CN113524256A - Mechanical arm, mask detection device and mask detection system - Google Patents
Mechanical arm, mask detection device and mask detection system Download PDFInfo
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- CN113524256A CN113524256A CN202110917353.8A CN202110917353A CN113524256A CN 113524256 A CN113524256 A CN 113524256A CN 202110917353 A CN202110917353 A CN 202110917353A CN 113524256 A CN113524256 A CN 113524256A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J18/00—Arms
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J19/00—Accessories fitted to manipulators, e.g. for monitoring, for viewing; Safety devices combined with or specially adapted for use in connection with manipulators
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Abstract
The application provides a robotic arm, robotic arm includes: the adsorption device comprises a sucker, a first channel and a first support rod, wherein the first channel is arranged in the first support rod and penetrates through the first support rod; the driving device is connected with the adsorption device through a first supporting rod; the dust collecting device comprises a dust collecting box and a second channel, and the second channel is connected with the first channel and the dust collecting box. According to the technical scheme, the driving device controls the adsorption device to adsorb the particulate matters, and the particulate matters are collected to the dust collection box in the dust collection device through the first channel connected with the adsorption device and the second channel connected with the first channel. The gripping device is matched with the adsorption device, the gripping device grips a product to be processed, and the adsorption device processes particulate matters to be removed from the product, so that the processing speed is increased.
Description
Technical Field
The application relates to the field of semiconductor manufacturing, in particular to a mechanical arm, a mask detection device and a mask detection system.
Background
In the field of semiconductor manufacturing, dust particles are easily adsorbed by a mask in the using process of the mask, so that the transfer printing quality of a mask pattern is directly influenced, and the yield of semiconductor products is influenced. Therefore, after exposure with the mask, the reticle is typically inspected with an integrated mask inspection system. When the integrated mask detection system detects that dust particles exist on the mask, the detection is stopped and manual removal of the dust particles is waited. However, the manual removal of dust particles needs to be performed through the processes of taking out the mask, visual inspection, cleaning and the like, and the mask needs to be detected by the integrated mask detection system again, so that the operation stop time of the production line is seriously prolonged, and the production efficiency is reduced.
Therefore, the technical problem to be solved is to improve the efficiency of removing dust particles on the mask.
Disclosure of Invention
The technical problem that this application will be solved provides a robotic arm, mask detection device and mask detecting system, improves the efficiency of cleaing away the dust particle on the mask version.
In order to solve the above problem, the present application provides a robot arm including: the adsorption device comprises a sucker, a first channel and a first support rod, wherein the first channel is arranged in the first support rod and penetrates through the first support rod; the driving device is connected with the adsorption device through a first supporting rod; the dust collecting device comprises a dust collecting box and a second channel, and the second channel is connected with the first channel and the dust collecting box.
Optionally, the driving device is configured to be pneumatic, hydraulic, electric, or mechanical. The pneumatic driving device has the main advantages of good overload protection performance, explosion resistance and capability of being used in occasions with dangerous gases such as gas and the like. The hydraulic driving device has the advantages of simple structure and small volume. The electric driving device has the advantages of wide output torque range, convenient control and free control by adopting various signals such as direct current, alternating current, short wave, pulse and the like. The mechanical driving device is only used in the occasion of fixed action, is generally used for realizing the specified action, and has the characteristics of reliable action, high working speed and low cost, but is not easy to adjust. The type of the driving device can be selected according to the application scene of the mechanical arm.
Optionally, the chuck is configured as a vacuum chuck or an electrostatic chuck. The vacuum chuck is easy to use, and for particulate matters made of any materials, the vacuum chuck can be applied under the condition of keeping the chuck sealed and airtight, does not pollute the environment, and does not generate light, heat, electromagnetism and the like. The electrostatic chuck can adsorb conductors, semiconductors, insulators and porous materials, has the characteristics of low electrostatic adsorption energy consumption, uniform adsorption force and the like, and can not generate local stress during adsorption, so that scars and wrinkles can not be generated during adsorption of large-area thin sheet workpieces.
Optionally, the mechanical arm further includes a base and a second support rod, the second support rod is connected to the base and the driving device, and the second channel is disposed inside the second support rod and penetrates through the second support rod.
Optionally, the mechanical arm further includes: the gripping device comprises a gripping clamp and a third supporting rod, and the third supporting rod is connected with the gripping clamp and the driving device.
The present application further provides a mask detection device, the mask detection device includes: the detection mechanism comprises an optical signal emitter and an optical signal receiver, the optical signal emitter is electrically connected with the optical signal receiver, the optical signal emitter emits a first optical signal to the surface of the mask, the optical signal receiver receives a second optical signal reflected by the surface of the mask, and the mask condition is judged according to the conditions of the first optical signal and the second optical signal and a feedback signal is output; a processing mechanism electrically connected to the detection mechanism, the processing mechanism comprising: the adsorption device comprises a sucker, a first channel and a first support rod, wherein the first channel is arranged in the first support rod and penetrates through the first support rod; the driving device is connected with the adsorption device through a first supporting rod; the dust collecting device comprises a dust collecting box and a second channel, and the second channel is connected with the first channel and the dust collecting box; and the processing mechanism processes the mask according to the feedback signal.
Optionally, the driving device is configured to be pneumatic, hydraulic, electric, or mechanical. The pneumatic driving device has the main advantages of good overload protection performance, explosion resistance and capability of being used in occasions with dangerous gases such as gas and the like. The hydraulic driving device has the advantages of simple structure and small volume. The electric driving device has the advantages of wide output torque range, convenient control and free control by adopting various signals such as direct current, alternating current, short wave, pulse and the like. The mechanical driving device is only used in the occasion of fixed action, is generally used for realizing the specified action, and has the characteristics of reliable action, high working speed and low cost, but is not easy to adjust. The type of the driving device can be selected according to the application scene of the mechanical arm.
Optionally, the chuck is configured as a vacuum chuck or an electrostatic chuck. The vacuum chuck is easy to use, and for particulate matters made of any materials, the vacuum chuck can be applied under the condition of keeping the chuck sealed and airtight, does not pollute the environment, and does not generate light, heat, electromagnetism and the like. The electrostatic chuck can adsorb conductors, semiconductors, insulators and porous materials, has the characteristics of low electrostatic adsorption energy consumption, uniform adsorption force and the like, and can not generate local stress during adsorption, so that scars and wrinkles can not be generated during adsorption of large-area thin sheet workpieces.
Optionally, the mask detection device further includes a base and a second support rod, the second support rod is connected to the base and the driving device, and the second channel is disposed inside the second support rod and penetrates through the second support rod.
Optionally, the mask detecting apparatus further includes: the gripping device comprises a gripping clamp and a third supporting rod, and the third supporting rod is connected with the gripping clamp and the driving device.
The present application further provides a mask inspection system, which includes: the mask detection device comprises a detection unit and a control unit, wherein the detection unit comprises an optical signal emitter and an optical signal receiver, the optical signal emitter is electrically connected with the optical signal receiver, the optical signal emitter emits a first optical signal to the surface of a mask, the optical signal receiver receives a second optical signal reflected by the surface of the mask, and the mask condition is judged according to the conditions of the first optical signal and the second optical signal and a feedback signal is output; a processing unit, the processing unit comprising: the adsorption device comprises a sucker, a first channel and a first support rod, wherein the first channel is arranged in the first support rod and penetrates through the first support rod; the driving device is connected with the adsorption device through a first supporting rod; the dust collecting device comprises a dust collecting box and a second channel, and the second channel is connected with the first channel and the dust collecting box; and the processing unit processes the mask according to the feedback signal.
Optionally, the driving device is configured to be pneumatic, hydraulic, electric, or mechanical. The pneumatic driving device has the main advantages of good overload protection performance, explosion resistance and capability of being used in occasions with dangerous gases such as gas and the like. The hydraulic driving device has the advantages of simple structure and small volume. The electric driving device has the advantages of wide output torque range, convenient control and free control by adopting various signals such as direct current, alternating current, short wave, pulse and the like. The mechanical driving device is only used in the occasion of fixed action, is generally used for realizing the specified action, and has the characteristics of reliable action, high working speed and low cost, but is not easy to adjust. The type of the driving device can be selected according to the application scene of the mechanical arm.
Optionally, the chuck is configured as a vacuum chuck or an electrostatic chuck. The vacuum chuck is easy to use, and for particulate matters made of any materials, the vacuum chuck can be applied under the condition of keeping the chuck sealed and airtight, does not pollute the environment, and does not generate light, heat, electromagnetism and the like. The electrostatic chuck can adsorb conductors, semiconductors, insulators and porous materials, has the characteristics of low electrostatic adsorption energy consumption, uniform adsorption force and the like, and can not generate local stress during adsorption, so that scars and wrinkles can not be generated during adsorption of large-area thin sheet workpieces.
Optionally, the mask detection system further includes a base and a second support rod, the second support rod is connected to the base and the driving device, and the second channel is disposed inside the second support rod and penetrates through the second support rod.
Optionally, the mask inspection system further includes: the gripping device comprises a gripping clamp and a third supporting rod, and the third supporting rod is connected with the gripping clamp and the driving device
According to the technical scheme, the driving device controls the adsorption device to adsorb the particulate matters, and the particulate matters are collected to the dust collection box in the dust collection device through the first channel connected with the adsorption device and the second channel connected with the first channel. Particularly in the semiconductor field, since the price of the wafer is expensive, the technical solution of no damage to the mask and no new generation of contaminants is required for the particles on the mask a. According to the technical scheme, the processing speed of particles on the surface of the mask is increased under the condition that the mask is not damaged, and the production efficiency of products is improved.
Drawings
Fig. 1 is a schematic view of a robot according to an embodiment of the present disclosure.
Fig. 2 is a schematic diagram of a mask inspection apparatus according to an embodiment of the present disclosure.
FIG. 3 is a schematic diagram of a mask inspection system according to an embodiment of the present application.
Detailed Description
The following describes in detail specific embodiments of a robot, a mask inspection apparatus, and a mask inspection system according to the present invention with reference to the accompanying drawings.
Fig. 1 is a schematic view of a robot according to an embodiment of the present disclosure. The robot arm includes: a suction device D1, the suction device D1 includes a suction cup D11, a first channel D12 and a first support rod D13, the first channel D12 is arranged inside the first support rod D13 and penetrates through the first support rod D13; a driving device D2, wherein the driving device D2 is connected with the adsorption device D1 through a first support rod D13; the dust collecting device D3, the dust collecting device D3 includes a dust box D31 and a second channel D32, the second channel D22 connects the first channel D12 and the dust box D31. The driving device D2 controls the adsorption device D1 to adsorb the particles, and the particles are collected in a dust collection box D31 in the dust collection device D3 through the first channel D12 connected with the adsorption device D1 and the second channel D22 connected with the first channel D12.
The suction cup D11 is configured as a vacuum or electrostatic suction cup. The vacuum chuck is easy to use, and for particulate matters made of any materials, the vacuum chuck can be applied under the condition of keeping the chuck sealed and airtight, does not pollute the environment, and does not generate light, heat, electromagnetism and the like. The electrostatic chuck can adsorb conductors, semiconductors, insulators and porous materials, has the characteristics of low electrostatic adsorption energy consumption, uniform adsorption force and the like, and can not generate local stress during adsorption, so that scars and wrinkles can not be generated during adsorption of large-area thin sheet workpieces.
In this embodiment, the robot arm further includes a base D4 and a second supporting rod D5, the second supporting rod D5 connects the base D4 and the driving device D2, and the second channel D22 is disposed inside the second supporting rod D5 and penetrates through the second supporting rod D5. While the base D4 shown in FIG. 1 is a cube and the dust collector D3 is disposed within the base interior D4, in other embodiments the base of the robot arm may be configured in any other manner such as a clamp that secures the robot arm in a desired position, and in other embodiments the dust collector may be disposed outside the base or may not be attached to the base.
Referring to fig. 1, the driving device D2 is connected to the adsorbing device D1 via the first supporting rod D13, the driving device D2 is connected to the dust collecting device D3 via the second supporting rod D5, the first channel D12 penetrates through the first supporting rod D13, and the second channel D32 penetrates through the second supporting rod D5. The outer surface of the driving device D2 is provided with an annular channel D21, and the annular channel D21 is connected with the first channel D12 and the second channel D32.
The driving device D2 is configured to be pneumatic, hydraulic, electric, or mechanical. The pneumatic driving device has the main advantages of good overload protection performance, explosion resistance and capability of being used in occasions with dangerous gases such as gas and the like. The hydraulic driving device has the advantages of simple structure and small volume. The electric driving device has the advantages of wide output torque range, convenient control and free control by adopting various signals such as direct current, alternating current, short wave, pulse and the like. The mechanical driving device is only used in the occasion of fixed action, is generally used for realizing the specified action, and has the characteristics of reliable action, high working speed and low cost, but is not easy to adjust. The type of the driving device can be selected according to the application scene of the mechanical arm.
With reference to fig. 1, the robot arm further includes a gripping device D6, the gripping device includes a gripping clip D61 and a third supporting rod D62, and the third supporting rod D62 connects the gripping clip D61 and the driving device D2. The gripping device D6 is used for gripping the product to be treated, and the adsorption device D1 is used for treating the particulate matters to be removed from the product, so that the treatment speed is increased. In this embodiment, the gripping device D6 further includes a third channel D63, and the third channel D63 penetrates through the third supporting rod D62 and is connected to the second channel D32 through the annular channel D21, so that the gripping device D1 can process pollutants simultaneously, and the processing efficiency is further optimized.
According to the technical scheme, the driving device D2 controls the adsorption device D1 to adsorb the particulate matters, and the particulate matters are collected in the dust collection box D31 in the dust collection device D3 through the first channel D12 connected with the adsorption device D1 and the second channel D22 connected with the first channel D12. Wherein the suction device D1 has a suction cup D11, the suction cup D11 is configured as a vacuum suction cup or an electrostatic suction cup. The vacuum chuck can be applied to particles made of any material under the condition of keeping the chuck sealed and airtight, does not pollute the environment, and does not generate light, heat, electromagnetism and the like. The electrostatic chuck can adsorb conductors, semiconductors, insulators and porous materials, has the characteristic of uniform adsorption force, and cannot generate local stress during adsorption, so that the electrostatic chuck cannot generate scars and wrinkles during adsorption of large-area thin sheet workpieces. Grabbing device D6 cooperates with adsorption equipment D1, snatchs the product that needs to be handled by grabbing device D6, handles the particulate matter that needs to get rid of on the product by adsorption equipment D1 again, improves the speed of handling.
Fig. 2 is a schematic diagram of a mask inspection apparatus according to an embodiment of the present disclosure. The mask detection device comprises a detection mechanism U1 and a processing mechanism U2, and is used for detecting and processing the particles on the mask A.
The detection mechanism U1 includes light signal transmitter D7 and light signal receiver D8, light signal transmitter D7 with light signal receiver D8 electricity is connected, light signal transmitter D7 is to the first light signal r1 of mask A surface transmission, light signal receiver D8 receives the second light signal r2 of mask A surface reflection, judges the mask A condition and outputs the feedback signal according to the condition of first light signal r1 and second light signal r 2. The processing mechanism U2 includes: a suction device D1, the suction device D1 includes a suction cup D11, a first channel D12 and a first support rod D13, the first channel D12 is arranged inside the first support rod D13 and penetrates through the first support rod D13; a driving device D2, wherein the driving device D2 is connected with the adsorption device D1 through a first support rod D13; the dust collecting device D3, the dust collecting device D3 includes a dust box D31 and a second channel D32, the second channel D22 connects the first channel D12 and the dust box D31. The driving device D2 controls the adsorption device D1 to adsorb the particles, and the particles are collected in a dust collection box D31 in the dust collection device D3 through the first channel D12 connected with the adsorption device D1 and the second channel D22 connected with the first channel D12. When the first optical signal r1 is normal and the second optical signal r2 is abnormal, a feedback signal is output, and the processing mechanism U2 processes the mask according to the feedback signal.
The suction cup D11 is configured as a vacuum or electrostatic suction cup. The vacuum chuck is easy to use, and for particulate matters made of any materials, the vacuum chuck can be applied under the condition of keeping the chuck sealed and airtight, does not pollute the environment, and does not generate light, heat, electromagnetism and the like. The electrostatic chuck can adsorb conductors, semiconductors, insulators and porous materials, has the characteristics of low electrostatic adsorption energy consumption, uniform adsorption force and the like, and can not generate local stress during adsorption, so that scars and wrinkles can not be generated during adsorption of large-area thin sheet workpieces.
In this embodiment, the disposing mechanism U2 further includes a base D4 and a second supporting rod D5, the second supporting rod D5 connects the base D4 and the driving device D2, and the second channel D22 is disposed inside the second supporting rod D5 and penetrates through the second supporting rod D5. While the base D4 shown in FIG. 2 is a cube and the dust collector D3 is disposed within the base interior D4, in other embodiments the base of the processing mechanism U2 may be configured in any other manner such as a clamp that secures the robot arm in a desired position, and in other embodiments the dust collector may be disposed outside the base or not attached to the base.
With reference to fig. 2, the driving device D2 is connected to the adsorbing device D1 via the first supporting rod D13, the driving device D2 is connected to the dust collecting device D3 via the second supporting rod D5, the first channel D12 penetrates through the first supporting rod D13, and the second channel D32 penetrates through the second supporting rod D5. The outer surface of the driving device D2 is provided with an annular channel D21, and the annular channel D21 is connected with the first channel D12 and the second channel D32.
The driving device D2 is configured to be pneumatic, hydraulic, electric, or mechanical. The pneumatic driving device has the main advantages of good overload protection performance, explosion resistance and capability of being used in occasions with dangerous gases such as gas and the like. The hydraulic driving device has the advantages of simple structure and small volume. The electric driving device has the advantages of wide output torque range, convenient control and free control by adopting various signals such as direct current, alternating current, short wave, pulse and the like. The mechanical driving device is only used in the occasion of fixed action, is generally used for realizing the specified action, and has the characteristics of reliable action, high working speed and low cost, but is not easy to adjust. The type of the driving device can be selected according to the application scene of the mechanical arm.
With reference to fig. 2, the robot arm further includes a gripping device D6, the gripping device includes a gripping clip D61 and a third supporting rod D62, and the third supporting rod D62 connects the gripping clip D61 and the driving device D2. The gripping device D6 is used for gripping the product to be treated, and the adsorption device D1 is used for treating the particulate matters to be removed from the product, so that the treatment speed is increased. In this embodiment, the gripping device D6 further includes a third channel D63, and the third channel D63 penetrates through the third supporting rod D62 and is connected to the second channel D32 through the annular channel D21, so that the gripping device D1 can process pollutants simultaneously, and the processing efficiency is further optimized.
According to the technical scheme, the driving device D2 controls the adsorption device D1 to adsorb the particulate matters, and the particulate matters are collected in the dust collection box D31 in the dust collection device D3 through the first channel D12 connected with the adsorption device D1 and the second channel D22 connected with the first channel D12. Wherein the suction device D1 has a suction cup D11, the suction cup D11 is configured as a vacuum suction cup or an electrostatic suction cup. The vacuum chuck can be applied to particles made of any material under the condition of keeping the chuck sealed and airtight, does not pollute the environment, and does not generate light, heat, electromagnetism and the like. The electrostatic chuck can adsorb conductors, semiconductors, insulators and porous materials, has the characteristic of uniform adsorption force, and cannot generate local stress during adsorption, so that the electrostatic chuck cannot generate scars and wrinkles during adsorption of large-area thin sheet workpieces. Grabbing device D6 cooperates with adsorption equipment D1, snatchs the product that needs to be handled by grabbing device D6, handles the particulate matter that needs to get rid of on the product by adsorption equipment D1 again, improves the speed of handling. Particularly in the semiconductor field, since the price of the wafer is expensive, the technical solution of no damage to the mask and no new generation of contaminants is required for the particles on the mask a. According to the technical scheme, the processing speed of particles on the surface of the mask is increased under the condition that the mask is not damaged, and the production efficiency of products is improved.
FIG. 3 is a schematic diagram of a mask inspection system according to an embodiment of the present application. The mask inspection system includes a probing unit M1 and a processing unit M2, the processing unit M2 includes: an adsorption device D1, a drive device D2, and a dust collector D3. The structure of the mask inspection system is as described in the previous embodiments, and is specifically shown in fig. 2.
Referring to fig. 2, the detecting unit M1 includes an optical signal transmitter D7 and an optical signal receiver D8, the optical signal transmitter D7 is electrically connected to the optical signal receiver D8, the optical signal transmitter D7 transmits a first optical signal r1 to the surface of the mask a, the optical signal receiver D8 receives a second optical signal r2 reflected by the surface of the mask a, and determines the condition of the mask a according to the conditions of the first optical signal r1 and the second optical signal r2 and outputs a feedback signal. The processing unit M2 includes: a suction device D1, the suction device D1 includes a suction cup D11, a first channel D12 and a first support rod D13, the first channel D12 is arranged inside the first support rod D13 and penetrates through the first support rod D13; a driving device D2, wherein the driving device D2 is connected with the adsorption device D1 through a first support rod D13; the dust collecting device D3, the dust collecting device D3 includes a dust box D31 and a second channel D32, the second channel D22 connects the first channel D12 and the dust box D31. The driving device D2 controls the adsorption device D1 to adsorb the particles, and the particles are collected in a dust collection box D31 in the dust collection device D3 through the first channel D12 connected with the adsorption device D1 and the second channel D22 connected with the first channel D12. When the first optical signal r1 is normal and the second optical signal r2 is abnormal, a feedback signal is output, and the processing unit M2 processes the mask according to the feedback signal.
The suction cup D11 is configured as a vacuum or electrostatic suction cup. The vacuum chuck is easy to use, and for particulate matters made of any materials, the vacuum chuck can be applied under the condition of keeping the chuck sealed and airtight, does not pollute the environment, and does not generate light, heat, electromagnetism and the like. The electrostatic chuck can adsorb conductors, semiconductors, insulators and porous materials, has the characteristics of low electrostatic adsorption energy consumption, uniform adsorption force and the like, and can not generate local stress during adsorption, so that scars and wrinkles can not be generated during adsorption of large-area thin sheet workpieces.
In this embodiment, the processing unit M2 further includes a base D4 and a second supporting rod D5, the second supporting rod D5 connects the base D4 and the driving device D2, and the second channel D22 is disposed inside the second supporting rod D5 and penetrates through the second supporting rod D5. While base D4 shown in FIG. 2 is a cube and dust collector D3 is disposed within base interior D4, in other embodiments the base of processing unit U2 may be configured in any other manner such as a clamp that secures the robot arm in the desired position, and in other embodiments the dust collector may be disposed outside of the base or may not be attached to the base.
With reference to fig. 2, the driving device D2 is connected to the adsorbing device D1 via the first supporting rod D13, the driving device D2 is connected to the dust collecting device D3 via the second supporting rod D5, the first channel D12 penetrates through the first supporting rod D13, and the second channel D32 penetrates through the second supporting rod D5. The outer surface of the driving device D2 is provided with an annular channel D21, and the annular channel D21 is connected with the first channel D12 and the second channel D32.
The driving device D2 is configured to be pneumatic, hydraulic, electric, or mechanical. The pneumatic driving device has the main advantages of good overload protection performance, explosion resistance and capability of being used in occasions with dangerous gases such as gas and the like. The hydraulic driving device has the advantages of simple structure and small volume. The electric driving device has the advantages of wide output torque range, convenient control and free control by adopting various signals such as direct current, alternating current, short wave, pulse and the like. The mechanical driving device is only used in the occasion of fixed action, is generally used for realizing the specified action, and has the characteristics of reliable action, high working speed and low cost, but is not easy to adjust. The type of the driving device can be selected according to the application scene of the mechanical arm.
With reference to fig. 2, the robot arm further includes a gripping device D6, the gripping device includes a gripping clip D61 and a third supporting rod D62, and the third supporting rod D62 connects the gripping clip D61 and the driving device D2. The gripping device D6 is used for gripping the product to be treated, and the adsorption device D1 is used for treating the particulate matters to be removed from the product, so that the treatment speed is increased. In this embodiment, the gripping device D6 further includes a third channel D63, and the third channel D63 penetrates through the third supporting rod D62 and is connected to the second channel D32 through the annular channel D21, so that the gripping device D1 can process pollutants simultaneously, and the processing efficiency is further optimized.
According to the technical scheme, the driving device D2 controls the adsorption device D1 to adsorb the particulate matters, and the particulate matters are collected in the dust collection box D31 in the dust collection device D3 through the first channel D12 connected with the adsorption device D1 and the second channel D22 connected with the first channel D12. Wherein the suction device D1 has a suction cup D11, the suction cup D11 is configured as a vacuum suction cup or an electrostatic suction cup. The vacuum chuck can be applied to particles made of any material under the condition of keeping the chuck sealed and airtight, does not pollute the environment, and does not generate light, heat, electromagnetism and the like. The electrostatic chuck can adsorb conductors, semiconductors, insulators and porous materials, has the characteristic of uniform adsorption force, and cannot generate local stress during adsorption, so that the electrostatic chuck cannot generate scars and wrinkles during adsorption of large-area thin sheet workpieces. Grabbing device D6 cooperates with adsorption equipment D1, snatchs the product that needs to be handled by grabbing device D6, handles the particulate matter that needs to get rid of on the product by adsorption equipment D1 again, improves the speed of handling. Particularly in the semiconductor field, since the price of the wafer is expensive, the technical solution of no damage to the mask and no new generation of contaminants is required for the particles on the mask a. According to the technical scheme, the processing speed of particles on the surface of the mask is increased under the condition that the mask is not damaged, and the production efficiency of products is improved.
The foregoing is only a preferred embodiment of the present application and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (15)
1. A robot arm, comprising:
the adsorption device comprises a sucker, a first channel and a first support rod, wherein the first channel is arranged in the first support rod and penetrates through the first support rod;
the driving device is connected with the adsorption device through a first supporting rod;
the dust collecting device comprises a dust collecting box and a second channel, and the second channel is connected with the first channel and the dust collecting box.
2. The robotic arm of claim 1, wherein the driving device is configured to be pneumatic, hydraulic, electric, or mechanical.
3. The robot arm of claim 1, wherein the chuck is configured as a vacuum chuck or an electrostatic chuck.
4. The robotic arm of claim 1, further comprising a base and a second support rod, the second support rod connecting the base and the driving device, the second channel being disposed within the second support rod and extending through the second support rod.
5. The robot arm of claim 1, further comprising:
the gripping device comprises a gripping clamp and a third supporting rod, and the third supporting rod is connected with the gripping clamp and the driving device.
6. A mask inspection apparatus, comprising:
the detection mechanism comprises an optical signal emitter and an optical signal receiver, the optical signal emitter is electrically connected with the optical signal receiver, the optical signal emitter emits a first optical signal to the surface of the mask, the optical signal receiver receives a second optical signal reflected by the surface of the mask, and the mask condition is judged according to the conditions of the first optical signal and the second optical signal and a feedback signal is output;
a processing mechanism electrically connected to the detection mechanism, the processing mechanism comprising:
the adsorption device comprises a sucker, a first channel and a first support rod, wherein the first channel is arranged in the first support rod and penetrates through the first support rod;
the driving device is connected with the adsorption device through a first supporting rod;
the dust collecting device comprises a dust collecting box and a second channel, and the second channel is connected with the first channel and the dust collecting box;
and the processing mechanism processes the mask according to the feedback signal.
7. The mask inspection device of claim 6, wherein the driving device is configured to be pneumatic, hydraulic, electric, or mechanical.
8. The mask inspection device of claim 6, wherein the chuck is configured as a vacuum chuck or an electrostatic chuck.
9. The mask inspection device of claim 6, further comprising a base and a second support bar, wherein the second support bar connects the base and the driving device, and the second channel is disposed inside the second support bar and penetrates the second support bar.
10. The mask inspection device of claim 6, further comprising:
the gripping device comprises a gripping clamp and a third supporting rod, and the third supporting rod is connected with the gripping clamp and the driving device.
11. A mask inspection system, comprising:
the mask detection device comprises a detection unit and a control unit, wherein the detection unit comprises an optical signal emitter and an optical signal receiver, the optical signal emitter is electrically connected with the optical signal receiver, the optical signal emitter emits a first optical signal to the surface of a mask, the optical signal receiver receives a second optical signal reflected by the surface of the mask, and the mask condition is judged according to the conditions of the first optical signal and the second optical signal and a feedback signal is output;
a processing unit, the processing unit comprising:
the adsorption device comprises a sucker, a first channel and a first support rod, wherein the first channel is arranged in the first support rod and penetrates through the first support rod;
the driving device is connected with the adsorption device through a first supporting rod;
the dust collecting device comprises a dust collecting box and a second channel, and the second channel is connected with the first channel and the dust collecting box;
and the processing unit processes the mask according to the feedback signal.
12. The mask inspection system of claim 11, wherein the driving mechanism is configured to be pneumatic, hydraulic, electric, or mechanical.
13. The mask inspection system of claim 11, wherein the chuck is configured as a vacuum chuck or an electrostatic chuck.
14. The mask inspection system of claim 11, further comprising a base and a second support bar, the second support bar connecting the base and the driving device, the second channel disposed within the second support bar and extending through the second support bar.
15. The mask inspection system of claim 11, further comprising:
the gripping device comprises a gripping clamp and a third supporting rod, and the third supporting rod is connected with the gripping clamp and the driving device.
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| CN113524256B (en) | 2023-02-28 |
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