CN109634064A - Exposure device and article manufacturing method - Google Patents
Exposure device and article manufacturing method Download PDFInfo
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- CN109634064A CN109634064A CN201811127037.5A CN201811127037A CN109634064A CN 109634064 A CN109634064 A CN 109634064A CN 201811127037 A CN201811127037 A CN 201811127037A CN 109634064 A CN109634064 A CN 109634064A
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- temperature
- thermoregulation mechanism
- lens barrel
- exposure device
- target temperature
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
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- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Abstract
The present invention provides exposure device and article manufacturing method.Exposure device has the 1st thermoregulation mechanism (113) and the 2nd thermoregulation mechanism (211), 1st thermoregulation mechanism (113) adjusts the temperature inside lens barrel by the inside supply gas of the lens barrel (110) to receiving projection optical system (104), 2nd thermoregulation mechanism (211) adjusts the temperature of optical element and holding member by supplying liquid to the flow path (209) being arranged in the holding member (206) kept to the optical element (201) for constituting projection optical system, wherein, the target temperature of 1st thermoregulation mechanism and the target temperature of the 2nd thermoregulation mechanism are different.
Description
Technical field
The present invention relates to exposure device and the article manufacturing methods for having used it.
Background technique
In the photo-mask process of the manufacturing process as semiconductor devices, liquid crystal display device etc., the pattern of master is passed through
Projection optical system to the exposure device that photosensitive substrate transfers be known.Here, if exposure-processed is related to for a long time,
Then the optical element inside projection optical system absorbs exposure light, and the energy of absorbed light is converted into heat, the light
Learn element, the optical element holding member and surround their temperature of air and can rise.
At this point, generating Temperature Distribution in the inner space of the lens barrel of receiving projection optical system, the refractive index in the space becomes
Change, as a result, the imaging performance variation of exposure device.It is thus known that making to reduce the Temperature Distribution of the inner space of lens barrel
The air for being controlled temperature recycles such technology in the inner space of lens barrel.
Patent document 1 discloses following exposure device: rising phase and with the internal temperature of lens barrel with exposure-processed
Increase the temperature of the air supplied to the inside of lens barrel, imaging performance caused by inhibiting because of the Temperature Distribution inside lens barrel
Variation.In addition, patent document 2 discloses following exposure device: passing through the optics member for being included relative to projection optical system
Part, its holding member make liquid circulation, carry out the temperature control of optical element, its holding member.
Citation
Patent document 1: Japanese Unexamined Patent Publication 2012-058440 bulletin
Patent document 2: Japanese Unexamined Patent Publication 2017-134389 bulletin
Summary of the invention
Problems to be solved by the invention
It is generally believed that the inside of the lens barrel in receiving projection optical system, by the inner space for concurrently implementing lens barrel
Temperature control and the projection optical system optical element and its holding member that are included temperature control, to reduce the interior of lens barrel
The temperature and optical element in portion space and its temperature difference of holding member.At this point, with the thermal time constant of air and optics member
The difference of the thermal time constant of the material of part and its holding member is cause, is easy to generate Temperature Distribution inside lens barrel.
The temperature point that the purpose of the present invention is to provide a kind of by reducing the inside of the lens barrel of receiving projection optical system
Cloth and can inhibit projection optical system imaging performance variation exposure device.
Solution for solving the problem
Exposure device of the invention has the 1st thermoregulation mechanism and the 2nd thermoregulation mechanism, and the 1st temperature is adjusted
Mechanism by receiving projection optical system lens barrel inside supply gas, come adjust the lens barrel inside temperature, institute
The 2nd thermoregulation mechanism is stated by being arranged on the holding kept to the optical element for constituting the projection optical system
Flow path in component supplies liquid, to adjust the temperature of the optical element and the holding member, which is characterized in that described
The target temperature of 1st thermoregulation mechanism is different with the target temperature of the 2nd thermoregulation mechanism.
From the description (referring to attached drawing) of following exemplary embodiment, other features of the invention be will become obvious.
Detailed description of the invention
Fig. 1 is the figure for indicating the structure of exposure device for the present invention.
Fig. 2 is the figure for indicating the structure of variable lens device for the present invention.
Fig. 3 is the figure for indicating the project in previous temprature control method.
Fig. 4 is the figure for indicating the temprature control method in embodiments of the present invention 1.
Fig. 5 is the figure for indicating the temprature control method in embodiments of the present invention 2.
Specific embodiment
In the following, referring to each figure, the embodiment of the present invention will be described in detail.In addition, it is to be defined that the present invention, which is not,
In the invention of following embodiment, embodiment below only indicates the specific example that the present invention is implemented.
(structure of exposure device)
Using Fig. 1, illustrate the structure of the exposure device 100 in relation to present embodiment.Exposure device 100 is by through exposure mask
(master) is exposed the resist on substrate, forms the device of sub-image corresponding with the pattern of exposure mask in the resist.Make
For Exposure mode, there are step-scan mode, stepping repetitive mode, still, here for using the exposure device of step-scan mode.
But it is the invention for being defined in specific Exposure mode that the present invention, which is not,.
Exposure device 100 can have lamp optical system 101, contraposition microscope 102, to the exposure mask M for foring pattern
Exposure mask mounting table 103, projection optical system 104 and the substrate-placing platform 105 for keeping substrate W kept.In addition, exposure dress
Setting 100 may include the control device 130 for generally controlling exposure-processed.
Lamp optical system 101 has light source, relative to the exposure mask M irradiation exposure being maintained in exposure mask mounting table 103
Light.Contraposition is the optics observed with calibration mark the contraposition being formed on exposure mask M and substrate W with microscope 102
System.Exposure device 100 can be transferred the pattern on exposure mask M by making exposure mask M and substrate W be synchronously carried out scan exposure
Onto the substrate W for having smeared resist.
Projection optical system 104 is by the pattern being formed on exposure mask M as to being maintained on substrate-placing platform 105
The optical system of substrate W projection.Exposure device 100 in relation to present embodiment includes the variable mirror 201 as optical element.It can
Become mirror 201 and constitutes concave mirror.It is emitted from lamp optical system 101 and has penetrated the exposure light of exposure mask M by plane reflection
For mirror 107 by optical path warpage, the reflecting surface 201a of the variable mirror 201 of Xiang Zuowei concave mirror is incident.In the reflection of variable mirror 201
The exposure light that face 201a is reflected is reflected in convex reflecting mirror 108, incident to the reflecting surface 201a of variable mirror 201 again.?
The exposure light that the reflecting surface 201a of variable mirror 201 is reflected, by optical path warpage, is imaged by plane mirror 107 on substrate W.
In addition, as that as illustrating below, by deforming the reflecting surface 201a of variable mirror 201, can make to throw using Fig. 2
The imaging position of shadow optical system 104 changes.
Variable mirror 201 in the lens barrel 110 of receiving projection optical system 104 is formed about air supply opening 110a and exhaust
Mouth 110b.The air feeder for the temperature stabilization in lens barrel 110 can be separately connected in air supply opening 110a and exhaust outlet 110b
Structure 111 and exhaust gear 112.
The gases such as the air of air conditioning are carried out by air conditioning apparatus 113 to be sent by gas supply mechanism 111 through air supply opening 110a
In lens barrel 110, it is vented by exhaust gear 112 through exhaust outlet 110b.In exposure, each optical element generates heat because of exposure light,
But it is possible to reduce the Temperature Distribution of the inner space of lens barrel 110 by air-breathing exhaust.Air conditioning apparatus 113 is used as the 1st temperature
Regulating mechanism functions.In addition, the temperature of the inner space of lens barrel 110 is measured by temperature measurement component 106 in lens barrel.
(structure of variable lens device)
Fig. 2 is to indicate to include the variable of variable mirror 201 and the pedestal kept to variable mirror 201 (holding member) 206
The figure of the structure of lens device 200.Variable lens device 200 is configured to make the shape of the reflecting surface 201a of variable mirror 201 to become
Change.
Variable mirror 201 is Bao Jing, the back side 201b of reflecting surface 201a and its opposite side with reflection light.Pedestal 206
The 2nd face 206b with the back side 201b with variable mirror 201 opposite the 1st face 206a and its opposite side.Variable mirror 201 includes
The a part at the center of back side 201b is fixed on one of the center including the 1st face 206a of pedestal 206 by fixation member 202
Point.In order to inhibit with Yin Re and caused by strain be cause form error generation, variable mirror 201 is for example using low thermal expansion
Optical glass.Implement the coating for the wavelength for being suitable for used light to reflecting surface 201a.Pedestal 206 is right through fixation member 202
Variable mirror 201 is supported, and is kept to the fixed retainer 207 of displacement sensor 208 and actuator.
Variable lens device 200, which has, to be arranged between variable mirror 201 and pedestal 206 and to the back side of variable mirror 201
201b applied force and make reflecting surface 201a deform actuator 203.Actuator 203 is, for example, to be made of magnet 204 and coil 205
Voice coil motor (VCM).For example, magnet 204 is configured in the back side 201b of variable mirror 201, coil 205 and magnet 204 are opposite
Ground is fixed on pedestal 206 and being kept by retainer 207.Actuator 203 is configured with spreading the entire surface of variable mirror 201
Multiple, still, the present invention is not the invention for being defined in the quantity, configuration mode of specific actuator 203.In addition, actuator
203 are also possible to the actuator other than voice coil motor.
Flow path 209 is formed in the inside of pedestal 206, from fluid temperature control mechanism 211 to the 209 supplying temperature quilt of flow path
The liquid of control.Fluid temperature control mechanism 211 is functioned as the 2nd thermoregulation mechanism.As liquid, such as using
Water.By recycling the liquid as refrigerant in flow path 209, the heat generated in actuator 203 is cold through heat conductive bar 210
But.In addition, by recycling the liquid of high temperature in flow path 209, additionally it is possible to increase the temperature of pedestal 206 and variable mirror 201.
Flow path is not arranged in the inside of pedestal 206 alternatively, it is also possible to use but the inside of variable mirror 201 is set, makes liquid
In the structure of flow path circulation.
Variable lens device 200 may include the controller 220 for controlling actuator 203.It is carried out for the error to optical property
The data of the target shape of modified variable mirror 201 are input into controller 220 from control device 130.Calculation unit 221 with it is defeated
The data entered will correspondingly be transmitted for the drive command value of each actuator to driver 222.The drive that driver 222 will receive
Dynamic instruction value is transmitted to corresponding actuator 203 respectively.The drive command value that each actuator is correspondingly generated and received
Corresponding power.The surface shape deformation of variable mirror 201, the error of optical property are corrected as a result,.
Then, the temperature control using Fig. 3, to having been used together by air conditioning apparatus 113 to the inner space progress of lens barrel 110
The project that can be generated when system and the temperature control carried out by fluid temperature control mechanism 211 to pedestal 206 is illustrated.In order to drop
The Temperature Distribution of the inner space of low lens barrel 110, along with the temperature of the inner space of the lens barrel 110 associated with exposure-processed etc.
Rise, increase the temperature of the gas supplied to the inner space of lens barrel 110 from air conditioning apparatus 113.In addition, at the same time, by
The temperature for the liquid that fluid temperature control mechanism 211 recycles the flow path in pedestal 206 rises.
As shown in the upper layer of Fig. 3, if giving the information for indicating target temperature A, air conditioning apparatus relative to air conditioning apparatus 113
113 are adjusted to the gas of temperature corresponding with target temperature A to the supply of the inner space of lens barrel 110.Such as the institute, lower layer of Fig. 3
Show, if giving the information for indicating target temperature A relative to fluid temperature control mechanism 211, fluid temperature control mechanism 211 makes
It is adjusted to the liquid of temperature corresponding with the target temperature A circulation of flow path 209 shown in Fig. 2.
Here, though the target temperature given relative to air conditioning apparatus 113 and relative to fluid temperature control mechanism 211 to
The target temperature given is identical, and the temperature of the inner space of the lens barrel 110 after the stipulated time and the temperature of pedestal 206 can also produce
Raw difference.The temperature difference is the material of the thermal time constant and pedestal 206 due to the air of the inner space full of lens barrel 110
Caused by thermal time constant difference.Thermal time constant is to indicate the parameter of the responsiveness relative to temperature change, is to indicate straight
The constant of time until generating defined temperature change.Thermal time constant is transmitted by the thermal capacity of medium, pyroconductivity, heat
The thermal characteristics such as rate determine.
In the example shown in Fig. 3, since the thermal time constant of the material of pedestal 206 is bigger than the thermal time constant of air,
So producing the base-plate temp θ b of the air themperature θ a and pedestal 206 by the air inside lens barrel 110 after a certain period of time
Temperature difference Δ θ.It is easy to generate Temperature Distribution in the inner space of lens barrel 110 using temperature difference Δ θ as cause, as a result, leading
The imaging performance in exposure-processed is caused to reduce.
Therefore, in the present embodiment, make the target temperature given relative to air conditioning apparatus 113 and relative to fluid temperature
The target temperature that control mechanism 211 is given is different.Specifically, as using Fig. 4 in elaboration below, it will be relative to liquid
The target temperature B that temperature control device 211 is given is set to the target temperature A high than giving relative to air conditioning apparatus 113.By
This, can reduce the air themperature θ a and pedestal for controlling from temperature and beginning to pass through the air inside lens barrel 110 after a certain period of time
The temperature difference Δ θ of 206 base-plate temp θ b, as a result, the raising of the imaging performance in exposure-processed can be made.
(embodiment 1)
Then, using Fig. 4, the details of the temperature control device of embodiment 1 for the present invention is illustrated.Air-conditioning
Mechanism 113 includes air themperature feedback control section 42 and temperature regulation section 43, is measured according to target temperature A and by temperature in lens barrel
The deviation for the air themperature θ a that component 106 measures carries out feedback control to the temperature of the air inside lens barrel 110.
Fluid temperature control mechanism 211 includes fluid temperature feedback (FB) control unit 46 and temperature regulation section 47, according to mesh
The deviation for marking the temperature of the liquid of temperature B and the measurement component measurement of not shown temperature, carries out feedback control to the temperature of liquid
System.As temperature regulation section 43,47, it is able to use well known heater, peltier-element, compressor etc..
The target temperature B of the liquid inputted to fluid temperature feedback (FB) control unit 46 is by base-plate temp feedforward (FF) control
Portion 44 calculates.For the temperature control in base-plate temp feedforward (FF) control unit 44 and fluid temperature feedback (FB) control unit 46
Method will be set forth later.
It here, can be by by fluid temperature control shown in the transmission function FFb such as formula (1) of base-plate temp FF control unit 44
The inverse characteristic of the transmission function Pb of the inverse characteristic and pedestal 206 of the transmission function Gb of mechanism 211 processed is multiplied to calculate.
FFb=1/ (Pb × Gb) ... (1)
The transmission function Gb of fluid temperature control mechanism 211 is using the target temperature of liquid as input and by the temperature of liquid
Transmission function of the degree as output, the transmission function Pb of pedestal 206 be using the temperature of liquid as input and by the temperature of pedestal 206
Spend the transmission function as output.The transmission function Pb of the transmission function Gb of fluid temperature control mechanism 211 and pedestal 206 is such as
Time lag of first order characteristic is indicated like that shown in formula (2), (3).Tb and Tc is time constant, and Kb and Kc are gains.
Tb is the heat between heet transfer rate, pedestal 206 and air between the thermal capacity of pedestal 206, pedestal 206 and liquid
The function of transport.In addition, Tc is the heat transmitting between the thermal capacity of pedestal 206, the thermal capacity of liquid, pedestal 206 and liquid
The function of rate.
Pb=Kb/ (Tb+1) ... (2)
Gb=Kc/ (Tc+1) ... (3)
Included parameter in the transmission function Gb of fluid temperature control mechanism 211, can be by making frequency and liquid on one side
Temperature variation finds out amplitude between the target temperature of liquid and the temperature of liquid on one side, and when phase difference obtains.Equally,
Parameter contained in the transmission function Pb of pedestal 206, can be by finding out when making the temperature change of frequency and pedestal 206
When phase difference obtains for amplitude between the temperature of liquid and the temperature of pedestal 206.Alternatively, it is also possible to by using calculating
Calculating, simulation of machine etc. find out each parameter contained in transmission function.
Then, the temprature control method in air conditioning apparatus 113 is described in detail.Structure will be measured by temperature in lens barrel
The air themperature θ a that part 106 measures gives subtracter 41.Moreover, calculating target temperature A and air themperature θ a in subtracter 41
Deviation, give the signal for indicating the deviation to air themperature feedback control section 42.Air themperature feedback control section 42 be using
Ratio, integral, differential the PID compensator respectively acted temperature regulation section 43 is determined according to the deviation that inputs from subtracter 41
Control parameter.Temperature regulation section 43 carries out the temperature of the air inside lens barrel 110 according to the control parameter inputted from subtracter 41
Degree control.
Then, the temprature control method in fluid temperature control mechanism 211 is described in detail.Firstly, relative to
The base-plate temp feedforward input of (FF) control unit 44 indicates the information of target temperature A.Base-plate temp feedforward (FF) control unit 44 is to contain
The frequency filter of proportional, integral, differential respectively acted determines to control to fluid temperature according to the target temperature A being entered
The target temperature B for the liquid that mechanism 211 inputs.
In the subtracter 45 included by fluid temperature control mechanism 211, the target temperature B of liquid is calculated and by not shown
Temperature measurement component measurement liquid temperature deviation, by the signal for indicating the deviation give fluid temperature feedback (FB) control
Portion 46 processed.Fluid temperature feedback (FB) control unit 46 be used ratio, integral, differential the PID compensator respectively acted, according to
The deviation inputted from subtracter 45, determines the control parameter of temperature regulation section 47.Temperature regulation section 47 is according to anti-from fluid temperature
The control parameter that (FB) control unit 46 inputs is presented, the temperature control of liquid is carried out, the liquid that temperature is controlled is supplied to pedestal 206
It gives.
Fluid temperature control machine is given as above, suitably setting by (FF) control unit 44 that feedovered by base-plate temp
The target temperature of structure 211 can reduce the temperature difference of the temperature of the inner space of lens barrel 110 and the temperature of pedestal 206.As a result,
It can be effectively reduced using the Temperature Distribution of the inner space of lens barrel 110 as the imaging performance of the projection optical system 104 of cause
Variation.
(embodiment 2)
Then, using Fig. 5, the temperature control device of embodiment 2 for the present invention is illustrated.With shown in Fig. 4
Related embodiment 1 temperature control device difference be fluid temperature control mechanism 211 provided with base-plate temp feed back
(FB) this point of control unit 48.Since the temprature control method in air conditioning apparatus 113 is identical as embodiment 1, so omitting the description.
In the present embodiment, the target temperature A exported from control device 130 is added in air conditioning apparatus by adder 51
The air themperature deviation calculated in 113, using the temperature after target temperature A added air themperature deviation as to fluid temperature
The target temperature that control mechanism 211 inputs.Moreover, the deviation of target temperature and base-plate temp θ b is calculated by subtracter 52, by table
Show that the signal of the deviation gives base-plate temp feedback (FB) control unit 48.Base-plate temp feedback (FB) control unit 48 is to have used ratio
Example integrates, the PID compensator of differential respectively acted, and according to the deviation inputted from subtracter 52, determines the control of temperature regulation section 47
Parameter processed.Temperature regulation section 47 carries out the temperature of liquid according to the control parameter for feeding back the input of (FB) control unit 48 from base-plate temp
Degree control, the liquid that temperature is controlled are supplied to pedestal 206.
In the present embodiment, the air themperature deviation calculated in air conditioning apparatus 113 is considered in advance, is determined to liquid temperature
Spend the target temperature that control mechanism 211 inputs.The tracking changed thereby, it is possible to reduce base-plate temp θ b relative to air themperature θ a
Delay.
(article manufacturing method)
The article manufacturing method of embodiment for the present invention is suitble to manufacture the micro element such as semiconductor devices, have
Element of microstructure and other items.The article manufacturing method of present embodiment includes: to be smeared using above-mentioned exposure device
Emulsion on substrate forms the process (process being exposed to substrate) of latent image pattern；And to being formed by the process
The process that the substrate of latent image pattern develops.In turn, the manufacturing method include other known processes (oxidation, film forming,
Vapor deposition, doping, planarization, etching, resist removing, cutting, bonding, encapsulation etc.).The article manufacturing method of present embodiment with
Previous method is compared, advantageous in terms of at least one of the performance of article, quality, productivity, production cost.
Above, the preferred embodiments of the present invention is illustrated, still, the present invention is not limited to these certainly
Embodiment can carry out various modifications and change within the scope of its subject matter.For example, as by fluid temperature control mechanism into
Trip temperature control optical element be not limited to variable mirror 201, can also by plane mirror 107, convex reflecting mirror 108 or
Their holding member of person is as temperature controlled object.
Claims (8)
1. a kind of exposure device, the exposure device has the 1st thermoregulation mechanism and the 2nd thermoregulation mechanism,
1st thermoregulation mechanism is described to adjust by the inside supply gas to the lens barrel for accommodating projection optical system
The temperature of the inside of lens barrel,
2nd thermoregulation mechanism is by keeping the optical element for constituting the projection optical system to being arranged on
Holding member in flow path supply liquid, to adjust the temperature of the optical element and the holding member, feature exists
In,
The target temperature of 1st thermoregulation mechanism is different with the target temperature of the 2nd thermoregulation mechanism.
2. exposure device as described in claim 1, which is characterized in that the target temperature of the 2nd thermoregulation mechanism compares institute
The target temperature for stating the 1st thermoregulation mechanism is high.
3. exposure device as described in claim 1, which is characterized in that according to the thermal capacity of the holding member, heet transfer rate
And at least one of pyroconductivity, determine the target temperature of the 2nd thermoregulation mechanism.
4. exposure device as described in claim 1, which is characterized in that according to the thermal capacity of the optical element, heet transfer rate
And at least one of pyroconductivity, determine the target temperature of the 2nd thermoregulation mechanism.
5. exposure device as described in claim 1, which is characterized in that measured to the temperature of the inner space of the lens barrel
Temperature measurement component be configured in the inside of the lens barrel, according in the lens barrel by temperature measurement component measurement
The temperature in portion space determines the target temperature of the 1st thermoregulation mechanism.
6. exposure device as claimed in claim 5, which is characterized in that the 1st thermoregulation mechanism is according to by the temperature
The deviation of the temperature of the inner space of the lens barrel of component measurement and the target temperature of the 1st thermoregulation mechanism is measured,
The temperature of the gas of the inside supply of the opposite lens barrel carries out feedback control.
7. exposure device as described in claim 1, which is characterized in that according to the target temperature of the 1st thermoregulation mechanism
With the transmission function of the 2nd thermoregulation mechanism and the transmission function of the holding member, the 2nd temperature adjuster is determined
The target temperature of structure.
8. a kind of article manufacturing method characterized by comprising
The exposure process that substrate is exposed using exposure device described in any one of claim 1 to 7；And
To the developing procedure that the substrate being exposed by the exposure process develops,
By the substrate manufacture article.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-196423 | 2017-10-06 | ||
| JP2017196423A JP7016661B2 (en) | 2017-10-06 | 2017-10-06 | Method of manufacturing exposure equipment and articles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109634064A true CN109634064A (en) | 2019-04-16 |
| CN109634064B CN109634064B (en) | 2022-05-17 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811127037.5A Active CN109634064B (en) | 2017-10-06 | 2018-09-27 | Exposure apparatus and article manufacturing method |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP7016661B2 (en) |
| KR (1) | KR102393140B1 (en) |
| CN (1) | CN109634064B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112925175A (en) * | 2021-01-29 | 2021-06-08 | 深圳市大族数控科技股份有限公司 | Exposure machine |
| CN113238459A (en) * | 2020-02-06 | 2021-08-10 | 佳能株式会社 | Optical device, exposure device, and article manufacturing method |
| CN113253574A (en) * | 2020-02-12 | 2021-08-13 | 佳能株式会社 | Optical device, exposure device, and method for manufacturing article |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021015141A (en) * | 2019-07-10 | 2021-02-12 | キヤノン株式会社 | Optical device, projection optical system, exposure device and method for producing article |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5883704A (en) * | 1995-08-07 | 1999-03-16 | Nikon Corporation | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system |
| CN102549503A (en) * | 2009-09-30 | 2012-07-04 | 卡尔蔡司Smt有限责任公司 | Optical arrangement in a projection exposure apparatus for EUV lithography |
| CN103299249A (en) * | 2007-10-09 | 2013-09-11 | 卡尔蔡司Smt有限责任公司 | Device for controlling temperature of an optical element |
| JP2016161923A (en) * | 2015-03-05 | 2016-09-05 | キヤノン株式会社 | Exposure device, and method for manufacturing article |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4474871B2 (en) * | 2003-03-19 | 2010-06-09 | 株式会社ニコン | Exposure equipment |
| JP2009192569A (en) * | 2008-02-12 | 2009-08-27 | Canon Inc | Exposure apparatus and method for manufacturing device |
| JP5517847B2 (en) | 2010-09-08 | 2014-06-11 | キヤノン株式会社 | Exposure apparatus and device manufacturing method using the same |
| JP2014078572A (en) * | 2012-10-09 | 2014-05-01 | Nikon Corp | Optical element adjusting device, optical device, and exposure method and apparatus |
| JP2015050353A (en) * | 2013-09-02 | 2015-03-16 | キヤノン株式会社 | Optical device, projection optical system, exposure device, and manufacturing method of article |
| JP2016143869A (en) * | 2015-02-05 | 2016-08-08 | キヤノン株式会社 | Exposure device, and method of manufacturing article |
| JP6866131B2 (en) | 2016-01-27 | 2021-04-28 | キヤノン株式会社 | Optical equipment, exposure equipment equipped with it, and manufacturing method of goods |
-
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-
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- 2018-09-27 CN CN201811127037.5A patent/CN109634064B/en active Active
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5883704A (en) * | 1995-08-07 | 1999-03-16 | Nikon Corporation | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system |
| CN103299249A (en) * | 2007-10-09 | 2013-09-11 | 卡尔蔡司Smt有限责任公司 | Device for controlling temperature of an optical element |
| CN102549503A (en) * | 2009-09-30 | 2012-07-04 | 卡尔蔡司Smt有限责任公司 | Optical arrangement in a projection exposure apparatus for EUV lithography |
| JP2016161923A (en) * | 2015-03-05 | 2016-09-05 | キヤノン株式会社 | Exposure device, and method for manufacturing article |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113238459A (en) * | 2020-02-06 | 2021-08-10 | 佳能株式会社 | Optical device, exposure device, and article manufacturing method |
| CN113253574A (en) * | 2020-02-12 | 2021-08-13 | 佳能株式会社 | Optical device, exposure device, and method for manufacturing article |
| CN113253574B (en) * | 2020-02-12 | 2024-01-16 | 佳能株式会社 | Optical device, exposure device, and method for manufacturing article |
| CN112925175A (en) * | 2021-01-29 | 2021-06-08 | 深圳市大族数控科技股份有限公司 | Exposure machine |
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| Publication number | Publication date |
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| JP2019070724A (en) | 2019-05-09 |
| KR102393140B1 (en) | 2022-05-02 |
| CN109634064B (en) | 2022-05-17 |
| KR20190039873A (en) | 2019-04-16 |
| JP7016661B2 (en) | 2022-02-07 |
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