CN113594214A - Film layer structure, touch panel and film layer structure preparation method - Google Patents
Film layer structure, touch panel and film layer structure preparation method Download PDFInfo
- Publication number
- CN113594214A CN113594214A CN202110859936.XA CN202110859936A CN113594214A CN 113594214 A CN113594214 A CN 113594214A CN 202110859936 A CN202110859936 A CN 202110859936A CN 113594214 A CN113594214 A CN 113594214A
- Authority
- CN
- China
- Prior art keywords
- protective layer
- polarizer
- layer
- patterned structure
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000002360 preparation method Methods 0.000 title abstract description 16
- 239000010410 layer Substances 0.000 claims abstract description 105
- 239000011241 protective layer Substances 0.000 claims abstract description 86
- 229910052751 metal Inorganic materials 0.000 claims abstract description 59
- 239000002184 metal Substances 0.000 claims abstract description 59
- 238000000034 method Methods 0.000 claims description 14
- 238000003475 lamination Methods 0.000 claims description 4
- 230000002829 reductive effect Effects 0.000 abstract description 22
- 238000005260 corrosion Methods 0.000 abstract description 12
- 230000007797 corrosion Effects 0.000 abstract description 12
- 239000010408 film Substances 0.000 description 49
- 229910052740 iodine Inorganic materials 0.000 description 28
- 239000011630 iodine Substances 0.000 description 28
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 24
- 238000010586 diagram Methods 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000000126 substance Substances 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000012044 organic layer Substances 0.000 description 5
- -1 iodine ions Chemical class 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 3
- 239000012466 permeate Substances 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- CECABOMBVQNBEC-UHFFFAOYSA-K aluminium iodide Chemical compound I[Al](I)I CECABOMBVQNBEC-UHFFFAOYSA-K 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- 229940006461 iodide ion Drugs 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/40—OLEDs integrated with touch screens
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The application relates to the technical field of display, in particular to a film layer structure, a touch panel and a film layer structure preparation method, and solves the problem that the reliability of the film layer structure is unqualified due to the shrinkage of a polaroid in a high-temperature and high-humidity environment. The application provides a film layer structure includes: a metal layer; the protective layer is arranged on one side surface of the metal layer; the polaroid is arranged on the surface of one side, far away from the metal layer, of the protective layer; wherein, one side that the protective layer is close to the polaroid includes first graphical structure, and one side that the polaroid is close to the protective layer includes the second graphical structure with first graphical structure nested cooperation to form nested cooperation between messenger's polaroid and the protective layer, increased the cohesion between polaroid and the protective layer, reduced the shrinkage of polaroid, thereby reduced the degree of corrosion of the metal level of polaroid below, improved membranous layer structure's reliability.
Description
Technical Field
The application relates to the technical field of display, in particular to a film layer structure, a touch panel and a film layer structure preparation method.
Background
Current touch panels include a plurality of films, such as a polarizer, a touch film, a light emitting display film, and the like. The polarizer shrinks in a high-temperature and high-humidity environment, and iodine in the polarizer permeates into a metal layer below the polarizer, so that the metal layer below the polarizer is corroded, and the reliability of the film structure is unqualified.
Disclosure of Invention
In view of this, embodiments of the present application provide a film structure, a touch panel, and a method for manufacturing the film structure, so as to solve the problem that the reliability of the film structure is not qualified due to shrinkage of a polarizer in a high-temperature and high-humidity environment.
In a first aspect, an embodiment of the present application provides a film layer structure, including: a metal layer; the protective layer is arranged on one side surface of the metal layer; the polaroid is arranged on the surface of one side of the protective layer, which is far away from the metal layer; wherein, one side that the protective layer is close to the polaroid includes first graphical structure, and one side that the polaroid is close to the protective layer includes the second graphical structure with first graphical structure nested coordination to form nested coordination between messenger's polaroid and the protective layer, increased the cohesion between polaroid and the protective layer, reduced the shrinkage of polaroid, thereby reduced the degree of corrosion of the metal level of polaroid below, improved membranous layer structure's reliability.
In an embodiment of the application, the protective layer has a first central region and a first edge region surrounding the first central region, and the first patterned structure is located in the first edge region, so that the first patterned structure does not need to be formed in the first central region of the protective layer, the film structure is simplified, and the process difficulty is reduced.
In an embodiment of the present application, the metal layer has a second central region and a second edge region surrounding the second central region; in the first direction, the width of the first graphical structure is greater than or equal to the width of the second edge region, wherein the first direction is a direction from the second central region to the second edge region, so that the shrinkage of the polarizer corresponding to the position right above the corrosion-prone region of the metal layer is reduced, the corrosion degree of the corrosion-prone region of the metal layer is further reduced, and the reliability of the film layer structure is improved.
In an embodiment of the application, the orthographic projection of the second patterned structure on the protective layer is overlapped with the first patterned structure, so that the second patterned structure and the first patterned structure are completely corresponding to each other to realize nesting, no gap is reserved between the protective layer and the polarizer, the nested patterned structure cannot be formed without preparation, and the cost is saved.
In one embodiment of the present application, the first patterned structure includes a first protrusion, and the second patterned structure includes a first groove nested and matched with the first protrusion; or the first patterned structure comprises a second groove and the second patterned structure comprises a second protrusion which is matched with the second groove in a nesting mode. The first graphical structure and the second graphical structure are nested and matched in a mode of arranging the protrusions and the grooves, and the method is simple, reliable and easy to achieve.
In an embodiment of the application, in the second direction, the cross section of the first protrusion includes a first trapezoidal cross section, and the cross section of the first groove includes a second trapezoidal cross section, so that the preparation of the first protrusion and the first groove is facilitated, the preparation process is simplified, and the production cost is reduced, wherein the second direction includes the stacking direction of the protective layer and the polarizer; or in the second direction, the section of the second groove comprises a third trapezoidal section, and the section of the second protrusion comprises a fourth trapezoidal section, so that the preparation of the second groove and the second protrusion is facilitated, the preparation process is simplified, and the production cost is reduced.
In an embodiment of the application, the slope of the first trapezoidal section faces the polarizer, and the slope of the fourth trapezoidal section faces the protective layer, so that the preparation of the first graphical structure and the second graphical structure is further facilitated, the preparation process is simplified, and the production cost is reduced.
In an embodiment of the present application, in the second direction, the height of the first patterned structure is smaller than the thickness of the protection layer, so that the protection layer is prevented from generating a hollow structure in the region with the first patterned structure, and the metal layer below the protection layer is prevented from directly contacting with the polarizer, thereby reducing the probability that the metal layer is corroded, the height of the second patterned structure is smaller than the thickness of the polarizer, so that the polarizer is prevented from generating a hollow structure in the region with the second patterned structure, and the protection layer below the polarizer is prevented from losing the protection of the polarizer, thereby further reducing the probability that the metal layer is corroded, wherein the second direction includes the stacking direction of the protection layer and the polarizer.
In a second aspect, an embodiment of the present application provides a touch panel, including the film structure of any of the embodiments.
In a third aspect, a film layer structure manufacturing method provided in an embodiment of the present application includes: preparing or providing a metal layer; the protective layer with a first graphical structure is arranged on the surface of the metal layer; preparing or providing a polarizer comprising a second patterned structure corresponding to the first patterned structure; and fitting the polarizer and the protective layer, and nesting and matching the first graphical structure and the second graphical structure.
According to the film structure, the touch panel and the preparation method of the film structure, one side, close to the polaroid, of the protective layer comprises the first graphical structure, and one side, close to the protective layer, of the polaroid comprises the second graphical structure in nested fit with the first graphical structure, so that nested fit is formed between the polaroid and the protective layer, the binding force between the polaroid and the protective layer is increased, the shrinkage of the polaroid is reduced, the corrosion degree of a metal layer below the polaroid is reduced, and the reliability of the film structure is improved.
Drawings
Fig. 1 is a schematic structural diagram of a film layer structure according to an embodiment of the present disclosure.
Fig. 2 is a schematic structural diagram of a film layer structure according to another embodiment of the present disclosure.
Fig. 3 is a schematic structural diagram of a film layer structure according to another embodiment of the present disclosure.
Fig. 4 is a schematic structural diagram illustrating a film structure when a polarizer is not attached to a protective layer according to an embodiment of the present disclosure.
Fig. 5 is a schematic structural diagram of a film structure when a polarizer is not attached to a protective layer according to another embodiment of the present disclosure.
Fig. 6 is a schematic structural diagram of a touch panel according to an embodiment of the present disclosure.
Fig. 7 is a schematic flow chart illustrating a method for manufacturing a film layer structure according to an embodiment of the present disclosure.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
The polarizer shrinks in a high-temperature and high-humidity environment, and iodine in the polarizer permeates into a metal layer below the polarizer, so that the metal layer below the polarizer is corroded, and the reliability of the film structure is unqualified. Specifically, the polarizer itself contains iodine, and in a high-temperature and high-humidity environment, iodine in the polarizer undergoes a chemical reaction represented by the following formula, thereby chemically reacting with a metal material of the metal layer, resulting in corrosion of the metal layer. The following three equations take the example where the material of the metal layer is aluminum.
Equation 1:
equation 2:
equation 3: 2Al +3I2＝2AlI3
Wherein the content of the first and second substances,
represents the five ions of iodine, and represents the five ions of iodine,
represents iodonium triion, I-Represents an iodide ion, I2Denotes iodine simple substance, Al denotes aluminum, AlI3Denotes aluminum iodide, symbol
Indicating that the reaction is reversible. Iodine in the polaroid is used for separating out iodine pentaions in a high-temperature and high-humidity environment. Because the iodine pentaion is unstable, the iodine pentaion is decomposed into iodine triion and iodine simple substance. Due to iodine dissociationThe iodine ions are unstable, so the iodine ions and the iodine simple substance are decomposed by the iodine triions, meanwhile, the iodine triions can also react with the iodine simple substance to generate iodine pentaions, and the iodine ions can also react with the iodine simple substance to generate iodine triions, namely, the iodine pentaions, the iodine triions and the iodine ions can be mutually converted. The iodine simple substance and the aluminum are chemically reacted to generate aluminum iodide, so that the property of the metal layer is changed, namely the metal layer is corroded.
Fig. 1 is a schematic structural diagram of a film layer structure according to an embodiment of the present disclosure. As shown in fig. 1, a film structure provided in an embodiment of the present application includes: metal layer 1, protective layer 2 and polarizer 2.
Specifically, the protective layer 2 is disposed on one side surface of the metal layer 1. And the polarizer 3 is arranged on the surface of one side of the protective layer 2, which is far away from the metal layer 1. The side of the protective layer 2 close to the polarizer 3 comprises a first patterned structure 21, and the side of the polarizer 3 close to the protective layer 2 comprises a second patterned structure 31 which is in nested fit with the first patterned structure 21.
The film structure may be a partial film structure of a touch panel of an On-Cell (overlay surface) structure, or a partial film structure of an external touch panel. The metal layer 1 may be a metal touch electrode layer for receiving a touch signal, thereby providing data support for determining a touch position. The protective layer 2 may be an organic layer, such as polyimide, for blocking water and oxygen. The polaroid 3 not only can filter stray light and convert natural light into linearly polarized light, but also can protect a lower film layer and prevent the lower metal layer 1 from being corroded. The protective layer 2 may be coated on the metal layer 1. The polarizer 3 may be attached to the protective layer 2 by a pressure sensitive adhesive. The first patterned structure 21 and the second patterned structure 31 may be patterned structures capable of forming a nested fit, for example, if the first patterned structure 21 may be a groove, the second patterned structure 31 may be a protrusion capable of being embedded in the groove. The structure of the first patterned structure 21 and the second patterned structure 31 is not particularly limited as long as the first patterned structure 21 and the second patterned structure 31 can be nested and matched.
Since the polarizer 3 may shrink in a high temperature and high humidity environment, and iodine in the polarizer 3 may penetrate the protective layer 2, thereby corroding the metal layer 1, resulting in unqualified reliability of the film structure. Therefore, in the embodiment of the application, one side of the protection layer 2 close to the polarizer 3 includes the first patterned structure 21, and one side of the polarizer 3 close to the protection layer 2 includes the second patterned structure 31 in nested fit with the first patterned structure 21, so that the polarizer 3 and the protection layer 2 form nested fit, the bonding force between the polarizer 3 and the protection layer 2 is increased, the shrinkage of the polarizer 3 is reduced, the iodine permeation is reduced, the corrosion degree of the metal layer 1 below the polarizer 3 is reduced, and the reliability of the film structure is improved.
Fig. 2 is a schematic structural diagram of a film layer structure according to another embodiment of the present disclosure. As shown in fig. 2, the protective layer 2 has a first central area a and a first edge area B surrounding the first central area a. The dashed line in fig. 2 is the boundary between the first central area a and the first edge area B. The first patterned structure 21 is located at the first edge region B. In practical applications, there is no physical boundary between the first central region a and the first edge region B, and the protective layer 2 is artificially divided into regions to illustrate the position of the first patterned structure 21.
Specifically, the shrinkage rate of the polarizer 3 in the high temperature and high humidity environment is about 3%, but the shrinkage rates of different polarizers 3 in different temperature and humidity environments may have a certain difference, for example, the shrinkage rate of the polarizer 3 in the high temperature and high humidity environment may also be 2%, 1%, and the like, and the application is not limited specifically. For example, if the length of the polarizer 3 is 100 mm, the width thereof is 50 mm, the length of the polarizer 3 after shrinking in a high temperature and high humidity environment is 97 mm, and the width thereof is 48.5 mm, the width of the first edge region B of the protective layer 2 corresponding to the polarizer 3 may be 1.5 mm, and the width of the first patterned structure 21 may be 1.5 mm in a direction in which the first central region a points to the first edge region B. The first central area a points to the first edge area B, and the width of the first edge area B and the width of the first patterned structure 21 may be set according to actual requirements, which is not specifically limited in the present application.
After the polarizer 3 shrinks in a high-temperature and high-humidity environment, the polarizer 3 is not covered above the first edge area B of the protective layer 2, and the polarizer 3 is still covered above the first central area A of the protective layer 2, therefore, only the first graphical structure 21 is arranged on the first edge area B, the shrinkage of the polarizer 3 in the high-temperature and high-humidity environment can be reduced, the coverage area of the polarizer 3 above the first edge area B of the protective layer 2 is increased, meanwhile, the first graphical structure 21 is not required to be formed in the first central area A of the protective layer 2, the film structure is simplified, and the process difficulty is reduced.
Fig. 3 is a schematic structural diagram of a film layer structure according to another embodiment of the present disclosure. As shown in fig. 3, the metal layer 1 has a second central region C and a second edge region D surrounding the second central region C. In the first direction (the direction indicated by the arrow in fig. 3), the width of the first patterned structure 21 is greater than or equal to the width of the second edge region D. The first direction is a direction pointing from the second center region C to the second edge region D. The dotted lines in fig. 3 are the boundary between the first center area a and the first edge area B, and the boundary between the second center area C and the second edge area D. In practical applications, there is no physical boundary between the first central region a and the first edge region B and no physical boundary between the second central region C and the second edge region D, and here, the protective layer 2 and the metal layer 1 are artificially divided into regions in order to explain the positional and dimensional relationship of the first patterned structure 21.
In particular, the second edge region D of the metal layer 1 may be a region susceptible to corrosion. After the polarizer 3 shrinks in a high-temperature and high-humidity environment, iodine in the polarizer 3 permeates the protective layer 2 to corrode the metal layer 1 right below, and the position where the metal layer 1 is easy to corrode is divided into a second edge area D of the metal layer 1.
By making the width of the first patterned structure 21 in the first direction greater than or equal to the width of the second edge region D in the first direction, the width of the nested fit of the first patterned structure 21 and the second patterned structure 31 in the first direction may be greater than or equal to the width of the second edge region D in the first direction. Since the nesting and matching of the first patterned structure 21 and the second patterned structure 31 increases the bonding force between the protective layer 2 and the polarizer 3, the bonding force between the protective layer 2 and the polarizer 3 is increased at the nesting and matching position of the first patterned structure 21 and the second patterned structure 31, and the shrinkage of the polarizer 3 is reduced. Therefore, the width of the first patterned structure 21 in the first direction is greater than or equal to the width of the second edge region D in the first direction, so that the shrinkage of the polarizer 3 corresponding to the region of the metal layer 1, which is susceptible to corrosion, is reduced, the corrosion degree of the region of the metal layer 1, which is susceptible to corrosion, is further reduced, and the reliability of the film structure is improved.
In an embodiment of the present application, an orthographic projection of the second patterned structure 31 on the protective layer 2 coincides with the first patterned structure 21, so that the second patterned structure 31 and the first patterned structure 21 are completely embedded, a gap is not left between the protective layer 2 and the polarizer 3, and a nested patterned structure which cannot be formed is not required to be manufactured, thereby saving cost.
Fig. 4 is a schematic structural diagram illustrating a film structure when a polarizer is not attached to a protective layer according to an embodiment of the present disclosure. For clearly showing the structures of the protective layer 2 and the polarizer 3, fig. 4 illustrates the film structure when the polarizer 3 is not attached to the protective layer 2, and in practical applications, the polarizer 3 and the protective layer 2 in the film structure of the present application are attached together. As shown in fig. 4, the first patterned structure 21 includes a first protrusion 211, and the second patterned structure 31 includes a first groove 311 nested with the first protrusion 211.
Fig. 5 is a schematic structural diagram of a film structure when a polarizer is not attached to a protective layer according to another embodiment of the present disclosure. For clearly showing the structures of the protective layer 2 and the polarizer 3, fig. 5 illustrates the film structure when the polarizer 3 is not attached to the protective layer 2, and in practical applications, the polarizer 3 and the protective layer 2 in the film structure of the present application are attached together. As shown in fig. 5, the first patterned structure 21 includes a second groove 212, and the second patterned structure 31 includes a second protrusion 312 nested in the second groove 212.
As shown in fig. 4 and 5, the structures of the first patterned structure 21 and the second patterned structure 31 are not particularly limited as long as the first patterned structure 21 and the second patterned structure 31 can form a nested fit. The first patterned structure 21 and the second patterned structure 31 are nested and matched in a mode of arranging the protrusions and the grooves, and the method is simple, reliable and easy to implement.
In an embodiment of the present application, in the second direction, a cross section of the first protrusion 211 includes a first trapezoidal cross section, and a cross section of the first groove 311 includes a second trapezoidal cross section. The second direction is a lamination direction of the protective layer 2 and the polarizer 3.
The protective layer 2 is an organic layer and is a patterned structure formed by an exposure process that most easily forms a protrusion or a groove having a trapezoidal section. The polarizer 3 may be a patterned structure formed by exposure and etching processes, which are also easy to form a protrusion or a groove having a trapezoidal cross section. Therefore, the cross section of the first protrusion 211 comprises a first trapezoid cross section, and the cross section of the first groove 311 comprises a second trapezoid cross section, so that the preparation of the first protrusion 211 and the first groove 311 is facilitated, the preparation process is simplified, and the production cost is reduced.
In an embodiment of the present application, in the second direction, the cross section of the second groove 212 includes a third trapezoidal cross section, and the cross section of the second protrusion 312 includes a fourth trapezoidal cross section, which facilitates the preparation of the second groove 212 and the second protrusion 312, simplifies the preparation process, and reduces the production cost.
As shown in fig. 4 and 5, in an embodiment of the present application, the slope of the first trapezoid cross section faces the polarizer 3, and the slope of the fourth trapezoid cross section faces the protection layer 2.
Specifically, as shown in fig. 4, the slope of the first trapezoidal cross section faces the polarizer 3, i.e., the angle α is greater than 90 degrees and less than 180 degrees. As shown in fig. 5, the slope of the fourth trapezoidal cross section faces the protective layer 2. I.e. the angle beta is greater than 90 degrees and less than 180 degrees.
Due to the manufacturing process of the first patterned structure 21 and the second patterned structure 31, the protrusion or the groove with the trapezoidal section is easily formed, the first patterned structure 21 and the second patterned structure 31 are further conveniently manufactured, the manufacturing process is simplified, and the production cost is reduced. The domatic polaroid 3 of orientation of first trapezoidal cross-section, and the domatic protective layer 2 of orientation of fourth trapezoidal cross-section have made things convenient for polaroid 3 and protective layer 2's laminating.
As shown in fig. 1 to 5, in an embodiment of the present application, in the second direction, the height of the first patterned structure 21 is smaller than the thickness of the protection layer 2, and the height of the second patterned structure 31 is smaller than the thickness of the polarizer 3. The second direction includes the lamination direction of the protective layer 2 and the polarizer 3. For example, if the thickness of the protective layer in the second direction is 5 micrometers, the height of the first patterned structure 21 is less than 5 micrometers, for example, may be 3 micrometers.
By making the height of the first patterned structure 21 smaller than the thickness of the protective layer 2, the protective layer 2 is prevented from generating a hollow structure in the region with the first patterned structure 21, so as to prevent the metal layer 1 below the protective layer 2 from directly contacting the polarizer 3, thereby reducing the probability of corrosion of the metal layer 1.
By making the height of the second patterned structure 31 smaller than the thickness of the polarizer 3, the polarizer 3 is prevented from generating a hollow structure in the area having the second patterned structure 31, so as to prevent the protective layer 2 below the polarizer 3 from losing the protection of the polarizer 3, thereby further reducing the probability of corrosion of the metal layer 1.
An embodiment of the present application further provides a touch panel, including the film structure in the above embodiments.
Fig. 6 is a schematic structural diagram of a touch panel according to an embodiment of the present disclosure. As shown in fig. 6, the touch panel provided in the embodiment of the present application may include the following film layers: polarizer 3, protective layer 2, metal layer 1, organic layer 4, packaging layer 5, display layer 6.
Specifically, the touch panel may be an On-Cell structure touch panel, an external-hanging touch panel, or other types of touch panels having the above film structure, which is not limited in this application. The protective layer 2 may be an organic layer, such as polyimide. The metal layer 1 may be a touch electrode layer. The encapsulation layer 5 may be a thin film encapsulation layer. The display layer 6 may be an OLED layer plus an array layer.
Fig. 7 is a schematic flow chart illustrating a method for manufacturing a film layer structure according to an embodiment of the present disclosure. As shown in fig. 7, a method for preparing a film structure provided in the embodiment of the present application includes the following steps.
Specifically, the metal layer may be prepared in advance, or may be prepared through a series of processes such as deposition, exposure, etching, and the like, which is not specifically limited in the present application.
Specifically, the protective substrate may be prepared on the surface of the metal layer, that is, the surface of the metal layer is coated with an organic material to form the protective substrate, or the protective substrate may be prepared through deposition and other processes, which is not limited in this application. Then, a first patterned structure is formed on the protective substrate. The protective substrate forming the first patterned structure is a protective layer, i.e. the protective layer may be an organic layer having the first patterned structure. And exposing the protective substrate to form a first patterned structure.
Specifically, the polarizer including the second patterned structure corresponding to the first patterned structure may be prepared in advance, or may be prepared through a series of processes such as deposition, exposure, and etching, which is not specifically limited in this application. Step 703 may be performed before or after step 701 and step 702, only step 703 needs to be performed before step 704, and the timing of performing step 703 is not specifically limited in the present application.
Specifically, polaroid and protective layer can be laminated by the manual work, also can use laminating equipment automatic laminating, and this application does not do specific limit to the laminating mode.
The above description is only exemplary of the present application and should not be taken as limiting the present application, as any modifications, equivalents and the like that are within the spirit and principle of the present application should be included in the scope of the present application.
Claims (10)
1. A film layer structure, comprising:
a metal layer;
the protective layer is arranged on one side surface of the metal layer; and
the polaroid is arranged on the surface of one side, far away from the metal layer, of the protective layer;
one side, close to the polarizer, of the protective layer comprises a first graphical structure, and one side, close to the protective layer, of the polarizer comprises a second graphical structure in nested fit with the first graphical structure.
2. The film layer structure of claim 1, wherein the protective layer has a first central region and a first edge region surrounding the first central region, and the first patterned structure is located at the first edge region.
3. The film layer structure of claim 1 or 2, wherein the metal layer has a second central region and a second edge region surrounding the second central region;
in a first direction, a width of the first patterned structure is greater than or equal to a width of the second edge region, wherein the first direction is a direction from the second central region to the second edge region.
4. A film layer structure according to claim 1 or 2, wherein an orthographic projection of the second patterned structure on the protective layer coincides with the first patterned structure.
5. The film layer structure of claim 1 or 2, wherein the first patterned structure comprises a first protrusion, and the second patterned structure comprises a first groove nested with the first protrusion; or
The first patterned structure includes a second groove, and the second patterned structure includes a second protrusion that nestingly mates with the second groove.
6. The film structure of claim 5, wherein in a second direction, the cross section of the first protrusion comprises a first trapezoidal cross section, and the cross section of the first groove comprises a second trapezoidal cross section, wherein the second direction comprises a lamination direction of the protective layer and the polarizer; or
In the second direction, a cross section of the second groove includes a third trapezoidal cross section, and a cross section of the second protrusion includes a fourth trapezoidal cross section.
7. The film structure of claim 6, wherein the slope of the first trapezoidal cross section faces the polarizer, and the slope of the fourth trapezoidal cross section faces the protective layer.
8. The film structure of claim 1 or 2, wherein the height of the first patterned structure is smaller than the thickness of the protective layer and the height of the second patterned structure is smaller than the thickness of the polarizer in a second direction, wherein the second direction comprises a lamination direction of the protective layer and the polarizer.
9. A touch panel comprising the film structure of any one of claims 1 to 8.
10. A method for preparing a film layer structure, comprising:
preparing or providing a metal layer;
preparing a protective layer with a first graphical structure on the surface of the metal layer;
preparing or providing a polarizer comprising a second patterned structure corresponding to the first patterned structure;
and attaching the polarizer to the protective layer, and nesting and matching the first graphical structure and the second graphical structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110859936.XA CN113594214B (en) | 2021-07-28 | 2021-07-28 | Film structure, touch panel and film structure preparation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110859936.XA CN113594214B (en) | 2021-07-28 | 2021-07-28 | Film structure, touch panel and film structure preparation method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113594214A true CN113594214A (en) | 2021-11-02 |
| CN113594214B CN113594214B (en) | 2024-04-26 |
Family
ID=78251459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110859936.XA Active CN113594214B (en) | 2021-07-28 | 2021-07-28 | Film structure, touch panel and film structure preparation method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113594214B (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105655501A (en) * | 2016-03-18 | 2016-06-08 | 张家港康得新光电材料有限公司 | Comprehensive functional membrane, manufacturing method thereof, and OLED display panel |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN205644504U (en) * | 2016-03-14 | 2016-10-12 | 上海中航光电子有限公司 | Touch display panel and touch display device |
| CN207182243U (en) * | 2017-08-17 | 2018-04-03 | 四川粤鸿显示技术有限公司 | A kind of Capacitance-type built-in touches structure and touch-screen |
| WO2019103439A1 (en) * | 2017-11-22 | 2019-05-31 | 김영수 | Attachable/detachable display device comprising polarizing film |
| CN113066806B (en) * | 2021-03-24 | 2024-03-22 | 武汉天马微电子有限公司 | Display panel, manufacturing method thereof and display device |
-
2021
- 2021-07-28 CN CN202110859936.XA patent/CN113594214B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105655501A (en) * | 2016-03-18 | 2016-06-08 | 张家港康得新光电材料有限公司 | Comprehensive functional membrane, manufacturing method thereof, and OLED display panel |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113594214B (en) | 2024-04-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8852852B2 (en) | Narrow frame touch input sheet, manufacturing method of same, and conductive sheet used in narrow frame touch input sheet | |
| US10720475B2 (en) | OLED display device with embedded touch electrode | |
| TW201034090A (en) | Method for edge sealing barrier films | |
| US10186688B2 (en) | Display device | |
| CN212809177U (en) | Flexible polaroid and flexible touch display device | |
| CN110796949B (en) | Display substrate, manufacturing method thereof, mother board, display panel and display device | |
| US20190296260A1 (en) | Display panel and method for making the same | |
| CN106373981B (en) | Flexible display panel and manufacturing method thereof | |
| CN110473901B (en) | Flexible display panel, preparation method thereof and display device | |
| CN112068735A (en) | Flexible polaroid and flexible touch display device | |
| JP4577734B2 (en) | Low reflective resistive touch panel and method for manufacturing the same | |
| CN113594214A (en) | Film layer structure, touch panel and film layer structure preparation method | |
| EP2389051A1 (en) | Method of manufacturing printed circuit board | |
| JP2011065394A (en) | Narrow frame touch input sheet with protection film, laminate narrow frame touch input sheet with protection film and method for manufacturing them | |
| US11366556B2 (en) | Electronic substrate and manufacture method thereof, and electronic device | |
| CN104659149B (en) | The manufacture method and solar module of solar module | |
| CN108292181B (en) | Film laminating method | |
| CN113471389A (en) | Display device, manufacturing method thereof and electronic equipment | |
| CN112987970A (en) | Display screen, preparation method of display screen and electronic equipment | |
| CN111625122B (en) | Touch display device | |
| US20200395391A1 (en) | An array substrate, a display panel and a method for manufacturing the array substrate | |
| CN115132079B (en) | Display panel and display device | |
| CN117979736A (en) | Display substrate and display device | |
| JPS6325356B2 (en) | ||
| CN114203771A (en) | Display panel, preparation method thereof and display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |