CN100546903C - Purifying method of ultrahigh pure hydrofluoric acid - Google Patents
Purifying method of ultrahigh pure hydrofluoric acid Download PDFInfo
- Publication number
- CN100546903C CN100546903C CNB2007100257701A CN200710025770A CN100546903C CN 100546903 C CN100546903 C CN 100546903C CN B2007100257701 A CNB2007100257701 A CN B2007100257701A CN 200710025770 A CN200710025770 A CN 200710025770A CN 100546903 C CN100546903 C CN 100546903C
- Authority
- CN
- China
- Prior art keywords
- hydrogen fluoride
- hydrofluoric acid
- gas
- absorption tower
- minutes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Gas Separation By Absorption (AREA)
- Treating Waste Gases (AREA)
Abstract
The present invention relates to a kind of purifying method of ultrahigh pure hydrofluoric acid, comprise following processing step: anhydrous hydrogen fluoride for industrial use liquid is fed rectifying still, add 0.16-1 weight % potassium permanganate, stir, static; Add 0.16-1 weight % hydrogen peroxide then, stir, static; Be warming up to 60-80 ℃, the gasification of hydrogen fluoride liquid generates purified hydrogen fluoride gas; The purified hydrogen fluoride gas that will go out rectifying still feeds water cooler and cools off and filter; Inject deionized water in the absorption tower, the bottom, absorption tower is provided with the gas distribution coil pipe, and the hydrogen fluoride gas that will go out water cooler feeds the gas distribution coil pipe of bottom, absorption tower, makes the hydrofluoric acid work in-process by being absorbed by deionized water after the qi-emitting hole ejection on the air-spreading disk tube wall again; The hydrofluoric acid work in-process that go out the absorption tower obtain the ultra-pure hydrofluoric acid finished product after feeding the strainer of 0.05 μ m.The product purity height of the inventive method preparation, output height, compliance with environmental protection requirements.
Description
Technical field
The present invention relates to a kind of purifying method of ultrahigh pure hydrofluoric acid.Belong to the electronic chemical product technical field.
Background technology
Hydrofluoric acid (hydrofluoric, HF), relative molecular weight 20.1 is colourless transparent liquid, strongly-acid; It has intensive corrodibility to metal, glass, is severe toxicity.Hydrofluoric acid density (25 ℃) is 1.13g/ml (40 weight %).And ultra-pure hydrofluoric acid is that strongly-acid cleans, etching reagent, can be used with nitric acid, glacial acetic acid, hydrogen peroxide and ammonium hydroxide etc., is mainly used in the production of super large-scale integration Technology.
The method of purification of the hydrofluoric acid that generally adopts is at present: the rectifying purifying obtains the high-purity hydrogen fluoride of a kind of ultra-clean after adding potassium permanganate with anhydrous hydrogen fluoride for industrial use.The shortcoming of this method maximum is that the purity of hydrofluoric acid is not high, yields poorly, and the absorption tower absorptive character are poor, and the hydrofluoric acid gas that part is not fully absorbed is discharged in the air and pollutes to environment.
Summary of the invention
The objective of the invention is to overcome above-mentioned deficiency, a kind of product purity height is provided, output height, the purifying method of ultrahigh pure hydrofluoric acid of compliance with environmental protection requirements.
The object of the present invention is achieved like this: a kind of purifying method of ultrahigh pure hydrofluoric acid, and the main technique of this method is as follows:
Step 1, rectifying
Anhydrous hydrogen fluoride for industrial use liquid is fed rectifying still, with the air in the nitrogen replacement rectifying still, control rectifying still internal pressure≤0.1Mpa, add potassium permanganate, the dosage of potassium permanganate accounts for the 0.16-1 weight % of anhydrous hydrogen fluoride for industrial use dosage, stirred 10 minutes ± 5 minutes, and static 20 minutes ± 5 minutes, made a large amount of sulfurous gas and the arsenous fluoride generation that contain in the anhydrous hydrogen fluoride for industrial use be difficult to the evaporable compound; The hydrogen peroxide that adds 30 weight % then, the dosage of hydrogen peroxide account for the 0.5-5 weight % of anhydrous hydrogen fluoride for industrial use dosage, stir static 20 minutes ± 5 minutes 10 minutes ± 5 minutes; Be warming up to 60-80 ℃, the gasification of hydrogen fluoride liquid generates purified hydrogen fluoride gas;
Step 2, cold filtration
The purified hydrogen fluoride gas that will go out rectifying still feeds water cooler and cools off and filters, is covered with polytetrafluoroethylene packing bottom the water cooler, and hydrogen fluoride gas is filtered.By cooling the hydrogen fluoride gas behind the purifying is converted to gas-liquid phase criticality, the small amount of impurities that wherein also has is separated, impurity is partly refluxed to rectifying still, and getting once more through cold filtration, purified hydrogen fluoride gas enters the absorption tower.
Step 3, absorption
Inject deionized water in the absorption tower, the bottom, absorption tower is provided with the gas distribution coil pipe, hydrogen fluoride gas after secondarily purified is fed the gas distribution coil pipe of bottom, absorption tower, absorb by deionized water again after discharging by the qi-emitting hole on the air-spreading disk tube wall and make the hydrofluoric acid work in-process;
Step 4, filtration
After filtering, the strainer that the hydrofluoric acid work in-process that go out the absorption tower feed 0.05-0.2 μ m obtains the ultra-pure hydrofluoric acid finished product.
The inventive method makes full use of effective cooperation of oxidant potassium permanganate and hydrogen peroxide, with sulfurous gas in the anhydrous hydrogen fluoride for industrial use and arsenous fluoride impurity exhaustive oxidation, sulfurous gas and arsenous fluoride separate impurities have been strengthened, make and be difficult to evaporable impurity and in rectifying, do not taken out of and stockpile and at the bottom of still, get rid of in addition, like this, not only improve the purity of product but also realized environmental protection production.
The absorption tower that the present invention adopts can fully fully absorb hydrogen fluoride gas, its principle is: absorb gas by the original aperture that utilizes the absorption tube lower end, assimilation effect is poor, change the present gas distribution coil pipe that utilizes the bottom, absorption tower into and discharge gas, improve the uniform absorption degree on absorption tower and strengthened assimilated efficiency greatly, output increases 3 times, and absorbs fully near 100%.
In sum, the inventive method following advantage of having compared with present preparation technology:
1, by the effect of potassium permanganate and twice oxidation of hydrogen peroxide and the cooling and the filteration of water cooler, thoroughly solve impurity such as trivalent arsenic and be difficult for removing this difficult problem, thereby product purity is improved greatly, make the ultra-pure hydrofluoric acid of making reach semi-conductor SEMI-C12 standard, satisfy the manufacturing of super large-scale integration fully.Specific targets are as follows: granularity 0.3 μ m≤100, purity: negatively charged ion≤30ppb, positively charged ion≤0.05ppb.
2, the absorption tower can absorb the later ultra-pure hydrogen fluoride gas of the purifying that is distillated fully fully, when improving assimilated efficiency, also improved output greatly, the hydrogen fluoride gas of having avoided part fully not absorbed simultaneously is leaked in the air, pollutes to environment, meets the environmental protection and energy saving requirement.
Embodiment
Embodiment 1:
The 330kg anhydrous hydrogen fluoride for industrial use is fed rectifying still, with the air in the nitrogen replacement rectifying still, control rectifying still internal pressure≤0.1Mpa, add the 0.6kg potassium permanganate solution then, stirred 10 minutes, and static 20 minutes, added the superoxol of 4kg 30 weight % then, stirred static 20 minutes 10 minutes; Be warming up to 60 ℃ then, the gasification of hydrogen fluoride liquid generates purified hydrogen fluoride gas; The purified hydrogen fluoride gas that will go out rectifying still feeds water cooler and carries out cold filtration, by cooling the hydrogen fluoride gas behind the purifying is converted to gas-liquid phase criticality, the small amount of impurities that wherein also has is separated, impurity is partly refluxed to rectifying still, and getting once more through cold filtration, purified hydrogen fluoride gas enters the absorption tower.Inject deionized water in the absorption tower, the bottom, absorption tower is provided with the gas distribution coil pipe, and the hydrogen fluoride gas that will go out water cooler feeds the gas distribution coil pipe of bottom, absorption tower, makes the hydrofluoric acid work in-process by being absorbed by deionized water after the ejection on the air-spreading disk tube wall again; After filtering, the strainer that the hydrofluoric acid work in-process that go out the absorption tower feed 0.05 μ m obtains the ultra-pure hydrofluoric acid finished product of 570kg49% (wt) in hundred grades of environment purifications (granularity 0.5 μ m be controlled at≤100).Detected result: granularity 0.3 μ m≤100, purity: negatively charged ion≤30ppb, positively charged ion≤0.05ppb.
Embodiment 2:
220kg anhydrous hydrogen fluoride for industrial use liquid is fed rectifying still, with the air in the nitrogen replacement rectifying still, control rectifying still internal pressure≤0.1Mpa, add the 0.5kg potassium permanganate solution then, stirred 10 minutes, and static 20 minutes, added the superoxol of 2.7kg 30 weight % then, stirred static 20 minutes 10 minutes; Be warming up to 80 ℃ then, the gasification of hydrogen fluoride liquid generates purified hydrogen fluoride gas; The purified hydrogen fluoride gas that will go out rectifying still feeds water cooler and cools off and filter, by cooling the hydrogen fluoride gas behind the purifying is converted to gas-liquid phase criticality, the small amount of impurities that wherein also has is separated, impurity is partly refluxed to rectifying still, and getting once more through cold filtration, purified hydrogen fluoride gas enters the absorption tower; Inject deionized water in the absorption tower, the bottom, absorption tower is provided with the gas distribution coil pipe, and the hydrogen fluoride gas that will go out water cooler feeds the gas distribution coil pipe of bottom, absorption tower, makes the hydrofluoric acid work in-process by being absorbed by deionized water after the ejection on the air-spreading disk tube wall again; After filtering, the strainer that the hydrofluoric acid work in-process that go out the absorption tower feed 0.05 μ m obtains the ultra-pure hydrofluoric acid finished product of 415kg40% (wt) in hundred grades of environment purifications (granularity 0.5 μ m be controlled at≤100).Detected result: granularity 0.3 μ m≤100, purity: negatively charged ion≤30ppb, positively charged ion≤0.05ppb.
Claims (1)
1, a kind of purifying method of ultrahigh pure hydrofluoric acid is characterized in that the main technique of this method is as follows:
Step 1, rectifying
Anhydrous hydrogen fluoride for industrial use liquid is fed rectifying still, with the air in the nitrogen replacement rectifying still, control rectifying still internal pressure≤0.1Mpa, add potassium permanganate, the dosage of potassium permanganate accounts for the 0.16-1 weight % of anhydrous hydrogen fluoride for industrial use dosage, stirred 10 minutes ± 5 minutes, and static 20 minutes ± 5 minutes, made a large amount of sulfurous gas and the arsenous fluoride generation that contain in the anhydrous hydrogen fluoride for industrial use be difficult to the evaporable compound; The hydrogen peroxide that adds 30 weight % then, hydrogen peroxide account for the 0.5-5 weight % of anhydrous hydrogen fluoride for industrial use dosage, stir static 20 minutes ± 5 minutes 10 minutes ± 5 minutes; Be warming up to 60-80 ℃, the gasification of hydrogen fluoride liquid generates purified hydrogen fluoride gas;
Step 2, cold filtration
The purified hydrogen fluoride gas that will go out rectifying still feeds water cooler and cools off and filter, the water cooler bottom is covered with polytetrafluoroethylene packing, hydrogen fluoride gas is filtered, by cooling the hydrogen fluoride gas behind the purifying is converted to gas-liquid phase criticality, the small amount of impurities that wherein also has is separated, impurity is partly refluxed to rectifying still, and getting once more through cold filtration, purified hydrogen fluoride gas enters the absorption tower;
Step 3, absorption
Inject deionized water in the absorption tower, the bottom, absorption tower is provided with the gas distribution coil pipe, and the hydrogen fluoride gas that will go out water cooler feeds the gas distribution coil pipe of bottom, absorption tower, is absorbed by deionized water after being discharged by the qi-emitting hole on the air-spreading disk tube wall again and makes the hydrofluoric acid work in-process;
Step 4, filtration
After filtering, the strainer that the hydrofluoric acid work in-process that go out the absorption tower feed 0.05-0.2 μ m obtains the ultra-pure hydrofluoric acid finished product.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2007100257701A CN100546903C (en) | 2007-08-06 | 2007-08-06 | Purifying method of ultrahigh pure hydrofluoric acid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2007100257701A CN100546903C (en) | 2007-08-06 | 2007-08-06 | Purifying method of ultrahigh pure hydrofluoric acid |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101125639A CN101125639A (en) | 2008-02-20 |
CN100546903C true CN100546903C (en) | 2009-10-07 |
Family
ID=39093794
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2007100257701A Active CN100546903C (en) | 2007-08-06 | 2007-08-06 | Purifying method of ultrahigh pure hydrofluoric acid |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN100546903C (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102774813A (en) * | 2011-05-12 | 2012-11-14 | 特力生有限公司 | Method for preparing hydrofluoric acid |
CN102923662A (en) * | 2012-11-30 | 2013-02-13 | 江苏扬农化工股份有限公司 | Method for separating hydrogen fluoride and hydrogen chloride in chloropyridine derivative fluorination process |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101264869B (en) * | 2008-04-03 | 2010-04-14 | 江阴市润玛电子材料有限公司 | Continuous producing technique for ultra-high pure nitric acid |
CN101570318B (en) * | 2008-04-28 | 2011-12-14 | 多氟多化工股份有限公司 | Method for producing electronic-stage hydrofluoric acid |
CN101570319B (en) * | 2008-04-28 | 2011-04-06 | 多氟多化工股份有限公司 | Method for producing ultra-clean high-pure hydrofluoric acid |
JP5179339B2 (en) | 2008-12-22 | 2013-04-10 | 東京エレクトロン株式会社 | Mixed gas supply method and mixed gas supply device |
CN102009957A (en) * | 2010-11-20 | 2011-04-13 | 江阴市润玛电子材料有限公司 | Method for purifying high-yield superclean high-purity hydrofluoric acid |
CN102320573B (en) * | 2011-09-19 | 2013-04-03 | 瓮福(集团)有限责任公司 | Method for preparing electronic grade hydrofluoric acid |
CN102774858A (en) * | 2012-08-21 | 2012-11-14 | 天津市风船化学试剂科技有限公司 | Method for preparing ultra-purity ammonium-fluoride aggressive agents |
CN103086327B (en) * | 2013-02-18 | 2013-11-13 | 苏州晶瑞化学有限公司 | Preparation method of ultra-clean high-purity hydrofluoric acid |
CN103613075A (en) * | 2013-12-02 | 2014-03-05 | 浙江凯圣氟化学有限公司 | Preparation method of ultrapure electronic-grade hydrofluoric acid |
CN103864018B (en) * | 2014-03-05 | 2016-02-10 | 福建省邵武市永飞化工有限公司 | The method of industrial hydrofluoric acid arsenic removal |
CN103910334B (en) * | 2014-04-21 | 2016-06-22 | 仲晓武 | The pretreating process of a kind of volume production ultra-pure hydrofluoric acid and device thereof |
CN107934915B (en) * | 2017-12-29 | 2020-12-29 | 云南瓮福云天化氟化工科技有限公司 | Method for purifying impurities in anhydrous hydrogen fluoride production process |
CN111661860A (en) * | 2020-06-19 | 2020-09-15 | 锦洋高新材料股份有限公司 | Production method of anhydrous aluminum fluoride |
CN112978680B (en) * | 2021-04-28 | 2021-07-20 | 联仕(昆山)化学材料有限公司 | Production process and production device of electronic-grade hydrofluoric acid |
CN113896172A (en) * | 2021-10-27 | 2022-01-07 | 池州天赐高新材料有限公司 | Production process of electronic grade hydrogen fluoride |
CN114146586B (en) * | 2021-12-30 | 2023-11-21 | 金宏气体股份有限公司 | Device and method for preparing hydrofluoric acid solution |
CN115872678A (en) * | 2022-12-01 | 2023-03-31 | 桂林理工大学 | Method for preparing heat-preservation and heat-insulation board by mixing vitrified micro bubbles and cement |
CN117699742B (en) * | 2024-02-05 | 2024-07-12 | 上海联风气体有限公司 | Hydrofluoric acid regeneration method for photovoltaic waste acid |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3166379A (en) * | 1962-06-04 | 1965-01-19 | Union Carbide Corp | Purification of hydrofluoric acid |
US4032621A (en) * | 1975-11-24 | 1977-06-28 | E. I. Du Pont De Nemours And Company | Preparation of hydrogen fluoride with low levels of arsenic, iron and sulfite |
CN1051333A (en) * | 1989-10-31 | 1991-05-15 | 纳幕尔杜邦公司 | The method of purifying hydrogen fluoride |
CN1054574A (en) * | 1990-03-02 | 1991-09-18 | 纳幕尔杜邦公司 | Hydrofluoric method of purification |
CN1931709A (en) * | 2006-10-09 | 2007-03-21 | 殷福华 | Prepn process of high purity hydrofluoric acid |
-
2007
- 2007-08-06 CN CNB2007100257701A patent/CN100546903C/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3166379A (en) * | 1962-06-04 | 1965-01-19 | Union Carbide Corp | Purification of hydrofluoric acid |
US4032621A (en) * | 1975-11-24 | 1977-06-28 | E. I. Du Pont De Nemours And Company | Preparation of hydrogen fluoride with low levels of arsenic, iron and sulfite |
CN1051333A (en) * | 1989-10-31 | 1991-05-15 | 纳幕尔杜邦公司 | The method of purifying hydrogen fluoride |
CN1054574A (en) * | 1990-03-02 | 1991-09-18 | 纳幕尔杜邦公司 | Hydrofluoric method of purification |
CN1931709A (en) * | 2006-10-09 | 2007-03-21 | 殷福华 | Prepn process of high purity hydrofluoric acid |
Non-Patent Citations (2)
Title |
---|
高纯氢氟酸制备的概况. 陈鸿昌.有机氟工业,第3期. 2000 |
高纯氢氟酸制备的概况. 陈鸿昌.有机氟工业,第3期. 2000 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102774813A (en) * | 2011-05-12 | 2012-11-14 | 特力生有限公司 | Method for preparing hydrofluoric acid |
CN102923662A (en) * | 2012-11-30 | 2013-02-13 | 江苏扬农化工股份有限公司 | Method for separating hydrogen fluoride and hydrogen chloride in chloropyridine derivative fluorination process |
CN102923662B (en) * | 2012-11-30 | 2015-04-08 | 江苏优嘉化学有限公司 | Method for separating hydrogen fluoride and hydrogen chloride in chloropyridine derivative fluorination process |
Also Published As
Publication number | Publication date |
---|---|
CN101125639A (en) | 2008-02-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN100546903C (en) | Purifying method of ultrahigh pure hydrofluoric acid | |
CN102009957A (en) | Method for purifying high-yield superclean high-purity hydrofluoric acid | |
CN106011503A (en) | Method for recycling tungsten, vanadium and titanium from SCR waste catalysts | |
CN103991847A (en) | Preparation method for electron-grade hydrofluoric acid | |
CN102744238B (en) | Method for comprehensively utilizing plant ash in biomass power plant | |
CN103613075A (en) | Preparation method of ultrapure electronic-grade hydrofluoric acid | |
CN100443398C (en) | Prepn process of high purity hydrofluoric acid | |
CN102874756A (en) | Method for removing hydrogen fluoride from hydrogen chloride gas | |
CN101696036B (en) | Preparation process of ammonium paratungstate | |
CN111732120A (en) | Environment-friendly efficient production method of high-purity silver nitrate | |
CN101597032A (en) | The preparation method of electron-grade high purity hydrofluoric acid | |
CN201485354U (en) | Novel device for processing ammonia nitrogen waste water | |
CN106947864A (en) | A kind of system and its processing method that heavy metal is reclaimed from discarded SCR catalyst | |
CN103818969A (en) | Iron oxide red and preparation method thereof | |
CN206179892U (en) | Solar cell processing procedure chemical liquid recycling apparatus | |
CN112591722B (en) | Method for co-producing industrial-grade nitric acid and electronic-grade nitric acid | |
CN103950950A (en) | Preparation method of boron-11 acid with high abundance | |
CN201280430Y (en) | Purification apparatus for ultra-pure hydrofluoric acid | |
CN212188425U (en) | Gaseous phase white carbon black tail gas processing system | |
CN102863023B (en) | Synthesis and purification method of electronic grade arsines | |
CN208166579U (en) | Wet phosphoric acid purifying process for producing system | |
CN102275951A (en) | Method for producing super-pure ammonia water | |
CN207943871U (en) | A kind of fluosilicic acid produces the production system of anhydrous hydrogen chloride | |
CN106964245B (en) | High-efficient processing apparatus of nitrogen oxide waste gas during iron oxide pigment production | |
CN104803416A (en) | Arsenic collecting method for arsenic-containing flue gas |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: 214423, No. 1, Changqing North Road, Jiangyin Industrial Park, Zhouzhuang Town, Jiangsu, China Patentee after: Jiangyin Runma Electronic Material Co., Ltd. Address before: 214423, No. 1, Changqing North Road, Jiangyin Industrial Park, Zhouzhuang Town, Jiangsu, China Patentee before: Jiangyin Runma Electronic Material Co., Ltd. |