CN1134847C - 半导体器件 - Google Patents
半导体器件 Download PDFInfo
- Publication number
- CN1134847C CN1134847C CNB961962372A CN96196237A CN1134847C CN 1134847 C CN1134847 C CN 1134847C CN B961962372 A CNB961962372 A CN B961962372A CN 96196237 A CN96196237 A CN 96196237A CN 1134847 C CN1134847 C CN 1134847C
- Authority
- CN
- China
- Prior art keywords
- semiconductor device
- semiconductor
- spherulite
- electrode
- spherical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 425
- 239000011941 photocatalyst Substances 0.000 claims abstract description 118
- 239000013078 crystal Substances 0.000 claims abstract description 15
- 238000009792 diffusion process Methods 0.000 claims description 56
- 230000006870 function Effects 0.000 claims description 42
- 239000003792 electrolyte Substances 0.000 claims description 34
- 238000009413 insulation Methods 0.000 claims description 26
- 230000000694 effects Effects 0.000 claims description 22
- 206010070834 Sensitisation Diseases 0.000 claims description 19
- 230000008313 sensitization Effects 0.000 claims description 19
- 238000003487 electrochemical reaction Methods 0.000 claims description 15
- 239000012535 impurity Substances 0.000 claims description 15
- 229910044991 metal oxide Inorganic materials 0.000 claims description 15
- 150000004706 metal oxides Chemical class 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 230000004888 barrier function Effects 0.000 claims description 11
- 238000003491 array Methods 0.000 claims description 9
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 8
- 239000011159 matrix material Substances 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 3
- 230000003667 anti-reflective effect Effects 0.000 claims description 3
- DVRDHUBQLOKMHZ-UHFFFAOYSA-N chalcopyrite Chemical compound [S-2].[S-2].[Fe+2].[Cu+2] DVRDHUBQLOKMHZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052951 chalcopyrite Inorganic materials 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 235000021384 green leafy vegetables Nutrition 0.000 claims description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 12
- 229910052710 silicon Inorganic materials 0.000 abstract description 12
- 239000010703 silicon Substances 0.000 abstract description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 abstract description 6
- 239000000377 silicon dioxide Substances 0.000 abstract description 3
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000005868 electrolysis reaction Methods 0.000 description 37
- 239000002994 raw material Substances 0.000 description 37
- 239000007789 gas Substances 0.000 description 35
- 230000004048 modification Effects 0.000 description 29
- 238000012986 modification Methods 0.000 description 29
- 239000010408 film Substances 0.000 description 27
- 238000000034 method Methods 0.000 description 27
- 239000011521 glass Substances 0.000 description 25
- 239000000758 substrate Substances 0.000 description 23
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 20
- 238000005755 formation reaction Methods 0.000 description 20
- 239000000463 material Substances 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 17
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 16
- 229910010413 TiO 2 Inorganic materials 0.000 description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000000203 mixture Substances 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- 229920003002 synthetic resin Polymers 0.000 description 10
- 239000000057 synthetic resin Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 9
- 229920001296 polysiloxane Polymers 0.000 description 9
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 230000008859 change Effects 0.000 description 8
- 239000011261 inert gas Substances 0.000 description 8
- 230000005291 magnetic effect Effects 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 239000000725 suspension Substances 0.000 description 8
- 238000005229 chemical vapour deposition Methods 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- 238000009434 installation Methods 0.000 description 7
- 230000003647 oxidation Effects 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 7
- 238000006722 reduction reaction Methods 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 230000005684 electric field Effects 0.000 description 6
- 230000005611 electricity Effects 0.000 description 6
- 230000002349 favourable effect Effects 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 239000012071 phase Substances 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- 230000009467 reduction Effects 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000003466 welding Methods 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 229920005479 Lucite® Polymers 0.000 description 4
- 230000033228 biological regulation Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910002367 SrTiO Inorganic materials 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000002800 charge carrier Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000009849 deactivation Effects 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 230000005486 microgravity Effects 0.000 description 3
- 230000033116 oxidation-reduction process Effects 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000005036 potential barrier Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 238000004064 recycling Methods 0.000 description 3
- 230000035807 sensation Effects 0.000 description 3
- 229920002545 silicone oil Polymers 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000009795 derivation Methods 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 229940071870 hydroiodic acid Drugs 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 240000007175 Datura inoxia Species 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000009408 flooring Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000001483 mobilizing effect Effects 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical group [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000007540 photo-reduction reaction Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000036647 reaction Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Hybrid Cells (AREA)
Abstract
Description
Claims (30)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB961962372A CN1134847C (zh) | 1996-10-09 | 1996-10-09 | 半导体器件 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB961962372A CN1134847C (zh) | 1996-10-09 | 1996-10-09 | 半导体器件 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1194727A CN1194727A (zh) | 1998-09-30 |
CN1134847C true CN1134847C (zh) | 2004-01-14 |
Family
ID=5129104
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB961962372A Expired - Lifetime CN1134847C (zh) | 1996-10-09 | 1996-10-09 | 半导体器件 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN1134847C (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003056633A1 (fr) * | 2001-12-25 | 2003-07-10 | Josuke Nakata | Appareil semi-conducteur d'emission et de reception de lumiere |
EP1553638B1 (en) * | 2002-06-21 | 2008-12-10 | Kyosemi Corporation | Light receiving or light emitting device and its production method |
US7387400B2 (en) * | 2003-04-21 | 2008-06-17 | Kyosemi Corporation | Light-emitting device with spherical photoelectric converting element |
JP2006127884A (ja) | 2004-10-28 | 2006-05-18 | Matsushita Electric Ind Co Ltd | 発光素子および表示装置 |
US10546963B2 (en) * | 2014-12-01 | 2020-01-28 | Luxtera, Inc. | Method and system for germanium-on-silicon photodetectors without germanium layer contacts |
CN105140321B (zh) * | 2015-07-06 | 2017-02-01 | 南京汇金锦元光电材料有限公司 | 柔性cigs太阳能电池及其金属基底制备方法 |
-
1996
- 1996-10-09 CN CNB961962372A patent/CN1134847C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1194727A (zh) | 1998-09-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100377825B1 (ko) | 반도체디바이스 | |
JP3262174B2 (ja) | 半導体デバイス | |
CN1219331C (zh) | 发光或受光用半导体模块及其制造方法 | |
JP3326462B2 (ja) | 球状半導体デバイスとその製造方法 | |
CN1220277C (zh) | 发光或感光半导体组件及其制造方法 | |
CN1227747C (zh) | 光致电压器件模块 | |
CN1470080A (zh) | 半导体器件及其制造方法 | |
CN1023362C (zh) | 光生伏特器件及其制造方法 | |
CN1139996C (zh) | 光电解装置用太阳能电池组件及光电解装置 | |
AU2003275663B2 (en) | Light receiving or light emitting modular sheet and process for producing the same | |
CN1280383A (zh) | 生产半导体部件的方法,生产太阳能电池的方法和阳极化处理设备 | |
CN1846288A (zh) | 串联染料敏化太阳能电池及其制造方法 | |
CN1582502A (zh) | 受光或发光用半导体装置 | |
CN1649180A (zh) | 半导体发光元件及其制造方法 | |
CN1620749A (zh) | 太阳能转换器和太阳能转换系统 | |
CN1137840A (zh) | 光电池、光电池阵列及其组成的电解装置 | |
CN1168541A (zh) | 有强抗湿性和透光度的专用表面侧覆层的太阳能电池组件 | |
US9540741B2 (en) | Light-driven hydroiodic acid splitting from semiconductive fuel generator | |
CN1134847C (zh) | 半导体器件 | |
US20140346053A1 (en) | Carbon dioxide reducing method, carbon dioxide reducing cell, and carbon dioxide reducing apparatus | |
JP4345064B2 (ja) | 光電変換素子の製造方法、および電子機器 | |
JP2013253269A (ja) | 二酸化炭素還元装置 | |
WO2018079103A1 (ja) | 二酸化炭素還元装置 | |
TW201131788A (en) | A solar cell having a graded buffer layer | |
CN1155109C (zh) | 球状半导体器件及其制造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: KYOSEMI CORP. Free format text: FORMER OWNER: JOSUKE NAKATA Effective date: 20120710 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20120710 Address after: Kyoto Japan Patentee after: Kyosemi Corp. Address before: Japan Kyoto Xijing City Patentee before: Nakata Josuke |
|
ASS | Succession or assignment of patent right |
Owner name: SIFEILE ELECTRIC POWER CO., LTD. Free format text: FORMER OWNER: KYOSEMI CORP. Effective date: 20140404 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20140404 Address after: Kyoto Japan Patentee after: Scarlett Feile Electric Power Co. Address before: Kyoto Japan Patentee before: Kyosemi Corp. |
|
CX01 | Expiry of patent term |
Granted publication date: 20040114 |
|
EXPY | Termination of patent right or utility model |