CN113219569A - Structure for generating circular dichroism signals by noble metal structure and preparation method thereof - Google Patents
Structure for generating circular dichroism signals by noble metal structure and preparation method thereof Download PDFInfo
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
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Abstract
The application relates to a structure for generating a circular dichroism signal by a noble metal structure and a preparation method thereof, in particular to the field of circular dichroism signal structures. The structure provided by the application comprises: the first structural layer and the second structural layer are complementary structures and are both noble metal structures, so that free electrons in the first structural layer and the second structural layer are coupled with light under the action of the light, namely the first structural layer and the second structural layer are excited by the light to generate surface plasmons, and the surface plasmons enable circular dichroism signals of the structure to be much stronger than those of a chiral structure in the nature, namely the structure can generate more circular dichroism signals.
Description
Technical Field
The application relates to the field of circular dichroism signal structures, in particular to a structure for generating a circular dichroism signal by a noble metal structure and a preparation method thereof.
Background
Chirality exists widely in nature and if an object is different from its mirror image, it is called "chiral" and its mirror image is not coincident with the original object, as if the left and right hands were mirror images of each other and could not be superimposed. Chirality is an essential feature of life processes.
Circular dichroism spectroscopy (circular dichroism for short) is the most widely used method for measuring chirality, and is a rapid, simple and accurate method for studying chiral conformation. The plasmon chiral nano structure can be measured in a solution state, is closer to the physiological state, is quick, simple and convenient to measure, and is an important means for researching chirality, so that the plasmon chiral nano structure is widely applied to chiral detection.
However, the mechanism for generating circular dichroism in the related art is complicated and generates a small number of circular dichroism signals, and thus a structure that can generate a large number of circular dichroism signals with a simple structure is required.
Disclosure of Invention
The present invention is directed to provide a structure for generating circular dichroism signals by using a noble metal structure and a method for manufacturing the same, which solve the problems of the prior art that the mechanism for generating circular dichroism is complicated and the generated circular dichroism signals are small, and thus a structure capable of generating a large number of circular dichroism signals with a simple structure is required.
In order to achieve the above purpose, the embodiment of the present invention adopts the following technical solutions:
in a first aspect, the present application provides a noble metal structure for generating a circular dichroism signal, the structure comprising: first structural layer, photoresist layer and second structural layer, the both sides of photoresist layer are provided with first structural layer and second structural layer respectively, and first structural layer and second structural layer are mutual complementary structure, and first structural layer includes the nanometer structure portion that a plurality of cycles set up, and nanometer structure portion includes: the first nano-structure block and the second nano-structure block are arranged on two sides of the nanowire respectively and are arranged in a non-axisymmetric structure, and photoresist is filled in a gap in the second structure layer, wherein the first structure layer and the second structure layer are made of noble metal materials.
Optionally, the nanowire has a width of 40nm to 140 nm.
Optionally, the photoresist layer has a thickness of 40nm to 140 nm.
Optionally, the first nanostructure mass and the second nanostructure mass of the nanostructure portion are rectangular or parallelogram in shape.
Optionally, the number of the first nanostructure mass and the second nanostructure mass of the nanostructure portion is 1 or 2.
Optionally, the first and second nanostructure blocks of the nanostructure portion are inclined to the direction of the second structure layer.
In a second aspect, the present application provides a method for preparing a structure of a noble metal structure generating a circular dichroism signal, the method for preparing the structure of the noble metal structure generating the circular dichroism signal according to any one of the first aspect, the method comprising:
coating photoresist on one side of a glass substrate by using a photoresist spinner;
drying the photoresist on one side of the photoresist layer, and etching the photoresist on one side of the photoresist layer according to a preset image by using an electron beam exposure technology;
fixing the etched substrate by using a developing solution, and drying;
and vertically evaporating a metal structure according to the shape etched on one side of the photoresist layer by using an evaporation coating machine to obtain a first structure layer, the photoresist layer and a second structure layer.
Optionally, the step of coating the photoresist on one side of the glass substrate by using a spin coater further comprises:
ultrasonically cleaning the glass substrate with deionized water for 15min, ultrasonically cleaning the glass substrate with acetone for 15min, ultrasonically cleaning the glass substrate with alcohol for 15min, ultrasonically cleaning the glass substrate with deionized water for 5min, and blow-drying the glass substrate with a nitrogen gun.
Optionally, the developing solution is a mixed solution of tetramethylcyclopentanone and isopropanol in a volume ratio of 3: 1.
The invention has the beneficial effects that:
the application provides a noble metal structure produces structure of circular dichroism signal, and the structure includes: first structural layer, photoresist layer and second structural layer, the both sides of photoresist layer are provided with first structural layer and second structural layer respectively, and first structural layer and second structural layer are mutual complementary structure, and first structural layer includes the nanometer structure portion that a plurality of cycles set up, and nanometer structure portion includes: the nano-structure comprises a first nano-structure block, a second nano-structure block and a nanowire, wherein the first nano-structure block and the second nano-structure block are respectively arranged at two sides of the nanowire, the first nano-structure block and the second nano-structure block are distributed in a non-axisymmetric structure, and photoresist is filled in a gap in the second structure layer, wherein the first structure layer and the second structure layer are made of noble metal materials; when the light irradiates on the first structural layer or the second structural layer of the structure of the application, because the first structural layer and the second structural layer are both noble metal structures, under the action of the light, free electrons in the first structural layer and the second structural layer are coupled with the light, namely the light excites the first structural layer and the second structural layer to generate surface plasmons, and the surface plasmons resonance enables the circular dichroism signal of the structure of the application to be much stronger than that of a chiral structure in the nature, namely the structure of the application can generate more circular dichroism signals.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
Fig. 1 is a schematic structural diagram of a structure of a metal structure for generating a circular dichroism signal according to an embodiment of the present invention;
FIG. 2 is a schematic top view of a metal structure for generating a circular dichroism signal according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a nanostructure portion of a metal structure for generating a circular dichroism signal according to an embodiment of the present invention;
FIG. 4 is a transmission spectrum of a metal structure generating a circular dichroism signal according to an embodiment of the present invention;
FIG. 5 is a circular dichroism spectrum of a metal structure producing a circular dichroism signal according to one embodiment of the present invention;
FIG. 6 is a diagram illustrating charge distribution under left-handed circular polarized light illumination of a metal structure for generating a circular dichroism signal according to an embodiment of the present invention;
fig. 7 is a diagram illustrating a charge distribution under right-handed circularly polarized light irradiation of a structure in which a metal structure generates a circular dichroism signal according to an embodiment of the present invention.
Icon: 10-a first structural layer; 11-a first nanostructure mass; 12-a second nanostructure mass; 13-a nanowire; 20-a second structural layer; 30-photoresist layer.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are one embodiment of the present invention, and not all embodiments. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or the orientations or positional relationships that the products of the present invention are conventionally placed in use, and are only used for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.
Furthermore, the terms "horizontal", "vertical" and the like do not imply that the components are required to be absolutely horizontal or pendant, but rather may be slightly inclined. For example, "horizontal" merely means that the direction is more horizontal than "vertical" and does not mean that the structure must be perfectly horizontal, but may be slightly inclined.
In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
In order to make the implementation of the present invention clearer, the following detailed description is made with reference to the accompanying drawings.
Fig. 1 is a schematic structural diagram of a structure of a metal structure for generating a circular dichroism signal according to an embodiment of the present invention; FIG. 2 is a schematic top view of a metal structure for generating a circular dichroism signal according to an embodiment of the present invention; FIG. 3 is a schematic diagram of a nanostructure portion of a metal structure for generating a circular dichroism signal according to an embodiment of the present invention; as shown in fig. 1, 2 and 3, the present application provides a structure for generating a circular dichroism signal by a noble metal structure, the structure comprising: first structural layer 10, photoresist layer 30 and second structural layer 20, the both sides of photoresist layer 30 are provided with first structural layer 10 and second structural layer 20 respectively, and first structural layer 10 and second structural layer 20 are mutual complementary structure, and first structural layer 10 includes the nanometer structure portion that a plurality of periods set up, and nanometer structure portion includes: the nano-structure comprises a first nano-structure block 11, a second nano-structure block 12 and a nanowire 13, wherein the first nano-structure block 11 and the second nano-structure block 12 are respectively arranged at two sides of the nanowire 13, the first nano-structure block 11 and the second nano-structure block 12 are arranged in a non-axisymmetric structure, photoresist is filled in a gap in a second structure layer 20, and the first structure layer 10 and the second structure layer 20 are made of noble metal materials.
The structure of the present application includes a first structural layer 10, a second structural layer 20 and a photoresist layer 30, where the first structural layer 10 and the second structural layer 20 are respectively disposed on two sides of the photoresist layer 30, where the first structural layer 10 and the second structural layer 20 are mutually complementary structures, that is, if the first structural layer 10 is a circle, the structure of the second structural layer 20 is located in a circle with a radius the same as that of the first structural layer 10, and can fill the circle in the first structural layer 10, a specific structure of the first structural layer 10 includes a plurality of periodically disposed nanostructure portions, the nanostructure portions include a first nanostructure block 11, a second nanostructure block 12 and a nanowire 13, the first nanostructure block 11 and the second nanostructure block 12 are respectively disposed on two sides of the nanowire 13, and the first nanostructure block 11 and the second nanostructure block 12 are arranged in a non-axisymmetric structure, that is, the first nanostructure mass 11 and the second nanostructure mass 12 are not symmetrically disposed, the size and specific geometric parameters of the first nanostructure mass 11 and the second nanostructure mass 12 are determined according to actual needs, and are not specifically limited herein, the number of periodically disposed nanostructure portions in the first structure layer 10 is determined according to actual needs, generally, the number of nanostructure portions is 4, 9, 16, and the like natural numbers, for convenience of description, the number of nanostructure portions is four, four identical nanostructure portion periods are disposed in the first structure layer 10, that is, four nanostructure portions 2 are disposed, and since the second structure layer 20 and the first structure layer 10 are complementary structures, the second structure layer 20 should also include four structure periods complementary to the nanostructure portions respectively, that is, since the first structure layer 10 is composed of four nanostructure portions, each nanostructure portion includes a first nanostructure block 11, a second nanostructure block 12, and a nanowire 13, which means that a hole is formed inside the first structure layer 10, the shape of the hole is the shape of the second structure layer 20, in the second structure layer 20, the projection of the first structure layer 10 on the second structure layer 20 is a hole or a gap, and the inside of the hole or the gap is filled with a photoresist, that is, the structure of the present application is specifically that the gap of the second structure layer 20 is filled with a photoresist, and the photoresist and the side of the second structure layer 20 away from the first structure layer 10 are in a plane, the side of the second structure layer 20 close to the first structure layer 10 is further provided with the photoresist layer 30, the side of the photoresist layer 30 away from the second structure layer 20 is provided with the first structure layer 10, the first structure layer 10 and the second structure layer 20 are complementary structures, in practical applications, the materials of the first structural layer 10 and the second structural layer 20 may be any single noble metal of noble metals, or a mixed noble metal material composed of multiple noble metals of noble metals, and if the materials of the first structural layer 10 and the second structural layer 20 are mixed noble metal materials composed of multiple noble metals, the ratio between the noble metal species in the mixed noble metal material and the noble metals of each species is determined according to actual needs, and is not specifically limited herein; when the light is irradiated on the first structural layer 10 or the second structural layer 20 of the structure of the present application, since the first structural layer 10 and the second structural layer 20 are both noble metal structures, free electrons in the first structural layer 10 and the second structural layer 20 are coupled with light under the action of light by the first structural layer 10 and the second structural layer 20, that is, the first and second structural layers 10 and 20 are optically excited to generate surface plasmons, which make the circular dichroism signal of the structure of the present application much stronger than that of a chiral structure in the natural world, i.e., the structure of the present application can generate more circular dichroism signals, and since the structure of the present application includes only the first structural layer 10, the photoresist layer 30 and the second structural layer 20, the structure is simpler, and the purposes of simple structure and more circular dichromatic signals are realized.
The circular dichroism signal refers to the difference between the absorption/transmittance of electromagnetic waves in two polarization states when LCP and RCP pass through the chiral structure.
Optionally, the width of the nanowire 13 is 40nm-140 nm.
The width of the nanowire 13 may be 40nm, may also be 140nm, and may also be any size between 40nm and 140nm, which is not specifically limited herein.
Optionally, the photoresist layer 30 has a thickness of 40nm to 140 nm.
The thickness of the photoresist layer 30 may be 40nm, 140nm, or any size between 40nm and 140nm, which is not limited herein
Alternatively, the first nanostructure mass 11 and the second nanostructure mass 12 of the nanostructure portion are rectangular or parallelogram in shape.
The first nanostructure block 11 and the second nanostructure block 12 of the nanostructure portion may be rectangular or parallelogram-shaped, and if the first nanostructure block 11 and the second nanostructure block 12 of the nanostructure portion are rectangular, the gap between the first nanostructure block 11 and the second nanostructure block 12 is also rectangular, that is, the structure inside the second structure layer 20 is also rectangular; if the first nanostructure block 11 and the second nanostructure block 12 of the nanostructure portion are parallelogram, the gap between the first nanostructure block 11 and the second nanostructure block 12 is also parallelogram, that is, the structure inside the second structure layer 20 is also parallelogram, the first nanostructure block 11 and the second nanostructure block 12 of the parallelogram are disposed in an inclined manner, and the inclined first nanostructure block 11 and the second nanostructure block 12 can make the left and right charges distributed more in the z direction, so that the SPP coupled to the lower layer is stronger, the transmittance of the left-handed light is improved, and the circular dichroism signal is larger.
FIG. 4 is a transmission spectrum of a metal structure generating a circular dichroism signal according to an embodiment of the present invention; FIG. 5 is a circular dichroism spectrum of a metal structure producing a circular dichroism signal according to one embodiment of the present invention; as shown in fig. 4 and 5, for further explanation, the shapes of the first nanostructure mass 11 and the second nanostructure mass 12 of the nanostructure portion are illustrated as rectangles, and the transmission spectrum and the CD spectrum of the structure in which a noble metal structure generates a circular dichromatic signal, where T-represents the transmission spectrum under left-handed circularly polarized light irradiation, T + + represents the transmission spectrum under right-handed circularly polarized light irradiation, and CD ═ T — T + +. The calculated parameters are: the period Px is 500nm, the interval between the upper and lower layers is 80nm, and the thickness of the metal structure is 100 nm. The two rectangular blocks are staggered by 160 nm. The width of the nanowire 13 is 100 nm.
As shown in fig. 4 and 5, a large difference in transmittance of the two resonance modes I and II is generated. As shown in fig. 5, both patterns I and II, respectively, produced two CD signals, with the CD value of pattern II reaching 20%. In mode II, the transmittance under left-handed circularly polarized light irradiation is very high because the left-handed circularly polarized light irradiation structurally excites the Surface Plasmon Polaritons (SPPs) mode.
FIG. 6 is a diagram illustrating charge distribution under left-handed circular polarized light illumination of a metal structure for generating a circular dichroism signal according to an embodiment of the present invention; as shown in fig. 6, the four portions in fig. 6 sequentially represent, from left to right, the charge distribution of the four surfaces of the structure perpendicular to the incident light, from top to bottom, of the metal structure, which respectively represent the first surface, the second surface, the third surface and the fourth surface under the irradiation of left-handed circularly polarized light, and it can be seen from the figure that positive charges are distributed on one side of the four surfaces of the structure, and negative charges are distributed on the other side of the structure, so that the SPPs mode propagates from left to right. Also, the mutual coupling between the first structural layer 10 and the second structural layer 20, the SPP mode resonance on the surface of the first structural layer 10 and the surface of the second structural layer 20 is enhanced more, so there is a greater transmission. The transmittance is low under the irradiation of the right-handed circularly polarized light due to the fact that the right-handed circularly polarized light irradiates a local surface plasmon resonance (LSP) excited on the structure; FIG. 7 is a diagram illustrating the distribution of charges under right-handed circular polarized light irradiation of a structure for generating a circular dichroism signal by a metal structure according to an embodiment of the present invention; as shown in fig. 7, the four portions in fig. 7 sequentially represent, from left to right, four surfaces of the metal structure perpendicular to incident light, from top to bottom, a charge distribution of the first surface, the second surface, the third surface and the fourth surface under the irradiation of right-handed circularly polarized light, respectively, and the transmittance is low. The difference in mode between left-handed circularly polarized light illumination and right-handed circularly polarized light illumination results in a larger CD signal. That is, the structure provided by the application can generate the maximum value of the transmitted circular dichroism signal which can reach 20%. The CD signal is mainly due to the SPPs mode formed under left-handed light irradiation and the LSP mode formed under right-handed light irradiation, and the SPPs mode has high transmittance, and thus a large CD signal is generated. And, a new mechanism or idea is provided for generating CDs.
Alternatively, the number of the first nanostructure bulk 11 and the second nanostructure bulk 12 of the nanostructure portion is 1 or 2.
The number of the first nanostructure block 11 and the second nanostructure block 12 of the nanostructure portion may be one or two, if the number of the first nanostructure block 11 and the second nanostructure block 12 of the nanostructure portion of the first structural layer 10 is two, two rectangular blocks are disposed on one side of the nanowire 13, one rectangular block is disposed on the other side of the nanowire 13, and the second structural layer 20 is a complementary structure of the first structural layer 10. The plurality of rectangular blocks can make the left and right charges distributed more in the y direction, so that the SPP mode coupled to the second structural layer 20 is stronger, the transmissivity of the left light is improved, and the CD signal is larger
Alternatively, the first nanostructure mass 11 and the second nanostructure mass 12 of the nanostructure portion are inclined to the direction of the second structure layer 20.
The first nanostructure block 11 and the second nanostructure block 12 of the nanostructure portion are inclined toward the second structure layer 20, that is, the first nanostructure block 11 and the second nanostructure block 12 of the nanostructure portion are inclined downward, that is, the charges collected between the first structure layer 10 and the second structure layer 20 are more, so that the resonance of the SPP mode is stronger, the transmittance of the left-handed light is improved, and the CD signal is larger.
The application provides a noble metal structure produces structure of circular dichroism signal, and the structure includes: first structural layer 10, photoresist layer 30 and second structural layer 20, the both sides of photoresist layer 30 are provided with first structural layer 10 and second structural layer 20 respectively, and first structural layer 10 and second structural layer 20 are mutual complementary structure, and first structural layer 10 includes the nanometer structure portion that a plurality of periods set up, and nanometer structure portion includes: the structure comprises a first nanostructure block 11, a second nanostructure block 12 and a nanowire 13, wherein the first nanostructure block 11 and the second nanostructure block 12 are respectively arranged at two sides of the nanowire 13, the first nanostructure block 11 and the second nanostructure block 12 are arranged in a non-axisymmetric structure, a gap in a second structure layer 20 is filled with photoresist, and the first structure layer 10 and the second structure layer 20 are made of noble metal materials; when the light is irradiated on the first structural layer 10 or the second structural layer 20 of the structure of the present application, since the first structural layer 10 and the second structural layer 20 are both noble metal structures, free electrons in the first structural layer 10 and the second structural layer 20 are coupled with light under the action of light by the first structural layer 10 and the second structural layer 20, that is, the first and second structural layers 10 and 20 are optically excited to generate surface plasmons, which make the circular dichroism signal of the structure of the present application much stronger than that of a chiral structure in the natural world, i.e., the structure of the present application can generate more circular dichroism signals, and since the structure of the present application includes only the first structural layer 10, the photoresist layer 30 and the second structural layer 20, the structure is simpler, and the purposes of simple structure and more circular dichromatic signals are realized.
The application provides a preparation method of a structure of a noble metal structure for generating a circular dichroism signal, which is used for preparing the structure of any one of the noble metal structures for generating the circular dichroism signal, and the method comprises the following steps:
coating photoresist on one side of a glass substrate by using a photoresist spinner;
drying the photoresist on one side of the photoresist layer, and etching the photoresist on one side of the photoresist layer according to a preset image by using an electron beam exposure technology;
fixing the etched substrate by using a developing solution, and drying;
and vertically evaporating a metal structure according to the shape etched on one side of the photoresist layer by using an evaporation coating machine to obtain a first structure layer, the photoresist layer and a second structure layer.
Optionally, the step of coating the photoresist on one side of the glass substrate by using a spin coater further comprises:
ultrasonically cleaning the glass substrate with deionized water for 15min, ultrasonically cleaning the glass substrate with acetone for 15min, ultrasonically cleaning the glass substrate with alcohol for 15min, ultrasonically cleaning the glass substrate with deionized water for 5min, and blow-drying the glass substrate with a nitrogen gun.
Optionally, the developing solution is a mixed solution of tetramethylcyclopentanone and isopropanol in a volume ratio of 3: 1.
The structure of the present application is specifically prepared by a method comprising: step 1, preparing a substrate: preparing a glass substrate, cleaning and blow-drying; ITO glass with thickness of 1.0mm and length and width dimensions of 20.0 mm. Performing ultrasonic treatment with deionized water for 15min, performing ultrasonic treatment with acetone for 15min, performing ultrasonic treatment with alcohol for 15min, performing ultrasonic treatment with deionized water for 5min, blow-drying with nitrogen gun, and placing in nitrogen cabinet; step 2, coating photoresist: coating PMMA photoresist on the glass substrate prepared in the step 1 by using a spin coater; step 3, drying after gluing: putting the substrate coated with the PMMA photoresist in the step 2 on a hot plate for drying; the drying temperature is 150 ℃ and the drying time is 3 min; step 4, electron beam exposure of structural patterns: designing the pattern of the white area in the staggered parallel plate figure 1 (right side) by using a pattern generator, and exposing the pattern by using an electron beam to obtain an exposed substrate; during exposure, etching the PMMA photoresist of the pattern part of the structure by using an electron beam; and step 5, developing: and (4) at normal temperature, putting the substrate exposed in the step (4) into a developing solution for soaking and developing, wherein the developing time is 60 s. The developing solution is prepared by mixing tetramethylcyclopentanone and isopropanol according to the volume ratio of 3: 1; step 6, fixing: placing the substrate subjected to soaking and developing in the step 5 into a fixing solution for soaking and fixing, taking out the substrate after fixing is finished, and drying by using nitrogen; the time for soaking and fixing is 30 s; and 7, drying after fixing: putting the substrate which is soaked and fixed in the step 6 and dried in the air on a hot plate for drying; step 8, metal evaporation: and (4) putting the substrate which is dried after the fixation in the step (7) into an electron beam vacuum evaporation coating machine, and vertically evaporating a first layer of noble metal.
The preparation method of the structure for generating the circular dichroism signal by the noble metal structure has the following specific beneficial effects: by providing the preparation method for generating the circular dichroism signal by the noble metal structure, the double-layer chiral noble metal structure can be obtained by etching for multiple times through dry etching only once without alignment, and a new method is provided for preparing the chiral structure.
The above is only a preferred embodiment of the present invention, and is not intended to limit the present invention, and various modifications and changes will occur to those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (9)
1. A noble metal structure for generating a circular dichroism signal, the structure comprising: first structural layer, photoresist layer and second structural layer, the both sides of photoresist layer are provided with respectively first structural layer with the second structural layer, just first structural layer with the second structural layer is mutual complementary structure, first structural layer includes the nanometer structure portion that a plurality of periods set up, nanometer structure portion includes: first nanostructure piece, second nanostructure piece and nano wire, first nanostructure piece with the second nanostructure piece sets up respectively the both sides of nano wire, just first nanostructure piece with the second nanostructure piece is arranged for non-axisymmetric structure, it has the photoresist to fill in the clearance in the second structural layer, wherein, first structural layer with the material of second structural layer is noble metal material.
2. The noble metal structure producing a circular dichroism signal structure of claim 1, wherein the nanowire has a width of 40nm to 140 nm.
3. The noble metal structure of claim 2, wherein the photoresist layer has a thickness of 40nm to 140 nm.
4. The structure for generating a circular dichroism signal according to claim 3, wherein the first nanostructure mass and the second nanostructure mass of the nanostructure portion have a rectangular shape or a parallelogram shape.
5. The structure for generating a circular dichroism signal according to claim 4, wherein the number of the first nanostructure mass and the second nanostructure mass of the nanostructure portion is 1 or 2.
6. The structure of claim 5, wherein the first nanostructure mass and the second nanostructure mass of the nanostructure portion are tilted in the direction of the second structure layer.
7. A method for preparing a structure of a noble metal structure generating a circular dichroism signal, the method being used for preparing the structure of the noble metal structure generating the circular dichroism signal according to any one of claims 1 to 6, and the method comprising:
coating photoresist on one side of a glass substrate by using a photoresist spinner;
drying the photoresist on one side of the photoresist layer, and etching the photoresist on one side of the photoresist layer according to a preset image by using an electron beam exposure technology;
fixing the etched substrate by using a developing solution, and drying;
and vertically evaporating a metal structure according to the shape etched on one side of the photoresist layer by using an evaporation coating machine to obtain a first structure layer, the photoresist layer and a second structure layer.
8. The method of claim 7, wherein the step of coating the photoresist on the side of the glass substrate using a photoresist spinner is preceded by the steps of:
ultrasonically cleaning the glass substrate with deionized water for 15min, ultrasonically cleaning the glass substrate with acetone for 15min, ultrasonically cleaning the glass substrate with alcohol for 15min, ultrasonically cleaning the glass substrate with deionized water for 5min, and finally blow-drying the glass substrate with a nitrogen gun.
9. The method of claim 8, wherein the developing solution is a mixture of tetramethylcyclopentanone and isopropanol at a volume ratio of 3: 1.
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