CN113768432A - Cleaning method of cleaning assembly and cleaning robot system - Google Patents

Cleaning method of cleaning assembly and cleaning robot system Download PDF

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Publication number
CN113768432A
CN113768432A CN202110979654.3A CN202110979654A CN113768432A CN 113768432 A CN113768432 A CN 113768432A CN 202110979654 A CN202110979654 A CN 202110979654A CN 113768432 A CN113768432 A CN 113768432A
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China
Prior art keywords
cleaning
task
assembly
robot
node
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CN202110979654.3A
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Chinese (zh)
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不公告发明人
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Ecovacs Robotics Suzhou Co Ltd
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Ecovacs Robotics Suzhou Co Ltd
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Priority to CN202110979654.3A priority Critical patent/CN113768432A/en
Publication of CN113768432A publication Critical patent/CN113768432A/en
Priority to PCT/CN2022/105329 priority patent/WO2023011124A1/en
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    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4091Storing or parking devices, arrangements therefor; Means allowing transport of the machine when it is not being used
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/40Parts or details of machines not provided for in groups A47L11/02 - A47L11/38, or not restricted to one of these groups, e.g. handles, arrangements of switches, skirts, buffers, levers
    • A47L11/4011Regulation of the cleaning machine by electric means; Control systems and remote control systems therefor
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L2201/00Robotic cleaning machines, i.e. with automatic control of the travelling movement or the cleaning operation
    • A47L2201/02Docking stations; Docking operations
    • A47L2201/028Refurbishing floor engaging tools, e.g. cleaning of beating brushes
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L2201/00Robotic cleaning machines, i.e. with automatic control of the travelling movement or the cleaning operation
    • A47L2201/06Control of the cleaning action for autonomous devices; Automatic detection of the surface condition before, during or after cleaning

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  • Electric Vacuum Cleaner (AREA)

Abstract

The application discloses cleaning method and cleaning robot system of cleaning subassembly, this method is applied to cleaning robot's basic station, includes: determining a task node where a cleaning robot returning to a base station is located in a current cleaning task; and cleaning the cleaning component of the cleaning robot by adopting a cleaning strategy matched with the task node. According to the method, after the task node where the cleaning robot is located in the current cleaning task is determined, the cleaning assembly is cleaned by the cleaning strategy matched with the task node, so that the cleaning efficiency of the cleaning assembly can be improved, the using amount and the energy consumption of the cleaning solution can be saved, the cleaning assembly can be cleaned by the cleaning strategy adaptive to the task node where the cleaning robot is located, and the flexibility and the intelligence of the cleaning process are improved.

Description

Cleaning method of cleaning assembly and cleaning robot system
Technical Field
The application relates to the field of intelligent cleaning, in particular to a cleaning method of a cleaning assembly and a cleaning robot system.
Background
Cleaning robots with higher and higher intelligent degrees are widely used, an existing cleaning robot system can be provided with a special base station to realize automatic charging of the cleaning robot and cleaning of cleaning components (such as rotating brushes, cleaning rags and the like) of the cleaning robot, the base station is provided with a parking space for parking the cleaning robot, and the cleaning robot can be charged and clean the cleaning components of the cleaning robot at the parking space. Namely, the base station, as an important component of the intelligent cleaning robot, plays roles of recovering dirt collected by the cleaning robot, cleaning a cleaning assembly of the cleaning robot, injecting water and discharging dirt for the cleaning robot, and supplementing electric energy. The mode that cleaning machines people's cleaning assembly was washd in basic station is generally comparatively fixed, and intelligent degree is lower for cleaning assembly has excessive cleanness, energy consumption and cleaning solution quantity higher in the clean link of part, and then has clean insufficient, dirty washing scheduling problem in the clean link of part.
Therefore, how to make the cleaning process of the cleaning component of the cleaning robot more intelligent becomes a technical problem to be solved urgently by those skilled in the art.
Disclosure of Invention
The embodiment of the application provides a cleaning method of a cleaning assembly and a cleaning robot system, which aim to solve the technical problems that the intelligentization degree of a cleaning assembly mode of a base station cleaning robot in the prior art is low, the cleaning assembly is excessively cleaned in a partial cleaning link, the energy consumption and the cleaning liquid consumption are high, and the partial cleaning link is insufficient in cleaning and incomplete in dirty cleaning.
The embodiment of the application provides a cleaning method of a cleaning assembly, which is applied to a base station of a cleaning robot and comprises the following steps:
determining a task node where a cleaning robot returning to a base station is located in a current cleaning task;
and cleaning a cleaning component of the cleaning robot by adopting a cleaning strategy matched with the task node.
Optionally, the task node includes: the cleaning task starting node of the cleaning robot corresponds to the cleaning strategy matched with the task node and comprises at least one of the following steps:
the amount of cleaning liquid used for the cleaning assembly is less than a predetermined amount of cleaning liquid;
a cleaning duration for the cleaning assembly is less than a predetermined duration;
a number of cleanings for the cleaning assembly is less than a predetermined number;
the cleaning liquid flow rate to the cleaning assembly is less than a predetermined flow rate.
Optionally, the task node includes: a cleaning task starting node of the cleaning robot; the method further comprises the following steps: obtaining status information of the cleaning assembly and/or status information of the environment being cleaned;
correspondingly, the cleaning strategy matched with the task node comprises the following steps: a cleaning strategy matching the cleaning task initiating node and the status information of the cleaning assembly and/or the status information of the environment being cleaned.
Optionally, the status information of the cleaning assembly includes: humidity information of the cleaning assembly;
the cleaning strategy matched with the cleaning task starting node and the state information of the cleaning component comprises the following steps: cleaning liquid dosage matched with the cleaning task starting node and the humidity information of the cleaning assembly.
Optionally, the obtaining the status information of the cleaning assembly includes: determining humidity information of the cleaning assembly based on a drying state of the cleaning assembly corresponding to a previous cleaning task.
Optionally, the state information of the cleaned environment includes: temperature information and/or humidity information of the environment being cleaned;
the cleaning strategy matched with the cleaning task starting node and the state information of the cleaned environment comprises the following steps: cleaning liquid dosage matched with the temperature information and/or humidity information of the cleaning task starting node and the cleaned environment.
Optionally, the task node includes: a cleaning task processing node or a cleaning task completing node;
the cleaning strategy matched with the task node comprises at least one of the following:
the usage amount of the cleaning liquid for the cleaning assembly is larger than a preset cleaning liquid amount;
a cleaning duration for the cleaning assembly is greater than a predetermined duration;
the number of cycles of cleaning for the cleaning assembly is greater than a predetermined number;
a cleaning liquid flow rate for the cleaning assembly is greater than a predetermined flow rate;
and in the process of cleaning the cleaning assembly, the assembly bearing member for bearing the cleaning assembly moves in a positive and negative alternate rotation mode.
Optionally, the task node includes: cleaning task processing nodes; the cleaning strategy matched with the task node comprises the following steps: during the cycle of cleaning the cleaning assembly for a plurality of times, at least one of the following factors is implemented in a decreasing manner:
cleaning fluid usage for a single cleaning of the cleaning assembly;
a cleaning duration for a single cleaning of the cleaning assembly;
a cleaning liquid flow rate for a single cleaning of the cleaning assembly;
the component carrying member for carrying the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation or the vibration amplitude and/or the vibration frequency of the component carrying member for carrying the cleaning component.
Optionally, the task node includes: cleaning the task completion node; the cleaning strategy matched with the task node comprises the following steps: during the cyclic multiple cleaning of the cleaning assembly, at least one of the following factors is implemented in a constant manner:
cleaning fluid usage for a single cleaning of the cleaning assembly;
a cleaning duration for a single cleaning of the cleaning assembly;
a cleaning liquid flow rate for a single cleaning of the cleaning assembly;
the component carrying member for carrying the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation or the vibration amplitude and/or the vibration frequency of the component carrying member for carrying the cleaning component.
Optionally, the method further includes: and drying the cleaning assembly after the cleaning treatment.
Optionally, the determining a task node where the cleaning robot returning to the base station is located in the current cleaning task includes one of the following manners:
determining the task node based on a task execution phase of the cleaning robot for a current cleaning task;
determining the task node based on cleanliness of a cleaning component of the cleaning robot;
determining the task node based on functional attribute information of the cleaning component for a subsequent proximate time interval or a subsequent proximate task execution phase.
An embodiment of the present application further provides a cleaning robot system, including: a cleaning robot and a base station to which the cleaning robot is moored, the base station having a cleaning control unit;
the cleaning control unit is used for determining a task node where the cleaning robot returning to the base station is located in the current cleaning task; and cleaning a cleaning component of the cleaning robot by adopting a cleaning strategy matched with the task node.
The present application further provides, in combination with a specific application scenario, a cleaning method of a cleaning assembly, including:
the cleaning robot is arranged in a berth of the base station and starts a cleaning task;
before the cleaning robot leaves the base station, the base station soaks the cleaning assembly of the cleaning robot to a usable state, and the cleaning robot carries the soaked cleaning assembly to a designated area for cleaning;
after the cleaning robot finishes cleaning part of the designated area in the designated area, returning to the base station, cleaning the cleaning assembly for multiple times by the base station in a mode that the cleaning intensity is gradually decreased, and cleaning the uncleaned area in the designated area by the cleaning robot, wherein the cleaning intensity comprises at least one of the following conditions: cleaning fluid usage for a single cleaning of the cleaning assembly; a cleaning duration for a single cleaning of the cleaning assembly; a cleaning liquid flow rate for a single cleaning of the cleaning assembly; the component bearing member for bearing the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation or the vibration amplitude and/or the vibration frequency of the component bearing member for bearing the cleaning component;
repeating the steps until the designated area is cleaned;
and after the cleaning robot finishes cleaning the designated area, returning to the base station, cleaning the cleaning assembly for multiple times by the base station in a mode of constant cleaning strength, and drying the cleaned cleaning assembly.
The application provides a cleaning method of a cleaning assembly, which is applied to a base station of a cleaning robot and comprises the following steps: determining a task node where a cleaning robot returning to a base station is located in a current cleaning task; and cleaning a cleaning component of the cleaning robot by adopting a cleaning strategy matched with the task node. According to the method, after the task node where the cleaning robot is located in the current cleaning task is determined, the cleaning component is cleaned by adopting the cleaning strategy matched with the task node, the cleaning efficiency of the cleaning component can be improved, the cleaning solution using amount and the energy consumption are saved, the cleaning component can be cleaned by the cleaning strategy adaptive to the task node where the cleaning robot is located, the flexibility and the intelligence of the cleaning process are improved, the problems that the cleaning component is excessively cleaned in part of cleaning links, the energy consumption and the cleaning solution using amount are high, insufficient cleaning exists in part of cleaning links, dirty cleaning is not thorough and the like are effectively avoided.
Drawings
Fig. 1 is a schematic view of a base station of a cleaning robot provided herein;
FIG. 2 is a schematic diagram of a prior art cleaning sequence for a cleaning assembly;
FIG. 3 is a flow chart of a method of cleaning a cleaning assembly according to a first embodiment of the present disclosure;
FIG. 4 is a schematic diagram of a cleaning sequence for the cleaning assembly according to the first embodiment of the present disclosure;
fig. 5 is a schematic structural diagram of a cleaning robot system according to a second embodiment of the present application;
fig. 6 is a flowchart of a cleaning method of a cleaning assembly according to a third embodiment of the present disclosure.
Detailed Description
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. This application is capable of implementation in many different ways than those herein set forth and of similar import by those skilled in the art without departing from the spirit of this application and is therefore not limited to the specific implementations disclosed below.
Please refer to fig. 1, which is a schematic diagram of a base station provided in the present application.
As shown in fig. 1, the base station includes a cleaning module, a charging seat and a dust collecting port, and the present embodiment is mainly described with respect to the functions of the cleaning module, and the cleaning module is used for completing the cleaning operation of the cleaning component (such as a rotating brush or a cleaning cloth) of the cleaning robot. The base station is provided with a cleaning robot berth, and the cleaning robot needs to return to the berth provided by the base station in the cleaning task processing process or after the cleaning task processing process is completed, or under the condition that charging is needed. When the cleaning robot returns to the docking station of the base station 101, the base station 101 charges the cleaning robot and cleans the cleaning components thereof.
For example, in a common scenario of a cleaning robot, an initial position of the cleaning robot is located at a base station, a charging state of the cleaning robot or a drying state of a cleaning assembly may be maintained. After the cleaning robot receives a cleaning instruction aiming at a specified area, a cleaning task is started, the cleaning robot starts from the base station and starts cleaning work after reaching the corresponding position of the specified area, after the cleaning task is completed or in the process of processing the cleaning task, the cleaning robot needs to return to the base station, and a cleaning component at the bottom of the cleaning robot is cleaned by a cleaning tool arranged in the base station.
The mode of the clean subassembly of cleaning machines people is washd in current basic station generally adopts the circulation to wash, and the cooperation brush dish (being used for bearing the weight of the rag) is rotatory, and the mode of the clean subassembly of structure scraping (rag), circulation are washed and are set for relatively fixed, for example, once complete cleaning process to clean subassembly includes: the brush disc rotates, the base station discharges clear water for a period of time, then the base station pumps sewage for a period of time, the operation is circulated for 1-3 times (as shown in figure 2), the time T1 for flushing water in one cleaning cycle is the same, the time T2 for pumping sewage in one cleaning cycle is also the same, and then the brush disc stops rotating, and the cleaning is completed. This kind of mode of circulation washing can not be according to the scene dynamic change cleaning strategy of in-service use for the intelligent degree to the cleaning process of cleaning assembly is lower, and then makes cleaning assembly have excessive cleanness, energy consumption and cleaning solution quantity higher in the clean link of part, and then has clean insufficient, dirty washing scheduling problem in the clean link of part.
In order to solve the problem that the degree of intelligence of the cleaning manner for the cleaning assembly is low due to the same cleaning strategy adopted in each cleaning stage in the prior art, a first embodiment of the present application provides a cleaning method for the cleaning assembly, the main execution body of the method is a base station of the cleaning robot, more specifically, a cleaning control unit of the base station, please refer to fig. 3 to understand the embodiment, and fig. 3 is a flowchart of the cleaning method for the cleaning assembly provided in the first embodiment of the present application; this method is described below with reference to fig. 3.
S101, determining task nodes where the cleaning robot returning to the base station is located in the current cleaning task.
The "returning base station" in this step may refer to that the current position of the cleaning robot is the berth of the base station, specifically, the current position of the cleaning robot is monitored to be the berth of the base station from an external cleaning area during or after the cleaning task is completed, or the current position of the cleaning robot is monitored to be a "normalized" position before the cleaning task is executed, that is, the cleaning robot is normally parked at the berth of the base station at the execution time of the non-cleaning task to maintain a drying state, a charging state or a standing state, which is not limited herein.
The complete cleaning process of the cleaning robot for a specified area (e.g. the whole room) is a cleaning task which may be initiated based on a preset point in time, e.g. a predetermined point in time per day or a predetermined point in time per week, or based on a user trigger. The task node refers to a node set for the cleaning robot based on the self state or the cleaning stage of the cleaning robot, and is used for distinguishing different states or different cleaning stages of the cleaning robot. In this embodiment, the task node where the cleaning robot returning to the base station is located in the current cleaning task may be determined as follows: determining the task node based on a task execution phase of the cleaning robot for a current cleaning task. During the execution of one cleaning task, the cleaning robot needs to go through at least the following task execution phases: when a cleaning task is started, the base station soaks or cleans the cleaning assembly, and a container (such as a water tank) containing cleaning liquid is used for containing a preset dosage of cleaning liquid, and the stage corresponds to a cleaning task starting node; leaving the base station and going to a designated area for cleaning, returning to the base station at least once in the cleaning task processing process to clean the cleaning assembly and supplement cleaning solution, wherein the stage corresponds to a cleaning task processing node; and after the cleaning task is finished, returning to the base station to clean the cleaning component and dry the cleaning component and charging, wherein the cleaning task is finished corresponding to the node.
It should be noted that different types of task nodes can be obtained based on different division criteria, and in an alternative embodiment of the present application, the task nodes can be determined based on only the cleanliness or contamination of the cleaning assembly of the cleaning robot, for example, by detecting the cleanliness or contamination of the cleaning assembly (cleaning cloth), and determining that the cleaning robot is the first node in the current cleaning task when the cleaning cloth is high in cleanliness, and the cleaning robot is the second node in the current cleaning task when the cleaning cloth is low in cleanliness. Or the cleanliness or the dirt degree of the cleaning assembly is subdivided into a plurality of grades, and the cleaning assemblies with different grades of cleanliness or dirt degrees correspond to different task nodes.
In another optional embodiment of the present application, the task node may be determined based on function attribute information of the cleaning component in a subsequent adjacent time interval or a subsequent adjacent task execution stage, for example, a purpose of the cleaning robot currently returning to the base station may be determined based on a task execution time interval in which the cleaning robot returns to the base station in the same cleaning task or a frequency sequence of times the cleaning robot returns to the base station or the task execution time interval in which the cleaning robot returns to the base station, and if the purposes of the return to the base station are different, function attributes of the cleaning component of the cleaning robot in the subsequent adjacent time interval or the subsequent adjacent task execution stage are different, and different function attributes correspond to different task nodes.
For example, the number of times that the cleaning robot returns to the base station in the processing period of one cleaning task is set to five times in advance, after the cleaning task is started for the first time and before the cleaning robot leaves the base station, the cleaning robot returns to the base station in the process of executing the cleaning task for the second time and the third time and the fourth time, after the cleaning task is completed for the fifth time, the cleaning robot returns to the base station, when the cleaning robot returns to the base station, the cleaning robot is detected to be the second time return base station of the cleaning robot in the processing period of the cleaning task, the cleaning assembly of the cleaning robot in the next time interval or the next task execution stage has the function of continuously cleaning a second designated area, and the corresponding task node is a second node; when the cleaning robot returns to the base station for the third time in the cleaning task processing period, the cleaning component of the cleaning robot has the function of continuously cleaning a third designated area in the next time interval or the next task execution stage, and the corresponding task node is a third node; when the cleaning robot returns to the base station for the fifth time in the cleaning task processing period, the cleaning assembly of the cleaning robot has the functions of keeping a clean state and a dry state in a subsequent time interval or a subsequent task execution stage so as to deal with the next cleaning task, and the corresponding task node is a fifth node.
For another example, the cleaning robot is preset to correspond to three task execution time intervals in a processing cycle of one cleaning task, the first task execution time interval is from the start of the cleaning task to the time when the cleaning robot leaves the base station, the second task execution time interval is a time interval corresponding to the execution process of the cleaning task, and the third task execution time interval is within a predetermined time period after the task is executed. When the time point when the cleaning robot returns to the base station falls within the first task execution time interval, the cleaning assembly of the cleaning robot has the function of cleaning the designated area in the subsequent time interval or the subsequent task execution stage, and the corresponding task node is the first task node; when the time point when the cleaning robot returns to the base station falls within a second task execution time interval, the cleaning assembly of the cleaning robot has the function of continuously cleaning the designated area in the subsequent time interval or the subsequent task execution stage, and the corresponding task node is a second task node; when the time point when the cleaning robot returns to the base station falls within the third task execution time interval, the cleaning assembly of the cleaning robot has the functions of keeping a clean state and a dry state in a subsequent time interval or a subsequent task execution stage so as to deal with the next cleaning task, and the corresponding task node is a third task node.
It should be noted that although the task nodes may be determined by using different division criteria or different consideration angles, it may be determined that the cleaning difficulty or the cleaning complexity corresponding to the cleaning component of the cleaning robot is different for different task nodes determined by using the same division criteria or the same consideration angles.
And S102, cleaning the cleaning component of the cleaning robot by adopting the cleaning strategy matched with the task node.
After determining the task node where the cleaning robot returning to the base station is located in the current cleaning task in the above steps, this step is used to clean the cleaning component of the cleaning robot by using the cleaning strategy matched with the above task node. That is, since the cleaning robot has different cleaning difficulty levels or cleaning complexity levels corresponding to the cleaning components when the cleaning robot is at different task nodes, the cleaning components correspond to different cleaning strategies, and the cleaning strategies include combination information of some or all of the cleaning elements, such as the amount of cleaning liquid, the cleaning duration, the number of times of cleaning, and the flow rate of cleaning liquid, which are preset or determined in real time for the different task nodes.
In this embodiment, the task node determined based on the task execution phase of the cleaning robot for the current cleaning task is taken as an example for description, and as can be seen from the content of step S101, the task node determined based on the task execution phase may be one of a cleaning task starting node, a cleaning task processing node, and a cleaning task completing node. When the task execution stage corresponding to the cleaning task starting node is the starting of the cleaning task of the cleaning robot, the base station soaks or cleans the cleaning assembly and ensures that a container (such as a water tank) containing cleaning liquid contains a predetermined amount of cleaning liquid; the task execution stage corresponding to the cleaning task processing node is that the cleaning robot leaves the base station and goes to a designated area for cleaning, and the cleaning robot needs to return to the base station in the cleaning task processing process to clean the cleaning assembly and supplement cleaning solution; and the task execution stage corresponding to the cleaning task completion node is that after the cleaning task is completed, the cleaning robot returns to the base station to clean the cleaning assembly and dry the cleaning assembly and charges the cleaning assembly so as to deal with the next cleaning task.
In this embodiment, the cleaning strategies matched with the task nodes may be divided into a basic cleaning strategy and an optimized cleaning strategy, and the basic factors such as water yield and cleaning duration are quantitatively set only based on different task nodes under the basic cleaning strategy, and the basic cleaning strategy can meet the concept of the present application, for example, when the task nodes are cleaning task starting nodes of the cleaning robot, since the cleaning components are in a cleaner state, the corresponding cleaning strategies should adopt a simpler and softer cleaning strategy, and thus the cleaning strategies matched with the task nodes may be one or a combination of more of the following: the usage amount of the cleaning liquid for the cleaning assembly is less than the predetermined cleaning liquid amount; a cleaning duration for the cleaning assembly is less than a predetermined duration; the number of cleanings for the cleaning assembly is less than a predetermined number; the cleaning liquid flow rate to the cleaning assembly is less than the predetermined flow rate. Through the mode, the cleaning flow of the cleaning assembly in the task execution stage corresponding to the cleaning task starting node is simplified, the using amount of the cleaning liquid is saved, and the cleaning efficiency in the stage is improved.
For another example, when the task node is a cleaning task processing node or a cleaning task completing node of the cleaning robot, since the cleaning component is in a dirty state, the corresponding cleaning strategy should adopt a more complex and high-strength cleaning strategy, and therefore the cleaning strategy matched with the task node may be one or a combination of more of the following: the usage amount of the cleaning liquid for the cleaning assembly is larger than the preset cleaning liquid amount; a cleaning duration for the cleaning assembly is greater than a predetermined duration; the number of cycles of cleaning for the cleaning assembly is greater than a predetermined number; the flow rate of the cleaning liquid to the cleaning assembly is greater than a predetermined flow rate; in the process of cleaning the cleaning assembly, an assembly carrying member (such as a brush disc for carrying a cleaning cloth to rotate) for carrying the cleaning assembly moves in a positive and negative alternate rotation manner. The assembly bearing member moves in a positive and negative alternate rotation mode, so that the cleaning assembly can achieve the effect of repeated scrubbing, and the cleaning quality of the cleaning assembly can be effectively guaranteed.
It should be noted that, in this embodiment, since when the cleaning robot is at the cleaning task processing node, the cleaning component is still in the using stage in the current cleaning task, and then the cleaning operation is needed, and when the cleaning robot is at the cleaning task completion node, the cleaning robot will be charged and standby in the docking station for a long time after returning to the base station, and wait for the next cleaning task, the cleaning component will be cleaned sufficiently to remove the dirt as much as possible, so that the cleaning component will not mildew or generate the odor even if the cleaning component is not used for a long time, therefore, the cleaning intensity (the cleaning liquid usage amount, the cleaning duration, the cleaning times, the cleaning liquid flow rate, and the rotation speed and/or the alternating frequency of the component carrying member carrying the cleaning component in the positive and negative alternating rotation, or at least one of the vibration amplitude or the frequency of the component carrying member) of the cleaning component at the cleaning task processing node should be lower than the cleaning task completion node The cleaning strength of.
Corresponding to the basic cleaning strategy, in order to meet the scene subdivision requirements of different task execution stages, in an optional embodiment of the present application, different forms of optimized cleaning strategies may be adopted to clean the cleaning component, and the optimized cleaning strategies may be defined conditions added on the basis of matching task nodes to meet the scene requirements of each task execution stage. For example, when the task node is a cleaning task starting node of the cleaning robot, at least one of state information of the cleaning assembly and state information of the environment to be cleaned may also be obtained, and correspondingly, the cleaning policy matched with the task node is: a cleaning policy that matches the state information of the cleaning task initiating node and the cleaning component, or a cleaning policy that matches the state information of the cleaning task initiating node and the environment to be cleaned, or a cleaning policy that matches the state information of the cleaning task initiating node, the cleaning component, and the environment to be cleaned.
The state information of the cleaning component may be humidity information of the cleaning component, duration information (for example, a rag with longer usage time has a more seriously damaged cleaning function due to wear, water immersion, etc., and thus the cleaning effect is weaker than that of a new rag), and the like, and when the state information of the cleaning component is the humidity information of the cleaning component, the cleaning strategy matched with the state information of the cleaning task starting node and the cleaning component may be: the cleaning liquid usage amount matched with the cleaning task starting node and the humidity information of the cleaning assembly, for example, the cleanliness of the cleaning assembly corresponding to the cleaning task starting node is high, so that the cleaning assembly is not required to be cleaned intensively (for example, the cleaning assembly is not required to be cleaned circularly, the flow rate of the cleaning liquid is not required to be too high, and an assembly bearing member for bearing the cleaning assembly is not required to move in a positive and negative alternate rotation mode), the cleaning assembly is only required to be wetted to a usable state, and in this case, the cleaning liquid can be appropriately supplemented to the predetermined humidity of the usable state on the basis of the current humidity information of the cleaning assembly. In an alternative embodiment of the present application, the manner of obtaining the status information of the cleaning assembly may be: the humidity information of the cleaning assembly is determined based on the drying state of the cleaning assembly corresponding to the previous cleaning task, for example, if the drying state of the cleaning assembly corresponding to the previous cleaning task is drying-completed, it is determined that the humidity of the cleaning assembly is negligible, and if the drying state of the cleaning assembly corresponding to the previous cleaning task is in the process of drying and the drying progress has been half, it is determined that the humidity of the cleaning assembly is half of the humidity value in the case of complete wetting.
The state information of the environment to be cleaned may be at least one of temperature information and humidity information of the environment to be cleaned; correspondingly, the cleaning strategy matched with the cleaning task starting node and the state information of the cleaned environment may be: the cleaning liquid dosage is matched with the temperature information and/or the humidity information of the cleaning task starting node and the cleaned environment. For example, the environment to be cleaned is a room with high temperature and dryness, the cleanliness of the cleaning assembly corresponding to the cleaning task starting node is high, and therefore the cleaning assembly does not need to be cleaned with high intensity (for example, the cleaning assembly does not need to be cleaned circularly, the flow rate of the cleaning solution does not need to be too high, and an assembly carrying member for carrying the cleaning assembly does not need to move in a positive and negative alternate rotation manner), and only the cleaning assembly needs to be soaked to the cleanable state, however, in this case, the influence of the factor that the environment to be cleaned is high temperature and dryness on the using amount of the cleaning solution needs to be considered, the predetermined humidity of the cleanable state of the cleaning assembly is high, and the using amount of the cleaning solution needs to be supplemented is high.
The cleaning strategy matched with the cleaning task start node, the state information of the cleaning assembly, and the state information of the environment to be cleaned refers to a comprehensive cleaning strategy determined by considering all of the cleaning task start node, the state information of the cleaning assembly, and the state information of the environment to be cleaned, for example, a cleaning solution dosage matched with the cleaning task start node, the humidity information of the cleaning assembly, and the humidity and/or temperature of the environment to be cleaned.
Cleaning assemblies are cleaned by adopting the optimized cleaning strategy corresponding to the cleaning task starting node, the cleaning logic of the cleaning assemblies in the cleaning task starting stage can be simplified, the cleaning solution using amount and the energy consumption in the stage are saved, the cleaning efficiency in the stage is improved, factors such as the state information of the cleaning assemblies and the state information of the cleaned environment are combined, the actual requirements of the cleaning work of the cleaning assemblies in the cleaning task starting stage are adapted, and the flexibility and the intelligence of the cleaning process are improved.
In another alternative embodiment of the present application, another form of optimized cleaning strategy is provided, specifically: when the task node is a cleaning task processing node of the cleaning robot, after the cleaning robot returns to the base station, because the cleaning robot has already performed part of the cleaning task, the cleaning cloth is in a dirty state and needs to be repeatedly washed for many times, the cleaning assembly needs to be circularly cleaned according to the preset cleaning times, and meanwhile, because the cleanliness of the cleaning assembly is gradually improved in each cleaning process and the cleaning assembly is still in a use stage and needs to be cleaned, the cleanliness of the cleaning assembly required by the cleaning task processing node is not strictly required, so that one or more of the following factors are gradually reduced in the circulating cleaning process: cleaning fluid usage for a single cleaning of the cleaning assembly; the cleaning duration for a single cleaning of the cleaning assembly (as shown in "mission treatment phase" in fig. 4, T5, T7, T9 are all water discharge flushing times, T6, T8, T10 are all sewage pumping times); a cleaning liquid flow rate for a single cleaning of the cleaning assembly; the component carrying member for carrying the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation or the vibration amplitude and/or the vibration frequency of the component carrying member for carrying the cleaning component. Through this kind of mode can make the cleanliness of the clean subassembly of cleaning task processing stage and the actual demand of this cleaning task processing stage of cleaning work adaptation more to clean subassembly, practice thrift cleaning solution quantity and the energy consumption at this stage, promote clean efficiency, promote the flexibility and the intellectuality of clean process.
In another alternative embodiment of the present application, another form of optimized cleaning strategy is also provided, specifically: when the task node is a cleaning task completion node of the cleaning robot, after the cleaning robot returns to the base station, the cleaning robot is charged in a parking position of the base station for a long time to wait for the next cleaning task, so that the cleaning cloth is sufficiently cleaned to remove dirt as much as possible, so that the cleaning cloth is not mildewed or has peculiar smell even if the cleaning cloth is not used for a long time, multiple times of circulating cleaning are required to be performed on the cleaning cloth according to preset cleaning times, the cleaning cloth is sufficiently cleaned, and at least one of the following factors is realized in a constant mode in the circulating cleaning process: cleaning fluid usage for a single cleaning of the cleaning assembly; the cleaning duration for a single cleaning of the cleaning assembly (as shown in "task complete phase" in fig. 4, T11 is the single discharge flush time, T12 is the single pump down time); a cleaning liquid flow rate for a single cleaning of the cleaning assembly; the component carrying member for carrying the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation or the vibration amplitude and/or the vibration frequency of the component carrying member for carrying the cleaning component. The effect of thoroughly cleaning the cleaning assembly is achieved through the mode, so that the cleanliness of the cleaning assembly in the cleaning task completion stage and the actual requirement of the cleaning work of the cleaning assembly in the cleaning task completion stage can be more matched. And the fan is required to be started after the cleaning is finished so as to carry out air drying/drying treatment on the cleaning cloth after the cleaning treatment, thereby preventing the cleaning cloth from mildewing and generating peculiar smell.
It should be noted that after the cleaning operation of the cleaning assembly at any task node is completed, a container (e.g., a water tank) containing a predetermined amount of cleaning solution can be replenished for use in a subsequent cleaning process. The cleaning liquid is preferably replenished at the cleaning task processing node and the cleaning task completion node, wherein the replenishment of the cleaning liquid at the cleaning task completion node enables the cleaning task to be started directly at the next use without waiting for the replenishment of the cleaning liquid at the cleaning task start stage.
In the above embodiment, a specific implementation of "cleaning the cleaning component of the cleaning robot by using a cleaning strategy matched with the task node" is described mainly based on the task node determined by the cleaning robot in the task execution stage of the current cleaning task, and it should be noted that in other embodiments of the present application, the cleaning component of the cleaning robot may also be cleaned by using a cleaning strategy matched with nodes in step S101, such as "the first node, the second node, the cleaning component with different levels of cleanliness or contamination degree correspond to different task nodes, and the cleaning component of the cleaning robot corresponds to different task nodes with different functional attributes in the subsequent adjacent time interval or the subsequent adjacent task execution stage", and details are not repeated herein.
It should be noted that, in step S101, when the cleaning robot returns to the base station, it is detected that the cleaning robot returns to the base station for the second time in the cleaning task processing cycle, the cleaning component of the cleaning robot has a function of continuously cleaning the second designated area in the next time interval or the next task execution stage, and the corresponding task node is the second node; when the cleaning robot returns to the base station for the third time in the cleaning task processing period, the cleaning component of the cleaning robot has the function of continuously cleaning a third designated area in the next time interval or the next task execution stage, and the corresponding task node is a third node; "the second designated area and the third designated area are shown, and the corresponding task nodes are respectively the second node and the third node, in the process of cleaning the cleaning component of the cleaning robot by using the cleaning strategy matched with the task nodes in step S102, another preferred embodiment of the present invention may detect the degree of contamination of the second designated area or the third designated area, and determine the cleaning strategy matched with the second node or the third node based on the degree of contamination, for example, the degree of contamination of the second designated area is higher, the cleaning strategy matched with the second node may be a cleaning strategy with high cleaning intensity, for example, the cleaning liquid usage amount for the cleaning component is larger, the cleaning time period for the cleaning component is longer, the number of times of cleaning cycles for the cleaning component is larger, the cleaning liquid flow rate for the cleaning component is larger, the rotation frequency and/or the rotation speed of the component carrying member for carrying the cleaning component by using forward and reverse alternate rotation is higher, and the like.
In summary, according to the cleaning method for the cleaning assembly provided by the application, after the task node where the cleaning robot returning to the base station is located in the current cleaning task is determined, the cleaning assembly of the cleaning robot is cleaned by adopting the cleaning strategy matched with the task node. According to the method, after the task node where the cleaning robot is located in the current cleaning task is determined, the cleaning component is cleaned by adopting the cleaning strategy matched with the task node, the cleaning efficiency of the cleaning component can be improved, the cleaning solution using amount and the energy consumption are saved, the cleaning component can be cleaned by the cleaning strategy adaptive to the task node where the cleaning robot is located, the flexibility and the intelligence of the cleaning process are improved, the problems that the cleaning component is excessively cleaned in part of cleaning links, the energy consumption and the cleaning solution using amount are high, the cleaning component is insufficiently cleaned in part of cleaning links, dirty cleaning is not thorough and the like are effectively avoided.
In correspondence with the first embodiment, the second embodiment of the present application also provides a cleaning robot system, which is substantially similar to the first embodiment described above, since the system performs the cleaning work on the cleaning assembly based on the method provided by the first embodiment described above. The following is a brief description of the embodiment of the system, and other relevant points can be found in the partial description of the first embodiment.
Please refer to fig. 5, which is a schematic structural diagram of a cleaning robot system according to a second embodiment of the present application, the cleaning robot system including: a cleaning robot 501 and a base station 502 to which the cleaning robot is docked, the base station having a cleaning control unit (not shown in fig. 5) for determining a task node where the cleaning robot returning to the base station is located in a current cleaning task; and cleaning a cleaning component of the cleaning robot by adopting a cleaning strategy matched with the task node.
Optionally, the task node includes: the cleaning task starting node of the cleaning robot corresponds to the cleaning strategy matched with the task node and comprises at least one of the following steps:
the amount of cleaning liquid used for the cleaning assembly is less than a predetermined amount of cleaning liquid;
a cleaning duration for the cleaning assembly is less than a predetermined duration;
a number of cleanings for the cleaning assembly is less than a predetermined number;
the cleaning liquid flow rate to the cleaning assembly is less than a predetermined flow rate.
Optionally, the task node includes: a cleaning task starting node of the cleaning robot; the cleaning control unit is further configured to: obtaining status information of the cleaning assembly and/or status information of the environment being cleaned; correspondingly, the cleaning strategy matched with the task node comprises the following steps: a cleaning strategy matching the cleaning task initiating node and the status information of the cleaning assembly and/or the status information of the environment being cleaned.
Optionally, the status information of the cleaning assembly includes: humidity information of the cleaning assembly;
the cleaning strategy matched with the cleaning task starting node and the state information of the cleaning component comprises the following steps: cleaning liquid dosage matched with the cleaning task starting node and the humidity information of the cleaning assembly.
Optionally, the obtaining the status information of the cleaning assembly includes: determining humidity information of the cleaning assembly based on a drying state of the cleaning assembly corresponding to a previous cleaning task.
Optionally, the state information of the cleaned environment includes: temperature information and/or humidity information of the environment being cleaned;
the cleaning strategy matched with the cleaning task starting node and the state information of the cleaned environment comprises the following steps: cleaning liquid dosage matched with the temperature information and/or humidity information of the cleaning task starting node and the cleaned environment.
Optionally, the task node includes: a cleaning task processing node or a cleaning task completing node;
the cleaning strategy matched with the task node comprises at least one of the following:
the usage amount of the cleaning liquid for the cleaning assembly is larger than a preset cleaning liquid amount;
a cleaning duration for the cleaning assembly is greater than a predetermined duration;
the number of cycles of cleaning for the cleaning assembly is greater than a predetermined number;
a cleaning liquid flow rate for the cleaning assembly is greater than a predetermined flow rate;
and in the process of cleaning the cleaning assembly, the assembly bearing member for bearing the cleaning assembly moves in a positive and negative alternate rotation mode.
Optionally, the task node includes: cleaning task processing nodes; the cleaning strategy matched with the task node comprises the following steps: during the circulation cleaning process of the cleaning assembly according to the preset cleaning times, at least one of the following factors is realized in a descending manner:
cleaning fluid usage for a single cleaning of the cleaning assembly;
a cleaning duration for a single cleaning of the cleaning assembly;
a cleaning liquid flow rate for a single cleaning of the cleaning assembly;
the component carrying member for carrying the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation.
Optionally, the task node includes: cleaning the task completion node; the cleaning strategy matched with the task node comprises the following steps: during the cyclic cleaning of the cleaning assembly at the preset cleaning times, at least one of the following factors is realized in a constant mode:
cleaning fluid usage for a single cleaning of the cleaning assembly;
a cleaning duration for a single cleaning of the cleaning assembly;
a cleaning liquid flow rate for a single cleaning of the cleaning assembly;
the component carrying member for carrying the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation.
Optionally, the cleaning control unit is further configured to: and controlling the fan to dry the cleaned assembly.
Optionally, the determining a task node where the cleaning robot returning to the base station is located in the current cleaning task includes one of the following manners:
determining the task node based on a task execution phase of the cleaning robot for a current cleaning task;
determining the task node based on cleanliness of a cleaning component of the cleaning robot;
determining the task node based on functional attribute information of the cleaning component for a subsequent proximate time interval or a subsequent proximate task execution phase.
In correspondence with the above method embodiments, a third embodiment of the present application is described with reference to a specific cleaning scenario for a cleaning assembly of a cleaning robot, and at least one alternative implementation manner of the first embodiment is adopted to describe this scenario embodiment.
The method is applied to cleaning the designated area after the cleaning robot is started. Please refer to fig. 6, which is a flowchart illustrating a cleaning method of a cleaning assembly according to a third embodiment of the present application.
The method comprises the following steps:
step S601, the cleaning robot is placed in a berth of the base station, and starts a cleaning task.
This step corresponds cleaning robot's cleaning task start-up link, for example, domestic multi-functional cleaning robot through collocation water tank, brush dish, can collect dirt box automatically, be used for supplying cleaning robot to berth in order to charge, wash clean subassembly (rag), stoving rag, mend watered basic station, can realize to the multiple functions such as the cleaning of appointed area, drag ground, wash rag, automatic water injection, collection dirt, air-dry/stoving rag. After the cleaning task is started, the cleaning robot can start from the base station and go to a designated area to perform cleaning work.
Step S602, before the cleaning robot leaves the base station, the base station wets the cleaning assembly to a usable state, and the cleaning robot carries the wetted cleaning assembly to a designated area for cleaning.
In this step, the base station may check the humidity of the cleaning assembly, and if the humidity reaches the usable state (e.g., the current time is near the end time of the last cleaning task and the cleaning cloth is not dried after the last cleaning task), the base station does not need to wet the cleaning assembly, and if the humidity does not reach the usable state (e.g., the current time is longer than the end time of the last cleaning task and the cleaning cloth is dried after the last cleaning task), the cleaning cloth is sufficiently wetted. But because the cleaning cloth is in a cleaner state, it is not necessary to adequately clean the cleaning components of the cleaning robot before it leaves the base station.
Step S603, after the cleaning robot finishes cleaning a part of the designated area in the designated area, returning to the base station, the base station cleaning the cleaning component for multiple times in a manner that the cleaning intensity gradually decreases, and the cleaning robot moving to an uncleaned area in the designated area for cleaning, wherein the cleaning intensity includes at least one of the following: cleaning fluid usage for a single cleaning of the cleaning assembly; a cleaning duration for a single cleaning of the cleaning assembly; a cleaning liquid flow rate for a single cleaning of the cleaning assembly; the component carrying member for carrying the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation or the vibration amplitude and/or the vibration frequency of the component carrying member for carrying the cleaning component.
The cleaning component is cleaned by a specific mode that a component bearing member bearing the cleaning component rotates or vibrates corresponding to a cleaning task processing link of the cleaning robot, meanwhile, the cleaning robot sends a cleaning message to the base station to enable the base station to start a water circulation system, clear water is placed in the cleaning tank by the base station, and the cleaned dirty water base station is recovered to a sewage tank through a recovery system to be stored or is discharged through a sewer port.
In this step, the cleaning robot also needs to send a dust collection command to the base station, and the base station starts the dust collection system to recover the dirt in the dust collection box.
Step S604, repeat the above step S603 until the cleaning of the designated area is completed.
And step S605, after the cleaning robot finishes cleaning the designated area, returning to the base station, and the base station cleans the cleaning assembly for multiple times in a mode of constant cleaning strength and dries the cleaned cleaning assembly. This step corresponds to a cleaning task completion link of the cleaning robot.
The third embodiment is a specific implementation manner provided in combination with a specific application scenario, and the implementation manner is an implementation manner that is more closely combined with the specific scenario on the basis of the first embodiment; the specific technical features thereof can be further combined with the first embodiment to form an implementation mode for different situations.
Although the present application has been described with reference to the preferred embodiments, it is not intended to limit the present application, and those skilled in the art can make variations and modifications without departing from the spirit and scope of the present application, therefore, the scope of the present application should be determined by the claims that follow.

Claims (13)

1. A method for cleaning a cleaning assembly, the method being applied to a base station of a cleaning robot, comprising:
determining a task node where a cleaning robot returning to a base station is located in a current cleaning task;
and cleaning a cleaning component of the cleaning robot by adopting a cleaning strategy matched with the task node.
2. The cleaning assembly cleaning method of claim 1, wherein the task node comprises: the cleaning task starting node of the cleaning robot corresponds to the cleaning strategy matched with the task node and comprises at least one of the following steps:
the amount of cleaning liquid used for the cleaning assembly is less than a predetermined amount of cleaning liquid;
a cleaning duration for the cleaning assembly is less than a predetermined duration;
a number of cleanings for the cleaning assembly is less than a predetermined number;
the cleaning liquid flow rate to the cleaning assembly is less than a predetermined flow rate.
3. The cleaning assembly cleaning method of claim 1, wherein the task node comprises: a cleaning task starting node of the cleaning robot; the method further comprises the following steps: obtaining status information of the cleaning assembly and/or status information of the environment being cleaned;
correspondingly, the cleaning strategy matched with the task node comprises the following steps: a cleaning strategy matching the cleaning task initiating node and the status information of the cleaning assembly and/or the status information of the environment being cleaned.
4. The cleaning method of a cleaning assembly of claim 3, wherein the status information of the cleaning assembly comprises: humidity information of the cleaning assembly;
the cleaning strategy matched with the cleaning task starting node and the state information of the cleaning component comprises the following steps: cleaning liquid dosage matched with the cleaning task starting node and the humidity information of the cleaning assembly.
5. The method of claim 4, wherein the obtaining status information of the cleaning assembly comprises: determining humidity information of the cleaning assembly based on a drying state of the cleaning assembly corresponding to a previous cleaning task.
6. The cleaning assembly cleaning method of claim 3, wherein the status information of the cleaned environment comprises: temperature information and/or humidity information of the environment being cleaned;
the cleaning strategy matched with the cleaning task starting node and the state information of the cleaned environment comprises the following steps: cleaning liquid dosage matched with the temperature information and/or humidity information of the cleaning task starting node and the cleaned environment.
7. The cleaning assembly cleaning method of claim 1, wherein the task node comprises: a cleaning task processing node or a cleaning task completing node;
the cleaning strategy matched with the task node comprises at least one of the following:
the usage amount of the cleaning liquid for the cleaning assembly is larger than a preset cleaning liquid amount;
a cleaning duration for the cleaning assembly is greater than a predetermined duration;
the number of cycles of cleaning for the cleaning assembly is greater than a predetermined number;
a cleaning liquid flow rate for the cleaning assembly is greater than a predetermined flow rate;
and in the process of cleaning the cleaning assembly, the assembly bearing member for bearing the cleaning assembly moves in a positive and negative alternate rotation mode.
8. The cleaning assembly cleaning method of claim 1, wherein the task node comprises: cleaning task processing nodes; the cleaning strategy matched with the task node comprises the following steps: during the circulation cleaning process of the cleaning assembly according to the preset cleaning times, at least one of the following factors is realized in a descending manner:
cleaning fluid usage for a single cleaning of the cleaning assembly;
a cleaning duration for a single cleaning of the cleaning assembly;
a cleaning liquid flow rate for a single cleaning of the cleaning assembly;
the component carrying member for carrying the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation or the vibration amplitude and/or the vibration frequency of the component carrying member for carrying the cleaning component.
9. The cleaning assembly cleaning method of claim 1, wherein the task node comprises: cleaning the task completion node; the cleaning strategy matched with the task node comprises the following steps: during the cyclic cleaning of the cleaning assembly at the preset cleaning times, at least one of the following factors is realized in a constant mode:
cleaning fluid usage for a single cleaning of the cleaning assembly;
a cleaning duration for a single cleaning of the cleaning assembly;
a cleaning liquid flow rate for a single cleaning of the cleaning assembly;
the component carrying member for carrying the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation or the vibration amplitude and/or the vibration frequency of the component carrying member for carrying the cleaning component.
10. The method of cleaning a cleaning assembly of claim 9, further comprising: and drying the cleaning assembly after the cleaning treatment.
11. The cleaning assembly cleaning method of claim 1, wherein the determining the task node where the cleaning robot returning to the base station is located in the current cleaning task comprises one of:
determining the task node based on a task execution phase of the cleaning robot for a current cleaning task;
determining the task node based on cleanliness of a cleaning component of the cleaning robot;
determining the task node based on functional attribute information of the cleaning component for a subsequent proximate time interval or a subsequent proximate task execution phase.
12. A cleaning robot system, comprising: a cleaning robot and a base station to which the cleaning robot is moored, the base station having a cleaning control unit;
the cleaning control unit is used for determining a task node where the cleaning robot returning to the base station is located in the current cleaning task; and cleaning a cleaning component of the cleaning robot by adopting a cleaning strategy matched with the task node.
13. A method of cleaning a cleaning assembly, comprising:
the cleaning robot is arranged in a berth of the base station and starts a cleaning task;
before the cleaning robot leaves the base station, the base station soaks the cleaning assembly of the cleaning robot to a usable state, and the cleaning robot carries the soaked cleaning assembly to a designated area for cleaning;
after the cleaning robot finishes cleaning part of the designated area in the designated area, returning to the base station, cleaning the cleaning assembly for multiple times by the base station in a mode that the cleaning intensity is gradually decreased, and cleaning the uncleaned area in the designated area by the cleaning robot, wherein the cleaning intensity comprises at least one of the following conditions: cleaning fluid usage for a single cleaning of the cleaning assembly; a cleaning duration for a single cleaning of the cleaning assembly; a cleaning liquid flow rate for a single cleaning of the cleaning assembly; the component bearing member for bearing the cleaning component adopts the alternating frequency and/or the rotating speed of positive and negative alternate rotation or the vibration amplitude and/or the vibration frequency of the component bearing member for bearing the cleaning component;
repeating the steps until the designated area is cleaned;
and after the cleaning robot finishes cleaning the designated area, returning to the base station, cleaning the cleaning assembly for multiple times by the base station in a mode of constant cleaning strength, and drying the cleaned cleaning assembly.
CN202110979654.3A 2021-08-05 2021-08-25 Cleaning method of cleaning assembly and cleaning robot system Pending CN113768432A (en)

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