CN113441463A - Cleaning method - Google Patents
Cleaning method Download PDFInfo
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- CN113441463A CN113441463A CN202110082395.4A CN202110082395A CN113441463A CN 113441463 A CN113441463 A CN 113441463A CN 202110082395 A CN202110082395 A CN 202110082395A CN 113441463 A CN113441463 A CN 113441463A
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- cleaning
- flower basket
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- bubbling
- basket
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- 238000004140 cleaning Methods 0.000 title claims abstract description 118
- 238000000034 method Methods 0.000 title claims abstract description 35
- 230000005587 bubbling Effects 0.000 claims abstract description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 18
- 238000001035 drying Methods 0.000 claims abstract description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 14
- 239000010703 silicon Substances 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 10
- 239000007788 liquid Substances 0.000 claims abstract description 10
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 15
- 239000011261 inert gas Substances 0.000 claims description 10
- 239000004094 surface-active agent Substances 0.000 claims description 9
- 239000007789 gas Substances 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 230000018044 dehydration Effects 0.000 claims description 4
- 238000006297 dehydration reaction Methods 0.000 claims description 4
- 230000002045 lasting effect Effects 0.000 claims 2
- 239000002245 particle Substances 0.000 abstract description 12
- 229910021645 metal ion Inorganic materials 0.000 abstract description 6
- 239000000428 dust Substances 0.000 abstract description 4
- 239000002893 slag Substances 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000005416 organic matter Substances 0.000 abstract description 2
- 230000000694 effects Effects 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- 239000012535 impurity Substances 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- -1 metal complex ions Chemical class 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009296 electrodeionization Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000001223 reverse osmosis Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/042—Acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/12—Water-insoluble compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention belongs to the technical field of solar cell manufacturing, and particularly relates to a cleaning method for a transfer basket used for cleaning a silicon-based cell. A transfer cleaning flower basket for cleaning a silicon wafer battery comprises S101, preparing normal-temperature cleaning liquid; s102, ultrasonically cleaning the flower basket in the normal-temperature cleaning solution; s103, carrying out N treatment on the cleaned flower basket in pure water2Bubbling and cleaning; s104, carrying out bubbling cleaning on the flower basketDehydrating; s105, drying the dehydrated flower basket. The invention provides a cleaning method for transferring and cleaning a flower basket by a battery, which utilizes a unique formula to prepare a normal-temperature cleaning solution and a unique cleaning process, has the advantages of short cleaning time, no need of heating and temperature rise, capability of removing organic matter dirt of the flower basket, capability of removing metal ions on the surface of the flower basket, capability of effectively removing silicon slag and dust particles on the surface of the flower basket, and no other dirt brought in the cleaning process.
Description
Technical Field
The invention belongs to the technical field of solar cell manufacturing, and particularly relates to a cleaning method for a transfer basket used for cleaning a silicon-based cell.
Background
The silicon-based cell is a solar cell with higher efficiency at present, and a plurality of process steps are involved in the preparation process. The transfer of the silicon-based battery between different process steps usually adopts a basket, and the cleanliness of the basket has great influence on the efficiency of the silicon-based battery. The current methods for cleaning flower baskets commonly used in the industry mainly include the following methods:
1. directly heating, soaking and cleaning with pure water, and spin-drying.
2. Bubbling with hydrogen peroxide for cleaning, then cleaning with pure water, and finally drying with nitrogen.
3. Soaking in SC1 solution under heating, washing with pure water, and blowing with nitrogen gas.
4. Directly ultrasonically cleaning with pure water, and then drying with nitrogen.
The method for cleaning the flower basket has the following problems:
1. the time for cleaning the flower basket is longer;
2. the cleaning process needs long-time heating and temperature rise, and consumes electric energy;
3. organic matter dirt on the surface of the flower basket cannot be effectively removed;
4. metal ions on the surface of the flower basket cannot be effectively removed;
5. silicon slag and dust particles on the surface of the flower basket cannot be effectively removed;
6. the cleaning process may introduce other contaminants.
Disclosure of Invention
In view of the above, the invention provides a cleaning method for transferring and cleaning a flower basket by a battery, which is characterized in that a normal-temperature cleaning solution is prepared by using a unique formula, the flower basket is cleaned by ultrasonic vibration, then the cleaning solution attached to the surface of the flower basket and the cleaned impurities are removed by a pure water bubbling cleaning mode, and then dehydration and drying are performed.
In order to achieve the technical effects, the invention adopts the following specific technical scheme:
a cleaning method for cleaning a transport basket of silicon-based cells, comprising the following steps:
preparing normal-temperature cleaning liquid, wherein the normal-temperature cleaning liquid comprises 70-90 parts by weight of water and 8-12ppm of O30.17-0.23 parts by weight of surfactant and 0.00009-0.000094 parts by weight of HF;
carrying out ultrasonic cleaning on the flower basket in the normal-temperature cleaning solution;
carrying out inert gas bubbling cleaning on the ultrasonically cleaned flower basket in pure water;
dehydrating the flower basket after bubbling cleaning;
and drying the dehydrated flower basket.
Further, the cleaning solution comprises 80 parts by weight of water and 10ppm of O30.2 parts by weight of a surfactant and 0.000092 parts by weight of HF.
Further, the ultrasonic cleaning method comprises the following steps: placing the flower basket in a cleaning tank body, and vibrating the cleaning liquid in the cleaning tank body through ultrasonic; the duration of the ultrasonic cleaning is 25-35 min.
Further, the duration of the ultrasonic cleaning is 30min, including cleaning with an ultrasonic frequency of 28kHz for 10-15min and cleaning with an ultrasonic frequency of 40kHz for 15-20 min.
Further, the cleaning times of the inert gas bubbling cleaning are 2-4 times, and the duration of each time is 3-7 min.
Further, the cleaning times of the inert gas bubbling cleaning are 3 times, and the duration of each time is 5 min.
Further, the dehydration mode is as follows: placing the flower basket in a container of anhydrous ethanol, and standing for 8-12 min.
Further, the inert gas bubbling cleaning is nitrogen bubbling cleaning.
Further, the drying mode is as follows: the flower basket is placed in a spin dryer and rotated for 8-12min at the speed of 1400-1600 r/min.
Further, in the drying process, heating gas is also introduced into the spin dryer, and the heating gas comprises nitrogen. By adopting the technical scheme, the invention can bring the following beneficial effects:
dissolving O in the cleaning liquid3The function of the cleaning agent is to clean organic matters attached to the surface of the flower basket because of O3Has strong oxidizability, and can decompose organic matters attached to the surface of the flower basket into CO2And H2And O, achieving the purpose of removing the organic matters on the surface. Organic matters attached to the surface are removed, so that metal ions and other particles can be better removed;
HF is added into the cleaning solution, the pH value of the solution can be controlled, and the state of metal complex ions in the cleaning solution can be controlled, so that the metal ions can be removed, and the reattachment of metal is inhibited;
the silicon slag particles or other dust particles can fall off from the surface of the flower basket more quickly and effectively by adopting an ultrasonic cleaning mode; the use of the surfactant can reduce the surface tension of the cleaning solution, prevent the cleaned particles from being adsorbed on the surface of the flower basket again, and keep higher particle removal efficiency.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a flow chart of a cleaning method in an embodiment of the present invention.
Detailed Description
The embodiments of the present application will be described in detail below with reference to the accompanying drawings.
The following description of the embodiments of the present application is provided by way of specific examples, and other advantages and effects of the present application will be readily apparent to those skilled in the art from the disclosure herein. It is to be understood that the embodiments described are only a few embodiments of the present application and not all embodiments. The present application is capable of other and different embodiments and its several details are capable of modifications and/or changes in various respects, all without departing from the spirit of the present application. It is to be noted that the features in the following embodiments and examples may be combined with each other without conflict. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
It is noted that various aspects of the embodiments are described below within the scope of the appended claims. It should be apparent that the aspects described herein may be embodied in a wide variety of forms and that any specific structure and/or function described herein is merely illustrative. Based on the present application, one skilled in the art should appreciate that one aspect described herein may be implemented independently of any other aspects and that two or more of these aspects may be combined in various ways. For example, an apparatus may be implemented and/or a method practiced using any number of the aspects set forth herein. Additionally, such an apparatus may be implemented and/or such a method may be practiced using other structure and/or functionality in addition to one or more of the aspects set forth herein.
It should be noted that the drawings provided in the following embodiments are only for illustrating the basic idea of the present application, and the drawings only show the components related to the present application rather than the number, shape and size of the components in actual implementation, and the type, amount and ratio of the components in actual implementation may be changed arbitrarily, and the layout of the components may be more complicated.
In addition, in the following description, specific details are provided to facilitate a thorough understanding of the examples. However, it will be understood by those skilled in the art that the aspects may be practiced without these specific details.
The embodiment of the application provides a cleaning method for cleaning a transfer cleaning flower basket of a silicon-based battery, as shown in fig. 1, comprising the following steps:
s101, preparing a normal-temperature cleaning solution comprising 70-90 parts by weight of water and 8-12ppm of O30.17-0.23 parts by weight of surfactant and 0.00009-0.000094 parts by weight of HF.
In this example, the cleaning solution comprises 80 parts by weight of water, 10ppm of O30.2 parts by weight of a surfactant and 0.000092 parts by weight of HF.
In this embodiment, O is dissolved in the cleaning liquid3The function of the cleaning agent is to clean organic matters attached to the surface of the flower basket because of O3Has strong oxidizability, and can decompose organic matters attached to the surface of the flower basket into CO2And H2And O, achieving the purpose of removing the organic matters on the surface. Organic matters attached to the surface are removed, so that metal ions and other particles can be better removed; HF is added into the cleaning solution, the main purpose is to remove metal ions, the pH value of the solution can be controlled after the HF is added, the state of metal complex ions in the cleaning solution can be controlled, and the reattachment of metal is inhibited; the use of the surfactant reduces the surface tension of the cleaning solution, can prevent the cleaned particles from being adsorbed on the surface of the flower basket again, and keeps higher particle removal efficiency.
S102, ultrasonically cleaning the flower basket in a normal-temperature cleaning solution.
In this embodiment, the normal temperature cleaning solution can greatly simplify the process conditions. The adoption of the ultrasonic cleaning mode can enable the silicon slag particles or other dust particles to fall off from the surface of the flower basket more quickly and effectively.
S103, the cleaned flower basket is cleaned in pure water by bubbling inert gas which does not generate oxidation reaction with the flower basket.
In this embodiment, the pure water is bubbled and washed and then soaked in absolute ethyl alcohol by standing, which not only can effectively remove water and play a certain role in drying, but also can remove some of the cleaning solution remaining in the first step.
In this example, the inert gas is nitrogen.
S104, dehydrating the flower basket after bubbling cleaning.
In this example, the heat N was applied by a spin dryer2The flower basket can be dried quickly and effectively by means of spin drying, and other pollution cannot be introduced.
S105, drying the dehydrated flower basket.
In this embodiment, because the volume limit (100L) of the existing ultrasonic cleaning apparatus is adopted, only one basket can be cleaned at a time, the cleaning solution is prepared to contain 80L of pure water after reverse osmosis process or ultrapure water after EDI (electro deionization, continuous electrolytic desalination) adsorption, and the ultrapure water is selected here because the ultrapure water supply in the silicon wafer production plant is convenient; the weight of the surfactant was set at 200g, and 1L of HF gas was added to the solution.
In this embodiment, the ultrasonic cleaning in S102 specifically includes: the flower basket is placed in an ultrasonic cleaning tank body, the tank body is cleaned through ultrasonic vibration, the ultrasonic cleaning duration is 25-35min, the ultrasonic cleaning duration is 30min as the best, when the frequency of ultrasonic waves is lower, cavitation generated in liquid is easier, the generated cleaning force is high, the effect is strong, the cleaning tank is suitable for coarse cleaning, dirty cleaning and initial cleaning of workpieces, and when the frequency of the ultrasonic waves is high, the ultrasonic wave directivity is strong, the cleaning tank is suitable for cleaning fine objects, so in the embodiment, cleaning with the ultrasonic frequency of 28kHz and the ultrasonic frequency of 40kHz, wherein the ultrasonic frequency lasts for 10-15min is performed firstly, and then cleaning with the ultrasonic frequency of 15-20min is performed. Preferably, the ultrasonic frequency is 28kHz for 10min, and then 40kHz for 20 min.
In this embodiment, the specific manner of the bubbling cleaning in S103 is as follows: n is a radical of2The washing times of the bubbling washing are 2-4 times, and the duration of each time is 3-7 min. Preferably, N is2The washing times of the bubbling washing are 3 times, and the duration of each time is 5min optimally.
In this embodiment, the dehydration mode in S104 is specifically: placing the flower basket in a container of absolute ethyl alcohol for standing. In this embodiment, the standing time is 8-12min, preferably 10 min.
In this embodiment, the drying manner of the flower basket in S105 specifically includes: the flower basket is placed in a spin dryer and rotated for 8-12min at the speed of 1400-1600r/min, and preferably rotated for 10min at the speed of 1500 r/min.
In this embodiment, during the drying process of S105, a heating gas is further introduced into the spin dryer, where the heating gas is N2Or N at a concentration of 90% or more2。
The flower basket after being cleaned is at N2And storing in a cabinet.
In summary, compared with the prior art, the technical scheme of the invention has the following advantages:
1. in the prior art, the time for cleaning the flower basket is long, which is about to soak for 12 hours, but the technical scheme can complete the whole process of cleaning the flower basket only in 2 hours, and the process turnover period is shortened.
2. The flower basket needs to be heated to 80 ℃ for soaking in the prior art, and the technical scheme can be carried out at normal temperature, so that the cleaning difficulty is greatly reduced, and the cleaning cost is also reduced.
3. The effect of the prior art for cleaning the flower basket can not completely remove all impurities, but the technical scheme performs targeted configuration on components in the cleaning solution aiming at the application of the flower basket, provides different treatment technologies according to different cleaning stages, has very effective cleaning effect, and can completely remove all impurities.
The above description is only for the specific embodiments of the present application, but the scope of the present application is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present application should be covered within the scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.
Claims (10)
1. A cleaning method for cleaning a transport basket of silicon-based cells, comprising the following steps:
preparing normal-temperature cleaning liquid, wherein the normal-temperature cleaning liquid comprises 70-90 parts by weight of water and 8-12ppm of O30.17-0.23 parts by weight of surfactant and 0.00009-0.000094 parts by weight of HF;
carrying out ultrasonic cleaning on the flower basket in the normal-temperature cleaning solution;
carrying out inert gas bubbling cleaning on the ultrasonically cleaned flower basket in pure water;
dehydrating the flower basket after bubbling cleaning;
and drying the dehydrated flower basket.
2. The cleaning method according to claim 1, characterized in that: the cleaning solution comprises 80 parts by weight of water and 10ppm of O30.2 parts by weight of a surfactant and 0.000092 parts by weight of HF.
3. The cleaning method according to claim 1, wherein the ultrasonic cleaning is performed by: placing the flower basket in a cleaning tank body, and vibrating the cleaning liquid in the cleaning tank body through ultrasonic; the duration of the ultrasonic cleaning is 25-35 min.
4. The cleaning method according to claim 3, characterized in that: the duration of the ultrasonic cleaning is 30min, and the ultrasonic cleaning comprises the cleaning with the ultrasonic frequency of 28kHz lasting for 10-15min and the cleaning with the ultrasonic frequency of 40kHz lasting for 15-20 min.
5. The cleaning method according to claim 1, characterized in that: the cleaning times of the bubbling cleaning of the inert gas are 2-4 times, and the duration of each time is 3-7 min.
6. The cleaning method according to claim 5, characterized in that: the cleaning times of the bubbling cleaning of the inert gas are 3 times, and the duration of each time is 5 min.
7. The cleaning method according to claim 1, wherein the dehydration is performed by: placing the flower basket in a container of anhydrous ethanol, and standing for 8-12 min.
8. The cleaning method according to any one of claims 1 to 7, wherein the inert gas bubbling cleaning is a nitrogen bubbling cleaning.
9. The cleaning method according to any one of claims 1 to 7, wherein the drying is performed by: the flower basket is placed in a spin dryer and rotated for 8-12min at the speed of 1400-1600 r/min.
10. The cleaning method according to claim 9, characterized in that: and in the drying process, heating gas is also introduced into the spin dryer, and the heating gas comprises nitrogen.
Priority Applications (1)
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CN202110082395.4A CN113441463A (en) | 2021-01-21 | 2021-01-21 | Cleaning method |
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CN202110082395.4A CN113441463A (en) | 2021-01-21 | 2021-01-21 | Cleaning method |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115069644A (en) * | 2022-07-12 | 2022-09-20 | 江苏格林保尔光伏有限公司 | Cleaning equipment for solar cell dry flower basket |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1099675A (en) * | 1993-02-22 | 1995-03-08 | 柴野佳英 | Method of oscillating ultrasonic vibrator for ultrasonic cleaning |
US5665168A (en) * | 1994-08-30 | 1997-09-09 | Shin-Etsu Handotai Co., Ltd. | Method for cleaning semiconductor silicon wafer |
CN103000502A (en) * | 2012-10-29 | 2013-03-27 | 江苏卡迪诺节能保温材料有限公司 | Method for implementing aluminum diffusion on silicon wafer |
CN103736690A (en) * | 2013-12-31 | 2014-04-23 | 上海集成电路研发中心有限公司 | Silicon chip washing method |
CN104043605A (en) * | 2013-03-13 | 2014-09-17 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Carrier cleaning device and carrier cleaning method |
CN105689325A (en) * | 2016-04-18 | 2016-06-22 | 北京哈密瓜科技有限公司 | Intelligent multifrequency ultrasonic cleaning device and method |
CN106319636A (en) * | 2016-09-23 | 2017-01-11 | 西安黄河光伏科技股份有限公司 | Preparation method for improving fabric surface of single crystalline silicon solar cell and preparation tool |
CN206854241U (en) * | 2017-04-11 | 2018-01-09 | 安徽高芯众科半导体有限公司 | Multifrequency alternate oscillation ultrasonic washing instrument for photoelectricity parts |
CN107790456A (en) * | 2017-09-29 | 2018-03-13 | 佛山华国光学器材有限公司 | A kind of cleaning of infrared chalcogenide glass lenses |
CN109107974A (en) * | 2018-07-20 | 2019-01-01 | 横店集团东磁股份有限公司 | A kind of solar battery preparation cleaning method of quartz member |
CN110441924A (en) * | 2019-08-08 | 2019-11-12 | 苏州嗨喽科技有限公司 | A kind of cleaning control method of contact lenses |
CN110479691A (en) * | 2019-07-29 | 2019-11-22 | 江苏顺风新能源科技有限公司 | A kind of cleaning method of solar battery dried flower basket |
-
2021
- 2021-01-21 CN CN202110082395.4A patent/CN113441463A/en active Pending
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1099675A (en) * | 1993-02-22 | 1995-03-08 | 柴野佳英 | Method of oscillating ultrasonic vibrator for ultrasonic cleaning |
US5665168A (en) * | 1994-08-30 | 1997-09-09 | Shin-Etsu Handotai Co., Ltd. | Method for cleaning semiconductor silicon wafer |
CN103000502A (en) * | 2012-10-29 | 2013-03-27 | 江苏卡迪诺节能保温材料有限公司 | Method for implementing aluminum diffusion on silicon wafer |
CN104043605A (en) * | 2013-03-13 | 2014-09-17 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Carrier cleaning device and carrier cleaning method |
CN103736690A (en) * | 2013-12-31 | 2014-04-23 | 上海集成电路研发中心有限公司 | Silicon chip washing method |
CN105689325A (en) * | 2016-04-18 | 2016-06-22 | 北京哈密瓜科技有限公司 | Intelligent multifrequency ultrasonic cleaning device and method |
CN106319636A (en) * | 2016-09-23 | 2017-01-11 | 西安黄河光伏科技股份有限公司 | Preparation method for improving fabric surface of single crystalline silicon solar cell and preparation tool |
CN206854241U (en) * | 2017-04-11 | 2018-01-09 | 安徽高芯众科半导体有限公司 | Multifrequency alternate oscillation ultrasonic washing instrument for photoelectricity parts |
CN107790456A (en) * | 2017-09-29 | 2018-03-13 | 佛山华国光学器材有限公司 | A kind of cleaning of infrared chalcogenide glass lenses |
CN109107974A (en) * | 2018-07-20 | 2019-01-01 | 横店集团东磁股份有限公司 | A kind of solar battery preparation cleaning method of quartz member |
CN110479691A (en) * | 2019-07-29 | 2019-11-22 | 江苏顺风新能源科技有限公司 | A kind of cleaning method of solar battery dried flower basket |
CN110441924A (en) * | 2019-08-08 | 2019-11-12 | 苏州嗨喽科技有限公司 | A kind of cleaning control method of contact lenses |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115069644A (en) * | 2022-07-12 | 2022-09-20 | 江苏格林保尔光伏有限公司 | Cleaning equipment for solar cell dry flower basket |
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