CN113372569A

CN113372569A - Semiconductor new material preparation equipment for refined tannic acid

Info

Publication number: CN113372569A
Application number: CN202110469431.2A
Authority: CN
Inventors: 俞仁龙
Original assignee: Individual
Current assignee: Individual
Priority date: 2021-04-28
Filing date: 2021-04-28
Publication date: 2021-09-10

Abstract

The invention provides a new semiconductor material preparation device for refining tannic acid, which structurally comprises a supporting seat, an on-off key, a finished product box, a material taking barrel, a processing box and a pressure gauge, wherein the supporting seat is connected with the on-off key in a clamping way, the finished product box is arranged at the upper end of the supporting seat, the material taking barrel is embedded at the upper end of the finished product box, the processing box is connected with the finished product box, the pressure gauge is embedded at the front end of the processing box, the invention can effectively ensure that tannic acid scales can be treated by water drops on the surface ends of the scales before being dried after being processed under the effect of a filter layer of a regulating device arranged in the tannic acid preparation device, the scales can be effectively treated by the movable device in the filter tank continuously through the filter tank, thereby the scale reaches the effect that dry department can form the anhydrous pearl of surface end and impurity thereby can prevent that the effect of the residual water stain that direct drying formed and impurity from leading to influencing the reaction numerical value and the result of use of tannic acid.

Description

Semiconductor new material preparation equipment for refined tannic acid

Technical Field

The invention relates to the field of preparation of new semiconductor materials, in particular to equipment for preparing a new semiconductor material for refining tannic acid.

Background

The tannic acid is yellow or light brown amorphous powder or scale, and has the conditions of no odor and special odor, so that the novel semiconductor material can effectively prolong the service life of the novel semiconductor material and enhance the performance of the semiconductor through the effects of oxygen resistance, bacteriostasis and the like of the tannic acid, so that the tannic acid material can be obtained by processing, washing and drying the inside of the preparation equipment, and the tannic acid can be effectively produced in batches;

in summary, the present inventors found that the existing new material preparation apparatus mainly has the following defects: the process comprises the steps that when tannic acid is in a scale state, in the process of manufacturing, washing and drying through preparation equipment, a plurality of water drops can be formed on the rear end face of washing, and the water drops can be attached to the end face of the scale through self-adsorption, so that the trace of the water drops remained on the end face can be formed by directly evaporating the water drops on the scale when the scale is subjected to drying treatment, and the trace of the remained water drops is formed because corresponding impurities are arranged inside the scale, and the tannic acid reaction value and the use effect can be directly influenced correspondingly under the influence of the trace of the impurity water drops.

Disclosure of Invention

The technical scheme adopted by the invention for realizing the technical purpose is as follows: the utility model provides a refined semiconductor new material preparation equipment for tannic acid, its structure includes supporting seat, on & off switch, finished product case, gets a material section of thick bamboo, processing case, manometer, the supporting seat carries out the block with the on & off switch and is connected, the finished product case is installed in the upper end of supporting seat, get the material section of thick bamboo and imbed in the upper end of finished product case, processing case and finished product case interconnect, the manometer imbeds in the front end of processing case.

The processing box is provided with a fixed block, a clamping groove, an adjusting device and four exhaust ends, the fixed block and the clamping groove are integrated, the adjusting device is embedded into the clamping groove, the exhaust ends are installed at the central position of the adjusting device, the fixed block is in a solid state, and the number of the fixed block and the number of the clamping groove are four.

As a further improvement of the invention, the adjusting device is provided with a fixing plate, a processing groove and a solid block, wherein the fixing plate and the processing groove are integrated, the solid block is fixedly connected to the central position of the fixing plate, and the fixing plate is in an inclined shape and is mutually connected with the processing groove.

As a further improvement of the invention, the treatment tank is provided with an adjusting layer, a through grid and a processor, the adjusting layer is movably connected with the through grid, the processor is embedded into two sides of the through grid, the adjusting layer is made of an elastic body material and can effectively adjust the diameter effect of the through grid, and therefore, the number of the processors on two sides of the through grid is six.

As a further improvement of the invention, the processor is provided with a bolt, a limiting ring, a rotating wheel and a collecting block, the bolt is in threaded connection with the central position of the limiting ring, the rotating wheel is in clearance fit with the bolt, the collecting block is embedded in the rotating wheel, the bolt is a threaded product and can be in corresponding threaded connection with the solid limiting ring, so that the rotating wheel and the bolt have corresponding clearance effects, and the collecting block is provided with six in the rotating wheel.

As a further improvement of the present invention, the collecting block is provided with a solid layer, a guiding groove, a collecting groove and a guiding ring, the solid layer and the guiding groove are integrated, the collecting groove is communicated with the guiding groove, the guiding ring is embedded in the middle of the collecting groove, the solid layer is triangular, the guiding groove at the upper end is hollow and is in an inverted flat angle shape, so that the collecting groove is made of stainless steel, and the guiding ring is provided with a corresponding handle and a corresponding buckle.

As a further improvement of the invention, the solid block is provided with a fixed block, a support shaft, a rotating shaft and a lug, the upper end of the fixed block and the support shaft are integrated, the rotating shaft and the support shaft are movably connected, the lug is arranged at the upper end of the rotating shaft, the lug is triangular, and the end face of the lug is in a rounded corner shape.

As a further improvement of the invention, the lug is provided with an insertion rod, a fixed plate and a buffer shaft, the insertion rod is embedded in the fixed plate, the buffer shaft is embedded in the fixed plate, the fixed plate is made of stainless steel, and the end faces of the outer ends of the fixed plate are in a polished state.

As a further improvement of the invention, the insertion rod is provided with a notch, a connecting plate, a movable seat and a balance rod, the notch is fixedly connected with the connecting plate, the movable seat is embedded in the connecting plate, the balance rod is movably connected with the movable seat, the balance rod is in a solid state and has corresponding elasticity and toughness.

Compared with the prior art, the invention has the following beneficial effects:

1. according to the invention, under the effect of the filter layer of the adjusting device arranged in the tannic acid preparation equipment, the tannic acid scales can be effectively ensured to be processed with water drops on the surface ends of the scales before being dried after being processed, and then the scales can be effectively processed with the water drops on the surface ends by the movable device in the filter tank continuously through the filter tank, so that the scales reach the effect that no water drops and impurities exist on the surface ends at the drying part, and the effect of directly drying the formed residual water stains and impurities can be prevented from influencing the reaction value and the using effect of the tannic acid.

2. According to the invention, a plurality of scales formed in the process of conveying a large amount of processed scales to a drying position can be effectively prevented from being clamped in the upper end plane of the solid block under the effect that the solid block is triangular, so that all the scales can effectively and continuously fall into corresponding positions under the performance effect of the movable device arranged in the solid block, and the scales are prevented from being clamped in the upper end of the solid block in the falling process.

Drawings

FIG. 1 is a schematic structural diagram of a new semiconductor material preparation device for refining tannic acid.

Fig. 2 is a schematic top view of a processing box.

Fig. 3 is a schematic top view of an adjusting device.

FIG. 4 is a schematic sectional view of a processing tank.

Fig. 5 is a schematic diagram of the overall structure of a processor.

Fig. 6 is a schematic diagram of the structure inside a collection block.

Fig. 7 is a side view of a solid block.

Fig. 8 is a schematic view of a bump-provided component.

Fig. 9 is a schematic view of the structure of the inside of an insert rod.

In the figure: supporting seat-1, switch key-2, finished product box-3, material taking barrel-4, processing box-5, pressure gauge-6, fixing block-51, clamping groove-52, adjusting device-53, exhaust end-54, fixing plate-531, processing groove-532, solid block-533, adjusting layer-a 1, logical grid-a 2, processor-a 3, bolt-a 31, spacing ring-a 32, rotating wheel-a 33, collecting block-a 34, solid layer-b 1, guide groove-b 2, collecting groove-b 3, guide ring-b 4, fixing block-c 1, support shaft-c 2, rotating shaft-c 3, convex block-c 4, insertion rod-c 41, fixing plate-c 42, buffer shaft-c 43, notch-d 1, connecting plate-d 2, connection plate-d 2, A movable seat-d 3 and a balance bar-d 4.

Detailed Description

The invention is further described below with reference to the accompanying drawings:

example 1:

fig. 1 to 6 show:

the invention provides a new semiconductor material preparation device for refining tannic acid,

its structure includes supporting seat 1, on & off switch 2, finished product case 3, gets feed cylinder 4, processing case 5, manometer 6, supporting seat 1 carries out the block with on & off switch 2 and is connected, finished product case 3 is installed in the upper end of supporting seat 1, it imbeds in the upper end of finished product case 3 to get feed cylinder 4, processing case 5 and finished product case 3 interconnect, manometer 6 imbeds in the front end of processing case 5.

The processing box 5 is provided with a fixed block 51, an engagement groove 52, an adjusting device 53 and an exhaust end 54, the fixed block 51 and the engagement groove 52 are integrated, the adjusting device 53 is embedded in the engagement groove 52, the exhaust end 54 is installed at the central position of the adjusting device 53, the fixed block 51 is in a solid state, the number of the fixed block and the engagement groove 52 is four, the fixed block 51 can effectively fix the adjusting device 53 in the solid state and the four states of the engagement groove 52, and therefore the movement stability of the adjusting device 53 can be improved.

The adjusting device 53 is provided with a fixing plate 531, a processing groove 532 and a solid block 533, the fixing plate 531 and the processing groove 532 are integrated, the solid block 533 is fixedly connected to the center of the fixing plate 531, the fixing plate 531 is inclined and is mutually connected with the processing groove 532, and the fixing plate 531 can effectively prevent scales from being clamped at the side position of the processing groove 532 in the dropping process through the inclined state of the fixing plate 531.

The processing groove 532 is provided with an adjusting layer a1, a Tonggua a2 and a processor a3, the adjusting layer a1 is movably connected with the Tonggua a2, the processor a3 is embedded into two sides of the Tonggua a2, the adjusting layer a1 is made of an elastomer material and can effectively adjust the diameter effect of the Tonggua a2, so that the processor a3 is provided with six of the two sides of the Tonggua a2, the adjusting layer a1 can effectively adjust the size of the Tonggua 2 through the elastic material of the adjusting layer a1 and can drive the processor a3 to move, and the processor a3 can completely process water bead impurities on the end faces of the scales under the quantity effect of the six of the processor a 3.

The processor a3 is provided with a bolt a31, a limit ring a32, a runner a33 and a collection block a34, the bolt a31 is in threaded connection with the center of a32, the runner a33 is in clearance fit with the bolt a31, the collection block a34 is embedded in the runner a33, the bolt a31 is a threaded product and can be in corresponding threaded connection with the solid limit ring a32, so that the runner a33 and the bolt a31 have corresponding clearance effect, the collection block a34 is provided with six in the runner a33, the bolt a31 can effectively fix the limit ring a32 and the runner a33 through the thread pitch of the bolt a31, and the runner a33 can rotate at a fixed point through the corresponding interval, so that the collection block a34 can process scales through continuous rotation of the runner a 33.

Wherein the collection block a34 is provided with a solid layer b1, a guide groove b2, a collection groove b3 and a guide ring b4, the solid layer b1 is integrated with the guide groove b2, the collection groove b3 is communicated with the guide groove b2, the lead-out ring b4 is inserted into the middle of the collection groove b3, the solid layer b1 is triangle-shaped, and the guide groove b2 at the upper end is hollow and is chamfer-shaped, so that the collection trough b3 is made of stainless steel, and the lead-out ring b4 has a corresponding handle and catch, the triangular shape and the flat angle of the end point of the solid layer b1 can effectively treat the water drops on the end surface of the scale so as to lead the water drops into the collecting groove b3 through the guiding groove b2, and the collecting groove b3 can effectively prolong the service life of the collecting groove b3 through the stainless steel material of the collecting groove b3 and prevent the rusting condition caused by the influence of water drops.

The specific functions and operation flow of this embodiment are as follows:

in the invention, the tannic acid preparation equipment can effectively open the processing box 5 through the switch 2 arranged on the self supporting seat 1, so that the pressure gauge 6 can detect the internal pressure, the processing box 5 can continuously process the tannic acid flakes through the adjusting device 53 before the tannic acid is processed and dehydrated and dried, the processing groove 532 arranged on the fixing plate 531 of the adjusting device 53 can effectively and continuously pass the tannic acid flakes, the diameter of the grid a2 can be controlled by the processing groove 532 through the self adjusting layer a1, the processor a3 can move along with the movement of the grid a2 and the flakes, the processor a3 can continuously rotate through the rotating wheel a33 when the flakes pass, the bolt a31 and the limiting ring a32 can effectively position the rotating wheel a33, and the flakes can be continuously processed by the collecting block a34 while passing through, thereby collection piece a34 can carry out constantly collecting processing through self guiding groove b2 with the drop of water impurity on the scale terminal surface, causes collecting vat b3 to deposit these drop of water impurity, and finally the accessible is derived circle b4 and is discharged the drop of water impurity of inside, to sum up can effectually prevent through each part under mutually supporting that the scale is direct to remain some impurity on the dry scale terminal surface that forms and influence reaction numerical value and the result of use that leads to of scale.

Example 2:

fig. 7 to 9 show:

its structure includes solid piece 533 is equipped with fixed block c1, support shaft c2, rotation axis c3, lug c4, fixed block c1 upper end and support shaft c2 are as an organic whole, rotation axis c3 carries out swing joint with support shaft c2, lug c4 is installed in rotation axis c 3's upper end, lug c4 is the triangle-shaped to its terminal surface is the fillet shape, lug c4 can prevent the scale by the state of incised wound and blocking when dropping through the triangle-shaped of self and the state of fillet.

The convex block c4 is provided with an insertion rod c41, a fixing plate c42 and a buffer shaft c43, the insertion rod c41 is embedded into the fixing plate c42, the buffer shaft c43 is embedded into the fixing plate c42, the fixing plate c42 is made of stainless steel, the end face of the outer end of the fixing plate c42 is in a polished state, the fixing plate c42 can effectively prevent the influence of water stain under the effect of the stainless steel of the fixing plate c42, and the scale can be effectively prevented from being attached to the end face of the fixing plate c when the scale drops through the polished state.

The insertion rod c41 is provided with a notch d1, a connecting plate d2, a movable seat d3 and a balance rod d4, the notch d1 is fixedly connected with the connecting plate d2, the movable seat d3 is embedded into the connecting plate c2, the balance rod c4 is movably connected with the movable seat d3, the balance rod d4 is in a solid state and has corresponding elasticity and toughness, and the balance rod d4 can effectively improve the movable balance between the movable seat d3 and each component under the effects of the solid state and the toughness of the balance rod d 4.

The specific functions and operation flow of this embodiment are as follows:

in the invention, based on the basic effect of embodiment 1, the solid block 533 can effectively make a plurality of scales fall off continuously under the states of the triangular shape and the rounded corner of the solid block 533, and the bump c4 can move continuously under the driving of the rotating shaft c3 and the supporting shaft c2, so that the bump c4 can improve the moving performance of the scales, so that the bump c4 can effectively prevent the scales from being clamped in the upper end point of the bump c4 through the mutual matching of the buffering shaft c43 and the fixing plate c42, and can improve the moving balance of the bump c41, so that the inserting rod c41 can effectively drive the moving seat d3 in the bump to move to extend the balance rod d4 to form a clamping state when moving, so that the moving balance of each component can be effectively improved, and the falling performance of the scales can be effectively improved through the mutual matching of each component, thereby preventing the scales from falling off in the process of the clamping In the upper surface end of the solid block 533.

The technical solutions of the present invention or similar technical solutions designed by those skilled in the art based on the teachings of the technical solutions of the present invention are all within the scope of the present invention to achieve the above technical effects.

Claims

1. The utility model provides a refined semiconductor new material preparation equipment for tannic acid, its structure includes supporting seat (1), on & off switch (2), finished product case (3), gets feed cylinder (4), processing case (5), manometer (6), its characterized in that: the supporting seat (1) is connected with the on-off key (2) in a clamping mode, the finished product box (3) is installed at the upper end of the supporting seat (1), the material taking barrel (4) is embedded into the upper end of the finished product box (3), the processing box (5) is connected with the finished product box (3) in an interconnecting mode, and the pressure gauge (6) is embedded into the front end of the processing box (5);

the machining box (5) is provided with a fixing block (51), a clamping groove (52), an adjusting device (53) and an exhaust end (54), the fixing block (51) and the clamping groove (52) are integrated, the adjusting device (53) is embedded into the clamping groove (52), and the exhaust end (54) is installed at the center position of the adjusting device (53).

2. The apparatus for manufacturing a new semiconductor material for refined tannic acid of claim 1, wherein: the adjusting device (53) is provided with a fixing plate (531), a processing groove (532) and a solid block (533), the fixing plate (531) and the processing groove (532) are integrated, and the solid block (533) is fixedly connected to the center of the fixing plate (531).

3. The apparatus for manufacturing a new semiconductor material for refined tannic acid of claim 2, wherein: the processing tank (532) is provided with an adjusting layer (a1), a through lattice (a2) and a processor (a3), wherein the adjusting layer (a1) is movably connected with the through lattice (a2), and the processor (a3) is embedded in two sides of the through lattice (a 2).

4. The apparatus for manufacturing a new semiconductor material for refined tannic acid of claim 3, wherein: the processor (a3) is provided with a bolt (a31), a limiting ring (a32), a rotating wheel (a33) and a collecting block (a34), the bolt (a31) is in threaded connection with the center of the limiting ring (a32), the rotating wheel (a33) is in clearance fit with the bolt (a31), and the collecting block (a34) is embedded into the rotating wheel (a 33).

5. The apparatus for manufacturing a new semiconductor material for refined tannic acid of claim 4, wherein: the collecting block (a34) is provided with a solid layer (b1), a guide groove (b2), a collecting groove (b3) and a guiding ring (b4), the solid layer (b1) and the guide groove (b2) are integrated, the collecting groove (b3) is communicated with the guide groove (b2), and the guiding ring (b4) is embedded in the middle of the collecting groove (b 3).

6. The apparatus for manufacturing a new semiconductor material for refined tannic acid of claim 2, wherein: the solid block (533) is provided with a fixing block (c1), a supporting shaft (c2), a rotating shaft (c3) and a bump (c4), the upper end of the fixing block (c1) is integrated with the supporting shaft (c2), the rotating shaft (c3) is movably connected with the supporting shaft (c2), and the bump (c4) is mounted at the upper end of the rotating shaft (c 3).

7. The apparatus for manufacturing a new semiconductor material for refined tannic acid of claim 6, wherein: the convex block (c4) is provided with an insertion rod (c41), a fixing plate (c42) and a buffer shaft (c43), the insertion rod (c41) is embedded in the fixing plate (c42), and the buffer shaft (c43) is embedded in the fixing plate (c 42).

8. The apparatus for manufacturing a new semiconductor material for refined tannic acid of claim 7, wherein: the insert rod (c41) is provided with a notch (d1), a connecting plate (d2), a movable seat (d3) and a balance rod (d4), the notch (d1) is fixedly connected with the connecting plate (d2), the movable seat (d3) is embedded into the connecting plate (c2), and the balance rod (c4) is movably connected with the movable seat (d 3).