparation method of the metal polishing passivation solution of any one of claims 1 to 5, characterized in that the preparation method comprises the following specific steps:
a. weighing the substances according to the mass volume of the proportioning amount, adding creatine citric acid into a small amount of water, stirring to fully dissolve the creatine citric acid, and continuously adding glacial acetic acid and stirring uniformly;
b. and adding the wetting agent and the auxiliary agent A, uniformly stirring, slowly dropwise adding the auxiliary agent B, finally adding the rest water to a constant volume, and continuously stirring to obtain the polishing passivation solution.
7. Use of the metal polishing passivation solution according to any one of claims 1 to 5 in the surface treatment of stainless steel.
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102168265A (en) * | 2011-03-25 | 2011-08-31 | 东北大学 | Chromium-free composite passivator and preparation method thereof |
| CN106086848A (en) * | 2016-07-19 | 2016-11-09 | 东莞市凯盟表面处理技术开发有限公司 | A kind of acid-washing stainless steel passivating solution and preparation method thereof and using method |
| JP2017082253A (en) * | 2015-10-22 | 2017-05-18 | 株式会社Ihi | Descaling treatment method of stainless steel component, and passivation treatment method |
| CN109487280A (en) * | 2018-12-26 | 2019-03-19 | 安徽笃舜智能装备有限公司 | A kind of austenitic stainless steel Cleaning and Passivation agent |
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2021
- 2021-09-08 CN CN202111058961.4A patent/CN113913915B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102168265A (en) * | 2011-03-25 | 2011-08-31 | 东北大学 | Chromium-free composite passivator and preparation method thereof |
| JP2017082253A (en) * | 2015-10-22 | 2017-05-18 | 株式会社Ihi | Descaling treatment method of stainless steel component, and passivation treatment method |
| CN106086848A (en) * | 2016-07-19 | 2016-11-09 | 东莞市凯盟表面处理技术开发有限公司 | A kind of acid-washing stainless steel passivating solution and preparation method thereof and using method |
| CN109487280A (en) * | 2018-12-26 | 2019-03-19 | 安徽笃舜智能装备有限公司 | A kind of austenitic stainless steel Cleaning and Passivation agent |
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