CN113782408A - Plasma emission direction control device, plasma source and starting method thereof - Google Patents
Plasma emission direction control device, plasma source and starting method thereof Download PDFInfo
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Abstract
The present application relates to a plasma emission direction control apparatus, a plasma source and a starting method thereof, the apparatus including: applied to a plasma source comprising: the ionization chamber, the radio frequency coil and the air supply pipeline; wherein, one side of the ionization chamber is connected with an ion emission port; the control device includes: the anode is arranged at the position of the ion emission opening, and the anode power supply is connected with the anode; the anode power supply provides positive electrode electricity for the anode to drive the anode to generate an electric field, and the plasma is emitted at a set emission angle under the action of the electric field; the technical scheme can control the emission angle and the coverage range of the plasma, overcomes the defect of fixed plasma emission position, thereby improving the controllability of the plasma emission angle, having good plasma uniformity and enhancing the coating using effect of the plasma source.
Description
Technical Field
The application relates to the technical field of ion sources, in particular to a plasma emission direction control device, a plasma source and a starting method thereof.
Background
The plasma source mainly comprises a parallel flat plasma source (capacitive coupling), a microwave plasma source, an Inductive Coupling (ICP) high-frequency plasma source and the like; the capacitive coupling plasma source generally adopts two circular parallel flat plates as an upper electrode and a lower electrode, and a radio frequency power supply is coupled to the upper electrode plate and the lower electrode plate through a distribution network. The microwave plasma maintains glow discharge to reaction gas by using a microwave Electron Cyclotron Resonance (ECR) technology, and is flexible in controlling components of a film and internal stress of a coating film. The inductively coupled high-frequency plasma source mainly utilizes an inductively coupled high-frequency plasma device.
The application of the plasma source mainly comprises Reactive Ion Etching (RIE) and Plasma Enhanced Chemical Vapor Deposition (PECVD); the etching process of the reactive ion etching has two functions of physics and chemistry, and glow discharge is carried out under low vacuum of a few to dozens of Pa. The PECVD technology based on the glow discharge method can ensure that reaction gas is ionized to form plasma under the excitation of an external electromagnetic field.
The conventional plasma source has the defects of fixed plasma emission position, fixed and unadjustable coverage area and poor plasma uniformity during structural design, and the defects of insufficient firmness of film formation easily occur.
Disclosure of Invention
In view of the above, it is necessary to provide a plasma emission direction control device to achieve controllability of a plasma emission angle and improve plasma uniformity in view of at least one of the above technical drawbacks.
A plasma emission direction control apparatus applied to a plasma source, the plasma source comprising: the ionization chamber, the radio frequency coil and the air supply pipeline; wherein, one side of the ionization chamber is connected with an ion emission port; the control device includes: the anode is arranged at the position of the ion emission opening, and the anode power supply is connected with the anode;
the anode power supply provides positive electrode electricity for the anode to drive the anode to generate an electric field, and the plasma is emitted according to a set emission angle under the action of the electric field.
In one embodiment, the anode is designed into a ring structure and is sleeved at a set position between the ion emission opening and the ionization chamber.
In one embodiment, the plasma emission direction control device further comprises a controller connected to the anode power supply and used for controlling the on-off state and power supply parameters of the anode power supply so as to control the plasma to emit according to a set emission angle.
In one embodiment, when it is desired to emit a plasma at a low divergence position, the anode is moved closer to the ionization chamber; when the plasma at the high divergence position needs to be emitted, the anode is moved away from the ionization chamber;
when the plasma emission angle needs to be increased, the output voltage of the anode power supply is reduced, and when the plasma emission angle needs to be reduced, the output voltage of the anode power supply is increased.
In one embodiment, the plasma emission direction control device further comprises a chamber structure with adjustable length connected with the ionization chamber and used for adjusting the plasma emission position.
In one embodiment, the adjustable length chamber structure comprises a plurality of different length insulating chamber assemblies connected to the ionization chamber by transition joints.
According to the plasma emission direction control device, the anode is arranged at the position of the ion emission opening of the plasma source, the anode power supply supplies anode electricity to the anode, the anode is driven to generate an electric field, and the plasma is emitted according to the set emission angle under the action of the electric field; the technical scheme can control the emission angle and the coverage range of the plasma, overcomes the defect of fixed plasma emission position, thereby improving the controllability of the plasma emission angle, having good plasma uniformity and enhancing the coating using effect of the plasma source.
Further, the length of the ionization chamber is prolonged by designing a chamber structure with adjustable length, so that the plasma emission position can be adjusted, a plurality of insulating chamber components with different lengths can be designed for replacement, and the use effect of the plasma source is greatly improved.
In addition, the application also provides a plasma source and a starting method thereof, so as to improve the gas ionization efficiency and the ionization effect.
A plasma source, comprising: the plasma emission direction control device, the ionization chamber, the radio frequency coil, the at least one induction coil and the air supply pipeline are arranged in the plasma emission direction control device; the ionization chamber comprises a first ionization chamber corresponding to the radio-frequency coil and a second ionization chamber corresponding to the induction coil; the induction coil is connected to the front end of the radio frequency coil in series, and the first ionization chamber is connected with the second ionization chamber in series;
the gas supply pipeline introduces gas into the first ionization chamber, the gas is ionized by the radio frequency coil, the non-ionized gas enters the second ionization chamber, and plasma is output after secondary ionization is carried out by the induction coil;
the radio frequency coil generates a magnetic field to ionize gas entering the first ionization chamber, and the induction coil generates inductance by inducing the magnetic field generated by the radio frequency coil to ionize gas entering the second ionization chamber.
In one embodiment, the cross-sectional area of the first ionization chamber is less than the cross-sectional area of the second ionization chamber; the gas entering the first ionization chamber has high concentration, and the gas entering the second ionization chamber has large volume.
In one embodiment, the induction coil comprises a first coil and a second coil connected in series, wherein the first coil is encased within the radio frequency coil and the second coil is encased outside the second ionization chamber.
In one embodiment, the radio frequency coil is wrapped with a metal band for enhancing magnetic field conduction efficiency of the radio frequency coil.
In one embodiment, a first metal ring is wrapped between the first coil and the radio frequency coil and used for enhancing the conductivity of the first coil; and the second ionization chamber and the second coil are also provided with a second metal ring for enhancing the conductivity of the second coil.
In one embodiment, the first metal ring and the second metal ring are fixed and connected through a metal connecting column.
In one embodiment, the radio frequency coil is provided with a cooling water channel inside, and the induction coil is provided with a cooling water channel inside.
In one embodiment, the plasma source is provided with a neutralizer at the ion emission opening for providing neutralizing electrons to reduce the starting power of the plasma source.
A starting method of a plasma source is applied to the plasma source, and comprises the following steps:
opening a gas supply pipeline to introduce gas;
starting a radio frequency power supply to provide radio frequency power for the radio frequency coil;
starting a neutralizer, and activating plasma by using electrons output by the neutralizer;
after the plasma source is judged to be successfully started, the neutralizer is closed;
the plasma source is controlled to enter a normal operating mode.
The plasma source and the starting method of the plasma source design the structures of the radio frequency coil and the induction coil, the induction coil generates inductance by inducing the magnetic field generated by the radio frequency coil, gas enters from the first ionization chamber, is ionized by the radio frequency coil, then sequentially enters into the second ionization chamber, and is subjected to secondary ionization by the induction coil step by step and then is output into plasma; according to the technical scheme, an inductance mode is obtained by designing the magnetic field of the induction coil induction radio frequency coil, so that the multistage radio frequency ionization effect is realized, the ionization efficiency is greatly improved, stable gas ionization can be realized under vacuum low pressure, and the effective reaction of the vacuum deposition process is enhanced.
Further, the structure that first ionization chamber is less than the second ionization chamber has been designed, and gas concentration that gas at first got into first ionization chamber is the highest, can carry out the higher ionization of density by radio frequency coil, then the gas space volume that gets into the second ionization chamber increases, is favorable to carrying out high-efficient ionization to gas, has greatly promoted the ionization efficiency of gas.
Furthermore, the conductivity can be enhanced through the induction coil through the metal ring and the metal connecting column, so that the induction inductance efficiency is improved, and the ionization effect is enhanced; the radio frequency coil may enhance magnetic field conduction efficiency through the metal strap.
Furthermore, a neutralizer is arranged outside the ion emission port to assist the starting of the plasma source, and the starting neutralizer is used for outputting electrons when the plasma source is started, so that the plasma source can be started under low power, the starting power of the plasma source is reduced, and the use efficiency of the plasma source is improved.
Drawings
FIG. 1 is a schematic structural diagram of a plasma emission direction control device according to an embodiment;
FIG. 2 is a schematic view of an anode structure;
FIG. 3 is a schematic diagram of a chamber configuration with adjustable length;
FIG. 4 is a schematic diagram of the insulating chamber assembly configuration;
FIG. 5 is a schematic diagram of a plasma source according to one embodiment;
FIG. 6 is a schematic diagram of a coil configuration;
FIG. 7 is a schematic diagram of a radio frequency coil configuration;
FIG. 8 is a schematic diagram of an induction coil configuration;
FIG. 9 is a schematic diagram of an exemplary neutralizer operation;
FIG. 10 is a schematic diagram of another exemplary neutralizer operation;
fig. 11 is a flowchart of a method of starting up a plasma source.
Detailed Description
In order to make the objects, technical solutions and advantages of the present application more apparent, the present application is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
Referring to fig. 1, fig. 1 is a schematic structural diagram of a plasma emission direction control device according to an embodiment, the plasma emission direction control device provided in the present application can be applied to any plasma source at present, and for the plasma source, the structure generally includes an ionization chamber 01, an rf coil 10 and a gas supply pipeline 30; wherein one side of the ionization chamber 01 is connected with the ion emission port, and the other side is a gas supply port, as shown in fig. 1, a plasma source is provided, which supplies gas from the right side, and then passes through the ionization chamber 01 to be ionized, and then is emitted through the ion emission port on the left side.
Taking the plasma source provided above as an example, the control device of the present application may include an anode 40 disposed at the position of the ion emission port, and an anode power source 41 connected to the anode 40; the anode power source 41 provides positive power to the anode 40, drives the anode 40 to generate an electric field, and emits plasma at a set emission angle under the action of the electric field when the plasma passes through the anode 40.
According to the technical scheme of the embodiment, the anode 40 is arranged at the position of the ion emission opening of the plasma source, the anode power supply 41 supplies positive electrode power to the anode 40, the anode 40 is driven to generate an electric field, and the plasma is emitted according to a set emission angle under the action of the electric field; therefore, the emission angle and the coverage range of the plasma can be controlled, the defect of fixed plasma emission position is overcome, the controllability of the plasma is improved, the uniformity of the plasma is good, and the film coating using effect of the plasma source is enhanced.
Referring to fig. 2, fig. 2 is a schematic view of an anode structure; the anode 40 is designed into a circular ring structure and sleeved at a set position between the ion emission port and the ionization chamber 01, as shown in the figure, the position of the anode 40 can be adjusted according to actual conditions, for example, the anode can move to the right side or move to the left side; because the anode 40 can generate electric fields with different intensities at different positions and have different effects on the plasma, in practical application, the electric field of the anode 40 can be adjusted according to requirements, so that controllability of the plasma emission direction can be realized. Accordingly, as shown in fig. 1, a controller 42 may be further provided to control the anode power source 41, and the controller 42 may control the on/off of the anode power source 41 and the output power parameters, including the output voltage, the current magnitude, etc., so as to control the plasma to emit at a set emission angle.
In one embodiment, for controlling the plasma emission direction and position, when it is required to emit plasma at a low divergence position, the anode 40 is moved close to the ionization chamber 01; when it is desired to emit a plasma at a high divergence position, the anode 40 is moved away from the ionization chamber 01; the output voltage of the anode power supply 41 is lowered when the plasma emission angle needs to be increased, and the output voltage of the anode power supply 41 is raised when the plasma emission angle needs to be decreased.
Specifically, under other equivalent conditions, the closer the anode 40 is located to the plasma source, the lower the plasma divergence position, the larger the coverage area; conversely, the higher the plasma divergence position, the smaller the coverage area and the higher the ion density within the irradiation range. Meanwhile, under other equivalent conditions, the smaller the voltage of the anode 40, the larger the plasma emission angle, the higher the voltage of the anode 40, the smaller the plasma emission angle, and the higher the ion density within the radiation range.
In one embodiment, in order to enhance the control of the plasma emission position, the plasma emission direction control apparatus of the present application may further design a chamber structure 210 with adjustable length connected to the ionization chamber 01, as shown in fig. 3, fig. 3 is a schematic view of the chamber structure with adjustable length, and the chamber structure may extend the ion emission port position, thereby adjusting the plasma emission position; in this embodiment, the anode 40 may be disposed at positions 1-3, etc. in the figure, and it may also act on the ions within the chamber structure to adjust its final emission direction.
Further, as shown in fig. 4, fig. 4 is a schematic structural diagram of an insulating chamber assembly, the length-adjustable chamber structure 210 may be designed with a plurality of insulating chamber assemblies 211 with different lengths, in use, the insulating chamber assembly 211 with a corresponding length may be selected according to requirements, and is connected to the ionization chamber 01 through the adapter 212, and by adjusting the insulating chamber assemblies 211 with different lengths, the lower the length is, the shorter the plasma divergence position is, and the longer the length is, the higher the plasma divergence position is; for the insulating chamber assembly 211, a through-bore adapter is used, and the adapter 212 is made of quartz insulating material or high temperature resistant insulating material.
According to the technical scheme of the embodiment, the length of the ionization chamber 01 is prolonged by the chamber structure with the adjustable length, so that the plasma emission position can be adjusted, a plurality of insulating chamber components with different lengths can be designed for replacement, and the use effect of the plasma source is greatly improved.
In conclusion, the directional movement of the plasma is realized by controlling the anode, the plasma input at different positions is realized by adjusting the insulating chamber components with different lengths, and the action position of the plasma is controlled.
Embodiments of the plasma source of the present application are set forth below.
Referring to fig. 5, fig. 5 is a schematic view showing a structure of a plasma source according to an embodiment, in which a cross-sectional view is shown at a side angle; as shown in the figure, the plasma source provided in this embodiment mainly includes the plasma emission direction control device, the ionization chamber 01, the rf coil 10, at least one induction coil 20, and the gas supply pipeline 30 provided in the above embodiments; wherein the ionization chamber 01 comprises a first ionization chamber 11 corresponding to the radio frequency coil 10 and a second ionization chamber 21 corresponding to the induction coil 20; around the periphery of the first ionization chamber 11 may be an insulating member of quartz material.
As shown in the figure, the induction coil 20 is connected in series at the front end of the rf coil 10, and the first ionization chamber 11 is connected in series with the second ionization chamber 21, for convenience of description, in this embodiment, one induction coil 20 is taken as an example, and if a plurality of ionization chambers need to be connected in series, a plurality of ionization chambers can be continuously connected in series from the left side of the figure and corresponding induction coils are designed.
In the working process, the gas supply pipeline 30 introduces gas into the first ionization chamber 11, the gas is ionized by the rf coil 10, after the gas is ionized by the rf coil 10, part of the non-ionized gas enters the second ionization chamber 21, after the gas is secondarily ionized by the induction coil 20, plasma is output, and the plasma is emitted from the left opening, and the specific structure is not shown in the drawing.
In the ionization process, firstly, the radio frequency coil 10 generates a magnetic field to ionize the gas entering the first ionization chamber 11, and meanwhile, the induction coil 20 generates inductance by inducing the magnetic field generated by the radio frequency coil 10 to ionize the gas entering the second ionization chamber 21; the multi-stage radio frequency ionization effect is the multi-stage induction and the stage-by-stage ionization in the real sense, and is not the ionization of a plurality of radio frequency coils, so that the ionization efficiency is greatly improved, the stable gas ionization can be realized under the vacuum low pressure, and the effective reaction in the vacuum deposition process is enhanced; because the multi-stage induction coil and the ionization chamber can be connected in series, the gas can be completely and fully ionized theoretically.
In order to make the technical solutions of the present application clearer, further embodiments are described below with reference to the accompanying drawings.
In one embodiment, in order to improve the gas ionization efficiency, referring to fig. 5, taking the example that the first ionization chamber 11 is coaxially connected with the second ionization chamber 21, the sectional area of the first ionization chamber 11 is smaller than that of the second ionization chamber 21; the utility model discloses a gas ionization chamber, including the first ionization chamber 11, the second ionization chamber 21, the second ionization chamber is used for the second ionization chamber to get into the second ionization chamber.
For the radio frequency coil 10 and induction coil 20 configuration, reference is made to fig. 6, which is a schematic diagram of the coil configuration; as shown, the induction coil 20 may include two parts of a first coil 201 and a second coil 202 connected in series, wherein the first coil 201 is nested in the radio frequency coil 10, and the second coil 202 is wrapped outside the second ionization chamber 21; in this design mechanism, the first coil 201 can efficiently induce the magnetic field of the radio frequency coil 10 and conduct to the second coil 202.
With continued reference to fig. 6, further, a first metal coil 221 may be wrapped between the first coil 201 and the radio frequency coil 10 to enhance the conductivity of the first coil 201; similarly, the second ionization chamber 21 and the second coil 202 are further provided with a second metal ring 222 for enhancing the conductivity of the second coil 202; preferably, the metal ring is made of copper metal.
As shown in fig. 7, fig. 7 is a schematic structural diagram of the rf coil, the rf coil 10 may further be wrapped with a metal strap 12, and the metal strap 12 is connected by soldering to enhance the magnetic field conduction efficiency of the rf coil 10, and preferably, the metal strap 12 is made of copper metal. For the radio frequency coil 10, the radio frequency coil is connected to a radio frequency power supply through a radio frequency matching network and a matching network controller, and the radio frequency power of the radio frequency coil 10 can be controlled through the matching network controller.
In addition, referring to fig. 8, fig. 8 is a schematic structural diagram of an induction coil, and the first metal ring 221 and the second metal ring 222 are fixed and connected through a metal connection column 23, preferably, the metal connection column 23 is made of copper metal.
According to the scheme of the embodiment, the electric conductivity can be enhanced through the induction coil through the metal ring and the metal connecting column, so that the induction inductance efficiency is improved, and the ionization effect is enhanced; the radio frequency coil may enhance magnetic field conduction efficiency through the metal strap.
Referring to fig. 6 to 8, a cooling water path is built in the rf coil 10, and a cooling water path is built in the induction coil 20, and passes through the cooling water path, as shown in fig. 6 and 7, a water inlet a1 and a water outlet b1 of the rf coil 10, a water inlet a2 and a water outlet b2 of the induction coil 20; the cooling water cooling design can efficiently dissipate heat of the radio frequency coil 10 and the induction coil 20, and ensure the stability of the plasma source.
In one embodiment, in order to reduce the starting power, the plasma source of the present application may further include a neutralizer 50 disposed at the ion emitting opening, and the specific location may be set according to actual requirements, as shown in fig. 9, fig. 9 is an exemplary operation diagram of the neutralizer, the neutralizer 50 is disposed outside the ion emitting opening, and may provide neutralizing electrons when the plasma source is started, as shown in fig. 10, fig. 10 is another exemplary operation diagram of the neutralizer, and the neutralizer 50 is disposed at the ion emitting opening of the adjustable length chamber structure 210, wherein the adjustable length chamber structure 210 is sleeved with the anode 40, and may control the plasma emitting direction.
According to the technical scheme, because a large number of electrons exist in vacuum, the electrons and ionized plasma collide, so that the starting power of the plasma source can be reduced, and the experimental and actual measurement results show that the plasma source can be started only by thousands of watts of power, and the scheme of the embodiment can be started under hundreds of watts of power.
Based on the technical scheme of the neutralizer, the embodiment of the starting method of the plasma source is explained below; as shown in fig. 11, fig. 11 is a flowchart of a starting method of the plasma source, which mainly includes:
s1, opening the gas supply pipeline to introduce gas; specifically, the gas flow meter was turned on to start introducing the reaction gas.
s2, starting the radio frequency power supply to supply the radio frequency power supply to the radio frequency coil, and ionizing the gas to generate plasma; where the plasma source is started and the gas begins to ionize within the ionization chamber.
s3, starting the neutralizer, and activating the plasma by using the electrons output by the neutralizer; specifically, the neutralizer is turned on to provide electrons to the plasma source.
s4, after judging that the plasma source is started successfully, closing the neutralizer; specifically, a large number of electron plasmas collide in the vacuum, so that the low-power starting can be successful, and the neutralizer can be closed after the low-power starting is successful.
s5, controlling the plasma source to enter a normal operation mode.
According to the plasma source and the starting method thereof in the embodiment, the neutralizer is arranged outside the ion emitting port to assist the starting of the plasma source, and the starting neutralizer is used for outputting electrons during starting, so that the plasma source can be started under low power, the starting power of the plasma source is reduced, and the use efficiency of the plasma source is improved.
By combining the technical scheme of the embodiment, the multi-stage radio frequency ionization effect is realized, the ionization efficiency is greatly improved, stable gas ionization can be realized under vacuum low pressure, and the effective reaction in the vacuum deposition process is enhanced; stable gas ionization effect under low pressure (E-2 Pa in high vacuum environment) is realized.
The above-mentioned embodiments only express several embodiments of the present application, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the concept of the present application, which falls within the scope of protection of the present application. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (10)
1. A plasma emission direction control apparatus applied to a plasma source, the plasma source comprising: the ionization chamber, the radio frequency coil and the air supply pipeline; wherein, one side of the ionization chamber is connected with an ion emission port; characterized in that the control device comprises: the anode is arranged at the position of the ion emission opening, and the anode power supply is connected with the anode;
the anode power supply provides positive electrode electricity for the anode to drive the anode to generate an electric field, and the plasma is emitted according to a set emission angle under the action of the electric field.
2. The plasma emission direction control device of claim 1, wherein the anode is designed as a ring structure and is disposed at a predetermined position between the ion emission opening and the ionization chamber.
3. The plasma emission direction control device according to claim 2, further comprising a controller connected to the anode power supply for controlling the anode power supply to be turned on or off and the power supply parameters thereof, so as to control the plasma to be emitted at a set emission angle.
4. The plasma emission direction control device according to claim 3, wherein the anode is moved closer to the ionization chamber when it is desired to emit a plasma at a low divergence position; when the plasma at the high divergence position needs to be emitted, the anode is moved away from the ionization chamber;
when the plasma emission angle needs to be increased, the output voltage of the anode power supply is reduced, and when the plasma emission angle needs to be reduced, the output voltage of the anode power supply is increased.
5. The plasma emission direction control apparatus according to any one of claims 1 to 4, further comprising a chamber structure of adjustable length connected to the ionization chamber for adjusting a plasma emission position.
6. The plasma emission direction control apparatus of claim 5, wherein the adjustable length chamber structure comprises a plurality of different length insulating chamber assemblies connected to the ionization chamber by transition joints.
7. A plasma source, comprising: the plasma emission direction control device, the ionization chamber, the radio frequency coil, the at least one induction coil, and the gas supply line of any one of claims 1 to 6; the ionization chamber comprises a first ionization chamber corresponding to the radio-frequency coil and a second ionization chamber corresponding to the induction coil; the induction coil is connected to the front end of the radio frequency coil in series, and the first ionization chamber is connected with the second ionization chamber in series;
the gas supply pipeline introduces gas into the first ionization chamber, the gas is ionized by the radio frequency coil, the non-ionized gas enters the second ionization chamber, and plasma is output after secondary ionization is carried out by the induction coil;
the radio frequency coil generates a magnetic field to ionize gas entering the first ionization chamber, and the induction coil generates inductance by inducing the magnetic field generated by the radio frequency coil to ionize gas entering the second ionization chamber.
8. The plasma source of claim 7, wherein the induction coil comprises a first coil and a second coil in series, wherein the first coil is encased within the radio frequency coil and the second coil is encased outside the second ionization chamber.
9. The plasma source of claim 8, wherein the rf coil is wrapped with a metal tape to enhance magnetic field conduction efficiency of the rf coil;
a first metal ring is wrapped between the first coil and the radio frequency coil and used for enhancing the conductivity of the first coil; the second ionization chamber and the second coil are also provided with a second metal ring for enhancing the conductivity of the second coil;
the first metal ring and the second metal ring are fixed and connected through a metal connecting column.
10. The plasma source of claim 7, wherein a neutralizer is provided at the ion emission port for providing neutralizing electrons to reduce the starting power of the plasma source.
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| CN202111081909.0A CN113782408A (en) | 2021-09-15 | 2021-09-15 | Plasma emission direction control device, plasma source and starting method thereof |
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| CN202111081909.0A CN113782408A (en) | 2021-09-15 | 2021-09-15 | Plasma emission direction control device, plasma source and starting method thereof |
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