CN113105955A - Decontamination formula and decontamination method for radioactive contamination deposited oxide of primary loop component of AP1000 reactor - Google Patents

Decontamination formula and decontamination method for radioactive contamination deposited oxide of primary loop component of AP1000 reactor Download PDF

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Publication number
CN113105955A
CN113105955A CN202110352285.5A CN202110352285A CN113105955A CN 113105955 A CN113105955 A CN 113105955A CN 202110352285 A CN202110352285 A CN 202110352285A CN 113105955 A CN113105955 A CN 113105955A
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decontamination
reactor
primary loop
loop component
radioactive contamination
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Inventor
牛强
张义
孔祥泉
南小飞
于成龙
段黎明
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Shandong Nuclear Power Co Ltd
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Shandong Nuclear Power Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02Inorganic compounds
    • C11D7/04Water-soluble compounds
    • C11D7/10Salts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02Inorganic compounds
    • C11D7/04Water-soluble compounds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/265Carboxylic acids or salts thereof
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/40Specific cleaning or washing processes
    • C11D2111/44Multi-step processes
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/40Specific cleaning or washing processes
    • C11D2111/46Specific cleaning or washing processes applying energy, e.g. irradiation

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • General Chemical & Material Sciences (AREA)
  • Detergent Compositions (AREA)

Abstract

The invention discloses a decontamination formula and a decontamination method for radioactive contamination deposited oxide of a primary loop component of an AP1000 reactor, wherein the decontamination formula comprises the following components: an oxidizing agent for oxidizing the insoluble lower valent metal oxide of the contaminating deposited oxide to higher soluble ions, a reducing agent for reducing the insoluble higher valent metal oxide of the contaminating deposited oxide to lower soluble ions, and a water-soluble peroxide passivating agent for removing residual reducing agent and producing a passivation film. The decontamination method comprises six steps of oxidation decontamination, rinsing, reduction decontamination, passivation film formation, rinsing and air drying; the decontamination formula and the decontamination method can remove radioactive contamination deposition oxides of a primary loop component of the AP1000 reactor to the maximum extent: the removal rate is more than 99 percent, so that the irradiation dose of operators can be reduced, and the life safety of the operators is guaranteed; meanwhile, the damage to the matrix can be avoided.

Description

Decontamination formula and decontamination method for radioactive contamination deposited oxide of primary loop component of AP1000 reactor
Technical Field
The invention relates to a decontamination formula and a decontamination method for radioactive contamination deposited oxide of a primary loop component of an AP1000 reactor, belonging to the technical field of radioactive contamination decontamination of nuclear power stations.
Background
With the long-term operation of the nuclear power station, radioactive metal oxides containing elements such as chromium, iron and nickel are deposited in a primary circuit of the pressurized water reactor, the level of radioactivity is gradually increased, and the irradiation risk is increased. Due to the requirement of radiation protection, in the shutdown and overhaul period of a nuclear power plant, parts disassembled from equipment overhaul are decontaminated, and metal oxides deposited on the surfaces of the parts are removed, so that the radiation dose of operators is reduced.
Patent CN108806811A describes a method for ambient temperature decontamination of surfaces of nuclear power plant components containing radionuclides in metal oxides, the deposits being partly disintegrated and/or removed by adding elemental metal additives to the aqueous solution, the elemental metal reacting with the iron oxide deposits, causing the release of iron ions from the crystal lattice, releasing complex ions from the deposits.
Patent CN109478437A describes a method for decontaminating metal surfaces in nuclear power plants, the metal oxide layer being contacted with an aqueous solution of an organic acid, an oxidizing agent selected from the group consisting of oxygen, air, hydrogen peroxide and ozone being fed into the decontamination solution to control the dissolution rate of the metal oxide layer. Is suitable for large-scale system decontamination.
Patent CN107418789A describes a radioactive contamination detergent for nuclear facilities and a decontamination method, which uses a mixed solution of potassium permanganate and sodium hydroxide as a decontamination medium to perform ultrasonic decontamination, and the detergent method has the disadvantages that potassium permanganate is reduced to manganese dioxide to cover the metal surface, and the contamination nuclide entering the solution is easy to adsorb and deposit.
The Haiyang nuclear power plant uses an AP1000 reactor. The primary loop of the AP1000 reactor can deposit radioactive metal oxide containing elements such as zinc, chromium, iron, nickel and the like, and the cobalt, the nickel and radioactive nuclides thereof in the chromite on the outer surface of the reactor core are replaced by the zinc to form more stable oxide due to the injection of hydrogen and zinc into the primary loop of the AP1000 reactor. Compared with the oxide deposited in the primary circuit of the common pressurized water reactor nuclear power station, the oxide formed in the primary circuit of the AP1000 nuclear power station is more compact and thinner, the content of zinc elements, cobalt elements and nickel elements in the oxide is relatively reduced, and the physicochemical characteristics of the oxide structure, the chemical composition and the like are changed. Due to the requirement of radiation protection, during shutdown and overhaul of a nuclear power plant, the components disassembled from some equipment overhauls of the AP1000 need to be decontaminated to remove the metal oxides deposited on the surfaces of the components.
The AP1000 reactor is different from common pressurized water reactors such as Qinshan nuclear power stations and the like, and the zinc-adding hydrogenation technology is adopted in one loop, so that the corrosive oxide in the loop is different from other pressurized water reactors, the physicochemical properties of the corrosive oxide are obviously different, and the outer component of the oxide is Fe2O3And Fe3O4The inner layer contains ZnCr2O4With different contents (base material) of ZnO and ZnFe2O4,ZnCr2O4And ZnFe2O4And forming a compact oxide layer on the surface of the substrate. The characteristics of the base material of the American imported equipment adopted by the AP1000 main process equipment are different from those of other domestic pressurized water reactor power stations. Therefore, it is urgently needed to develop a decontamination formula and a process aiming at the characteristics of the base material and the corrosion oxide of the AP1000 primary process equipment, and the requirement is that the corrosion to the base material cannot be more than 1 μm and the intergranular corrosion and the pitting corrosion cannot be generated while the deposited oxide is removed (the removal rate of the deposited oxide is more than 99%).
Disclosure of Invention
The technical problem to be solved by the invention is as follows: the existing radioactive contamination decontamination method can not meet the decontamination requirement of radioactive contamination deposited oxides of a primary loop component of an AP1000 reactor: the efficiency of not damaging the substrate and being capable of removing the deposited oxide is more than 99%.
In order to solve the technical problem, the invention provides a decontamination formula for radioactive contamination deposited oxide of a primary loop component of an AP1000 reactor, which comprises the following steps:
an oxidizing agent for oxidizing insoluble lower valent metal oxides of the contaminant deposition oxide to higher valent soluble ions;
a reducing agent for reducing insoluble higher valent metal oxides in the contaminant deposited oxide to lower valent soluble ions;
and a water-soluble peroxide passivating agent for removing the residual reducing agent and generating a passivation film.
Preferably, the oxidizing agent contains at least one of permanganate, persulfate and pyrosulfate; the reducing agent contains at least one of ascorbic acid, sodium citrate and sodium oxalate; the water-soluble peroxide passivator is hydrogen peroxide.
Preferably, the oxidizing agent comprises at least one of potassium permanganate, potassium persulfate and potassium pyrosulfate.
Preferably, the concentration of the oxidant is 0.3-0.8 wt%, and the pH value is 11-12; the concentration of the reducing agent is 0.3-0.8 wt%, and the pH value is 3-6; the concentration of the water-soluble peroxide passivator is 0.05-0.5 wt%.
The invention also provides a decontamination method for radioactive contamination deposited oxide of the primary loop component of the AP1000 reactor, and the decontamination formula in the scheme is adopted, and the decontamination method comprises six steps of oxidation decontamination, rinsing, reduction decontamination, passivation film forming, rinsing again and air drying to decontaminate the decontamination component.
Preferably, the process conditions of the oxidation decontamination step are as follows: ultrasonic cooperating, the temperature is 50-70 ℃, and the time is 4-6 h.
Preferably, the process conditions of the primary rinsing/secondary rinsing step are as follows: ultrasonic cooperating, the temperature is 50-70 ℃, and the time is 0.25-1 h.
Preferably, the process conditions of the reduction decontamination step are as follows: ultrasonic cooperating, the temperature is 50-70 ℃, and the time is 3-6 h.
Preferably, the process conditions of the passivation film forming step are as follows: ultrasonic cooperation, the temperature is 50-70 ℃, and the time is 0.25-1 h; after the passivation film-forming step, a layer of Fe is formed on the surface of the decontamination part3O4And (5) passivating the film.
Preferably, the ultrasonic synergistic ultrasonic power density is 15-35W/cm2The ultrasonic frequency is 15-45 KHz.
Compared with the prior art, the invention has the beneficial effects that:
the decontamination formula and the decontamination method for the radioactive contamination deposited oxide of the AP1000 primary loop component can realize the removal of the radioactive contamination deposited oxide to the maximum extent: the removal rate is more than 99 percent, so that the irradiation dose of operators can be reduced, and the life safety of the operators is guaranteed; meanwhile, the damage to the matrix can be avoided, and intergranular corrosion and pitting corrosion are avoided.
Detailed Description
In order to make the invention more comprehensible, preferred embodiments are described in detail below.
Example 1
A decontamination formula for radioactive contamination deposited oxides of a primary loop component of an AP1000 reactor comprises 0.4 wt% of a potassium permanganate solution, 0.3 wt% of an ascorbic acid solution and 0.1 wt% of hydrogen peroxide.
A decontamination method for radioactive contamination deposited oxides of a primary loop component of an AP1000 reactor adopts the decontamination formula, and comprises the following specific steps:
(1) preparing 0.4 wt% potassium permanganate solution, adjusting the pH value of the solution to 11 with sodium hydroxide, and controlling the temperature: placing the polluted component on a bracket in a decontamination tank for fixation at 60-70 ℃, and oxidizing and decontaminating for 6h under the ultrasonic synergistic effect with the ultrasonic power density of 30W/cm2
(2) Ultrasonic rinsing with deionized water at 50-70 deg.C for 40 min.
(3) Preparing 0.3 wt% ascorbic acid solution, adjusting the pH value of the solution to 4.5 by using sodium hydroxide, and controlling the temperature: restoring and decontaminating for 6h at 60-70 ℃ under the ultrasonic synergistic effect, and ultrasonic power density of 30W-cm2
(4) And (3) ultrasonically rinsing the mixture for 40min at 50-70 ℃ by adopting 0.1 wt% of hydrogen peroxide solution.
(5) And ultrasonic rinsing with deionized water at 50-70 deg.C for 20 min.
(6) And (5) hanging the bracket for fixing the decontamination part to the upper part of the decontamination groove, and draining.
After the radioactive contamination part of the AP1000 reactor is decontaminated, the surface contamination level is measured from 140Bq/cm through wiping and sampling2Reduced to 0.6Bq/cm2The removal rate of the deposited metal oxide reaches 99.6 percent, the dose rate level is reduced from 2900 mu Sv/h to 540 mu Sv/h, the reduction rate is reduced by 81.4 percent, and the effect of removing the deposited oxide is obvious. The decontaminated parts are subjected to scanning electron microscope 10000 times, show that the parts have no intergranular corrosion and no damage to a matrix.
Example 2
A decontamination formula for radioactive contamination deposited oxides of a primary loop component of an AP1000 reactor comprises 0.2 wt% of potassium persulfate solution, mixed solution containing 0.4 wt% of sodium oxalate and 0.4 wt% of sodium citrate and 0.2 wt% of hydrogen peroxide.
A decontamination method for radioactive contamination deposited oxides of a primary loop component of an AP1000 reactor adopts the decontamination formula, and comprises the following specific steps:
(1) preparing 0.2 wt% potassium persulfate solution, adjusting the pH value of the solution to 11.5 by using sodium hydroxide, and controlling the temperature: placing the radioactive contamination component on a bracket in a decontamination tank for fixation at 60-70 ℃, oxidizing and decontaminating for 10h under the ultrasonic synergistic effect, wherein the ultrasonic power density is 25W/cm2
(2) And ultrasonic rinsing with deionized water at 60-80 deg.C for 30 min.
(3) Preparing a mixed solution containing 0.4 wt% of sodium oxalate and 0.4 wt% of sodium citrate, adjusting the pH value of the solution to be 5, and controlling the temperature: reducing decontamination at 60-70 deg.C under ultrasonic synergistic effect for 6h, and ultrasonic power density of 25W/cm2
(4) Performing ultrasonic synergistic rinsing at 50-70 deg.C for 30min with 0.2 wt% hydrogen peroxide solution.
(5) And ultrasonic rinsing with deionized water at 60-70 deg.C for 30 min.
(6) And (5) hanging the bracket for fixing the decontamination part to the upper part of the decontamination groove, and draining.
After the radioactive contamination part of the AP1000 reactor is decontaminated, the surface contamination level is measured from 1000Bq/cm by wiping and sampling2Reduced to 1.1Bq/cm2The removal rate of the deposited metal oxide reaches 99.9 percent. The dosage rate level is reduced from 5200 mu Sv/h to 1400 mu Sv/h, the reduction rate is 73.1 percent, and the effect of removing deposited oxide is obvious. The decontaminated parts are subjected to scanning electron microscope 10000 times, show that the parts have no intergranular corrosion and no damage to a matrix.
The above-described embodiments are only preferred embodiments of the present invention, and are not intended to limit the present invention in any way and substantially, it should be noted that those skilled in the art may make several modifications and additions without departing from the scope of the present invention, which should also be construed as a protection scope of the present invention.

Claims (10)

1. A decontamination formulation for radioactive contamination of deposited oxides from a primary loop component of an AP1000 reactor, comprising:
an oxidizing agent for oxidizing insoluble lower valent metal oxides of the contaminant deposition oxide to higher valent soluble ions;
a reducing agent for reducing insoluble higher valent metal oxides in the contaminant deposited oxide to lower valent soluble ions;
and a water-soluble peroxide passivating agent for removing the residual reducing agent and generating a passivation film.
2. The decontamination formulation for radioactive contamination of deposited oxides from a primary component of an AP1000 reactor as claimed in claim 1, wherein said oxidizing agent comprises at least one of permanganate, persulfate and pyrosulfate; the reducing agent contains at least one of ascorbic acid, sodium citrate and sodium oxalate; the water-soluble peroxide passivator is hydrogen peroxide.
3. The decontamination formulation for radioactive contamination of deposited oxides from a primary loop component of an AP1000 reactor as claimed in claim 2, wherein said oxidizing agent comprises at least one of potassium permanganate, potassium persulfate and potassium pyrosulfate.
4. The decontamination formulation for radioactive contamination of deposited oxides from a primary loop component of an AP1000 reactor as claimed in claim 3, wherein said oxidizing agent has a concentration of 0.3-0.8 wt% and a PH of 11-12; the concentration of the reducing agent is 0.3-0.8 wt%, and the pH value is 3-6; the concentration of the water-soluble peroxide passivator is 0.05-0.5 wt%.
5. A decontamination method for radioactive contamination deposited oxides of a primary loop component of an AP1000 reactor is characterized in that the decontamination formula for the radioactive contamination deposited oxides of the primary loop component of the AP1000 reactor, which is disclosed by any one of claims 1 to 4, is adopted, and the decontamination method comprises six steps of oxidation decontamination, rinsing, reduction decontamination, passivation film formation, rinsing again and air drying to decontaminate the decontamination component.
6. The method for decontaminating radioactively contaminated deposited oxides of a primary loop component of an AP1000 reactor according to claim 5, wherein said step of oxidative decontamination is carried out under process conditions of: ultrasonic cooperating, the temperature is 50-70 ℃, and the time is 4-6 h.
7. The method for decontaminating radioactively contaminated deposited oxides of a primary loop component of an AP1000 reactor according to claim 5, wherein said rinsing/re-rinsing step is carried out under process conditions of: ultrasonic cooperating, the temperature is 50-70 ℃, and the time is 0.25-1 h.
8. The method for decontaminating radioactively contaminated deposited oxides of a primary loop component of an AP1000 reactor according to claim 5, wherein said reductive decontamination step is carried out under process conditions of: ultrasonic cooperating, the temperature is 50-70 ℃, and the time is 3-6 h.
9. The method for decontaminating radioactively contaminated deposited oxides of a primary loop component of an AP1000 reactor according to claim 5, wherein the passivating film-forming step is carried out under process conditions of: ultrasonic cooperation, the temperature is 50-70 ℃, and the time is 0.25-1 h; after the passivation film-forming step, a layer of Fe is formed on the surface of the decontamination part3O4And (5) passivating the film.
10. The method for decontaminating radioactively contaminated deposited oxides of a primary loop component of an AP1000 reactor according to any of claims 6 to 9, wherein the ultrasound-assisted ultrasound power density is between 15 and 35W/cm2The ultrasonic frequency is 15-45 KHz.
CN202110352285.5A 2021-03-31 2021-03-31 Decontamination formula and decontamination method for radioactive contamination deposited oxide of primary loop component of AP1000 reactor Withdrawn CN113105955A (en)

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Cited By (3)

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Publication number Priority date Publication date Assignee Title
CN113737191A (en) * 2021-08-19 2021-12-03 中国辐射防护研究院 Decontamination method of low-carbon martensite nickel-chromium stainless steel
CN113881513A (en) * 2021-09-08 2022-01-04 中国辐射防护研究院 Detergent for decontamination of nuclear power station reactor components and use method thereof
CN113990541A (en) * 2021-09-08 2022-01-28 中国辐射防护研究院 Method for removing radioactive contamination deposited oxide

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113737191A (en) * 2021-08-19 2021-12-03 中国辐射防护研究院 Decontamination method of low-carbon martensite nickel-chromium stainless steel
CN113881513A (en) * 2021-09-08 2022-01-04 中国辐射防护研究院 Detergent for decontamination of nuclear power station reactor components and use method thereof
CN113990541A (en) * 2021-09-08 2022-01-28 中国辐射防护研究院 Method for removing radioactive contamination deposited oxide

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Application publication date: 20210713