CN113726305A - 表面声波装置 - Google Patents
表面声波装置 Download PDFInfo
- Publication number
- CN113726305A CN113726305A CN202010446767.2A CN202010446767A CN113726305A CN 113726305 A CN113726305 A CN 113726305A CN 202010446767 A CN202010446767 A CN 202010446767A CN 113726305 A CN113726305 A CN 113726305A
- Authority
- CN
- China
- Prior art keywords
- layer
- acoustic wave
- wave device
- surface acoustic
- piezoelectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010897 surface acoustic wave method Methods 0.000 title claims abstract description 56
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 235000012239 silicon dioxide Nutrition 0.000 claims description 11
- 239000000377 silicon dioxide Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 238000003475 lamination Methods 0.000 claims description 5
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims 2
- 238000010030 laminating Methods 0.000 claims 2
- 239000010410 layer Substances 0.000 description 121
- 239000012790 adhesive layer Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 238000004088 simulation Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H1/00—Constructional details of impedance networks whose electrical mode of operation is not specified or applicable to more than one type of network
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02834—Means for compensation or elimination of undesirable effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02614—Treatment of substrates, e.g. curved, spherical, cylindrical substrates ensuring closed round-about circuits for the acoustical waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02614—Treatment of substrates, e.g. curved, spherical, cylindrical substrates ensuring closed round-about circuits for the acoustical waves
- H03H9/02622—Treatment of substrates, e.g. curved, spherical, cylindrical substrates ensuring closed round-about circuits for the acoustical waves of the surface, including back surface
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/25—Constructional features of resonators using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02157—Dimensional parameters, e.g. ratio between two dimension parameters, length, width or thickness
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
Claims (11)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010446767.2A CN113726305B (zh) | 2020-05-25 | 2020-05-25 | 表面声波装置 |
US17/997,853 US20230179169A1 (en) | 2020-05-25 | 2021-05-24 | Surface acoustic wave device |
JP2022571802A JP7356689B2 (ja) | 2020-05-25 | 2021-05-24 | 表面弾性波デバイス |
PCT/CN2021/095543 WO2021238873A1 (en) | 2020-05-25 | 2021-05-24 | Surface acoustic wave device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010446767.2A CN113726305B (zh) | 2020-05-25 | 2020-05-25 | 表面声波装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN113726305A true CN113726305A (zh) | 2021-11-30 |
CN113726305B CN113726305B (zh) | 2024-03-08 |
Family
ID=78671509
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010446767.2A Active CN113726305B (zh) | 2020-05-25 | 2020-05-25 | 表面声波装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20230179169A1 (zh) |
JP (1) | JP7356689B2 (zh) |
CN (1) | CN113726305B (zh) |
WO (1) | WO2021238873A1 (zh) |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0563500A (ja) * | 1991-08-30 | 1993-03-12 | Tdk Corp | 表面弾性波素子 |
KR20060049516A (ko) * | 2004-06-03 | 2006-05-19 | 소니 가부시끼 가이샤 | 박막 벌크 음향 공진기 및 박막 벌크 음향 공진기의 제조방법 |
JP2006222512A (ja) * | 2005-02-08 | 2006-08-24 | Seiko Epson Corp | 弾性表面波素子 |
US20090212659A1 (en) * | 2006-03-07 | 2009-08-27 | Fujitsu Media Decices Limited | Elastic boundary wave device |
WO2011132443A1 (ja) * | 2010-04-21 | 2011-10-27 | 株式会社村田製作所 | 弾性表面波装置及びその製造方法 |
US20130026881A1 (en) * | 2010-06-17 | 2013-01-31 | Shoji Okamoto | Acoustic wave element |
JP2015115870A (ja) * | 2013-12-13 | 2015-06-22 | 株式会社村田製作所 | 弾性波デバイス |
US20170302251A1 (en) * | 2015-08-25 | 2017-10-19 | Avago Technologies General Ip (Singapore) Pte. Ltd | Acoustic filters integrated into single die |
CN109417376A (zh) * | 2016-07-20 | 2019-03-01 | 信越化学工业株式会社 | 表面声波器件用复合基板及其制造方法和使用该复合基板的表面声波器件 |
US20190280666A1 (en) * | 2016-07-20 | 2019-09-12 | Shin-Etsu Chemical Co., Ltd. | Method of producing composite substrate for surface acoustic wave device |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4375037B2 (ja) | 2004-02-05 | 2009-12-02 | パナソニック株式会社 | 弾性表面波素子 |
WO2014027538A1 (ja) | 2012-08-17 | 2014-02-20 | 日本碍子株式会社 | 複合基板,弾性表面波デバイス及び複合基板の製造方法 |
US20180152169A1 (en) | 2016-11-30 | 2018-05-31 | Skyworks Solutions, Inc. | Saw filters with stepped-profile piezoelectric substrate |
CN110392978B (zh) | 2017-02-21 | 2023-04-04 | 株式会社村田制作所 | 弹性波装置、高频前端电路以及通信装置 |
JP7566455B2 (ja) | 2019-03-25 | 2024-10-15 | 太陽誘電株式会社 | 弾性波デバイス、フィルタおよびマルチプレクサ |
-
2020
- 2020-05-25 CN CN202010446767.2A patent/CN113726305B/zh active Active
-
2021
- 2021-05-24 WO PCT/CN2021/095543 patent/WO2021238873A1/en active Application Filing
- 2021-05-24 US US17/997,853 patent/US20230179169A1/en active Pending
- 2021-05-24 JP JP2022571802A patent/JP7356689B2/ja active Active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0563500A (ja) * | 1991-08-30 | 1993-03-12 | Tdk Corp | 表面弾性波素子 |
KR20060049516A (ko) * | 2004-06-03 | 2006-05-19 | 소니 가부시끼 가이샤 | 박막 벌크 음향 공진기 및 박막 벌크 음향 공진기의 제조방법 |
JP2006222512A (ja) * | 2005-02-08 | 2006-08-24 | Seiko Epson Corp | 弾性表面波素子 |
US20090212659A1 (en) * | 2006-03-07 | 2009-08-27 | Fujitsu Media Decices Limited | Elastic boundary wave device |
WO2011132443A1 (ja) * | 2010-04-21 | 2011-10-27 | 株式会社村田製作所 | 弾性表面波装置及びその製造方法 |
US20130026881A1 (en) * | 2010-06-17 | 2013-01-31 | Shoji Okamoto | Acoustic wave element |
JP2015115870A (ja) * | 2013-12-13 | 2015-06-22 | 株式会社村田製作所 | 弾性波デバイス |
US20170302251A1 (en) * | 2015-08-25 | 2017-10-19 | Avago Technologies General Ip (Singapore) Pte. Ltd | Acoustic filters integrated into single die |
CN109417376A (zh) * | 2016-07-20 | 2019-03-01 | 信越化学工业株式会社 | 表面声波器件用复合基板及其制造方法和使用该复合基板的表面声波器件 |
US20190280666A1 (en) * | 2016-07-20 | 2019-09-12 | Shin-Etsu Chemical Co., Ltd. | Method of producing composite substrate for surface acoustic wave device |
Also Published As
Publication number | Publication date |
---|---|
JP7356689B2 (ja) | 2023-10-05 |
WO2021238873A1 (en) | 2021-12-02 |
JP2023527784A (ja) | 2023-06-30 |
US20230179169A1 (en) | 2023-06-08 |
CN113726305B (zh) | 2024-03-08 |
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TR01 | Transfer of patent right |
Effective date of registration: 20240610 Address after: No. 2, Lianshan Industrial Zone, Gushan Village, Shijing Town, Nan'an City, Quanzhou City, Fujian Province, 362343 Patentee after: Quanzhou San'an integrated circuit Co.,Ltd. Country or region after: China Address before: No.753-799 Min'an Avenue, Hongtang Town, Tong'an District, Xiamen City, Fujian Province Patentee before: XIAMEN SANAN INTEGRATED CIRCUIT Co.,Ltd. Country or region before: China Patentee before: Sanyan Japan Technology Co.,Ltd. Country or region before: Japan Patentee before: FUJIAN JING' AN OPTOELECTRONICS Co.,Ltd. |
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TR01 | Transfer of patent right |