CN113419401A - Photosensitive emulsion for heat-sensitive positive image CTP plate and preparation method thereof - Google Patents

Photosensitive emulsion for heat-sensitive positive image CTP plate and preparation method thereof Download PDF

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CN113419401A
CN113419401A CN202110643534.6A CN202110643534A CN113419401A CN 113419401 A CN113419401 A CN 113419401A CN 202110643534 A CN202110643534 A CN 202110643534A CN 113419401 A CN113419401 A CN 113419401A
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parts
photosensitive
stirring
reaction
photosensitive emulsion
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孙长义
郭俊成
李长华
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Anhui Qiangbang New Material Co ltd
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Anhui Qiangbang New Material Co ltd
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/2805Compounds having only one group containing active hydrogen
    • C08G18/2815Monohydroxy compounds
    • C08G18/284Compounds containing ester groups, e.g. oxyalkylated monocarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/48Polyethers
    • C08G18/4829Polyethers containing at least three hydroxy groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/74Polyisocyanates or polyisothiocyanates cyclic
    • C08G18/76Polyisocyanates or polyisothiocyanates cyclic aromatic
    • C08G18/7657Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings
    • C08G18/7664Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups
    • C08G18/7671Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups containing only one alkylene bisphenyl group

Abstract

The invention discloses a photosensitive emulsion for a heat-sensitive positive CTP plate and a preparation method thereof, which relate to the field of CTP plate materials, and form a photosensitive emulsion by taking matrix resin and film-forming resin as main raw materials and well proportioning the matrix resin and the film-forming resin with other raw materials from a photosensitive layer of the CTP plate; the preparation process of the photosensitive glue is characterized in that a cementing agent is prepared, wherein polyether triol is a high polymer material with the characteristics of good mechanical property, good bonding property, thermal oxidation resistance, light resistance and the like, but a large amount of hydroxyl exists on the polyether triol, the water absorption is strong, the hydrolytic stability is poor, and then the hydroxyl group of the polyether triol is blocked after the reaction of isocyanate groups, so that the problem of poor hydrolytic stability of the polyether triol is solved, the good bonding property of the photosensitive glue is kept, the bonding property of the photosensitive glue can be improved, and the problem that the photosensitive property of the photosensitive glue is influenced due to low adhesive force is solved.

Description

Photosensitive emulsion for heat-sensitive positive image CTP plate and preparation method thereof
Technical Field
The invention relates to the field of CTP plate materials, in particular to a photosensitive emulsion for a heat-sensitive positive CTP plate and a preparation method thereof.
Background
At present, the development speed of the CTP technology in the world is fast, various CTP systems compete with each other, wherein the development speed of the thermosensitive CTP is fastest, more than 60% of the total machine loading amount of the CTP is taken as a thermosensitive plate making machine, the thermosensitive technology becomes one of the mainstream directions of the development and popularization of the CTP technology, and the thermosensitive CTP plate material has the following advantages: (1) the thermosensitive CTP plate adopts infrared laser exposure to have low natural light sensitivity, so that the plate can be operated under the condition of a bright room; (2) the thermosensitive plate must reach an initial heat energy threshold value when generating images, and the heat energy higher than the initial threshold value does not change the shape of dots, so that the thermosensitive plate is the only technology capable of controlling the predicted result, the quality is easy to control, the publishing quality is stable, the exposed printing plate can be developed after being prolonged to 6 months, and the quality of the plate is not influenced at all; (3) the thermosensitive CTP photosensitive emulsion is a micro-graphic processing material coated on the surface of a thermosensitive CTP printing plate to form an image latent image and restore a required output image, and along with the maturity of the domestic thermosensitive CTP technology, the CTP photosensitive emulsion serving as a consumable material is also more and more attracted by people.
However, the sensitivity of the current photosensitive resist for the heat-sensitive positive CTP plate to infrared laser exposure is low, the photosensitive performance and the developing resistance are poor, the viscosity is low, the adhesive force is reduced, and the photosensitive resist cannot be well adhered to a plate base, so that a photosensitive resist for the heat-sensitive positive CTP plate and a preparation method thereof are provided for solving the problems.
Disclosure of Invention
In order to overcome the technical problems, the invention aims to provide a photosensitive emulsion for a heat-sensitive positive CTP plate and a preparation method thereof.
The purpose of the invention can be realized by the following technical scheme:
a photosensitive emulsion for a heat-sensitive positive image CTP plate comprises the following components in parts by weight:
30-55 parts of matrix resin, 10-30 parts of film-forming resin, 10-30 parts of cementing agent, 1-6 parts of infrared dye, 0.5-2 parts of coloring dye, 3-8 parts of infrared absorbent, 10-15 parts of butanone, 2-5 parts of initiator, 1-3 parts of antioxidant, 3-8 parts of cosolvent, 2-6 parts of stabilizer, 3-7 parts of flatting agent, 2-5 parts of polymerization inhibitor and 2-6 parts of catalyst;
the preparation method of the cementing agent comprises the following steps:
s1: adding dimethyl carbonate, aniline and anhydrous zinc acetate into a four-neck flask provided with a stirrer and a condensation reflux pipe, heating to boil, carrying out reflux reaction for 6-8h, cooling to room temperature after the reaction is finished, carrying out vacuum filtration on a reaction product, carrying out reduced pressure distillation on a filtrate to remove unreacted dimethyl ester, aniline and generated methanol, precipitating crystals, washing the crystals for 2-3 times with deionized water, placing the crystals in a vacuum drying oven, and drying at the temperature of 30-40 ℃ to constant weight to obtain an intermediate 1;
the reaction principle is as follows:
Figure BDA0003108903270000021
s2: adding the intermediate 1 and a hydrochloric acid solution into a four-neck flask provided with a stirrer and a condensation reflux pipe, heating to 80 ℃, controlling the heating rate to be 1-3 ℃/min, then adding a formaldehyde solution, carrying out a constant-temperature reaction for 1-2h under the condition that the stirring speed is 100 plus one year/min, cooling to room temperature after the reaction is finished, carrying out centrifugal treatment on a reaction product, washing a precipitate for 2-3 times by using methanol, then washing for 2-3 times by using distilled water, filtering, placing a filter cake into a vacuum drying box, and drying to constant weight under the condition that the temperature is 30-40 ℃ to obtain an intermediate 2;
the reaction principle is as follows:
Figure BDA0003108903270000031
s3: dissolving the intermediate 2 in a solvent to obtain an intermediate 2 solution, adding the intermediate 2 solution and a catalyst into a reaction kettle, reacting for 0.5-2h under the conditions that the pressure is 0.5MPa and the temperature is 180-300 ℃, cooling to room temperature by using distilled water after the reaction is finished, filtering, and distilling the filtrate to remove the solvent to obtain an intermediate 3;
the reaction principle is as follows:
Figure BDA0003108903270000032
s4: adding the intermediate 3, dibutyltin dilaurate and tetrahydrofuran into a three-neck flask provided with a stirrer and a condensation reflux pipe, stirring and reacting for 10-20min under the conditions that the temperature is 65-70 ℃ and the stirring speed is 100-300r/min, placing polyether triol in a vacuum drying box, drying for 2-3h under the condition that the temperature is 120 ℃ to obtain dried polyether triol, dropwise adding the dried polyether triol into the three-neck flask, controlling the dropwise adding speed to be 1 drop/s, stirring and reacting for 2-3h at constant temperature to obtain an intermediate 4, adding hydroxyethyl methacrylate into the intermediate 4, and continuously stirring and reacting for 2-3h to obtain the cementing agent.
The reaction principle is as follows:
Figure BDA0003108903270000041
Figure BDA0003108903270000051
as a further scheme of the invention: in the step S1, the dosage ratio of the dimethyl carbonate to the aniline to the anhydrous zinc acetate is 30 mL: 6mL of: 0.3 g.
As a further scheme of the invention: the dosage ratio of the intermediate 1, the hydrochloric acid solution and the formaldehyde solution in the step S2 is 15.1 g: 10mL of: 2-3mL, wherein the mass fraction of the hydrochloric acid solution is 18%, and the mass fraction of the formaldehyde solution is 35-40%.
As a further scheme of the invention: in the step S3, the solvent is one of chlorobenzene, toluene, nitrobenzene, and n-pentadecane, and the catalyst is one of triethylamine and phosphorus pentoxide.
As a further scheme of the invention: in the step S4, the usage ratio of the intermediate 3, dibutyltin dilaurate, tetrahydrofuran, dried polyether triol, and hydroxyethyl methacrylate is 5.756 g: 0.096 g: 20-50 mL: 24 g: 6.24 g.
As a further scheme of the invention: a preparation method of a photosensitive emulsion for a heat-sensitive positive image CTP plate comprises the following steps:
step one, preparation of an infrared light absorber:
a1, preparation of aqueous dispersion: adding sodium polystyrene sulfonate and water into a reaction kettle, stirring and dissolving, adding 3, 4-ethylenedioxythiophene, ferric chloride and potassium persulfate under the stirring condition, and reacting for 1-2h at the temperature of 60 ℃ to obtain a water dispersion for later use;
a2, preparation of infrared light absorber: adding the aqueous dispersion into a dispersion barrel, adding nano metal oxide, and uniformly dispersing by ultrasonic waves to obtain an infrared light absorber for later use;
step two, glue solution preparation:
adding matrix resin, film-forming resin and cementing agent into a reaction kettle, heating to 80 ℃, stirring under the condition of 800-;
step three, preparing a photosensitive emulsion pigment:
adding an infrared dye and a coloring dye into a dispersing barrel, adding butanone, stirring for 4 hours at normal temperature, and fully dissolving and reacting to obtain a photosensitive emulsion pigment;
step four, preparing the photosensitive emulsion for the heat-sensitive positive image CTP plate:
and (2) respectively carrying out three-stage filtration on the original glue solution, the photosensitive resist pigment and the infrared light absorber by using filter elements with the aperture of 8 microns, 2 microns and 0.5 micron, then introducing the original glue solution into a reaction kettle, adding the infrared light absorber and a catalyst, heating to 70 ℃, stirring for reaction for 12 hours, adding the photosensitive resist pigment into the reaction kettle, stirring and dispersing for 4 hours, and thus obtaining the photosensitive resist for the heat-sensitive positive CTP plate.
As a further scheme of the invention: in the step A1, the mass ratio of the ferric chloride to the potassium persulfate to the 3, 4-ethylenedioxythiophene to the sodium polystyrene sulfonate to the water is 1-5: 10-15: 40-50: 100-200: 300-500.
As a further scheme of the invention: in the step A2, the nano metal oxide is one or a mixture of more than two of cerium oxide, titanium dioxide, aluminum oxide and ferric oxide with the particle size of 30-200nm in any proportion, and the mass ratio of the nano metal oxide to the aqueous dispersion is 1: 100-.
As a further scheme of the invention: the matrix resin is one of epoxy resin, carboxyl polyester resin and acrylic resin, and the film-forming resin is novolac resin with the weight-average molecular weight of 3000-10000.
As a further scheme of the invention: the infrared dye is a CTP infrared dye, and the coloring dye is one or a mixture of more than two of crystal violet, oil-soluble blue, methylene blue and eosin in any proportion.
As a further scheme of the invention: the initiator is one or a mixture of more than two of iodonium salt and sulfonium salt in any proportion; the antioxidant is one of an antioxidant 1010, an antioxidant 168 and an antioxidant 1076; the cosolvent is one of hydrophilic UV resin, organic acid or acid anhydride.
As a further scheme of the invention: the stabilizer is one of a calcium salt stabilizer, a zinc salt stabilizer and hydrotalcite, the flatting agent is one of an acrylate flatting agent and a fluorine flatting agent, and the polymerization inhibitor is hydroquinone.
The invention has the beneficial effects that:
the photosensitive glue for the heat-sensitive positive CTP plate and the preparation method thereof form the photosensitive glue by taking the matrix resin and the film-forming resin as main raw materials and well proportioning the matrix resin and the film-forming resin with other raw materials from the photosensitive layer of the CTP plate, and the viscosity of the photosensitive glue can be effectively improved by adding the cementing agent, so that the photosensitive glue has good adhesive force and can be tightly adhered to a plate base, thereby indirectly improving the photosensitive performance of the photosensitive glue;
a cementing agent is prepared in the process of preparing the photosensitive resist, dimethyl carbonate and aniline react under the catalytic action of anhydrous zinc acetate to generate an intermediate 1, then the intermediate 1 reacts with formaldehyde to generate an intermediate 2, the intermediate 2 loses two groups from adjacent atoms to form a new double bond, and an intermediate 3 is generated, the intermediate 3 has two isocyanate groups and has strong activity, and is easy to react with a compound containing active hydrogen atoms, wherein one isocyanate group reacts with hydroxyl on polyether triol firstly to generate an intermediate 4, and then the other isocyanate group reacts with hydroxyl on hydroxyethyl methacrylate to generate the cementing agent, the polyether triol is a high polymer material with the characteristics of good mechanical property, adhesive property, thermal oxidation resistance, light resistance and the like, but a large number of hydroxyl groups exist on the polyether triol, the water absorption is strong, the hydrolytic stability is poor, and then the hydroxyl group of the photosensitive emulsion is blocked after the reaction of the isocyanate group, so that the problem of poor hydrolytic stability of the photosensitive emulsion is solved, the good adhesion of the photosensitive emulsion is kept, the adhesion of the photosensitive emulsion can be improved, and the problem that the photosensitive performance of the photosensitive emulsion is influenced due to low adhesive force is solved.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1:
this embodiment is a cementing agent, and the preparation method of the cementing agent is as follows:
s1: adding dimethyl carbonate, aniline and anhydrous zinc acetate into a four-neck flask provided with a stirrer and a condensation reflux pipe, heating to boil, carrying out reflux reaction for 6 hours, cooling to room temperature after the reaction is finished, carrying out vacuum filtration on a reaction product, carrying out reduced pressure distillation on a filtrate, separating out crystals, washing the crystals for 2 times by using deionized water, placing the crystals in a vacuum drying oven, and drying the crystals to constant weight at the temperature of 30 ℃ to obtain an intermediate 1; controlling the dosage ratio of the dimethyl carbonate to the aniline to the anhydrous zinc acetate to be 30 mL: 6mL of: 0.3 g;
s2: adding the intermediate 1 and a hydrochloric acid solution into a four-neck flask provided with a stirrer and a condensation reflux pipe, heating to 80 ℃, controlling the heating rate to be 1 ℃/min, then adding a formaldehyde solution, carrying out a constant-temperature reaction for 1h under the condition that the stirring speed is 100r/min, cooling to room temperature after the reaction is finished, carrying out centrifugal treatment on a reaction product, washing a precipitate with methanol for 2 times, then washing with distilled water for 2 times, filtering, placing a filter cake into a vacuum drying box, and drying to constant weight under the condition that the temperature is 30 ℃ to obtain an intermediate 2; controlling the dosage ratio of the intermediate 1, the hydrochloric acid solution and the formaldehyde solution to be 15.1 g: 10mL of: 2mL, wherein the mass fraction of the hydrochloric acid solution is 18%, and the mass fraction of the formaldehyde solution is 35%;
s3: dissolving the intermediate 2 in a solvent to obtain an intermediate 2 solution, adding the intermediate 2 solution and a catalyst into a reaction kettle, reacting for 0.5h under the conditions that the pressure is 0.5MPa and the temperature is 180 ℃, cooling to room temperature by using distilled water after the reaction is finished, filtering, and distilling the filtrate to remove the solvent to obtain an intermediate 3; the solvent is n-pentadecane, and the catalyst is phosphorus pentoxide;
s4: adding the intermediate 3, dibutyltin dilaurate and tetrahydrofuran into a three-neck flask provided with a stirrer and a condensation reflux pipe, stirring and reacting for 10min under the conditions that the temperature is 65 ℃ and the stirring speed is 100r/min, placing polyether triol in a vacuum drying oven, drying for 2h under the condition that the temperature is 120 ℃ to obtain dried polyether triol, dropwise adding the dried polyether triol into the three-neck flask, controlling the dropwise adding speed to be 1 drop/s, then stirring and reacting for 2h at constant temperature to obtain an intermediate 4, then adding hydroxyethyl methacrylate into the intermediate 4, and continuously stirring and reacting for 2h to obtain the cementing agent; controlling the dosage ratio of the intermediate 3, dibutyltin dilaurate, tetrahydrofuran, dried polyether triol and hydroxyethyl methacrylate to be 5.756 g: 0.096 g: 20mL of: 24 g: 6.24 g.
Example 2:
this embodiment is a cementing agent, and the preparation method of the cementing agent is as follows:
s1: adding dimethyl carbonate, aniline and anhydrous zinc acetate into a four-neck flask provided with a stirrer and a condensation reflux pipe, heating to boil, carrying out reflux reaction for 8 hours, cooling to room temperature after the reaction is finished, carrying out vacuum filtration on a reaction product, carrying out reduced pressure distillation on a filtrate, separating out crystals, washing the crystals for 3 times by using deionized water, placing the crystals in a vacuum drying oven, and drying the crystals to constant weight at the temperature of 40 ℃ to obtain an intermediate 1; controlling the dosage ratio of the dimethyl carbonate to the aniline to the anhydrous zinc acetate to be 30 mL: 6mL of: 0.3 g;
s2: adding the intermediate 1 and a hydrochloric acid solution into a four-neck flask provided with a stirrer and a condensation reflux pipe, heating to 80 ℃, controlling the heating rate to be 3 ℃/min, then adding a formaldehyde solution, carrying out a constant-temperature reaction for 2h under the condition that the stirring speed is 300r/min, cooling to room temperature after the reaction is finished, carrying out centrifugal treatment on a reaction product, washing a precipitate with methanol for 3 times, then washing with distilled water for 3 times, filtering, placing a filter cake into a vacuum drying box, and drying to constant weight under the condition that the temperature is 40 ℃ to obtain an intermediate 2; controlling the dosage ratio of the intermediate 1, the hydrochloric acid solution and the formaldehyde solution to be 15.1 g: 10mL of: 3mL, wherein the mass fraction of the hydrochloric acid solution is 18%, and the mass fraction of the formaldehyde solution is 40%;
s3: dissolving the intermediate 2 in a solvent to obtain an intermediate 2 solution, adding the intermediate 2 solution and a catalyst into a reaction kettle, reacting for 0.5-2h under the conditions that the pressure is 0.5MPa and the temperature is 300 ℃, cooling to room temperature by using distilled water after the reaction is finished, filtering, and distilling the filtrate to remove the solvent to obtain an intermediate 3; the control solvent is chlorobenzene, and the catalyst is triethylamine;
s4: adding the intermediate 3, dibutyltin dilaurate and tetrahydrofuran into a three-neck flask provided with a stirrer and a condensation reflux pipe, stirring and reacting for 20min under the conditions that the temperature is 70 ℃ and the stirring speed is 300r/min, placing polyether triol in a vacuum drying oven, drying for 3h under the condition that the temperature is 120 ℃ to obtain dried polyether triol, dropwise adding the dried polyether triol into the three-neck flask, controlling the dropwise adding speed to be 1 drop/s, then stirring and reacting for 3h at constant temperature to obtain an intermediate 4, then adding hydroxyethyl methacrylate into the intermediate 4, and continuously stirring and reacting for 3h to obtain the cementing agent; controlling the dosage ratio of the intermediate 3, dibutyltin dilaurate, tetrahydrofuran, dried polyether triol and hydroxyethyl methacrylate to be 5.756 g: 0.096 g: 20-50 mL: 24 g: 6.24 g.
Example 3:
the embodiment is a preparation method of a photosensitive resist for a heat-sensitive positive image CTP plate, which comprises the following steps:
step one, preparation of an infrared light absorber:
a1, preparation of aqueous dispersion: adding sodium polystyrene sulfonate and water into a reaction kettle, stirring and dissolving, adding 3, 4-ethylenedioxythiophene, ferric chloride and potassium persulfate under the stirring condition, and reacting for 1h at the temperature of 60 ℃ to obtain a water dispersion for later use;
a2, preparation of infrared light absorber: adding the aqueous dispersion into a dispersion barrel, adding nano metal oxide, and uniformly dispersing by ultrasonic waves to obtain an infrared light absorber for later use;
step two, glue solution preparation:
adding matrix resin, film-forming resin and the cementing agent from example 1 into a reaction kettle, heating to 80 ℃, stirring at 800r/min, and adding an initiator, an antioxidant, a dissolution promoter, a stabilizer, a leveling agent and a polymerization inhibitor to perform chemical reaction to generate an original glue solution;
step three, preparing a photosensitive emulsion pigment:
adding an infrared dye and a coloring dye into a dispersing barrel, adding butanone, stirring for 4 hours at normal temperature, and fully dissolving and reacting to obtain a photosensitive emulsion pigment;
step four, preparing the photosensitive emulsion for the heat-sensitive positive image CTP plate:
and (2) respectively carrying out three-stage filtration on the original glue solution, the photosensitive resist pigment and the infrared light absorber by using filter elements with the aperture of 8 microns, 2 microns and 0.5 micron, then introducing the original glue solution into a reaction kettle, adding the infrared light absorber and a catalyst, heating to 70 ℃, stirring for reaction for 12 hours, adding the photosensitive resist pigment into the reaction kettle, stirring and dispersing for 4 hours, and thus obtaining the photosensitive resist for the heat-sensitive positive CTP plate.
Example 4:
the embodiment is a preparation method of a photosensitive resist for a heat-sensitive positive image CTP plate, which comprises the following steps:
step one, preparation of an infrared light absorber:
a1, preparation of aqueous dispersion: adding sodium polystyrene sulfonate and water into a reaction kettle, stirring and dissolving, adding 3, 4-ethylenedioxythiophene, ferric chloride and potassium persulfate under the stirring condition, and reacting for 2 hours at the temperature of 60 ℃ to obtain a water dispersion for later use;
a2, preparation of infrared light absorber: adding the aqueous dispersion into a dispersion barrel, adding nano metal oxide, and uniformly dispersing by ultrasonic waves to obtain an infrared light absorber for later use;
step two, glue solution preparation:
adding matrix resin, film-forming resin and the cementing agent from example 2 into a reaction kettle, heating to 80 ℃, stirring at 1000r/min, and adding an initiator, an antioxidant, a dissolution promoter, a stabilizer, a leveling agent and a polymerization inhibitor to perform chemical reaction to generate an original glue solution;
step three, preparing a photosensitive emulsion pigment:
adding an infrared dye and a coloring dye into a dispersing barrel, adding butanone, stirring for 4 hours at normal temperature, and fully dissolving and reacting to obtain a photosensitive emulsion pigment;
step four, preparing the photosensitive emulsion for the heat-sensitive positive image CTP plate:
and (2) respectively carrying out three-stage filtration on the original glue solution, the photosensitive resist pigment and the infrared light absorber by using filter elements with the aperture of 8 microns, 2 microns and 0.5 micron, then introducing the original glue solution into a reaction kettle, adding the infrared light absorber and a catalyst, heating to 70 ℃, stirring for reaction for 12 hours, adding the photosensitive resist pigment into the reaction kettle, stirring and dispersing for 4 hours, and thus obtaining the photosensitive resist for the heat-sensitive positive CTP plate.
Comparative example 1:
comparative example 1 differs from example 4 in that comparative example 1 does not add cement.
Comparative example 2:
comparative example 2 is a heat-sensitive positive CTP photosensitive glue solution of patent application No. CN 201110241445.5.
The performance of the photoresists of examples 3-4 and comparative examples 1-2 were tested, and the results are as follows.
Figure BDA0003108903270000121
As can be seen from the data in the above table, comparative examples 1 to 2, in which no binder was added, had low viscosity, and indirectly affected the photosensitive properties of the photosensitive resist, and the viscosity increased significantly after the binder was added, and specifically significantly improved the photosensitive properties.
In the description herein, references to the description of "one embodiment," "an example," "a specific example" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The foregoing is illustrative and explanatory only and is not intended to be exhaustive or to limit the invention to the precise embodiments described, and various modifications, additions, and substitutions may be made by those skilled in the art without departing from the scope of the invention or exceeding the scope of the claims.

Claims (8)

1. The photosensitive emulsion for the heat-sensitive positive CTP plate is characterized by comprising the following components in parts by weight:
30-55 parts of matrix resin, 10-30 parts of film-forming resin, 10-30 parts of cementing agent, 1-6 parts of infrared dye, 0.5-2 parts of coloring dye, 3-8 parts of infrared absorbent, 10-15 parts of butanone, 2-5 parts of initiator, 1-3 parts of antioxidant, 3-8 parts of cosolvent, 2-6 parts of stabilizer, 3-7 parts of flatting agent, 2-5 parts of polymerization inhibitor and 2-6 parts of catalyst;
the preparation method of the cementing agent comprises the following steps:
s1: adding dimethyl carbonate, aniline and anhydrous zinc acetate into a four-neck flask provided with a stirrer and a condensation reflux pipe, heating to boil, carrying out reflux reaction for 6-8h, cooling to room temperature after the reaction is finished, carrying out vacuum filtration on a reaction product, carrying out reduced pressure distillation on a filtrate, separating out crystals, washing the crystals for 2-3 times by using deionized water, placing the crystals in a vacuum drying box, and drying the crystals to constant weight at the temperature of 30-40 ℃ to obtain an intermediate 1;
s2: adding the intermediate 1 and a hydrochloric acid solution into a four-neck flask provided with a stirrer and a condensation reflux pipe, heating to 80 ℃, controlling the heating rate to be 1-3 ℃/min, then adding a formaldehyde solution, carrying out a constant-temperature reaction for 1-2h under the condition that the stirring speed is 100 plus one year/min, cooling to room temperature after the reaction is finished, carrying out centrifugal treatment on a reaction product, washing a precipitate for 2-3 times by using methanol, then washing for 2-3 times by using distilled water, filtering, placing a filter cake into a vacuum drying box, and drying to constant weight under the condition that the temperature is 30-40 ℃ to obtain an intermediate 2;
s3: dissolving the intermediate 2 in a solvent to obtain an intermediate 2 solution, adding the intermediate 2 solution and a catalyst into a reaction kettle, reacting for 0.5-2h under the conditions that the pressure is 0.5MPa and the temperature is 180-300 ℃, cooling to room temperature by using distilled water after the reaction is finished, filtering, and distilling the filtrate to remove the solvent to obtain an intermediate 3;
s4: adding the intermediate 3, dibutyltin dilaurate and tetrahydrofuran into a three-neck flask provided with a stirrer and a condensation reflux pipe, stirring and reacting for 10-20min under the conditions that the temperature is 65-70 ℃ and the stirring speed is 100-300r/min, placing polyether triol in a vacuum drying box, drying for 2-3h under the condition that the temperature is 120 ℃ to obtain dried polyether triol, dropwise adding the dried polyether triol into the three-neck flask, controlling the dropwise adding speed to be 1 drop/s, stirring and reacting for 2-3h at constant temperature to obtain an intermediate 4, adding hydroxyethyl methacrylate into the intermediate 4, and continuously stirring and reacting for 2-3h to obtain the cementing agent.
2. The photosensitive emulsion for heat-sensitive positive CTP plate according to claim 1, wherein the dosage ratio of dimethyl carbonate, aniline and anhydrous zinc acetate in step S1 is 30 mL: 6mL of: 0.3 g.
3. The photosensitive emulsion for a heat-sensitive positive CTP plate according to claim 1, wherein the ratio of the intermediate 1, the hydrochloric acid solution and the formaldehyde solution in step S2 is 15.1 g: 10mL of: 2-3mL, wherein the mass fraction of the hydrochloric acid solution is 18%, and the mass fraction of the formaldehyde solution is 35-40%.
4. The photosensitive emulsion of claim 1, wherein in step S3, the solvent is one of chlorobenzene, toluene, nitrobenzene and n-pentadecane, and the catalyst is one of triethylamine and phosphorus pentoxide.
5. The photosensitive emulsion for a heat-sensitive positive CTP plate according to claim 1, wherein the dosage ratio of the intermediate 3, dibutyltin dilaurate, tetrahydrofuran, dried polyether triol and hydroxyethyl methacrylate in step S4 is 5.756 g: 0.096 g: 20-50 mL: 24 g: 6.24 g.
6. The method for preparing the photosensitive emulsion for the heat-sensitive positive CTP plate according to claim 1, which comprises the following steps:
step one, preparation of an infrared light absorber:
a1, preparation of aqueous dispersion: adding sodium polystyrene sulfonate and water into a reaction kettle, stirring and dissolving, adding 3, 4-ethylenedioxythiophene, ferric chloride and potassium persulfate under the stirring condition, and reacting for 1-2h at the temperature of 60 ℃ to obtain a water dispersion for later use;
a2, preparation of infrared light absorber: adding the aqueous dispersion into a dispersion barrel, adding nano metal oxide, and uniformly dispersing by ultrasonic waves to obtain an infrared light absorber for later use;
step two, glue solution preparation:
adding matrix resin, film-forming resin and cementing agent into a reaction kettle, heating to 80 ℃, stirring under the condition of 800-;
step three, preparing a photosensitive emulsion pigment:
adding an infrared dye and a coloring dye into a dispersing barrel, adding butanone, stirring for 4 hours at normal temperature, and fully dissolving and reacting to obtain a photosensitive emulsion pigment;
step four, preparing the photosensitive emulsion for the heat-sensitive positive image CTP plate:
and (2) respectively carrying out three-stage filtration on the original glue solution, the photosensitive resist pigment and the infrared light absorber by using filter elements with the aperture of 8 microns, 2 microns and 0.5 micron, then introducing the original glue solution into a reaction kettle, adding the infrared light absorber and a catalyst, heating to 70 ℃, stirring for reaction for 12 hours, adding the photosensitive resist pigment into the reaction kettle, stirring and dispersing for 4 hours, and thus obtaining the photosensitive resist for the heat-sensitive positive CTP plate.
7. The method for preparing the photosensitive emulsion for the heat-sensitive positive CTP plate according to claim 6, wherein the mass ratio of the ferric chloride, the potassium persulfate, the 3, 4-ethylenedioxythiophene, the sodium polystyrene sulfonate and the water in the step A1 is 1-5: 10-15: 40-50: 100-200: 300-500.
8. The method as claimed in claim 6, wherein the nano metal oxide in step A2 is one or more of cerium oxide, titanium dioxide, aluminum oxide and ferric oxide with a particle size of 30-200nm, and the mass ratio of the nano metal oxide to the aqueous dispersion is 1: 100-200.
CN202110643534.6A 2021-06-09 2021-06-09 Photosensitive emulsion for heat-sensitive positive image CTP plate and preparation method thereof Pending CN113419401A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114874673A (en) * 2022-05-17 2022-08-09 安徽强邦新材料股份有限公司 Scratch-resistant treatment-free CTP plate and preparation method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006088582A (en) * 2004-09-24 2006-04-06 Fuji Photo Film Co Ltd Original lithographic printing plate and lithographic printing method using the original plate
CN103724854A (en) * 2013-12-03 2014-04-16 常州大学 Nano-composite near-infrared absorbent and preparation method thereof
CN110568724A (en) * 2019-09-11 2019-12-13 河北金锐美科技有限公司 Photosensitive emulsion for treatment-free thermosensitive CTP and preparation method thereof
CN110609444A (en) * 2019-09-11 2019-12-24 河北金锐美科技有限公司 Positive thermosensitive CTP photosensitive emulsion and preparation method thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006088582A (en) * 2004-09-24 2006-04-06 Fuji Photo Film Co Ltd Original lithographic printing plate and lithographic printing method using the original plate
CN103724854A (en) * 2013-12-03 2014-04-16 常州大学 Nano-composite near-infrared absorbent and preparation method thereof
CN110568724A (en) * 2019-09-11 2019-12-13 河北金锐美科技有限公司 Photosensitive emulsion for treatment-free thermosensitive CTP and preparation method thereof
CN110609444A (en) * 2019-09-11 2019-12-24 河北金锐美科技有限公司 Positive thermosensitive CTP photosensitive emulsion and preparation method thereof

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
史芸等: "由碳酸二甲酯合成异氰酸酯", 《石油学报(石油加工)》, vol. 26, no. 4, pages 648 - 656 *
王丽: "喷墨CTP 版用UV墨水的制备及性能研究", 《中国优秀硕士论文电子期刊网》, no. 11, pages 024 - 95 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114874673A (en) * 2022-05-17 2022-08-09 安徽强邦新材料股份有限公司 Scratch-resistant treatment-free CTP plate and preparation method thereof

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