CN113433724B - Display panel and display device - Google Patents
Display panel and display device Download PDFInfo
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- CN113433724B CN113433724B CN202110757448.8A CN202110757448A CN113433724B CN 113433724 B CN113433724 B CN 113433724B CN 202110757448 A CN202110757448 A CN 202110757448A CN 113433724 B CN113433724 B CN 113433724B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133357—Planarisation layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
- G02F1/134363—Electrodes characterised by their geometrical arrangement for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS]
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
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- Crystallography & Structural Chemistry (AREA)
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- Optics & Photonics (AREA)
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Abstract
The invention provides a display panel and a device. The common electrode layer is electrically connected with the array substrate through the via hole, and meanwhile, the pixel electrode layer is connected with the common electrode layer in the via hole bottom area through the via hole, so that the problem that the touch performance of the display panel is affected due to the fact that the electrode layer is prone to breaking in the via hole area is solved, and the reliability and the touch effect of the display panel are effectively improved.
Description
Technical Field
The invention relates to the technical field of manufacturing of display panels, in particular to a display panel and a display device.
Background
With the continuous improvement of the manufacturing technology of the display panel, people put higher demands on the performance and quality of the display panel.
Among them, Organic Light-Emitting diodes (OLEDs) and Liquid Crystal Displays (LCDs) are the most commonly used flat panel displays. Organic electroluminescent devices have been the most promising display devices in recent years because of their advantages such as self-luminescence, all solid-state property, and high contrast. However, in the conventional manufacturing technology of the display panel, there is a certain defect in manufacturing and forming each film layer structure in the display device, thereby reducing the improvement of the overall performance of the display panel. For example, when a common electrode layer connected to the touch layer in the display panel is formed, the common electrode layer is directly electrically connected to the second metal layer through a via hole, and a pixel electrode layer of the display panel is electrically connected to a source or a drain of the thin film transistor through another via hole. When the above-mentioned mode is adopted for connection, the problem that the corresponding film layer is easy to break under the action of stress in the transition area of the via hole is solved, and once the pixel electrode layer arranged in the via hole breaks, the impedance of the touch layer of the display panel is increased, so that the touch performance of the panel is influenced.
In summary, when each film layer inside the touch display panel is formed, the film layers inside the display panel are prone to fracture and other problems under the action of stress in the transition region of the via hole, so that the touch performance of the touch display panel is affected, and the comprehensive performance of the panel is reduced.
Disclosure of Invention
Embodiments of the present invention provide a display panel and a display device, so as to effectively solve the problem that when a touch display panel is manufactured and formed, a film layer inside the touch display panel is easily broken at a transition region of a via hole, so that impedance of a touch layer is increased, and touch performance of the panel is reduced.
In order to solve the above technical problem, the technical method provided by the embodiment of the present invention is as follows:
an array substrate;
a planarization layer disposed on the array substrate;
a common electrode layer disposed on the planarization layer;
a passivation layer disposed on the common electrode layer; and the number of the first and second groups,
a pixel electrode layer disposed on the passivation layer;
the display panel further comprises a via hole, the via hole penetrates through the planarization layer and the passivation layer, the public electrode layer is electrically connected with the array substrate through the via hole, and the pixel electrode layer is connected with the public electrode layer in the bottom area of the via hole through the via hole.
According to an embodiment of the present invention, the common electrode layer includes a bonding portion and an extension portion, the bonding portion is connected to the extension portion, the bonding portion is bonded to the film layer in the sidewall region and the bottom region of the via hole, and the extension portion is disposed on the planarization layer.
According to an embodiment of the present invention, a thickness of the common electrode layer in the bottom region of the via hole is greater than a thickness of the common electrode layer in the sidewall region.
According to an embodiment of the present invention, a slope is formed between the bottom of the via and the sidewall of the via.
According to an embodiment of the present invention, the gradient is between 120 ° and 150 °.
According to an embodiment of the present invention, the array substrate includes:
a substrate;
an active layer disposed on the substrate;
a gate insulating layer disposed on the active layer;
a gate disposed on the insulating layer;
an interlayer insulating layer disposed on the gate electrode;
and a metal layer disposed on the interlayer insulating layer;
the array substrate further comprises a via hole, the metal layer is electrically connected with the active layer through the via hole, the via hole is arranged in an area corresponding to the metal layer, and the common electrode layer is electrically connected with the metal layer through the via hole.
According to an embodiment of the present invention, a projection of the bottom region of the via hole on the interlayer insulating layer is located within a projection of the metal layer on the interlayer insulating layer.
According to an embodiment of the present invention, in the via region, a thickness of the pixel electrode layer is greater than a thickness of the common electrode layer.
According to an embodiment of the present invention, the display panel further includes a conductive layer, the conductive layer is disposed between the metal layer and the common electrode layer, an end portion of the conductive layer is disposed on a sidewall inside the via hole, and the conductive layer covers the metal layer inside the via hole region.
According to a second aspect of the embodiments of the present invention, there is also provided a bearing device, including:
a substrate;
a display panel disposed on the substrate; and (c) a second step of,
an encapsulation layer disposed on the display panel;
wherein the display panel includes: an array substrate;
a planarization layer disposed on the array substrate;
a common electrode layer disposed on the planarization layer;
a passivation layer disposed on the common electrode layer; and the number of the first and second groups,
A pixel electrode layer disposed on the passivation layer;
the display panel further comprises a via hole, the via hole penetrates through the planarization layer and the passivation layer, the common electrode layer is electrically connected with the array substrate through the via hole, and the pixel electrode layer is connected with the common electrode layer in the bottom area of the via hole through the via hole.
In summary, the embodiments of the present invention have the following beneficial effects:
embodiments of the present invention provide a display panel and a display device, which are used to improve the touch performance of the display panel and prevent the impedance of a touch layer from increasing due to the breakage of a film layer inside the panel. In the embodiment of the invention, the common electrode layer and the pixel electrode layer are arranged in the same through hole, and the common electrode layer and the pixel electrode layer are attached to each other in the through hole. And then the impedance of the touch layer can not change when the common electrode layer is broken, and the touch and other comprehensive performances of the touch display panel are ensured.
Drawings
The technical solution and other advantages of the present invention will become more apparent from the detailed description of the embodiments of the present invention with reference to the accompanying drawings.
Fig. 1 is a schematic diagram of a film structure of a display panel provided in the prior art;
fig. 2 is a schematic structural diagram of a display panel according to an embodiment of the present invention;
fig. 3 is a schematic diagram of a partial film structure of a display panel according to an embodiment of the present invention;
fig. 4 is a schematic view of another film structure of a display panel according to an embodiment of the present invention;
fig. 5 is a schematic wiring diagram of the display panel provided by the embodiment of the invention at the first via hole.
Detailed Description
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated.
With the continuous expansion of the user's demand for various displays, the requirements of people on various performances and qualities of display panels are also increasing. The panels are gradually becoming thinner and lighter and more portable. For the conventional light and thin touch display panel, most manufacturers adopt an in-cell touch structure design, in which the second metal layer is connected to the common electrode layer at the bottom through a via hole on the planarization layer. However, the common electrode disposed at the bottom of the via hole is easily broken, which increases the impedance of the touch electrode and further affects the touch performance of the display panel.
As shown in fig. 1, fig. 1 is a schematic diagram of a film structure of a display panel provided in the prior art. The display panel includes a buffer layer 100, a gate insulating layer 101 disposed on the buffer layer 100, a planarization layer 102 disposed on the gate insulating layer 101, and a passivation layer 103 disposed on the planarization layer 102.
Meanwhile, the display panel further includes a second metal layer 106, and the second metal layer 106 is disposed on the gate insulating layer 101. And a common electrode layer 105, wherein the common electrode layer 105 is disposed on the planarization layer 102, and the common electrode layer 105 is connected to the second metal layer 106 through a via 107. And the pixel defining layer 104 is arranged on the passivation layer 103, and the pixel defining layer 104 is also connected with the source electrode or the drain electrode of the thin film transistor through the corresponding via hole, so as to further realize the acquisition and transmission of the touch driving signal.
However, in the bottom region of the via hole 107, since there is a certain angle between the bottom and the sidewall of the via hole 107, the common electrode layer 105 is stressed complicatedly at the connection point of the bottom and the sidewall, and a fracture problem is easily caused in the region. Once the common electrode layer 105 is broken in this area, the impedance of the touch layer becomes large, thereby affecting the touch performance of the panel.
The embodiment of the invention provides a display panel and a display device. When the embedded touch structure is arranged in the display panel, each electrode layer and the touch film layer in the display panel cannot be broken, so that the quality and the touch performance of the display panel are effectively improved.
As shown in fig. 2, fig. 2 is a schematic structural diagram of a display panel according to an embodiment of the present invention. The display panel includes an array substrate 20, a planarization layer 204, a common electrode layer 205, a passivation layer 206, and a pixel electrode layer 213.
Specifically, in the embodiment of the present invention, the planarization layer 204 is disposed on the array substrate 20, the common electrode layer 205 is disposed on the planarization layer 204, the passivation layer 206 is disposed on the common electrode layer 205, and the passivation layer 206 completely covers the common electrode layer 205. Meanwhile, the pixel electrode layer 213 is disposed on the passivation layer 206.
In the embodiment of the present invention, the display panel further includes a first via 212. Wherein the first via 212 is disposed on the array substrate 20, and the first via 212 penetrates through the planarization layer 204 and the passivation layer 206. By providing the first via hole 212, the common electrode layer 205 of the display panel is electrically connected to the array substrate 20 through the first via hole.
Specifically, the common electrode layer 205 also forms a filled hole structure in the first via hole 212, so that the pixel electrode layer 213 is also electrically connected to the common electrode layer 205 through the first via hole 212, or the pixel electrode layer 213 fills the hole structure formed by the common electrode layer 205 in the first via hole 212. Further, the array substrate 20, the common electrode layer 205, and the pixel electrode layer 213 are electrically connected to each other. When a touch signal is applied to the display panel, the transmission of the touch signal is realized and the touch action is completed.
Further, in the embodiment of the present invention, the array substrate 20 includes a substrate 200, a buffer layer 201, a light-shielding layer 208, a gate insulating layer 202, an interlayer insulating layer 203, and a thin film transistor 207.
Specifically, a buffer layer 201 is provided on the substrate 200, a light-shielding layer 208 is provided on the substrate 200, and a thin film transistor 207 is provided on the buffer layer 201.
The thin film transistor 207 includes an active layer 209, a source electrode 210, a drain electrode, a gate electrode, and a dielectric layer disposed between the electrodes. Wherein the active layer 209 is disposed on the buffer layer 201, the gate insulating layer 202 is disposed on the buffer layer 201, and the gate insulating layer 202 covers the active layer 209. Meanwhile, the source electrode 210 and the drain electrode are electrically connected to the active layer 209 through corresponding via holes, as shown in fig. 2, and the thin film transistor 207 is disposed on a corresponding region of the light-shielding layer 208.
In the embodiment of the present invention, the display panel further includes a second metal layer 211, where the second metal layer 211 is disposed on the array substrate 20, and specifically, the second metal layer 211 is disposed on the interlayer insulating layer 203. Wherein a portion of the second metal layer 211 disposed on the interlayer insulating layer 203 forms a source 210 and a drain of the thin film transistor 207.
Specifically, the first via hole 212 is disposed at a position corresponding to an upper region of the second metal layer 211, and meanwhile, an aperture of the first via hole 212 is smaller than a width of the corresponding second metal layer 211. And the first via 212 extends through the planarization layer 204 and the passivation layer 206.
In the embodiment of the invention, since the first via 212 penetrates through the planarization layer 204 and the passivation layer 206, the via structure formed by the first via 212 on the planarization layer 204 and the passivation layer 206 may be a continuous via, or the apertures of the vias formed by the first via 212 on the two layers may be different. To achieve the connection between the film layers, the first via 212 may have a corresponding aperture on the planarization layer 204 that is larger than a corresponding aperture on the passivation layer 206.
The pixel electrode layer 213 is also correspondingly connected to the common electrode layer 205 through the first via hole 212. Specifically, the pixel electrode layer 213 is connected to the corresponding common electrode layer 205 in the bottom region of the first via hole 212. Thus, even if the common electrode layer 205 is broken at the bottom and near the sidewall of the first via hole 212, the pixel electrode layer 213 is still in contact with the common electrode layer 205 in the bottom region, i.e., the pixel electrode layer 213 is still in conduction with the second metal layer 211, and the impedance in the touch electrode layer in the display panel is hardly changed, thereby effectively ensuring the touch performance of the touch panel.
For further displaying the film structures in the first via hole 212 of the display panel, as shown in fig. 3, fig. 3 is a schematic view of a partial film structure of the display panel according to an embodiment of the present invention. In the embodiment of the invention, the common electrode layer 205 in the region corresponding to the first via hole 212 further includes an extension portion 2051 and a fitting portion 2052.
Specifically, the extension portion 2051 is connected to the bonding portion 2052 to form the entire common electrode layer 205. The extension 2051 is disposed on the planarization layer 204, and the extension 2051 is disposed within a peripheral region of the first via 212. The fitting portion 2052 fits to the sidewall area 301 and the film layer in the bottom area 300 in the first via hole 212.
In the embodiment of the invention, when the common electrode layer in the first via hole 212 is disposed, the thickness of the corresponding common electrode layer 205 in the bottom region 300 may be greater than the film thickness of the corresponding common electrode layer 205 in the sidewall region 301. In this way, since the film layer in the bottom region 300 is thicker, the contact between the common electrode layer in the bottom region 300 and the second metal layer 211 and the contact effect between the common electrode layer and the pixel electrode layer 213 can be effectively ensured, and the transmission effect of the touch signal of the touch panel can be effectively improved.
Preferably, when the first via hole 212 is provided, the first via hole 212 may be provided as a tapered via hole, and when provided as a tapered via hole structure, the slope 220 between the bottom surface of the bottom region 300 and the side surface of the sidewall region 301 is set between 120 ° and 150 °. In the embodiment of the invention, the slope 220 can be set to be 125 degrees, so that the problems that the common electrode layer is easy to crack in a transition section and the like are solved on the basis of ensuring that the common electrode layer is tightly attached to the bottom and the side wall, and the reliability of the touch display panel is further improved. Meanwhile, in the embodiment of the invention, in the side wall area of the first via hole, the thickness of the corresponding pixel electrode layer can be larger than the film thickness of the common electrode layer, so that the reliability of the touch display panel is effectively ensured.
Further, when the first via hole 212 is disposed, the first via hole 212 is disposed above the film layer corresponding to the second metal layer 211, and it is ensured that a projection of the bottom surface of the bottom region 300 of the first via hole 212 on the array substrate is located within a projection area range of the second metal layer 211 on the array substrate. That is, the bottom region 300 of the first via hole 212 completely falls within the second metal layer 211, so that when the common electrode layer 205 is disposed, the common electrode layer 205 can completely lay on the second metal layer 211, thereby ensuring the adhesion effect between the common electrode layer 205 and the second metal layer 211.
Preferably, in order to ensure the conduction effect between the two electrode layers and the second metal layer, the display panel may further include a conductive layer, and the conductive layer may be disposed between the second metal layer and the common electrode layer. The conductive layer may be disposed only at a position corresponding to a bottom region of the first via hole, or both side ends of the conductive layer may be extended into side wall regions of the first via hole. Therefore, the arranged common electrode layer is protected, and even if the common electrode layer is broken at a certain position in the first through hole, the common electrode layer can be communicated with the second metal layer at the bottom through the conducting layer, so that the reliability and the quality of the touch display panel are effectively improved.
Further, as shown in fig. 4, fig. 4 is a schematic view of another film structure of the display panel according to the embodiment of the present invention. The film layer structure corresponds to the respective film layers in the area of the first via 212. In conjunction with the film structure of fig. 3, in an embodiment of the invention, a first via 212 is etched in the planarization layer 204 and the passivation layer 206. Specifically, when the common electrode layer 205 is disposed, the extension portion 2051 of the common electrode layer 205 is disposed on the planarization layer 204, and the attaching portion 2052 of the common electrode layer 205 is only attached to the film layer in the sidewall region 301 of the first via hole 212, and meanwhile, the end portions of the attaching portion 2052 are respectively contacted with the surface of the second metal layer 211 to achieve conduction, and the common electrode layer 205 forms a disconnected structure in the bottom region 300 of the first via hole 212.
When the pixel electrode layer 213 in the first via hole 212 is provided, the pixel electrode layer 213 is directly provided on the common electrode layer 205, the pixel electrode layer 213 is bonded to the side wall of the common electrode layer 205, and the pixel electrode layer 213 is directly bonded to the second metal layer 211 in the bottom region 300. Thus, even if the common electrode layer at the bottom of the first via hole 212 is broken near the sidewall, the conduction between the pixel electrode layer 213 and the second metal layer 211 can still be maintained, so that the connection between the electrode layers is ensured, and when a touch signal is applied to the touch panel, the impedance on the touch electrode is not affected, and the touch signal can still be transmitted normally. Therefore, various touch control performances of the display panel provided by the embodiment of the invention are effectively ensured.
Specifically, the thickness of the common electrode layer 205 in the sidewall area 301 may be different. Preferably, the thickness of the corresponding common electrode layer 205 in the sidewall region 301 decreases gradually from the bottom region 300 to the top of the first via 212. Because the film layer in the bottom region 300 of the via hole is subjected to a greater stress than the film layer in the sidewall region 301, the film layer pair thickness near the bottom of the via hole is increased to effectively reduce the problem of cracking of the film layers.
Meanwhile, the thickness of the common electrode layer 205 in contact with the bottom region 300 is greater than the thickness of the common electrode layer 205 in the sidewall region 301. And the thickness of the pixel electrode layer 213 in the bottom region 300 is also greater than the thickness of the pixel electrode layer 213 in the sidewall region 301.
Further, when the common electrode layer 205 and the pixel electrode layer 213 are disposed, at least one step 215 may be formed on the surface of the planarization layer 204 by the two electrode layers, and by disposing the step 215, the gradient of the two electrode layers in the transition to the first via hole 212 is reduced, so that the transition of the electrode layers between the surface of the planarization layer 204 and the inclined plane is more gradual, the stress between the film layers is reduced, and the reliability of the touch display panel is effectively improved.
As shown in fig. 5, fig. 5 is a schematic diagram of a corresponding wiring of the display panel at the first via according to the embodiment of the present invention. Also combine the schematic diagrams of the display panel structures in fig. 3-4. During wiring, etching is performed on a film region corresponding to the second metal layer 211 to form a first via hole 212. When the first via hole 212 is formed by etching, the aperture of the first via hole 212 is smaller than the width of the corresponding second metal layer 211, so that the connection with the electrode layer is ensured during the subsequent preparation of the corresponding electrode layer. After the first via hole 212 is formed by etching, other film layers such as a pixel electrode layer are further disposed in a position corresponding to the first via hole 212, and a touch function of the touch panel is realized.
In the embodiment of the invention, the common electrode layer is also disposed on the first via hole 212, and the pixel electrode layer passes through the first via hole and the common electrode layer, so that even if the common electrode layer in the first via hole 212 is broken due to stress, the common electrode layer connected to the pixel electrode layer can be used as a conductive layer to connect the pixel electrode layer and the second metal layer, thereby effectively improving the reliability and the touch effect of the touch display panel.
Further, an embodiment of the present invention further provides a display device, where the display device includes the display panel provided in the embodiment of the present invention. The display device further comprises a packaging layer, a touch layer and other film layers, wherein the touch layer is arranged on the display panel, the packaging layer is arranged on the touch layer, and finally the display device in the embodiment of the invention is formed.
The display panel and the display device provided by the embodiment of the present invention are described in detail above, and the principle and the embodiment of the present invention are explained in the present document by applying specific examples, and the description of the above embodiments is only used to help understanding the technical scheme and the core idea of the present invention; those of ordinary skill in the art will understand that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (8)
1. A display panel, comprising:
an array substrate;
a planarization layer disposed on the array substrate;
A common electrode layer disposed on the planarization layer;
a passivation layer disposed on the common electrode layer; and the number of the first and second groups,
a pixel electrode layer disposed on the passivation layer;
the display panel further comprises a via hole, the via hole penetrates through the planarization layer and the passivation layer, the common electrode layer is electrically connected with the array substrate through the via hole, and the pixel electrode layer is connected with the common electrode layer in the bottom area of the via hole through the via hole; at least one step is formed on the surface of the planarization layer by the common electrode layer and the pixel electrode layer, and the thickness of the common electrode layer in the bottom region corresponding to the through hole is larger than that in the side wall region of the through hole; and the gradient between the bottom surface and the side surface of the via hole is set to be 120-150 degrees.
2. The display panel according to claim 1, wherein the common electrode layer comprises a fitting portion and an extension portion, the fitting portion is connected to the extension portion, the fitting portion is fitted to the film layer in the sidewall region and the bottom region of the via hole, and the extension portion is disposed on the planarization layer.
3. The display panel according to claim 2, wherein a slope is provided between the bottom of the via and the sidewall of the via.
4. The display panel according to claim 1, wherein the array substrate comprises:
a substrate;
an active layer disposed on the substrate;
a gate insulating layer disposed on the active layer;
a gate disposed on the insulating layer;
an interlayer insulating layer disposed on the gate electrode;
and a metal layer disposed on the interlayer insulating layer;
the array substrate further comprises a via hole, the metal layer is electrically connected with the active layer through the via hole, the via hole is arranged in an area corresponding to the metal layer, and the common electrode layer is electrically connected with the metal layer through the via hole.
5. The display panel according to claim 4, wherein a projection of the bottom region of the via hole on the interlayer insulating layer is located within a projection of the metal layer on the interlayer insulating layer.
6. The display panel according to claim 1, wherein a thickness of the pixel electrode layer is larger than a thickness of the common electrode layer in the via region.
7. The display panel according to claim 4, wherein the display panel further comprises a conductive layer, the conductive layer is disposed between the metal layer and the common electrode layer, an end portion of the conductive layer is disposed on a sidewall within the via hole, and the conductive layer covers the metal layer within the via hole region.
8. A display device, comprising:
a substrate;
a display panel disposed on the substrate; and the number of the first and second groups,
an encapsulation layer disposed on the display panel;
wherein the display panel includes: an array substrate;
a planarization layer disposed on the array substrate;
a common electrode layer disposed on the planarization layer;
a passivation layer disposed on the common electrode layer; and the number of the first and second groups,
a pixel electrode layer disposed on the passivation layer;
the display panel further comprises a through hole, the through hole penetrates through the planarization layer and the passivation layer, the common electrode layer is electrically connected with the array substrate through the through hole, the pixel electrode layer is connected with the common electrode layer in the bottom area of the through hole through the through hole, the common electrode layer and the pixel electrode layer form at least one step on the surface of the planarization layer, and the thickness of the common electrode layer in the bottom area corresponding to the through hole is larger than that in the side wall area of the through hole; and the gradient between the bottom surface and the side surface of the via hole is set to be 120-150 degrees.
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| CN107884973A (en) * | 2016-09-30 | 2018-04-06 | 乐金显示有限公司 | Touch liquid crystal display device and its manufacture method |
| CN107958916A (en) * | 2016-10-14 | 2018-04-24 | 三星显示有限公司 | Display device |
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| CN105116655B (en) * | 2015-09-22 | 2017-04-12 | 深圳市华星光电技术有限公司 | Liquid crystal display panel, array substrate and manufacturing method of array substrate |
| CN105467703B (en) * | 2015-12-11 | 2019-08-13 | 厦门天马微电子有限公司 | The manufacturing method of array substrate, display panel and array substrate |
| CN106158882B (en) * | 2016-09-27 | 2019-02-26 | 厦门天马微电子有限公司 | A kind of display device, display panel, array substrate and preparation method thereof |
| CN108062915B (en) * | 2018-01-11 | 2019-10-22 | 京东方科技集团股份有限公司 | Array substrate and its manufacturing method, touch-control display panel, touch control display apparatus |
| CN111045238B (en) * | 2019-12-16 | 2022-07-29 | 武汉华星光电技术有限公司 | Liquid crystal touch control display panel |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107884973A (en) * | 2016-09-30 | 2018-04-06 | 乐金显示有限公司 | Touch liquid crystal display device and its manufacture method |
| CN107958916A (en) * | 2016-10-14 | 2018-04-24 | 三星显示有限公司 | Display device |
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