CN113231372B - Cleaning method of semiconductor-grade quartz ring - Google Patents
Cleaning method of semiconductor-grade quartz ring Download PDFInfo
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- CN113231372B CN113231372B CN202110565279.8A CN202110565279A CN113231372B CN 113231372 B CN113231372 B CN 113231372B CN 202110565279 A CN202110565279 A CN 202110565279A CN 113231372 B CN113231372 B CN 113231372B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 112
- 238000000034 method Methods 0.000 title claims abstract description 31
- 239000010453 quartz Substances 0.000 title claims abstract description 24
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 59
- 238000005406 washing Methods 0.000 claims abstract description 28
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000003344 environmental pollutant Substances 0.000 claims abstract description 11
- 231100000719 pollutant Toxicity 0.000 claims abstract description 11
- 238000002791 soaking Methods 0.000 claims abstract description 9
- 239000004519 grease Substances 0.000 claims abstract description 5
- 230000000087 stabilizing effect Effects 0.000 claims description 48
- 238000011010 flushing procedure Methods 0.000 claims description 21
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 19
- 238000001035 drying Methods 0.000 claims description 17
- 238000000861 blow drying Methods 0.000 claims description 13
- 239000002253 acid Substances 0.000 claims description 12
- 238000004806 packaging method and process Methods 0.000 claims description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 6
- 239000004065 semiconductor Substances 0.000 claims description 6
- 238000007689 inspection Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 235000008373 pickled product Nutrition 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 abstract description 2
- 230000003139 buffering effect Effects 0.000 description 4
- 230000003749 cleanliness Effects 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/12—Brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
- B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a cleaning method of a semiconductor-grade quartz ring, which specifically comprises the following steps: the method comprises the following steps: selecting a product to be cleaned, wiping the quartz product with isopropanol to remove coarse pollutants and grease; step two: after the isopropanol is wiped, the surface of the product is washed by pure water through a washing device, so that no visible pollutant is generated on the product; step three: putting the product into a cleaning tank after pure water washing, and soaking the product for 30-50 minutes; step four: taking out the product soaked in the cleaning tank, and rinsing with pure water; according to the invention, the pushing plate is pressed downwards, so that the pushing plate drives the supporting rod to move towards the direction far away from the rotary table, the distance between the first cleaning head and the second cleaning head is increased, a product is put into the washing tank, the product body is quickly placed, the time consumed by preparation work before cleaning is saved, and the working efficiency is improved.
Description
Technical Field
The invention relates to a cleaning method, in particular to a cleaning method of a semiconductor-grade quartz ring, belonging to the technical field of quartz ring processing and application.
Background
With the development of the electronic industry, the requirements on the surface quality of wafers and related parts are higher and higher; the surface cleanliness of the silicon wafer can seriously affect the finished product ratio of devices and the quality of the next process;
the quartz product has very high purity, excellent heat resistance, light transmittance, electrical insulation and chemical stability, and is widely applied to semiconductor equipment, so that the requirement on the cleanliness of the quartz surface is higher and higher, the existing cleaning process cannot meet the requirement of the quartz industry, and the more advanced cleaning technology is always a technical difficulty which needs to be broken through at present;
the existing cleaning process cannot well remove pollutants of organic matters, particles and inorganic metal ions on the surface of a quartz product, particularly the residual quantity of the metal ions after cleaning is obviously reduced compared with the existing process, the cleaning cost and the transportation cost of cleaning the quartz product to a third party are greatly increased, and the control of the processing period of the product cannot reach the ideal.
Disclosure of Invention
The invention aims to provide a method for cleaning a semiconductor grade quartz ring.
The purpose of the invention can be realized by the following technical scheme: a method for cleaning a semiconductor-grade quartz ring specifically comprises the following steps:
the method comprises the following steps: selecting a product to be cleaned, wiping the quartz product with isopropanol to remove coarse pollutants and grease;
step two: after the isopropanol is wiped, the surface of the product is washed by pure water through a washing device, so that no visible pollutant is generated on the product;
step three: putting the product into a cleaning tank after pure water washing, and soaking the product for 30-50 minutes;
step four: taking out the product soaked in the cleaning tank, and rinsing with pure water;
step five: carrying out acid washing after rinsing with pure water, and observing without visible pollutants after acid washing;
step six: rinsing the pickled product with pure water for 20-30 seconds at an overflow speed of 5-10L/min;
step seven: carrying out first ultrasonic cleaning on the product rinsed by pure water;
step eight: carrying out first blow-drying after ultrasonic cleaning until the air gun pressure is 0.5-1 Mpa;
step nine: carrying out acceptance inspection after the first blow-drying;
step ten: the product is subjected to secondary ultrasonic cleaning after being inspected, and the intensity is controlled to be 40-60W/m2The overflow speed is 5-10L/min, and the cleaning time is controlled to be 40-60 minutes;
step eleven: performing secondary blow-drying on the product subjected to the secondary ultrasonic cleaning until the pressure of an air gun is 0.5-1 Mpa;
step twelve: after the second drying, putting the product into a drying furnace for drying, wherein the drying temperature is controlled to be between 150 and 200 ℃, and the drying time is controlled to be between 30 and 40 minutes;
step thirteen: and finally, packaging, wherein the packaging bag is required to be vacuumized and is made of a PVC material.
The invention has further technical improvements that: the specific method for washing with pure water in the second step comprises the following steps: each product needs to be washed for 5-10 seconds and 3-6 times.
The invention has further technical improvements that: the specific method for rinsing by pure water in the fourth step comprises the following steps: rinsing time is 5-10 seconds, and overflow speed is 5-10L/min.
The invention has further technical improvements that: in the step five, the acid component in the acid cleaning is hydrofluoric acid, the concentration is 5-10%, and the soaking time is 10-20 minutes.
The invention has further technical improvements that: in the seventh step, the ultrasonic intensity in the first ultrasonic cleaning is controlled to be 40-60W/m2The overflow speed is 5-10L/min, and the cleaning time is controlled at 40-60 minutes.
The invention has further technical improvements that: the flushing device in the second step specifically comprises a shell, a water tank and a water pump are respectively installed inside the shell, the water pump is fixed at one end of the water tank, the input end of the water pump is arranged in the water tank, a flushing head is installed at the top of the shell through an installation frame and is connected with the output end of the water pump through a connecting pipe, a flushing groove is formed in the top of the shell, and the flushing head is arranged right opposite to the flushing groove;
a driving motor is installed inside the shell, a rotary table is rotationally connected in the washing groove, the end part of an output shaft of the driving motor is fixedly connected with the bottom of the rotary table, arc-shaped rods are arranged on the outer side of the rotary table at equal angles, one ends of the arc-shaped rods are rotationally connected with the rotary table through hinges, a first cleaning head is fixed at one end, away from the rotary table, of each arc-shaped rod, a product body is arranged in the washing groove, and one end, away from the arc-shaped rods, of each first cleaning head is matched with the inner wall of the product body;
the utility model discloses a cleaning device, including product body, mounting panel, bracing piece, first cleaning head and second cleaning head, product body outside cover is equipped with the mounting panel, the spacing spout has been seted up to angles such as mounting panel inner wall, sliding connection has the bracing piece in the spacing spout, be provided with expanding spring in the spacing spout, expanding spring's both ends respectively with bracing piece and mounting panel fixed connection, the one end that expanding spring was kept away from to the bracing piece runs through the mounting panel lateral wall and is fixed with the second cleaning head, first cleaning head and second cleaning head mutually support.
The invention has further technical improvements that: the first cleaning head comprises a first arc-shaped plate and a first mounting plate, and the first arc-shaped plate is connected with the first mounting plate in a sliding mode through a connecting guide rod;
one end, far away from the first mounting plate, of the first arc-shaped plate is fixedly connected with the end part of the arc-shaped rod, first connecting rods are symmetrically arranged on one side of the first arc-shaped plate, one ends of the first connecting rods are rotatably connected with the first arc-shaped plate through torsion springs, first stabilizing grooves are symmetrically formed in one side, close to the first arc-shaped plate, of the first mounting plate, first stabilizing blocks are symmetrically arranged in the first stabilizing grooves and are slidably connected in the first stabilizing grooves, and one ends, far away from the first arc-shaped plate, of the first connecting rods are respectively rotatably connected with two first stabilizing blocks in the corresponding first stabilizing grooves;
one side of the first arc-shaped plate, which is far away from the first mounting plate, is provided with a first cleaning brush, and the first cleaning brush is matched with the inner wall of the product body.
The invention has further technical improvements that: the second cleaning head comprises a second arc-shaped plate and a second mounting plate;
one end of the second arc-shaped plate, far away from the second mounting plate, is fixedly connected with the end part of the supporting rod, one side of the second arc-shaped plate is symmetrically provided with second connecting rods, one end of each second connecting rod is rotatably connected with the second arc-shaped plate through a torsion spring, one side of the second mounting plate, close to the second arc-shaped plate, is symmetrically provided with second stabilizing grooves, second stabilizing blocks are symmetrically arranged in the second stabilizing grooves and are slidably connected in the second stabilizing grooves, and one end of each second connecting rod, far away from the second arc-shaped plate, is rotatably connected with two corresponding second stabilizing blocks in the second stabilizing grooves;
one side of the second mounting plate, which is far away from the second arc-shaped plate, is provided with a second cleaning brush, and the second cleaning brush is matched with the outer side of the product body.
The invention has further technical improvements that: the top of the mounting plate is provided with a push plate, the bottom end of the push plate is arranged in the mounting plate, the top of the support rod is provided with a limiting groove, the bottom end of the push plate is arranged in the limiting groove, and the push plate is matched with the limiting groove;
the inside sliding connection of spacing spout has the baffle, and the both ends of baffle respectively with expanding spring and bracing piece fixed connection.
Compared with the prior art, the invention has the beneficial effects that:
1. when the washing machine is used, the pushing plate is pressed downwards, so that the pushing plate drives the supporting rod to move towards the direction far away from the rotary table, the distance between the first cleaning head and the second cleaning head is increased, a product is placed into the washing tank, the product body is placed quickly, the time consumed by preparation work before cleaning is saved, and the working efficiency is improved;
2. the driving motor and the water pump are started, the driving motor drives the turntable to rotate, the turntable drives the arc-shaped rods to rotate, the arc-shaped rods drive the first arc-shaped plate and the first mounting plate to move towards the direction of the product, so that the first cleaning hairbrush cleans the product body, the first connecting rod is rotationally connected with the first arc-shaped plate through the torsion spring and pushes the first mounting plate, when the first mounting plate is subjected to reverse thrust of the product body, the first connecting rod is reversely rotated, the two first stabilizing blocks slide to generate reverse buffering force, the cleaning efficiency of the product body is increased, the second cleaning hairbrush cleans the outer side of the product body while the turntable rotates, and the second connecting rod, the second mounting plate and the second stabilizing blocks simultaneously generate reverse buffering force, avoid causing the damage to the product body when clean, simultaneously expanding spring still produces a driving force to the bracing piece, increases the compactness between second cleaning head and the product body.
3. The cleaning method of the invention ensures that the surface cleaning cleanliness of the product is high, and the high-quality quartz rings can be cleaned in batches.
Drawings
In order to facilitate understanding for those skilled in the art, the present invention will be further described with reference to the accompanying drawings;
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic view of the internal structure of the rinsing bath according to the present invention;
FIG. 3 is an enlarged view of the area A of the present invention;
in the figure: 1. a housing; 2. a water tank; 3. a drive motor; 4. a water pump; 5. a rinsing head; 6. a support bar; 7. an arcuate bar; 8. a turntable; 9. a washing tank; 10. a first cleaning head; 11. a second cleaning head; 12. a limiting chute; 13. mounting a plate; 14. a first arc-shaped plate; 15. a first connecting rod; 16. a product body; 17. a first mounting plate; 18. a tension spring; 19. a baffle plate; 20. a limiting groove; 21. a second arc-shaped plate; 22. a second mounting plate; 23. a second cleaning brush; 24. connecting the guide rod; 25. a first stabilizing slot; 26. a first stabilization block; 27. a first cleaning brush; 28. a second stabilizing slot; 29. a second stabilization block; 30. a second connecting rod.
Detailed Description
The technical solutions of the present invention will be described clearly and completely with reference to the following embodiments, and it should be understood that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-3, a method for cleaning a semiconductor-grade quartz ring includes the following steps:
the method comprises the following steps: selecting a product to be cleaned, wiping the quartz product with isopropanol to remove coarse pollutants and grease;
step two: after isopropyl alcohol is wiped, carry out the pure water through washing unit and wash the product surface, ensure that the product does not have visual pollutant, specifically wash the process and be:
the pushing plate is pressed downwards, so that the pushing plate drives the supporting rod 6 to move towards the direction far away from the rotary disc 8, and the distance between the first cleaning head 10 and the second cleaning head 11 is increased;
putting the product into the flushing tank 9, starting the driving motor 3 and the water pump 4, the driving motor 3 driving the rotary disc 8 to rotate, the rotary disc 8 driving the arc-shaped rod 7 to rotate, so that the arc-shaped rod 7 driving the first arc-shaped plate 14 and the first mounting plate 17 to move towards the product, thereby the first cleaning brush 27 cleaning the product body 16, because the first connecting rod 15 is rotatably connected with the first arc-shaped plate 14 through the torsion spring, the first connecting rod 15 pushing the first mounting plate 17, when the first mounting plate 17 receives the reverse thrust of the product body 16, the first connecting rod 15 reversely rotates, and the two first stabilizing blocks 26 slide, a reverse buffer force is generated, thereby the cleaning efficiency of the product body 16 is increased, because the second cleaning head 11 is not rotating, when the rotary disc 8 rotates, the second cleaning brush 23 cleans the outer side of the product body 16, the second connecting rod 30, the second mounting plate 22 and the second stabilizing block 29 simultaneously generate a reverse buffering force to avoid damaging the product body 16 during cleaning, meanwhile, the telescopic spring 18 also generates a pushing force on the supporting rod 6 to increase the tightness between the second cleaning head 11 and the product body 16, and the cleaning head 5 cleans the product body 16;
step three: putting the product into a cleaning tank after pure water washing, and soaking the product, wherein the soaking time is controlled to be 40 minutes;
step four: taking out the product soaked in the cleaning tank, and rinsing with pure water;
step five: carrying out acid washing after rinsing with pure water, and observing without visible pollutants after acid washing;
step six: rinsing the pickled product with pure water for 25 seconds at an overflow speed of 7.5L/min;
step seven: carrying out first ultrasonic cleaning on the product rinsed by pure water;
step eight: carrying out first blow-drying after ultrasonic cleaning until the air gun pressure is 0.75 Mpa;
step nine: carrying out acceptance inspection after the first blow-drying;
step ten: the product is subjected to secondary ultrasonic cleaning after being inspected, and the intensity is controlled to be 50W/m2The overflow speed is 7.5L/min, and the cleaning time is controlled to be 50 minutes;
step eleven: performing secondary blow-drying on the product subjected to the secondary ultrasonic cleaning until the pressure of an air gun is 0.75 Mpa;
step twelve: after the second drying, putting the product into a drying furnace for drying, wherein the drying temperature is controlled at 175 ℃, and the drying time is controlled at 35 minutes;
step thirteen: and finally, packaging, wherein the packaging bag is required to be vacuumized and is made of a PVC material.
The specific method for washing with pure water in the second step comprises the following steps: each product was rinsed 5 times for 7.5 seconds per pass.
The specific method for rinsing by pure water in the fourth step comprises the following steps: rinsing time 7.5 seconds, overflow rate 7.5L/min.
In the step five, the acid component in the acid cleaning is hydrofluoric acid, the concentration is 7.5%, and the soaking time is 15 minutes.
In the seventh step, the ultrasonic intensity in the first ultrasonic cleaning is controlled at 50W/m2The overflow rate was 7.5L/min, and the washing time was controlled to 50 minutes.
The flushing device in the second step specifically comprises a shell 1, a water tank 2 and a water pump 4 are respectively installed inside the shell 1, the water pump 4 is fixed at one end of the water tank 2, the input end of the water pump 4 is arranged in the water tank 2, a flushing head 5 is installed at the top of the shell 1 through an installation frame, the flushing head 5 is connected with the output end of the water pump 4 through a connecting pipe, a flushing groove 9 is formed in the top of the shell 1, and the flushing head 5 is arranged right opposite to the flushing groove 9;
a driving motor 3 is installed inside the shell 1, a rotary table 8 is rotatably connected in a washing groove 9, the end part of an output shaft of the driving motor 3 is fixedly connected with the bottom of the rotary table 8, arc-shaped rods 7 are arranged on the outer side of the rotary table 8 at equal angles, one end of each arc-shaped rod 7 is rotatably connected with the rotary table 8 through a hinge, a first cleaning head 10 is fixed at one end, away from the rotary table 8, of each arc-shaped rod 7, a product body 16 is arranged in the washing groove 9, and one end, away from the arc-shaped rods 7, of each first cleaning head 10 is matched with the inner wall of the product body 16;
16 outside covers of product body are equipped with mounting panel 13, and spacing spout 12 has been seted up to angles such as mounting panel 13 inner wall, and sliding connection has bracing piece 6 in the spacing spout 12, is provided with expanding spring 18 in the spacing spout 12, expanding spring 18's both ends respectively with bracing piece 6 and mounting panel 13 fixed connection, the one end that expanding spring 18 was kept away from to bracing piece 6 runs through mounting panel 13 lateral wall and is fixed with second cleaning head 11, first cleaning head 10 and second cleaning head 11 mutually support.
The first cleaning head 10 comprises a first arc-shaped plate 14 and a first mounting plate 17, wherein the first arc-shaped plate 14 is connected with the first mounting plate 17 in a sliding manner through a connecting guide rod 24;
one end, far away from the first mounting plate 17, of the first arc-shaped plate 14 is fixedly connected with the end part of the arc-shaped rod 7, first connecting rods 15 are symmetrically arranged on one side of the first arc-shaped plate 14, one end of each first connecting rod 15 is rotatably connected with the first arc-shaped plate 14 through a torsion spring, first stabilizing grooves 25 are symmetrically formed in one side, near to the first arc-shaped plate 14, of the first mounting plate 17, first stabilizing blocks 26 are symmetrically arranged in the first stabilizing grooves 25, the first stabilizing blocks 26 are slidably connected in the first stabilizing grooves 25, and one ends, far away from the first arc-shaped plate 14, of the first connecting rods 15 are respectively rotatably connected with two first stabilizing blocks 26 in the corresponding first stabilizing grooves 25;
the first cleaning brush 27 is installed on one side of the first installation plate 17 far away from the first arc-shaped plate 14, and the first cleaning brush 27 is matched with the inner wall of the product body 16.
one end of the second arc-shaped plate 21, which is far away from the second mounting plate 22, is fixedly connected with the end part of the support rod 6, one side of the second arc-shaped plate 21 is symmetrically provided with a second connecting rod 30, one end of the second connecting rod 30 is rotatably connected with the second arc-shaped plate 21 through a torsion spring, one side of the second mounting plate 22, which is near to the second arc-shaped plate 21, is symmetrically provided with a second stabilizing groove 28, a second stabilizing block 29 is symmetrically arranged in the second stabilizing groove 28, the second stabilizing block 29 is slidably connected in the second stabilizing groove 28, and one end of the second connecting rod 30, which is far away from the second arc-shaped plate 21, is respectively rotatably connected with two second stabilizing blocks 29 in the corresponding second stabilizing grooves 28;
one side of the second mounting plate 22, which is far away from the second arc-shaped plate 21, is provided with a second cleaning brush 23, and the second cleaning brush 23 is matched with the outer side of the product body 16.
The top of the mounting plate 13 is provided with a push plate, the bottom end of the push plate is arranged inside the mounting plate 13, the top of the support rod 6 is provided with a limit groove 20, the bottom end of the push plate is arranged in the limit groove 20, and the push plate is matched with the limit groove 20;
the limiting sliding groove 12 is connected with a baffle 19 in a sliding manner, and two ends of the baffle 19 are respectively fixedly connected with the telescopic spring 18 and the supporting rod 6.
The working principle is as follows: when the cleaning agent is used, firstly, products needing cleaning are selected, and the quartz products are wiped by isopropanol to remove coarse pollutants and grease; after the isopropanol is wiped, pure water washing is carried out on the surface of the product through a washing device, and the pushing plate is pressed downwards, so that the pushing plate drives the supporting rod 6 to move towards the direction far away from the rotating disc 8, and the distance between the first cleaning head 10 and the second cleaning head 11 is increased;
putting the product into the flushing tank 9, starting the driving motor 3 and the water pump 4, the driving motor 3 driving the rotary disc 8 to rotate, the rotary disc 8 driving the arc-shaped rod 7 to rotate, so that the arc-shaped rod 7 driving the first arc-shaped plate 14 and the first mounting plate 17 to move towards the product, thereby the first cleaning brush 27 cleaning the product body 16, because the first connecting rod 15 is rotatably connected with the first arc-shaped plate 14 through the torsion spring, the first connecting rod 15 pushing the first mounting plate 17, when the first mounting plate 17 receives the reverse thrust of the product body 16, the first connecting rod 15 reversely rotates, and the two first stabilizing blocks 26 slide, a reverse buffer force is generated, thereby the cleaning efficiency of the product body 16 is increased, because the second cleaning head 11 is not rotating, when the rotary disc 8 rotates, the second cleaning brush 23 cleans the outer side of the product body 16, the second connecting rod 30, the second mounting plate 22 and the second stabilizing block 29 simultaneously generate a reverse buffering force to avoid damaging the product body 16 during cleaning, meanwhile, the telescopic spring 18 also generates a pushing force on the supporting rod 6 to increase the tightness between the second cleaning head 11 and the product body 16, and the cleaning head 5 cleans the product body 16;
putting the product into a cleaning tank after pure water washing, and soaking the product; taking out the product soaked in the cleaning tank, and rinsing with pure water; rinsing with pure water, then carrying out acid cleaning, rinsing with pure water on the product after acid cleaning, and carrying out first ultrasonic cleaning on the product after rinsing with pure water; carrying out first blow-drying after ultrasonic cleaning, and carrying out incoming inspection after the first blow-drying; and (3) carrying out secondary ultrasonic cleaning after the product is inspected, carrying out secondary blow-drying on the product subjected to the secondary ultrasonic cleaning, putting the product into a drying furnace for drying after the secondary blow-drying, and finally packaging, wherein the packaging bag is required to be vacuumized and is made of a PVC material.
The preferred embodiments of the invention disclosed above are intended to be illustrative only. The preferred embodiments are not intended to be exhaustive or to limit the invention to the precise forms disclosed. Many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the invention and the practical application, to thereby enable others skilled in the art to best utilize the invention. The invention is limited only by the claims and their full scope and equivalents.
Claims (6)
1. A method for cleaning a semiconductor-grade quartz ring is characterized in that: the method specifically comprises the following steps:
the method comprises the following steps: selecting a product to be cleaned, wiping the quartz product with isopropanol to remove coarse pollutants and grease;
step two: after the isopropanol is wiped, washing the surface of the product by pure water through a washing device;
the flushing device specifically comprises a shell (1), a water tank (2) and a water pump (4) are respectively installed inside the shell (1), the water pump (4) is fixed at one end of the water tank (2), the input end of the water pump (4) is arranged in the water tank (2), a flushing head (5) is installed at the top of the shell (1) through a mounting frame, the flushing head (5) is connected with the output end of the water pump (4) through a connecting pipe, a flushing groove (9) is formed in the top of the shell (1), and the flushing head (5) is over against the flushing groove (9);
a driving motor (3) is installed inside the shell (1), a rotary table (8) is rotationally connected in the flushing tank (9), the end portion of an output shaft of the driving motor (3) is fixedly connected with the bottom of the rotary table (8), arc-shaped rods (7) are arranged on the outer side of the rotary table (8) at equal angles, one ends of the arc-shaped rods (7) are rotationally connected with the rotary table (8) through hinges, a first cleaning head (10) is fixed at one end, away from the rotary table (8), of each arc-shaped rod (7), a product body (16) is arranged in the flushing tank (9), and one end, away from the arc-shaped rods (7), of each first cleaning head (10) is matched with the inner wall of the product body (16);
the cleaning device is characterized in that a mounting plate (13) is sleeved on the outer side of the product body (16), a limiting sliding groove (12) is formed in the inner wall of the mounting plate (13) at an equal angle, a supporting rod (6) is connected in the limiting sliding groove (12) in a sliding mode, an expansion spring (18) is arranged in the limiting sliding groove (12), two ends of the expansion spring (18) are fixedly connected with the supporting rod (6) and the mounting plate (13) respectively, one end, far away from the expansion spring (18), of the supporting rod (6) penetrates through the side wall of the mounting plate (13) and is fixed with a second cleaning head (11), and the first cleaning head (10) and the second cleaning head (11) are matched with each other;
the first cleaning head (10) comprises a first arc-shaped plate (14) and a first mounting plate (17), and the first arc-shaped plate (14) is connected with the first mounting plate (17) in a sliding mode through a connecting guide rod (24);
one end, far away from a first mounting plate (17), of the first arc-shaped plate (14) is fixedly connected with the end part of the arc-shaped rod (7), first connecting rods (15) are symmetrically arranged on one side of the first arc-shaped plate (14), one end of each first connecting rod (15) is rotatably connected with the first arc-shaped plate (14) through a torsion spring, first stabilizing grooves (25) are symmetrically formed in one side, close to the first arc-shaped plate (14), of the first mounting plate (17), first stabilizing blocks (26) are symmetrically arranged in the first stabilizing grooves (25), the first stabilizing blocks (26) are slidably connected in the first stabilizing grooves (25), and one end, far away from the first arc-shaped plate (14), of each first connecting rod (15) is rotatably connected with two first stabilizing blocks (26) in the corresponding first stabilizing grooves (25);
a first cleaning brush (27) is arranged on one side, away from the first arc-shaped plate (14), of the first mounting plate (17), and the first cleaning brush (27) is matched with the inner wall of the product body (16);
step three: putting the product into a cleaning tank after pure water washing, and soaking the product for 30-50 minutes;
step four: taking out the product soaked in the cleaning tank, and rinsing with pure water;
step five: rinsing with pure water and then carrying out acid washing;
step six: rinsing the pickled product with pure water for 20-30 seconds at an overflow speed of 5-10L/min;
step seven: carrying out first ultrasonic cleaning on the product rinsed by pure water;
step eight: carrying out first blow-drying after ultrasonic cleaning until the air gun pressure is 0.5-1 Mpa;
step nine: carrying out acceptance inspection after the first blow-drying;
step ten: the product is subjected to secondary ultrasonic cleaning after being inspected, and the intensity is controlled to be 40-60W/m2The overflow speed is 5-10L/min, and the cleaning time is controlled to be 40-60 minutes;
step eleven: performing secondary blow-drying on the product subjected to the secondary ultrasonic cleaning until the pressure of an air gun is 0.5-1 Mpa;
step twelve: after the second drying, putting the product into a drying furnace for drying, wherein the drying temperature is controlled to be between 150 and 200 ℃, and the drying time is controlled to be between 30 and 40 minutes;
step thirteen: and finally, packaging, wherein the packaging bag is required to be vacuumized and is made of a PVC material.
2. The method for cleaning the semiconductor grade quartz ring according to claim 1, wherein the specific method for rinsing with pure water in the second step is as follows: each product needs to be washed for 5-10 seconds and 3-6 times.
3. The method for cleaning the semiconductor grade quartz ring according to claim 1, wherein the specific method for rinsing with pure water in the fourth step is as follows: rinsing time is 5-10 seconds, and overflow speed is 5-10L/min.
4. The method as claimed in claim 1, wherein the acid component in the step five is hydrofluoric acid with concentration of 5-10%, and the soaking time is 10-20 min.
5. The method for cleaning the semiconductor grade quartz ring according to claim 1, wherein the ultrasonic intensity in the first ultrasonic cleaning in the seventh step is controlled to be 40-60W/m2The overflow speed is 5-10L/min, and the cleaning time is controlled at 40-60 minutes.
6. A cleaning method of a semiconductor grade quartz ring according to claim 1, characterized in that the second cleaning head (11) comprises a second arc-shaped plate (21) and a second mounting plate (22);
one end, far away from the second mounting plate (22), of the second arc-shaped plate (21) is fixedly connected with the end part of the support rod (6), a second connecting rod (30) is symmetrically arranged on one side of the second arc-shaped plate (21), one end of the second connecting rod (30) is rotatably connected with the second arc-shaped plate (21) through a torsion spring, a second stabilizing groove (28) is symmetrically formed in one side, close to the second arc-shaped plate (21), of the second mounting plate (22), second stabilizing blocks (29) are symmetrically arranged in the second stabilizing groove (28), the second stabilizing blocks (29) are slidably connected in the second stabilizing groove (28), and one end, far away from the second arc-shaped plate (21), of the second connecting rod (30) is rotatably connected with two second stabilizing blocks (29) in the corresponding second stabilizing groove (28) respectively;
and a second cleaning brush (23) is arranged on one side, away from the second arc-shaped plate (21), of the second mounting plate (22), and the second cleaning brush (23) is matched with the outer side of the product body (16).
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110565279.8A CN113231372B (en) | 2021-05-24 | 2021-05-24 | Cleaning method of semiconductor-grade quartz ring |
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| CN202110565279.8A CN113231372B (en) | 2021-05-24 | 2021-05-24 | Cleaning method of semiconductor-grade quartz ring |
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| CN113231372B true CN113231372B (en) | 2022-01-14 |
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| US20040216254A1 (en) * | 2003-05-02 | 2004-11-04 | Trojan Technologies Inc. | Sectoral ring brush |
| CN109047218A (en) * | 2018-07-12 | 2018-12-21 | 安徽三弟电子科技有限责任公司 | A kind of cup cleaning device for inner wall of gas regulating |
| CN109013526A (en) * | 2018-07-25 | 2018-12-18 | 中国建筑材料科学研究总院有限公司 | The cleaning method of quartz glass pendulum |
| CN109013427A (en) * | 2018-09-14 | 2018-12-18 | 深圳市旭隆珠宝首饰有限公司 | A kind of ring cleaning device |
| CN109604245A (en) * | 2018-12-04 | 2019-04-12 | 芜湖通潮精密机械股份有限公司 | A kind of organic glass surface contaminant cleaning treatment method |
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