CN113812215A - 用于极紫外光源的保护系统 - Google Patents

用于极紫外光源的保护系统 Download PDF

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Publication number
CN113812215A
CN113812215A CN202080034591.8A CN202080034591A CN113812215A CN 113812215 A CN113812215 A CN 113812215A CN 202080034591 A CN202080034591 A CN 202080034591A CN 113812215 A CN113812215 A CN 113812215A
Authority
CN
China
Prior art keywords
shielding gas
conduit
delivery system
target
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202080034591.8A
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English (en)
Chinese (zh)
Inventor
S·德德亚
H·G·泰格波什
R·W·J·M·范登布蒙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
ASML Netherlands BV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of CN113812215A publication Critical patent/CN113812215A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN202080034591.8A 2019-05-08 2020-05-07 用于极紫外光源的保护系统 Pending CN113812215A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201962845007P 2019-05-08 2019-05-08
US62/845,007 2019-05-08
PCT/EP2020/062670 WO2020225347A1 (en) 2019-05-08 2020-05-07 Protection system for an extreme ultraviolet light source

Publications (1)

Publication Number Publication Date
CN113812215A true CN113812215A (zh) 2021-12-17

Family

ID=70738480

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080034591.8A Pending CN113812215A (zh) 2019-05-08 2020-05-07 用于极紫外光源的保护系统

Country Status (6)

Country Link
JP (1) JP2022532840A (ja)
KR (1) KR20220005464A (ja)
CN (1) CN113812215A (ja)
NL (1) NL2025434A (ja)
TW (1) TW202105040A (ja)
WO (1) WO2020225347A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7328046B2 (ja) * 2019-07-25 2023-08-16 ギガフォトン株式会社 Ｅｕｖチャンバ装置、極端紫外光生成システム、及び電子デバイスの製造方法
IL308073A (en) * 2021-06-25 2023-12-01 Asml Netherlands Bv Apparatus and method for producing drops of target material in an EUV source

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10237960B2 (en) * 2013-12-02 2019-03-19 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
US9301382B2 (en) * 2013-12-02 2016-03-29 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
JP6751163B2 (ja) * 2017-01-30 2020-09-02 ギガフォトン株式会社 極端紫外光生成装置

Also Published As

Publication number Publication date
TW202105040A (zh) 2021-02-01
NL2025434A (en) 2020-11-26
WO2020225347A1 (en) 2020-11-12
KR20220005464A (ko) 2022-01-13
JP2022532840A (ja) 2022-07-20

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