CN113253574B - Optical device, exposure device, and method for manufacturing article - Google Patents
Optical device, exposure device, and method for manufacturing article Download PDFInfo
- Publication number
- CN113253574B CN113253574B CN202110176119.4A CN202110176119A CN113253574B CN 113253574 B CN113253574 B CN 113253574B CN 202110176119 A CN202110176119 A CN 202110176119A CN 113253574 B CN113253574 B CN 113253574B
- Authority
- CN
- China
- Prior art keywords
- flow path
- wall
- lens barrel
- optical
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 182
- 238000000034 method Methods 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 239000000758 substrate Substances 0.000 claims description 9
- 230000004308 accommodation Effects 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 3
- 238000012546 transfer Methods 0.000 claims description 3
- 230000001276 controlling effect Effects 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lens Barrels (AREA)
- Cameras Adapted For Combination With Other Photographic Or Optical Apparatuses (AREA)
Abstract
The present invention relates to an optical device, an exposure device, and a method for manufacturing an article. In order to provide an optical device which suppresses variation in optical performance, improves rigidity of a lens barrel, and is compact, the optical device of the present invention is characterized by comprising: an optical element (104 a, 104 b); and a lens barrel (107) having an outer wall (201), an inner wall (204), and a rib (202) provided between the outer wall (201) and the inner wall (204) and coupled to at least one of the outer wall (201) and the inner wall (204), the lens barrel being configured to house the optical elements (104 a, 104 b), wherein a flow path (L) for a gas supplied from the gas supply member (205) is defined between the outer wall (201) and the inner wall (204) in the lens barrel (107), and an optical element housing space (S) for housing the optical elements (104 a, 104 b) is defined inside the inner wall (204), and the gas passes through the flow path (L) and the optical element housing space (S).
Description
Technical Field
The present invention relates to an optical device, an exposure device, and a method for manufacturing an article.
Background
In the related art, it is known that in an optical device, an optical element absorbs a part of light and generates heat, and the refractive index of gas around the optical element changes with temperature, so that there is a possibility that the optical performance may change.
In addition, it is also known that the optical performance may be changed due to deformation of a lens barrel in which the optical element is housed by ambient heat or vibration of the optical element accompanying vibration generated outside or inside the device.
Japanese patent application laid-open No. 2015-95503 discloses an exposure apparatus as follows: a temperature-adjusting gas is supplied into a lens barrel in which an optical element is housed, and a rib structure is provided on a wall surface of the lens barrel, whereby variation in optical performance is suppressed, and rigidity of the lens barrel is improved.
As disclosed in japanese patent application laid-open No. 2015-95503, if a flow path and a rib structure of a temperature-adjusting gas are provided in a lens barrel, respectively, in order to suppress a change in optical performance and to improve rigidity of the lens barrel, an increase in size of the apparatus is caused.
Disclosure of Invention
Accordingly, an object of the present invention is to provide an optical device that suppresses variation in optical performance, improves rigidity of a lens barrel, and is compact.
The optical device of the present invention is characterized by comprising: an optical element; and a lens barrel having an outer wall, an inner wall, and a rib provided between the outer wall and the inner wall and coupled to at least one of the outer wall and the inner wall, the lens barrel being configured to house the optical element, a flow path of the gas supplied from the gas supply member being defined between the outer wall and the inner wall in the lens barrel, and an optical element housing space housing the optical element being defined inside the inner wall, the gas passing through the flow path and the optical element housing space.
Drawings
Fig. 1 is a schematic side view of an exposure apparatus provided with an optical apparatus of a first embodiment.
Fig. 2 is a partial cross-sectional view of the exposure apparatus including the optical apparatus according to the first embodiment, as viewed from above.
Fig. 3 is a partial cross-sectional view of an exposure apparatus including an optical apparatus according to a second embodiment, as viewed from above.
Fig. 4 is a partial cross-sectional view of an exposure apparatus including an optical apparatus according to a third embodiment, as viewed from above.
Fig. 5 is a partial cross-sectional view of an exposure apparatus including an optical apparatus according to the fourth embodiment, as viewed from above.
Detailed Description
The optical device according to the present embodiment is described in detail below with reference to the accompanying drawings. In order to make it easy to understand the present embodiment, drawings shown below are drawn to a scale different from the actual scale.
The present embodiment is not limited to the following embodiments, but a specific example advantageous for implementation of the present embodiment is shown below.
In addition, not all combinations of features described in the following embodiments are necessary to solve the problems of the present embodiment.
Conventionally, as a problem of high definition of an exposure apparatus, a change in a pattern image due to a temperature change has been known. Specifically, when the exposure process is performed for a long period of time, the optical element absorbs a part of the exposure light, and the temperature of the optical element, the optical element holding member, and the surrounding space increases.
In addition, the refractive index of the surrounding gas changes with this temperature rise, and the pattern image formed on the substrate is deformed.
In order to suppress such deformation of the pattern image, it is required to uniformly generate heat in the optical element and suppress the temperature change of the surrounding gas.
Therefore, in the exposure apparatus, the temperature-adjusted gas is supplied to the lens barrel accommodating the optical element, thereby suppressing the temperature change of the optical element and the gas in the light path of the exposure.
In addition, since a pattern image formed on a substrate is deformed due to thermal deformation of the lens barrel itself, it is also required to suppress temperature variation of the lens barrel.
Therefore, in the exposure apparatus, the rigidity of the lens barrel is also improved by providing a rib structure on the wall surface of the lens barrel.
Further, by providing a heat insulating material between each rib structure provided on the wall surface of the lens barrel, absorption of heat from the outside of the lens barrel is suppressed, thereby suppressing thermal deformation of the lens barrel.
As another problem of high definition of an exposure apparatus, a change in a pattern image due to an influence of vibration generated outside or inside the exposure apparatus is also known.
Specifically, if the optical element vibrates with vibration generated outside or inside the exposure apparatus due to some reasons, the pattern image changes.
Therefore, in the exposure apparatus, rigidity is improved by improving a fixing method of the optical element to the lens barrel, or thickening a wall of the lens barrel, or providing a plurality of ribs.
As described above, in order to suppress temperature changes of the optical element in the barrel, the gas in the optical path space, and the barrel itself, in the high definition of the exposure apparatus, the temperature-adjusted gas is supplied to the barrel in which the optical element is housed.
In addition, in order to suppress the influence of vibration generated outside or inside the exposure apparatus, the rigidity of the lens barrel is improved.
However, if the walls of the lens barrel are thickened or the number of ribs is increased in order to increase the rigidity of the lens barrel, the space for providing an air-conditioning air supply port and duct in the lens barrel is insufficient, and it is difficult to achieve both temperature adjustment and rigidity of the lens barrel.
Therefore, in the optical device of the present embodiment, by adopting the following configuration, the rigidity of the lens barrel is ensured, and the temperature change of the optical element in the lens barrel, the gas in the optical path space, and the lens barrel itself is suppressed, while achieving miniaturization. In particular, this embodiment is effective for an exposure apparatus in which the space between the projection optical system and the board mount is small.
First embodiment
Fig. 1 shows a schematic side view of an exposure apparatus 100 including an optical apparatus according to a first embodiment.
In the following description, the vertical direction perpendicular to the light sensing surface of the glass plate 105 is referred to as the Z direction, and two directions perpendicular to each other in the light sensing surface of the glass plate 105 are referred to as the X direction and the Y direction, respectively.
The exposure apparatus 100 is an apparatus for transferring a pattern of a master (reticle or mask) to a photosensitive substrate (a wafer, a glass plate, or the like having a resist layer formed on a surface thereof) via a projection optical system in a photolithography process, which is a process for manufacturing a semiconductor device, a liquid crystal display device, or the like.
Further, in semiconductor devices, liquid crystal display devices, and the like, miniaturization of line widths is demanded, and high definition is also demanded for exposure devices for manufacturing the same.
The exposure apparatus 100 includes an illumination optical system 101, a mask stage 103, optical elements 104a and 104b (1 st optical element and 2 nd optical element) as projection optical systems, and a board stage 106.
In the exposure apparatus 100, exposure light is irradiated from an illumination optical system 101 having a light source to a mask 102 held by a mask stage 103.
The light having passed through the mask 102 after exposure was reflected 5 times in total by the optical element 104b as a trapezoidal mirror, the optical element 104a as a concave mirror, the convex mirror, the optical element 104a, and the optical element 104b, which are not shown, and then reached the glass plate 105.
In this way, the image of the pattern formed on the mask 102 is projected (transferred) onto the sensitizer applied to the glass plate 105 via the optical elements 104a and 104b, and the glass plate 105 is held by the plate mount 106.
In the exposure apparatus 100, the mask stage 103 on which the mask 102 is placed and the board stage 106 on which the glass plate 105 is placed are scanned in synchronization with each other in the Y direction.
As shown in fig. 1, optical elements 104a and 104b as projection optical systems are housed in a lens barrel 107.
The optical device of the present embodiment includes an optical element including optical elements 104a and 104b and a lens barrel 107.
Fig. 2 is a partial cross-sectional view of the exposure apparatus 100 including the optical apparatus according to the present embodiment, as viewed from above.
As shown in fig. 2, in the optical device of the present embodiment, in order to control the temperature environment of the optical elements 104a and 104b, the gas adjusted to an appropriate temperature and humidity is supplied from the air conditioner 205 (gas supply means) in order to control the temperature environment of the gas inside the lens barrel 107.
In addition, as shown in fig. 2, in the optical device of the present embodiment, the lens barrel 107 includes an outer wall 201, an inner wall 204, and ribs 202 bonded to the outer wall 201 and the inner wall 204 for reinforcing rigidity of the lens barrel 107.
The rib 202 is formed with an opening for passing the air supplied from the air conditioner 205. The rib 202 may be bonded (fixed or connected) to at least one of the outer wall 201 and the inner wall 204.
In the XY section, a closed space is defined by both X-direction side surfaces of the outer wall 201, the rib 202, and the inner wall 204 as a flow path L of the gas supplied from the air conditioner 205. In other words, in the optical device of the present embodiment, the flow path L of the gas supplied from the air conditioner 205 is defined between the outer wall 201 and the inner wall 204.
As shown in fig. 2, in the optical device of the present embodiment, the flow path L extends in the Y direction and is provided on both sides with the optical elements 104a and 104b interposed therebetween in an XY section perpendicular to the Z direction.
In the XY section, a space S (optical element accommodation space) in which the optical elements 104a and 104b as the projection optical system are accommodated is defined by both end surfaces in the Y direction of the outer wall 201 and the inner wall 204.
In other words, in the optical device of the present embodiment, the space S for accommodating the optical elements 104a and 104b is defined inside the inner wall 204.
As shown in fig. 2, a temperature sensor 206 is provided in the flow path L defined by the outer wall 201, the rib 202, and the inner wall 204.
Based on the detection result of the temperature sensor 206, the gas whose temperature has been adjusted by the air conditioner 205 is supplied from the gas supply port 108 to the flow path L via the gas supply pipe 207 (supply flow path) so that the gas passing through the flow path L has a predetermined temperature.
After passing through the openings formed in the ribs 202, the gas supplied to the flow path L reaches the blowout port 208 facing the space S in which the optical elements 104a and 104b are housed. In the case where the rib 202 is joined to one of the outer wall 201 and the inner wall 204, the gas supplied to the flow path L can pass through the space on the other side of the rib 202.
Here, the blow-out port 208 uses a net or a punched metal for suppressing the distribution of wind speed.
The temperature of the gas in the space S and the temperature of the optical elements 104a and 104b are adjusted by the gas supplied to the space S through the blowout port 208 that communicates the flow path L and the space S. Thereafter, the gas is discharged from the exhaust port 109 and is collected by the air conditioner 205 through the exhaust duct 209 (exhaust flow path).
The blowout port 208 may be provided with a louver that allows the gas to flow in the direction of travel of the gas, such as toward the optical elements 104a and 104b and toward the optical path between the optical elements 104a and 104 b.
As shown in fig. 2, in the optical device of the present embodiment, the air outlet 208 is provided between the optical element 104a and the optical element 104b in the Y direction perpendicular to the Z direction and the X direction perpendicular to the air outlet 208, respectively. That is, the blowout port 208 is provided between the optical element 104a and the optical element 104b in the Y direction in which the flow path L extends.
Then, the recovered gas is adjusted to an appropriate temperature in the air conditioner 205, and then supplied again to the lens barrel 107.
As described above, in the optical device of the present embodiment, the gas is circulated in a closed state so that the temperature in the lens barrel 107 is adjusted by the air conditioner 205.
Here, the amount of heat exchange between the gas supplied from the air conditioner 205 and the cylinder 107 depends on the surface area of the flow path L, and therefore the flow path L may be designed according to the temperature of the cylinder 107 to be assumed.
As described above, in the optical device of the present embodiment, the space for providing the rib 202 and the inner wall 204 in the lens barrel 107 and the space for the flow path L of the gas supplied from the air conditioner 205 to the lens barrel 107 can be used as a common space.
This ensures rigidity of the lens barrel 107, and allows temperature adjustment of the optical elements 104a and 104b in the lens barrel 107 and the gas in the space S accommodating them, while achieving downsizing of the lens barrel 107.
As described above, in the exposure apparatus 100 including the optical apparatus according to the present embodiment, thermal deformation occurs in the lens barrel 107 with an increase in temperature of exposure processing, and thus, it is required to suppress a temperature change of the lens barrel 107 because of a change in optical performance.
Therefore, in the exposure apparatus 100 including the optical apparatus of the present embodiment, the gas supplied from the air conditioner 205 passes through the flow path L defined by the outer wall 201, the ribs 202, and the inner wall 204 of the lens barrel 107, and heat exchange is performed between the lens barrel 107 and the supplied gas.
At this time, the heat of the lens barrel 107 accumulated by the exposure process is transferred to the supply gas, so that the temperature rise of the lens barrel 107 can be suppressed.
Thus, the exposure apparatus 100 can be provided, which can suppress the change in optical performance and has high stability even when heat is generated by the exposure process.
At this time, the temperature of the gas supplied from the air conditioner 205 increases by receiving heat from the lens barrel 107.
Accordingly, the gas having the temperature rise is collected by the air conditioner 205, and therefore, the output of the heater of the air conditioner 205 can be suppressed, and the power consumption of the air conditioner 205 can be suppressed.
As described above, in the optical device of the present embodiment, the gas supplied from the air conditioner 205 to the lens barrel 107 via the gas supply port 108 passes through the flow path L defined by the outer wall 201, the ribs 202 having the openings formed therein, and the inner wall 204 in the lens barrel 107. After that, the air flows into the space S from the air outlet 208, passes through the space S, and is discharged from the air outlet 109, and is collected by the air conditioner 205.
Thereby, the rigidity of the lens barrel 107 is ensured using the rib 202 and the inner wall 204, and the temperature variation of the optical elements 104a and 104b in the lens barrel 107, the gas in the optical path space, and the lens barrel 107 itself is suppressed, while achieving miniaturization of the optical device.
In the optical device of the present embodiment, the air outlet 208 is provided on each of the X-direction sides of the space S of the lens barrel 107, and the air outlet 109 is provided at one end in the Y-direction, but the positions and the number of the air outlet 208 and the air outlet 109 are not limited thereto. In particular, the positions of the air outlet 208 and the air outlet 109 vary according to the shape of the lens barrel 107 and the arrangement of the optical elements 104a and 104 b.
In the optical device of the present embodiment, the air supply port 108 is provided so that the flow path L and the air supply duct 207 communicate with each other, while the air discharge port 109 is provided so that the space S and the air discharge duct 209 communicate with each other, but the present invention is not limited thereto.
That is, the air supply port 108 may be provided so that the space S and the air supply duct 207 communicate with each other, while the air discharge port 109 may be provided so that the flow path L and the air discharge duct 209 communicate with each other.
The gas supplied from the air conditioner 205 to the lens barrel 107 via the gas supply port 108 may flow into the flow path L from the gas outlet 208 after passing through the space S, and may be discharged from the gas outlet 109 after passing through the flow path L.
Second embodiment
Fig. 3 shows a partial cross-sectional view of an exposure apparatus 200 including an optical apparatus according to the second embodiment, as viewed from above.
The optical device of the present embodiment has the same configuration as that of the optical device of the first embodiment except for the structure of the lens barrel 107, and therefore, the same members are given the same reference numerals, and the description thereof is omitted.
As described in the first embodiment, the gas supplied from the air conditioner 205 passes through the flow path L defined by the outer wall 201, the ribs 202, and the inner wall 204 of the column 107, and thus heat exchange is performed between the column 107 and the supplied gas.
At this time, the larger the surface area of the cylinder 107 in contact with the supplied gas, the larger the amount of heat exchange between the cylinder 107 and the supplied gas.
Therefore, in the optical device of the present embodiment, the lens barrel 107 is designed such that the surface area of the lens barrel 107 in contact with the supplied gas is increased, that is, the flow path L is lengthened.
Specifically, as shown in fig. 3, the 1 st rib 202a and the 2 nd rib 202b, which form openings at different positions, are arranged between the outer wall 201 and the inner wall 204 in such a manner as to be alternately arranged along the Y direction.
In other words, in the optical device of the present embodiment, the 1 st rib 202a and the 2 nd rib 202b, which are formed with openings at mutually different positions in the X direction perpendicular to the flow path L in the XY cross section perpendicular to the vertical direction, are alternately arranged along the flow path L. Thus, the gas supplied to the flow path L meanders and flows in the flow path L.
In the optical device of the present embodiment, the 1 st rib 202a is formed with an opening at the center in the X direction, while the 2 nd rib 202b is formed with an opening at the end portion on the side of the X-direction inner wall 204, but the present invention is not limited thereto.
As described above, in the optical device of the present embodiment, the gas supplied from the air conditioner 205 to the lens barrel 107 passes through the flow path L defined by the outer wall 201, the 1 st and 2 nd ribs 202a and 202b formed with openings, and the inner wall 204 in the lens barrel 107. Then, the gas flows into the space S from the blowout port 208, passes through the space S, and is discharged from the exhaust port 109, and is collected by the air conditioner 205.
Thereby, the 1 st rib 202a, the 2 nd rib 202b, and the inner wall 204 are used to secure rigidity of the lens barrel 107, and to suppress temperature variations of the optical elements 104a and 104b in the lens barrel 107, the gas in the optical path space, and the lens barrel 107 itself, while achieving miniaturization of the optical device.
In the optical device of the present embodiment, the flow path L is lengthened so that the supply gas meanders in the XY section by designing the lens barrel 107, specifically, the flow path L as described above. Therefore, the surface area of the lens barrel 107 in contact with the supplied gas can be increased.
This increases the amount of heat exchange between the lens barrel 107 and the supplied gas, and can suppress the temperature rise of the lens barrel 107 more efficiently.
In addition, the amount of heat exchange between the lens barrel 107 and the supplied gas increases, and the output of the heater of the air conditioner 205, that is, the power consumption of the air conditioner 205 can be further suppressed.
Third embodiment
Fig. 4 is a partial cross-sectional view of an exposure apparatus 300 including an optical apparatus according to the third embodiment, as viewed from above.
The optical device of the present embodiment has the same configuration as that of the optical device of the first embodiment except that the control unit 305 is provided and the structure of the lens barrel 107 is different, and therefore the same members are given the same reference numerals and the description thereof is omitted.
As shown in fig. 4, in the optical device of the present embodiment, the flow path defined by the outer wall 201, the rib 202, and the inner wall 204 is divided by the dividing member 308. Thus, a relatively long (large surface area) flow path L1 (No. 1 flow path) and a relatively short (small surface area) flow path L2 (No. 2 flow path) are provided.
Further, switching valves 301 and 302 (switching means) are provided at the merging point of the flow paths L1 and L2, that is, at both ends in the Y direction of the dividing member 308, respectively.
At this time, when the temperature of the lens barrel 107 is greatly increased, specifically, at a predetermined temperature or higher, the control unit 305 controls the switching valves 301 and 302 so that the gas supplied from the air conditioner 205 passes through the flow path L1.
On the other hand, when the temperature of the lens barrel 107 does not rise significantly, specifically, is smaller than the predetermined temperature, the control unit 305 controls the switching valves 301 and 302 so that the gas supplied from the air conditioner 205 passes through the flow path L2.
Here, in the optical device of the present embodiment, a temperature sensor 306 is provided for measuring the temperature of the lens barrel 107.
That is, in the optical device of the present embodiment, the dividing member 308 is provided to divide the flow path into the flow path L1 and the flow path L2 having different lengths.
Further, switching valves 301 and 302 for switching the flow paths so that the gas travels in one of the flow paths L1 and L2 are provided at the junction between the flow paths L1 and L2.
In addition, the control section 305 controls the switching valves 301 and 302 based on the detection result of the temperature sensor 306 for detecting the temperature of the lens barrel 107.
At this time, when the supply gas is caused to pass through the flow path L1, a large pressure loss occurs in the flow path L1, and therefore, it is necessary to increase the output of the fan in the air conditioner 205.
On the other hand, in the flow path L1, the surface area of the cylinder 107 in contact with the supply gas is larger than that in the flow path L2, so that the amount of heat exchange between the cylinder 107 and the supply gas is increased, and the temperature rise of the cylinder 107 can be suppressed more efficiently.
As described above, in the optical device of the present embodiment, the gas supplied from the air conditioner 205 to the lens barrel 107 via the gas supply port 108 passes through the flow path L1 or L2 defined by the outer wall 201, the rib 202 having the opening formed therein, and the inner wall 204 in the lens barrel 107. Then, the gas flows into the space S from the blowout port 208, passes through the space S, and is discharged from the exhaust port 109, and is collected by the air conditioner 205.
Thereby, the rigidity of the lens barrel 107 is ensured using the rib 202 and the inner wall 204, and the temperature variation of the optical elements 104a and 104b in the lens barrel 107, the gas in the optical path space, and the lens barrel 107 itself is suppressed, while achieving miniaturization of the optical device.
In the optical device of the present embodiment, by switching the flow paths L1 and L2 having different lengths provided by the dividing member 308 according to the temperature of the lens barrel 107, the temperature rise of the lens barrel 107 can be suppressed more efficiently.
In the optical device of the present embodiment, the flow path is switched according to the temperature of the lens barrel 107, but the present invention is not limited thereto. For example, in the case where the temperature of the lens barrel 107 can be estimated from the operation time of the optical device, the flow path may be switched when a predetermined time elapses from the operation time of the lens barrel 107.
In the optical device of the present embodiment, the flow path defined by the outer wall 201, the rib 202, and the inner wall 204 is divided into two flow paths L1 and L2, but the present invention is not limited thereto, and may be divided into three or more flow paths.
In the optical device of the present embodiment, the switching valves 301 and 302 are provided at the Y-direction both ends of the dividing member 308, respectively, but the present invention is not limited thereto, and three or more joining points may be provided, and the switching valves may be provided, respectively.
Fourth embodiment
Fig. 5 shows a partial cross-sectional view of an exposure apparatus 400 including an optical apparatus according to the fourth embodiment, as viewed from above.
The optical device of the present embodiment has the same configuration as that of the optical device of the first embodiment except for the structure of the lens barrel 107, and therefore, the same members are given the same reference numerals, and the description thereof is omitted.
As shown in fig. 5, the air conditioner 205 includes a cooler 402, a heater 403, and a fan 404.
In the air conditioner 205, the gas is first cooled to a predetermined temperature in the cooler 402, then heated to a predetermined temperature by the heater 403, and supplied to the lens barrel 107 by the fan 404.
In the optical device of the present embodiment, the air supplied from the air conditioner 205 to the lens barrel 107 and the air discharged from the air conditioner 205 of the lens barrel 107 can exchange heat with each other.
Specifically, as shown in fig. 5, a space S' (space for heat exchange) for heat exchange is newly provided between the space S accommodating the optical elements 104a and 104b and the exhaust port 109.
Further, heat exchange walls 401 (heat exchange walls) are provided on both sides of the space S' in the X direction. A flow path forming member 408 is provided in the center of the space S 'so that the gas flowing into the space S' is easily brought into contact with the heat exchange wall 401.
As described above, heat exchange is performed between the gas supplied from the air conditioner 205, the lens barrel 107, and the optical elements 104a and 104 b.
Therefore, the heat of the lens barrel 107 and the optical elements 104a and 104b accumulated by the exposure process is transferred to the supplied gas, and the temperature of the gas discharged from the lens barrel 107 increases.
That is, in the optical device of the present embodiment, the temperature of the gas discharged from the lens barrel 107 is higher than the temperature of the gas supplied to the lens barrel 107, and therefore, heat is transferred from the gas discharged from the lens barrel 107 to the gas supplied to the lens barrel 107 via the wall 401 for heat exchange.
This can suppress an increase in temperature of the gas supplied to the lens barrel 107, and thus can suppress an output of the heater 403 provided in the air conditioner 205.
Further, since the temperature of the gas discharged from the lens barrel 107 is reduced, the output of the cooler 402 provided in the air conditioner 205 can be suppressed.
Therefore, in the optical device of the present embodiment, the power consumption of the air conditioner 205 can be reduced.
As described above, in the optical device of the present embodiment, the gas supplied from the air conditioner 205 to the lens barrel 107 via the gas supply port 108 passes through the flow path L defined by the outer wall 201, the ribs 202 having the openings formed therein, and the inner wall 204 in the lens barrel 107. Then, the air is sent from the air outlet 208 to the space S, passes through the spaces S and S', and is discharged from the air outlet 109, and is collected by the air conditioner 205.
Thereby, the rigidity of the lens barrel 107 is ensured using the rib 202 and the inner wall 204, and the temperature variation of the optical elements 104a and 104b in the lens barrel 107, the gas in the optical path space, and the lens barrel 107 itself is suppressed, while achieving miniaturization of the optical device.
In the optical device of the present embodiment, a space S 'for heat exchange is provided between the space S and the exhaust port 109, and a wall 401 for heat exchange is provided in which the amount of heat exchange between the gas in the space S' and the gas in the flow path L is larger than that of the inner wall 204. That is, the wall 401 for heat exchange, which is a part of the inner wall 204, has higher heat transfer performance than other parts of the inner wall 204.
This suppresses the output of the heater 403 and the cooler 402 provided in the air conditioner 205, and reduces the power consumption of the air conditioner 205.
In the optical device of the present embodiment, the heat sink may be provided on the wall 401 for heat exchange so as to promote heat exchange, or the surface may have a concave-convex shape.
In the optical device of the present embodiment, the space S' for heat exchange is provided, and heat exchange is performed between the gas discharged from the lens barrel 107 and the gas supplied to the lens barrel 107 by the wall 401 for heat exchange, but the present invention is not limited thereto. For example, the gas supply pipe 207 outside the column 107 may be in thermal contact with the gas exhaust pipe 209, so that heat exchange between the gas discharged from the column 107 and the gas supplied to the column 107 may be performed.
According to the present invention, it is possible to provide an optical device which suppresses variation in optical performance, improves rigidity of a lens barrel, and is compact.
The preferred embodiments have been described above, but the present invention is not limited to these embodiments, and various modifications and changes can be made within the scope of the gist thereof.
[ method for producing article ]
Next, a method for manufacturing an article using an exposure apparatus including the optical apparatus according to any one of the first to fourth embodiments will be described.
The article is a semiconductor device, a display device, a color filter, an optical component, MEMS, or the like.
For example, a semiconductor device is manufactured through a pre-process for manufacturing a circuit pattern on a wafer and a post-process for completing a circuit chip manufactured in the pre-process as a product, including a processing process.
The previous working procedure comprises the following steps: an exposure step of exposing the wafer coated with the sensitizer using an exposure device including the optical device according to any one of the first to fourth embodiments; and a developing step of developing the photosensitive agent.
An etching process, an ion implantation process, and the like are performed using the developed pattern of the photosensitive agent as a mask, thereby forming a circuit pattern on the wafer.
These steps of exposure, development, etching, and the like are repeated to form a circuit pattern including a plurality of layers on the wafer.
In the subsequent step, the wafer on which the circuit pattern is formed is diced, and the mounting, bonding, and inspection steps of the chip are performed.
The display device is manufactured through a process of forming a transparent electrode. The step of forming the transparent electrode includes the steps of: coating a sensitizer on the glass wafer on which the transparent conductive film is evaporated; and exposing the glass wafer coated with the sensitizer using an exposure device provided with the optical device according to any one of the first to fourth embodiments. The step of forming the transparent electrode includes a step of developing the exposed photosensitive agent.
According to the method for manufacturing an article of the present embodiment, an article of higher quality and higher productivity than in the past can be manufactured.
Claims (12)
1. An optical device is provided with:
an optical element; and
a lens barrel having an outer wall, an inner wall, and a rib provided between the outer wall and the inner wall and coupled to at least one of the outer wall and the inner wall, the lens barrel for accommodating the optical element,
in the lens barrel, a flow path of the gas supplied from the gas supply member is defined between the outer wall and the inner wall, and an optical element housing space housing the optical element is defined inside the inner wall,
the gas passes through the flow path and the optical element housing space.
2. An optical device as claimed in claim 1, wherein,
the ribs are formed with openings for the passage of the gas.
3. An optical device as claimed in claim 2, wherein,
the opening is arranged in the flow path so that the gas flows in a meandering manner.
4. An optical device as claimed in claim 2, wherein,
the flow path is provided with a dividing member for dividing the flow path into a 1 st flow path and a 2 nd flow path having different lengths,
a switching member for switching a flow path so that the gas travels in one of the 1 st flow path and the 2 nd flow path is provided at a point where the 1 st flow path and the 2 nd flow path merge,
the optical device includes a temperature sensor for detecting the temperature of the lens barrel, and a control unit for controlling the switching member based on the detection result of the temperature sensor.
5. An optical device as claimed in claim 2, wherein,
the lens barrel has a space for heat exchange provided between the optical element accommodation space and the air outlet,
the gas supplied to the lens barrel is discharged from the gas outlet after passing through the flow path, the optical element housing space, and the heat exchanging space in this order,
a part of the inner wall defining the flow path defines a part of the space for heat exchange,
this portion of the inner wall has a higher heat transfer performance than the other portion of the inner wall.
6. An optical device as claimed in claim 1, wherein,
the lens barrel is provided with an air supply port for communicating one of the flow path and the optical element accommodation space with a supply flow path from the air supply member, and an air discharge port for communicating the other of the flow path and the optical element accommodation space with an exhaust flow path to the air supply member,
the inner wall is provided with a blowout port that communicates the flow path and the optical element housing space with each other.
7. The optical device of claim 6, wherein the optical device comprises a lens,
the air outlet is provided between the 1 st optical element and the 2 nd optical element in the direction in which the flow path extends.
8. An optical device as claimed in claim 1, wherein,
the flow path is provided on both sides with the optical element therebetween in a cross section perpendicular to the vertical direction.
9. An optical device as claimed in claim 1, wherein,
the gas supply member is an air conditioner.
10. An exposure apparatus for exposing a substrate to light to transfer a pattern drawn on an original plate to the substrate, characterized in that,
the exposure apparatus includes the optical apparatus according to any one of claims 1 to 9, wherein the optical apparatus is configured to house a projection optical system configured to project an image of the pattern drawn on the master onto the substrate.
11. The exposure apparatus according to claim 10, wherein,
the exposure device includes:
a temperature sensor provided in the lens barrel of the optical device, for detecting a temperature of the gas supplied from the gas supply member; and
the gas supply means supplies the temperature-regulated gas to the optical device based on a detection result of the temperature sensor.
12. A method for manufacturing an article, characterized in that,
the method for manufacturing the article comprises the following steps:
exposing the substrate using the exposure apparatus according to claim 10;
developing the exposed substrate; and
and processing the developed substrate to obtain an article.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020-021537 | 2020-02-12 | ||
| JP2020021537A JP7366789B2 (en) | 2020-02-12 | 2020-02-12 | Optical device, exposure device, and article manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113253574A CN113253574A (en) | 2021-08-13 |
| CN113253574B true CN113253574B (en) | 2024-01-16 |
Family
ID=77180989
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110176119.4A Active CN113253574B (en) | 2020-02-12 | 2021-02-07 | Optical device, exposure device, and method for manufacturing article |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7366789B2 (en) |
| KR (1) | KR20210102839A (en) |
| CN (1) | CN113253574B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001244178A (en) * | 2000-02-29 | 2001-09-07 | Canon Inc | Aligner and method of exposure, and method of manufacturing device |
| JP2001284215A (en) * | 2000-03-30 | 2001-10-12 | Canon Inc | Exposure system, method of manufacturing device, and maintenance method for semiconductor manufacturing plant and exposure system |
| JP2016161923A (en) * | 2015-03-05 | 2016-09-05 | キヤノン株式会社 | Exposure device, and method for manufacturing article |
| CN109634064A (en) * | 2017-10-06 | 2019-04-16 | 佳能株式会社 | Exposure device and article manufacturing method |
| JP2019186871A (en) * | 2018-04-17 | 2019-10-24 | キヤノン株式会社 | Cooling device and imaging apparatus equipped with the same |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002005586A (en) | 2000-06-23 | 2002-01-09 | Canon Inc | Heat exchanger for regulating temperature of object, projection lens manufactured using it, and apparatus comprising optical system using it |
| JP2003163157A (en) | 2001-11-28 | 2003-06-06 | Nikon Corp | Gas supplying method and apparatus, lens-barrel, optical apparatus, exposure apparatus and method thereof |
| JP2005183624A (en) | 2003-12-18 | 2005-07-07 | Nikon Corp | Lens barrel, aligner and method of manufacturing device |
| JP6335480B2 (en) | 2013-11-11 | 2018-05-30 | キヤノン株式会社 | Exposure apparatus and device manufacturing method |
-
2020
- 2020-02-12 JP JP2020021537A patent/JP7366789B2/en active Active
-
2021
- 2021-01-22 KR KR1020210009098A patent/KR20210102839A/en not_active Application Discontinuation
- 2021-02-07 CN CN202110176119.4A patent/CN113253574B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001244178A (en) * | 2000-02-29 | 2001-09-07 | Canon Inc | Aligner and method of exposure, and method of manufacturing device |
| JP2001284215A (en) * | 2000-03-30 | 2001-10-12 | Canon Inc | Exposure system, method of manufacturing device, and maintenance method for semiconductor manufacturing plant and exposure system |
| JP2016161923A (en) * | 2015-03-05 | 2016-09-05 | キヤノン株式会社 | Exposure device, and method for manufacturing article |
| CN109634064A (en) * | 2017-10-06 | 2019-04-16 | 佳能株式会社 | Exposure device and article manufacturing method |
| JP2019186871A (en) * | 2018-04-17 | 2019-10-24 | キヤノン株式会社 | Cooling device and imaging apparatus equipped with the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2021128211A (en) | 2021-09-02 |
| CN113253574A (en) | 2021-08-13 |
| KR20210102839A (en) | 2021-08-20 |
| JP7366789B2 (en) | 2023-10-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8891054B2 (en) | Stage device including a heat insulating sheet supported by an auxiliary member | |
| US20050219501A1 (en) | Stage apparatus and exprosure apparatus | |
| EP1670040A1 (en) | Projection exposure device, projection exposure method, and device manufacturing method | |
| CN113253574B (en) | Optical device, exposure device, and method for manufacturing article | |
| JP2008292761A (en) | Exposure apparatus and method for manufacturing device | |
| US7460213B2 (en) | Alignment apparatus, exposure apparatus, and device manufacturing method using exposure apparatus | |
| JP2006303462A (en) | Exposure device and method for manufacturing device | |
| JP2001250759A (en) | Aligner | |
| TW201350902A (en) | Optical system, exposure apparatus and manufacturing method for equipment | |
| JP2011086708A (en) | Diaphragm device, optical system, exposure device, and method of manufacturing electronic device | |
| JPH10149970A (en) | Treating device and production method of device | |
| TWI575336B (en) | Lithographic apparatus and device manufacturing method | |
| JP7033168B2 (en) | Exposure equipment and manufacturing method of goods | |
| JP2001023890A (en) | Aligner and manufacture of device using the same | |
| JP7427461B2 (en) | Exposure equipment and article manufacturing method | |
| JP2002124451A (en) | Temperature control method, temperature-regulated chamber, and projection aligner | |
| JP2009043810A (en) | Exposure apparatus | |
| JP6335480B2 (en) | Exposure apparatus and device manufacturing method | |
| JPH10256140A (en) | Device aligner and method thereof | |
| JP7385421B2 (en) | Exposure device and article manufacturing method | |
| JP7500370B2 (en) | GAS SUPPLY APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING AN ARTICLE - Patent application | |
| CN112305872A (en) | Optical device, projection optical system, exposure device, and method for manufacturing article | |
| JP2024092046A (en) | Exposure apparatus and method for manufacturing article | |
| JP2021021932A (en) | Optical apparatus, exposure device and method for manufacturing article | |
| JP2000019385A (en) | Exposure device and device manufacture |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |