CN113186491A - 一种红外发射率连续可调的复合层及其应用 - Google Patents
一种红外发射率连续可调的复合层及其应用 Download PDFInfo
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Abstract
本发明提供一种红外发射率连续可调的复合层及其应用,所述红外发射率连续可调的复合层,包括基底层和包覆于所述基底层表面的薄膜层;所述基底层的厚度大于1mm,所述薄膜层的厚度在1~1000nm范围内可调。本发明基于红外辐射在不同材料中的穿透深度不同,通过控制表面薄膜层的厚度小于3‑5μm和8‑14μm波段红外线的穿透深度,使得薄膜层材料在该波段对红外的吸收受厚度变化的控制,从而通过改变表面薄膜层的厚度获得红外发射率连续可调的复合层。使用该复合层调节红外发射率,相较于传统的在物体表面制作不同发射率的涂层,成本更低,且易于控制和实现,对节能减排、红外隐身等应用具有重要意义。
Description
技术领域
本发明涉及功能材料技术领域,尤其涉及一种红外发射率连续可调的复合层及其应用。
背景技术
自红外辐射被英国天文学家威廉〃赫谢尔通过测量手段证实以来,红外物理与技术受到各国学者的重视并不断发展,在安全生产工程、军事以及日常生活等方面得到了广泛应用。如红外辐射节能涂料通过提高炉膛的辐射率,强化炉内辐射传热作用,有效改善传热过程,达到节能的作用。
根据应用方向的不同,需要对物体红外辐射出射度进行调控。由斯蒂芬-玻尔兹曼定律:M=εσT4(其中ε为物体发射率,σ为斯蒂芬-玻尔兹曼常数,T为物体绝对温度)可知,红外辐射出射度与ε和T的4次方成正比,因此通过调节物体的温度与发射率可以实现对辐射出射度的调节。现有改变辐射出射度最常用的方法是在物体表面制作不同发射率的涂层。
目前的红外涂料主要是通过改变涂料中颜料与粘结剂的比例来实现对涂料发射率的调节,但这种调节方式是不连续的,且需要大量前期实验来得到满足发射率要求的涂料,成本较高。
发明内容
针对现有技术存在的不足,本发明提供一种红外发射率连续可调的复合层及其应用。
本发明采用以下技术方案:
本发明提供一种红外发射率连续可调的复合层,包括基底层和包覆于所述基底层表面的薄膜层;所述基底层的厚度大于1mm,所述薄膜层的厚度在1~1000nm范围内可调。
本发明基于红外辐射在不同材料中的穿透深度不同,通过控制表面薄膜层的厚度小于3-5μm和8-14μm波段红外线的穿透深度,使得薄膜层材料在该波段对红外的吸收受厚度变化的控制,从而通过改变表面薄膜层的厚度即可获得红外发射率连续可调的复合层。具体应用中,可根据应用方向的不同,对薄膜层的厚度进行控制。
本发明中,穿透深度的定义为电磁波辐射强度降至入射到材料表面时辐射强度的1/e时,电磁波在材料中传播的距离。
进一步地,所述基底层与所述薄膜层在3-5μm和8-14μm波段的红外发射率相差0.6以上,可以使复合层调节红外发射率的范围更大。理论分析结果表明,本发明的复合层在3~5μm和8~14μm波段可实现红外发射率0.1~0.9的连续可调。
在本发明的一个优选实施方式中,所述基底层为聚氨酯海绵、蜜胺泡绵等弹性多孔材料,所述薄膜层为金属。优选地,所述金属为金、银、铜或铂,所述薄膜层的厚度为1~450nm。
本发明发现,基底层选用聚氨酯海绵或蜜胺泡绵,薄膜层选用金属,则复合层整体实现红外发射率调节时,薄膜层的厚度可调范围比较宽,也就是说,通过调节薄膜层厚度实现红外发射率调节的制备条件不苛刻,即更容易实现红外发射率的连续可调。
在本发明的另一个优选实施方式中,所述基底层为金属,所述薄膜层为石墨或硼。
本发明发现,基底层选用金属,薄膜层选用石墨或硼,不仅基底层与薄膜层之间具有较好的结合强度,不易互相脱落,而且可以实现红外发射率的上调,以便应用于辐射散射方面,同时,红外发射率变化速度与薄膜层厚度变化速度相协调,从而更易实现红外发射率的连续可调。
上述技术方案中,优选地,采用沉积法在所述基底层的表面包覆所述薄膜层。
进一步地,所述薄膜层选用金属材料时,采用磁控溅射法或电子束蒸发的方式进行沉积;
所述薄膜层选用非金属材料时,采用热蒸发、电子束蒸发或磁控溅射的方式进行沉积。
进一步地,进行沉积前,对所述基底层进行清洗,所述清洗包括依次使用丙酮、乙醇以及去离子水超声清洗。
本发明还提供上述红外发射率连续可调的复合层在红外领域中的应用。具体应用领域包括红外隐身、辐射散热、节能门窗等方面。即在需要进行红外发射率调控时,可将该复合层单独应用,或将该复合层设置在物体表面后连同物体一起应用。例如,需要利用辐射散热时,则需将目标的红外发射率控制在0.9以上,此时可利用上述的复合层,基底层采用不锈钢,薄膜层采用石墨,然后通过调节薄膜层的厚度,达到目标发射率,即得到所需的辐射散热能力。
进一步地,将所述复合层设置在所述物体表面的方法包括焊接、铆接等固定连接方式,也可为铰接等可拆卸连接方式。
本发明提供了一种红外发射率连续可调的复合层及其应用,本发明基于红外辐射在不同材料中的穿透深度不同,通过控制表面薄膜层的厚度小于3-5μm和8-14μm波段红外线的穿透深度,使得薄膜层材料在该波段对红外的吸收受厚度变化的控制,从而通过改变表面薄膜层的厚度获得红外发射率连续可调的复合层。使用该复合层调节红外发射率,相较于传统的在物体表面制作不同发射率的涂层,成本更低,且易于控制和实现,对节能减排、红外隐身等应用具有重要意义。
附图说明
图1为本发明实施例中红外发射率连续可调的复合层的结构示意图;
图2为实施例1中实际测得的复合层整体结构在3-5μm和8-14μm波段发射率的调节范围;
图3为实施例2中实际测得的复合层整体结构在3-5μm和8-14μm波段发射率的调节范围;
图4为实施例3中实际测得的复合层整体结构在3-5μm和8-14μm波段发射率的调节范围。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚,下面对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
实施例1
本实施例提供一种红外发射率连续可调的复合层,其结构示意图如图1所示,由基底层和包覆于基底层表面的薄膜层组成。
其中,基底层为聚氨酯海绵,厚度为5mm。
薄膜层为金属铜,厚度为1~450nm。
本实施例中薄膜层通过磁控溅射的方式沉积在基底层表面。
沉积过程中,逐渐增加薄膜层厚度,从而实现复合层的红外发射率连续调节。当复合层的应用方向明确时,可根据应用方向确定目标红外发射率,从而在调节薄膜层厚度过程中,一旦达到目标红外发射率则停止改变薄膜层厚度。或者,也可以先获得该复合层的红外发射率与薄膜层厚度之间的关系曲线图,之后在应用过程中,根据目标红外发射率获知相应薄膜层厚度,再行制备。
根据本实施例中使用的复合层整体结构,测试其在薄膜层金属铜厚度变化时3-5μm和8-14μm波段的红外发射率(采用便携式红外光谱发射率仪测试),结果如图2所示,可以看出,本实施例最终实现的红外发射率调节范围为0.3~0.9。
本实施例提供的红外发射率连续可调的复合层,相较于传统的在物体表面制作不同发射率的涂层,成本更低,且易于控制和实现。具体来说,传统的在物体表面制作不同发射率的涂层,需要不断改变颜料和粘结剂的比例甚至是选用种类来实现发射率的改变,实验过程繁琐且重复性差,而且很难实现发射率的连续调节。而本实施例设置好适当的磁控溅射参数,只需调节磁控溅射时间即可获得红外发射率连续可调的复合层,而且本实施例中选用了较为匹配的基底层和薄膜层,使得薄膜层厚度可调范围较宽,从而在实际应用中为获取目标红外发射率时,薄膜层的厚度可在一定范围内浮动,而不是必须为某一个纳米级的点值,这使目标红外发射率的获得易于实现和控制,降低了对制备条件和设备的苛刻要求。
实施例2
本实施例提供一种红外发射率连续可调的复合层,由基底层和包覆于基底层表面的薄膜层组成。
其中,基底层为304不锈钢,厚度为2mm。
薄膜层为石墨,厚度为1~10nm。
本实施例中薄膜层通过电子束蒸发的方式沉积在基底层表面。沉积过程中,随着薄膜层厚度的逐渐增加,从而实现复合层的红外发射率连续调节。
根据本实施例中使用的复合层整体结构,测试其在石墨层厚度变化时3-5μm和8-14μm波段的红外发射率,结果如图3所示,可以看出,本实施例最终实现的红外发射率调节范围为3-5μm的0.16~0.25和8-14μm的0.08~0.11。
需要说明的是,本实施例中调节范围偏小的主要原因是表面石墨层厚度变化范围较小。实际操作中,石墨层的厚度可继续变厚,本实施例中发明人主要为论证其可行性,故只做了厚度为1~10nm的情形。
实施例3
本实施例提供一种红外发射率连续可调的复合层,由基底层和包覆于基底层表面的薄膜层组成。
其中,基底层为蜜胺泡绵,厚度为5mm。
薄膜层为金属金,厚度为1~160nm。
本实施例中薄膜层通过磁控溅射的方式沉积在基底层表面。
沉积过程中,逐渐增加薄膜层厚度,从而实现复合层的红外发射率连续调节。当复合层的应用方向明确时,可根据应用方向确定目标红外发射率,从而在调节薄膜层厚度过程中,一旦达到目标红外发射率则停止改变薄膜层厚度。或者,也可以先获得该复合层的红外发射率与薄膜层厚度之间的关系曲线图,之后在应用过程中,根据目标红外发射率获知相应薄膜层厚度,再行制备。
根据本实施例中使用的复合层整体结构,测试其在薄膜层金属金厚度变化时3-5μm和8-14μm波段的红外发射率,结果如图4所示,可以看出,本实施例最终实现的红外发射率调节范围为0.62~0.95。
最后应说明的是:以上实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的精神和范围。
Claims (10)
1.一种红外发射率连续可调的复合层,其特征在于,包括基底层和包覆于所述基底层表面的薄膜层;所述基底层的厚度大于1mm,所述薄膜层的厚度在1~1000nm范围内可调。
2.根据权利要求1所述的红外发射率连续可调的复合层,其特征在于,所述基底层与所述薄膜层在3-5μm和8-14μm波段的红外发射率相差0.6以上。
3.根据权利要求2所述的红外发射率连续可调的复合层,其特征在于,所述基底层为金属,所述薄膜层为石墨或硼。
4.根据权利要求2所述的红外发射率连续可调的复合层,其特征在于,所述基底层为弹性多孔材料,所述薄膜层为金属。
5.根据权利要求4所述的红外发射率连续可调的复合层,其特征在于,所述金属为金、银、铜或铂,所述薄膜层的厚度为1~450nm。
6.根据权利要求1~5任一项所述的红外发射率连续可调的复合层,其特征在于,采用沉积法在所述基底层的表面包覆所述薄膜层。
7.根据权利要求6所述的红外发射率连续可调的复合层,其特征在于,所述薄膜层选用金属材料时,采用磁控溅射法或电子束蒸发的方式进行沉积;
所述薄膜层选用非金属材料时,采用热蒸发、电子束蒸发或磁控溅射的方式进行沉积。
8.根据权利要求6所述的红外发射率连续可调的复合层,其特征在于,进行沉积前,对所述基底层进行清洗,所述清洗包括依次使用丙酮、乙醇以及去离子水超声清洗。
9.权利要求1~8任一项所述的红外发射率连续可调的复合层在红外领域中的应用,其特征在于,包括将所述复合层单独或设置在物体表面后进行红外发射率调控。
10.根据权利要求9所述的红外发射率连续可调的复合层在红外领域中的应用,其特征在于,将所述复合层设置在所述物体表面的方法包括焊接或铆接。
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