CN113066927A - Titanium-doped niobium oxide-based 1S1R device and preparation method thereof - Google Patents

Titanium-doped niobium oxide-based 1S1R device and preparation method thereof Download PDF

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CN113066927A
CN113066927A CN202110170101.3A CN202110170101A CN113066927A CN 113066927 A CN113066927 A CN 113066927A CN 202110170101 A CN202110170101 A CN 202110170101A CN 113066927 A CN113066927 A CN 113066927A
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titanium
niobium oxide
doped niobium
layer
bottom electrode
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CN113066927B (en
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王浩
余志颖
季杰
檀秋阳
潘希彦
马国坤
饶毅恒
万厚钊
桃李
彭小牛
段金霞
汪汉斌
汪宝元
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Hubei University
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/881—Switching materials
    • H10N70/883—Oxides or nitrides
    • H10N70/8833—Binary metal oxides, e.g. TaOx
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/20—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having two electrodes, e.g. diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011—Manufacture or treatment of multistable switching devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011—Manufacture or treatment of multistable switching devices
    • H10N70/021—Formation of the switching material, e.g. layer deposition
    • H10N70/026—Formation of the switching material, e.g. layer deposition by physical vapor deposition, e.g. sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices without a potential-jump barrier or surface barrier, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/841—Electrodes
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    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Abstract

The invention provides a titanium-doped niobium oxide-based 1S1R device and a preparation method thereof, wherein the device comprises: a bottom electrode; a translation layer; a resistance change layer; a top electrode; the conversion layer is titanium doped niobium oxide. In the device, the conversion layer is titanium-doped niobium oxide, and the gate tube prepared based on the material has the advantages of very stable operating voltage, high pulse current resistance and the like; the resistance change layer adopts a silicon nitride film, and the movement of oxygen vacancy is limited due to the existence of nitride, so that the oxygen vacancy is more controllable. According to the method, the titanium-doped niobium oxide is used as a gate tube functional layer and the silicon nitride film is used as a resistance change layer, so that the prepared 1S1R device has stable SET voltage, RESET voltage, negative threshold voltage, positive holding voltage and other related operating voltages, an obvious storage window and gating ratio (nonlinear value) show stronger stability in a direct current tolerance test, and therefore leakage current can be effectively reduced, and certain crosstalk resistance is achieved.

Description

Titanium-doped niobium oxide-based 1S1R device and preparation method thereof
Technical Field
The invention relates to the technical field of information storage, in particular to a titanium-doped niobium oxide-based 1S1R device and a preparation method thereof.
Background
With the advent of the big data age, the information to be stored and analyzed is growing explosively, so that the memory has huge requirements and markets, and the continuous improvement of the performance of the memory becomes a key basic problem in the field of information science. With the continuous forward advance of semiconductor technology nodes, moore's law is being challenged gradually, and at present, the mainstream flash memory based on a floating gate structure of a charge storage mechanism is also facing serious technical challenges, and as the feature size thereof is reduced to below 16nm, the continuous reduction will face a plurality of physical limits, such as floating gate coupling, charge leakage, crosstalk between adjacent cells, and the like, so that a next-generation nonvolatile memory is urgently sought.
The Resistive Random Access Memory (RRAM) has obvious advantages compared with the conventional flash memory due to its characteristics of simple structure, low power consumption, small cell size, high device density, fast programming/erasing speed, compatibility with a Complementary Metal Oxide (CMOS) process, and the like, and is considered to be one of novel memories most suitable for three-dimensional integration. Therefore, RRAM is one of important next-generation storage technologies, has the potential to replace the existing mainstream Flash memory, and is highly regarded by the industry and academia. In the RRAM memory array architecture, due to the ohmic conduction characteristic of the RRAM cells in the low resistance state, when reading the resistance value of a certain resistive unit, if the adjacent Cross unit is also in the low resistance state, current flows through the adjacent Cross unit, so that the read resistance value is inaccurate, the process is called crosstalk effect (Cross-Talk), and the current on the adjacent low resistance unit is called leakage current or crosstalk current. When the memory array becomes larger or the multi-layer arrays are stacked, more leakage current will make the crosstalk effect more serious, so that the read information is inaccurate, and in addition, the leakage current also causes the problems of power consumption increase and the like.
To solve the crosstalk problem, the main solutions at present are: the structure is 1D1R (D is a diode, and R is an RRAM unit) by integrating a diode with a rectification characteristic, but the structure is only suitable for RRAM with single polarity; designing a self-rectifying RRAM device to enable the device to have a rectifying characteristic in a low-resistance state, but the performance of the device is not stable enough; thirdly, a complementary resistive random access memory (CRS) structure is adopted, but the CRS structure is complex and difficult to prepare; fourthly, a field effect transistor is integrated to form a 1T1R structure, but the unit area of the structure is large, the silicon substrate area is occupied, and three-dimensional integration is not facilitated; and fifthly, integrating a gate tube to form a 1Selector-1 RRAM (1S1R) structure. Wherein the 1S1R structure has simple structure, does not depend on the front-end process of CMOS process, and can realize the minimum memory cell area 4F2(F is the characteristic size) and the like.
The three-dimensional integration technology is the inevitable choice for realizing the ultra-high density storage of the RRAM, and the 1S1R structural unit becomes the key point to realize the realization. Therefore, only after obtaining 1S1R cell with stable performance and excellent effect of suppressing leakage current and solving the crosstalk problem existing in the array, 1S1R can be applied to the three-dimensional memory array of RRAM.
There are two main types of current three-dimensional memory arrays for RRAM: one is a cross-array multilayer stacked structure (X-point cross array), namely, a two-dimensional cross array structure is repeatedly prepared and stacked to form a plurality of layers; another method is a vertical cross array structure (V-point vertical array), i.e., a conventional horizontal cross array structure is rotated by 90 degrees and repeatedly extended in the horizontal direction to form a vertical cross structure three-dimensional array. In the prior art, the intermediate electrode is only kept to have stable performance when the RRAM and the gate device are integrated to form the 1S1R device, and it should be noted that the intermediate electrode exists when the V-point three-dimensional vertical structure cannot accept the integration of the RRAM device and the gate device, because the special structure of the V-point three-dimensional vertical structure causes the risk of short-circuit communication between cells on the same vertical pillar when the intermediate electrode exists, and therefore, the device cell in the V-point three-dimensional vertical structure needs to be a 1S1R device without the intermediate electrode.
Therefore, how to improve the stability of the 1S1R device, reduce the leakage current of the 1S1R device, and the 1S1R device without the intermediate electrode is a problem to be solved urgently by those skilled in the art.
Disclosure of Invention
In view of the above, the present invention provides a titanium-doped niobium oxide-based 1S1R device and a method for manufacturing the same, which solve or at least partially solve the technical defects in the prior art.
In a first aspect, the present invention provides a titanium doped niobium oxide based 1S1R device, comprising:
a bottom electrode;
the conversion layer is positioned on one side surface of the bottom electrode;
the resistance change layer is positioned on the surface of one side, away from the bottom electrode, of the conversion layer;
the top electrode is positioned on the surface of one side, far away from the bottom electrode, of the resistance change layer;
wherein the material of the conversion layer is titanium-doped niobium oxide.
Optionally, in the titanium-doped niobium oxide-based 1S1R device, the material of the resistive layer is silicon nitride.
Optionally, in the titanium-doped niobium oxide-based 1S1R device, the bottom electrode is made of one of Ti, Pt, W, or TiN; the top electrode is made of one of Pt or Ti.
Optionally, in the titanium-doped niobium oxide-based 1S1R device, the thickness of the bottom electrode is 180-220 nm, the thickness of the conversion layer is 80-100 nm, the thickness of the resistance change layer is 40-60 nm, and the thickness of the top electrode is 60-100 nm.
Optionally, in the titanium-doped niobium oxide-based 1S1R device, the top electrode is rectangular or circular, the side length of the rectangle is 50-1000 μm, and the diameter of the circle is 50-1000 μm.
In a second aspect, the invention further provides a method for preparing a titanium-doped niobium oxide-based 1S1R device, which comprises the following steps:
providing a bottom electrode;
preparing a conversion layer on the surface of the bottom electrode;
preparing a resistance change layer on the surface of one side of the conversion layer, which is far away from the bottom electrode;
preparing a top electrode on the surface of one side of the resistance change layer, which is far away from the bottom electrode;
wherein the material of the conversion layer is titanium-doped niobium oxide.
Optionally, the method for preparing the titanium-doped niobium oxide-based 1S1R device includes the following specific steps:
and co-depositing titanium-doped niobium oxide on the surface of the bottom electrode by using a magnetron sputtering method by taking metal titanium and niobium pentoxide as targets, wherein the titanium-doped niobium oxide is the conversion layer.
Optionally, in the preparation method of the titanium-doped niobium oxide-based 1S1R device, the material of the resistive layer is a silicon nitride material, and the preparation method of the resistive layer specifically includes:
and preparing silicon nitride on the surface of the conversion layer by using a magnetron sputtering method by using the silicon nitride as a target material, wherein the silicon nitride is the resistance change layer.
Optionally, in the preparation method of the titanium-doped niobium oxide-based 1S1R device, the material of the top electrode is Ti, and the preparation method of the top electrode specifically includes:
and (3) taking titanium as a target material, and preparing the titanium on the surface of the resistance change layer by using a magnetron sputtering method, wherein the titanium is the top electrode.
Optionally, in the preparation method of the titanium-doped niobium oxide-based 1S1R device, the sputtering power of the niobium pentoxide target is 40-60W, and the sputtering power of the metallic titanium target is 15-30W.
Compared with the prior art, the titanium-doped niobium oxide-based 1S1R device and the preparation method thereof have the following beneficial effects:
(1) the titanium-doped niobium oxide-based 1S1R device is characterized in that a conversion layer is made of titanium-doped niobium oxide, the titanium-doped niobium oxide conversion layer is used as a gate tube, more oxygen vacancies are generated after titanium doping, oxygen vacancy filaments formed by a large number of oxygen vacancies are very stable, namely the movement of the oxygen vacancies is more controllable, the filament part in the gate tube is stable, and the rest niobium oxide conversion region can work more stably, so that the gate tube prepared based on the material does not need a Forming process (the Forming process is the process of needing a large voltage to drive the device before the gate tube device is used, and the process is not needed by the gate tube based on the titanium-doped niobium oxide) in an independent use process, and the threshold voltage and the holding voltage of the positive polarity and the negative polarity are almost coincident and very stably, and the 1S1R device prepared by introducing the gate tube also has relatively stable positive polarity holding voltage and negative polarity holding voltage, the two voltage parameters have large subthreshold slope; the titanium-doped niobium oxide conversion layer is used as the gate tube, so that the prepared 1S1R device has the advantages of high on-state current density and high pulse current resistance;
(2) according to the 1S1R device based on titanium-doped niobium oxide, a silicon nitride storage film with very stable electrical properties is used as a resistance change layer, oxygen vacancy movement is limited due to existence of nitride, so that oxygen vacancy is more controllable, the resistance change layer made of the material has stable memory performance, stable SET voltage and RESET voltage and a stable memory window, and the made 1S1R device also has stable electrical properties, stable SET voltage and RESET voltage and an obvious memory window;
(3) the titanium-doped niobium oxide-based 1S1R device has stable SET voltage, RESET voltage, threshold voltage, holding voltage and other related voltages, and obvious memory window ratio and nonlinear ratio, so that leakage current can be effectively reduced, the device has certain crosstalk resistance, and has strong stability in a direct current tolerance test;
(4) the titanium-doped niobium oxide-based 1S1R device has no intermediate electrode, can be simultaneously applied to an X-point cross array and a V-point vertical array, provides technical support for realizing an ultrahigh-density three-dimensional storage array by an RRAM, has high value in industry and academia, and has very wide application prospect.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a schematic structural view of a 1S1R device based on titanium doped niobium oxide of the present invention;
FIG. 2 is a FIB-SEM diagram of a titanium-doped niobium oxide-based 1S1R device prepared in example 1 of the present invention;
FIG. 3 is a graph showing the I-V curves of the Forming process of a titanium doped niobium oxide based 1S1R device prepared in example 1 of the present invention;
FIG. 4 is a graph showing the I-V curves of a titanium doped niobium oxide based 1S1R device prepared in example 1 of the present invention;
FIG. 5 is a graph showing the distribution of resistivity states of a titanium doped niobium oxide-based 1S1R device 1/2 prepared in example 1 according to the present invention under the reading rule;
FIG. 6 is a graph showing the distribution of resistivity states of a titanium doped niobium oxide-based 1S1R device 1/3 prepared in example 1 according to the present invention under the reading rule;
FIG. 7 is a graph showing the relative voltage box distribution of a titanium doped niobium oxide based 1S1R device prepared in example 1 of the present invention;
FIG. 8 is a statistical distribution diagram of the relative voltages of the titanium doped niobium oxide based 1S1R device prepared in example 1 of the present invention;
FIG. 9 is an I-V plot of a titanium doped niobium oxide based 1S1R device made in example 2 of the present invention;
FIG. 10 is a graph of the I-V curve for a titanium doped niobium oxide based gate device made in example 3 of the present invention;
FIG. 11 is an I-V plot of a RRAM device prepared in comparative example 1;
FIG. 12 is an I-V plot of a 1S1R device prepared in comparative example 2;
FIG. 13 is an I-V plot of a 1S1R device prepared in comparative example 3.
Detailed Description
In the following, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention.
As shown in FIG. 1, the present invention provides a 1S1R device based on titanium doped niobium oxide, comprising:
a bottom electrode 1;
a conversion layer 2 positioned on one side surface of the bottom electrode 1;
the resistance change layer 3 is positioned on the surface of one side of the conversion layer 3, which is far away from the bottom electrode;
the top electrode 4 is positioned on the surface of one side of the resistance change layer 3 away from the bottom electrode 1;
wherein the material of the conversion layer 2 is titanium doped niobium oxide.
The 1S1R device of the present invention comprises a bottom electrode 1, a switching layer 2, a resistance change layer 3 and a top electrode 4, wherein the switching layer 2 is made of titanium-doped niobium oxide (NbO)x) The titanium-doped niobium oxide conversion layer is used as a gate tube, more oxygen vacancies are generated after the titanium is doped, and the oxygen vacancy filaments formed by a large number of oxygen vacancies are very stable, namely the oxygen vacanciesThe movement of (A) is more controllable, so that the filament part inside the gate tube is stable, and the remaining niobium oxide (NbO)x) The transition region can work more stably, so that the threshold voltage and the holding voltage of the positive and negative polarities of the gate tube made of the material are almost coincident and very stable, and the gate tube is introduced, so that the 1S1R device made of the material also has stable positive polarity holding voltage and negative polarity threshold voltage, and the two voltage parameters have large sub-threshold slope; the titanium-doped niobium oxide conversion layer is used as the gate tube, the gate tube made of the material has the important characteristics of high on-state current density and resistance to overshoot current, and the introduction of the gate tube enables the 1S1R device made of the material to have the advantages of high on-state current density and resistance to high pulse current.
Specifically, in the embodiment of the present application, the material of the resistance change layer is silicon nitride (SiNO)x) The bottom electrode is made of one of Ti, Pt, W or TiN; the top electrode is made of one of Pt or Ti; the thickness of the bottom electrode is 180-220 nm, the thickness of the conversion layer is 80-100 nm, the thickness of the resistance change layer is 40-60 nm, and the thickness of the top electrode is 60-100 nm.
It should be noted that, in the present application, the resistance change layer material uses Si with a purity of 99.99%3N4A small amount of oxygen can be brought in a sputtering process of a film obtained by sputtering in a radio frequency magnetron sputtering instrument, so that the silicon nitride-based resistive random access memory has stable performance, and the movement of a small amount of oxygen vacancies in nitride is limited, so that the silicon nitride-based resistive random access memory shows controllable resistive random access performance. When the top electrode of the resistive random access memory is positively biased and the bottom electrode is grounded, an oxygen vacancy conductive filament showing positive electricity is formed from the bottom electrode to the top electrode under the driving of an electric field, so that the device is converted into a low-resistance state from a high-resistance state, and conversely, when the top electrode is negatively biased, the oxygen vacancy conductive filament starts to break from the end of the top electrode, so that the device is converted into the high-resistance state from the low-resistance state.
Specifically, in the embodiment of the present application, the top electrode is rectangular or circular, the side length of the rectangle is 50 to 1000 μm, the diameter of the circle is 50 to 1000 μm, and in practice, the top electrodes may be arranged on the resistive layer 3 in an array.
According to the 1S1R device, a silicon nitride storage film with very stable electrical properties is used as a resistance change layer, the movement of oxygen vacancies is limited due to the existence of nitride, so that the oxygen vacancies are more controllable, the resistance change layer made of the material has stable memory performance, stable SET voltage and RESET voltage and a stable storage window, and the made 1S1R device also has stable electrical properties, stable SET voltage and RESET voltage and an obvious storage window; on the whole, the 1S1R device has stable SET voltage, RESET voltage, threshold voltage, holding voltage and other related voltages, and obvious memory window ratio and nonlinear ratio, so that the leakage current can be effectively reduced, the device has certain crosstalk resistance, and the device has strong stability in a direct current tolerance test.
When a 1S1R device is prepared by a traditional method, 1S1R performance is often unavailable, because when a 1S1R device is directly formed by stacking and integrating gate tubes made of other materials (oxygen vacancy type, metal filament type and the like) and resistive random access memories made of other materials (oxygen vacancy type, metal filament type and the like) directly, two functional layers interfere with each other, oxygen vacancies or metal filaments penetrate each other, so that two devices fail, and stable 1S1R performance cannot be obtained. Therefore, the prior 1S1R device often has an intermediate electrode for assisting connection, or two separate devices are connected by a lead to form a 1S1R device, the former integrates the integrated storage array of the V-point type which is not suitable for the application of the intermediate electrode, and the latter can only obtain the 1S1R performance and can not be used in the integrated storage array; the 1S1R device adopts a titanium-doped niobium oxide gate tube which does not need a Fomring process and has a series of advantages of overshoot current resistance and the like, and a resistive random access memory device based on a nitride material which has an inhibition effect on oxygen vacancy movement. Meanwhile, each of them has extremely stable performance in their separate operations. Therefore, in the use process of the 1S1R device formed by directly integrating and stacking the two devices, the oxygen vacancy movement between the two functional layers in the respective functional engineering is almost not interfered with each other, and the excellent performance and stability of the functional layers are respectively maintained, so that the intermediate electrode is not needed, and the excellent performance and stability can be also shown. The 1S1R device can be simultaneously applied to an X-point cross array and a V-point vertical array, provides technical support for realizing an ultrahigh-density three-dimensional storage array by the RRAM, has high value in industry and academia, and has wide application prospect.
Based on the same inventive concept, the embodiment of the present application further provides a method for preparing the titanium-doped niobium oxide-based 1S1R device, which includes the following steps:
s1, providing a bottom electrode;
s2, preparing a conversion layer on the surface of the bottom electrode;
s3, preparing a resistance change layer on the surface of the conversion layer far away from the bottom electrode;
s4, preparing a top electrode on the surface of the side, away from the bottom electrode, of the resistance change layer;
wherein the material of the conversion layer is titanium-doped niobium oxide.
The S2 specifically comprises the following steps: a metal titanium target and a niobium pentoxide target are arranged on the magnetron sputtering equipment, and the system pressure in a vacuum chamber of the magnetron sputtering equipment is controlled to be 4.1 multiplied by 10 after argon is introduced at room temperature-1Pa, and carrying out co-sputtering deposition on the bottom electrode under the conditions that the niobium pentoxide target power is 40-60W and the Ti target power is 15-30W to obtain the titanium-doped niobium oxide, namely the conversion layer. It is obvious that in practice, chemical vapor deposition and other physical vapor depositions may be used in addition to the magnetron sputtering method.
S3 specifically includes: the material of the resistance change layer is silicon nitride material, a silicon nitride target material is arranged on the magnetron sputtering equipment, and the system pressure in the vacuum chamber of the magnetron sputtering equipment is controlled to be 4.1 multiplied by 10 after argon is introduced at room temperature-1And Pa, depositing a silicon nitride film on the surface of the conversion layer under the condition that the sputtering power is 40-60W to obtain the resistance change layer. It is obvious that in practice, chemical vapor deposition and other physical vapor depositions may be used in addition to the magnetron sputtering method.
S4 specifically includes: the top electrode is made of Ti, and the preparation method of the top electrode comprises the following steps: mounting titanium target on magnetron sputtering equipment, and controlling at room temperatureThe system pressure in the vacuum chamber of the magnetron sputtering equipment is 4.1 multiplied by 10 after argon is introduced-1Pa, and depositing a titanium film on the surface of the resistance change layer under the condition that the sputtering power is 40-60W, namely, the top electrode. It is obvious that in practice, chemical vapor deposition and other physical vapor depositions may be used in addition to the magnetron sputtering method.
The following further describes the 1S1R device of the present application and its method of preparation in specific embodiments.
Example 1
This example provides a titanium doped niobium oxide based 1S1R device, comprising:
a bottom electrode 1, a conversion layer 2, a resistance change layer 3 and a top electrode 4, wherein the material of the conversion layer 2 is titanium-doped niobium oxide (NbO)x(Ti-doped)), the material of the bottom electrode 1 is Pt, and the material of the resistance change layer 3 is silicon nitride (SiNO)x) The film material, the top electrode 4 material is Ti film material; the thickness of the bottom electrode is about 200 nm; the conversion layer 2 is approximately 100nm thick; the thickness of the resistance change layer is about 40 nm; the top electrode was about 105nm thick and the top electrode was circular in shape and 200 μm in diameter.
The preparation method of the 1S1R device comprises the following steps:
s1, pretreating the surface of the film-carrying substrate with the Pt bottom electrode, wherein the pretreatment method comprises the following steps: ultrasonically cleaning in an ultrasonic instrument for 30min by sequentially using acetone, ethanol and deionized water, and then taking out and drying by using high-pressure gas; the film-carrying substrate with Pt bottom electrode in the present application was purchased from Nippon Kagaku Co., Ltd, specifically, SiO with a thickness of 500nm was deposited on a Si wafer in sequence250nm thick Ti and 200nm thick Pt; in practice, the film-carrying substrate may be a TiN substrate (sequentially deposited SiO with a thickness of 500nm on a Si wafer)250nm thick Ti and 200nm thick TiN), W substrate (500 nm thick SiO deposited on a Si wafer in sequence2100nm thick W) and Ti substrate (500 nm thick SiO deposited sequentially on a Si wafer2100nm thick Ti), etc.;
s2, mounting a metal titanium target and a niobium pentoxide target on the magnetron sputtering equipment, and controlling the system pressure in the vacuum chamber of the magnetron sputtering equipment to be 4.1 multiplied by 10 after argon is introduced at room temperature-1Pa, 50W of niobium pentoxide target power and Ti target powerUnder the condition of 20W, co-sputtering and depositing on the surface of the Pt bottom electrode to prepare titanium-doped niobium oxide which is a conversion layer, wherein the deposition time is 1800 s;
s3, mounting the silicon nitride target on the magnetron sputtering equipment, and controlling the system pressure in the vacuum chamber of the magnetron sputtering equipment to be 4.1 multiplied by 10 after argon is introduced at room temperature-1Pa, depositing a silicon nitride film on the surface of the conversion layer under the condition that the sputtering power is 40W to obtain a resistance change layer, wherein the deposition time is 2400 s;
s4, mounting the titanium target in the magnetron sputtering equipment, and controlling the system pressure in the vacuum chamber of the magnetron sputtering equipment to be 4.1 multiplied by 10 after argon is introduced at room temperature-1And Pa, depositing a titanium film on the surface of the resistance change layer under the condition that the sputtering power is 40W, wherein the deposition time is 1800 s.
Example 2
The device structure and the fabrication method of 1S1R in this example are the same as those in example 1, except that the sputtering power of the niobium pentoxide target in the step of fabricating the switching layer in this example is 40W, and the other parameters are the same as those in example 1.
Example 3
The device structure and the fabrication method of 1S1R in this example are the same as those in example 1, except that in the step of fabricating the switching layer in this example, the sputtering power of the Ti target is 21W, and the other parameters are the same as those in example 1.
Comparative example 1
The gate tube device structure and the preparation method of the comparative example are the same as those of example 1, except that the gate tube device structure of the comparative example does not contain a silicon nitride resistance change layer, that is, the gate tube device of the comparative example only comprises a bottom electrode layer, a conversion layer and a top electrode layer in sequence from bottom to top, and other parameters are the same as those of example 1.
Comparative example 2
The RRAM device structure and the manufacturing method of the present comparative example are the same as those of example 1, except that the RRAM device structure of the present comparative example does not include the titanium-doped niobium oxide conversion layer, that is, the RRAM device of the present comparative example sequentially includes only the bottom electrode layer, the resistance change layer, and the top electrode layer from bottom to top, and other parameters are the same as those of example 1.
Comparative example 3
The device structure and fabrication method of the 1S1R device of this comparative example are the same as those of example 1, except that the switching layer in the device structure of 1S1R of this comparative example is a niobium oxide switching layer, and the other parameters are the same as those of example 1.
And (3) performance testing:
the 1S1R device prepared in example 1 was characterized using a zeiss cross beam 540 focused ion beam dual beam system, and the FIB-SEM cross-sectional image is shown in fig. 2.
The 1S1R device prepared in examples 1 and 2 and the 1S1R device prepared in comparative examples 1 and 2 were subjected to I-V testing on agilent B1500A semiconductor parametric analyzer test platform, and the 1S1R device in example 1 is mainly described in detail herein.
Two probes are respectively used for contacting a top electrode and a bottom electrode of the 1S1R device in example 1, wherein one end contacting the top electrode is positive voltage; firstly, a Forming process is carried out, a larger forward scanning voltage (8V,4mA current limiting) activation device is set by using Agilent B1500A test software, and a conductive channel is formed by soft breakdown of the activation device, as shown in figure 3; then, conducting channels are broken back to a high-resistance state by using a small voltage (-2V,100mA current limiting) in the negative direction; setting a scanning voltage of-1.7V- +2V by using Agilent B1500A test software, wherein one cycle of the scanning voltage is divided into four parts, namely, scanning from 0V to +2V, and then scanning from +2V to 0V, and the two parts are set to limit the current to 3 mA; then from 0V to-1.7V and finally from-1.7V to 0V, both parts are not, i.e. are limited to 100 mA. That is, a cycle is completed, the current takes 101 reading points when the scanning steps of each part are 101, that is, the voltage is scanned from 0V to +2V, the I-V cycle test chart is shown in FIG. 4, the impedance state distribution diagrams under 1/2 reading rule and 1/3 reading rule at a certain reading voltage are shown in FIGS. 5-6, and the relevant voltage distribution diagrams of SET voltage (transition voltage), RESET voltage (RESET voltage) are shown in FIGS. 7-8.
It should be noted that, the 1/2 reading rule and the 1/3 reading rule can be specifically referred to the Kim, et al crossbar array[J]Solid State Electronics,2015.DOI 10.1016/j. sse.2015.08.001. Using a single layer criss-cross array as an example, the 1/2 read rule is that the voltages on all unselected word lines and bit lines are set to half the read voltage (1/2V)read) While the word line of the selected cell is grounded and the bit line voltage is set to the read voltage (V)read). In the 1/2 read grid, all unselected word lines and bit lines are biased to half the read voltage (1/2V)read) And most of the leakage current is sourced from half-selected cells in the selected word line and bit line. 1/3 read rule, i.e., the voltage on all unselected word lines is set to 2/3 (2/3V) of the read voltageread) 1/3 (1/3V) with the voltage on the unselected bit line set to the read voltageread) While the word line of the selected cell is grounded and the bit line voltage is set to the read voltage (V)read). Under the 1/3 read rule, selecting cells from all word lines and all thirds of all bit lines results in leakage currents. When the performance of the 1S1R device is better, the leakage current is smaller.
In fig. 7, each voltage on the abscissa corresponds to one box, and the values of the boxes are concentrated, which shows that the operating voltages have small discreteness and are very stable.
FIGS. 9 to 10 are I-V cycle test charts of 1S1R devices prepared according to examples 2 and 3; FIG. 11 is a graph showing the results of I-V cycling tests on a 1S1R device made according to comparative example 1; FIG. 12 is a graph showing the results of I-V cycling tests on a 1S1R device made based on comparative example 2; FIG. 13 is a graph of the I-V cycle test results (60 cycles) for the 1S1R device made in comparative example 3.
As can be seen from fig. 4, the 1S1R device has a larger memory window and a larger gating ratio (nonlinear value), effectively reduces the leakage current, and obtains the basic performance of the memristor with crosstalk resistance. For forward scan, when the scan voltage is greater than the threshold voltage of the gate device, the gate device turns on, but the entire device is turned on when the voltage reaches the transition voltage (V) of the resistive switching elementset) It will transition to the low resistance state. After the voltage drops to the holding voltage (V)holdBefore (+) the gate tube device is always kept in an open state, when the voltage is less than the holding voltage, the gate tube is closed, the whole device is converted into a high-resistance state, and the effect of startingThe effect of suppressing leakage current; for negative-going scans, when the voltage reaches the threshold voltage (V)th-) the gate tube is turned on, the device is changed to a low resistance state, and when the voltage is further increased to the reset voltage (V) of the resistive unitreset) The resistance changing unit changes to a high resistance state, the gate tube is also closed in the flyback process, and the device changes to keep the high resistance state.
The core of the 1S1R device is silicon nitride (SiNO) with stable resistance change performancex) Thin film material and titanium-doped niobium oxide [ NbO ] having excellent gating propertiesx(Ti-doped)]A film material. As can be seen from fig. 5 to 8, the 1S1R devices SET, RESET, and other related voltage stabilities are better, and the resistance state remains stable within 130 dc cycles, especially compared with the 1S1R device based on the titanium-free niobium oxide gate tube and the silicon nitride resistance change layer, the stability is significantly improved (compare fig. 11 to 13). In addition, the 1S1R is not provided with an integrated intermediate electrode, can be simultaneously applied to an X-point three-dimensional storage array and a V-point vertical three-dimensional storage array, and provides technical support for realizing an ultrahigh-density three-dimensional storage array by the RRAM. In conclusion, the device has excellent and stable performance and high application value.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.

Claims (10)

1. A titanium doped niobium oxide based 1S1R device, comprising:
a bottom electrode;
the conversion layer is positioned on one side surface of the bottom electrode;
the resistance change layer is positioned on the surface of one side, away from the bottom electrode, of the conversion layer;
the top electrode is positioned on the surface of one side, far away from the bottom electrode, of the resistance change layer;
wherein the material of the conversion layer is titanium-doped niobium oxide.
2. The titanium doped niobium oxide based 1S1R device of claim 1, wherein the material of the resistive layer is silicon nitride.
3. The titanium doped niobium oxide based 1S1R device of claim 1, wherein the material of the bottom electrode is one of Ti, Pt, W or TiN; the top electrode is made of one of Pt or Ti.
4. The titanium-doped niobium oxide-based 1S1R device according to claim 1, wherein the bottom electrode has a thickness of 180 to 220nm, the switching layer has a thickness of 80 to 100nm, the resistive layer has a thickness of 40 to 60nm, and the top electrode has a thickness of 60 to 100 nm.
5. The titanium doped niobium oxide based 1S1R device, according to claim 1, wherein the top electrode is rectangular or circular, the rectangle has a side length of 50-1000 μm, and the circle has a diameter of 50-1000 μm.
6. A preparation method of a 1S1R device based on titanium-doped niobium oxide is characterized by comprising the following steps:
providing a bottom electrode;
preparing a conversion layer on the surface of the bottom electrode;
preparing a resistance change layer on the surface of one side of the conversion layer, which is far away from the bottom electrode;
preparing a top electrode on the surface of one side of the resistance change layer, which is far away from the bottom electrode;
wherein the material of the conversion layer is titanium-doped niobium oxide.
7. The method for preparing the titanium-doped niobium oxide-based 1S1R device according to claim 6, wherein the step of preparing the conversion layer on the surface of the bottom electrode specifically comprises:
and co-depositing titanium-doped niobium oxide on the surface of the bottom electrode by using a magnetron sputtering method by taking metal titanium and niobium pentoxide as targets, wherein the titanium-doped niobium oxide is the conversion layer.
8. The method for preparing the titanium-doped niobium oxide-based 1S1R device according to claim 6, wherein the material of the resistive layer is a silicon nitride material, and the method for preparing the resistive layer specifically comprises:
and preparing silicon nitride on the surface of the conversion layer by using a magnetron sputtering method by using the silicon nitride as a target material, wherein the silicon nitride is the resistance change layer.
9. The method for preparing the titanium-doped niobium oxide-based 1S1R device according to claim 6, wherein the material of the top electrode is Ti, and the method for preparing the top electrode specifically comprises the following steps:
and (3) taking titanium as a target material, and preparing the titanium on the surface of the resistance change layer by using a magnetron sputtering method, wherein the titanium is the top electrode.
10. The method for preparing the titanium-doped niobium oxide-based 1S1R device according to claim 7, wherein the niobium pentoxide target sputtering power is 40-60W, and the metallic titanium target sputtering power is 15-30W.
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