CN113690342A - Chain type back polishing equipment for polycrystalline silicon battery piece - Google Patents
Chain type back polishing equipment for polycrystalline silicon battery piece Download PDFInfo
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- CN113690342A CN113690342A CN202110919208.3A CN202110919208A CN113690342A CN 113690342 A CN113690342 A CN 113690342A CN 202110919208 A CN202110919208 A CN 202110919208A CN 113690342 A CN113690342 A CN 113690342A
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- tank
- polishing
- conveying
- water washing
- roller
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- 238000005498 polishing Methods 0.000 title claims abstract description 64
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 93
- 238000005406 washing Methods 0.000 claims abstract description 61
- 239000012295 chemical reaction liquid Substances 0.000 claims abstract description 47
- 239000007788 liquid Substances 0.000 claims abstract description 45
- 239000007921 spray Substances 0.000 claims abstract description 13
- 238000001035 drying Methods 0.000 claims abstract description 12
- 238000005530 etching Methods 0.000 claims abstract description 8
- 229920005591 polysilicon Polymers 0.000 claims description 9
- 238000001125 extrusion Methods 0.000 claims description 8
- 238000005507 spraying Methods 0.000 claims description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 claims description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 239000002253 acid Substances 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 5
- 238000005260 corrosion Methods 0.000 abstract description 4
- 230000007797 corrosion Effects 0.000 abstract description 4
- 238000005516 engineering process Methods 0.000 description 6
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 description 3
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 description 3
- 102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007791 dehumidification Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
The invention discloses a chain type back polishing device for a polycrystalline silicon cell, which comprises a rack, a water collecting tank, an auxiliary conveying roller, a water spray plate, a dehumidifying conveying roller, a moisture absorbing sheath, a first reaction liquid tank, a liquid carrying conveying roller, a liquid carrying groove, a second reaction liquid tank, a polishing conveying roller, a polishing groove, a water washing tank, a water washing conveying net, a lower water washing roller, an upper water washing roller, a water spray hole and a drying mechanism. The invention can ensure the efficiency and stability of the battery, ensure that the front surface has no acid corrosion, is not easy to form etching print to influence the appearance, can also reduce the use amount of acid, has low electric leakage ratio and good back polishing effect.
Description
[ technical field ] A method for producing a semiconductor device
The invention relates to the technical field of cell production, in particular to the technical field of chain type back polishing equipment for polycrystalline silicon cells.
[ background of the invention ]
Solar energy is an environment-friendly energy source, the solar cell can directly convert sunlight into electric energy, and the power generation principle is the photovoltaic effect of PN junctions. At present, the conventional battery technology is limited by technology, the conversion efficiency is not greatly improved, and the battery conversion efficiency must depend on upgrading the existing technology and a new battery structure type. At present, the PERC battery technology in the industry is undoubtedly the most effective means for improving efficiency, one of the core technologies of the PERC battery is a back polishing process, and the requirements of the PERC battery back polishing are the requirements of smooth texture, consistency, high reflectivity and the like of the whole back surface of a battery piece. The existing back polishing technology generally adopts a Schmid etching process, and has the problems of uneven texture surface on the back of a silicon wafer and high acid consumption.
[ summary of the invention ]
The invention aims to solve the problems in the prior art, and provides chain type back polishing equipment for a polycrystalline silicon cell, which can ensure the efficiency and stability of the cell, ensure that the front surface has no acid corrosion, is not easy to form etching prints to influence the appearance, can reduce the use amount of acid, has low electric leakage ratio and has good back polishing effect.
In order to realize the purpose, the invention provides chain type back polishing equipment for a polycrystalline silicon cell, which comprises a frame, a water collecting tank, auxiliary conveying rollers, water spray plates, a dehumidifying conveying roller, a moisture absorption sheath, a first reaction liquid tank, a liquid carrying conveying roller, a liquid carrying groove, a second reaction liquid tank, a polishing conveying roller, a polishing groove, a water washing tank, a water washing conveying net, a lower water washing roller, an upper water washing roller, water spray holes and a drying mechanism, wherein the water collecting tank is arranged on the left side of the frame, the auxiliary conveying rollers are arranged above the water collecting tank, the water spray plates are arranged in parallel right above the auxiliary conveying rollers, the dehumidifying conveying roller is arranged on the right side of the auxiliary conveying rollers, the moisture absorption sheath is detachably arranged on the dehumidifying conveying rollers, the first reaction liquid tank is arranged on the right side of the water collecting tank, the liquid carrying conveying rollers with the tops aligned with the liquid level are arranged in the first reaction liquid tank, the improved automatic washing machine is characterized in that a plurality of liquid carrying grooves are distributed on the liquid carrying conveying rollers, a second reaction liquid tank is arranged on the right side of the first reaction liquid tank, a plurality of polishing conveying rollers with tops parallel to the liquid level are arranged in the second reaction liquid tank, a plurality of polishing grooves are distributed on the polishing conveying rollers, a water washing tank is arranged on the right side of the second reaction liquid tank, a water washing conveying net is arranged in the water washing tank, a lower water washing roller and an upper water washing roller are symmetrically arranged on the water washing conveying net in an up-down mode, a plurality of water spraying holes connected with a water pump are uniformly formed in the circumferential surfaces of the upper water washing roller and the lower water washing roller, and a drying mechanism is arranged at the rear section of the water washing conveying net.
Preferably, the first reaction liquid tank is a hydrofluoric acid and nitric acid mixed liquid reaction liquid tank, and the second reaction liquid tank is an alkali liquor etching reaction liquid tank.
Preferably, the auxiliary conveying roller, the dehumidifying conveying roller, the liquid-carrying conveying roller and the polishing conveying roller are parallel to each other and are located on the same horizontal plane.
Preferably, dehumidification conveying rollers are arranged among the water collecting tank, the first reaction liquid tank, the second reaction liquid tank and the rinsing tank for conveying.
Preferably, extrusion limiting rollers are symmetrically arranged above the polishing conveying rollers in an extrusion mode, and elastic extrusion sleeves are sleeved on the outer surfaces of the extrusion limiting rollers.
Preferably, the depth of the liquid carrying groove is 0.2mm, the width of the liquid carrying groove is 25mm, and the liquid carrying groove is uniformly and axially distributed on the liquid carrying conveying roller.
Preferably, the depth of the polishing grooves is 1mm, the width of the polishing grooves is 0.3mm, and the polishing grooves are uniformly and axially distributed on the polishing conveying roller.
Preferably, the washing conveying net is arranged obliquely above the right, the drying mechanism comprises an air heater and an exhaust fan, a plurality of air heaters are uniformly distributed above the washing conveying net, and a plurality of exhaust fans are uniformly distributed below the washing conveying net.
The invention has the beneficial effects that: according to the invention, through combining the frame, the water collecting tank, the auxiliary conveying roller, the water spray plate, the dehumidifying conveying roller, the moisture absorption sheath, the first reaction liquid tank, the liquid carrying conveying roller, the liquid carrying groove, the second reaction liquid tank, the polishing conveying roller, the polishing groove, the water washing tank, the water washing conveying net, the lower water washing roller, the upper water washing roller, the water spray hole and the drying mechanism together, through experimental optimization, the efficiency and the stability of the battery can be ensured, the front surface is ensured to be free from acid corrosion, etching prints are not easy to form to influence the appearance, the use amount of acid can be reduced, the electric leakage ratio is low, and the back polishing effect is good.
The features and advantages of the present invention will be described in detail by embodiments in conjunction with the accompanying drawings.
[ description of the drawings ]
Fig. 1 is a schematic structural diagram of a chain type back polishing device for polysilicon cells of the present invention.
In the figure: 1-a frame, 2-a water collecting tank, 3-an auxiliary conveying roller, 4-a water spraying plate, 5-a dehumidifying conveying roller, 6-a moisture absorbing sheath, 7-a first reaction liquid tank, 8-a liquid carrying conveying roller, 9-a liquid carrying groove, 10-a second reaction liquid tank, 11-a polishing conveying roller, 12-a polishing groove, 13-a water washing tank, 14-a water washing conveying net, 15-a lower water washing roller, 16-an upper water washing roller, 17-a water spraying hole, 18-a drying mechanism, 19-an extrusion limiting roller, 20-a hot air blower and 21-an exhaust fan.
[ detailed description ] embodiments
Referring to fig. 1, the chain type back polishing device for polysilicon battery plates of the invention comprises a frame 1, a water collecting tank 2, auxiliary conveying rollers 3, water spray plates 4, dehumidifying conveying rollers 5, a moisture absorbing sheath 6, a first reaction liquid tank 7, a liquid carrying conveying roller 8, a liquid carrying groove 9, a second reaction liquid tank 10, a polishing conveying roller 11, a polishing groove 12, a rinsing tank 13, a rinsing conveying net 14, a lower rinsing roller 15, an upper rinsing roller 16, water spray holes 17 and a drying mechanism 18, wherein the left side of the frame 1 is provided with the water collecting tank 2, a plurality of auxiliary conveying rollers 3 are arranged above the water collecting tank 2, the water spray plates 4 are arranged in parallel right above the auxiliary conveying rollers 3, the right side of the auxiliary conveying rollers 3 is provided with the dehumidifying conveying rollers 5, the moisture absorbing sheath 6 is detachably arranged on the dehumidifying conveying rollers 5, the right side of the water collecting tank 2 is provided with the first reaction liquid tank 7, the device is characterized in that a plurality of liquid carrying conveying rollers 8 with tops parallel to the liquid level are arranged in the first reaction liquid tank 7, a plurality of liquid carrying grooves 9 are distributed on the liquid carrying conveying rollers 8, a second reaction liquid tank 10 is arranged on the right side of the first reaction liquid tank 7, a plurality of polishing conveying rollers 11 with tops parallel to the liquid level are arranged in the second reaction liquid tank 10, a plurality of polishing grooves 12 are distributed on the polishing conveying rollers 11, a water washing tank 13 is arranged on the right side of the second reaction tank, a water washing conveying net 14 is arranged in the water washing tank 13, a lower water washing roller 15 and an upper water washing roller 16 are symmetrically arranged on the water washing conveying net 14 from top to bottom, a plurality of water spraying holes 17 connected with a water pump are uniformly arranged on the circumferential surfaces of the upper water washing roller 16 and the lower water washing roller 15, a drying mechanism 18 is arranged at the rear section of the water washing conveying net 14, the first reaction liquid tank 7 is a hydrofluoric acid and nitric acid mixed liquid reaction tank, the second reaction liquid tank 10 is an alkali liquor etching reaction liquid tank, the auxiliary conveying rollers 3, the dehumidifying conveying rollers 5, the liquid carrying conveying rollers 8 and the polishing conveying rollers 11 are parallel to each other and are positioned on the same horizontal plane, the dehumidifying conveying rollers 5 are arranged among the water collecting tank 2, the first reaction liquid tank 7, the second reaction liquid tank 10 and the rinsing tank 13 for conveying, the extruding limiting rollers 19 are symmetrically extruded above the polishing conveying rollers 11, the outer surfaces of the extruding limiting rollers 19 are sleeved with elastic extruding sleeves, the depth of the liquid carrying grooves 9 is 0.2mm, the width of the liquid carrying grooves 9 is 25mm, the liquid carrying grooves 9 are uniformly and axially distributed on the liquid carrying conveying rollers 8, the depth of the polishing grooves 12 is 1mm, the width of the polishing grooves 12 is 0.3mm, the polishing grooves 12 are uniformly and axially distributed on the polishing conveying rollers 11, the water washing conveying net 14 is arranged above the right side, the drying mechanism 18 comprises a hot air blower 20 and an exhaust blower 21, a plurality of hot air blowers 20 are uniformly distributed above the washing conveying net 14, and a plurality of exhaust blowers 21 are uniformly distributed below the washing net.
According to the invention, the frame 1, the water collecting tank 2, the auxiliary conveying roller 3, the water spraying plate 4, the dehumidifying conveying roller 5, the moisture absorbing sheath 6, the first reaction liquid tank 7, the liquid carrying conveying roller 8, the liquid carrying groove 9, the second reaction liquid tank 10, the polishing conveying roller 11, the polishing groove 12, the water washing tank 13, the water washing conveying net 14, the lower water washing roller 15, the upper water washing roller 16, the water spraying holes 17 and the drying mechanism 18 are combined together, and through test optimization, the efficiency and the stability of the battery can be ensured, the front surface is ensured to be free from acid corrosion, etching prints are not easy to form to influence the appearance, the acid consumption can be reduced, the electric leakage ratio is low, and the back polishing effect is good.
The above embodiments are illustrative of the present invention, and are not intended to limit the present invention, and any simple modifications of the present invention are within the scope of the present invention.
Claims (8)
1. The utility model provides a polycrystalline silicon battery piece chain back of body polishing equipment which characterized in that: comprises a frame (1), a water collecting tank (2), auxiliary conveying rollers (3), water spray plates (4), dehumidifying conveying rollers (5), a moisture absorbing sheath (6), a first reaction liquid tank (7), liquid carrying conveying rollers (8), a liquid carrying groove (9), a second reaction liquid tank (10), polishing conveying rollers (11), a polishing groove (12), a water washing tank (13), a water washing conveying net (14), a lower water washing roller (15), an upper water washing roller (16), water spray holes (17) and a drying mechanism (18), wherein the water collecting tank (2) is arranged on the left side of the frame (1), a plurality of auxiliary conveying rollers (3) are arranged above the water collecting tank (2), the water spray plates (4) are arranged in parallel right above the auxiliary conveying rollers (3), the dehumidifying conveying rollers (5) are arranged on the right side of the auxiliary conveying rollers (3), and the moisture absorbing sheath (6) can be disassembled on the dehumidifying conveying rollers (5), the right side of the water collecting tank (2) is provided with a first reaction liquid tank (7), a plurality of liquid carrying conveying rollers (8) with tops parallel to the liquid level are arranged in the first reaction liquid tank (7), a plurality of liquid carrying grooves (9) are distributed on the liquid carrying conveying rollers (8), a second reaction liquid tank (10) is arranged on the right side of the first reaction liquid tank (7), a plurality of polishing conveying rollers (11) with tops parallel to the liquid level are arranged in the second reaction liquid tank (10), a plurality of polishing grooves (12) are distributed on the polishing conveying rollers (11), a water washing tank (13) is arranged on the right side of the second reaction tank, a water washing conveying net (14) is arranged in the water washing tank (13), a lower water washing roller (15) and an upper water washing roller (16) are symmetrically arranged on the water washing conveying net (14) from top to bottom, a plurality of water spraying holes (17) connected with a water pump are uniformly arranged on the circumferential surfaces of the upper water washing roller (16) and the lower water washing roller (15), and a drying mechanism (18) is arranged at the rear section of the washing conveying net (14).
2. The chain type back polishing apparatus for polysilicon battery plates as claimed in claim 1, wherein: the first reaction liquid tank (7) is a hydrofluoric acid and nitric acid mixed liquid reaction liquid tank, and the second reaction liquid tank (10) is an alkali liquor etching reaction liquid tank.
3. The chain type back polishing apparatus for polysilicon battery plates as claimed in claim 1, wherein: the auxiliary conveying roller (3), the dehumidifying conveying roller (5), the liquid-carrying conveying roller (8) and the polishing conveying roller (11) are parallel to each other and are positioned on the same horizontal plane.
4. The chain type back polishing apparatus for polysilicon battery plates as claimed in claim 1, wherein: and dehumidifying conveying rollers (5) are arranged among the water collecting tank (2), the first reaction liquid tank (7), the second reaction liquid tank (10) and the rinsing tank (13) for conveying.
5. The chain type back polishing apparatus for polysilicon battery plates as claimed in claim 1, wherein: the polishing device is characterized in that extrusion limiting rollers (19) are symmetrically extruded above the polishing conveying rollers (11), and elastic extrusion sleeves are sleeved on the outer surfaces of the extrusion limiting rollers (19).
6. The chain type back polishing apparatus for polysilicon battery plates as claimed in claim 1, wherein: the depth of the liquid carrying groove (9) is 0.2mm, the width of the liquid carrying groove (9) is 25mm, and the liquid carrying groove (9) is uniformly and axially distributed on the liquid carrying conveying roller (8).
7. The chain type back polishing apparatus for polysilicon battery plates as claimed in claim 1, wherein: the depth of the polishing groove (12) is 1mm, the width of the polishing groove (12) is 0.3mm, and the polishing groove (12) is uniformly and axially distributed on the polishing conveying roller (11).
8. The chain type back polishing apparatus for polysilicon battery plates as claimed in claim 1, wherein: washing delivery network (14) oblique upper right side sets up, stoving mechanism (18) include air heater (20) and air exhauster (21), washing delivery network (14) top evenly distributed has a plurality of air heaters (20), the below evenly distributed of washing network has a plurality of air exhausters (21).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110919208.3A CN113690342A (en) | 2021-08-11 | 2021-08-11 | Chain type back polishing equipment for polycrystalline silicon battery piece |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110919208.3A CN113690342A (en) | 2021-08-11 | 2021-08-11 | Chain type back polishing equipment for polycrystalline silicon battery piece |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113690342A true CN113690342A (en) | 2021-11-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110919208.3A Pending CN113690342A (en) | 2021-08-11 | 2021-08-11 | Chain type back polishing equipment for polycrystalline silicon battery piece |
Country Status (1)
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| CN (1) | CN113690342A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104505425A (en) * | 2014-10-24 | 2015-04-08 | 横店集团东磁股份有限公司 | Method for preparing solar monocrystal back polished cell piece |
| CN205904864U (en) * | 2016-06-29 | 2017-01-25 | 太极能源科技（昆山）有限公司 | A gyro wheel for solar cell glossing |
| CN109285772A (en) * | 2018-07-06 | 2019-01-29 | 横店集团东磁股份有限公司 | A kind of polycrystalline silicon battery plate chain type back polishing method and its device |
| CN110491972A (en) * | 2019-09-18 | 2019-11-22 | 浙江德西瑞新能源科技股份有限公司 | Cell piece chain type etches alkali and carries on the back polishing process |
| CN110534408A (en) * | 2019-07-30 | 2019-12-03 | 苏州昊建自动化系统有限公司 | A kind of crystal-silicon battery slice chain type alkali polishing production line and chain type alkali polishing method |
| CN112133765A (en) * | 2020-09-18 | 2020-12-25 | 江苏东鋆光伏科技有限公司 | Crystalline silicon battery prepared in solid state diffusion mode and preparation process thereof |
-
2021
- 2021-08-11 CN CN202110919208.3A patent/CN113690342A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104505425A (en) * | 2014-10-24 | 2015-04-08 | 横店集团东磁股份有限公司 | Method for preparing solar monocrystal back polished cell piece |
| CN205904864U (en) * | 2016-06-29 | 2017-01-25 | 太极能源科技（昆山）有限公司 | A gyro wheel for solar cell glossing |
| CN109285772A (en) * | 2018-07-06 | 2019-01-29 | 横店集团东磁股份有限公司 | A kind of polycrystalline silicon battery plate chain type back polishing method and its device |
| CN110534408A (en) * | 2019-07-30 | 2019-12-03 | 苏州昊建自动化系统有限公司 | A kind of crystal-silicon battery slice chain type alkali polishing production line and chain type alkali polishing method |
| CN110491972A (en) * | 2019-09-18 | 2019-11-22 | 浙江德西瑞新能源科技股份有限公司 | Cell piece chain type etches alkali and carries on the back polishing process |
| CN112133765A (en) * | 2020-09-18 | 2020-12-25 | 江苏东鋆光伏科技有限公司 | Crystalline silicon battery prepared in solid state diffusion mode and preparation process thereof |
Non-Patent Citations (1)
| Title |
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| 武佳娜;李雪方;焦朋府;: "多晶硅片湿法切边背抛光对转换效率的影响研究", 山西化工, no. 03 * |
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