CN113492118A - Ten-grade wiping cloth purifying and cleaning process for semiconductor - Google Patents
Ten-grade wiping cloth purifying and cleaning process for semiconductor Download PDFInfo
- Publication number
- CN113492118A CN113492118A CN202110759926.9A CN202110759926A CN113492118A CN 113492118 A CN113492118 A CN 113492118A CN 202110759926 A CN202110759926 A CN 202110759926A CN 113492118 A CN113492118 A CN 113492118A
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- cleaning
- rod
- wiping cloth
- adjusting
- purifying
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- 238000004140 cleaning Methods 0.000 title claims abstract description 115
- 239000004744 fabric Substances 0.000 title claims abstract description 70
- 239000004065 semiconductor Substances 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims abstract description 20
- 230000008569 process Effects 0.000 title claims abstract description 18
- 230000007246 mechanism Effects 0.000 claims abstract description 32
- 230000001680 brushing effect Effects 0.000 claims abstract description 19
- 230000000694 effects Effects 0.000 claims abstract description 6
- 238000005096 rolling process Methods 0.000 claims description 43
- 238000003825 pressing Methods 0.000 claims description 32
- 238000000746 purification Methods 0.000 claims description 31
- 230000005540 biological transmission Effects 0.000 claims description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 238000001125 extrusion Methods 0.000 claims description 10
- 238000002347 injection Methods 0.000 claims description 6
- 239000007924 injection Substances 0.000 claims description 6
- 230000009471 action Effects 0.000 claims description 4
- 239000012459 cleaning agent Substances 0.000 claims description 3
- 238000004804 winding Methods 0.000 claims description 3
- 239000012535 impurity Substances 0.000 abstract description 6
- 238000005406 washing Methods 0.000 description 8
- 239000007788 liquid Substances 0.000 description 4
- 238000010926 purge Methods 0.000 description 4
- 230000000087 stabilizing effect Effects 0.000 description 4
- 239000000428 dust Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 241000220317 Rosa Species 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000010865 sewage Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
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- Cleaning In General (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a ten-grade wiping cloth purifying and cleaning process for a semiconductor, and particularly relates to the technical field of ten-grade wiping cloth purifying and cleaning processes, wherein the ten-grade wiping cloth purifying and cleaning process comprises a cleaning box, two groups of adjusting and cleaning mechanisms are arranged on one side of the cleaning box, and a brushing mechanism is arranged between the two groups of adjusting and cleaning mechanisms; according to the invention, through arranging the brushing mechanism and the adjusting and cleaning mechanism, the back-and-forth brushing of the upper brushing plate and the lower brushing plate is realized, so that the brushing efficiency is improved, the impurity removing effect is better, the operation is simple, the use is easy, the cleaning cost is effectively reduced, the practicability is better, the upper side surface and the lower side surface of the ten-grade wiping cloth are more attached, the brushing friction force is increased, the tightening degree of the ten-grade wiping cloth in the cleaning process is improved, the cloth cleaning device is suitable for the cleaning operation of the ten-grade wiping cloth with different thicknesses, and the cleaning applicability is improved.
Description
Technical Field
The invention relates to the technical field of ten-level wiping cloth purification and cleaning processes, in particular to a ten-level wiping cloth purification and cleaning process for a semiconductor.
Background
The semiconductor refers to a material with electric conductivity between the conductor and the insulator at normal temperature, and has wide application in radio, television and temperature measurement, for example, the diode is a device made of the semiconductor, and the semiconductor needs to use ten-grade wiping cloth to wipe in the production process, and the ten-grade wiping cloth needs to use a cleaning process to remove impurities and dust on the surface of the wiping cloth in the production and manufacturing process.
Among the prior art, carrying out the cleaning process in-process to ten grades of wiping cloth, need cross the water and carry out running roller cleaning process operation, abluent impurity and dust can not be handled fast under such handling condition, and can't adjust to the dozens of wiping cloth of different thickness, and the elasticity in the cleaning process is adjusted more troublesome, has reduced the cleaning performance, improves and washs the cost, and the practicality is poor.
Disclosure of Invention
In order to overcome the defects in the prior art, the embodiment of the invention provides a purification and cleaning process for ten-grade wiping cloth for a semiconductor, and the brushing mechanism and the cleaning mechanism are arranged to realize the back-and-forth brushing of the upper brush plate and the lower brush plate, so that the brushing efficiency can be improved, the speed is higher, the impurity removing effect is better, the operation is simple, the use is easy, the cleaning cost is effectively reduced, the practicability is better, and the tightening degree of the ten-grade wiping cloth in the cleaning process is improved, so that the problems in the background art are solved.
In order to achieve the purpose, the invention provides the following technical scheme: the utility model provides a ten grades of wiping cloth purification belt cleaning device for semiconductor, is including wasing the case, its characterized in that: two groups of adjusting and cleaning mechanisms are arranged on one side of the cleaning box, and a brushing mechanism is arranged between the two groups of adjusting and cleaning mechanisms;
the adjusting and cleaning mechanism comprises a supporting block arranged on one side of the cleaning box, the top end of the supporting block is connected with an adjusting cylinder, the pushing end of the adjusting cylinder is connected with a pushing rod, the top end of the pushing rod is connected with a pushing block, one side of the pushing block is connected with an adjusting concave frame, a bottom rolling limiting shaft lever is arranged inside the adjusting concave frame, a top rolling limiting shaft lever is arranged above the bottom rolling limiting shaft lever, a lower pressing shaft ring block is sleeved outside one end of the top rolling limiting shaft lever, and a lower pressing cylinder is arranged at the top end of the lower pressing shaft ring block;
brush moving mechanism is including setting up wash the support concave frame of case opposite side, support the inside transmission lead screw that is provided with of concave frame, transmission lead screw one end is connected with the rotary rod, servo motor is installed to rotary rod one end, the outside cover of transmission lead screw is equipped with the screw ring, screw ring top is connected with the removal extension board, it is connected with horizontal backup pad to remove the extension board top, horizontal backup pad one side is connected with the extrusion cylinder, extrusion cylinder promotion end is connected with the movable rod, the movable rod bottom is connected with pushes down concave frame, it is connected with the brush board to push down concave frame bottom, it is provided with down the brush board to go up brush board bottom, brush board one side is connected with the linkage piece down, the linkage piece top is connected with tensile pole.
In a preferred embodiment, a downstream electric valve pipe is connected to the bottom end of the cleaning tank, a filter tank is mounted at the bottom end of the downstream electric valve pipe, a filter screen is arranged inside the filter tank, a filter element is mounted at the bottom end of the filter screen, a return pipe is embedded in the bottom end of the filter tank, a return pump is mounted at one end of the return pipe, a guide pipe is connected to the output end of the return pump, a transverse injection pipe is connected to one end of the guide pipe, a circulation pipe is connected to one side of the downstream electric valve pipe, an electric control valve is mounted at the bottom end of the circulation pipe, and an access pipe is mounted at the bottom end of the electric control valve.
In a preferred embodiment, a purification box is installed on one side of the cleaning box, a first purification roller is arranged inside the purification box, a second purification roller is arranged on one side of the first purification roller, a stretching cylinder is arranged at the top end of the stretching rod, a first roller is arranged on one side of the linkage block, and a second roller is arranged on the other side of the lower brush plate.
In a preferred embodiment, the bottom end of the purge tank is provided with a discharge valve pipe, and the discharge valve pipe is communicated with the purge tank.
In a preferred embodiment, a fixing support rod is connected to one side of the servo motor, and the fixing support rod is fixedly connected with the servo motor.
In a preferred embodiment, the adjusting concave frame is movably connected with the bottom rolling limiting shaft rod, and the outer part of one end of the top rolling limiting shaft rod is movably connected with the lower pressing shaft ring block.
In a preferred embodiment, two ends of the rotating rod are respectively and fixedly connected with the output ends of the transmission screw rod and the servo motor in pairs, and the outside of the transmission screw rod is connected with the threaded ring through threads.
In a preferred embodiment, the first roller is movably connected with one side of the inner wall of the cleaning box, and the second roller is movably connected with the inner wall of the cleaning box and is located at the other side of the lower brush plate.
A purification and cleaning process of a ten-grade wiping cloth purification and cleaning device for a semiconductor specifically comprises the following steps:
step one, when cloth is installed, pouring mixed water with a cleaning agent into a cleaning box, enabling cleaned ten-level wiping cloth to pass through a first group of adjusting and cleaning mechanisms, pulling the ten-level wiping cloth to enter the bottom of a first roller, enabling the ten-level wiping cloth to enter a position between an upper brush plate and a lower brush plate through a second roller, enabling the ten-level wiping cloth to pass through a second group of adjusting and cleaning mechanisms, enabling the ten-level wiping cloth to be located between a bottom rolling limiting shaft rod and a top rolling limiting shaft rod, and enabling the ten-level wiping cloth to enter a purification box and pass through the bottom of a first purification roller and the bottom of a second purification roller;
step two, during adjustment, the lower pressing cylinder is started to drive the lower pressing shaft collar block to move downwards, the lower pressing shaft collar block drives the top rolling limiting shaft lever to move downwards, so that the bottom rolling limiting shaft lever and the top rolling limiting shaft lever can extrude the ten-stage wiping cloth to a certain extent, then the adjusting cylinder is started to drive the pushing rod to move upwards, the pushing rod drives the pushing block to move upwards, the pushing block drives the adjusting concave frame to move upwards, so that the wiping cleaning cloth starts to be tightened, and the tightness is adjusted;
step three, during cleaning, an extrusion cylinder is started to drive a movable rod to move downwards, the movable rod drives a lower concave frame to move downwards, the lower concave frame drives an upper brush plate to move downwards, meanwhile, a stretching cylinder is started to drive a stretching rod to move upwards, the stretching rod drives a linkage block to move upwards, the linkage block drives a lower brush plate to move upwards, so that ten-grade wiping cloth is extruded, a winding device is used for driving the ten-grade wiping cloth to move slowly, then a servo motor is started to drive a rotating rod to rotate, the rotating rod drives a transmission lead screw to rotate, the transmission lead screw drives a threaded ring to move under the action of threads, the threaded ring drives a moving support plate to move a transverse support plate, back and forth movement of the upper brush plate and the lower brush plate is realized through positive and negative rotation of the servo motor, and cleaned ten-grade wiping cloth is purified through a clean water source in a purification box, thereby cleaning and purifying the effect.
The invention has the technical effects and advantages that:
1. by arranging the brushing mechanism, the lower pressing concave frame drives the upper brush plate to move downwards, the stretching cylinder drives the stretching rod to move upwards, the stretching rod drives the linkage block to move upwards, the linkage block drives the lower brush plate to move upwards, the ten-grade wiping cloth is extruded, the upper side surface and the lower side surface of the ten-grade wiping cloth are more attached, the brushing friction force is increased, the transmission lead screw drives the threaded ring to move under the action of the threads, the transverse support plate is moved by moving the support plate, and the back-and-forth brushing of the upper brush plate and the lower brush plate is realized through the positive and negative rotation of the servo motor, so that the brushing efficiency can be improved, the speed is higher, the impurity removing effect is better, the operation is simple, the use is easy, the cleaning cost is effectively reduced, and the practicability is better;
2. by arranging the adjusting and cleaning mechanism, the bottom rolling limiting shaft rod and the top rolling limiting shaft rod extrude the ten-grade wiping cloth to a certain extent, the pushing rod drives the pushing block to move upwards, the pushing block drives the adjusting concave frame to move upwards, so that the wiping and cleaning cloth starts to be tightened, the tightness is adjusted, the tightening degree of the ten-grade wiping cloth in the cleaning process can be improved, the friction force is increased in the brushing process, impurities and dust are better removed, the distance between the bottom rolling limiting rod and the top rolling limiting rod can be adjusted, the ten-grade wiping cloth cleaning device is suitable for cleaning operation of the ten-grade wiping cloth with different thicknesses, and the cleaning applicability is improved;
3. close down the electric valve pipe that flows and open electric control valve, start the reflux pump machine, make the water source that washs incasement portion and have the washing liquid enter into the circulating pipe, enter into the guiding pipe through inserting the pipe, spray the washing incasement along horizontal injection pipe, can make the washing liquid mix fast like this, and treat the washing back that finishes, can open the electric valve pipe that closes down flow, thereby make sewage enter into the rose box, once filter through the filter screen, carry out secondary filter through the filter core again, can circulate the circulating water after filtering like this, effectively practice thrift the water source, environmental protection more.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention.
Fig. 2 is a schematic side-view perspective structure of the present invention.
FIG. 3 is a schematic view of a cross-sectional structure of a portion of the connection between the cleaning tank and the concave supporting frame according to the present invention.
FIG. 4 is a schematic cross-sectional view of the cleaning tank and the filtering tank according to the present invention.
Fig. 5 is an enlarged schematic view of a portion a in fig. 1 according to the present invention.
Fig. 6 is an enlarged schematic view of the structure at B in fig. 1 according to the present invention.
Fig. 7 is an enlarged view of the structure of fig. 4C according to the present invention.
The reference signs are: 1. a cleaning tank; 2. a support block; 3. an adjusting cylinder; 4. a push rod; 5. a pushing block; 6. adjusting the concave frame; 7. a bottom rolling limit shaft lever; 8. a top rolling limit shaft lever; 9. pressing down the collar block; 10. pressing down the air cylinder; 11. supporting the concave frame; 12. a transmission screw rod; 13. rotating the rod; 14. a servo motor; 15. a threaded ring; 16. moving the support plate; 17. a transverse support plate; 18. an extrusion cylinder; 19. A movable rod; 20. pressing the concave frame downwards; 21. an upper brush plate; 22. a lower brush plate; 23. a linkage block; 24. a stretch rod; 25. stretching the cylinder; 26. a first roller; 27. a second roller; 28. a downstream electrically operated valve tube; 29. A filter box; 30. a filter screen; 31. stabilizing the supporting rod; 32. a filter element; 33. a return pipe; 34. a reflux pump machine; 35. a flow guide pipe; 36. a transverse injection pipe; 37. a circulation pipe; 38. an electrically controlled valve; 39. an access pipe; 40. a purification box; 41. a first purge roller; 42. a second purge roller; 43. a discharge valve tube.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The ten-grade wiping cloth purifying and cleaning device for the semiconductor comprises a cleaning box 1, wherein two groups of adjusting and cleaning mechanisms are arranged on one side of the cleaning box 1, and a brushing mechanism is arranged between the two groups of adjusting and cleaning mechanisms;
the adjusting and cleaning mechanism comprises a supporting block 2 arranged on one side of the cleaning box 1, the top end of the supporting block 2 is connected with an adjusting cylinder 3, the pushing end of the adjusting cylinder 3 is connected with a pushing rod 4, the top end of the pushing rod 4 is connected with a pushing block 5, one side of the pushing block 5 is connected with an adjusting concave frame 6, a bottom rolling limiting shaft rod 7 is arranged inside the adjusting concave frame 6, a top rolling limiting shaft rod 8 is arranged above the bottom rolling limiting shaft rod 7, a pressing collar block 9 is sleeved outside one end of the top rolling limiting shaft rod 8, and a pressing cylinder 10 is arranged at the top end of the pressing collar block 9;
brush moving mechanism is including setting up the concave frame 11 of support at washing case 1 opposite side, support the inside transmission lead screw 12 that is provided with of concave frame 11, transmission lead screw 12 one end is connected with rotary rod 13, servo motor 14 is installed to rotary rod 13 one end, the outside cover of transmission lead screw 12 is equipped with screw ring 15, 15 tops of screw ring are connected with removal extension board 16, it is connected with horizontal backup pad 17 to remove extension board 16 top, horizontal backup pad 17 one side is connected with extrusion cylinder 18, extrusion cylinder 18 promotion end is connected with movable rod 19, the movable rod 19 bottom is connected with pushes down concave frame 20, it is connected with brush board 21 to push down concave frame 20 bottom, it is provided with down brush board 22 to go up brush board 21 bottom, brush board 22 one side is connected with linkage block 23 down, linkage block 23 top is connected with tensile pole 24.
As shown in fig. 2 and 4, the bottom end of the cleaning tank 1 is connected with a downstream electric valve pipe 28, the bottom end of the downstream electric valve pipe 28 is provided with a filter tank 29, the inside of the filter tank 29 is provided with a filter screen 30, the bottom end of the filter screen 30 is provided with a filter element 32, the bottom end of the filter tank 29 is embedded with a return pipe 33, one end of the return pipe 33 is provided with a return pump 34, the output end of the return pump 34 is connected with a guide pipe 35, one end of the guide pipe 35 is connected with a transverse injection pipe 36, one side of the downstream electric valve pipe 28 is connected with a circulating pipe 37, the bottom end of the circulating pipe 37 is provided with an electric control valve 38, the bottom end of the electric control valve 38 is provided with an access pipe 39, so that when in use, the downstream electric valve pipe 28 is closed, the electric control valve 38 is opened, the return pump 34 is started, a water source with cleaning liquid inside the cleaning tank 1 enters the circulating pipe 37, enters the access pipe 39 and enters the guide pipe 35 through the access pipe 39, enter into horizontal injection pipe 36 along honeycomb duct 35 in, spray in washing case 1, can make the washing liquid mix fast like this to after finishing washing, can open the electric valve pipe 38 that closes of downflow 28, thereby make sewage enter into rose box 29, carry out once through filter screen 30 and filter, carry out secondary filter through filter core 32 again, can recycle the circulating water after filtering like this.
As shown in fig. 1 and 2, a cleaning box 40 is installed at one side of the cleaning box 1, a first cleaning roller 41 is installed inside the cleaning box 40, a second cleaning roller 42 is installed at one side of the first cleaning roller 41, a stretching cylinder 25 is installed at the top end of the stretching rod 24, a first roller 26 is installed at one side of the linkage block 23, and a second roller 27 is installed at the other side of the lower brush plate 22, so that ten-level wiping cloths can be placed at the bottom of the lower brush plate through the first cleaning roller 41 and the second cleaning roller 42, thereby performing a cleaning function.
As shown in fig. 2, a discharge valve pipe 43 is provided at the bottom end of the purification tank 40, and the discharge valve pipe 43 communicates with the purification tank 40 so that the discharge valve pipe 43 can be opened to discharge the contaminated water after the purification is completed through the discharge valve pipe 43.
As shown in fig. 6, a stabilizing support rod 31 is connected to one side of the servo motor 14, and the stabilizing support rod 31 is fixedly connected to the servo motor 14, so that the stabilizing support rod 31 can support and stabilize the servo motor 14, and the stable operation of the servo motor 14 is maintained.
As shown in fig. 5, the adjusting concave frame 6 is movably connected with the bottom rolling limiting shaft rod 7, and the outside of one end of the top rolling limiting shaft rod 8 is movably connected with the lower pressing shaft ring block 9, so that both the bottom rolling limiting shaft rod 7 and the top rolling limiting shaft rod 8 can rotate.
As shown in fig. 3, two ends of the rotating rod 13 are respectively fixedly connected with the output ends of the transmission screw rod 12 and the servo motor 14, and the outside of the transmission screw rod 12 is connected with the threaded ring 15 through threads, so that the servo motor 14 is started to drive the rotating rod 13 to rotate, the rotating rod 13 drives the transmission screw rod 12 to rotate, and the transmission screw rod 12 drives the threaded ring 15 to rotate.
As shown in fig. 1, 4 and 7, the first roller 26 is movably connected to one side of the inner wall of the cleaning tank 1, and the second roller 27 is movably connected to the inner wall of the cleaning tank 1 at a position at the other side of the lower brush plate 22, so that both the first roller 26 and the second roller 27 can rotate on the inner wall of the cleaning tank 1.
A purification and cleaning process of a ten-grade wiping cloth purification and cleaning device for a semiconductor specifically comprises the following steps:
step one, when cloth is installed, pouring mixed water with a cleaning agent into a cleaning box 1, enabling cleaned ten-level wiping cloth to pass through a first group of adjusting and cleaning mechanisms, pulling the ten-level wiping cloth to enter the bottom of a first roller 26, enabling the ten-level wiping cloth to enter a position between an upper brush plate 21 and a lower brush plate 22 through a second roller 27, enabling the ten-level wiping cloth to pass through a second group of adjusting and cleaning mechanisms, enabling the ten-level wiping cloth to be located between a bottom rolling limiting shaft rod 7 and a top rolling limiting shaft rod 8, and enabling the ten-level wiping cloth to enter a purifying box 40 and pass through the bottom of a first purifying roller 41 and the bottom of a second purifying roller 42;
step two, during adjustment, a pressing cylinder 10 is started to drive a pressing shaft ring block 9 to move downwards, the pressing shaft ring block 9 drives a top rolling limiting shaft rod 8 to move downwards, so that a bottom rolling limiting shaft rod 7 and the top rolling limiting shaft rod 8 can extrude ten-stage wiping cloth to a certain extent, then an adjusting cylinder 3 is started to drive a pushing rod 4 to move upwards, the pushing rod 4 drives a pushing block 5 to move upwards, the pushing block 5 drives an adjusting concave frame 6 to move upwards, so that the wiping cleaning cloth starts to be tightened, and the tightness is adjusted;
step three, during cleaning, the extrusion cylinder 18 is started to drive the movable rod 19 to move downwards, the movable rod 19 drives the lower concave pressing frame 20 to move downwards, the lower concave pressing frame 20 drives the upper brush plate 21 to move downwards, meanwhile, the stretching cylinder 25 is started to drive the stretching rod 24 to move upwards, the stretching rod 24 drives the linkage block 23 to move upwards, the linkage block 23 drives the lower brush plate 22 to move upwards, so that ten-grade wiping cloths are extruded, the winding equipment is used for driving the ten-grade wiping cloths to move slowly, then the servo motor 14 is started to drive the rotary rod 13 to rotate, the rotary rod 13 drives the transmission screw rod 12 to rotate, the transmission screw rod 12 drives the threaded ring 15 to move under the action of threads, the threaded ring 15 drives the movable support plate 16 to move the transverse support plate 17, and the upper brush plate 21 and the lower brush plate 22 are brushed back and forth through the forward rotation and reverse rotation of the servo motor 14, the clean ten-stage wipes are purified by passing them through a clean water source inside the purification tank 40.
The working principle of the invention is as follows: when cloth is installed, the ten-level cleaning cloth passes through the first group of adjusting and cleaning mechanisms, is pulled to enter the bottom of the second roller 27, enters between the upper brush plate 21 and the lower brush plate 22 through the second roller, passes through the second group of adjusting and cleaning mechanisms, and is finally installed inside the purifying box 40;
during adjustment, the bottom rolling limiting shaft rod 7 and the top rolling limiting shaft rod 8 extrude ten-grade wiping cloth to a certain extent, the adjusting cylinder 3 drives the pushing rod 4 to move upwards, and the pushing rod 4 drives the pushing block 5 to move upwards, so that the wiping and cleaning cloth can be tightened, and the tightness is adjusted;
during cleaning, the lower concave pressing frame 20 drives the upper brush plate 21 to move downwards, meanwhile, the stretching cylinder 25 is started to drive the stretching rod 24 to move upwards, the stretching rod 24 drives the linkage block 23 to move upwards, the linkage block 23 drives the lower brush plate 22 to move upwards, the transmission screw rod 12 drives the threaded ring 15 to enable the movable support plate 16 to drive the transverse support plate 17 to move in a threaded mode, and the upper brush plate 21 and the lower brush plate 22 are brushed back and forth through forward and reverse rotation of the servo motor 14.
The points to be finally explained are: first, in the description of the present application, it should be noted that, unless otherwise specified and limited, the terms "mounted," "connected," and "connected" should be understood broadly, and may be a mechanical connection or an electrical connection, or a communication between two elements, and may be a direct connection, and "upper," "lower," "left," and "right" are only used to indicate a relative positional relationship, and when the absolute position of the object to be described is changed, the relative positional relationship may be changed;
secondly, the method comprises the following steps: in the drawings of the disclosed embodiments of the invention, only the structures related to the disclosed embodiments are referred to, other structures can refer to common designs, and the same embodiment and different embodiments of the invention can be combined with each other without conflict;
and finally: the above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that are within the spirit and principle of the present invention are intended to be included in the scope of the present invention.
Claims (9)
1. The utility model provides a ten grades of wiping cloth purification belt cleaning device for semiconductor, is including wasing case (1), its characterized in that: two groups of adjusting and cleaning mechanisms are arranged on one side of the cleaning box (1), and a brushing mechanism is arranged between the two groups of adjusting and cleaning mechanisms;
the adjusting and cleaning mechanism comprises a supporting block (2) arranged on one side of the cleaning box (1), the top end of the supporting block (2) is connected with an adjusting cylinder (3), the pushing end of the adjusting cylinder (3) is connected with a pushing rod (4), the top end of the pushing rod (4) is connected with a pushing block (5), one side of the pushing block (5) is connected with an adjusting concave frame (6), a bottom rolling limiting shaft rod (7) is arranged inside the adjusting concave frame (6), a top rolling limiting shaft rod (8) is arranged above the bottom rolling limiting shaft rod (7), a lower pressing shaft ring block (9) is sleeved outside one end of the top rolling limiting shaft rod (8), and a lower pressing cylinder (10) is arranged on the top end of the lower pressing shaft ring block (9);
the brushing mechanism comprises a supporting concave frame (11) arranged at the other side of the cleaning box (1), a transmission screw rod (12) is arranged inside the supporting concave frame (11), one end of the transmission screw rod (12) is connected with a rotary rod (13), one end of the rotary rod (13) is provided with a servo motor (14), a thread ring (15) is sleeved outside the transmission screw rod (12), the top end of the thread ring (15) is connected with a movable support plate (16), the top end of the movable support plate (16) is connected with a transverse support plate (17), one side of the transverse support plate (17) is connected with an extrusion cylinder (18), the pushing end of the extrusion cylinder (18) is connected with a movable rod (19), the bottom end of the movable rod (19) is connected with a lower pressing concave frame (20), the bottom end of the lower pressing concave frame (20) is connected with an upper brush plate (21), and the bottom of the upper brush plate (21) is provided with a lower brush plate (22), one side of the lower brush plate (22) is connected with a linkage block (23), and the top end of the linkage block (23) is connected with a stretching rod (24).
2. The ten-grade wiping cloth purifying and cleaning device for the semiconductor according to claim 1, characterized in that: the cleaning device is characterized in that a lower flow electric valve pipe (28) is connected to the bottom end of the cleaning box (1), a filter box (29) is installed at the bottom end of the lower flow electric valve pipe (28), a filter screen (30) is arranged inside the filter box (29), a filter core (32) is installed at the bottom end of the filter screen (30), a return pipe (33) is embedded into the bottom end of the filter box (29), a return pump (34) is installed at one end of the return pipe (33), a guide pipe (35) is connected to the output end of the return pump (34), a transverse injection pipe (36) is connected to one end of the guide pipe (35), a circulating pipe (37) is connected to one side of the lower flow electric valve pipe (28), an electric control valve (38) is installed at the bottom end of the circulating pipe (37), and an access pipe (39) is installed at the bottom end of the electric control valve (38).
3. The ten-grade wiping cloth purifying and cleaning device for the semiconductor according to claim 1, characterized in that: wash case (1) one side and install purifying box (40), purifying box (40) inside is provided with first purification running roller (41), first purification running roller (41) one side is provided with second purification running roller (42), tensile pole (24) top is provided with tensile cylinder (25), linkage piece (23) one side is provided with first gyro wheel (26), brush board (22) another is provided with second gyro wheel (27) down.
4. The ten-grade wiping cloth purifying and cleaning device for the semiconductor according to claim 3, characterized in that: the bottom end of the purification box (40) is provided with a discharge valve pipe (43), and the discharge valve pipe (43) is communicated with the purification box (40).
5. The ten-grade wiping cloth purifying and cleaning device for the semiconductor according to claim 1, characterized in that: servo motor (14) one side is connected with firm branch (31), firm branch (31) with fixed connection between servo motor (14).
6. The ten-grade wiping cloth purifying and cleaning device for the semiconductor according to claim 1, characterized in that: the adjusting concave frame (6) is movably connected with the bottom rolling limiting shaft rod (7), and the outer part of one end of the top rolling limiting shaft rod (8) is movably connected with the lower pressing shaft ring block (9).
7. The ten-grade wiping cloth purifying and cleaning device for the semiconductor according to claim 1, characterized in that: the two ends of the rotating rod (13) are respectively fixedly connected with the transmission screw rod (12) and the output end of the servo motor (14) in a pairwise mode, and the outside of the transmission screw rod (12) is connected with the threaded ring (15) through threads.
8. The ten-grade wiping cloth purifying and cleaning device for the semiconductor according to claim 1, characterized in that: the first idler wheel (26) is movably connected with one side of the inner wall of the cleaning box (1), and the second idler wheel (27) is movably connected with the inner wall of the cleaning box (1) and is positioned at the other side of the lower brush plate (22).
9. The ten-grade wiping cloth purifying and cleaning device for the semiconductor according to any one of claims 1 to 8, characterized in that: the cleaning process of the device for cleaning and purifying the semiconductor by using the ten-grade wiping cloth also comprises the following specific using steps:
firstly, pouring mixed water with a cleaning agent into a cleaning box (1) when cloth is installed, enabling cleaned ten-level wiping cloth to pass through a first group of adjusting and cleaning mechanisms, pulling the ten-level wiping cloth to enter the bottom of a first roller (26), entering a position between an upper brush plate (21) and a lower brush plate (22) through a second roller (27), then passing through a second group of adjusting and cleaning mechanisms, enabling the ten-level wiping cloth to be located between a bottom rolling limiting shaft rod (7) and a top rolling limiting shaft rod (8), and then entering a purification box (40) to pass through the bottom of a first purification roller (41) and the bottom of a second purification roller (42);
step two, during adjustment, a lower pressing cylinder (10) is started to drive a lower pressing shaft ring block (9) to move downwards, the lower pressing shaft ring block (9) drives a top rolling limiting shaft rod (8) to move downwards, so that a bottom rolling limiting shaft rod (7) and the top rolling limiting shaft rod (8) can extrude ten-stage wiping cloth to a certain extent, then an adjusting cylinder (3) is started to drive a push rod (4) to move upwards, the push rod (4) drives a push block (5) to move upwards, the push block (5) drives an adjusting concave frame (6) to move upwards, so that the wiping cleaning cloth starts to be tightened, and the tightness is adjusted;
step three, during cleaning, an extrusion cylinder (18) is started to drive a movable rod (19) to move downwards, the movable rod (19) drives a lower concave pressing frame (20) to move downwards, the lower concave pressing frame (20) drives an upper brush plate (21) to move downwards, meanwhile, a stretching cylinder (25) is started to drive a stretching rod (24) to move upwards, the stretching rod (24) drives a linkage block (23) to move upwards, the linkage block (23) drives a lower brush plate (22) to move upwards, so that ten-stage wiping cloths are extruded, winding equipment is used for driving ten-stage wiping cloths to move slowly, then a servo motor (14) is started to drive a rotary rod (13) to rotate, the rotary rod (13) drives a transmission screw rod (12) to rotate, the transmission screw rod (12) drives a thread ring (15) to move under the action of threads, and the thread ring (15) drives a moving support plate (16) to move a transverse support plate (17), the upper brush plate (21) and the lower brush plate (22) are brushed back and forth through the positive and negative rotation of the servo motor (14), and the cleaned ten-grade wiping cloths are purified through a clean water source in the purifying box (40), so that the cleaning and purifying effects are achieved.
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| CN202110759926.9A CN113492118B (en) | 2021-07-06 | 2021-07-06 | Ten-grade wiping cloth purifying and cleaning process for semiconductor |
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| CN202110759926.9A CN113492118B (en) | 2021-07-06 | 2021-07-06 | Ten-grade wiping cloth purifying and cleaning process for semiconductor |
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Cited By (1)
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| CN114798236A (en) * | 2022-05-12 | 2022-07-29 | 江苏瀚林滤材有限公司 | Filter cloth is handled and is put rolling all-in-one with spraying |
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| CN113492118B (en) | 2022-11-11 |
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