CN113699496A - Anti-dazzle low-reflection film and manufacturing method thereof - Google Patents
Anti-dazzle low-reflection film and manufacturing method thereof Download PDFInfo
- Publication number
- CN113699496A CN113699496A CN202110791096.8A CN202110791096A CN113699496A CN 113699496 A CN113699496 A CN 113699496A CN 202110791096 A CN202110791096 A CN 202110791096A CN 113699496 A CN113699496 A CN 113699496A
- Authority
- CN
- China
- Prior art keywords
- glare
- coating
- reflection film
- low
- curing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Vapour Deposition (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
The invention discloses an anti-dazzle low-reflection film and a manufacturing method thereof, wherein the manufacturing method comprises the following steps: spraying an anti-glare coating on the substrate; placing the substrate in pre-curing equipment, and heating and pre-curing the anti-glare coating; enabling the substrate to enter a vacuum cavity of magnetron sputtering equipment, adjusting the sputtering power of a high-low refractive index target material and the ionization power of ICP (inductively coupled plasma) of the magnetron sputtering equipment, and carrying out primary curing on the anti-glare coating in an air plating mode; and carrying out magnetron sputtering coating in magnetron sputtering equipment to form an antireflection film layer on the anti-glare coating, and carrying out secondary curing on the anti-glare coating. According to the invention, the process flow of placing the anti-glare coating in a curing furnace for high-temperature curing is omitted, and the manufacturing process flow of the anti-glare low-reflection film is effectively shortened.
Description
Technical Field
The invention relates to the technical field of anti-glare film manufacturing, in particular to an anti-glare low-reflection film and a manufacturing method thereof.
Background
Glare is a visual condition that refers to the condition of vision in the field of vision due to inadequate brightness distribution or extreme contrast in space and time, causing visual discomfort and reducing the visibility of objects. The visual field may cause a bright feeling that human eyes cannot adapt to, may cause a feeling of aversion, discomfort, etc., and is one of important causes of visual fatigue.
In particular, an anti-glare treatment is required for a front windshield of an automobile (or an electric vehicle). Meanwhile, antireflection treatment, that is, reduction or elimination of reflected light from the front windshield surface is also required, so that the amount of transmitted light is increased, and stray light is reduced or eliminated.
At present, when an anti-glare low-reflection film is manufactured, the anti-glare film is firstly coated on a substrate in a spraying mode, then the substrate is subjected to preheating treatment and high-temperature curing, and after the curing is finished, a magnetron sputtering process is adopted to manufacture an anti-reflection film, so that the anti-glare effect and the anti-reflection effect are finally realized. However, the process flow is more when the anti-glare low-reflection film is manufactured by the method.
Disclosure of Invention
The invention discloses an anti-dazzle low-reflection film and a manufacturing method thereof, which are used for solving the problem that in the prior art, more manufacturing process flows exist.
In order to solve the problems, the invention adopts the following technical scheme:
provided is a method for manufacturing an anti-glare low-reflection film, comprising the steps of:
step S10, spraying an anti-glare coating on the substrate;
step S20, placing the substrate in a pre-curing device, and heating and pre-curing the anti-glare coating;
step S30, enabling the substrate to enter a vacuum cavity of a magnetron sputtering device, adjusting the sputtering power of a high-low refractive index target material of the magnetron sputtering device and the ionization power of ICP, and curing the anti-glare coating for the first time in an air plating mode;
and step S40, performing magnetron sputtering coating in the magnetron sputtering equipment to form an antireflection film layer on the anti-glare coating, and performing secondary curing on the anti-glare coating.
Optionally, the sputtering power of the high-low refractive index target and the ionization power of the ICP are the same during magnetron sputtering coating and during empty coating.
Optionally, the temperature difference between the pre-curing temperature of the anti-glare coating by heating and the empty plating temperature is more than 40 ℃.
Optionally, the temperature of the anti-glare coating is not higher than 80 ℃ when the anti-glare coating is pre-cured by heating, and the temperature of the anti-glare coating is not lower than 100 ℃ when the anti-glare coating is empty plated.
Optionally, the temperature of the anti-glare coating when pre-cured by heating is 60-80 ℃.
Optionally, the temperature of the anti-glare coating layer during the blank plating is 100-150 ℃.
Optionally, the time for heating for pre-curing is less than the time for empty plating and the time for magnetron sputtering for coating.
Optionally, the time for heating for pre-curing is 6-8 min.
Optionally, the time for the air plating is 30-45 min.
Optionally, the time for magnetron sputtering coating is 30-45 min.
Optionally, the sputtering power of the high-refractive index target and the low-refractive index target is greater than or equal to 12KW, and the ionization power of the ICP is greater than 4 KW.
Optionally, the material of the anti-glare coating is silicon oxide.
There is also provided an anti-glare low-reflection film manufactured according to the manufacturing method of any one of the above, including:
a substrate;
an anti-glare coating sprayed on the substrate;
and the anti-reflection film layer is plated on the anti-glare coating.
The technical scheme adopted by the invention can achieve the following beneficial effects:
in the process of plating the antireflection film layer in the magnetron sputtering equipment, the curing of the anti-glare coating is realized. Therefore, the process flow of placing the anti-dazzle coating into a curing furnace for high-temperature curing is omitted, and the manufacturing process flow of the anti-dazzle low-reflection film is effectively shortened. And the prepared anti-dazzle coating has good compactness and anti-dazzle effect.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments will be briefly introduced below to form a part of the present invention, and the exemplary embodiments and the description thereof illustrate the present invention and do not constitute a limitation of the present invention. In the drawings:
FIG. 1 is a flow chart illustrating the fabrication of an anti-glare low-reflection film disclosed in the prior art;
fig. 2 is a schematic structural view of an anti-glare low-reflection film disclosed in an embodiment of the present invention.
Wherein the following reference numerals are specifically included in figures 1-2:
a substrate-1; anti-glare coating-2; an anti-reflection film layer-3.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to the specific embodiments of the present invention and the accompanying drawings. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The manufacturing method of the anti-glare low-reflection film disclosed by the invention specifically comprises the following steps as shown in fig. 1 and 2:
step S10, spraying the anti-glare coating 2 on the substrate 1;
step S20, placing the substrate 1 in a pre-curing device, and heating and pre-curing the anti-glare coating 2;
step S30, enabling the substrate 1 to enter a vacuum cavity of a magnetron sputtering device, adjusting the sputtering power of a high-low refractive index target material of the magnetron sputtering device and the ionization power of ICP, and carrying out primary curing on the anti-glare coating 2 in an empty plating mode;
step S40, performing magnetron sputtering coating in a magnetron sputtering device to form the antireflection film layer 3 on the antiglare coating 2, and performing secondary curing on the antiglare coating 2.
The anti-glare low-reflection film is manufactured by the method, and the anti-reflection film layer 3 is plated in the magnetron sputtering equipment, so that the anti-glare coating 2 is cured. Therefore, the process flow of placing the anti-glare coating 2 into a curing furnace for high-temperature curing is omitted, and the manufacturing process flow of the anti-glare low-reflection film is effectively shortened. And the anti-dazzle coating 2 has good compactness and anti-dazzle effect.
In step S10, the substrate 1 may be a glass substrate 1 or an acrylic substrate 1, and is specifically set according to the use requirement, so as to be suitable for various use occasions, such as a windshield and a rearview mirror of a vehicle, and may also be applied to a cover plate of a display module, such as a cover plate of a display module of a vehicle-mounted center control screen, a vehicle-mounted instrument panel, a mobile phone or a computer. The material of the anti-glare coating 2 can be silicon oxide, the cost is low, the anti-glare coating is coated on the substrate 1 through a spraying process, and the substrate 1 can be cleaned before the anti-glare coating 2 is sprayed.
In step S20, the pre-curing device may be a UV pre-curing device, and the UV pre-curing has a fast film-forming speed, good coating transparency, and excellent mechanical properties. When the anti-glare coating 2 is pre-cured by heating, the temperature of the anti-glare coating 2 is not higher than 80 ℃, in a preferred example, when the anti-glare coating 2 is pre-cured by heating, the temperature of the anti-glare coating 2 is 60-80 ℃, so that the anti-glare coating 2 can be attached to the substrate 1 while the anti-glare coating 2 can avoid large stress on the substrate 1 as much as possible. The heating and pre-curing time of the anti-glare coating 2 can be 6-8min, so that the anti-glare coating 2 is better attached to the substrate 1, and the damage to the anti-glare coating 2 during sputtering coating is reduced.
In step S30, the anti-glare coating 2 is blank-plated, that is, only high-energy gas ions (e.g., argon ions, etc.) bombard the anti-glare coating 2 at a high speed, so that the anti-glare coating 2 generates heat under the bombardment of the high-speed gas ions to perform a first curing, and impurities and organic matters on the surface of the anti-glare coating 2 can be removed by the high-speed gas, thereby improving the anti-glare effect of the anti-glare coating 2. The high-refractive index target material and the low-refractive index target material are included, the material of the low-refractive index target material may be, for example, Si, and the material of the high-refractive index target material may be, for example, Nb.
In the process of plating the antireflection film, the sputtering power of a high-low refractive index target of a magnetron sputtering device can be increased to 12KW or more, the ionization power of ICP (Inductively Coupled Plasma, radio frequency Inductively Coupled Plasma source) is increased to 4KW or more, the temperature of the antiglare coating 2 in the empty plating is not lower than 100 ℃, in a preferred example, the temperature of the antiglare coating 2 in the empty plating is 100-150 ℃, so that impurities on the surface of the antiglare coating 2 can be effectively knocked off, the smoothness of the surface of the antiglare coating 2 is ensured, and the temperature difference between the temperature of the antiglare coating 2 in the first curing and the temperature of the antiglare coating in the heating pre-curing can be more than 40 ℃, so that the compactness of the antiglare coating 2 is ensured. Further, the idle plating time of the anti-glare coating 2 can be 30-45min, so that the balance between the time and the temperature is achieved, and the curing effect of the anti-glare coating 2 is ensured.
Compared with the existing air plating process, in the existing air plating process, the sputtering power of the target with high and low refractive indexes is about 9KW, the ionization power of ICP is about 2KW, and the air plating time is generally 2-3min, so that the existing air plating process can only realize target washing, but cannot enable the anti-glare coating 2 to generate high temperature under the collision of gas ions, and therefore the existing air plating process cannot realize high-temperature curing of the anti-glare coating 2.
In step S40, after the blank plating is completed, the sputtering power of the high and low refractive index target is still maintained at 12KW or more, and the ionization power of the ICP (radio frequency inductively coupled plasma source) is maintained at 4KW or more, and the sputtering power of the high and low refractive index target and the ionization power of the ICP are the same as those in the blank plating, and then the antireflection film layer 3 is formed on the antiglare coating 2, and as the thickness of the antireflection film layer 3 gradually increases, the bombardment force of the plasma on the antiglare coating 2 gradually decreases, so that the temperature of the antiglare coating 2 gradually decreases, and finally the antiglare coating 2 is cured for the second time. In the process, the temperature of the anti-glare coating 2 is gradually reduced from the highest temperature during the air plating, so that the formed anti-glare coating 2 has higher density, and the anti-glare effect is improved.
Of course, the sputtering power of the high and low refractive index target and/or the ionization power of the ICP during sputter coating may also be slightly greater than the sputtering power of the high and low refractive index target and/or the ionization power of the ICP during blank coating.
Furthermore, the time for magnetron sputtering coating is 30-45min to slow down the coating speed of the anti-reflection film layer 3, so that the temperature of the anti-glare coating 2 is gradually reduced from the highest temperature during empty coating, and the density of the anti-glare coating 2 is further improved.
The structure of the antireflection film layer 3 is the same as that of a general antireflection film layer, and the antireflection film layer is formed by alternately arranging a plurality of film layers with high refractive index and low refractive index. The thickness of each film layer may be the same as the conventional one, and will not be described in detail herein.
The anti-glare low-reflection film comprises a substrate 1, an anti-glare coating 2 sprayed on the substrate 1 and an anti-reflection film layer 3 plated on the anti-glare coating 2. The anti-glare low-reflection film is manufactured by the method, and the anti-glare coating 2 is cured in the process of plating the anti-reflection film layer 3 in the magnetron sputtering equipment. Therefore, the process flow of placing the anti-glare coating 2 into a curing furnace for high-temperature curing is omitted, and the manufacturing process flow of the anti-glare low-reflection film is effectively shortened. And the anti-dazzle coating 2 has good compactness and anti-dazzle effect.
The anti-dazzle low-reflection film can be applied to windshields and rearview mirrors of vehicles and cover plates of display modules, such as cover plates of display modules of vehicle-mounted central control screens, vehicle-mounted instrument screens, mobile phones or computers.
While the present invention has been described with reference to the embodiments shown in the drawings, the present invention is not limited to the embodiments, which are illustrative and not restrictive, and it will be apparent to those skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (13)
1. A method for manufacturing an anti-glare low-reflection film is characterized by comprising the following steps:
step S10, spraying an anti-glare coating on the substrate;
step S20, placing the substrate in a pre-curing device, and heating and pre-curing the anti-glare coating;
step S30, enabling the substrate to enter a vacuum cavity of a magnetron sputtering device, adjusting the sputtering power of a high-low refractive index target material of the magnetron sputtering device and the ionization power of ICP, and curing the anti-glare coating for the first time in an air plating mode;
and step S40, performing magnetron sputtering coating in the magnetron sputtering equipment to form an antireflection film layer on the anti-glare coating, and performing secondary curing on the anti-glare coating.
2. The method for manufacturing an anti-glare low-reflection film according to claim 1, wherein the sputtering power of the high-low refractive index target and the ionization power of the ICP are the same in magnetron sputtering film plating and blank plating.
3. The method for producing an anti-glare low-reflection film according to claim 1, wherein the temperature difference between the pre-curing by heating and the blank plating is more than 40 ℃.
4. The method for producing an anti-glare low-reflection film according to claim 3, wherein the temperature of the anti-glare coating layer is not higher than 80 ℃ when pre-cured by heating and is not lower than 100 ℃ when it is empty-plated.
5. The method for manufacturing an anti-glare low-reflection film according to claim 4, wherein the temperature of the anti-glare coating layer is 60 to 80 ℃ when it is pre-cured by heating.
6. The method for manufacturing the anti-glare low-reflection film according to claim 5, wherein the temperature of the anti-glare coating layer during the blank plating is 100-150 ℃.
7. The method for producing an anti-glare low-reflection film according to claim 6, wherein the time for heating for precuring is shorter than the time for idle plating and the time for magnetron sputtering for plating.
8. The method for producing an anti-glare low-reflection film according to claim 7, wherein the time for the pre-curing by heating is 6 to 8 min.
9. The method for producing an anti-glare low-reflection film according to claim 8, wherein the time for the blank plating is 30 to 45 min.
10. The method for producing an anti-glare low-reflection film according to claim 9, wherein the time for magnetron sputtering coating is 30 to 45 min.
11. The method for producing an anti-glare low-reflection film according to any one of claims 1 to 10, wherein the sputtering power of the high-refractive index target and the sputtering power of the low-refractive index target are greater than or equal to 12KW, and the ionization power of the ICP is greater than 4 KW.
12. The method for manufacturing an anti-glare low-reflection film according to any one of claims 1 to 10, wherein the material of the anti-glare coating is silicon oxide.
13. An anti-glare low-reflection film manufactured according to the manufacturing method of any one of claims 1 to 12, comprising:
a substrate;
an anti-glare coating sprayed on the substrate;
and the anti-reflection film layer is plated on the anti-glare coating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110791096.8A CN113699496A (en) | 2021-07-13 | 2021-07-13 | Anti-dazzle low-reflection film and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110791096.8A CN113699496A (en) | 2021-07-13 | 2021-07-13 | Anti-dazzle low-reflection film and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113699496A true CN113699496A (en) | 2021-11-26 |
Family
ID=78648550
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110791096.8A Pending CN113699496A (en) | 2021-07-13 | 2021-07-13 | Anti-dazzle low-reflection film and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113699496A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1263354A (en) * | 1999-02-12 | 2000-08-16 | 同济大学 | Wide band antireflective nano-coating layer for glass display screen and its production method |
| JP2008116611A (en) * | 2006-11-02 | 2008-05-22 | Toppan Printing Co Ltd | Antireflection film |
| CN105319624A (en) * | 2014-07-30 | 2016-02-10 | 住友化学株式会社 | Anti-glare film |
| CN107924002A (en) * | 2015-08-31 | 2018-04-17 | 旭硝子株式会社 | Translucency structure, its manufacture method and article |
| CN109267034A (en) * | 2018-11-30 | 2019-01-25 | 信利光电股份有限公司 | A kind of production method of screen |
-
2021
- 2021-07-13 CN CN202110791096.8A patent/CN113699496A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1263354A (en) * | 1999-02-12 | 2000-08-16 | 同济大学 | Wide band antireflective nano-coating layer for glass display screen and its production method |
| JP2008116611A (en) * | 2006-11-02 | 2008-05-22 | Toppan Printing Co Ltd | Antireflection film |
| CN105319624A (en) * | 2014-07-30 | 2016-02-10 | 住友化学株式会社 | Anti-glare film |
| CN107924002A (en) * | 2015-08-31 | 2018-04-17 | 旭硝子株式会社 | Translucency structure, its manufacture method and article |
| CN109267034A (en) * | 2018-11-30 | 2019-01-25 | 信利光电股份有限公司 | A kind of production method of screen |
Non-Patent Citations (1)
| Title |
|---|
| 张永宏: "《现代薄膜材料与技术》", 31 August 2016, pages: 37 * |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6583262B2 (en) | Manufacturing method of glass curved plate with antiglare film | |
| US20180185875A1 (en) | Translucent structure, method for manufacturing same, and article | |
| CN103226211B (en) | Optical substrate | |
| JPWO2005064367A1 (en) | Polarizing plate protective film, polarizing plate with antireflection function and optical product | |
| WO2015030245A1 (en) | Spectacle lens and method for producing same | |
| JPWO2005121841A1 (en) | Antireflection laminate and optical member | |
| US8158211B2 (en) | Anti-reflection plate and method for manufacturing anti-reflection structure thereof | |
| CN108032595B (en) | A kind of production method of ultra-thin laminated glass and ultra-thin laminated glass | |
| KR20080059262A (en) | Antireflection film | |
| TWI481895B (en) | Anti-reflection film and polarizing plate | |
| JP3938636B2 (en) | High refractive index plastic lens and manufacturing method thereof | |
| WO2015030246A1 (en) | Spectacle lens | |
| JP2007038447A (en) | Reflection preventing laminate, optical member, and liquid crystal display element | |
| CN113699496A (en) | Anti-dazzle low-reflection film and manufacturing method thereof | |
| JP6488506B2 (en) | Mold having surface uneven structure, method for producing the same, and method for producing antiglare resin structure using the die | |
| CN111559151A (en) | 3D composite board and preparation method thereof | |
| CN104527165A (en) | Semi-reflecting and semi-transmitting glass and preparation method thereof | |
| CN101487904A (en) | Anti-reflection plate and production method for anti-reflection structure | |
| US20030104185A1 (en) | Method for producing a multi-functional, multi-ply layer on a transparent plastic substrate and a multi-functional multi-ply layer produced according to said method | |
| JP2017165273A (en) | Rear window | |
| CN108285278B (en) | Preparation method of high-resistance and high-transmittance ITO glass substrate | |
| JPH0611706A (en) | Antidazzle film and its production and display device formed by using this antidazzle film | |
| CN112590267A (en) | Manufacturing process of ultrathin color-changing polarized resin lens | |
| TWI823718B (en) | Display cover glass | |
| JP4742603B2 (en) | Manufacturing method of plastic lens |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20211126 |
|
| RJ01 | Rejection of invention patent application after publication |