CN113492118B

CN113492118B - Ten-grade wiping cloth purifying and cleaning process for semiconductor

Info

Publication number: CN113492118B
Application number: CN202110759926.9A
Authority: CN
Inventors: 黄香; 傅建喜
Original assignee: Suzhou Jingya Dust Free Technology Co ltd
Current assignee: Suzhou Jingya Dust Free Technology Co ltd
Priority date: 2021-07-06
Filing date: 2021-07-06
Publication date: 2022-11-11
Anticipated expiration: 2041-07-06
Also published as: CN113492118A

Abstract

The invention discloses a ten-grade wiping cloth purifying and cleaning process for a semiconductor, and particularly relates to the technical field of ten-grade wiping cloth purifying and cleaning processes, wherein the ten-grade wiping cloth purifying and cleaning process comprises a cleaning box, two groups of adjusting and cleaning mechanisms are arranged on one side of the cleaning box, and a brushing mechanism is arranged between the two groups of adjusting and cleaning mechanisms; according to the invention, through arranging the brushing mechanism and the adjusting and cleaning mechanism, the back-and-forth brushing of the upper brushing plate and the lower brushing plate is realized, so that the brushing efficiency is improved, the impurity removing effect is better, the operation is simple, the use is easy, the cleaning cost is effectively reduced, the practicability is better, the upper side surface and the lower side surface of the ten-grade wiping cloth are more attached, the brushing friction force is increased, the tightening degree of the ten-grade wiping cloth in the cleaning process is improved, the cloth cleaning device is suitable for the cleaning operation of the ten-grade wiping cloth with different thicknesses, and the cleaning applicability is improved.

Description

Ten-grade wiping cloth purifying and cleaning process for semiconductor

Technical Field

The invention relates to the technical field of ten-grade wiping cloth purification and cleaning processes, in particular to a ten-grade wiping cloth purification and cleaning process for a semiconductor.

Background

The semiconductor refers to a material with electric conductivity between the conductor and the insulator at normal temperature, and has wide application in radio, television and temperature measurement, for example, the diode is a device made of the semiconductor, and the semiconductor needs to use ten-grade wiping cloth to wipe in the production process, and the ten-grade wiping cloth needs to use a cleaning process to remove impurities and dust on the surface of the wiping cloth in the production and manufacturing process.

Among the prior art, carrying out the cleaning process in-process to ten grades of wiping cloth, need cross the water and carry out running roller cleaning process operation, abluent impurity and dust can not be handled fast under such handling condition, and can't adjust to the dozens of wiping cloth of different thickness, and the elasticity in the cleaning process is adjusted more troublesome, has reduced the cleaning performance, improves and washs the cost, and the practicality is poor.

Disclosure of Invention

In order to overcome the defects in the prior art, the embodiment of the invention provides a purification and cleaning process for ten-grade wiping cloth for a semiconductor, and the brushing mechanism and the cleaning mechanism are arranged to realize the back-and-forth brushing of the upper brush plate and the lower brush plate, so that the brushing efficiency can be improved, the speed is higher, the impurity removing effect is better, the operation is simple, the use is easy, the cleaning cost is effectively reduced, the practicability is better, and the tightening degree of the ten-grade wiping cloth in the cleaning process is improved, so that the problems in the background art are solved.

In order to achieve the purpose, the invention provides the following technical scheme: the utility model provides a ten grades of wiping cloth purification belt cleaning device for semiconductor, is including wasing the case, its characterized in that: two groups of adjusting and cleaning mechanisms are arranged on one side of the cleaning box, and a brushing mechanism is arranged between the two groups of adjusting and cleaning mechanisms;

the adjusting and cleaning mechanism comprises a supporting block arranged on one side of the cleaning box, the top end of the supporting block is connected with an adjusting cylinder, the pushing end of the adjusting cylinder is connected with a pushing rod, the top end of the pushing rod is connected with a pushing block, one side of the pushing block is connected with an adjusting concave frame, a bottom rolling limiting shaft lever is arranged inside the adjusting concave frame, a top rolling limiting shaft lever is arranged above the bottom rolling limiting shaft lever, a lower pressing shaft ring block is sleeved outside one end of the top rolling limiting shaft lever, and a lower pressing cylinder is arranged at the top end of the lower pressing shaft ring block;

brush moving mechanism is including setting up wash the support concave frame of case opposite side, support the inside transmission lead screw that is provided with of concave frame, transmission lead screw one end is connected with the rotary rod, servo motor is installed to rotary rod one end, the outside cover of transmission lead screw is equipped with the screw ring, screw ring top is connected with the removal extension board, it is connected with horizontal backup pad to remove the extension board top, horizontal backup pad one side is connected with the extrusion cylinder, extrusion cylinder promotion end is connected with the movable rod, the movable rod bottom is connected with pushes down concave frame, it is connected with the brush board to push down concave frame bottom, it is provided with down the brush board to go up brush board bottom, brush board one side is connected with the linkage piece down, the linkage piece top is connected with tensile pole.

In a preferred embodiment, a downstream electric valve pipe is connected to the bottom end of the cleaning tank, a filter tank is mounted at the bottom end of the downstream electric valve pipe, a filter screen is arranged inside the filter tank, a filter element is mounted at the bottom end of the filter screen, a return pipe is embedded in the bottom end of the filter tank, a return pump is mounted at one end of the return pipe, a guide pipe is connected to the output end of the return pump, a transverse injection pipe is connected to one end of the guide pipe, a circulation pipe is connected to one side of the downstream electric valve pipe, an electric control valve is mounted at the bottom end of the circulation pipe, and an access pipe is mounted at the bottom end of the electric control valve.

In a preferred embodiment, a purification box is installed on one side of the cleaning box, a first purification roller wheel is arranged inside the purification box, a second purification roller wheel is arranged on one side of the first purification roller wheel, a stretching cylinder is arranged at the top end of the stretching rod, a first roller wheel is arranged on one side of the linkage block, and a second roller wheel is arranged on the other side of the lower brush plate.

In a preferred embodiment, the bottom end of the purification box is provided with a discharge valve pipe which is communicated with the purification box.

In a preferred embodiment, a stabilizing support rod is connected to one side of the servo motor, and the stabilizing support rod is fixedly connected with the servo motor.

In a preferred embodiment, the adjusting concave frame is movably connected with the bottom rolling limiting shaft rod, and the outer part of one end of the top rolling limiting shaft rod is movably connected with the lower pressing shaft ring block.

In a preferred embodiment, two ends of the rotating rod are respectively and fixedly connected with the output ends of the transmission screw rod and the servo motor in pairs, and the outside of the transmission screw rod is connected with the threaded ring through threads.

In a preferred embodiment, the first roller is movably connected with one side of the inner wall of the cleaning box, and the second roller is movably connected with the inner wall of the cleaning box and is located at the other side of the lower brush plate.

A purification and cleaning process of a ten-grade wiping cloth purification and cleaning device for a semiconductor specifically comprises the following steps:

step one, when cloth is installed, pouring mixed water with a cleaning agent into a cleaning box, enabling cleaned ten-level wiping cloth to pass through a first group of adjusting and cleaning mechanisms, pulling the ten-level wiping cloth to enter the bottom of a first roller, enabling the ten-level wiping cloth to enter a position between an upper brush plate and a lower brush plate through a second roller, enabling the ten-level wiping cloth to pass through a second group of adjusting and cleaning mechanisms, enabling the ten-level wiping cloth to be located between a bottom rolling limiting shaft rod and a top rolling limiting shaft rod, and enabling the ten-level wiping cloth to enter a purification box and pass through the bottom of a first purification roller and the bottom of a second purification roller;

step two, during adjustment, a lower pressing cylinder is started to drive a lower pressing shaft ring block to move downwards, the lower pressing shaft ring block drives a top rolling limiting shaft rod to move downwards, so that the bottom rolling limiting shaft rod and the top rolling limiting shaft rod can extrude the ten-grade wiping cloth to a certain extent, then an adjusting cylinder is started to drive a pushing rod to move upwards, the pushing rod drives a pushing block to move upwards, the pushing block drives an adjusting concave frame to move upwards, and therefore the wiping cleaning cloth starts to be tightened, and the tightness is adjusted;

and step three, during cleaning, starting an extrusion cylinder to drive a movable rod to move downwards, driving a lower concave pressing frame to move downwards, driving an upper brush plate to move downwards by the lower concave pressing frame, simultaneously starting a stretching cylinder to drive a stretching rod to move upwards, driving a linkage block to move upwards by the stretching rod, driving a lower brush plate to move upwards by the linkage block, extruding the ten-stage wiping cloth in such a way, driving the ten-stage wiping cloth to move slowly by using a rolling device, then starting a servo motor to drive a rotary rod to rotate, driving a transmission lead screw to rotate, driving a threaded ring to move under the action of threads, driving a moving support plate by the threaded ring to move a transverse support plate, realizing back and forth movement of the upper brush plate and the lower brush plate through the positive and negative rotation of the servo motor, and purifying the cleaned ten-stage wiping cloth through a clean water source in a purification box, thereby cleaning and purifying effects.

The invention has the technical effects and advantages that:

1. by arranging the brushing mechanism, the lower pressing concave frame drives the upper brush plate to move downwards, the stretching cylinder drives the stretching rod to move upwards, the stretching rod drives the linkage block to move upwards, the linkage block drives the lower brush plate to move upwards, the ten-grade wiping cloth is extruded, the upper side surface and the lower side surface of the ten-grade wiping cloth are more attached, the brushing friction force is increased, the transmission lead screw drives the threaded ring to move under the action of the threads, the transverse support plate is moved by moving the support plate, and the back-and-forth brushing of the upper brush plate and the lower brush plate is realized through the positive and negative rotation of the servo motor, so that the brushing efficiency can be improved, the speed is higher, the impurity removing effect is better, the operation is simple, the use is easy, the cleaning cost is effectively reduced, and the practicability is better;

2. by arranging the adjusting and cleaning mechanism, the bottom rolling limiting shaft rod and the top rolling limiting shaft rod extrude the ten-grade wiping cloth to a certain extent, the pushing rod drives the pushing block to move upwards, the pushing block drives the adjusting concave frame to move upwards, so that the wiping and cleaning cloth starts to be tightened, the tightness is adjusted, the tightening degree of the ten-grade wiping cloth in the cleaning process can be improved, the friction force is increased in the brushing process, impurities and dust are better removed, the distance between the bottom rolling limiting rod and the top rolling limiting rod can be adjusted, the ten-grade wiping cloth cleaning device is suitable for cleaning operation of the ten-grade wiping cloth with different thicknesses, and the cleaning applicability is improved;

3. close down the electric valve pipe that flows and open electric control valve, start the reflux pump machine, make the water source that washs incasement portion and have the washing liquid enter into the circulating pipe, enter into the guiding pipe through inserting the pipe, spray the washing incasement along horizontal injection pipe, can make the washing liquid mix fast like this, and treat the washing back that finishes, can open the electric valve pipe that closes down flow, thereby make sewage enter into the rose box, once filter through the filter screen, carry out secondary filter through the filter core again, can circulate the circulating water after filtering like this, effectively practice thrift the water source, environmental protection more.

Drawings

Fig. 1 is a schematic view of the overall structure of the present invention.

Fig. 2 is a schematic side-view perspective structure of the present invention.

FIG. 3 is a schematic view of a cross-sectional structure of a portion of the connection between the cleaning tank and the concave supporting frame according to the present invention.

FIG. 4 is a schematic cross-sectional view of the cleaning tank and the filtering tank according to the present invention.

Fig. 5 is an enlarged schematic view of a portion a in fig. 1 according to the present invention.

Fig. 6 is an enlarged schematic view of the structure at B in fig. 1 according to the present invention.

Fig. 7 is an enlarged view of the structure of fig. 4C according to the present invention.

The reference signs are: 1. a cleaning tank; 2. a support block; 3. an adjusting cylinder; 4. a push rod; 5. A pushing block; 6. adjusting the concave frame; 7. a bottom rolling limit shaft lever; 8. a top rolling limit shaft lever; 9. pressing down the collar block; 10. pressing down the air cylinder; 11. supporting the concave frame; 12. a transmission screw rod; 13. rotating the rod; 14. a servo motor; 15. a threaded ring; 16. moving the support plate; 17. a transverse support plate; 18. an extrusion cylinder; 19. a movable rod; 20. pressing the concave frame downwards; 21. an upper brush plate; 22. a lower brush plate; 23. a linkage block; 24. a stretching rod; 25. stretching the cylinder; 26. a first roller; 27. a second roller; 28. a downstream electrically operated valve tube; 29. a filter box; 30. a filter screen; 31. stabilizing the support rod; 32. a filter element; 33. a return pipe; 34. a reflux pump machine; 35. a flow guide pipe; 36. a transverse injection pipe; 37. a circulation pipe; 38. an electrically controlled valve; 39. an access pipe; 40. A purification box; 41. a first purge roller; 42. a second purge roller; 43. a discharge valve tube.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without making any creative effort based on the embodiments in the present invention, belong to the protection scope of the present invention.

The ten-grade wiping cloth purifying and cleaning device for the semiconductor comprises a cleaning box 1, wherein two groups of adjusting and cleaning mechanisms are arranged on one side of the cleaning box 1, and a brushing mechanism is arranged between the two groups of adjusting and cleaning mechanisms;

the adjusting and cleaning mechanism comprises a supporting block 2 arranged on one side of the cleaning box 1, the top end of the supporting block 2 is connected with an adjusting cylinder 3, the pushing end of the adjusting cylinder 3 is connected with a pushing rod 4, the top end of the pushing rod 4 is connected with a pushing block 5, one side of the pushing block 5 is connected with an adjusting concave frame 6, a bottom rolling limiting shaft lever 7 is arranged inside the adjusting concave frame 6, a top rolling limiting shaft lever 8 is arranged above the bottom rolling limiting shaft lever 7, a pressing shaft ring block 9 is sleeved outside one end of the top rolling limiting shaft lever 8, and a pressing cylinder 10 is arranged at the top end of the pressing shaft ring block 9;

the brush moves mechanism including setting up at the support concave frame 11 that washs 1 opposite side of case, support the inside transmission lead screw 12 that is provided with of concave frame 11, transmission lead screw 12 one end is connected with rotary rod 13, servo motor 14 is installed to rotary rod 13 one end, the outside cover of transmission lead screw 12 is equipped with screw ring 15, screw ring 15 top is connected with removes the extension board 16, it is connected with horizontal backup pad 17 to remove the extension board 16 top, horizontal backup pad 17 one side is connected with

extrusion cylinder

18, 18 catch ends of extrusion cylinder are connected with movable rod 19, the 19 bottom of movable rod is connected with down and presses concave frame 20, it is connected with brush board 21 to press concave frame 20 bottom down, it is provided with down brush board 22 to go up brush board 21 bottom, brush board 22 one side is connected with linkage block 23 down, linkage block 23 top is connected with tensile pole 24.

As shown in fig. 2 and 4, the bottom end of the cleaning tank 1 is connected with a downstream electric valve pipe 28, the bottom end of the downstream electric valve pipe 28 is provided with a filter tank 29, a filter screen 30 is arranged inside the filter tank 29, the bottom end of the filter screen 30 is provided with a filter element 32, the bottom end of the filter tank 29 is embedded with a return pipe 33, one end of the return pipe 33 is provided with a return pump 34, the output end of the return pump 34 is connected with a guide pipe 35, one end of the guide pipe 35 is connected with a transverse injection pipe 36, one side of the downstream electric valve pipe 28 is connected with a circulation pipe 37, the bottom end of the circulation pipe 37 is provided with an electric control valve 38, the bottom end of the electric control valve 38 is provided with an access pipe 39, so that when in use, the downstream electric valve pipe 28 is closed, the electric control valve 38 is opened, the return pump 34 is started, a water source with cleaning liquid inside the cleaning tank 1 enters the circulation pipe 37, enters the access pipe 39 through the access pipe 39, the guide pipe 35 enters the transverse injection pipe 36 through the guide pipe 35, and is injected into the cleaning tank 1, so that the cleaning liquid can be rapidly mixed, and after cleaning, the downstream electric valve pipe 28 is closed, the sewage enters the filter tank 29, the filter element is filtered, and the circulating water can be filtered for a second time, and the filter the circulating water.

As shown in fig. 1 and 2, a cleaning box 40 is installed at one side of the cleaning box 1, a first cleaning roller 41 is installed inside the cleaning box 40, a second cleaning roller 42 is installed at one side of the first cleaning roller 41, a stretching cylinder 25 is installed at the top end of the stretching rod 24, a first roller 26 is installed at one side of the linkage block 23, and a second roller 27 is installed at the other side of the lower brush plate 22, so that ten-level wiping cloths can be placed at the bottom of the lower brush plate through the first cleaning roller 41 and the second cleaning roller 42, thereby performing a cleaning function.

As shown in fig. 2, a discharge valve pipe 43 is provided at the bottom end of the purification tank 40, and the discharge valve pipe 43 communicates with the purification tank 40 so that the discharge valve pipe 43 can be opened to discharge the contaminated water after the purification is completed through the discharge valve pipe 43.

As shown in fig. 6, a stabilizing support rod 31 is connected to one side of the servo motor 14, and the stabilizing support rod 31 is fixedly connected to the servo motor 14, so that the stabilizing support rod 31 can support and stabilize the servo motor 14, and the stable operation of the servo motor 14 is maintained.

As shown in fig. 5, the adjusting concave frame 6 is movably connected with the bottom rolling limiting shaft rod 7, and the top rolling limiting shaft rod 8 is movably connected with the pressing shaft collar block 9 at the outer part of one end thereof, so that the bottom rolling limiting shaft rod 7 and the top rolling limiting shaft rod 8 can rotate.

As shown in fig. 3, two ends of the rotating rod 13 are respectively fixedly connected with the output ends of the transmission screw rod 12 and the servo motor 14, and the outside of the transmission screw rod 12 is connected with the threaded ring 15 through threads, so that the servo motor 14 is started to drive the rotating rod 13 to rotate, the rotating rod 13 drives the transmission screw rod 12 to rotate, and the transmission screw rod 12 drives the threaded ring 15 to rotate.

As shown in fig. 1, 4 and 7, the first roller 26 is movably connected to one side of the inner wall of the cleaning tank 1, and the second roller 27 is movably connected to the inner wall of the cleaning tank 1 at a position at the other side of the lower brush plate 22, so that both the first roller 26 and the second roller 27 can rotate on the inner wall of the cleaning tank 1.

step one, when cloth is installed, pouring mixed water with a cleaning agent into a cleaning box 1, enabling cleaned ten-grade wiping cloth to pass through a first group of adjusting and cleaning mechanisms, pulling the ten-grade wiping cloth to enter the bottom of a first roller 26, enabling the cleaned ten-grade wiping cloth to enter a space between an upper brush plate 21 and a lower brush plate 22 through a second roller 27, enabling the cleaned ten-grade wiping cloth to pass through a second group of adjusting and cleaning mechanisms, enabling the ten-grade wiping cloth to be located between a bottom rolling limiting shaft lever 7 and a top rolling limiting shaft lever 8, and enabling the cleaned ten-grade wiping cloth to enter a cleaning box 40 and pass through the bottom of a first cleaning roller 41 and the bottom of a second cleaning roller 42;

during adjustment, a pressing cylinder 10 is started to drive a pressing shaft ring block 9 to move downwards, the pressing shaft ring block 9 drives a top rolling limiting shaft rod 8 to move downwards, so that a bottom rolling limiting shaft rod 7 and the top rolling limiting shaft rod 8 can extrude ten-grade wiping cloth to a certain extent, then an adjusting cylinder 3 is started to drive a pushing rod 4 to move upwards, the pushing rod 4 drives a pushing block 5 to move upwards, the pushing block 5 drives an adjusting concave frame 6 to move upwards, so that the wiping cleaning cloth starts to be tightened, and the tightness is adjusted;

and step three, during cleaning, starting the extrusion cylinder 18 to drive the movable rod 19 to move downwards, driving the lower concave pressing frame 20 to move downwards by the movable rod 19, driving the upper brush plate 21 to move downwards by the lower concave pressing frame 20, simultaneously starting the stretching cylinder 25 to drive the stretching rod 24 to move upwards, driving the linkage block 23 to move upwards by the stretching rod 24, driving the lower brush plate 22 to move upwards by the linkage block 23, thus extruding the ten-stage wiping cloth, driving the ten-stage wiping cloth to move slowly by using a winding device, then starting the servo motor 14 to drive the rotary rod 13 to rotate, driving the transmission screw rod 12 to rotate by the rotary rod 13, driving the threaded ring 15 to move under the action of the threads, driving the moving support plate 16 by the threaded ring 15 to move the transverse support plate 17, realizing the back-and-forth brushing of the upper brush plate 21 and the lower brush plate 22 by the positive and negative rotation of the servo motor 14, and purifying the cleaned ten-stage wiping cloth by a clean water source in the purification box 40.

The working principle of the invention is as follows: when cloth is installed, the ten-level cleaning cloth passes through the first group of adjusting and cleaning mechanisms, is pulled to enter the bottom of the second roller 27, enters between the upper brush plate 21 and the lower brush plate 22 through the second roller, passes through the second group of adjusting and cleaning mechanisms, and is finally installed inside the purifying box 40;

during adjustment, the bottom rolling limiting shaft rod 7 and the top rolling limiting shaft rod 8 extrude ten-grade wiping cloth to a certain extent, the adjusting cylinder 3 drives the pushing rod 4 to move upwards, and the pushing rod 4 drives the pushing block 5 to move upwards, so that the wiping and cleaning cloth can be tightened, and the tightness is adjusted;

during cleaning, the lower concave pressing frame 20 drives the upper brush plate 21 to move downwards, meanwhile, the stretching cylinder 25 is started to drive the stretching rod 24 to move upwards, the stretching rod 24 drives the linkage block 23 to move upwards, the linkage block 23 drives the lower brush plate 22 to move upwards, the transmission screw rod 12 drives the threaded ring 15 to enable the movable support plate 16 to drive the transverse support plate 17 to move in a threaded mode, and the upper brush plate 21 and the lower brush plate 22 are brushed back and forth through forward and reverse rotation of the servo motor 14.

The points to be finally explained are: first, in the description of the present application, it should be noted that, unless otherwise specified and limited, the terms "mounted," "connected," "connecting," and "connecting" should be understood broadly, and may be a mechanical connection or an electrical connection, or a communication between two elements, and may be directly connected, and "upper," "lower," "left," and "right" are only used to indicate relative positional relationships, and when the absolute position of the object to be described is changed, the relative positional relationships may be changed;

secondly, the method comprises the following steps: in the drawings of the disclosed embodiments of the invention, only the structures related to the disclosed embodiments are referred to, other structures can refer to common designs, and the same embodiment and different embodiments of the invention can be combined with each other without conflict;

and finally: the above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that are within the spirit and principle of the present invention are intended to be included in the scope of the present invention.

Claims

1. The utility model provides a ten grades of wiping cloth purification belt cleaning device for semiconductor, is including wasing case (1), its characterized in that: two groups of adjusting and cleaning mechanisms are arranged on one side of the cleaning box (1), and a brushing mechanism is arranged between the two groups of adjusting and cleaning mechanisms;

the adjusting and cleaning mechanism comprises a supporting block (2) arranged on one side of the cleaning box (1), the top end of the supporting block (2) is connected with an adjusting cylinder (3), the pushing end of the adjusting cylinder (3) is connected with a pushing rod (4), the top end of the pushing rod (4) is connected with a pushing block (5), one side of the pushing block (5) is connected with an adjusting concave frame (6), a bottom rolling limiting shaft rod (7) is arranged inside the adjusting concave frame (6), a top rolling limiting shaft rod (8) is arranged above the bottom rolling limiting shaft rod (7), a lower pressing shaft ring block (9) is sleeved outside one end of the top rolling limiting shaft rod (8), and a lower pressing cylinder (10) is arranged on the top end of the lower pressing shaft ring block (9);

the brushing mechanism comprises a supporting concave frame (11) arranged at the other side of the cleaning box (1), a transmission screw rod (12) is arranged inside the supporting concave frame (11), one end of the transmission screw rod (12) is connected with a rotary rod (13), a servo motor (14) is installed at one end of the rotary rod (13), a thread ring (15) is sleeved outside the transmission screw rod (12), the top end of the thread ring (15) is connected with a movable support plate (16), the top end of the movable support plate (16) is connected with a transverse support plate (17), one side of the transverse support plate (17) is connected with an extrusion cylinder (18), the pushing end of the extrusion cylinder (18) is connected with a movable rod (19), the bottom end of the movable rod (19) is connected with a downward pressing concave frame (20), the bottom end of the downward pressing concave frame (20) is connected with an upper brush plate (21), the bottom of the upper brush plate (21) is provided with a lower brush plate (22), one side of the lower brush plate (22) is connected with a linkage block (23), the top end of the linkage block (23) is connected with a stretching rod (24), the bottom end of the downward flow valve pipe (28), the filter screen (30) is installed on the filter screen (30), and the filter screen (30) is installed on the inner side of the filter box, the bottom end of the filter box (29) is embedded with a return pipe (33), one end of the return pipe (33) is provided with a return pump machine (34), the output end of the return pump machine (34) is connected with a guide pipe (35), one end of the guide pipe (35) is connected with a transverse injection pipe (36), one side of a down-flow electric valve pipe (28) is connected with a circulating pipe (37), the bottom end of the circulating pipe (37) is provided with an electric control valve (38), the bottom end of the electric control valve (38) is provided with an access pipe (39), one side of the cleaning box (1) is provided with a purifying box (40), the inside of the purifying box (40) is provided with a first purifying roller (41), one side of the first purifying roller (41) is provided with a second purifying roller (42), the top end of a stretching rod (24) is provided with a stretching cylinder (25), one side of a linkage block (23) is provided with a first roller (26), the other side of a lower brush plate (22) is provided with a second roller (27), the bottom end of the purifying box (40) is provided with a discharge valve pipe (43), the discharge valve pipe (43) is communicated with the purifying box (40), one side of the servo motor (14), and the servo motor (31) is fixedly connected with the servo rod (31), the cleaning device comprises an adjusting concave frame (6), a bottom rolling limiting shaft rod (7), a top rolling limiting shaft rod (8), a lower pressing shaft ring block (9), a rotating rod (13), a transmission screw rod (12), a servo motor (14), a threaded ring (15), a first roller (26), a second roller (27), a cleaning box (1), a lower brush plate (22) and a cleaning cloth cleaning device, and is characterized in that the adjusting concave frame (6) is movably connected with the bottom rolling limiting shaft rod (7), one end of the top rolling limiting shaft rod (8) is movably connected with the lower pressing shaft ring block (9), two ends of the rotating rod (13) are fixedly connected with the transmission screw rod (12) and the output end of the servo motor (14) in pairs respectively, the outer part of the transmission screw rod (12) is connected with the threaded ring (15) through threads, the first roller (26) is movably connected with one side of the inner wall of the cleaning box (1), the second roller (27) is movably connected with the inner wall of the cleaning box (1) and is positioned at the other side of the lower brush plate (22), the cleaning cloth cleaning device also comprises a purification and cleaning technology of a semiconductor cleaning cloth cleaning device for ten levels, and the cleaning cloth cleaning device comprises the following specific use steps:

step one, when cloth is installed, pouring mixed water with a cleaning agent into a cleaning box (1), enabling cleaned ten-level wiping cloth to pass through a first group of adjusting and cleaning mechanisms, pulling the ten-level wiping cloth to enter the bottom of a first roller (26), enabling the ten-level wiping cloth to enter a position between an upper brush plate (21) and a lower brush plate (22) through a second group of adjusting and cleaning mechanisms, enabling the ten-level wiping cloth to be located between a bottom rolling limiting shaft lever (7) and a top rolling limiting shaft lever (8), and enabling the ten-level wiping cloth to enter a purification box (40) to pass through the bottom of a first purification roller (41) and the bottom of a second purification roller (42);

step two, during adjustment, a lower pressing cylinder (10) is started to drive a lower pressing shaft ring block (9) to move downwards, the lower pressing shaft ring block (9) drives a top rolling limiting shaft rod (8) to move downwards, so that a bottom rolling limiting shaft rod (7) and the top rolling limiting shaft rod (8) can extrude ten-stage wiping cloth to a certain extent, then an adjusting cylinder (3) is started to drive a push rod (4) to move upwards, the push rod (4) drives a push block (5) to move upwards, the push block (5) drives an adjusting concave frame (6) to move upwards, so that the wiping cleaning cloth starts to be tightened, and the tightness is adjusted;

and step three, during cleaning, an extrusion cylinder (18) is started to drive a movable rod (19) to move downwards, the movable rod (19) drives a lower pressing concave frame (20) to move downwards, the lower pressing concave frame (20) drives an upper brushing plate (21) to move downwards, meanwhile, a stretching cylinder (25) is started to drive a stretching rod (24) to move upwards, the stretching rod (24) drives a linkage block (23) to move upwards, the linkage block (23) drives the lower brushing plate (22) to move upwards, so that ten-stage wiping cloth is extruded, winding equipment is used for driving ten-stage wiping cloth to move slowly, then a servo motor (14) is started to drive a rotating rod (13) to rotate, the rotating rod (13) drives a transmission screw rod (12) to rotate, the transmission screw rod (12) drives a thread ring (15) to move under the action of threads, the thread ring (15) drives a moving support plate (16) to move a transverse support plate (17), the forward and reverse rotation of the upper brushing plate (21) and the lower brushing plate (22) are realized through the forward and reverse rotation of the servo motor (14), and the cleaning box can purify water sources, and the water sources can be cleaned.