CN113340180A - Measuring device for MOCVD equipment reaction chamber - Google Patents

Measuring device for MOCVD equipment reaction chamber Download PDF

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Publication number
CN113340180A
CN113340180A CN202110889862.4A CN202110889862A CN113340180A CN 113340180 A CN113340180 A CN 113340180A CN 202110889862 A CN202110889862 A CN 202110889862A CN 113340180 A CN113340180 A CN 113340180A
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China
Prior art keywords
rod
fixing
reaction chamber
annular
groove
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CN202110889862.4A
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Chinese (zh)
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CN113340180B (en
Inventor
尧舜
刘晨晖
董国亮
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China Semiconductor Technology Co ltd
Huaxin Semiconductor Research Institute Beijing Co ltd
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China Semiconductor Technology Co ltd
Huaxin Semiconductor Research Institute Beijing Co ltd
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Publication of CN113340180A publication Critical patent/CN113340180A/en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B5/00Measuring arrangements characterised by the use of mechanical techniques
    • G01B5/18Measuring arrangements characterised by the use of mechanical techniques for measuring depth
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B5/00Measuring arrangements characterised by the use of mechanical techniques
    • G01B5/24Measuring arrangements characterised by the use of mechanical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B5/25Measuring arrangements characterised by the use of mechanical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B5/252Measuring arrangements characterised by the use of mechanical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes for measuring eccentricity, i.e. lateral shift between two parallel axes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The invention discloses a measuring device for a reaction chamber of MOCVD equipment. The measuring device comprises an annular base, a movable frame rod and a measuring assembly, wherein the annular base comprises a first groove with an upward opening and a second groove with a downward opening, the first groove comprises a first annular cavity and a second annular cavity which are arranged up and down, and the second groove is fixed with the annular wall of the reaction cavity of the MOCVD equipment; the roller of the movable rack rod is arranged in the second annular cavity, the connecting rod is arranged in the first annular cavity, and two ends of the scale rod are connected with the roller through the connecting rod; the measuring assembly comprises a micrometer and a depth gauge which are vertically connected, the depth gauge measuring rod can move up and down along the first fixing assembly and can move horizontally along the scale rod through the first fixing assembly, and the micrometer can move up and down along with the depth gauge measuring rod through the horizontal fixing rod and the second fixing assembly. The device fixes the depth gauge and the micrometer on the movable frame rod which can freely rotate in 360 degrees on the plane, can realize data measurement at any position in the reaction cavity and ensure the consistency and the measurement precision of the measurement position.

Description

Measuring device for MOCVD equipment reaction chamber
Technical Field
The invention belongs to the field of chips, and particularly relates to a measuring device for a reaction chamber of MOCVD equipment.
Background
Metal Organic Chemical Vapor Deposition (MOCVD) is a Chemical Vapor Deposition technique for Vapor phase epitaxial growth of thin films by utilizing the thermal decomposition reaction of Organic metals, can accurately control the epitaxial thickness in the growth process, and has important significance in the fields of semiconductor growth and chip manufacturing. With the widespread use of Metal Organic Chemical Vapor Deposition (MOCVD) equipment in the semiconductor industry, measurements after the installation of fittings in the reaction chamber of MOCVD equipment (such as models G3 or G4) are increasing. The levelness and eccentricity of a large disk (susceptor) in a reaction cavity of the MOCVD equipment are important factors influencing the quality of an epitaxial film, and before vapor phase epitaxial growth, whether the levelness and eccentricity of the large disk (susceptor) meet requirements or not needs to be strictly controlled and measured so as to ensure that an epitaxial layer uniformly grows.
However, at present, the most used measuring tools are a micrometer and a depth gauge, and most of the two measuring tools are manually fixed, especially the depth gauge needs to be pressed on a measuring base to measure, so that the same measuring position is difficult to maintain and the precision is difficult to ensure; and the micrometer for measuring eccentricity is relatively complicated to fix and debug. In addition, when data of middle fittings in the reaction cavity need to be measured, the data can be measured only by means of a tool frame such as an aluminum rod on the top wall (Lid) of the reaction cavity, the tool is heavy, frequent operation is easy to scrape the Lid surface, the sealing performance is reduced, and the probability of collision with other graphite fittings is increased invisibly.
Disclosure of Invention
The present invention is directed to solving, at least to some extent, one of the technical problems in the related art. Therefore, an object of the present invention is to provide a measuring device for a reaction chamber of an MOCVD equipment, so as to solve the problems that the measuring tool of the existing MOCVD equipment (such as a G3 or a G4 model) needs to be manually fixed, the middle part of the reaction chamber needs to be measured by other tools, and the like, and to achieve the synchronous measurement of depth and eccentricity.
According to one aspect of the invention, the invention provides a measuring device for a reaction chamber of MOCVD equipment. According to an embodiment of the invention, the measuring device comprises:
the MOCVD equipment reaction chamber comprises an annular base, wherein a first groove and a second groove are formed between the inner peripheral wall and the outer peripheral wall of the annular base and are circumferentially arranged along the annular base, the first groove and the second groove are vertically arranged, the opening of the first groove faces upwards, the opening of the second groove faces downwards, the first groove comprises a first annular cavity and a second annular cavity which are vertically arranged, the radius of the inner peripheral wall of the second annular cavity is smaller than that of the inner peripheral wall of the first annular cavity, the radius of the outer peripheral wall of the second annular cavity is larger than that of the outer peripheral wall of the first annular cavity, scales circumferentially distributed along the annular base are marked on the upper surface of the annular base in a region close to the inner peripheral wall and/or the outer peripheral wall of the annular base, and the annular base is suitable for being fixed at the upper end of the annular wall of the MOCVD equipment reaction chamber through the second groove;
the movable rack rod comprises a scale rod, a connecting rod and a roller, the roller is arranged in the second annular cavity, the connecting rod is arranged in the first annular cavity, and two ends of the scale rod are connected with the roller through the connecting rod and can rotate along the circumferential direction of the annular base through the roller;
the measuring assembly comprises a micrometer and a depth gauge, the micrometer comprises a micrometer dial and a micrometer measuring rod connected with the micrometer dial, the depth gauge comprises a depth gauge measuring rod and a depth display screen arranged on the depth gauge measuring rod, a first fixing assembly and a second fixing assembly are arranged on the depth gauge measuring rod, the first fixing assembly is connected with the graduated rod, the depth gauge measuring rod can be moved up and down along the first fixing assembly and can pass through the first fixing assembly, the graduated rod can move horizontally, the micrometer is connected with the second fixing assembly through a horizontal fixing rod, the horizontal fixing rod can be moved horizontally along the second fixing assembly, and the second fixing assembly can be moved up and down along the depth gauge measuring rod.
The measuring device for the MOCVD equipment reaction chamber of the embodiment of the invention at least has the following advantages: 1. the measuring device is designed according to the self structure of the reaction cavity of the MOCVD equipment, integrates eccentricity measurement and depth measurement, is easy to be fixedly connected or detached with the MOCVD equipment through the second groove, and can be used for simultaneously measuring the depth and the eccentricity; 2. the measuring device is relatively fixed with the reaction cavity in the using process, the measuring component can horizontally move along the scale rod of the movable frame rod, and the movable frame rod can rotate 360 degrees along the annular base, so that not only can the depth data of any position in the reaction cavity be measured, but also the consistency of the measuring position can be ensured according to the scale rod and each scale on the annular base, and the measuring precision is higher; 3. can firmly fix the depth gauge and the micrometer on the movable hack lever through the fixed assembly, can stop the problem that the testing accuracy is difficult to guarantee because of manual fixation brings, can further improve measurement accuracy.
In addition, the measuring device for the reaction chamber of the MOCVD equipment according to the embodiment of the invention can also have the following additional technical characteristics:
in some embodiments of the invention, the first annular cavity, the second annular cavity and the second groove are coaxially arranged; and/or scales distributed along the circumferential direction of the annular base are marked on the upper surface of the annular base in the area close to the inner circumferential wall of the annular base.
In some embodiments of the invention, the central axes of the first ring cavity, the second ring cavity and the second groove coincide with a central plane between the inner circumferential wall and the outer circumferential wall of the annular base.
In some embodiments of the present invention, the MOCVD equipment reaction chamber includes a large plate and 8 small plates disposed on the large plate, the 8 small plates are uniformly distributed along the circumferential direction of the MOCVD equipment reaction chamber, 8 raised triangular regions are formed on the large plate along the circumferential direction of the large plate, the small plates and the triangular regions are alternately disposed, and in the scales formed on the upper surface of the annular base, the scales of 0 degree and 180 degrees respectively correspond to the central positions of the two small plates disposed oppositely.
In some embodiments of the invention, a fixing member is arranged on the outer peripheral wall of the annular base, and the fixing member is detachably connected with the outer peripheral wall of the reaction chamber of the MOCVD equipment.
In some embodiments of the invention, a lockset is arranged on the peripheral wall of the reaction chamber of the MOCVD equipment, a lockset protective cover matched and connected with the lockset is arranged on the lockset, a metal buckle plate matched and connected with the lockset protective cover is arranged on the peripheral wall of the annular base, and the metal buckle plate is connected with the peripheral wall of the annular base through a hinge.
In some embodiments of the invention, the inner surface of the second groove is provided with an elastic cushion, and the second groove is arranged at the upper end of the annular wall of the reaction chamber of the MOCVD equipment through the elastic cushion.
In some embodiments of the present invention, the annular base is a metal base, and the scale bars and the connecting bars of the movable frame bar are respectively and independently metal bars; and/or the presence of a gas in the gas,
the inner surface of the second groove is provided with a fluorine rubber elastic cushion, and the second groove is sleeved at the upper end of the annular wall of the MOCVD equipment reaction chamber through the elastic cushion.
In some embodiments of the invention, the total width of the roller and the connecting rod is greater than the width of the first ring cavity and less than the width of the second ring cavity; and/or, be equipped with the hasp on the connecting rod and with the fixed part that the hasp matches, hasp one end pass through the hinge with the connecting rod links to each other, the fixed part is established hinge upper portion and be suitable for with the other end of hasp links to each other, the other end of hasp is suitable for through the hinge rotation and with the fixed part links to each other or through the hinge rotation and stop in the bottom of first recess.
In some embodiments of the present invention, the first fixing assembly includes a first fixing block, a first fixing knob, and a second fixing knob, the graduated rod horizontally penetrates the first fixing block and adjusts fixing tightness of the first fixing block and the graduated rod by the first fixing knob, the depth scale measuring rod vertically penetrates the first fixing block and adjusts fixing tightness of the first fixing block and the depth scale measuring rod by the second fixing knob; and/or the second fixing component comprises a second fixing block and a third fixing knob, the second fixing block is detachably connected with the depth gauge measuring rod, the horizontal fixing rod horizontally penetrates through the second fixing block, and the fixing tightness of the horizontal fixing rod and the second fixing block is adjusted through the third fixing knob; and/or scales are marked on the horizontal fixing rod.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a schematic structural diagram of a measuring device for an MOCVD equipment reaction chamber, which is fixed with the MOCVD equipment reaction chamber according to an embodiment of the invention.
FIG. 2 is a cross-sectional view of an annular base according to one embodiment of the invention.
FIG. 3 is a top view of an annular base according to one embodiment of the present invention.
FIG. 4 is a bottom view of the ring base according to one embodiment of the present invention.
FIG. 5 is a top view of an annular base according to yet another embodiment of the invention.
FIG. 6 is a top view of a reaction chamber of an MOCVD apparatus.
Fig. 7 is a top view of a ring-shaped base of one embodiment of the present invention secured to the MOCVD tool reaction chamber of fig. 6.
Fig. 8 is a front view of a movable rack bar according to one embodiment of the present invention.
Fig. 9 is a side view of a movable rack bar according to one embodiment of the present invention.
Fig. 10 is a cross-sectional view of a mobile mast after being connected to a ring base, according to one embodiment of the present invention.
FIG. 11 is a front view of a measurement assembly according to one embodiment of the present invention.
FIG. 12 is a rear view of a measurement assembly according to one embodiment of the present invention.
FIG. 13 is a side view of a first securing assembly according to one embodiment of the invention.
FIG. 14 is a side view of a second securing assembly according to one embodiment of the invention.
Fig. 15 is a side view of the measuring device according to one embodiment of the present invention after being fixed to the reaction chamber of the MOCVD tool.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are illustrative and intended to be illustrative of the invention and are not to be construed as limiting the invention.
In the description of the present invention, it is to be understood that the terms "center," "length," "width," "thickness," "upper," "lower," "front," "rear," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," "circumferential," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the invention and to simplify the description, and are not intended to indicate or imply that the device or element so referred to must have a particular orientation, be constructed and operated in a particular orientation, and are not to be construed as limiting the invention. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly specified or limited, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
In the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
According to one aspect of the invention, the invention provides a measuring device for a reaction chamber of MOCVD equipment. According to an embodiment of the present invention, as shown in FIGS. 1 to 2, 8 and 11, the measuring apparatus includes: a ring-shaped base 100, a movable frame rod 200 and a measuring assembly 300. The measuring device is designed according to the self structure of the MOCVD equipment reaction cavity, integrates eccentricity measurement and depth measurement, is convenient to use and simple in measurement operation, can measure the depth data and eccentricity of any position in the reaction cavity, can ensure the consistency of the measuring position according to the scales on the scale rod and the annular base, and has high measuring precision. It should be noted that although the interior configurations of MOCVD equipment (such as AIXTRON planetary reactor) are different (such as G3 and G4 models), the cavity body itself has basically the same configuration, and the measuring device for MOCVD equipment reaction cavity can be used for measuring depth and eccentricity, and the invention is exemplified by the AIXTRON G4 model (loaded with 8 small plates).
The measuring device for the reaction chamber of the MOCVD equipment according to the embodiment of the invention is described in detail with reference to fig. 1 to 15.
Ring base 100
According to the embodiment of the invention, as understood by referring to fig. 1 to 4, a first groove 110 and a second groove 120 which are arranged along the circumferential direction of the annular base 100 are formed between the inner circumferential wall and the outer circumferential wall of the annular base 100, the first groove 110 and the second groove 120 are arranged up and down, the opening of the first groove 110 is upward, the opening of the second groove 120 is downward, the first groove 110 comprises a first annular cavity 111 and a second annular cavity 112 which are arranged up and down, the radius of the inner circumferential wall of the second annular cavity 112 is smaller than that of the inner circumferential wall of the first annular cavity 111, the radius of the outer circumferential wall of the second annular cavity 112 is larger than that of the outer circumferential wall of the first annular cavity 111, the scales 130 which are distributed along the circumferential direction of the annular base are marked on the upper surface of the annular base 100 in the area close to the inner circumferential wall and/or the outer circumferential wall thereof, and the annular base 100 is suitable for being fixed on the upper end of the annular wall 410 of the MOCVD equipment reaction chamber 400 through the second groove 120. Among them, as shown in fig. 3, scales 130 distributed along the circumferential direction of the ring-shaped base 100 may be marked on the upper surface of the base in the region near the inner circumferential wall thereof. The annular base is designed according to the self structure of the MOCVD equipment reaction cavity, and the annular base can be fixed at the upper end of an annular wall (Reactor Lid) of the MOCVD equipment reaction cavity through the second groove so as to keep the annular base and the annular wall of the MOCVD equipment reaction cavity relatively fixed in the measurement operation; furthermore, the starting point/midpoint of the scale on the upper surface of the annular base can correspond to a datum point or other specific positions in the reaction cavity of the MOCVD equipment, so that the consistency of the measuring position of the measuring device in the use process is ensured, and the accuracy and the reliability of the measuring result are improved.
According to an embodiment of the present invention, the first annular cavity 111, the second annular cavity 112, and the second groove 120 may be coaxially disposed, and more preferably, the central axes of the first annular cavity 111, the second annular cavity 112, and the second groove 120 may coincide with a central plane between the inner peripheral wall and the outer peripheral wall of the annular base 100, so as to further improve the stability of the annular base with respect to the MOCVD equipment reaction cavity, and avoid problems that the annular base is difficult to mount or dismount, the annular base is prone to scratching or colliding with the outer peripheral wall of the reaction cavity, and the like, which may be caused by the shift of the center of gravity of the annular base.
According to another embodiment of the present invention, as can be understood by referring to fig. 6 and 7, the reaction chamber 400 of the MOCVD equipment comprises a large plate (Susceptor) 420 and 8 small plates (Satellites) 430 arranged on the large plate 420, the 8 small plates 430 are uniformly distributed along the circumferential direction of the reaction chamber 400 of the MOCVD equipment, 8 raised triangular regions 440 are formed on the large plate 420 along the circumferential direction, the small plates 430 and the triangular regions 440 are alternately arranged, and for the scale 130 formed on the upper surface of the annular base 100, scales of 0 degree and 180 degree can respectively correspond to the central positions of the two small plates 430 arranged oppositely, even if the scales of positive integer multiples of 0 scale and 45 are in one-to-one correspondence with the central positions of the 8 small plates in the clockwise direction from small to large. In addition, the 8 raised triangular areas are uniformly distributed along the circumferential direction of the large disc, the shapes and the areas of the 8 triangular areas are the same, and a positioning mark (shown as 460 in fig. 6) is formed at the center position of one of the triangular areas, and the positioning mark can be used as a reference point to correspond to a certain fixed scale (such as 22.5 degrees) formed on the upper surface of the annular base so as to improve the positioning accuracy of the annular base; furthermore, an auxiliary positioning point may be formed on the large disc, the auxiliary positioning point and the positioning mark 460 are located in the same radial direction, and the positioning accuracy may be improved by using the auxiliary positioning point and the auxiliary positioning mark, for example, odd-numbered times of 22.5 degrees in the scales formed on the upper surface of the annular base may be in one-to-one correspondence with the center positions of the 8 triangular regions in the clockwise direction from small to large. In the actual measurement process, the fixed base is not moved, and the large disc stops automatically rotating, but in order to realize the measurement of the depth and the eccentricity of different areas, the large disc can be rotated by a fixed angle by stepping on the control pedal through a preset program, and the large disc can rotate 1/8 circles clockwise when the large disc control pedal is stepped on once.
According to another embodiment of the present invention, as shown in fig. 5, a fixing member 140 may be disposed on the outer peripheral wall of the annular base 100, and the fixing member 140 may be detachably connected to the outer peripheral wall of the MOCVD equipment reaction chamber 400, so that the relative fixing effect of the annular base and the MOCVD equipment reaction chamber may be further improved, and the problem of poor measurement accuracy and measurement accuracy due to unstable fixation of the annular base and the outer peripheral wall of the reaction chamber may be avoided. It should be noted that the number of the fixing members 140 in the present invention is not particularly limited, and those skilled in the art may select the number according to actual needs, for example, the number of the fixing members 140 may be 1 or more, wherein a plurality of fixing members 140 may be spaced apart or uniformly distributed on the outer circumferential wall of the annular base 100 along the circumferential direction thereof, and preferably, the number of the fixing members 140 may be 2 or 4, so that the structure of the annular base may be further simplified on the premise of ensuring that the annular base and the MOCVD apparatus reaction chamber have a better fixing effect.
According to another embodiment of the present invention, as shown in fig. 7, locks (locks) 450 are provided on the outer peripheral wall of the MOCVD equipment reaction chamber 400, each lock is further provided with a lock protection cover 470 connected to the lock in a matching manner, a metal buckle plate capable of being connected to the lock protection cover 470 in a matching manner can be provided on the outer peripheral wall of the annular base 100 as a fixing member 140, so that the metal buckle plate and the lock protection cover are fastened to realize fixing, that is, the relative fixing effect between the annular base and the MOCVD equipment reaction chamber is further improved by means of the self structure of the MOCVD equipment reaction chamber, wherein the metal buckle plate can be connected to the outer peripheral wall of the annular base 100 through a hinge 150, and the arrangement position of the metal buckle plate corresponds to the lock protection cover 470.
According to another embodiment of the present invention, referring to fig. 10, the inner surface of the second groove 120 may be provided with an elastic pad 160, and the second groove 120 may be sleeved on the upper end of the annular wall 410 of the MOCVD equipment reaction chamber 400 through the elastic pad 160. In addition, it should be noted that the material of the elastic pad 160 in the present invention is not particularly limited, and those skilled in the art can select the material as needed, as long as the elastic pad can satisfy the advantages of high temperature resistance, difficult deformation and slag dropping, and high cleanliness, and considering that the requirement of the reactor on cleanliness is high, the elastic pad may preferably be a fluororubber elastic pad, thereby effectively avoiding the negative effect of the use of the elastic pad on epitaxial growth.
According to yet another embodiment of the present invention, the ring base 100 may be a metal base, whereby the structural stability of the ring base may be further ensured. It should be noted that the material of the metal base is not particularly limited, and those skilled in the art may select the metal base according to actual needs as long as the metal base can satisfy the characteristics of high temperature resistance, difficult deformation, and high cleanliness, for example, the metal base may be formed by using stainless steel, aluminum alloy, and other materials, so as to further avoid the negative effect that the use of the annular base may bring to epitaxial growth.
Movable frame rod 200
According to an embodiment of the present invention, as will be understood with reference to fig. 8 to 10, the movable frame rod 200 includes a scale rod 210, a connecting rod 220 and a roller 230, the roller 230 is disposed in the second annular cavity 112, the connecting rod 220 is disposed in the first annular cavity 111, and both ends of the scale rod 210 are connected to the roller 230 through the connecting rod 220 and can rotate along the circumferential direction of the ring base 100 through the roller 230. The movable frame rod is connected with the measuring assembly, and the depth of each point in the same circumferential direction and the eccentricity of each point in the same circumferential direction can be measured by enabling the scale rod to rotate along the circumferential direction of the annular base; in addition, the scale on the scale rod can be combined with the scale on the annular base to position any position of the large plate so as to measure the depth data of any position of the large plate, and meanwhile, the consistency of the measuring position can be ensured according to the scale rod and each scale on the annular base, and the measuring precision is improved.
According to an embodiment of the present invention, the type of the roller 230 is not particularly limited, and may be selected by those skilled in the art according to actual needs, and preferably, the roller 230 may be a universal wheel, thereby facilitating 360 degree rotation of the scale bar.
According to still another embodiment of the present invention, as understood in conjunction with fig. 2 and 8, the total width L of the roller 230 and the connecting rod 2201May be greater than the width L of the first annular cavity 1112And is less than the width L of the second ring cavity 1123FromTherefore, the movable frame rod can be prevented from falling off in the using process. Further, the arrangement of the lower ends of the connecting rods 220 and the rollers 230 and the number of the connected rollers 230 are not particularly limited, and can be selected by those skilled in the art according to actual needs, for example, as shown in fig. 8 and 9, 4 rollers can be connected to the lower end of each connecting rod, 2 rollers can be disposed near the inner peripheral wall of the second ring cavity, and the other 2 rollers can be disposed near the outer peripheral wall of the second ring cavity.
According to another embodiment of the invention, in order to avoid that the position of the movable frame rod is difficult to keep unchanged due to the over flexibility of the roller during the measurement process, a latch (not shown) and a fixing portion (not shown) matched with the latch may be disposed on the connecting rod 220, such that one end of the latch is connected to the connecting rod 220 through a hinge (not shown), the fixing portion is disposed above the hinge and can be connected to the other end of the latch, and the latch can rotate through the hinge and be stopped against the bottom of the first groove, thus, when the movable frame rod is rotated, the lock catch can be rotated upwards and fixed on the connecting rod through the fixing part, the lock catch can rotate downwards and is stopped against the bottom of the first groove, and the movable support is fixed by friction between the lock catch and the bottom of the first groove, so that the accuracy and the reliability of a measuring result can be further ensured. It should be noted that the arrangement of the lock catch, the hinge and the fixing piece does not influence the rotation of the movable frame rod.
According to still another embodiment of the present invention, the scale bar 210 and the connecting bar 220 of the movable frame bar 200 may be metal bars, respectively, independently, thereby making the movable frame bar have good rigidity and strength, and further ensuring the accuracy and reliability of the measurement result. The material of the metal rod is not particularly limited, and those skilled in the art can select the metal rod according to actual needs as long as the metal rod can meet the characteristics of high temperature resistance, difficult deformation and high cleanliness, for example, the metal rod can be formed by stainless steel, aluminum alloy and other materials, so that the negative influence of the use of the movable frame rod on epitaxial growth can be further avoided.
Measuring assembly 300
According to the embodiment of the invention, as understood by referring to fig. 11 to 14, the measuring assembly 300 includes a micrometer 310 and a depth gauge 320, the micrometer 310 includes a micrometer dial 311 and a micrometer rod 312 connected to the micrometer dial 311, the depth gauge 320 includes a depth gauge rod 321 and a depth display screen 322 disposed on the depth gauge rod 321, the depth gauge rod 321 is provided with a first fixing assembly 330 and a second fixing assembly 340, the first fixing assembly 330 is connected to the scale rod 210, the depth gauge rod 321 can move up and down along the first fixing assembly 330 and can move horizontally along the scale rod 210 through the first fixing assembly 330, the micrometer 310 is connected to the second fixing assembly 340 through a horizontal fixing rod 350, the horizontal fixing rod 350 can move horizontally along the second fixing assembly 340, and the second fixing assembly 340 can move up and down along the depth gauge rod 321. In the measuring process, the relative positions of the depth gauge measuring rod and the scale rod can be ensured to be unchanged by utilizing the first fixing component, and the depth of each position in the same circumference and the eccentricity of each position in the same circumference can be measured by rotating the movable frame rod; or the movable frame rod is kept fixed, and the first fixing component is utilized to drive the depth ruler measuring rod to move along the scale rod, so that the depth and the eccentricity of different positions in the same radial direction are measured. In addition, when measuring eccentricity, the distance between the dial indicator and the inner wall of the reaction chamber or the edge of the large plate can be further controlled by combining the horizontal fixing rod, wherein scales can be marked on the horizontal fixing rod 350, so that the position of the dial indicator can be further accurately controlled.
According to an embodiment of the present invention, as understood in conjunction with fig. 13, the first fixing assembly 330 may include a first fixing block 331, a first fixing knob 333, and a second fixing knob 332, the graduated rod 210 may horizontally penetrate the first fixing block 331 through a graduated rod mounting hole 334 and adjust the fixing tightness of the first fixing block 331 and the graduated rod 210 through the first fixing knob 333, and the depth rod 321 may vertically penetrate the first fixing block 331 through a depth rod mounting hole 335 and adjust the fixing tightness of the first fixing block 331 and the depth rod 321 through the second fixing knob 332, thereby not only achieving the detachable connection of the measuring assembly and the movable frame rod, but also facilitating the measurement of the depths of different positions of the large plate.
According to still another embodiment of the present invention, as understood in conjunction with fig. 14, the second fixing assembly 340 may include a second fixing block 341 and a third fixing knob 342, the second fixing block 341 may be detachably connected to the depth gage rod 321, and the horizontal fixing rod 350 may horizontally penetrate through the second fixing block 341 through the horizontal fixing rod mounting hole 344 and adjust fixing tightness of the horizontal fixing rod 350 and the second fixing block 341 through the third fixing knob 342; further, the depth gauge rod 321 can vertically penetrate through the second fixing block 341 through another depth gauge rod mounting hole 345, and the fixing tightness between the second fixing block 341 and the depth gauge rod 321 is adjusted through the fourth fixing knob 343, so that the mounting and dismounting of the micrometer and the depth gauge can be more favorably realized.
According to another embodiment of the present invention, the connection manner of the horizontal fixing rod 350 and the dial indicator 310 is not particularly limited, and those skilled in the art can select the connection manner according to actual needs, for example, the horizontal fixing rod 350 may be fixedly connected to the dial indicator 310, or may be detachably connected to the dial indicator through the third fixing assembly 360 (as shown in fig. 12).
According to another embodiment of the present invention, the depth display screen 322 disposed on the depth scale rod 321 may further include an on/off key, a zero key, a battery compartment, and a unit conversion key, thereby facilitating accurate reading of depth values.
In summary, the measuring device for the reaction chamber of the MOCVD equipment according to the embodiment of the invention at least has the following advantages: 1. the measuring device is designed according to the self structure of the reaction cavity of the MOCVD equipment (G3 or G4 type), integrates eccentricity measurement and depth measurement, is easy to be fixedly connected with or detached from the MOCVD equipment through the second groove, and can be used for simultaneously measuring the depth and the eccentricity; 2. the measuring device is relatively fixed with the reaction cavity in the using process, the measuring component can horizontally move along the scale rod of the movable frame rod, and the movable frame rod can rotate 360 degrees along the annular base, so that not only can the depth data of any position in the reaction cavity be measured, but also the consistency of the measuring position can be ensured according to the scale rod and each scale on the annular base, and the measuring precision is higher; 3. can firmly fix the depth gauge and the micrometer on the movable hack lever through the fixed assembly, can stop the problem that the testing accuracy is difficult to guarantee because of manual fixation brings, can further improve measurement accuracy.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples and features of different embodiments or examples described in this specification can be combined and combined by one skilled in the art without contradiction.
Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention, and that variations, modifications, substitutions and alterations can be made to the above embodiments by those of ordinary skill in the art within the scope of the present invention.

Claims (10)

1. A measuring device for a reaction chamber of MOCVD equipment is characterized by comprising:
the MOCVD equipment reaction chamber comprises an annular base, wherein a first groove and a second groove are formed between the inner peripheral wall and the outer peripheral wall of the annular base and are circumferentially arranged along the annular base, the first groove and the second groove are vertically arranged, the opening of the first groove faces upwards, the opening of the second groove faces downwards, the first groove comprises a first annular cavity and a second annular cavity which are vertically arranged, the radius of the inner peripheral wall of the second annular cavity is smaller than that of the inner peripheral wall of the first annular cavity, the radius of the outer peripheral wall of the second annular cavity is larger than that of the outer peripheral wall of the first annular cavity, scales circumferentially distributed along the annular base are marked on the upper surface of the annular base in a region close to the inner peripheral wall and/or the outer peripheral wall of the annular base, and the annular base is suitable for being fixed at the upper end of the annular wall of the MOCVD equipment reaction chamber through the second groove;
the movable rack rod comprises a scale rod, a connecting rod and a roller, the roller is arranged in the second annular cavity, the connecting rod is arranged in the first annular cavity, and two ends of the scale rod are connected with the roller through the connecting rod and can rotate along the circumferential direction of the annular base through the roller;
the measuring assembly comprises a micrometer and a depth gauge, the micrometer comprises a micrometer dial and a micrometer measuring rod connected with the micrometer dial, the depth gauge comprises a depth gauge measuring rod and a depth display screen arranged on the depth gauge measuring rod, a first fixing assembly and a second fixing assembly are arranged on the depth gauge measuring rod, the first fixing assembly is connected with the graduated rod, the depth gauge measuring rod can be moved up and down along the first fixing assembly and can pass through the first fixing assembly, the graduated rod can move horizontally, the micrometer is connected with the second fixing assembly through a horizontal fixing rod, the horizontal fixing rod can be moved horizontally along the second fixing assembly, and the second fixing assembly can be moved up and down along the depth gauge measuring rod.
2. The measurement device for the MOCVD equipment reaction chamber of claim 1, wherein the first ring cavity, the second ring cavity and the second groove are coaxially arranged; and/or scales distributed along the circumferential direction of the annular base are marked on the upper surface of the annular base in the area close to the inner circumferential wall of the annular base.
3. The measurement device for the MOCVD equipment reaction chamber, according to claim 2, wherein central axes of the first annular cavity, the second annular cavity and the second groove coincide with a central plane between an inner circumferential wall and an outer circumferential wall of the annular base.
4. The measuring device for the MOCVD equipment reaction chamber according to claim 1, wherein the MOCVD equipment reaction chamber comprises a large disc and 8 small discs arranged on the large disc, the 8 small discs are uniformly distributed along the circumferential direction of the MOCVD equipment reaction chamber, 8 raised triangular areas are formed on the large disc along the circumferential direction of the large disc, the small discs and the triangular areas are alternately arranged, and in the scales formed on the upper surface of the annular base, scales of 0 degree and 180 degrees respectively correspond to the central positions of the two small discs which are oppositely arranged.
5. The measuring device for the reaction chamber of the MOCVD equipment as claimed in claim 1, wherein a fixing member is arranged on the outer peripheral wall of the annular base, and the fixing member is detachably connected with the outer peripheral wall of the reaction chamber of the MOCVD equipment.
6. The measurement device for be used for MOCVD equipment reaction chamber of claim 5, wherein, be equipped with the tool to lock on the periphery wall of MOCVD equipment reaction chamber, be equipped with the tool to lock safety cover rather than supporting continuous on the tool to lock, be equipped with on the annular base periphery wall with the tool to lock safety cover matches the metal buckle that links to each other, the metal buckle passes through the hinge and links to each other with annular base periphery wall.
7. The measuring device for the MOCVD equipment reaction chamber according to claim 1, wherein an elastic cushion is arranged on the inner surface of the second groove, and the second groove is arranged at the upper end of the annular wall of the MOCVD equipment reaction chamber through the elastic cushion.
8. The measuring device for the reaction chamber of the MOCVD equipment according to claim 1, wherein the annular base is a metal base, and the scale rod and the connecting rod of the movable frame rod are respectively and independently metal rods; and/or the presence of a gas in the gas,
the inner surface of the second groove is provided with a fluorine rubber elastic cushion, and the second groove is sleeved at the upper end of the annular wall of the MOCVD equipment reaction chamber through the elastic cushion.
9. The measurement device for the MOCVD equipment reaction chamber, according to claim 1, wherein the total width of the roller and the connecting rod is larger than the width of the first ring cavity and smaller than the width of the second ring cavity; and/or the presence of a gas in the gas,
the connecting rod is provided with a lock catch and a fixing part matched with the lock catch, one end of the lock catch is connected with the connecting rod through a hinge, the fixing part is arranged on the upper portion of the hinge and suitable for being connected with the other end of the lock catch, and the other end of the lock catch is suitable for rotating through the hinge and is connected with the fixing part or rotating through the hinge and is abutted to the bottom of the first groove.
10. The measuring device for the MOCVD equipment reaction chamber, according to claim 1, wherein the first fixing assembly comprises a first fixing block, a first fixing knob and a second fixing knob, the graduated rod horizontally penetrates through the first fixing block and the fixing tightness of the first fixing block and the graduated rod is adjusted through the first fixing knob, and the depth scale measuring rod vertically penetrates through the first fixing block and the fixing tightness of the first fixing block and the depth scale measuring rod is adjusted through the second fixing knob; and/or the presence of a gas in the gas,
the second fixing assembly comprises a second fixing block and a third fixing knob, the second fixing block is detachably connected with the depth gauge measuring rod, the horizontal fixing rod horizontally penetrates through the second fixing block, and the fixing tightness of the horizontal fixing rod and the second fixing block is adjusted through the third fixing knob; and/or the presence of a gas in the gas,
scales are marked on the horizontal fixing rod.
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