CN113351535A - Debris cleaning device and system - Google Patents
Debris cleaning device and system Download PDFInfo
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- CN113351535A CN113351535A CN202110620441.1A CN202110620441A CN113351535A CN 113351535 A CN113351535 A CN 113351535A CN 202110620441 A CN202110620441 A CN 202110620441A CN 113351535 A CN113351535 A CN 113351535A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 74
- 230000007246 mechanism Effects 0.000 claims abstract description 68
- 238000010408 sweeping Methods 0.000 claims abstract description 39
- 238000007790 scraping Methods 0.000 claims abstract description 29
- 238000009434 installation Methods 0.000 claims abstract description 16
- 238000001179 sorption measurement Methods 0.000 claims description 19
- 238000007789 sealing Methods 0.000 claims description 15
- 238000010521 absorption reaction Methods 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 229920001342 Bakelite® Polymers 0.000 description 3
- 239000004637 bakelite Substances 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 3
- 238000012858 packaging process Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 1
- 208000034809 Product contamination Diseases 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
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- B08B1/12—
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Abstract
The invention discloses a debris cleaning device and system, the debris cleaning device comprising: the scraping and sweeping mechanism comprises bristles and a scraping and sweeping base, the bristles are mounted on the scraping and sweeping base, the scraping and sweeping base is suitable for being mounted on the moving mechanism, and the moving mechanism is suitable for driving the scraping and sweeping base to move; the fixing mechanism is provided with an installation position, and the product is suitable for being installed at the installation position; wherein the moving mechanism is suitable for driving the bristles of the scraping and sweeping mechanism to move along the surface of the product so as to scrape and sweep the debris on the surface of the product. The debris cleaning device can effectively clean debris on the surface of a product and effectively avoid the influence of the debris on the performance of the product. The cleaning device has the advantages of simple structure, convenience in cleaning and low cost.
Description
Technical Field
The invention relates to the field of chip packaging, in particular to a debris cleaning device and a debris cleaning system.
Background
SIP (System In a Package System In Package) is a common packaging method In the field of chip packaging. Sputtering (Sputter) is a crucial process in the SIP packaging process. In the existing SIP packaging process, metal debris remains on the bottom surface of the product after the sputtering process, and the remaining metal debris may cause a risk of short circuit of the product. Metal debris also risks causing a short circuit of the whole machine if it flows to the client. In the existing packaging process, special workers are required to be arranged to inspect and clean surface debris under a microscope before the product is shipped, so as to ensure that the product is free from quality risks.
The following disadvantages exist in the process of manually cleaning product debris: firstly, manual microscopic examination and wiping are prone to leakage; secondly, the manual operation easily causes the product damage or the product contamination; thirdly, the efficiency of manual wiping is low and the cost is high.
Disclosure of Invention
In view of the above technical problems, an object of the present invention is to provide a debris cleaning device and a system thereof, which can effectively clean debris on the surface of a product and effectively prevent the debris from affecting the performance of the product. The cleaning device has the advantages of simple structure, convenience in cleaning and low cost.
In order to achieve the above object, an object of the present invention is to provide a debris cleaning device adapted to sweep debris on a surface of a product, comprising:
the scraping and sweeping mechanism comprises bristles and a scraping and sweeping base, the bristles are mounted on the scraping and sweeping base, the scraping and sweeping base is suitable for being mounted on the moving mechanism, and the moving mechanism is suitable for driving the scraping and sweeping base to move;
the fixing mechanism is provided with an installation position, and the product is suitable for being installed at the installation position;
wherein the moving mechanism is suitable for driving the bristles of the scraping and sweeping mechanism to move along the surface of the product so as to scrape and sweep the debris on the surface of the product.
Preferably, the fixing mechanism comprises a vacuum adsorption assembly adapted to fix the product by vacuum adsorption.
Preferably, the vacuum adsorption assembly comprises a vacuum adsorption base and a mounting base, the mounting base is provided with a first side surface and a second side surface, and the first side surface is provided with the mounting position; the installation pedestal mounting in the top surface of vacuum adsorption base, the second side with the vacuum adsorption base the surface between the negative pressure chamber, the vacuum adsorption base is suitable for taking out gas in the negative pressure chamber form the negative pressure in the negative pressure chamber, the installation position have with the absorption through-hole of negative pressure chamber intercommunication.
Preferably, the mounting position of the mounting base is provided with a mounting groove communicated with the adsorption through hole for mounting the product.
Preferably, a peripheral area of the first side of the mounting base is provided with a plurality of positioning protrusions, and the plurality of positioning protrusions surround to form a positioning area so as to limit a transfer mechanism for transferring a product to the mounting base.
Preferably, the preset position of the first side surface of the mounting base is provided with a support rib arranged along a gap between adjacent mounting grooves, and the height of the product placed behind the mounting grooves is lower than the height of the support rib.
Preferably, the periphery of the second side of the mounting base has a first sealing ring, the periphery of the top surface of the vacuum adsorption base has a second sealing ring, and the first sealing ring and the second sealing ring are oppositely arranged.
Preferably, at least one side of the mounting base is provided with an ear groove.
Preferably, the vacuum adsorption base has a plurality of support ribs at predetermined positions on the top surface thereof, and the support ribs are used for supporting the second side surface of the mounting base.
Preferably, the debris cleaning device further comprises a machine platform and a calibration block, wherein the calibration block and the vacuum adsorption base are respectively installed on the same side of the machine platform; the top surface of the calibration block is of a step structure, the top surface of the calibration block is provided with a first layer and a second layer, the height of the first layer is consistent with the height of the product after the product is installed in the installation groove, and the height of the second layer is 0.5-2mm lower than that of the first layer.
According to another aspect of the invention, the invention further provides a debris cleaning system comprising:
the debris cleaning apparatus of any of the above;
a control mechanism;
the control mechanism is connected with the moving mechanism, the scraping and sweeping mechanism of the debris cleaning device is installed on the moving mechanism, and the control mechanism is suitable for controlling the moving mechanism to drive the scraping and sweeping mechanism to move along a preset track.
Compared with the prior art, the debris cleaning device and the debris cleaning system provided by the invention have at least one of the following beneficial effects:
1. according to the debris cleaning device and the debris cleaning system, debris on the surface of a product can be effectively cleaned, and the influence of the debris on the performance of the product is effectively avoided. The structure is simple, the cleaning is convenient, and the cost is low; the debris cleaning device is particularly suitable for cleaning metal debris on the surface of the packaged product and preventing the metal debris from causing short circuit of the packaged product;
2. according to the debris cleaning device and the debris cleaning system, the vacuum adsorption base is arranged below the installation base of the debris cleaning device, a product to be swept is fixed in a vacuum adsorption mode, and the product to be swept cannot be damaged in the fixing process;
3. according to the debris cleaning device and the debris cleaning system, the supporting ribs are arranged on the first side face, used for mounting a product to be cleaned, of the mounting base of the debris cleaning device, and the height of the supporting ribs is higher than that of the product, so that the pressure of bristles of a scraping and sweeping mechanism can be effectively decomposed, and the product to be cleaned is protected from being crushed;
4. according to the debris cleaning device and the debris cleaning system, the support frame is arranged at the preset position of the top surface of the vacuum adsorption base, which is in contact with the mounting base, and can support the mounting base, prevent the mounting base from sinking and keep the flatness and stability of the top surface of the mounting base.
Drawings
The above features, technical features, advantages and modes of realisation of the present invention will be further described in the following detailed description of preferred embodiments thereof, which is to be read in connection with the accompanying drawings.
FIG. 1 is an exploded view of a debris cleaning device in accordance with a preferred embodiment of the present invention;
FIG. 2 is a cross-sectional view of a debris cleaning apparatus in accordance with a preferred embodiment of the present invention;
FIG. 3 is a perspective view of a mounting base of the debris cleaning apparatus of the preferred embodiment of the present invention;
FIG. 4 is a cross-sectional view taken along line A-A of the debris cleaning apparatus of FIG. 1 when the mounting base and the vacuum suction base are assembled with each other;
FIG. 5 is a cross-sectional view taken along line B-B of the debris cleaning apparatus of FIG. 1 with the mounting base and the vacuum suction base assembled with each other.
The reference numbers illustrate:
the cleaning device comprises a cleaning mechanism 1, bristles 11, a cleaning base 12, a mounting head 13, a fixing mechanism 2, a mounting position 21, a suction through hole 210, a vacuum suction component 22, a vacuum suction base 221, a top surface 2211, a negative pressure cavity 2210, a suction hole 2212, a mounting base 222, a first side 2221, a second side 2222, a mounting groove 2220, a positioning protrusion 223, a support rib 224, a first sealing ring 2251, a second sealing ring 2252, an ear groove 226, a support frame 227, a first shallow groove 231, a second shallow groove 232, a machine platform 31, a calibration block 32, a first step 321 and a second step 322.
Detailed Description
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following description will be made with reference to the accompanying drawings. It is obvious that the drawings in the following description are only some examples of the invention, and that for a person skilled in the art, other drawings and embodiments can be derived from them without inventive effort.
For the sake of simplicity, only the parts relevant to the invention are schematically shown in the drawings, and they do not represent the actual structure as a product. In addition, in order to make the drawings concise and understandable, components having the same structure or function in some of the drawings are only schematically illustrated or only labeled. In this document, "one" means not only "only one" but also a case of "more than one".
It should be further understood that the term "and/or" as used in this specification and the appended claims refers to and includes any and all possible combinations of one or more of the associated listed items.
In this context, it is to be understood that, unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In addition, in the description of the present application, the terms "first", "second", and the like are used only for distinguishing the description, and are not intended to indicate or imply relative importance.
Example 1
Referring to the accompanying drawings 1 to 5 of the specification, a debris cleaning device provided by the invention is illustrated, and the debris cleaning device provided by the invention can effectively clean debris on the surface of a product and effectively avoid the debris from influencing the performance of the product. The cleaning device has the advantages of simple structure, convenience in cleaning and low cost.
It is noted that the debris cleaning apparatus provided by the present invention is particularly suitable for sweeping metal debris from the backside of SIP packaged products. It will be appreciated that the debris cleaning device provided by the present invention can also be adapted to clean debris from the surface of other products, and the field of application of the automatic debris cleaning device and the type of debris being cleaned should not be construed as limiting the invention.
Referring to the drawings 1, 2 and 3 of the specification, specifically, the debris cleaning apparatus includes a sweeping mechanism 1 and a fixing mechanism 2. The scraping mechanism 1 comprises bristles 11 and a scraping base 12, the bristles 11 are installed on the scraping base 12, the scraping base 12 is suitable for being installed on a moving mechanism, and the moving mechanism is suitable for driving the scraping base 12 to move. The fixing mechanism 2 has a mounting location 21, and the product is adapted to be mounted to the mounting location 21. The moving mechanism is suitable for driving the bristles 11 of the sweeping mechanism 1 to move along the surface of the product so as to sweep the debris on the surface of the product.
The sweeping mechanism 1 further includes a mounting head 13, the mounting head 13 is mounted to the sweeping base 12, and the bristles 11 and the mounting head 13 are respectively mounted to opposite sides of the sweeping base 12. The mounting head 13 of the sweeping mechanism 1 is suitable for being connected to a machine table main shaft of a moving mechanism.
In the process of the debris cleaning device provided by the invention, the fixing mechanism 2 can fix the product, and the bristles 11 can perform sweeping movement along the surface of the product under the driving of the moving mechanism so as to clean the surface of the product. The debris cleaning device provided by the invention has higher cleaning efficiency and cleaning effect, and an operator does not need to contact with a product in the cleaning process, so that the product pollution in the cleaning process can be effectively prevented.
Further, the fixing mechanism 2 comprises a vacuum suction assembly 22, and the vacuum suction assembly 22 is adapted to fix the product by vacuum suction. It should be noted that the product is fixed in a vacuum adsorption mode, the structure is simple, and structural damage to the product cannot be caused. Alternatively, in other preferred embodiments of the present invention, the product can be fixed by other means, such as adhesion or clamping. It is immediately clear that the specific way in which the fixing means 2 fix the product should not constitute a limitation of the invention.
Referring to the specification, fig. 1, fig. 2 and fig. 3, specifically, the vacuum suction assembly 22 includes a vacuum suction base 221 and a mounting base 222, the mounting base 222 has a first side 2221 and a second side 2222, and the first side 2221 has the mounting position 21. The mounting base 222 is mounted on the top surface 2211 of the vacuum suction base 221, a negative pressure cavity 2210 is formed between the second side surface 2222 and the top surface 2211 of the vacuum suction base 221, the vacuum suction base 221 is adapted to draw out gas in the negative pressure cavity 2210, a negative pressure is formed in the negative pressure cavity 2210, and the mounting site 21 has a suction through hole 210 communicating with the negative pressure cavity 2210.
Referring to the description of fig. 4 and 5, the second side 2222 of the mounting base 222 has a first shallow groove 231, the top surface 2211 of the vacuum chuck base 221 has a second shallow groove 232, and the first shallow groove 231 and the second shallow groove 232 form the negative pressure cavity 2210 when the second side 2222 of the mounting base 222 is mounted to the top surface 2211 of the vacuum chuck base 221.
Preferably, the depths of the first shallow groove 231 and the second shallow groove 232 are 3 to 6mm, respectively.
In the use process of the fixing mechanism 2 provided by the present invention, after the vacuum adsorption base 221 starts to work, the gas in the negative pressure cavity 2210 is pumped out, and a negative pressure environment is formed in the negative pressure cavity 2210. The product is positioned above the suction through hole 210, and is fixed to the mounting base 222 by the negative pressure environment in the negative pressure chamber 2210.
Referring to fig. 1, 4 and 5 of the specification, further, the mounting position 21 of the mounting base 222 has a mounting groove 2220 communicated with the suction through hole 210. The product to be scraped is suitable for installation in the mounting groove 2220, the side wall of the mounting groove 2220 can be limited to the product to be scraped, so that the product to be scraped is prevented from moving relative to the mounting base 222, and the stability of installation of the product to be scraped is improved.
Preferably, the width of the mounting groove 2220 is 0.3-1mm wider than the width of the product, and the depth of the mounting groove 2220 is 0.3-0.5mm lower than the height of the product. The depth of the mounting groove 2220 is lower than the height of the product, so that the product can be sufficiently exposed, and cleaning is facilitated. Preferably, the length and width of the suction through-hole 210 are greater than 1mm, respectively, and the length and width of the suction through-hole 210 are smaller than the length and width of the product by 2mm, respectively.
A peripheral area of the first side 2221 of the mounting base 222 has a plurality of positioning protrusions 223, and a plurality of positioning protrusions 223 surround to form a positioning area so as to limit a transfer mechanism for transferring a product to the mounting base 222. The positioning bulge 223 can position the transferring mechanism for transferring products, and can improve the accuracy and precision of product installation.
Referring to fig. 1 of the specification, preferably, the number of the positioning protrusions 223 is four, four positioning protrusions 223 are respectively mounted at four corners of the first side 2221 of the mounting base 222, and the positioning protrusions 223 are respectively in an "L" shape.
Alternatively, the positioning protrusions 223 can also be in the shape of straight bars, which are respectively disposed on four sides of the first side 2221 of the mounting base 222. It is to be understood that the specific shape and mounting position of the positioning projection 223 should not be construed as limiting the present invention.
Referring to fig. 1 of the specification, the first side 2221 of the mounting base 222 has a support rib 224 arranged along a gap between adjacent mounting grooves 2220 at a predetermined position, and the height of the product placed in the mounting groove 2220 is lower than the height of the support rib 224. The height of the support rib 224 is higher than that of the product already placed in the mounting groove 2220, so that the product can be protected from being crushed before scraping. On the other hand, during the sweeping process, the support ribs 224 can decompose the pressure of the bristles 11 to protect the product.
Illustratively, the support ribs 224 of the first side 2221 of the mounting base 222 are arranged in a "tian" shape. Alternatively, the support rib 224 can be provided in other shapes, and the specific location and shape of the support rib 224 should not be construed as limiting the invention.
Preferably, the height of the support ribs 224 ranges from 0.4mm to 0.6 mm. The support ribs 224 are 0.1-0.2mm higher than the height of the product already placed in the mounting grooves 2220.
Referring to fig. 4 and 5 of the specification, the periphery of the second side surface 2222 of the mounting base 222 is provided with a first sealing ring 2251, the periphery of the top surface 2211 of the vacuum suction base 221 is provided with a second sealing ring 2252, and the first sealing ring 2251 and the second sealing ring 2252 are oppositely arranged to seal the joint between the mounting base 222 and the vacuum suction base 221.
Preferably, the first sealing ring 2251 and the second sealing ring 2252 are made of soft rubber, and have a hardness of 50-90, which meets the ESD electronic industry standard, and a surface electrostatic voltage of ± 100V | & impedance of 10^ 4-10 ^9 Ω.
Further, at least one side of the mounting base 222 is formed with an ear slot 226. By providing the ear groove 226 on at least one side of the mounting base 222, the product can be conveniently mounted and dismounted before and after the operation.
Preferably, the ear slots 226 range from 10mm to 20mm in width and from 40 mm to 100mm in length.
Referring to the specification, fig. 1, 4 and 5, the top surface of the vacuum chuck base has a plurality of supporting brackets 227 at predetermined positions, and the supporting brackets 227 are used for supporting the mounting base 222 to prevent the mounting base 222 from being recessed toward the vacuum chuck base 221. In use, a negative pressure environment is formed in the negative pressure cavity 2210 between the second side surface 2221 of the mounting base 222 and the vacuum absorption base 221, and the mounting base 222 is easily deformed by an external pressure, so that the first side surface 2221 is not flat, and the cleaning effect of the surface of the product is affected. In the preferred embodiment, by providing the supporting frame 227 at a predetermined position on the top surface 2211 of the vacuum suction base 221, the mounting base 222 can be effectively supported, and the mounting base 222 is prevented from being deformed concavely.
Referring to fig. 1 of the specification, the top surface 2211 of the vacuum absorption base 221 is further opened with an air exhaust hole 2212, and the air exhaust hole 2211 is communicated with the negative pressure cavity 2210 to exhaust air in the negative pressure cavity 2210, so as to form a negative pressure environment in the negative pressure cavity 2210. The supporting frame 227 and the air suction holes 2212 are arranged in a staggered manner so as to prevent the air suction holes 2212 from being blocked.
Preferably, the support frame 227 is formed of a plurality of bar-shaped support blocks. Optionally, the support 227 can also be made up of a plurality of support posts distributed at a plurality of different locations on the top surface 2211. The specific configuration of the supporting frame 227 should not be construed as limiting the present invention as long as the above-mentioned objects of the present invention can be achieved.
Referring to fig. 2 of the specification, further, the debris cleaning apparatus further includes a stage 31 and a calibration block 32, and the calibration block 32 and the vacuum suction base 221 are respectively installed on the same side of the stage 31. Wherein the top surface of the calibration block 32 is a step structure, the top surface of the calibration block has a first step 321 and a second step 322, the height of the first step 321 is the same as the height of the product after being mounted in the mounting groove 2220, and the height of the second step 322 is 0.5-2mm lower than that of the first step 321.
After a period of time during which the bristles 11 of the sweeping mechanism 1 are used to sweep a product, the heads of the bristles 11 may be worn, resulting in the bristles 11 not being in effective contact with the surface of the product, which may affect the sweeping effect. On the other hand, after the new bristle 11 is replaced, the distance between the newly installed bristle 11 and the product needs to be adjusted to achieve a good sweeping effect.
The height of the bristles 11 can be adjusted by the adjusting block 32 provided by the invention, so that the bristles 11 can be fully contacted with the surface of a product, and the debris sweeping effect is improved.
When the height of the brush hair 11 is adjusted by using the calibration block 32, the calibration block 32 is moved back and forth, and the brush hair 11 can pass through the second step 322 of the calibration block 32, but cannot pass through the first step 321 of the calibration block 32 to have a standard height.
In use, the bottom of the packaged product faces upward, and the front surface of the packaged product contacts with the first side surface 2221 of the mounting base 222 and is fixed by the suction force generated by the vacuum suction base 221. The bristles 11 are controlled to descend to a preset height and then to move along a preset trajectory to sweep debris from the surface of the enclosed product. Further, air pipes can be arranged for blowing air to further clean the remaining surface foreign matters.
Preferably, the first side 2221 of the mounting base 222 is made of esd (electrostatic discharge) protection bakelite, the second side 2222 is made of hard-anodized aluminum alloy, and the first side 2221 and the second side 2222 of the mounting base 222 are locked by embedded screws. Similarly, the top surface 2211 of the vacuum chuck base 221 is made of esd (electrostatic discharge) shielding bakelite, the back surface is made of hard anodized aluminum alloy, and the middle is locked with embedded screws. The front surface of the brush hair 11 is made of ESD (electrostatic discharge) protective bakelite, the back surface of the brush hair is made of hard-anodized aluminum alloy, and the middle of the brush hair is locked by an embedded screw.
Preferably, the sweeping base 12 is a circular base with a diameter of 100+/-0.1mm, a thickness of 15+/-0.1mm and an opening number of 80-100 at the bottom of the base. The brush hair 11 is antistatic wear-resisting nylon material, and to the difference of the product that needs to sweep, the diameter, the length of brush hair 11 can be different. Illustratively, for LGA products: bristle diameter 0.3mm +/-0.05mm, bristle protrusion base length 15+/-0.5mm, each bundle of bristles implanted into the base aperture: 5mm +/-0.1mm, and the middle area of the brush hair is kept clear and is not implanted with the brush hair; aiming at the BGA product: bristle diameter 0.4mm +/-0.05mm, bristle protrusion base length 15+/-0.5mm, each bundle of bristles implanted into the base aperture: 4mm +/-0.1mm, and the middle area of the brush hair is kept clear and is not implanted with the brush hair.
Example 2
According to another aspect of the invention, the invention further provides a debris cleaning system comprising: the debris cleaning device, the control mechanism and the moving mechanism in embodiment 1, wherein the control mechanism is connected to the moving mechanism, the sweeping mechanism 1 of the debris cleaning device is installed on the moving mechanism, and the control mechanism is adapted to control the moving mechanism to drive the sweeping mechanism 1 to move along a preset track so as to sweep debris on the surface of a product.
It should be noted that the above embodiments can be freely combined as necessary. The foregoing is only a preferred embodiment of the present invention, and it should be noted that it is obvious to those skilled in the art that various modifications and improvements can be made without departing from the principle of the present invention, and these modifications and improvements should also be considered as the protection scope of the present invention.
Claims (11)
1. A debris cleaning device adapted to sweep debris across a surface of a product, comprising:
the scraping and sweeping mechanism comprises bristles and a scraping and sweeping base, the bristles are mounted on the scraping and sweeping base, the scraping and sweeping base is suitable for being mounted on the moving mechanism, and the moving mechanism is suitable for driving the scraping and sweeping base to move;
the fixing mechanism is provided with an installation position, and the product is suitable for being installed at the installation position;
wherein the moving mechanism is suitable for driving the bristles of the scraping and sweeping mechanism to move along the surface of the product so as to scrape and sweep the debris on the surface of the product.
2. The debris cleaning device of claim 1 wherein the securing mechanism comprises a vacuum suction assembly adapted to secure the product by vacuum suction.
3. The debris cleaning device of claim 2 wherein the vacuum suction assembly includes a vacuum suction base and a mounting base, the mounting base having a first side and a second side, the first side having the mounting location; the installation pedestal mounting in the top surface of vacuum adsorption base, the second side with the vacuum adsorption base the surface between the negative pressure chamber, the vacuum adsorption base is suitable for taking out gas in the negative pressure chamber form the negative pressure in the negative pressure chamber, the installation position have with the absorption through-hole of negative pressure chamber intercommunication.
4. The debris cleaning device according to claim 3, wherein the mounting portion of the mounting base has a mounting groove communicating with the suction through hole for mounting the product.
5. The debris cleaning device of claim 4, wherein a peripheral region of the first side of the mounting base has a plurality of locating projections that form a locating region around to limit a transfer mechanism that transfers product to the mounting base.
6. The debris cleaning device of claim 5 wherein the predetermined location of the first side of the mounting base has a support rib disposed along a gap between adjacent mounting slots, the height of the product after placement in the mounting slots being less than the height of the support rib.
7. The debris cleaning device of claim 3, wherein a perimeter of the second side of the mounting base has a first sealing ring and a perimeter of the top surface of the vacuum suction base has a second sealing ring, the first and second sealing rings being oppositely disposed.
8. The debris cleaning device of claim 7 wherein at least one side of the mounting base defines an ear slot.
9. The debris cleaning device of claim 7 wherein the predetermined location of the top surface of the vacuum suction base has a plurality of support ribs for supporting the second side of the mounting base.
10. The debris cleaning device of any of claims 3 to 9, further comprising a stage platform and a calibration block, the calibration block and the vacuum suction base being mounted on a same side of the stage platform, respectively; the top surface of the calibration block is of a step structure, the top surface of the calibration block is provided with a first layer and a second layer, the height of the first layer is consistent with the height of the product after the product is installed in the installation groove, and the height of the second layer is 0.5-2mm lower than that of the first layer.
11. A debris cleaning system, comprising:
the debris cleaning device of any one of claims 1-10;
a control mechanism;
the control mechanism is connected with the moving mechanism, the scraping and sweeping mechanism of the debris cleaning device is installed on the moving mechanism, and the control mechanism is suitable for controlling the moving mechanism to drive the scraping and sweeping mechanism to move along a preset track.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110620441.1A CN113351535A (en) | 2021-06-03 | 2021-06-03 | Debris cleaning device and system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110620441.1A CN113351535A (en) | 2021-06-03 | 2021-06-03 | Debris cleaning device and system |
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| CN113351535A true CN113351535A (en) | 2021-09-07 |
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| CN202110620441.1A Pending CN113351535A (en) | 2021-06-03 | 2021-06-03 | Debris cleaning device and system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113978839A (en) * | 2021-12-08 | 2022-01-28 | 赵天明 | Rice transport packing assembly line |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005011887A1 (en) * | 2005-03-15 | 2006-09-21 | Linde Ag | Reactor`s surface cleaning method, involves simultaneously cleaning surface by air plasma or low vacuum plasma, and mechanically stressing surface by rotating round brush, metallic flat brush, scrubber, scraper or other cleaning equipment |
| CN108470935A (en) * | 2018-05-21 | 2018-08-31 | 江惊羊 | A kind of automation equipment for producing cylindrical battery |
| CN208196537U (en) * | 2018-05-18 | 2018-12-07 | 深圳鑫振华光电科技有限公司 | Grinding machine vacuum adsorption fixture |
| CN208428005U (en) * | 2018-05-18 | 2019-01-25 | 珠海格力精密模具有限公司 | Fixture and part system of processing |
| CN209095061U (en) * | 2018-10-31 | 2019-07-12 | 东莞市达上实业有限公司 | A kind of vacuum adsorption fixture |
| CN211135673U (en) * | 2019-11-15 | 2020-07-31 | 成都千益科技有限公司 | Numerical control planer-type milling machine with piece clearance mechanism |
| CN111975436A (en) * | 2020-07-28 | 2020-11-24 | 云和县新马玩具有限公司 | Chip collecting device for machining |
-
2021
- 2021-06-03 CN CN202110620441.1A patent/CN113351535A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005011887A1 (en) * | 2005-03-15 | 2006-09-21 | Linde Ag | Reactor`s surface cleaning method, involves simultaneously cleaning surface by air plasma or low vacuum plasma, and mechanically stressing surface by rotating round brush, metallic flat brush, scrubber, scraper or other cleaning equipment |
| CN208196537U (en) * | 2018-05-18 | 2018-12-07 | 深圳鑫振华光电科技有限公司 | Grinding machine vacuum adsorption fixture |
| CN208428005U (en) * | 2018-05-18 | 2019-01-25 | 珠海格力精密模具有限公司 | Fixture and part system of processing |
| CN108470935A (en) * | 2018-05-21 | 2018-08-31 | 江惊羊 | A kind of automation equipment for producing cylindrical battery |
| CN209095061U (en) * | 2018-10-31 | 2019-07-12 | 东莞市达上实业有限公司 | A kind of vacuum adsorption fixture |
| CN211135673U (en) * | 2019-11-15 | 2020-07-31 | 成都千益科技有限公司 | Numerical control planer-type milling machine with piece clearance mechanism |
| CN111975436A (en) * | 2020-07-28 | 2020-11-24 | 云和县新马玩具有限公司 | Chip collecting device for machining |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113978839A (en) * | 2021-12-08 | 2022-01-28 | 赵天明 | Rice transport packing assembly line |
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