CN113673455B - Biological feature sensing device - Google Patents

Abstract

A biological feature sensing device and a biological feature sensing group, wherein the biological feature sensing device comprises a sensing element layer, a first shading layer and a second shading layer. The first shading layer is arranged on the sensing element layer and comprises a first hole and a first shading part, wherein the first hole has a hole width Wn, and the first shading part has a width Gn. The second shading layer is arranged on the first shading layer and comprises a second hole and a second shading part. The distance between the first light shielding part and the second light shielding part is H _n . The included angle between the central axis of the second hole and the light is alpha and 0 DEG<α<60 deg.. When the central axis of the second hole overlaps with the central axis of the corresponding first hole, wn, gn, H _n And a is in accordance with formula 1:2H (H) _n * And (alpha) is equal to or less than (2Gn+Wn). When the central axis of the second hole is not overlapped with the central axis of the corresponding first hole, wn, gn, H _n And a is in accordance with formula 2:2H (H) _n *│tan(α)│≤(Gn+Wn)。

Description

Biological feature sensing device

Technical Field

The present invention relates to sensing devices, and more particularly to a biometric sensing device and a biometric sensing population.

Background

In recent years, biometric sensing devices including biometric systems (e.g., fingerprints or irises) have been widely used in portable electronic devices. Taking an under-screen optical sensor as an example, a micro optical imaging device is arranged below a screen of a portable electronic device, and an image of an object pressed above the screen is acquired through a part of a light transmission area of the screen.

In order to successfully identify the biological characteristics, the biological characteristic sensing device is generally configured to the optical mechanical structure layer to focus the incident light and improve the collimation thereof; however, in the case that the pitch between devices is smaller and smaller with the development of technology, the phenomenon of optical crosstalk (crosstalk) is inevitably generated, which results in poor resolution of the sensed image. Furthermore, when a large number of biometric sensing devices are fabricated on the motherboard, the biometric sensing devices located at the edge of the motherboard are prone to process drift, so that optical crosstalk is more likely to occur in the biometric sensing devices.

Disclosure of Invention

The invention provides a biological characteristic sensing device which can avoid the occurrence of optical crosstalk phenomenon and has good identification performance.

The biological feature sensing device comprises a sensing element layer, a first shading layer and a second shading layer. The sensing element layer is arranged on the substrate and comprises a plurality of sensing elements for sensing light. The first light shielding layer is disposed on the sensing element layer and comprises a plurality of first holes, wherein at least one of the first holes has a hole width W _n A first shading part is arranged between two adjacent first holes, and the width of the first shading part is Gn. The second shading layer is arranged on the first shading layer and comprises a plurality of second holes, wherein a second shading part is arranged between two adjacent second holes, and the second shading part corresponds to the first shading part. The distance between the first light shielding part and the second light shielding part in the normal direction of the substrate is H _n Wherein the included angle between the central axis of one of the second holes and the light is alpha and 0 DEG<α<60 deg.. When the central axis of one of the plurality of second holes overlaps with the central axis of one of the corresponding plurality of first holes, wn, gn, H _n And a is in accordance with formula 1:2H (H) _n * And (alpha) is equal to or less than (2Gn+Wn). When the central axis of one of the plurality of second holes is not overlapped with the central axis of one of the corresponding plurality of first holes, wn, gn, H _n And a is in accordance with formula 2:2H (H) _n *│tan(α)│≤(Gn+Wn)。

The invention provides a biological characteristic sensing group, which comprises biological characteristic sensing devices capable of avoiding occurrence of optical crosstalk phenomenon and having good identification performance.

The biological feature sensing device comprises a substrate, a sensing element layer, a first shading layer and a second shading layer. The substrate has a first region and a second region, wherein the second region is adjacent to the edge of the substrate, and the first region is distant from the edge of the substrate. The sensing element layer is arranged on the substrate and comprises a plurality of sensing elements for sensing light. The first shading layer is arranged on the sensing element layer and comprises a plurality of first holes, and a first shading part is arranged between two adjacent first holes. The second shading layer is arranged on the first shading layer and comprises a plurality of second holes, wherein a second shading part is arranged between two adjacent second holes, and the second shading part corresponds to the first shading part. The central axis of one of the plurality of second holes in the first region overlaps with the central axis of one of the corresponding plurality of first holes, and the central axis of one of the plurality of second holes in the second region does not overlap with the central axis of one of the corresponding plurality of first holes.

In summary, in the biological sensing group of the present invention, the hole width of the first hole of the biological sensing device, the width of the first light shielding portion, the distance between the first light shielding layer and the second light shielding layer, and the maximum angle between the central axis of the second hole and the light passing through the center of the second hole in the area far from the edge of the substrate are set to satisfy the relationship 1; the first hole of the biological feature sensing device in the area close to the edge of the substrate has a hole width, the first shading part has a width, the distance between the first shading layer and the second shading layer and the maximum angle between the central axis of the second hole and the light passing through the center of the second hole are in accordance with the relation 2, so that the biological feature sensing device provided by the invention has good identification performance.

Drawings

FIG. 1 is a schematic top view of a biological sensing population according to one embodiment.

FIG. 2A is a schematic cross-sectional view of a biometric sensing device according to one embodiment of the section line A1-A1' of FIG. 1.

FIG. 2B is a schematic cross-sectional view of a biometric sensing device according to another embodiment of the section line A2-A2' of FIG. 1.

Fig. 3A to 3D are images taken when the biometric sensing device according to fig. 2A is used to sense a fingerprint, wherein fig. 3A is an image taken with a resolution of 0.4 line pair (lineair/mm), fig. 3B is an image taken with a resolution of 0.6 line pair, fig. 3C is an image taken with a resolution of 0.8 line pair, and fig. 3D is an image of a fingerprint taken when the user uses the biometric sensing device of fig. 2A.

Fig. 4A to 4D are images taken when the biometric sensing device according to fig. 2B is used to sense a fingerprint, wherein fig. 4A is an image taken with a resolution of 0.4 line pair, fig. 4B is an image taken with a resolution of 0.6 line pair, fig. 4C is an image taken with a resolution of 0.8 line pair, and fig. 4D is an image of a fingerprint taken when the user uses the biometric sensing device of fig. 2B.

Reference numerals illustrate:

10: biological feature sensing populations

100. 200: biological feature sensing device

A1-A1', A2-A2': line of cutting

BL1: a first light shielding layer

BL2: a second light shielding layer

BL3: third light shielding layer

BM1: first light shielding part

Bm1_t: a top surface of the first light shielding portion

BM2: second light shielding part

Bm2_t: the top surface of the second light shielding part

BM3: third light shielding part

Bm3_t: top surface of the third light shielding portion

CA: first region

D _n : distance between top surface of first light shielding layer and top surface of sensing element layer

D _n+1 : distance between top surface of second light shielding layer and top surface of sensing element layer

Gn: width of the first light shielding part

Gn+1: width of the second light shielding part

H _n : distance between the first light shielding layer and the second light shielding layer

IL1: a first insulating layer

IL2: second insulating layer

IL3: third insulating layer

L: light ray

ML: micro lens

Ml_c: central axis of microlens

n: normal direction

OP1: first hole

OP 1-C: central axis of first hole

OP2: second hole

Op2_c: central axis of the second hole

OP3: third hole

PA: second region

SB: substrate board

SE: sensing element layer

Se_t: top surface of sensing element layer

Sn: offset distance

SU: sensing element

Wn: width of first hole

Wn+1: hole width of the second hole

Alpha: maximum included angle

Detailed Description

As used herein, "about," "approximately," "essentially," or "substantially" includes both the values and average values within an acceptable deviation of the particular values as determined by one of ordinary skill in the art, taking into account the particular number of measurements and errors associated with the measurements (i.e., limitations of the measurement system) in question. For example, "about" may mean within one or more standard deviations of the stated values, or within, for example, ±30%, ±20%, ±15%, ±10%, ±5%. Further, as used herein, "about," "approximately," "essentially," or "substantially" may be used to select a range of more acceptable deviations or standard deviations depending on the measured, cut, or other property, and not one standard deviation may be used for all properties.

In the drawings, the thickness of layers, films, panels, regions, etc. are exaggerated for clarity. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physical and/or electrical connection. Furthermore, "electrically connected" may be used in a manner that other elements are present between the two elements.

Moreover, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe one element's relationship to another element as illustrated. It will be understood that relative terms are intended to encompass different orientations of the device in addition to the orientation depicted in the figures. For example, if the device in one of the figures is turned over, elements described as being on the "lower" side of other elements would then be oriented on the "upper" side of the other elements. Thus, the exemplary term "lower" may include both "lower" and "upper" orientations, depending on the particular orientation of the figure. Similarly, if the device in one of the figures is turned over, elements described as "below" or "beneath" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "above" or "below" can encompass both an orientation of above and below.

Reference will now be made in detail to the exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers will be used throughout the drawings and the description to refer to the same or like parts.

FIG. 1 is a schematic top view of a biological sensing population according to one embodiment. Referring to fig. 1, the biological sensing group 10 of the present embodiment includes a substrate SB and a plurality of biological sensing devices 100 and 200, wherein the substrate SB has a first area CA and a second area PA, the first area CA is far from the edge of the substrate SB, and the second area PA is adjacent to the edge of the substrate SB. In the present embodiment, the second area PA surrounds the first area CA, but the invention is not limited thereto. The biological sensing device 100 and the biological sensing device 200 are, for example, respectively located in the first area CA and the second area PA of the substrate SB, and the biological sensing device 100 and the biological sensing device 200 include components and their specific parameter relationships will be described below with reference to fig. 2A and 2B.

FIG. 2A is a schematic cross-sectional view of a biometric sensing device according to one embodiment of the section line A1-A1' of FIG. 1. Referring to fig. 2A, the biometric sensing device 100 of the present embodiment includes a sensing element layer SE, a first light shielding layer BL1 and a second light shielding layer BL2.

The sensing element layer SE is disposed on the substrate SB, for example, and includes a plurality of sensing elements SU for sensing the light L. In some embodiments, the substrate SB may be a flexible substrate or a rigid substrate, which is not limited to the present invention. The sensing element layer SE of the present embodiment may include, in addition to a plurality of sensing elements SU, active elements (not shown), scan lines (not shown), and read lines (not shown), but the present invention is not limited thereto. In some exemplary embodiments, the active device, the scan line and the read line are also disposed on the substrate SB, wherein the scan line is electrically connected to the source of the active device and the read line is electrically connected to the drain of the active device to read the signal sensed by the sensing device SU. In some exemplary embodiments, the sensing element SU may include a first electrode (not shown), a photosensitive layer (not shown), and a second electrode (not shown). The first electrode, the photosensitive layer, and the second electrode are stacked in this order on the substrate SB, for example. The first and second electrodes may, for example, comprise a light transmissive conductive material or a light opaque conductive material, depending on the use of the biometric sensing device 100. In this embodiment, the biometric sensing device 100 can be used as an under-screen fingerprint sensor, so that light from the outside (such as light reflected by the fingerprint) can pass through the second electrode and enter the photosensitive layer, and based on this, the second electrode is made of a transparent conductive material. The photosensitive layer has the characteristic of converting light energy into electric energy so as to realize the function of optical sensing. In some embodiments, the material of the photosensitive layer may include a silicon-rich material, which may be a silicon-rich oxide, a silicon-rich nitride, a silicon-rich oxynitride, a silicon-rich carbide, a silicon-rich oxycarbide, a hydrogenated silicon-rich oxide, a hydrogenated silicon-rich nitride, a hydrogenated silicon-rich carbide, an elemental doping material with a high work function, such as: a silicon germanium compound or other suitable organic material, or a combination of the foregoing. In addition, in some embodiments, the sensing element layer SE may further include an insulating layer (not shown) covering the plurality of sensing elements SU, and the insulating layer may have a single-layer structure or a multi-layer structure, and may include an organic material or an inorganic material.

The first light shielding layer BL1 is disposed on the sensing element layer SE and includes a plurality of first holes OP1, and from another perspective, the first light shielding layer BL1 includes a plurality of first light shielding portions BM1 located between two adjacent first holes OP1. In the present embodiment, the first light shielding layer BL1 has a plurality of first holes OP1 for defining a light-emitting region, wherein the first light shielding portion BM1 has a width Gn, at least one of the plurality of first holes OP1 has a hole width Wn, and at least one of the plurality of first holes OP1 has a central axis op1_c. In some embodiments, the material of the first light shielding layer BL1 includes a light shielding and/or reflecting material, which may be a metal, an alloy, a nitride of the foregoing material, an oxide of the foregoing material, an oxynitride of the foregoing material, or other suitable light shielding and/or reflecting material. For example, the material of the first light shielding layer BL1 may be molybdenum, molybdenum oxide or a stacked layer thereof. In this way, the light-emitting passage region can be defined by the region where the first light-shielding layer BL1 is not provided. In the present embodiment, the first hole OP1 is disposed corresponding to the sensing element SU in the sensing element layer SE, so that the sensing element SU can convert the light L passing through the outside of the first hole OP1 into a corresponding electrical signal. In addition, in some embodiments, the region where the first light shielding portion BM1 is disposed may be used to shield the active element of the sensing element SU. In detail, the first light shielding portion BM1 may be located above the active device and at least shield the semiconductor layer of the active device, so as to prevent light from the outside from irradiating the semiconductor layer, thereby preventing the active device from generating electric leakage.

In some embodiments, the biometric sensing device 100 of the present embodiment may further include a first insulating layer IL1 disposed between the sensing element layer SE and the first light shielding layer BL 1. The first insulating layer IL1 may be, for example, an inorganic layer or an organic layer. In the case where the first insulating layer IL1 is an inorganic layer, the material included therein may be silicon oxide, silicon nitride, silicon oxynitride, or a stacked layer of at least two of the above materials. In the case where the first insulating layer IL1 is an organic layer, it may include a material of polyimide, polyester, benzocyclobutene, polymethyl methacrylate, polyvinyl phenol, polyvinyl alcohol, polytetrafluoroethylene, hexamethyldisiloxane, or a stacked layer of at least two of the above materials. Alternatively, the first insulating layer IL1 may include an organic material having a filtering technical effect. For example, the first insulating layer IL1 may be an infrared cut (IR-cut) filter layer to prevent the displayed image from being distorted or dispersed due to the influence of the infrared light, but the invention is not limited thereto. In some embodiments, the first insulating layer IL1 may have a single-layer structure or a multi-layer structure, which is not limited to the present invention.

The second light shielding layer BL2 is disposed on the first light shielding layer BL1 and includes a plurality of second holes OP2, and from another perspective, the second light shielding layer BL2 includes a plurality of second light shielding portions BM2 located between two adjacent second holes OP2. The second light shielding layer BL2 may also have a plurality of second holes OP2, for example, to define a light passing region, wherein the second light shielding portion BM2 has a width gn+1, at least one of the plurality of second holes OP2 has a hole width wn+1, and at least one of the plurality of second holes OP2 has a central axis op2_c. In some embodiments, in the normal direction n of the substrate SB, the second aperture OP2 of the second light shielding layer BL2 corresponds to the first aperture OP1 of the first light shielding layer BL 1. For example, the central axis op2_c of the second hole OP2 overlaps the central axis op1_c of the first hole OP1, i.e. there is no offset distance between the central axis op2_c of the second hole OP2 and the central axis op1_c of the first hole OP1, but the invention is not limited thereto. In other embodiments, the central axis op2_c of the second hole OP2 and the central axis op1_c of the first hole OP1 may have an offset distance therebetween. From another point of view, the second light shielding portion BM2 corresponds to and partially overlaps the first light shielding portion BM1 in the normal direction n of the substrate SB, but the present invention is not limited thereto.

In some embodiments, the hole width wn+1 of the second hole OP2 may be larger than the hole width Wn of the first hole OP1, and the width gn+1 of the second light shielding portion BM2 may be smaller than the width Gn of the first light shielding portion BM1, which is not limited in the present invention. In addition, in the normal direction n of the substrate SB, the first light shielding layer BL1 and the second light shielding layer BL2With a distance H between _n It is worth noting that the distance H here _n The distance between the top surface bm1_t of the first light shielding layer BL1 and the top surface bm2_t of the second light shielding layer BL2 is not limited to this, but may be the distance between the bottom surface of the first light shielding layer BL1 and the bottom surface of the second light shielding layer BL2.

In some embodiments, the second hole OP2 has a central axis op2_c that forms a maximum angle α with the light L passing through the center of the second hole OP2. In detail, the maximum included angle α mentioned herein is a critical angle at which the light L passing through the center of the second hole OP2 does not pass through the first hole OP1 that does not correspond to the second hole OP2. In the present embodiment, the maximum included angle α is the maximum angle between the path of the light L passing through the center of the second hole OP2 and striking the edge of the top surface bm1_t of the first light shielding portion BM1 and the central axis op2_c of the second hole OP2. In the present embodiment, 0 °<α<60 °, but the invention is not limited thereto. In the present embodiment, the first hole OP1 has a hole width Wn, the first light shielding portion BM1 has a width Gn, and the distance H between the first light shielding layer BL1 and the second light shielding layer BL2 _n And the maximum clamping degree alpha between the central axis OP2_C of the second hole OP2 and the light L passing through the center of the second hole OP2 is consistent with the following formula 1.

2H _n * Itan (alpha) It is less than or equal to (2Gn+Wn) … …, 1

When the biometric sensing device 100 of the present embodiment includes parameters having the above-described relationship (Wn, gn, H _n When the alpha accords with the relation 1), the degradation of the resolution of the image caused by the optical crosstalk phenomenon can be avoided, so that the biological feature sensing device of the embodiment has good recognition performance.

In addition, in some embodiments, in the normal direction n of the substrate SB, a distance D is provided between the top surface bm1_t of the first light shielding layer BL1 and the top surface se_t of the sensing element layer SE _n And a distance D is provided between the top surface Bm2_T of the second light shielding layer BL2 and the top surface SE_T of the sensing element layer SE _n+1 And D is _n 、D _n+1 And H is _n The following formula 3 is satisfied. For example, distance D _n Is the top surface bm1_t of the first light shielding portion BM1Distance from top surface SE_T of sensing element layer SE, and distance D _n+1 Is the distance between the top surface ml2_t of the second light shielding portion BM2 and the top surface se_t of the sensing element layer SE.

0<H _n ≤(D _n+1 -D _n ) … … type 3.

In some embodiments, the biometric sensing device 100 of the present embodiment may further include a second insulating layer IL2 disposed between the first light shielding layer BL1 and the second light shielding layer BL2. The second insulating layer IL2 includes materials and structures similar to those of the first insulating layer IL1, and the description of this embodiment is omitted.

In some embodiments, the biometric sensing device 100 of the present embodiment may further include a third light shielding layer BL3 and a plurality of microlenses ML. The third light shielding layer BL3 and the microlenses ML are disposed on the second light shielding layer BL2, for example, wherein the third light shielding layer BL3 includes a plurality of third holes OP3, and from another perspective, the third light shielding layer BL3 includes a plurality of third light shielding portions BM3 located between two adjacent third holes OP 3. The third light shielding layer BL3 is also used for defining a light passing area, and a plurality of microlenses ML are disposed in the light passing area. In some embodiments, the plurality of microlenses ML corresponds to the plurality of second apertures OP2. For example, in some embodiments, the central axis ml_c of the plurality of microlenses ML overlaps the central axis op2_c of the second hole OP2 of the second light shielding layer BL2, but the invention is not limited thereto, and in other embodiments, the central axis ml_c of the plurality of microlenses ML does not overlap the central axis op2_c of the second hole OP2 of the second light shielding layer BL2. The first, second and third holes OP1, OP2 and OP3 can be used for further improving the light collimation effect, so as to reduce the light leakage and the light mixing caused by scattered light or refracted light. In some embodiments, the microlenses ML may be symmetrical biconvex lenses, asymmetrical biconvex lenses, plano-convex lenses, or meniscus lenses, which is not limited to the present invention. In addition, each or more of the microlenses ML are disposed corresponding to one sensing element SU, but the invention is not limited thereto. The top surface bm3_t of the third light shielding portion BM3 may have a gentle surface with respect to the microlens ML, but the present invention is not limited thereto.

In some embodiments, the biometric sensing device 100 of the present embodiment may further include a third insulating layer IL3 disposed between the second light shielding layer BL2 and the plurality of microlenses ML. The third insulating layer IL3 includes materials and structures similar to those of the first insulating layer IL1, and the description of this embodiment is omitted.

In some embodiments, the biometric sensing device 100 of the present embodiment may further include a cover plate (not shown) overlapping the substrate SB. The cover plate is disposed above the microlenses ML, and includes at least one of a display panel, a touch panel, and a protection plate, wherein the display panel may be in a self-luminous form or a non-self-luminous form. When the biometric sensing device 100 of the present embodiment is used, the fingerprint of the user contacts the cover.

Based on the above, when the parameters included in the biometric sensing device 100 of the present embodiment have at least the above-mentioned relationship, the degradation of the resolution of the image caused by the optical crosstalk phenomenon can be avoided, thereby enabling the biometric sensing device of the present embodiment to have good recognition performance.

FIG. 2B is a schematic cross-sectional view of a biometric sensing device according to another embodiment of the section line A2-A2' of FIG. 1. It should be noted that the embodiment shown in fig. 2B uses the element numbers and part of the content of the embodiment in fig. 2A, where the same or similar elements are denoted by the same or similar numbers, and the description of the same technical content is omitted. The description and effects of the foregoing embodiments may be referred to for the description of the omitted parts, and the following embodiments will not be repeated, while the description of at least a part of the embodiment shown in fig. 2B, which is not omitted, may be referred to as the following description.

Referring to fig. 2B, the main differences between the biometric sensing device 200 of the present embodiment and the biometric sensing device 100 of the previous embodiment are as follows: the central axis op2_c of one of the plurality of second holes OP2 of the second light shielding layer BL2 of the present embodiment does not overlap with the central axis op1_c of one of the corresponding plurality of first holes OP1. This is because the biometric sensing device 200 located in the second area PA adjacent to the edge of the substrate SB is susceptible to a phenomenon of process offset when the biometric sensing population including the plurality of biometric sensing populations 100, 200 is formed, such that there is an offset distance Sn between the central axis op2_c of the second aperture OP2 of the second light shielding layer BL2 and the central axis op1_c of the first aperture OP1 in the biometric sensing population 200.

In order to avoid the optical crosstalk phenomenon of the biometric sensing group 200 caused by the above-mentioned process deviation, the present embodiment makes the first hole OP1 have a hole width Wn, the first light shielding portion BM1 have a width Gn, and the distance H between the first light shielding layer BL1 and the second light shielding layer BL2 _n And the maximum clamping degree alpha between the central axis OP2_C of the second hole OP2 and the light L passing through the center of the second hole OP2 is consistent with the following formula 2.

2H _n * Itan (alpha) It is less than or equal to (Gn+Wn) … …, 2

When the biometric sensing device 200 of the present embodiment includes parameters having at least the above-mentioned relationships (Wn, gn, H _n When α meets the above relation 2), the degradation of the resolution of the image caused by the optical crosstalk phenomenon can be avoided, so that the biological feature sensing device of the embodiment has good recognition performance.

Fig. 3A to 3D are images taken when the biometric sensing device according to fig. 2A is used to sense a fingerprint, wherein fig. 3A is an image taken with a resolution of 0.4 line pair, fig. 3B is an image taken with a resolution of 0.6 line pair, fig. 3C is an image taken with a resolution of 0.8 line pair, and fig. 3D is an image of a fingerprint taken when the user uses the biometric sensing device of fig. 2A. Fig. 4A to 4D are images taken when the biometric sensing device according to fig. 2B is used to sense a fingerprint, wherein fig. 4A is an image taken with a resolution of 0.4 line pair, fig. 4B is an image taken with a resolution of 0.6 line pair, fig. 4C is an image taken with a resolution of 0.8 line pair, and fig. 4D is an image of a fingerprint taken when the user uses the biometric sensing device of fig. 2B.

Referring to fig. 3A to 3D, the biological sensing device 100 has a good image resolution, and the parameters of the biological sensing device 100 conform to the above relation 1, so that the occurrence of optical crosstalk can be avoided. Similarly, referring to fig. 4A to 4D, it is shown that the biometric sensing device 200 also has good image resolution, because the biometric sensing device 200 has parameters that meet the above-mentioned relation 2, thereby avoiding occurrence of optical crosstalk.

In summary, in the biological sensing group of the present invention, the hole width of the first hole of the biological sensing device, the width of the first light shielding portion, the distance between the first light shielding layer and the second light shielding layer, and the maximum pinching degree between the central axis of the second hole and the light passing through the center of the second hole in the area far from the edge of the substrate are in accordance with the relation 1; the first hole of the biological feature sensing device in the area close to the edge of the substrate has a hole width, the first shading part has a width, the distance between the first shading layer and the second shading layer and the maximum clamping degree between the central axis of the second hole and the light passing through the center of the second hole are in accordance with the relation 2, so that the biological feature sensing device provided by the invention has good identification performance.

Claims (11)

1. A biometric sensing device, comprising:

the sensing element layer is arranged on the substrate and comprises a plurality of sensing elements for sensing light;

the first shading layer is arranged on the sensing element layer and comprises a plurality of first holes, wherein at least one of the first holes has a hole width Wn, a first shading part is arranged between two adjacent first holes, and the first shading part has a width Gn; and

a second light shielding layer disposed on the first light shielding layer and including a plurality of second holes, wherein a second light shielding portion is disposed between two adjacent second holes, the second light shielding portion corresponds to the first light shielding portion, and a distance between the first light shielding portion and the second light shielding portion in a normal direction of the substrate is H _n Wherein a central axis of one of the plurality of second holes is aligned with the central axisThe included angle between the light rays is alpha and 0 DEG<α<60°，

Wherein Wn, gn, H when the central axis of one of the plurality of second holes overlaps with the central axis of the corresponding one of the plurality of first holes _n And a is in accordance with formula 1:

2H _n * And (2 Gn+Wn) … … is equal to or less than (alpha) and equal to or less than (2 Gn+Wn) … …,

wherein when the central axis of one of the plurality of second holes is not overlapped with the central axis of the corresponding one of the plurality of first holes, wn, gn, H _n And a is in accordance with formula 2:

2H _n * And (alpha) is equal to or less than (Gn+Wn) … … and is represented by formula 2.

2. The biometric sensing device according to claim 1, wherein a distance from a top surface of the first light shielding layer to a top surface of the sensing element layer in the normal direction of the substrate is D _n The distance from the top surface of the second light shielding layer to the top surface of the sensing element layer is D _n+1 And D is _n 、D _n+1 And H is _n Meets the formula 3:

0<H _n ≤(D _n+1 -D _n ) … … type 3.

3. The biometric sensing device of claim 1, further comprising:

the micro lenses are arranged on the second shading layer and correspond to the second holes.

4. A biometric sensing device according to claim 3, further comprising:

a first insulating layer disposed between the sensing element layer and the first light shielding layer;

a second insulating layer disposed between the first light shielding layer and the second light shielding layer; and

and a third insulating layer arranged between the second shading layer and the microlenses.

5. The biometric sensing device of claim 1, further comprising:

and the cover plate is overlapped with the substrate and comprises at least one of a display panel, a touch panel and a protection plate.

6. A biometric sensing device, comprising:

a substrate having a first region and a second region, wherein the second region is adjacent to an edge of the substrate and the first region is remote from the edge of the substrate;

the sensing element layer is arranged on the first area and the second area of the substrate and comprises a plurality of sensing elements used for sensing light;

the first shading layer is arranged on the sensing element layer and comprises a plurality of first holes, and a first shading part is arranged between two adjacent first holes; and

the second shading layer is arranged on the first shading layer and comprises a plurality of second holes, wherein a second shading part is arranged between two adjacent second holes and corresponds to the first shading part, the central axis of one of the plurality of second holes in the first area is overlapped with the central axis of one of the corresponding plurality of first holes, and the central axis of one of the plurality of second holes in the second area is not overlapped with the central axis of one of the corresponding plurality of first holes.

7. The biometric sensing device according to claim 6, wherein at least one of said plurality of first holes has a hole width Wn, said first light shielding portion has a width Gn, and a distance between said first light shielding portion and said second light shielding portion in a normal direction of said substrate is H _n An included angle formed by the central axis of one of the second holes and the light is alpha and 0 DEG<α<60°；

Wherein the one of the plurality of second holes is located in the first regionThe central axis overlaps with the central axis of one of the corresponding first holes, wn, gn, H _n And a is in accordance with formula 1:

2H _n * And (2 Gn+Wn) … … is equal to or less than (alpha) and equal to or less than (2 Gn+Wn) … …,

wherein the central axis of one of the plurality of second holes in the second region does not overlap with the central axis of the corresponding one of the plurality of first holes, wn, gn, H _n And a is in accordance with formula 2:

2H _n * And (alpha) is equal to or less than (Gn+Wn) … … and is represented by formula 2.

8. The biometric sensing device according to claim 7, wherein a distance from a top surface of said first light shielding layer to a top surface of said sensing element layer in said normal direction of said substrate is D _n The distance from the top surface of the second light shielding layer to the top surface of the sensing element layer is D _n+1 And D is _n 、D _n+1 And H is _n Meets the formula 3:

0<H _n ≤(D _n+1 -D _n ) … … type 3.

9. The biometric sensing device of claim 6, further comprising:

the micro lenses are arranged on the second shading layer and correspond to the second holes.

10. The biometric sensing device of claim 9, further comprising:

a first insulating layer disposed between the sensing element layer and the first light shielding layer;

a second insulating layer disposed between the first light shielding layer and the second light shielding layer; and

and a third insulating layer arranged between the second shading layer and the microlenses.

11. The biometric sensing device of claim 6, further comprising:

and the cover plate is overlapped with the substrate and comprises at least one of a display panel, a touch panel and a protection plate.

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