CN113518913B - Analysis device - Google Patents

Abstract

The charged particle beam irradiation apparatus irradiates a sample with a charged particle beam and detects a signal released from the sample. The first processing unit (10) is configured to be able to communicate with the first input device (11), and analyze a sample based on a detection signal of the charged particle beam irradiation apparatus, based on a signal from the first input device (11). The second processing unit (20) is configured to be able to communicate with the second input device (21) and the first processing unit (10), generate an observation image of the sample based on a detection signal of the charged particle beam irradiation apparatus, and control the charged particle beam irradiation apparatus based on a signal from the second input device (21). The second input device (21) comprises a pointing device. The second processing unit (20) converts an operation input to the pointing device into a control signal for the charged particle beam irradiation device.

Description

Analysis device

Technical Field

The present invention relates to an analysis device.

Background

Analytical devices such as an electron probe microanalyzer (EPMA: electron Probe Micro Analyzer) and a scanning electron microscope (SEM: scanning Electron Microscope) were constituted as follows: by irradiating a sample with a charged particle beam such as an electron beam or an ion beam and detecting a signal (secondary electron beam, reflected electron beam, characteristic X-ray, or the like) generated from the sample by the irradiation, observation and analysis of the sample can be performed.

Japanese patent application laid-open No. 2015-17971 (patent document 1) discloses a spectrometry device for observing a sample by using a spectrometry microscope. The spectrometry device described in patent document 1 includes an image processing device for displaying spectroscopic data acquired by a spectroscopic microscope on a display unit. The image processing apparatus is configured to change the display image in accordance with an instruction from a pointing device such as a mouse.

Prior art literature

Patent literature

Patent document 1: japanese patent application laid-open No. 2015-17971

Disclosure of Invention

Problems to be solved by the invention

In recent years, an analysis apparatus has been proposed that can perform all operations for observation and analysis of a sample using an indicating device. According to this configuration, the analyzer can perform image observation (secondary electron image, reflected electron image, and X-ray image) of the sample, analysis position search of the sample based on the observation image, and qualitative and quantitative analysis of the element contained in the analysis position by operating the icon or the like displayed on the display by the pointing device.

For example, in the case of searching for an analysis position of a sample by EPMA, an observation image is displayed on a display, and icons for adjusting the position of a sample stage, the focus of an electron beam, magnification, and the like are displayed. When the operator manipulates the icon with the pointing device while looking at the observation image, the view can be set at a desired analysis position on the sample by controlling the electron beam irradiation device according to the manipulation.

Further, since the analysis position search of the sample is performed every time the sample is changed, the execution frequency is relatively high compared to other operations. However, in the above-described configuration, operability is sometimes not necessarily high depending on the analyst, but since the pointing device is required to be used in combination with other operations, it is difficult to make the pointing device dedicated to control of the electron beam irradiation apparatus.

On the other hand, as another configuration of the analysis device, there is a configuration in which a dedicated operation device dedicated to control of the electron beam irradiation device is attached to the electron beam irradiation device. For example, a panel-shaped operation device is provided integrally with the electron beam irradiation apparatus, and an operation switch (a button, a dial, a switch, or the like) for adjusting the position of the sample stage, the focus, the magnification, or the like of the electron beam is provided in the operation device. The analyzer can control the electron beam irradiation device by manually operating the operation switch while looking at the observation image. However, even an operation device dedicated to control of the electron beam irradiation apparatus as described above has a problem that it is difficult to provide an operation device having good operability for all analysts because the convenience of use varies from one analyst to another.

In addition, since communication inherent to the electron beam irradiation apparatus is used in communication between the dedicated operation device and the controller of the electron beam irradiation apparatus, the apparatus manufacturer needs to design for each apparatus, and there is a problem of high manufacturing cost.

The present invention has been made to solve the above-described problems, and an object of the present invention is to improve the work efficiency of an analyzer with a simple configuration.

Solution for solving the problem

According to a first aspect of the present invention, an analyzer includes a charged particle beam irradiation device, a first processing unit, a second processing unit, and a display. The charged particle beam irradiation apparatus irradiates a sample with a charged particle beam, and detects a signal released from the sample. The first processing unit is configured to be communicable with the first input device, and is configured to analyze the sample based on a detection signal of the charged particle beam irradiation apparatus in accordance with an analysis condition specified by the first input device. The second processing unit is configured to be communicable with the second input device and the first processing unit, and is configured to generate an observation image of the sample based on a detection signal of the charged particle beam irradiation apparatus, and to control the charged particle beam irradiation apparatus based on a signal from the second input device. The display is configured to be communicable with the first processing unit and the second processing unit, and is configured to display analysis conditions and observation images generated by the second processing unit. The second input device comprises a pointing device. The second processing section converts an operation input to the pointing device into a control signal to the charged particle beam irradiation apparatus.

ADVANTAGEOUS EFFECTS OF INVENTION

According to the present invention, in the analyzer, the work efficiency of the analyzer can be improved with a simple configuration.

Drawings

Fig. 1 is a schematic diagram illustrating a configuration example of an analysis device according to an embodiment of the present invention.

Fig. 2 schematically illustrates a configuration example of the electron beam irradiation apparatus shown in fig. 1.

Fig. 3 is a diagram schematically showing the structures of the first computer and the second computer.

Fig. 4 is a diagram showing a display example of the first display and the second display and a configuration example of the first PD and the second PD.

Fig. 5 is a diagram illustrating control contents of the electron beam irradiation device corresponding to respective operations of the second PD.

Detailed Description

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In addition, the same or corresponding portions in the drawings are denoted by the same reference numerals, and the description thereof will not be repeated.

Fig. 1 is a schematic diagram illustrating a configuration example of an analysis device according to an embodiment of the present invention. The analysis device 100 according to the present embodiment is configured to irradiate a charged particle beam onto a sample, detect a signal generated from the sample, and observe and analyze the sample. The analysis device 100 is, for example, an electron probe microanalyzer (EPMA: electron Probe Micro Analyzer).

Referring to fig. 1, an EPMA 100 according to the present embodiment includes an electron beam irradiation device 50, a first computer 10, a second computer 20, a first display 12, a second display 22, a first pointing device (hereinafter also referred to as a "first PD") 11, and a second pointing device (hereinafter also referred to as a "second PD") 21.

The electron beam irradiation device 50 irradiates an electron beam onto the sample surface, and detects a signal released from the sample surface. The detection signal includes characteristic X-rays, secondary electrons, reflected electrons, and the like having energy unique to the element contained on the sample surface. In EPMA 100, by analyzing the energy and intensity of the detected characteristic X-rays, the elements present at the analysis position on the sample surface can be identified and quantified. The electron beam irradiation apparatus 50 corresponds to one embodiment of a "charged particle beam irradiation apparatus".

In addition, the shape, group imaging, convex-concave shape of the sample surface can be observed based on the detected secondary electrons and reflected electrons. The analyzer can search for an analysis position on the sample surface while observing the secondary electron image or the reflected electron image. Specifically, the analyzer can set the irradiation position of the electron beam on the sample surface (i.e., the measurement position of the sample surface) and specify the analysis target region on the sample surface while observing the electron image.

EPMA generally has the following tendency: the amount of information and the amount of computation to be processed in each of the processes related to the control of the electron beam irradiation device and the processes related to the analysis of the characteristic X-rays detected by the electron beam irradiation device become large. Therefore, the analyzer 100 according to the present embodiment is configured to execute the process related to the control of the electron beam irradiation device 50 and the process related to the analysis of the characteristic X-rays by using different processing units.

Specifically, the first computer 10 is an analysis computer for analyzing characteristic X-rays detected by the electron beam irradiation device 50. The first computer 10 corresponds to one embodiment of a "first processing section". The second computer 20 is a control computer for controlling the electron beam irradiation device 50. The second computer 20 corresponds to one embodiment of a "second processing section".

As shown in fig. 1, the first computer 10 and the second computer 20 are communicably connected. The second computer 20 is also communicably connected to the electron beam irradiation device 50. The second computer 20 generates control signals for controlling the operations of the respective parts of the electron beam irradiation device 50, and outputs the generated control signals to the electron beam irradiation device 50. In addition, the second computer 20 receives signals (characteristic X-rays, secondary electrons, and/or reflected electrons) detected by the electron beam irradiation device 50. The second computer 20 receives secondary electrons and/or reflected electrons from the electron beam irradiation device 50, and generates an observation image (secondary electron image and/or reflected electron image) of the analysis position. In addition, the second computer 20 generates a distribution image (X-ray image) of the element at the analysis position from the position scan of the electron beam at the analysis position of the sample surface.

The first computer 10 receives characteristic X-rays from the second computer 20, and performs qualitative and quantitative analysis of elements contained in an analysis position on the sample surface based on the received characteristic X-rays. Specifically, the first computer 10 creates an X-ray spectrum corresponding to the wavelength scan of the characteristic X-rays, and performs qualitative analysis and quantitative analysis based on the X-ray spectrum.

The EPMA 100 has a display as an output device for providing various information such as the generated observation image and the analysis result to an analyzer. As described above, since the amount of information of each of the processing related to the control of the electron beam irradiation device 50 and the processing related to the analysis of characteristic X-rays is large, 2 displays 12, 22 are used in the present embodiment. The first display 12 is connected to the first computer 10 and has a first display screen 120. The first display 12 constitutes a display section for displaying information of a process related to the analysis of characteristic X-rays. The first display screen 120 displays an X-ray spectrum, and results of qualitative analysis and quantitative analysis based on the X-ray spectrum, and the like.

The second display 22 is connected to the second computer 20 and has a second display 220. The second display 22 constitutes a display section for displaying information of the process related to the control of the electron beam irradiation device 50. The second display screen 220 displays an image (an X-ray image, a secondary electron image, and/or a reflected electron image) to be observed by an analyzer when setting an analysis position of the sample.

As shown in fig. 1, the first display 12 and the second display 22 are arranged in proximity for the operability of an analyst. In the example of fig. 1, the first display screen 120 is disposed on the left side of the paper, and the second display screen 220 is disposed on the right side of the paper.

The first PD 11 is connected to the first computer 10. The first PD 11 is configured to be able to communicate with the first computer 10 and the second computer 20. The first PD 11 constitutes a "first input device" for inputting instructions of an analyst to the first computer 10. The first input device is, for example, a pointing device (hereinafter also referred to as PD), a keyboard, a touch panel, or the like. In the example of fig. 1, the first operation section is a pointing device. The pointing device is for example a mouse, a joystick or a trackball.

The analyzer can read the coordinates of the designated position and perform an input operation to the position by designating the position on the first display screen 120 with the pointer P1 using the first PD 11. As a specific example, icons representing analysis items such as qualitative analysis and quantitative analysis are displayed on the first display screen 120. The analyzer uses the first PD 11 to designate an icon corresponding to a desired analysis item with the pointer P1. The first computer 10 converts the operation input to the first PD 11 into an operation to the pointer P1 displayed on the first display screen 120. Thus, the analyzer can specify analysis items, analysis conditions such as detailed settings of the analysis items, and the like using the first PD 11. The icons are not particularly limited as long as they are images displayed on the first display screen and the second display screen for use in the operation of the analysis device 100 or the analysis (for example, the identification or quantification of a substance) performed by the analysis device 100.

The pointer P1 corresponding to the first PD 11 is configured to: normally, the pointer P1 acts on the first display screen 120, but acts on the second display screen 220 if it moves beyond the end of the first display screen 120 (the right end of the first display screen 120 in fig. 1) to the end of the second display screen 220 (the left end of the second display screen 220 in fig. 1) as indicated by an arrow A1. That is, the pointer P1 functions to virtually connect the right end of the first display screen 120 and the left end of the second display screen 220.

Thus, the analyzer can read the coordinates of the indicated position and perform an input operation to the position by designating the position on the second display screen 200 with the pointer P1 by using the first PD 11. Specifically, icons representing control items to the electron beam irradiation device 50 are displayed on the second display screen 220. The analyzer uses the first PD 11 to designate an icon corresponding to a desired control item with the pointer P1. The first computer 10 converts the operation input to the first PD 11 into the operation to the pointer P1 displayed on the second display screen 220. Thus, the analyst can specify conditions, etc. of desired control items using the first PD 11.

The second PD 21 is connected to the second computer 20. The second PD 21 is configured to be able to communicate with the second computer 20. The second PD 21 constitutes a "second input device" for inputting instructions of an analyst to the second computer 20. The second input device is a pointing device. The pointing device is for example a mouse, a joystick or a trackball. The analyst can input instructions regarding control of the electron beam irradiation device 50 to the second computer 20 using the second PD 21. But pointers corresponding to the second PD 21 are not displayed on the first display screen 120 and the second display screen 220. The second PD 21 will be described in detail later.

Fig. 2 schematically shows a configuration example of the electron beam irradiation device 50 shown in fig. 1.

Referring to fig. 2, the electron beam irradiation apparatus 50 includes an electron gun 1, a deflection yoke 2, an objective lens 3, a sample stage 4, a sample stage driving section 5, a plurality of beam splitters 6a and 6b, a deflection yoke control section 7, and an electron detector 8. The electron gun 1, the deflection yoke 2, the objective lens 3, the sample stage 4, the beam splitters 6a and 6b, and the electron detector 8 are provided in a measuring chamber not shown. In the measurement of X-rays, the measurement chamber is evacuated to a state close to vacuum.

The electron gun 1 is an excitation source for generating an electron beam E to be irradiated onto the sample S on the sample stage 4, and can adjust a beam current of the electron beam E by controlling a converging lens (not shown). The deflection yoke 2 forms a magnetic field by a driving current supplied from the deflection yoke control unit 7. The electron beam E can be deflected by the magnetic field formed by the deflection yoke 2.

The objective lens 3 is provided between the deflection yoke 2 and the sample S placed on the sample stage 4, and reduces the electron beam E passing through the deflection yoke 2 to a minute diameter. The sample stage 4 is a stage for placing the sample S, and is configured such that the sample stage 4 can be moved in a horizontal plane by the sample stage driving section 5.

The electron beam irradiation device 50 can scan the irradiation position of the electron beam E on the sample S two-dimensionally by driving the sample stage 4 by the sample stage driving section 5 and/or driving the deflection yoke 2 by the deflection yoke control section 7. The deflection yoke 2 and/or the sample stage 4 constitute a "scanning unit" for scanning the electron beam E over the sample S. In general, when the scanning range is relatively small, the deflection yoke 2 performs scanning, and when the scanning range is relatively large, the sample stage 4 moves to perform scanning.

The beam splitters 6a and 6b are devices for detecting characteristic X-rays emitted from the sample S irradiated with the electron beam E. In fig. 2, only 2 beam splitters 6a and 6b are shown, but in practice, a total of 4 beam splitters are provided in the electron beam irradiation device 50 so as to surround the sample S. The configuration of each of the optical splitters is the same except for the optical splitter crystal, and hereinafter, each of the optical splitters may be simply referred to as "optical splitter 6".

The spectroscope 6a includes a spectroscope 61a, a detector 63a, and a slit 64a. The electron beam E is irradiated onto the sample S at a position, and the spectroscopic crystal 61a and the detector 63a are arranged on a rowland circle, not shown. The spectroscopic crystal 61a is tilted while being moved on the straight line 62a by a driving mechanism not shown. The detector 63a is rotated as shown by a driving mechanism, not shown, in accordance with the movement of the spectroscopic crystal 61a so that the incidence angle of the characteristic X-ray with respect to the spectroscopic crystal 61a and the exit angle of the diffracted X-ray with respect to the spectroscopic crystal 61a satisfy the bragg diffraction condition. This enables wavelength scanning of characteristic X-rays released from the sample S.

The spectroscope 6b includes a spectroscope 61b, a detector 63b, and a slit 64b. The configuration of the spectroscope 6b and the spectroscope not shown is the same as that of the spectroscope 6a except for the spectroscope crystal, and therefore, description thereof will not be repeated. The configuration of each beam splitter is not limited to the above-described configuration, and various configurations known in the related art can be employed.

The electron detector 8 is a device for detecting electron beams emitted from the sample S irradiated with the electron beam E. The electron detector 8 detects secondary electrons. The detection signal of the electronic detector 8 is sent to the second computer 20.

The reflected electrons are also detected by an electron detector, not shown. The detection signal of the reflected electrons is also sent to the second computer 20.

The deflection coil control unit 7 controls the drive current supplied to the deflection coil 2 in accordance with an instruction from the second computer 20. By controlling the drive current in accordance with a predetermined drive current pattern (magnitude and change speed), the irradiation position of the electron beam E can be scanned on the sample S at a desired scanning speed.

The second computer 20 executes various processes related to control of the electron beam irradiation device 50 according to a built-in program and table. The second computer 20 generates an observation image in the analysis target region in accordance with the position scanning of the electron beam E in the analysis target region on the sample S. Specifically, the second computer 20 generates a secondary electron image of the analysis target region of the sample S based on the secondary electrons detected by the electron detector 8. The second computer 20 generates a distribution image (X-ray image) of the analysis target element in the analysis target region of the sample S based on the characteristic X-rays detected by the 4 spectroscopes 6.

When the first computer 10 receives a wavelength scan of the X-rays to be analyzed from the second computer 20, an X-ray spectrum is created based on the received wavelength scan. The first computer 10 performs qualitative analysis and/or quantitative analysis based on X-ray spectra, etc.

Fig. 3 is a diagram schematically showing the structures of the first computer 10 and the second computer 20.

Referring to fig. 3, the first computer 10 includes a CPU 13, a memory 14, an input interface (hereinafter also referred to as an input I/F) 15, a display controller 16, and a communication interface (hereinafter also referred to as a communication I/F) 17.

The first computer 10 is configured to operate in accordance with a program stored in the memory 14. The Memory 14 includes a ROM (Read Only Memory), a RAM (Random Access Memory: random access Memory), and an HDD (HARD DISK DRIVE: hard disk drive), which are not shown.

The ROM can store programs executed by the CPU 13. The program includes a program related to a process of analyzing characteristic X-rays detected by the electron beam irradiation device 50 and received via the second computer 20. The RAM can function as a temporary data memory that temporarily stores data used in the process of executing a program by the CPU 13 and is used as a work area. The HDD is a nonvolatile storage device, and can store characteristic X-rays received from the second computer 20, analysis results of the characteristic X-rays, and the like. A semiconductor memory device such as a flash memory may be used in addition to or instead of the HDD.

The CPU 13 controls the first computer 10. The CPU 13 expands and executes a program stored in the ROM of the memory 14 in the RAM or the like.

The input I/F15 is connected to the first PD 11. The input I/F15 is an interface for the first computer 10 to communicate with the first PD11, for receiving various signals from the first PD 11.

The display controller 16 is connected to the first display 12. The display controller 16 outputs a signal indicating the display content on the first display screen 120 to the first display 12. In the case where the first display 12 is a display provided with a touch panel, the display controller 16 receives a signal indicating a touch operation by an analyst from the first display 12.

The communication I/F17 is connected to the communication I/F27 of the second computer 20. The communication I/F17 is an interface for the first computer 10 to communicate with the second computer 20, and is used for inputting and outputting various signals to and from the second computer 20.

The first computer 10 is implemented by installing software related to analysis of characteristic X-rays in a computer having a general function and storing dedicated programs and data in the memory 14. Specifically, in the first computer 10, a basic software program called an Operating System (OS) runs at all times. The basic software program is responsible for display on the first display 12, processing of an operation input to the first PD 11, access to the memory 14, and the like, and can perform processing in parallel.

On the other hand, a software program related to the analysis of characteristic X-rays is executed on a basic software program. The software program related to the analysis of characteristic X-rays is supplied from the outside to the memory 14 of the first computer 10, and the supplied program code is read out and executed by the CPU 13 to realize the software program related to the analysis of characteristic X-rays.

The second computer 20 includes a CPU 23, a memory 24, an input I/F25, a display controller 26, and a communication I/F27. The second computer 20 is configured to operate in accordance with a program stored in the memory 24. The memory 24 includes a ROM, a RAM, and an HDD, which are not shown.

The ROM can store programs executed by the CPU 23. The program includes a program for processing related to control of the electron beam irradiation device 50. The RAM can function as a temporary data memory that can temporarily store data used in the process of executing a program by the CPU 23 and can be used as a work area. The HDD is a nonvolatile memory device capable of storing the detection signal generated by the electron beam irradiation device 50 and the information generated by the second computer 20. A semiconductor memory device such as a flash memory may be used in addition to or instead of the HDD.

The CPU 23 controls the whole of the electron beam irradiation device 50 and the analysis device 100. The CPU 23 expands and executes a program stored in the ROM of the memory 24 in the RAM or the like.

The input I/F25 is connected to the second PD 21. The input I/F25 is an interface for the second computer 20 to communicate with the second PD21, and receives various signals from the second PD 21.

The display controller 26 is connected to the second display 22. The display controller 26 outputs a signal for indicating the display content of the second display screen 220 to the second display 22. In the case where the second display 22 is a display provided with a touch panel, the display controller 26 receives a signal indicating a touch operation of the second display screen 220 by the analyst from the second display 22.

The communication I/F27 is connected to the communication I/F17 of the electron beam irradiation device 50 and the first computer 10. The communication I/F27 is an interface for the second computer 20 to communicate with the electron beam irradiation device 50 and the first computer 10, and inputs and outputs various signals to and from the electron beam irradiation device 50 and the first computer 10.

The second PD 21 is a PD dedicated to controlling the electron beam irradiating device 50. The second PD 21 will be described in detail later.

The second computer 20 can be realized by installing software related to control of the electron beam irradiation device 50 in a computer having a general function and storing a dedicated program and data in the memory 24. Specifically, in the second computer 20, a basic software program called OS runs at all times. The basic software program is responsible for display on the second display 22, processing of an operation input to the second PD 21, access to the memory 24, and the like, and can perform processing in parallel.

On the other hand, a software program related to control of the electron beam irradiation device 50 is executed on the basic software program. The software program related to the control of the electron beam irradiation device 50 is supplied from the outside to the memory 24 of the second computer 20, and the supplied program code is read out and executed by the CPU 23 to realize the software program related to the control of the electron beam irradiation device 50.

Fig. 4 is a diagram showing a display example of the first display and the second display and a configuration example of the first PD and the second PD.

Referring to fig. 4, the second display 22 displays information related to control of the electron beam irradiation device 50. The analyst can provide various instructions for controlling the electron beam irradiation device 50 to the second computer 20 based on the display. For example, a numerical value indicating the observation condition of the electron beam irradiation device 50 and an observation image (secondary electron image and/or reflected electron image and X-ray image) can be displayed on the second display screen 220 of the second display 22. In the example of fig. 4, an X-ray image I1, which is an observation image generated based on characteristic X-rays transmitted from the electron beam irradiation device 50 to the second computer 20, and numerical values M1 to M4 indicating observation conditions of the X-ray image I1 are displayed on the second display screen 220. The analyst can adjust the values M1 to M4 while observing the X-ray image I1. Icons 221 to 224 will be described later.

On the other hand, icons 121 to 123 for processing and analyzing characteristic X-rays transmitted from the second computer 20 to the first computer 10, a window W1 showing an analysis result, and an image I2 obtained by performing image processing on the X-ray image I1 displayed on the second display 22 are displayed on the first display screen 120 of the first display 12. The analyzer can select an observation image to be analyzed using the first PD 11, select analysis contents among the icons 121 to 123, and the like, and confirm the analysis and processing results through the window W1, the image I2, and the like. Fig. 4 shows an example in which the image I2 is subjected to a process for improving the contrast of the X-ray image I1 to improve the visibility of the analyst.

As described above, in the sample observation of the analysis apparatus, when the sample S to be observed is changed, the alignment of the sample S, the change of the focal point and the magnification of the electron beam, and the like are performed to control the respective portions of the electron beam irradiation apparatus 50. The information from the electron beam irradiating device 50 is sent to a control computer that controls the electron beam irradiating device 50, and is displayed on the second display 22 for displaying information related to the control. The analyst provides instructions to the second computer 20 regarding the control of the various parts of the electron beam irradiation device 50 based on the information displayed on the second display 22. The second computer 20 reflects the instruction of the analyst to the control of the electron beam irradiation device 50.

Here, since various instructions concerning the control of the electron beam irradiation device 50 by the analyzer are provided every time the sample S is changed, the frequency of providing various instructions is high as compared with other operations. Thus, various indications are preferably made using an input device that is easily accessible to an analyst. As a first typical method of making various indications using such an input device, there are the following methods: icons representing various controls displayed on the second display screen 220 of the second display 22 are operated using a mouse, a keyboard, a display provided with the above-described touch panel, or the like.

Hereinafter, a method of performing various instructions using a mouse will be described. First, a mouse is connected to at least one of a control computer and a computer (for example, an analysis computer) that communicates with the control computer. Then, the analyzer can output an instruction to the control computer by operating the mouse based on the information displayed on the second display 22 to operate the pointer in conjunction with the operation of the mouse. For example, by right clicking a predetermined icon on the second display screen 220, a command for moving the sample stage up and down can be issued. The control computer controls the electron beam irradiating device 50 based on the instruction.

In addition, as in the case of the input of various commands by the mouse, various commands can be input by the keyboard. Wherein the analyst sends a signal or the like to the control computer by pressing a key with a finger on the keyboard, thereby realizing the instruction to the control computer. For example, by simultaneously pressing a predetermined key and a downward arrow, a command for lowering the sample stage can be output.

Or an analyzer touches or lightly presses an icon or the like displayed on the display with a finger, and the control computer converts the operation into a predetermined command, thereby realizing the input of various commands by the display provided with the touch panel. For example, a command for moving the sample stage up and down can be output by touching a predetermined button on the display screen.

As a specific example, fig. 4 shows a configuration in which the first PD 11, which is an analysis PD, is used in combination as a control PD. Icons 221 to 224 for inputting and changing the observation condition of the X-ray image I1 are displayed on the second display screen 220 of the second display 22 in fig. 4. By operating the icons 221 to 224 by using the first PD 11, the analyst can output instructions for performing desired control to the electron beam irradiation device 50. The method of issuing the instruction from the analyzer is not limited to the above example, and may be realized by directly changing the numerical values M1 to M4 using at least one of the first PD 11 and a keyboard not shown, for example. Alternatively, the slider may be operated instead of the values M1 to M4. The following structure may be adopted: the second display 22 is a display provided with a touch panel that can be operated by an analyst, and the analyst touches the display to output instructions to the electron beam irradiation device 50. The values M1-M4 (or sliders) and icons 221-224 correspond to one embodiment of an "icon".

However, in the method of operating icons on a display screen using an input device such as a mouse, a keyboard, or a touch panel as described above, these input devices need to be used in combination with many other operations implemented on the display screen. For example, an input device is used for software other than control of the electron beam irradiation apparatus 50, such as changing a basic setting of a computer and creating a file. Therefore, it is difficult to configure the input device to realize an intuitive operation dedicated to the control of the electron beam irradiating apparatus 50 with a high frequency while being used in combination with many other operations.

Next, as a second typical method of using an input device for various instructions regarding control of the electron beam irradiation apparatus 50, there is a method of using a dedicated input device which has been developed to support control of the electron beam irradiation apparatus 50. Specifically, an operation panel may be provided on the side surface of the electron beam irradiation device 50, and buttons, switches, and the like corresponding to various controls may be arranged on the operation panel. By operating the button, the switch, or the like, the analyst can realize desired control of the electron beam irradiation device 50. Alternatively, as a dedicated input device, a joystick or the like attached to the electron beam irradiation device 50, which is configured to be capable of communicating with the device by wire or the like, may be used.

However, in the method using the dedicated input device attached to the electron beam irradiation apparatus 50 as described above, the operation efficiency may be lowered because the operability may be easily changed depending on the analyst.

Accordingly, in the analyzer 100 according to the present embodiment, the command for controlling the electron beam irradiation device 50 can be input by using the input device according to the preference of the analyzer with a simple configuration, thereby improving the work efficiency of the analyzer.

Referring to fig. 4, the second PD21 is a PD dedicated to the purpose of providing various instructions regarding control of the electron beam irradiation device 50 to the second computer 20. Unlike the first PD 11, the second PD21 does not display a pointer corresponding to the pointing device on the display. The operation input to the second PD21 is converted into a control signal for controlling the electron beam irradiating device 50 in the second computer 20. That is, the second PD21 is different from the first PD 11 in that the second PD21 does not have a function as an original PD. Further, unlike the first PD 11 for inputting instructions to the first computer 10 and the second computer 20, the second PD21 is for inputting instructions only to the second computer 20. The second computer 20 controls the electron beam irradiating device 50 based on the instruction supplied from the second PD 21.

Here, as the second PD 21, a common PD such as a mouse, a joystick, or a trackball can be used. The operability of PD such as a mouse, joystick, and trackball is generally different from each other. The analyst can select a PD that feels good in operability by himself/herself as the second PD 21. These ordinary PDs are readily available to analysts and therefore have the advantage of not expending unnecessary cost and effort for the analysts.

In fig. 4, as the second PD 21, a mouse having a trackball 215, a wheel 216, an L button 213, an R button 214, a button 211, and a button 212 mounted thereon is illustrated. In the present embodiment, the predetermined operations of the above-described portions of the second PD 21 are associated with control of the scanning portion (the deflection yoke 2 and/or the sample stage 4) for driving the electron beam irradiation device 50.

Fig. 5 is a diagram illustrating control contents of the electron beam irradiation device 50 corresponding to respective operations of the second PD 21. Referring to fig. 5, for example, when the trackball 215 is moved, the sample stage 4 (refer to fig. 2) is moved in the horizontal (XY) direction in the direction in which the trackball 215 is moved.

On the other hand, when the roller 216 is rotated, the sample stage 4 moves in the vertical (Z) direction.

The following examples are also shown in fig. 5: control such as focus change, astigmatism correction, and magnification change is performed by operating the respective parts of the second PD 21 (the trackball 215, the scroll wheel 216, the L button 213, and the R button 214 in the table of fig. 5).

When the second PD 21 is operated by an analyzer, the second computer 20 is configured to convert a signal from the second PD 21 into a control signal for the electron beam irradiating apparatus 50 in accordance with the relationship between the operation of the second PD 21 and the control of the electron beam irradiating apparatus 50 shown in fig. 5. The program describing the relationship shown in fig. 5 is stored in advance in the ROM incorporated in the second computer 20.

The method shown in fig. 4 and 5 can directly convert the hand motion of the analyst into the motion of the electron beam irradiation device 50, and therefore has an advantage of being intuitively operable compared to the method of operating the icons 221 to 224 using the first PD 11 and the method of changing the values M1 to M4 using the first PD 11 and/or a keyboard or the like.

On the other hand, consider the following case: the operation with the mouse shown in fig. 4 is intuitively unsuitable according to the analyst. In this case, the analyzer can change the second PD 21 to another PD (for example, a joystick or the like) having better operability in feeling itself. In this case, the analyst can customize the program stored in the ROM of the second computer 20 so that each operation of the PD conforming to his own preference is associated with control of the electron beam irradiation apparatus 50.

As described above, the analyst can control the electron beam irradiation apparatus using the input device having good feeling operability, so that the operability of the analyst can be improved. In addition, since it is not necessary to create a program corresponding to each input device, implementation is easy.

The second computer 20 is configured to be capable of switching between control of the electron beam irradiation device 50 according to a signal from the second PD 21 and control of the electron beam irradiation device 50 according to a signal from the first PD 11 transmitted via the first computer 10. Specifically, when the icons 221 to 224 are operated using the first PD 11, the second computer 20 controls the electron beam irradiation device 50 in accordance with the operation input. On the other hand, when the second PD 21 is operated as illustrated in fig. 5, the second computer 20 controls the electron beam irradiation device 50 in accordance with the operation input. Thus, the analyst can selectively use 2 input devices, and thus can expand the range of operability.

Fig. 1 shows an example of a configuration in which the first PD 11 and the second PD 21 are communicably connected to the first computer 10 and the second computer 20, respectively. However, the connection method of the first PD 11 and the second PD 21 to the computer is not limited to this, and the first PD 11 may transmit signals to the first computer 10 and the second computer 20 in a wired or wireless manner, and the second PD 21 may transmit signals to the second computer 20 in a wired or wireless manner. For example, the following structure may be adopted: the first PD 11 and the second PD 21 are both connected to the first computer 10, and a signal of the second PD 21 is transmitted to the second computer 20 via the first computer 10.

Similarly, the following configuration examples are shown: the first display 12 and the second display 22 are communicably connected to the first computer 10 and the second computer 20, respectively, but the connection method of the first display 12 and the second display 22 to the computer is not limited thereto. The first display 12 may be capable of receiving signals from the first computer 10 in a wired or wireless manner, and the second display 22 may be capable of receiving signals from the second computer 20 in a wired or wireless manner.

In fig. 1, the second computer 20 for controlling the electron beam irradiation device 50 and the first computer 10 for analysis are shown as separate 2 computers. However, the configuration and the number of the second computer 20 and the first computer 10 are not limited to this, and may be any configuration as long as they have a processing unit (second processing unit) that is responsible for processing related to control of the computer and a processing unit (first processing unit) that is responsible for processing related to analysis. For example, the second computer 20 and the first computer 10 may be configured by a processing unit (second processing unit) that is responsible for processing related to control in 1 computer and a processing unit (first processing unit) that is responsible for processing related to analysis. In this case, some of the constituent elements and functions of the first processing section and the second processing section may overlap. The first processing unit and the second processing unit may be virtual drivers, respectively. In this case, the following structure can be adopted: both the first PD 11 and the second PD 21 are connected to a computer responsible for both control and analysis in a wired or wireless manner.

Similarly, the second control display 22 and the first analysis display 12 may be any of a portion for displaying control information and a portion for displaying analysis information. For example, the control second display 22 and the analysis first display 12 may be an integrated single display. Similarly, the first display screen 120 and the second display screen 220 are not limited to 2 screens, and may be 2 display areas of 1 display. The first display screen 120 and the second display screen 220 correspond to a "first display area" and a "second display area", respectively. In addition, the first display 12 and the second display 22 correspond to "displays".

The above-described embodiments are examples, and can be modified as appropriate according to the gist of the present invention. Specifically, in the above embodiment, EPMA is exemplified as the analysis device, but instead of the electron beam, an ion beam may be used as the excitation source. In the above embodiment, the following configuration is adopted: the secondary electrons and the reflected electrons are detected to produce a secondary electron image and a reflected electron image, and a characteristic X-ray is detected to generate a two-dimensional distribution image (X-ray image) of a specific element, but other signals (for example, fluorescence) can be detected as a signal for generating an observation image, and the configuration of the present invention can be used in various scanning type charged particle microscopes.

The presently disclosed embodiments are considered in all respects as illustrative and not restrictive. The scope of the invention is shown not by the above description but by the claims, and encompasses all modifications within the meaning and scope equivalent to the claims.

Description of the reference numerals

1: An electron gun; 2: a deflection yoke; 3: an objective lens; 4: a sample stage; 5: a sample stage driving unit; 6. 6a, 6b: a beam splitter; 7: a deflection coil control unit; 8: an electronic detector; 10: a first computer (first processing unit); 12: a first display; 14. 24: a memory; 15. 25: an input interface (input I/F); 16. 26: a display controller; 17. 27: a communication interface (communication I/F); 20: a second computer (second processing unit); 22: a second display; 50: an electron beam irradiation device; 61a, 61b: a spectroscopic crystal; 63a, 62b: a detector; 64a, 64b: a slit; 100: an analysis device; 120: a first display screen; 121 to 123, 221 to 224: an icon; 221 to 214: a button; 215: a track ball; 216: a roller; 220: a second display screen; e: an electron beam; i1: an X-ray image; i2: an image; p1: a pointer; s: a sample; w1: a window.

Claims (6)

1. An analysis device is provided with:

a charged particle beam irradiation device configured to irradiate a sample with a charged particle beam and detect a signal released from the sample;

A first processing unit configured to be communicable with a first input device, and configured to analyze the sample based on a detection signal of the charged particle beam irradiation apparatus in accordance with an analysis condition specified by the first input device;

A second processing unit configured to be communicable with a second input device and the first processing unit, and configured to generate an observation image of the sample based on a detection signal of the charged particle beam irradiation apparatus, and to control the charged particle beam irradiation apparatus based on a signal from the second input device;

A first display configured to be communicable with the first processing unit, for displaying an icon for indicating the analysis condition; and

A second display configured to be communicable with the second processing section, for displaying the observation image generated by the second processing section and an icon for controlling the charged particle beam irradiation apparatus,

Wherein the first input device is configured to be able to accept an operation input for operating an icon displayed on the first display and an icon displayed on the second display,

The second input device comprises a control pointing device dedicated to control of the charged particle beam irradiation apparatus,

The second processing unit converts an operation input to the control pointing device into a control signal to the charged particle beam irradiation apparatus.

2. The apparatus according to claim 1, wherein,

The charged particle beam irradiation apparatus includes a scanning section configured to scan the charged particle beam in an analysis target region on the sample,

The control pointing device is configured to be able to accept a plurality of operation inputs,

The second processing section is configured to convert the plurality of operation inputs into control signals to the scanning section.

3. The analysis device according to claim 2, wherein,

The plurality of operation inputs are inputs by respective actions of a plurality of actions for controlling the scanner section applied to the control pointing device,

The second processing unit converts the plurality of operation inputs into control signals to the scanner unit in a state where neither the first display nor the second display displays a pointer corresponding to the control pointing device.

4. The analysis device according to any one of claim 1 to 3, wherein,

The first input device includes an operation pointing device for operating icons displayed on the first display and the second display,

Pointers corresponding to the operation indication devices can be displayed on the first display and the second display,

When a pointer corresponding to the operation instruction device is displayed on the first display, the first processing unit converts an operation input to the operation instruction device into an operation to the pointer displayed on the first display, converts an operation to the pointer displayed on the first display into an operation to an icon displayed on the first display,

When the pointer corresponding to the operation instruction device moves to the second display beyond the end of the first display, the first processing unit converts an operation input to the operation instruction device into an operation on the pointer displayed on the second display, and converts an operation on the pointer displayed on the second display into an operation on the icon displayed on the second display.

5. The analysis device according to claim 2, wherein,

The second processing unit is configured to change a correspondence between each of the plurality of operation inputs and a control signal to the scanning unit.

6. The apparatus according to claim 1, wherein,

The second processing unit is configured to: the control of the charged particle beam irradiation apparatus according to the signal from the second input device and the control of the charged particle beam irradiation apparatus according to the signal from the first input device transmitted via the first processing unit can be switched.