CN113584488A - Kovar alloy (4J29) normal-temperature chemical polishing method - Google Patents
Kovar alloy (4J29) normal-temperature chemical polishing method Download PDFInfo
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- CN113584488A CN113584488A CN202110816204.2A CN202110816204A CN113584488A CN 113584488 A CN113584488 A CN 113584488A CN 202110816204 A CN202110816204 A CN 202110816204A CN 113584488 A CN113584488 A CN 113584488A
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- kovar alloy
- chemical polishing
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- acid
- polishing
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- 238000005498 polishing Methods 0.000 title claims abstract description 62
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 53
- 239000000956 alloy Substances 0.000 title claims abstract description 53
- 229910000833 kovar Inorganic materials 0.000 title claims abstract description 53
- 239000000126 substance Substances 0.000 title claims abstract description 38
- 238000000034 method Methods 0.000 title claims abstract description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 18
- 238000005260 corrosion Methods 0.000 claims abstract description 10
- 230000007797 corrosion Effects 0.000 claims abstract description 10
- 239000007800 oxidant agent Substances 0.000 claims abstract description 8
- 230000001590 oxidative effect Effects 0.000 claims abstract description 8
- 239000003112 inhibitor Substances 0.000 claims abstract description 7
- 239000004094 surface-active agent Substances 0.000 claims abstract description 7
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229940081974 saccharin Drugs 0.000 claims abstract description 5
- 235000019204 saccharin Nutrition 0.000 claims abstract description 5
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 claims abstract description 5
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 3
- 238000005282 brightening Methods 0.000 claims abstract description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000008367 deionised water Substances 0.000 claims description 8
- 229910021641 deionized water Inorganic materials 0.000 claims description 8
- 239000003814 drug Substances 0.000 claims description 8
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 claims description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 6
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 4
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 claims description 4
- 229910001870 ammonium persulfate Inorganic materials 0.000 claims description 4
- 229940079593 drug Drugs 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 4
- 238000000227 grinding Methods 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 4
- 229940126589 solid medicine Drugs 0.000 claims description 4
- 238000003756 stirring Methods 0.000 claims description 4
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 4
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 3
- 239000004327 boric acid Substances 0.000 claims description 3
- LPMBTLLQQJBUOO-KTKRTIGZSA-N (z)-n,n-bis(2-hydroxyethyl)octadec-9-enamide Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)N(CCO)CCO LPMBTLLQQJBUOO-KTKRTIGZSA-N 0.000 claims description 2
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 claims description 2
- 239000004115 Sodium Silicate Substances 0.000 claims description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 2
- 229940077388 benzenesulfonate Drugs 0.000 claims description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 2
- 239000012964 benzotriazole Substances 0.000 claims description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims description 2
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 claims description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims description 2
- 239000012286 potassium permanganate Substances 0.000 claims description 2
- 239000011734 sodium Substances 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- -1 sodium alkyl benzene Chemical class 0.000 claims description 2
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 claims description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052911 sodium silicate Inorganic materials 0.000 claims description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 10
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 7
- 239000011609 ammonium molybdate Substances 0.000 abstract description 6
- 229940010552 ammonium molybdate Drugs 0.000 abstract description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract description 4
- APUPEJJSWDHEBO-UHFFFAOYSA-P ammonium molybdate Chemical compound [NH4+].[NH4+].[O-][Mo]([O-])(=O)=O APUPEJJSWDHEBO-UHFFFAOYSA-P 0.000 abstract description 4
- 235000018660 ammonium molybdate Nutrition 0.000 abstract description 4
- 239000002253 acid Substances 0.000 abstract description 3
- WUKLIUHWYLGAPC-UHFFFAOYSA-N azanium;sulfuric acid;chloride Chemical compound [NH4+].[Cl-].OS(O)(=O)=O WUKLIUHWYLGAPC-UHFFFAOYSA-N 0.000 abstract description 2
- 238000004090 dissolution Methods 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 238000002310 reflectometry Methods 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000004519 grease Substances 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 2
- 241000251468 Actinopterygii Species 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 238000012851 eutrophication Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- DAJSVUQLFFJUSX-UHFFFAOYSA-M sodium;dodecane-1-sulfonate Chemical compound [Na+].CCCCCCCCCCCCS([O-])(=O)=O DAJSVUQLFFJUSX-UHFFFAOYSA-M 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Detergent Compositions (AREA)
Abstract
The invention discloses a kovar alloy (4J29) normal-temperature chemical polishing method, belonging to the kovar alloy normal-temperature polishing field, in the original polishing solution system of sulfuric acid-hydrochloric acid-ammonium molybdate, the operation is required to be carried out in the environment higher than room temperature, and because the original polishing solution system causes the operation environment to be worse, the polishing effect is not good, the surface of the polished workpiece is not uniform, and a full bright surface can not be obtained, the hydrochloric acid in the polishing solution prepared by the new formula plays a role in acid dissolution, and the oxidant has an oxidation effect, on the basis, the invention adopts the hydrochloric acid and oxidant system to replace nitric acid and phosphoric acid, and adding surfactant to improve surface smoothness, saccharin can be used as brightening agent, corrosion inhibitor can inhibit local corrosion, the polishing agent has good polishing effect under the condition of not containing sulfuric acid and ammonium molybdate, and has less influence on the surrounding environment.
Description
Technical Field
The invention relates to the field of kovar alloy normal-temperature polishing, in particular to a kovar alloy (4J29) normal-temperature chemical polishing technology.
Background
The kovar alloy is increasingly widely applied in various fields, and polishing is an important technology for surface treatment of the kovar alloy in order to improve the surface decoration of the kovar alloy. Kovar alloy polishing mainly comprises three types of mechanical polishing, electrochemical polishing and chemical polishing, and the chemical polishing is a mainstream process of industrial production due to the reasons of simple equipment, simple and convenient operation, low cost and the like. The classical chemical polishing solution is a triacid polishing solution consisting of sulfuric acid, phosphoric acid and ammonium molybdate, has excellent polishing effect, and ensures that the brightness and the flatness of the surface of the kovar alloy can meet the requirements. However, the triacid polishing solution has inherent disadvantages that ammonium molybdate pollutes the atmosphere environment in the production process, and phosphorus-containing wastewater is discharged to pollute the water source environment. Under the situation of increasing requirements on environmental governance and sustainable development, the research on novel polishing solution replacing a three-acid chemical polishing solution system is provided. The currently reported polishing solution mainly improves the pollution problem of ammonium molybdate, so that a two-acid polishing solution of phosphoric acid and sulfuric acid is developed, but the discharge of phosphoric acid can increase the phosphorus content of a water body, further cause water eutrophication, seriously influence the survival of aquatic organisms such as fish and the like, and thus, the problem of environmental protection is not fundamentally solved.
Disclosure of Invention
The invention provides a kovar alloy (4J29) normal-temperature chemical polishing technology for solving the problems.
In order to achieve the purpose, the invention adopts the following technical scheme:
a kovar alloy (4J29) normal-temperature chemical polishing technology comprises the following steps:
s1, putting the kovar alloy (4J29) workpiece into absolute ethyl alcohol for preliminary pretreatment, then washing the kovar alloy (4J29) workpiece for 2-3 times by using deionized water until the surface of the kovar alloy (4J29) workpiece has no absolute ethyl alcohol residue, and removing stains on the surface of the kovar alloy (4J29) workpiece;
s2, putting the kovar alloy (4J29) workpiece after primary pretreatment into a chemical polishing agent, and performing chemical polishing for 5-10S at the temperature of 25-35 ℃;
the chemical polishing agent comprises the following components in percentage by mass: 30-35% of hydrochloric acid, 60-70% of oxidant, 1-2% of corrosion inhibitor, 1-2% of surfactant and 1-2% of brightener, wherein the mass percentage of hydrochloric acid is 35%; the chemical polishing agent is prepared by the following steps: respectively grinding all solid medicines into powder, pouring a hydrochloric acid solution into a container, placing the container in an oil bath at 25-35 ℃, slowly pouring an oxidant, a corrosion inhibitor, a surfactant and a brightening agent into the hydrochloric acid solution in sequence, continuously stirring, and dissolving other medicines after each medicine is stirred and dissolved to obtain a chemical polishing agent;
s3, putting the polished Kovar alloy (4J29) workpiece into deionized water, carrying out ultrasonic cleaning for 5-15 min, taking out and drying.
Preferably, the corrosion inhibitor is one or more of boric acid, hexamethylene diamine, oleic acid diethanolamine, sodium silicate, imidazole, sodium alkyl benzene sulfonate, triethanolamine and benzotriazole.
Preferably, the oxidant is one or two of hydrogen peroxide, peracetic acid, sodium dichromate, chromic acid, nitric acid, potassium permanganate and ammonium persulfate.
Preferably, the surfactant is one or more of sodium dodecyl sulfonate, sodium dodecyl benzene sulfonate and sodium dodecyl sulfate.
Preferably, the brightener is saccharin.
Compared with the prior art, the invention provides a kovar alloy (4J29) normal-temperature chemical polishing technology, which has the following beneficial effects:
1. the invention has the beneficial effects that: in the original polishing solution system of sulfuric acid-hydrochloric acid-ammonium molybdate, the operation needs to be carried out in the environment higher than room temperature, and the original polishing solution system causes the operation environment to be severe, the polishing effect is poor, the surface of a workpiece after polishing is not uniform, and a full bright surface cannot be obtained.
Detailed Description
The technical solutions in the embodiments of the present invention will be described below clearly and completely in connection with the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments.
Example 1:
in this embodiment, the chemical polishing agent in the kovar alloy (4J29) normal temperature chemical polishing technology is prepared as follows:
respectively grinding all solid medicines into powder, pouring a hydrochloric acid solution into a container, placing the container in an oil bath at 25-35 ℃, slowly pouring ammonium persulfate, boric acid, saccharin and sodium dodecyl sulfate into the hydrochloric acid solution in sequence, continuously stirring, and dissolving other medicines after each medicine is stirred and dissolved to obtain the chemical polishing agent for later use.
Taking 35% mass fraction sulfuric acid as a solvent, wherein the concentration of each component is as follows:
a kovar alloy (4J29) normal temperature chemical polishing technology comprises the following steps
S1, putting the kovar alloy (4J29) workpiece into absolute ethyl alcohol for preliminary pretreatment, then washing the kovar alloy (4J29) workpiece for 2-3 times by using deionized water until the surface of the kovar alloy (4J29) workpiece has no absolute ethyl alcohol residue, and removing stains on the surface of the kovar alloy (4J29) workpiece;
s2, putting the kovar alloy (4J29) workpiece after primary pretreatment into a chemical polishing agent, and performing chemical polishing for 5-10S at the temperature of 25-35 ℃;
s3, putting the polished Kovar alloy (4J29) workpiece into deionized water, carrying out ultrasonic cleaning for 5-15 min, taking out and drying;
detection method and standard: the reflectivity of the surface of a sample of the kovar alloy (4J29) workpiece is tested and polished by a UV-240 ultraviolet-visible spectrophotometer (wavelength 750nm), and the reflectivity of the surface of the sample of the kovar alloy (4J29) workpiece in the embodiment is 92.1 percent and the polishing effect is excellent by taking a mirror surface with 100 percent reflectivity as a reference; meanwhile, the surface of the kovar alloy (4J29) workpiece is polished uniformly, does not have ash hanging, does not generate local over corrosion, and can eliminate residual slight mechanical lines and trace grease.
Example 2: this example is based on example 1, but differs therefrom;
in this embodiment, the chemical polishing agent in the kovar alloy (4J29) normal temperature chemical polishing technology is prepared as follows:
respectively grinding all solid medicines into powder, pouring a hydrochloric acid solution into a container, placing the container in an oil bath at 25-35 ℃, slowly pouring ammonium persulfate, hexamethylene diamine, saccharin and sodium dodecyl sulfate into the hydrochloric acid solution in sequence, continuously stirring, and dissolving other medicines after each medicine is stirred and dissolved to obtain the chemical polishing agent for later use.
Taking sulfuric acid with the mass fraction of 30% as a solvent, wherein the concentration of each component is as follows:
a kovar alloy (4J29) normal temperature chemical polishing technology comprises the following steps
S1, putting the kovar alloy (4J29) workpiece into absolute ethyl alcohol for preliminary pretreatment, then washing the kovar alloy (4J29) workpiece for 2-3 times by using deionized water until the surface of the kovar alloy (4J29) workpiece has no absolute ethyl alcohol residue, and removing stains on the surface of the kovar alloy (4J29) workpiece;
s2, putting the kovar alloy (4J29) workpiece after primary pretreatment into a chemical polishing agent, and performing chemical polishing for 5-10S at the temperature of 25-35 ℃;
s3, putting the polished Kovar alloy (4J29) workpiece into deionized water, carrying out ultrasonic cleaning for 5-15 min, taking out and drying;
detection method and standard: the reflectivity of the surface of the polished kovar alloy sample is tested by using a UV-240 ultraviolet-visible spectrophotometer (with the wavelength of 750nm), the reflectivity of the surface of the kovar alloy sample in the embodiment is more than 91.1 percent by taking a mirror surface with 100 percent reflectivity as a reference, and the polishing effect is excellent; meanwhile, the surface of the kovar alloy is polished uniformly, ash is not attached, local over corrosion is not generated, and residual slight mechanical lines and trace grease can be eliminated.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (5)
1. A kovar alloy (4J29) normal-temperature chemical polishing technology is characterized by comprising the following steps:
s1, putting the kovar alloy (4J29) workpiece into absolute ethyl alcohol for preliminary pretreatment, then washing the kovar alloy (4J29) workpiece for 2-3 times by using deionized water until the surface of the kovar alloy (4J29) workpiece has no absolute ethyl alcohol residue, and removing stains on the surface of the kovar alloy (4J29) workpiece;
s2, putting the kovar alloy (4J29) workpiece after primary pretreatment into a chemical polishing agent, and performing chemical polishing for 5-10S at the temperature of 25-35 ℃;
the chemical polishing agent comprises the following components in percentage by mass: 30-35% of hydrochloric acid, 60-70% of oxidant, 1-2% of corrosion inhibitor, 1-2% of surfactant and 1-2% of brightener, wherein the mass percentage of hydrochloric acid is 35%; the chemical polishing agent is prepared by the following steps: respectively grinding all solid medicines into powder, pouring a hydrochloric acid solution into a container, placing the container in an oil bath at 25-35 ℃, slowly pouring an oxidant, a corrosion inhibitor, a surfactant and a brightening agent into the hydrochloric acid solution in sequence, continuously stirring, and dissolving other medicines after each medicine is stirred and dissolved to obtain a chemical polishing agent;
s3, putting the polished Kovar alloy (4J29) workpiece into deionized water, carrying out ultrasonic cleaning for 5-15 min, taking out and drying.
2. A kovar alloy (4J29) normal temperature chemical polishing technique according to claim 1, wherein: the corrosion inhibitor is one or more of boric acid, hexamethylene diamine, oleic acid diethanolamine, sodium silicate, imidazole, sodium alkyl benzene sulfonate, triethanolamine and benzotriazole.
3. A kovar alloy (4J29) normal temperature chemical polishing technique according to claim 1, wherein: the oxidant is one or two of hydrogen peroxide, peroxyacetic acid, sodium dichromate, chromic acid, nitric acid, potassium permanganate and ammonium persulfate.
4. A kovar alloy (4J29) normal temperature chemical polishing technique according to claim 1, wherein: the surfactant is one or more of sodium dodecyl sulfate, sodium dodecyl benzene sulfonate and sodium dodecyl sulfate.
5. A kovar alloy (4J29) normal temperature chemical polishing technique according to claim 1, wherein: the brightener is saccharin.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115945450A (en) * | 2023-01-06 | 2023-04-11 | 胡文花 | Surface treatment method for engine cylinder cover |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2056499A (en) * | 1979-08-03 | 1981-03-18 | Diversey Corp | Chemical Polishing Stainless Steel and Low Expansion Alloys |
CN107502894A (en) * | 2017-08-22 | 2017-12-22 | 无锡市恒利弘实业有限公司 | A kind of environment-friendly type brightening solution for stainless steel and preparation method thereof and glossing |
CN108315739A (en) * | 2018-02-10 | 2018-07-24 | 深圳市祥盛兴科技有限公司 | A kind of chemical polishing solution and surface with chemical polishing technology |
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2021
- 2021-07-20 CN CN202110816204.2A patent/CN113584488A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2056499A (en) * | 1979-08-03 | 1981-03-18 | Diversey Corp | Chemical Polishing Stainless Steel and Low Expansion Alloys |
CN107502894A (en) * | 2017-08-22 | 2017-12-22 | 无锡市恒利弘实业有限公司 | A kind of environment-friendly type brightening solution for stainless steel and preparation method thereof and glossing |
CN108315739A (en) * | 2018-02-10 | 2018-07-24 | 深圳市祥盛兴科技有限公司 | A kind of chemical polishing solution and surface with chemical polishing technology |
Non-Patent Citations (1)
Title |
---|
方景礼 著: "《金属材料抛光技术》", vol. 1, 北京:国防工业出版社, pages: 40 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115945450A (en) * | 2023-01-06 | 2023-04-11 | 胡文花 | Surface treatment method for engine cylinder cover |
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