CN113097732B - Visible light wave band special pattern MIM metamaterial perfect wave absorber and design method - Google Patents

Visible light wave band special pattern MIM metamaterial perfect wave absorber and design method Download PDF

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CN113097732B
CN113097732B CN202110233472.1A CN202110233472A CN113097732B CN 113097732 B CN113097732 B CN 113097732B CN 202110233472 A CN202110233472 A CN 202110233472A CN 113097732 B CN113097732 B CN 113097732B
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metamaterial
metal
mim
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wave absorber
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CN113097732A (en
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张柏富
韩成
王浩
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Nanjing University of Science and Technology
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Nanjing University of Science and Technology
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00—Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
    • H01Q15/0006—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices
    • H01Q15/0086—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices having materials with a synthesized negative refractive index, e.g. metamaterials or left-handed materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00—Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
    • H01Q15/0006—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices
    • H01Q15/0013—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective
    • H01Q15/002—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective said selective devices being reconfigurable or tunable, e.g. using switches or diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q15/00—Devices for reflection, refraction, diffraction or polarisation of waves radiated from an antenna, e.g. quasi-optical devices
    • H01Q15/0006—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices
    • H01Q15/0013—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective
    • H01Q15/0026—Devices acting selectively as reflecting surface, as diffracting or as refracting device, e.g. frequency filtering or angular spatial filtering devices said selective devices working as frequency-selective reflecting surfaces, e.g. FSS, dichroic plates, surfaces being partly transmissive and reflective said selective devices having a stacked geometry or having multiple layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q17/00—Devices for absorbing waves radiated from an antenna; Combinations of such devices with active antenna elements or systems
    • H01Q17/007—Devices for absorbing waves radiated from an antenna; Combinations of such devices with active antenna elements or systems with means for controlling the absorption

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Abstract

The invention discloses a visible light wave band special pattern MIM (metal-insulator-metal) metamaterial perfect wave absorber and a design method thereof, wherein the wave absorber is formed by periodically arranging metamaterial perfect absorber units; the metamaterial perfect absorber unit is symmetrical in the length and width directions, and is composed of three layers of materials with the uppermost layer of metal, the middle dielectric layer and the bottom being a metal substrate in the height direction; the pattern of the uppermost layer metal is a polygonal body with self-defined points, and each point is distributed randomly in a certain area with equal interval in the length direction and width; the absorption frequency of the structure is changed by changing the distribution position of each point in the width so as to generate a new metal pattern structure. The invention disperses the edges of the metal patterns on the top of the metamaterial into a plurality of points, and flexibly changes the distribution of the points to adjust the equivalent magnetic conductivity and the dielectric constant of the MIM structure, thereby flexibly regulating and controlling the absorption frequency of the metamaterial and realizing the perfect absorption of an ultra-narrow dual-band at the visible light wavelength.

Description

Visible light wave band special pattern MIM metamaterial perfect wave absorber and design method
Technical Field
The invention belongs to the field of metamaterial perfect absorber design, and particularly relates to a MIM metamaterial perfect absorber with a special pattern in a visible light wave band and a design method.
Background
The metamaterial is an artificial composite material with excellent electromagnetic performance which is difficult to obtain by natural materials, and generally consists of a unit structure in which metal and dielectric are periodically arranged.
After Landy et al first designed a Metamaterial Absorber capable of achieving nearly 100% absorption of electromagnetic waves with specific wavelengths (see: landy N I, sajuyigbe S, mock J, et al. Metamaterial Absorber [ J ] Physical Review Letters, 2008.), the Metamaterial Perfect Absorber (PMA) began to enter human vision and developed at a rapid pace. The PMA has the advantages of flexible design, adjustable response, small thickness, strong wave absorption and the like, and is one of the currently very important application hotspots.
The MIM metamaterial is a typical PMA structure, and a metal substrate at the bottom of the MIM metamaterial can effectively prevent electromagnetic waves from being transmitted, so that the transmittance of the electromagnetic waves is 0. The electromagnetic response of the structure is adjusted by reasonably designing the shape, size and arrangement mode of the device structure and selecting proper metal materials and dielectric materials, so that the reflectivity and transmissivity of electromagnetic waves of certain frequency bands to the structure both approach to 0, and the absorptivity is defined as: absorptance = 1-reflectance-transmittance, so that absorption close to 100% can be achieved.
At present, the types of structures of single-wave band MIM perfect absorbers designed by researchers are quite rich, and meanwhile, the design of the multi-wave band perfect absorbers is usually realized through the ideas of multilayer MIM structures, and the like, but the traditional technology needs to design and process the multilayer MIM structures, so that the absorption efficiency is influenced, the manufacturing cost is high, the difficulty is high, and the application range of the multi-wave band MIM perfect absorbers is limited.
Disclosure of Invention
The invention aims to provide a visible light waveband special pattern MIM metamaterial perfect wave absorber and a design method thereof, wherein the visible light waveband special pattern MIM metamaterial perfect wave absorber is flexible and adjustable in geometric parameters and high in degree of freedom, and conventional materials are selected and a single-layer MIM metamaterial structure is constructed to realize double-waveband perfect absorption.
The technical scheme for realizing the purpose of the invention is as follows: a visible light wave band special pattern MIM (metal-insulator-metal) metamaterial perfect absorber is characterized in that the whole structure of the metamaterial perfect absorber is formed by periodically arranging metamaterial perfect absorber units; the metamaterial perfect absorber unit is symmetrical in the length and width directions, and is composed of three layers of materials with the uppermost layer of metal, the middle dielectric layer and the bottom being a metal substrate in the height direction;
the pattern of the uppermost layer metal is a polygonal body with self-defined points, and each point is equal in interval in the length direction but randomly distributed in a certain area of the width; the absorption frequency of the structure is changed by changing the distribution position of each point in the width so as to generate a new metal pattern structure.
Furthermore, the equivalent permeability and the dielectric constant of the MIM structure are adjusted by changing the upper layer metal pattern, so that the absorption frequency of the metamaterial is regulated and controlled.
Furthermore, the upper layer metal pattern structure has 10 parameter points, the first parameter point and the tenth parameter point are fixed, and the patterns are set through the other 8 parameter points to change the absorption frequency of the metamaterial; the center of the metal pattern structure is used as a dot, the connecting line direction of the dot and the first reference point is used as an x axis, and the y values of 8 free parameter points are used as pattern parameters.
Furthermore, a parameter point is arranged in a quadrant at the abscissa of every 10nm, the ordinate of each parameter point is changed and recorded, and the parameter points are respectively arranged to be 0, 70, 60, 70, 40, 70 and 100nm.
Further, the MIM metamaterial wave absorber with different metal patterns is scanned within a wave band of 400nm to 1200nm to obtain the transmissivity and reflectivity of the material, and therefore the absorptivity of the structure to electromagnetic waves is calculated.
Furthermore, the top metal and metal substrate material of the metamaterial perfect absorber unit is Ag, and the middle medium layer is Al 2 O 3 。
A design method of a visible light wave band special pattern-based MIM metamaterial perfect wave absorber comprises the following steps:
the metamaterial perfect wave absorber is formed by periodically arranging metamaterial perfect absorber units;
the metamaterial perfect absorber unit is symmetrical in the length and width directions, and is composed of three layers of materials with the uppermost layer of metal, the middle dielectric layer and the bottom being a metal substrate in the height direction;
the pattern of the uppermost layer metal is a polygonal body with self-defined points, and each point is equal in interval in the length direction but randomly distributed in a certain area of the width;
the absorption frequency of the structure is changed by changing the distribution position of each point in the width so as to generate a new metal pattern structure.
Compared with the prior art, the invention has the beneficial effects that: the polygonal pattern has the advantages of freely adjustable parameters, high flexibility, simple model establishment and use of common materials, avoids complex and multilayer structural modeling and selection of novel materials, obtains a polygonal perfect absorption structure by simply scanning the structural size, and realizes double-peak perfect absorption in a visible light band.
Drawings
Fig. 1 is a three-dimensional schematic of the overall structure of a PMA.
Fig. 2 (a) - (c) are respectively a three-dimensional schematic diagram, a top view and a front view of a metamaterial structural unit, wherein coordinate axes represent directions of x, y and z axes in the structure, 8 points shown in the diagram (b) are respectively 70, 60, 70, 40, 70 and 70 from left to right in the y axis, and the unit is: and (5) nm.
Fig. 3 shows the transmittance T, reflectance R and absorptance a of the MIM metamaterial absorber of the present invention for the 400nm to 1200nm band, which achieves 98.3% and 99.1% absorptance at 422nm and 475nm, respectively.
Detailed Description
As shown in fig. 1, a special polygonal Metal-semiconductor-Metal (MIM) metamaterial perfect absorber structure that realizes perfect absorption of two peaks in visible light band, where the metamaterial perfect absorber unit is symmetrical in length and width directions, and is composed of top Metal and middle dielectric layer and three layers of materials with Metal substrate at bottom in height direction;
the pattern of the uppermost layer metal is a polygonal body with self-defined points, and each point is equal in interval in the length direction but randomly distributed in a certain area of the width; the absorption frequency of the structure is changed by changing the distribution position of each point in the width so as to generate a new metal pattern structure.
The geometric structure of the wave absorber has flexible and adjustable parameters, and the equivalent permeability and the dielectric constant of the MIM structure are adjusted by changing the upper-layer metal pattern, so that the absorption frequency of the metamaterial can be flexibly regulated and controlled.
The metamaterial integral structure is formed by periodically arranging metamaterial units.
Scanning MIM metamaterial wave absorbers with different special metal patterns within a wave band of 400nm to 1200nm to obtain the transmissivity and reflectivity of the material, and calculating the absorptivity of the structure to electromagnetic waves.
The metamaterial perfect wave absorber with visible light wave bands comprises special polygonal MIM structure units which are periodically arranged, wherein each unit consists of an upper Ag metal layer, a lower Ag metal layer and a middle Al layer 2 O 3 The layers are formed. The MIM structure realizes the remarkable enhancement of the absorptivity of the material through the electromagnetic resonance with incident electromagnetic waves, and the equivalent magnetic conductivity and the dielectric constant of the MIM structure can be adjusted through changing the geometric dimension of the upper layer pattern, so that the resonance absorption frequency can be flexibly adjusted and controlled.
Further, in order to obtain the spectral line data of perfect absorption effect. First, the MIM structure top pattern is drawn by setting a number of parameter points. In the embodiment of the scheme, the number of the parameter points is 8, the MIM metamaterial structure unit is symmetrical on the x axis and the y axis, the parameter points are arranged on the abscissa in one quadrant at intervals of 10nm, the ordinate of each parameter point is changed and recorded, the structure unit is symmetrical on the x axis and the y axis, and therefore the whole MIM top pattern can be drawn only by arranging the structure unit in one quadrant, the symmetrical pattern can effectively reduce simulation time, and more pattern absorption effects are obtained. And then scanning the MIM metamaterial wave absorber with different patterns at the wave band of 400nm to 1200nm by a time domain finite difference method to obtain the absorption rate spectral line of the material. And secondly, screening the obtained spectral line data as required to obtain an absorption rate spectral line meeting multiband and perfect absorption, and recording corresponding structural parameter data.
Further, the structural data of the invention is screened out. For conventional square, rectangular, cross-like structures, etc., the special pattern has a higher degree of freedom. On the other hand, in most metamaterial designs, a metamaterial absorber has one absorption peak in a certain wave band, and in order to solve the problem, a plurality of absorption peaks are generally realized by stacking metamaterial units and a composite structure, which affects the efficiency of the material. The special pattern MIM structure provides a new multi-absorption peak thought, and in the case, 8 parameter points are used for arranging an upper layer metal pattern to form a metamaterial unit together with a middle semiconductor layer and a bottom substrate. The metamaterial integral structure is formed by periodically arranging each metamaterial unit, and each metamaterial unit is symmetrical in the length direction and the width direction.
The material selection of the traditional metamaterial perfect wave absorber relates to a large amount of data simulation and experimental experience, and multiband absorption is realized by methods such as stacking metamaterial layers and the like. The invention selects common experimental materials, disperses the edges of the metal patterns on the top of the metamaterial into a plurality of points, and flexibly changes the distribution of the points to adjust the equivalent permeability and the dielectric constant of the MIM structure, thereby flexibly adjusting and controlling the absorption frequency of the metamaterial. The method avoids a large amount of data calculation and software simulation time cost, and simultaneously has freely adjustable pattern parameters and high flexibility, thereby providing a design idea of special polygonal patterns for the multiband metamaterial wave absorber.
The following is a detailed description of the embodiments of the present invention, which is implemented on the premise of the technical solution of the present invention, and a detailed implementation manner and a specific operation process are given, but the scope of the present invention is not limited to the following embodiments.
Examples
In the MIM structure of the invention, ag is selected as the bottom metal substrate and the upper metal pattern material, in the example, the upper metal and the substrate metal are both set to be Ag, but the material design of the special pattern MIM structure is not limited by the Ag, and the intermediate semiconductor layer is made of Al 2 O 3 As shown in fig. 1. Wherein, the dielectric constant of Ag is obtained by fitting experimental data through a Drude model, the bottom metal layer is used for preventing the transmission of the metamaterial, the thickness is set to be 80nm, and the thickness of the top metal pattern is set to be 30nm. Intermediate layer Al 2 O 3 The refractive index of the material is 1.75, the thickness is set to be 12nm, the metamaterial structure unit is symmetrical about the directions of x and y axes, and the period of the metamaterial unit is set to be 250nm.
First, the MIM unit structure upper layer pattern is symmetrical with respect to the x-axis and y-axis, as shown in fig. 2 (b). It is only necessary to define 8 y values at the free point in one quadrant as shown in fig. 2 (b) as pattern parameters. The absorption rate of the metamaterial is defined as: a =1-T-R, T being the transmittance of the material, R being the reflectance of the material, a being the absorptance of the material. The transmissivity and reflectivity of the material are obtained by scanning MIM metamaterial wave absorbers with different patterns in a wave band of 400nm to 1200nm, and absorption rate spectral lines are obtained by calculation.
Furthermore, the scanned absorption spectrum line is screened to obtain the structural parameters of the perfect absorption effect of the visible light wave band. The upper layer metal pattern structure of the invention has 10 parameter points in total, the first and tenth parameter points are fixed to facilitate modeling of the metamaterial structure, patterns are set through the other 8 parameter points to change the absorption frequency of the metamaterial, as shown in fig. 2, the distribution of the structural parameter points is set to be 0, 70, 60, 70, 40, 70 and 100 (unit: nm), which represents the y-axis distance of the set points every 10nm in the x-axis direction.
The effect of the structure after simulation calculation is shown in fig. 3. R, T, A represents the reflectance, transmittance and absorbance of the structure in the 400nm to 1200nm band, respectively. The absorber respectively reaches 98.3% at 422nm and 99.1% at 475nm, and under the condition, the designed polygonal special pattern MIM structure metamaterial has a double-frequency-band perfect absorption effect.
According to the invention, the special polygonal MIM metamaterial structure realizes the perfect bimodal absorption of an ultra-narrow visible light waveband, the MIM structure has flexible and adjustable pattern parameters, high degree of freedom and simple model establishment, the problems of complex and multilayer structure modeling and material selection are avoided, the polygonal pattern parameters are flexibly designed, absorption spectrum lines of different patterns are obtained by scanning the MIM structure, the feasibility of the perfect absorption of the double waveband of the special polygonal MIM structure is verified, and a new thought is provided for PMA design.
The above-mentioned embodiments are only used for illustrating the technical solutions of the present invention, and not for limiting the same; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.

Claims (10)

1. A visible light wave band special pattern MIM metamaterial perfect wave absorber is characterized in that: the whole structure of the metamaterial perfect wave absorber is formed by periodically arranging metamaterial perfect wave absorber units; the metamaterial perfect wave absorber unit is symmetrical in the length and width directions, and is composed of three layers of materials with the uppermost layer of metal, the middle dielectric layer and the bottom being a metal substrate in the height direction;
the pattern of the uppermost layer metal is a polygonal body with self-defined points, and each point is equal in interval in the length direction but randomly distributed in a certain area of the width; the absorption frequency of the structure is changed by changing the distribution position of each point in the width so as to generate a new metal pattern structure.
2. The visible band special pattern MIM metamaterial perfect wave absorber of claim 1, wherein: the equivalent permeability and the dielectric constant of the MIM structure are adjusted by changing the upper layer metal pattern, so that the absorption frequency of the metamaterial is regulated and controlled.
3. The visible band special pattern MIM metamaterial perfect wave absorber of claim 2, wherein: the upper layer metal pattern structure has 10 parameter points, the first parameter point and the tenth parameter point are fixed, and the patterns are arranged through the other 8 parameter points to change the absorption frequency of the metamaterial; the center of the metal pattern structure is used as a dot, the connecting line direction of the dot and the first reference point is used as an x axis, and the y values of 8 free parameter points are used as pattern parameters.
4. The visible band special pattern MIM metamaterial perfect wave absorber of claim 3, wherein: in one quadrant, the abscissa sets a parameter point every 10nm, the ordinate of each parameter point is changed and recorded, and the ordinates of the parameter points are respectively set to be 0, 70, 60, 70, 40, 70 and 100nm.
5. The visible band special pattern MIM metamaterial perfect wave absorber of claim 1, wherein: scanning MIM metamaterial wave absorbers with different metal patterns within a wave band of 400nm to 1200nm to obtain the transmissivity and reflectivity of the material, and calculating the absorptivity of the structure to electromagnetic waves.
6. The visible band special pattern MIM metamaterial perfect wave absorber of claim 1, wherein: the top metal and metal substrate of the metamaterial perfect wave absorber unit are made of Ag, and the middle dielectric layer is made of Al 2 O 3 。
7. The design method of the visible light band special pattern MIM metamaterial perfect absorber according to claim 1, comprising the following steps:
the whole structure of the metamaterial perfect wave absorber is formed by periodically arranging metamaterial perfect wave absorber units;
the metamaterial perfect wave absorber unit is symmetrical in the length and width directions, and is composed of three layers of materials with the uppermost layer metal, the middle dielectric layer and the bottom being a metal substrate in the height direction;
the pattern of the uppermost layer metal is a polygonal body with self-defined points, and each point is equal in interval in the length direction but randomly distributed in a certain area of the width;
the absorption frequency of the structure is changed by changing the distribution position of each point in the width so as to generate a new metal pattern structure.
8. The method of claim 7, wherein the equivalent permeability and the dielectric constant of the MIM structure are adjusted by changing the upper metal pattern, so that the metamaterial absorption frequency is regulated.
9. The method of claim 8, wherein the upper metal pattern structure has 10 parameter points, the first and tenth parameter points are fixed, and the absorption frequency of the metamaterial is changed by arranging patterns on the remaining 8 parameter points; the center of the metal pattern structure is used as a dot, the connecting line direction of the dot and the first reference point is used as an x axis, and the y values of 8 free parameter points are used as pattern parameters.
10. The method of claim 7, wherein the uppermost metal and metal substrate material of the metamaterial perfect absorber unit is Ag, and the intermediate dielectric layer is Al 2 O 3 。
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