CN113620252B - Electronic grade hydrofluoric acid manufacturing system and method for manufacturing electronic grade hydrofluoric acid - Google Patents

Electronic grade hydrofluoric acid manufacturing system and method for manufacturing electronic grade hydrofluoric acid Download PDF

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CN113620252B
CN113620252B CN202010660885.3A CN202010660885A CN113620252B CN 113620252 B CN113620252 B CN 113620252B CN 202010660885 A CN202010660885 A CN 202010660885A CN 113620252 B CN113620252 B CN 113620252B
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hydrofluoric acid
tank
storage tank
gaseous
absorption device
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CN113620252A (en
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陈义平
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Fujian Shenxin Electronic Materials Co., Ltd.
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00Halogens; Halogen acids
    • C01B7/19Fluorine; Hydrogen fluoride
    • C01B7/191Hydrogen fluoride
    • C01B7/195Separation; Purification

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Abstract

The electronic hydrofluoric acid producing system and method includes controlling the boiling point and condensing temperature of anhydrous hydrofluoric acid, gasifying and condensing for several stages to eliminate impurity from the anhydrous hydrofluoric acid, and filtering, absorbing and cooling gaseous hydrofluoric acid to obtain electronic hydrofluoric acid product.

Description

Electronic grade hydrofluoric acid manufacturing system and method for manufacturing electronic grade hydrofluoric acid
Technical Field
The present invention relates to a hydrofluoric acid manufacturing system and method, and more particularly, to a manufacturing system and method for manufacturing electronic grade hydrofluoric acid.
Background
Electronic grade hydrofluoric acid is an important chemical substance commonly used in semiconductor manufacturing, and is mainly applied to large integrated circuits as a cleaning agent and an etchant. Nowadays, the semiconductor process has high requirements on the purity of hydrofluoric acid, and the requirements of metal ions below 10ppt and anions below 3ppb are met, so in order to remove impurities in industrial grade anhydrous hydrofluoric acid with the purity of 99.95%, the impurities with high boiling point and low boiling point are separated and removed from the anhydrous hydrofluoric acid through a purification mode of multi-stage gasification and condensation. Among them, in the removal of arsenic ions in anhydrous hydrofluoric acid, arsenic is oxidized from trivalent to pentavalent by an oxidizing agent method and is removed in purification by gasification and condensation.
In the manufacture of electronic hydrofluoric acid, many processes use equipment lined with fluoroplastics, including reboilers, distillation columns and condensers, so that the equipment investment and energy use are relatively large, the equipment manufacturing trade time and manufacturers are relatively limited, the amount of waste acid generated by cold and hot water used for production is increased, and the operation cost is increased by adopting a condensing reflux or ultra-pure water washing method for impurity removal.
In view of the above, the inventors of the present invention have made extensive studies and thinking for many years to design a system and a method for manufacturing electronic hydrofluoric acid, so as to improve the shortcomings of the prior art and further enhance the industrial application.
Disclosure of Invention
The invention aims to provide an electronic-grade hydrofluoric acid manufacturing system and a method for manufacturing the electronic-grade hydrofluoric acid, which are used for removing impurities in anhydrous hydrofluoric acid through multi-stage gasification and condensation by controlling the boiling point and the condensation temperature of the anhydrous hydrofluoric acid, and then obtaining an electronic-grade hydrofluoric acid product through filtering, mixing and cooling gaseous hydrofluoric acid.
Therefore, the present invention provides an electronic hydrofluoric acid manufacturing system, which comprises a raw material storage tank, at least one set of equipment, a second reboiler, a filter, and a mixed cooling equipment. The equipment set comprises a first reboiler, a condenser, a hydrofluoric acid buffer storage tank and an oxidant storage tank. The mixed cooling equipment comprises an absorption device, an ultra-pure water tank and a control valve thereof, a mixed cooling tank and a cooling water device.
The raw material storage tank stores anhydrous hydrofluoric acid and is connected with the at least one set of equipment; the first end of the first reboiler of the set of equipment is connected with the raw material storage tank to gasify the anhydrous hydrofluoric acid to form a first gaseous hydrofluoric acid, and the second end of the first reboiler is connected with a collecting tank to discharge high-boiling-point impurities to the collecting tank; one end of the condenser is connected with the third end of the first reboiler so as to condense the first gaseous hydrofluoric acid to form liquid anhydrous hydrofluoric acid; the first end of the hydrofluoric acid buffer storage tank is connected with the other end of the condenser to temporarily store the liquid anhydrous hydrofluoric acid, the second end of the hydrofluoric acid buffer storage tank is connected with a tail gas treatment system to discharge low-boiling-point impurities to the tail gas treatment system, and the third end of the hydrofluoric acid buffer storage tank is connected with the first end of a mixing pipeline; and the oxidant storage tank is connected with the second end of the mixing pipeline so as to inject an oxidant to be mixed with the liquid anhydrous hydrofluoric acid.
The first end of the second reboiler is connected with the third end of the mixing pipeline to gasify the mixed liquid anhydrous hydrofluoric acid to form second gaseous hydrofluoric acid, and the second end of the second reboiler is connected with the collecting tank to discharge high-boiling-point impurities to the collecting tank; one end of the filter is connected with the third end of the second reboiler so as to remove micro-particles in the second gaseous hydrofluoric acid and form pure gaseous hydrofluoric acid; and one end of the mixed cooling equipment is connected with the other end of the filter so as to introduce the pure gaseous hydrofluoric acid, and the pure gaseous hydrofluoric acid is mixed and cooled with ultrapure water to form electronic-grade hydrofluoric acid.
In one embodiment, the mixed cooling equipment comprises an absorption device, an ultra-pure water tank and a control valve thereof, a mixed cooling tank and a cooling water device. The first end of the absorption device is connected with the other end of the filter so as to lead the pure gaseous hydrofluoric acid into the absorption device and be absorbed by the hydrofluoric acid solution in the absorption device; the ultrapure water tank is connected with the second end of the absorption device, and the connection part comprises a control valve for adding a proper amount of ultrapure water into the absorption device according to a regulation signal; the first end of the mixed cooling tank is connected with the third end of the absorption device so as to mix the absorbed hydrofluoric acid solution with the ultrapure water, and meanwhile, the mixed cooling tank is cooled by a cooling water device so as to form electronic grade hydrofluoric acid.
In one embodiment, the third end of the hybrid cooling tank is connected to the fourth end of the absorption device through a delivery pipe to deliver the electronic-grade hydrofluoric acid into the absorption device as the hydrofluoric acid solution in the absorption device.
In one embodiment, the material of the raw material storage tank, the first reboiler, the condenser, the hydrofluoric acid buffer storage tank, the oxidant storage tank, the collection tank and the second reboiler is carbon steel or stainless steel.
In one embodiment, the filter, the absorption device and the mixing and cooling tank are made of carbon steel lined with fluoroplastic or stainless steel lined with fluoroplastic.
In one embodiment, the plant includes a plurality of plants, and a connection line connects the mixing line and the first reboiler in the plant.
The invention also provides a method for manufacturing the electronic-grade hydrofluoric acid by using the electronic-grade hydrofluoric acid manufacturing system, which comprises the steps of first-stage gasification, condensation and purification treatment, and second-stage gasification, filtration and mixed cooling treatment.
Wherein the first stage gasification, condensation and purification treatment comprises: conveying the anhydrous hydrofluoric acid to the first reboiler, gasifying the anhydrous hydrofluoric acid with hot water at 22 deg.c and discharging the high boiling point impurity to the collecting tank to form the first gaseous hydrofluoric acid; conveying the first gaseous hydrofluoric acid to the condenser, and condensing the first gaseous hydrofluoric acid by using ice water with the temperature of below 17 ℃ to form liquid anhydrous hydrofluoric acid; conveying the liquid anhydrous hydrofluoric acid to the hydrofluoric acid buffer storage tank for temporary storage, and discharging the low-boiling point impurities to the tail gas treatment system; and injecting the oxidant in the oxidant storage tank into the oxidant through the second end of the mixing pipeline so as to be mixed with the liquid anhydrous hydrofluoric acid in the mixing pipeline.
The second stage gasification treatment comprises the following steps: gasifying the mixed liquid anhydrous hydrofluoric acid in the second reboiler by using hot water with the temperature of more than 22 ℃, and discharging the high-boiling-point impurities to the collecting tank to form the second gaseous hydrofluoric acid.
The filtering step is as follows: delivering the second gaseous hydrofluoric acid to the filter to remove particulates to form the purified gaseous hydrofluoric acid.
The mixed cooling step comprises the following steps: the pure gaseous hydrofluoric acid is delivered to the mixing and cooling device and mixed and cooled with ultrapure water to form electronic grade hydrofluoric acid.
In one embodiment, the step of hybrid cooling includes absorption, hybrid cooling. The absorption step is as follows: conveying the pure gaseous hydrofluoric acid to an absorption device, absorbing the pure gaseous hydrofluoric acid by a hydrofluoric acid solution in the absorption device, and adding a proper amount of ultrapure water; the mixed cooling step comprises the following steps: and conveying the absorbed hydrofluoric acid solution to a mixing and cooling tank to be mixed with the ultrapure water, and simultaneously cooling by a cooling water device to form the electronic grade hydrofluoric acid.
In one embodiment, the number of times the first stage vaporization, condensation and purification processes includes multiple times.
In one embodiment, the method further comprises conveying the electronic-grade hydrofluoric acid of the mixed cooling tank into the absorption device through the conveying pipeline to serve as the hydrofluoric acid solution in the absorption device.
In summary, the present invention will be described in detail with reference to specific embodiments. The following examples are given by way of illustration only and are not intended to limit the scope of the invention. Those skilled in the art will readily appreciate that various non-critical parameters may be varied or adjusted to produce substantially the same results.
Drawings
FIG. 1 is a schematic diagram of an electronic grade hydrofluoric acid manufacturing system of the present invention;
FIG. 2 is a schematic diagram of an electronic grade hydrofluoric acid manufacturing system including a plurality of kits according to the present invention.
[ description of reference ]
10 raw material storage tank
20 first reboiler
30 condenser
40 hydrofluoric acid buffer storage tank
50 oxidant storage tank
60 tail gas treatment system
70 collecting tank
80 second reboiler
90 filter
100 absorption device
110 ultra-pure water tank
111 control valve
120 mixed cooling tank
130 cooling water device
140 finished product storage tank
T1 mixing line
T2 conveying pipeline
T3 connecting line
A set of equipment
B mixed cooling equipment
Detailed Description
The following describes an embodiment of the present invention with reference to fig. 1 to 2. The description is not intended to limit the embodiments of the present invention, but is one example of the present invention.
First, as shown in fig. 1, the present invention discloses an electronic-grade hydrofluoric acid manufacturing system, comprising: a raw material storage tank 10 for storing anhydrous hydrofluoric acid, wherein the raw material storage tank 10 is connected to at least one set of equipment A.
This suit of equipment A includes: a first reboiler 20, a first end of the first reboiler 20 being connected to the raw material storage tank 10 to vaporize the anhydrous hydrofluoric acid to form a first gaseous hydrofluoric acid, a second end of the first reboiler 20 being connected to a holding tank 70 to discharge a high boiling point impurity to the holding tank 70; a condenser 30, one end of the condenser 30 is connected to the third end of the first reboiler 20 to condense the first gaseous hydrofluoric acid to formA liquid anhydrous hydrofluoric acid; a hydrofluoric acid buffer storage tank 40, a first end of the hydrofluoric acid buffer storage tank 40 is connected to the other end of the condenser 30 for temporarily storing the liquid anhydrous hydrofluoric acid, a second end of the hydrofluoric acid buffer storage tank 40 is connected to a tail gas treatment system 60 for discharging a low-boiling point impurity to the tail gas treatment system 60, and a third end of the hydrofluoric acid buffer storage tank 40 is connected to a first end of a mixing pipeline T1; and an oxidant storage tank 50 connected to a second end of the mixing pipe T1 for injecting an oxidant. The oxidant is potassium permanganate (KMnO)4) Ammonium persulfate ((NH)4)2S2O8) Potassium hydrogen fluoride (KHF)2) Or fluorine gas.
To explain, the equipment set a includes a plurality of equipment sets, as shown in fig. 2, the mixing pipeline T1 and the first reboiler 20 in the equipment set a are connected by a connecting pipeline T3, the number of the equipment set a is determined according to the quality and the energy demand of the electronic grade hydrofluoric acid by the user, and the number of the equipment set a may include 1 to 5 equipment sets a.
Then, the set of equipment a is connected to a second reboiler 80, a first end of the second reboiler 80 is connected to a third end of the mixing pipeline T1 to vaporize the liquid anhydrous hydrofluoric acid to form a second gaseous hydrofluoric acid, and a second end of the second reboiler 80 is connected to the holding tank 70 to discharge a high boiling point impurity to the holding tank 70; a filter 90, wherein one end of the filter 90 is connected to the third end of the second reboiler 80 to remove the particles in the second gaseous hydrofluoric acid to form a pure gaseous hydrofluoric acid; and a mixed cooling device B, one end of which is connected with the other end of the filter 90 to introduce the pure gaseous hydrofluoric acid, and the pure gaseous hydrofluoric acid is mixed and cooled with ultrapure water to form electronic grade hydrofluoric acid.
Further, in one embodiment, the hybrid cooling apparatus B includes an absorption device 100, an ultrapure water tank 110, a hybrid cooling tank 120, and a cooling water device 130. A first end of the absorption device 100 is connected to the other end of the filter 90, so as to introduce the pure gaseous hydrofluoric acid into the absorption device 100 for absorption by the hydrofluoric acid solution in the absorption device 100; the ultrapure water tank 110 is connected to the second end of the absorption apparatus 100, and the connection comprises a control valve 111 for adding an appropriate amount of ultrapure water into the absorption apparatus 100 according to a control signal, wherein the amount of the ultrapure water is adjusted according to the concentration requirement of the required electronic hydrofluoric acid; and the first end of the mixed cooling tank 120 is connected to the third end of the absorption device 100 to mix the absorbed hydrofluoric acid solution with the ultrapure water, and at the same time, the hydrofluoric acid solution is cooled by a cooling water device 130 to form electronic grade hydrofluoric acid.
In one embodiment, the second end of the hybrid cooling tank 120 is connected to a product storage tank 140 for discharging the electronic-grade hydrofluoric acid to the product storage tank for storage.
In one embodiment, the third end of the hybrid cooling tank 120 is connected to the fourth end of the absorption device 100 through a delivery pipe T2, so as to deliver the electronic-grade hydrofluoric acid into the absorption device 100 as the hydrofluoric acid solution in the absorption device, i.e. the hydrofluoric acid solution is the electronic-grade hydrofluoric acid. The electronic grade hydrofluoric acid is then returned to the absorption device 100, so that a larger flow rate can be used for returning, and a better mixed cooling effect can be achieved.
In addition, the material of the raw material storage tank 10, the first reboiler 20, the condenser 30, the hydrofluoric acid buffer storage tank 40, the oxidant storage tank 50, the collection tank 70, and the second reboiler 80 is carbon steel or stainless steel. The filter 90, the absorption device 100 and the mixing and cooling tank 120 are made of carbon steel lined with fluoroplastic or stainless steel lined with fluoroplastic.
Therefore, the invention uses carbon steel or stainless steel material, without reflux, and no cold or hot water waste acid is generated in the production process, so as to achieve the effects of low investment and low operation cost.
The invention also provides a method for manufacturing electronic-grade hydrofluoric acid by using the electronic-grade hydrofluoric acid manufacturing system, which comprises the following steps: the first stage gasification, condensation and purification treatment, the second stage gasification, filtration and mixed cooling treatment are described in detail as follows:
the first stage gasification, condensation and purification treatment: the boiling point of the anhydrous hydrofluoric acid as the raw material is 19.5 ℃, so that the anhydrous hydrofluoric acid is conveyed to the first reboiler 20, and the anhydrous hydrofluoric acid is gasified by using hot water of 22 ℃ or higher, at this time, in the continuous process, high boiling impurities (impurities) are discharged from the second end of the first reboiler 20 to the holding tank 70 in batches, and the gasified anhydrous hydrofluoric acid forms the first gaseous hydrofluoric acid; conveying the first gaseous hydrofluoric acid to a condenser 30, and condensing the first gaseous hydrofluoric acid by using ice water with the temperature of below 17 ℃ to form liquid anhydrous hydrofluoric acid; the liquid anhydrous hydrofluoric acid is conveyed to a hydrofluoric acid buffer storage tank 40 for temporary storage, and impurities with low boiling points are discharged to a tail gas treatment system 60; thereafter, the oxidizing agent in the oxidizing agent storage tank 50 is injected into the oxidizing agent through the second end of the mixing line T1 to be mixed with the liquid anhydrous hydrofluoric acid in the mixing line T1, thereby oxidizing trivalent arsenic into pentavalent arsenic.
In one embodiment, the number of the first stage gasification, condensation and purification processes includes a plurality of times, which may include 1 to 5 times, depending on the user's quality and capacity requirements for the electronic grade hydrofluoric acid.
Then, a second stage gasification treatment is performed: the mixed liquid anhydrous hydrofluoric acid is gasified in a second reboiler 80 with hot water of 22 ℃ or higher, and high boiling point impurities are discharged to the holding tank 70, forming second gaseous hydrofluoric acid.
Then, a filtration step is performed: the second gaseous hydrofluoric acid is delivered to a filter 90 to remove particulates from the gas to form pure gaseous hydrofluoric acid. In one embodiment, the filter has a filter pore size of 3 nm.
Carrying out a mixed cooling step: the pure gaseous hydrofluoric acid is delivered to the mixing and cooling device B, and is mixed and cooled with ultrapure water to form electronic grade hydrofluoric acid.
Further illustratively, in one embodiment, the step of mixing cooling comprises absorption, mixing cooling. Wherein the absorption step is as follows: the pure gaseous hydrofluoric acid is delivered to the absorption device 100, absorbed by the hydrofluoric acid solution in the absorption device 100, and added with a proper amount of ultrapure water. Wherein the amount of the additive is set according to the actual requirement of a user to send a control signal to control the opening and closing of a control valve 111 at the connection between the ultrapure water tank 110 and the absorption device 100, so as to adjust the flow rate of the ultrapure water. Then, the mixed cooling step is as follows: the absorbed hydrofluoric acid solution is transferred to a mixing and cooling tank 120 to be mixed with the ultrapure water, and is cooled by a cooling water device 130 to form the electronic-grade hydrofluoric acid.
In one embodiment, the method of the present invention further comprises delivering the electronic-grade hydrofluoric acid from the mixed cooling tank 120 to the absorption apparatus 100 through a delivery line T2. As mentioned above, the electronic-grade hydrofluoric acid is the above-mentioned hydrofluoric acid solution, and the electronic-grade hydrofluoric acid is then transported back into the absorption apparatus 100, so that a larger flow rate can be used for returning, thereby generating a better mixing and cooling effect.
In summary, the present invention provides an electronic hydrofluoric acid manufacturing system and a method for manufacturing electronic hydrofluoric acid using the same, wherein the boiling point and the condensation temperature of anhydrous hydrofluoric acid are controlled, and impurities in the anhydrous hydrofluoric acid are removed through multi-stage gasification and condensation, and then the gaseous hydrofluoric acid is filtered, absorbed, and cooled to obtain the electronic hydrofluoric acid product.
In addition, in an embodiment of the present invention, the raw material storage tank, the first reboiler, the condenser, the hydrofluoric acid buffer storage tank, the oxidizer storage tank, the collecting tank and the second reboiler are made of carbon steel or stainless steel, so that there is an advantage in investment; because the device is made of metal materials, the cold water and hot water efficiency used in the purification can achieve the aim of energy saving, and the waste acid amount is reduced. And the final hydrofluoric acid product will achieve a level of less than 3ppb anions and less than 10ppt metal ions.
The present invention is not limited to the above embodiments, and any modifications, equivalent substitutions, improvements, etc. within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (6)

1. An electronic grade hydrofluoric acid manufacturing system comprising:
a raw material storage tank for storing anhydrous hydrofluoric acid;
at least one kit, the kit comprising:
a first reboiler, a first end of which is connected to the raw material storage tank to vaporize the anhydrous hydrofluoric acid to form a first gaseous hydrofluoric acid, and a second end of which is connected to a collecting tank to discharge a high boiling point impurity to the collecting tank;
one end of the condenser is connected with the third end of the first reboiler so as to condense the first gaseous hydrofluoric acid to form liquid anhydrous hydrofluoric acid;
a hydrofluoric acid buffer storage tank, wherein a first end of the hydrofluoric acid buffer storage tank is connected with the other end of the condenser to temporarily store the liquid anhydrous hydrofluoric acid, a second end of the hydrofluoric acid buffer storage tank is connected with a tail gas treatment system to discharge low-boiling-point impurities to the tail gas treatment system, and a third end of the hydrofluoric acid buffer storage tank is connected with a first end of a mixing pipeline; and
the oxidant storage tank is connected with the second end of the mixing pipeline so as to inject an oxidant to be mixed with the liquid anhydrous hydrofluoric acid;
a second reboiler, a first end of which is connected with a third end of the mixing pipeline to gasify the mixed liquid anhydrous hydrofluoric acid to form a second gaseous hydrofluoric acid, and a second end of which is connected with the collecting tank to discharge a high-boiling point impurity to the collecting tank;
one end of the filter is connected with the third end of the second reboiler so as to remove micro-particles in the second gaseous hydrofluoric acid and form pure gaseous hydrofluoric acid; and
one end of the mixed cooling equipment is connected with the other end of the filter so as to introduce the pure gaseous hydrofluoric acid, and the mixed cooling equipment is mixed and cooled with ultrapure water so as to form electronic-grade hydrofluoric acid;
wherein, this hybrid cooling device includes:
the first end of the absorption device is connected with the other end of the filter so as to lead the pure gaseous hydrofluoric acid into the absorption device to be absorbed by the hydrofluoric acid solution in the absorption device;
the ultra-pure water tank is connected with the second end of the absorption device, and the connection part comprises a control valve for adding a proper amount of ultra-pure water into the absorption device according to a regulation signal; and
a first end of the mixed cooling tank is connected with a third end of the absorption device so as to mix the absorbed hydrofluoric acid solution with the ultrapure water, and meanwhile, the mixed cooling tank is cooled by a cooling water device so as to form electronic grade hydrofluoric acid;
wherein, the third end of the mixed cooling tank is connected with the fourth end of the absorption device through a conveying pipeline so as to convey the electronic-grade hydrofluoric acid into the absorption device.
2. The electronic grade hydrofluoric acid manufacturing system of claim 1, wherein the material of the raw material storage tank, the first reboiler, the condenser, the hydrofluoric acid buffer storage tank, the oxidant storage tank, the holding tank, and the second reboiler is carbon steel or stainless steel.
3. The electronic grade hydrofluoric acid manufacturing system of claim 1, wherein the filter, the absorption device and the mixing and cooling tank are made of carbon steel lined with fluoroplastic or stainless steel lined with fluoroplastic.
4. An electronic grade hydrofluoric acid manufacturing system as claimed in claim 1, wherein the kit comprises a plurality of said kits, said plurality of said kits being connected to each other by a connection line connecting said mixing line and said first reboiler in said kit.
5. A method of using the electronic grade hydrofluoric acid manufacturing system of claim 1 to manufacture electronic grade hydrofluoric acid, the method comprising:
the first stage gasification, condensation and purification treatment:
conveying the anhydrous hydrofluoric acid to the first reboiler, gasifying the anhydrous hydrofluoric acid with hot water at 22 deg.c and discharging the high boiling point impurity to the collecting tank to form the first gaseous hydrofluoric acid;
conveying the first gaseous hydrofluoric acid to the condenser, and condensing the first gaseous hydrofluoric acid by using ice water with the temperature of below 17 ℃ to form the liquid anhydrous hydrofluoric acid;
conveying the liquid anhydrous hydrofluoric acid to the hydrofluoric acid buffer storage tank for temporary storage, and discharging the low-boiling point impurities to the tail gas treatment system; and
injecting the oxidant in the oxidant storage tank into the oxidant through the second end of the mixing pipeline so as to be mixed with the liquid anhydrous hydrofluoric acid in the mixing pipeline;
and (3) second-stage gasification treatment:
gasifying the mixed liquid anhydrous hydrofluoric acid in the second reboiler by using hot water with the temperature of more than 22 ℃, and discharging the high-boiling-point impurities to the collecting tank to form second gaseous hydrofluoric acid;
and (3) filtering:
delivering the second gaseous hydrofluoric acid to the filter to remove particulates to form the purified gaseous hydrofluoric acid;
absorption:
conveying the pure gaseous hydrofluoric acid to an absorption device, absorbing the pure gaseous hydrofluoric acid by a hydrofluoric acid solution in the absorption device, and adding a proper amount of ultrapure water; and
mixing and cooling:
conveying the absorbed hydrofluoric acid solution to a mixing and cooling tank to be mixed with the ultrapure water, and simultaneously cooling by a cooling water device to form the electronic grade hydrofluoric acid; and
and conveying the electronic-grade hydrofluoric acid in the mixed cooling tank into the absorption device through the conveying pipeline.
6. The method of claim 5, wherein the number of first stage gasification, condensation and purification processes comprises a plurality of times.
CN202010660885.3A 2020-07-10 2020-07-10 Electronic grade hydrofluoric acid manufacturing system and method for manufacturing electronic grade hydrofluoric acid Active CN113620252B (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5785820A (en) * 1994-01-07 1998-07-28 Startec Ventures, Inc. On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing
JP2006111487A (en) * 2004-10-14 2006-04-27 Mitsubishi Chemical Engineering Corp Method for recovering hydrofluoric acid
CN103864018A (en) * 2014-03-05 2014-06-18 福建省邵武市永飞化工有限公司 Method for removing arsenic from industrial hydrofluoric acid
CN103910334A (en) * 2014-04-21 2014-07-09 仲晓武 Preprocessing process and device of ultrahigh pure hydrofluoric acid in mass production
CN103991847A (en) * 2013-02-18 2014-08-20 福建省邵武市永晶化工有限公司 Preparation method for electron-grade hydrofluoric acid
CN108313983A (en) * 2018-05-03 2018-07-24 繁昌县凯艺电子商务有限公司 The hydrofluoric acid purifying prepared for high purity lithium fluoride and preparation method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109133007A (en) * 2018-07-25 2019-01-04 浙江森田新材料有限公司 A kind of rectification and purification method of anhydrous hydrofluoric acid

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5785820A (en) * 1994-01-07 1998-07-28 Startec Ventures, Inc. On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing
JP2006111487A (en) * 2004-10-14 2006-04-27 Mitsubishi Chemical Engineering Corp Method for recovering hydrofluoric acid
CN103991847A (en) * 2013-02-18 2014-08-20 福建省邵武市永晶化工有限公司 Preparation method for electron-grade hydrofluoric acid
CN103864018A (en) * 2014-03-05 2014-06-18 福建省邵武市永飞化工有限公司 Method for removing arsenic from industrial hydrofluoric acid
CN103910334A (en) * 2014-04-21 2014-07-09 仲晓武 Preprocessing process and device of ultrahigh pure hydrofluoric acid in mass production
CN108313983A (en) * 2018-05-03 2018-07-24 繁昌县凯艺电子商务有限公司 The hydrofluoric acid purifying prepared for high purity lithium fluoride and preparation method

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