CN102486608A - Computer to conventional plate (CTcP) photosensitive resist, preparation method of the CTcP photosensitive resist and CTcP prepared from the CTcP photosensitive resist - Google Patents
Computer to conventional plate (CTcP) photosensitive resist, preparation method of the CTcP photosensitive resist and CTcP prepared from the CTcP photosensitive resist Download PDFInfo
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- CN102486608A CN102486608A CN201010567999XA CN201010567999A CN102486608A CN 102486608 A CN102486608 A CN 102486608A CN 201010567999X A CN201010567999X A CN 201010567999XA CN 201010567999 A CN201010567999 A CN 201010567999A CN 102486608 A CN102486608 A CN 102486608A
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Abstract
The invention discloses a computer to conventional plate (CTcP) photosensitive resist and a preparation method thereof. The preparation method of the CTcP photosensitive resist comprises that m-cresol-formaldehyde resin, poly(epoxy acrylate) resin and 2-diazo-1-naphthoquinone-5-sulfonyl chloride undergo an esterification reaction to produce an esterified material; and the esterified material is prepared into the CTcP photosensitive resist. The invention also discloses a CTcP prepared from the CTcP photosensitive resist. Through the CTcP photosensitive resist obtained by the preparation method, the CTcP pressrun is improved and is more than 150000.
Description
Technical field
The present invention relates to a kind of CTcP photoresists and preparation method thereof and CTcP version.
Background technology
The plate making digitizing is the megatrend of present plate making industry, thereby has expedited the emergence of the new technology of a large amount of CTPs.CTcP is exactly one of them.CTcP (Computer to Conventional Plate) is meant and on the traditional PS version, carries out the CTP technology, also can be described as the UV-CTP systems technology.Its principle of work is following: in CTcP technology; UV shines on the digital micromirror element DMD; Nearly more than 100 ten thousand micro mirrors above the DMD, each micro mirror is controlled by digital mode, and the UV light that shines its surface has two kinds of results: UV passes micro mirror and is accepted by optical lens system; Perhaps micro mirror deflection UV light makes lens can't receive UV light.This working method explanation, it is a pixel (Pixel) that micro mirror cans be compared to, and on forme, forms the image of screening.
The forme plate that CTcP adopts is exactly traditional P S (psensitized Plate) plate; Comprise photosensitive layer, oxidation film layer, aluminum substrate, can be divided into negative type (N type) and positive-type (P type), wherein; Positive-type PS version is meant and adopts positive standardized form of Chinese charcters master; The ultraviolet light of exposure sees through that low-density and blank position arrive PS version photographic layer on the master, is absorbed by emulsion, becomes word one-tenth figure to sensitization.
Since the diazo-compounds photoresists had been invented by nineteen forty-one Kalle company, the principal ingredient of the photoresists that generally use now was 2,1; 5 types (being 2-diazonium-1-naphthoquinones-5-sulphonic acid ester), 2,1; 4 types (being 2-diazonium-1-naphthoquinones-4-sulphonic acid ester), 1,2; 4 types (being 1-diazonium-2-naphthoquinones-4-sulphonic acid ester) also can comprise some colorants, surfactant.
But in the CTcP technology, the UV light source power is big inadequately, exposes to the sun a little less than in exposure-development flow process, being in-show under the condition by force and carry out.Because existing C TcP sensitization liquid is because the anti-solvent scarce capacity of alkali resistant causes the sensitization rete of pie graph line, site impaired.Specifically; Resin retention amount in the sensitization rete of composition diagram line site reduces; And the transmission, the ink roller that in printing process, play printing ink all depend on resin the bearing of rolling friction of the space of a whole page; So improve the pressrun of CTcP forme, need the resin in the component in the sensitization liquid be improved.
Summary of the invention
The object of the present invention is to provide a kind of novel CTcP photoresists, improve the pressrun of CTcP version.
Another object of the present invention is to provide a kind of preparation method of these CTcP photoresists
A purpose more of the present invention is to provide the CTcP version by this CTcP photoresists preparation.
CTcP photoresists of the present invention comprise by the metacresol urea formaldehyde, gather Epocryl and carboxylate that 2-diazonium-1-naphthoquinones-esterification of 5-sulfonic acid chloride obtains.
The preparation method of CTcP photoresists of the present invention comprises by the metacresol urea formaldehyde, gathers Epocryl and 2-diazonium-1-naphthoquinones-5-sulfonic acid chloride carries out the step that esterification obtains said carboxylate.
According to the present invention, the temperature of said esterification is 30～32 ℃.
According to the present invention, the solvent environment of said esterification is dioxane, ethylene glycol ethyl ether.
According to the present invention, the said Epocryl that gathers accounts for the metacresol urea formaldehyde and gathers 15～20% of Epocryl gross weight.
According to the present invention, comprise that also the carboxylate that esterification obtains carries out the step that precipitating is purified.
Said precipitating is purified and may further comprise the steps:
(a), the esterification system poured into carry out in the cold water filtering behind the elutriation, the temperature of cold water≤20 ℃ wherein;
(b), the filter cake that obtains after will filtering is dissolved in the acetone, pour into and carry out among the H2O that contains 1 volume %HCl filtering behind the elutriation second time;
(c), to the filter cake washed several times with water that filtration obtains, filter cake is pulverized;
(d), be dried to moisture≤1 weight % in 40～45 ℃.
According to the present invention, also comprise the step that said carboxylate that esterification is obtained and colorant, surfactant, solvent are prepared said photoresists.Said colorant is crystal violet, methyl blue, eosin, alkaline bright blue, Victoria's ethereal blue or methylene blue; Said solvent is dioxane, acetone, chloroform, tetrahydrofuran or its potpourri; Said surfactant is for gathering ethoxyquin dimethyl polysiloxane multipolymer or polyether-modified dimethyl polysiloxane multipolymer.
The present invention also provides the CTcP version of being processed by above-mentioned CTcP photoresists.
Among the present invention, adopt and gather the traditional metacresol urea formaldehyde of Epocryl replacement, improve alkali resistant, anti-solvent, abrasion-resistance, it is high to improve pressrun,＞15 ten thousand seals.
Embodiment
Below in conjunction with specific embodiment, the present invention is further specified.Should be understood that following examples only are used to the present invention is described but not are used to limit scope of the present invention.
Embodiment 1
, three liters there-necked flask of stirrer, thermometer and separating funnel adds 113 grams (0.913M) in being housed with 550ml dioxane (CH
2)
4O
2 reachThe dissolving of the mixed solution of ethylene glycol ethyl ether gather Epocryl and metacresol urea formaldehyde; The wherein said Epocryl that gathers accounts for and gathers Epocryl with 15% of metacresol urea formaldehyde gross weight; In another 1000ml flask, add 138 gram (0.514M) 2-diazonium-1-naphthoquinones-5-sulfonic acid chlorides, with 550ml (CH
2)
4O
2Dissolving adds 11 gram activated charcoals.Stirred 10 minutes, and filtered, filtrating is poured into mix water-bath in the above-mentioned there-necked flask and be heated to 30 ℃, begin to drip 10%NaHCO
3Solution by rate of addition control temperature of reaction, keeps reaction below 40 ℃ about 2 hours.Gradually pour into after the cooling in 5 liter cold water≤20 ℃ and carry out elutriation.Filter, filter cake is dissolved in the acetone, till the amounts of acetone of adding to deposition is dissolved fully.Pour the H that contains 1%HCl into
2Carry out the elutriation second time among the O, filter, filter cake is carried out repeated water washing, behind the suction filtration filter cake is pulverized, under 40～45 ℃, ventilate, be dried to moisture≤1%.
Embodiment 2
, three liters there-necked flask of stirrer, thermometer and separating funnel adds 113 grams (0.913M) in being housed with 550ml dioxane (CH
2)
4O
2 reachThe dissolving of the mixed solution of ethylene glycol ethyl ether gather Epocryl and metacresol urea formaldehyde; The wherein said Epocryl that gathers accounts for and gathers Epocryl with 18% of metacresol urea formaldehyde gross weight; In another 1000ml flask, add 138 gram (0.514M) 2-diazonium-1-naphthoquinones-5-sulfonic acid chlorides, with 550ml (CH
2)
4O
2Dissolving adds 11 gram activated charcoals.Stirred 10 minutes, and filtered, filtrating is poured into mix water-bath in the above-mentioned there-necked flask and be heated to 32 ℃, begin to drip 10%NaHCO
3Solution by rate of addition control temperature of reaction, keeps reaction below 40 ℃ about 2 hours.Gradually pour into after the cooling in 5 liter cold water≤20 ℃ and carry out elutriation.Filter, filter cake is dissolved in the acetone, till the amounts of acetone of adding to deposition is dissolved fully.Pour the H that contains 1%HCl into
2Carry out the elutriation second time among the O, filter, filter cake is carried out repeated water washing, behind the suction filtration filter cake is pulverized, under 40～45 ℃, ventilate, be dried to moisture≤1%.
Embodiment 3
, three liters there-necked flask of stirrer, thermometer and separating funnel adds 113 grams (0.913M) in being housed with 550ml dioxane (CH
2)
4O
2 reachThe dissolving of the mixed solution of ethylene glycol ethyl ether gather Epocryl and metacresol urea formaldehyde; The wherein said Epocryl that gathers accounts for and gathers Epocryl with 20% of metacresol urea formaldehyde gross weight; In another 1000ml flask, add 138 gram (0.514M) 2-diazonium-1-naphthoquinones-5-sulfonic acid chlorides, with 550ml (CH
2)
4O
2Dissolving adds 11 gram activated charcoals.Stirred 10 minutes, and filtered, filtrating is poured into mix water-bath in the above-mentioned there-necked flask and be heated to 32 ℃, begin to drip 10%NaHCO
3Solution by rate of addition control temperature of reaction, keeps reaction below 40 ℃ about 2 hours.Gradually pour into after the cooling in 5 liter cold water≤20 ℃ and carry out elutriation.Filter, filter cake is dissolved in the acetone, till the amounts of acetone of adding to deposition is dissolved fully.Pour the H that contains 1%HCl into
2Carry out the elutriation second time among the O, filter, filter cake is carried out repeated water washing, behind the suction filtration filter cake is pulverized, under 40～45 ℃, ventilate, be dried to moisture≤1%.
Adopt compound method of the prior art, the carboxylate for preparing in the foregoing description and colorant, surfactant, solvent are prepared, wherein, said colorant is crystal violet, methyl blue, eosin, alkaline bright blue, Victoria's ethereal blue or methylene blue; Said solvent is dioxane, acetone, chloroform, tetrahydrofuran or its potpourri; Said surfactant is for gathering ethoxyquin dimethyl polysiloxane multipolymer or polyether-modified dimethyl polysiloxane multipolymer.Photoresists of the present invention are coated on the aluminum plate foundation, produce the CTcP version.Among the present invention, adopt and gather the traditional metacresol urea formaldehyde of Epocryl replacement, improve alkali resistant, anti-solvent, abrasion-resistance, it is high to improve pressrun,＞15 ten thousand seals.
Claims (10)
1. CTcP photoresists is characterized in that, comprise by the metacresol urea formaldehyde, gather Epocryl and carboxylate that 2-diazonium-1-naphthoquinones-esterification of 5-sulfonic acid chloride obtains.
2. the preparation method of CTcP photoresists as claimed in claim 1 is characterized in that, by the metacresol urea formaldehyde, gather Epocryl and 2-diazonium-1-naphthoquinones-5-sulfonic acid chloride carries out esterification and obtains said carboxylate.
3. preparation method as claimed in claim 2 is characterized in that, the temperature of said esterification is 30～32 ℃.
4. preparation method as claimed in claim 2 is characterized in that, the solvent environment of said esterification is dioxane, ethylene glycol ethyl ether.
5. preparation method as claimed in claim 2 is characterized in that, the said Epocryl that gathers accounts for the metacresol urea formaldehyde and gathers 15～20% of Epocryl gross weight.
6. preparation method as claimed in claim 2 is characterized in that, comprises that also the carboxylate that esterification obtains carries out the step that precipitating is purified.
7. preparation method as claimed in claim 6 is characterized in that, said precipitating is purified and may further comprise the steps:
(a), the esterification system poured into carry out in the cold water filtering behind the elutriation, the temperature of cold water≤20 ℃ wherein;
(b), the filter cake that obtains after will filtering is dissolved in the acetone, pour into and carry out among the H2O that contains 1 volume %HCl filtering behind the elutriation second time;
(c), to the filter cake washed several times with water that filtration obtains, filter cake is pulverized;
(d), be dried to moisture≤1 weight % in 40～45 ℃.
8. preparation method as claimed in claim 2 is characterized in that, also comprises the step that said carboxylate that esterification is obtained and colorant, surfactant, solvent are prepared said photoresists.
9. preparation method as claimed in claim 8 is characterized in that, said colorant is crystal violet, methyl blue, eosin, alkaline bright blue, Victoria's ethereal blue or methylene blue; Said solvent is dioxane, acetone, chloroform, tetrahydrofuran or its potpourri; Said surfactant is for gathering ethoxyquin dimethyl polysiloxane multipolymer or polyether-modified dimethyl polysiloxane multipolymer.
10. CTcP version of processing by the described CTcP photoresists of claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010567999XA CN102486608A (en) | 2010-12-01 | 2010-12-01 | Computer to conventional plate (CTcP) photosensitive resist, preparation method of the CTcP photosensitive resist and CTcP prepared from the CTcP photosensitive resist |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010567999XA CN102486608A (en) | 2010-12-01 | 2010-12-01 | Computer to conventional plate (CTcP) photosensitive resist, preparation method of the CTcP photosensitive resist and CTcP prepared from the CTcP photosensitive resist |
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|---|---|
| CN102486608A true CN102486608A (en) | 2012-06-06 |
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| CN201010567999XA Pending CN102486608A (en) | 2010-12-01 | 2010-12-01 | Computer to conventional plate (CTcP) photosensitive resist, preparation method of the CTcP photosensitive resist and CTcP prepared from the CTcP photosensitive resist |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102786662A (en) * | 2012-08-03 | 2012-11-21 | 京东方科技集团股份有限公司 | Macromolecular photosensitizer with diazonium group as well as preparation method thereof and photoresist composition |
| CN108329446A (en) * | 2017-01-20 | 2018-07-27 | 中国科学院化学研究所 | Phenolic resin is esterified sulfonate and its synthetic method, printing hydrophilic version and application and galley |
| US11386699B2 (en) | 2018-01-10 | 2022-07-12 | Guangdong Oppo Mobile Telecommunications Corp., Ltd. | Image processing method, apparatus, storage medium, and electronic device |
-
2010
- 2010-12-01 CN CN201010567999XA patent/CN102486608A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102786662A (en) * | 2012-08-03 | 2012-11-21 | 京东方科技集团股份有限公司 | Macromolecular photosensitizer with diazonium group as well as preparation method thereof and photoresist composition |
| CN108329446A (en) * | 2017-01-20 | 2018-07-27 | 中国科学院化学研究所 | Phenolic resin is esterified sulfonate and its synthetic method, printing hydrophilic version and application and galley |
| CN108329446B (en) * | 2017-01-20 | 2019-07-05 | 中国科学院化学研究所 | Phenolic resin is esterified sulfonate and its synthetic method, printing hydrophilic version and application and galley |
| US11386699B2 (en) | 2018-01-10 | 2022-07-12 | Guangdong Oppo Mobile Telecommunications Corp., Ltd. | Image processing method, apparatus, storage medium, and electronic device |
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Application publication date: 20120606 |