CN113031141A - Method for processing blazed grating based on gravity field - Google Patents

Method for processing blazed grating based on gravity field Download PDF

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Publication number
CN113031141A
CN113031141A CN202110363795.2A CN202110363795A CN113031141A CN 113031141 A CN113031141 A CN 113031141A CN 202110363795 A CN202110363795 A CN 202110363795A CN 113031141 A CN113031141 A CN 113031141A
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CN
China
Prior art keywords
glue
liquid
side wall
ultraviolet
processing
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Pending
Application number
CN202110363795.2A
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Chinese (zh)
Inventor
高国涵
杜俊峰
边疆
雷柏平
李志炜
刘鑫
毛丹波
殷家家
汪利华
罗倩
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Institute of Optics and Electronics of CAS
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Institute of Optics and Electronics of CAS
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Application filed by Institute of Optics and Electronics of CAS filed Critical Institute of Optics and Electronics of CAS
Priority to CN202110363795.2A priority Critical patent/CN113031141A/en
Publication of CN113031141A publication Critical patent/CN113031141A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1852Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding

Abstract

The invention provides a method for processing blazed grating based on gravity field, which is divided into 4 steps of positioning side wall processing, glue solution pouring, inclined ultraviolet curing and film coating, and comprises a plane substrate, a positioning side wall, liquid ultraviolet glue, solid ultraviolet glue, an ultraviolet light source and a reflecting film layer; the plane substrate is used as a substrate supporting and positioning side wall and contains liquid ultraviolet glue, and the positioning side wall is precisely processed on the surface of the plane substrate in the modes of photoetching, etching, cutting, printing and the like. The plane substrate is inclined at a specific angle, the liquid ultraviolet glue is solidified by using an ultraviolet light source to form solid ultraviolet glue, and finally, a reflecting film layer is plated on the surface of the solid ultraviolet glue.

Description

Method for processing blazed grating based on gravity field
Technical Field
The invention belongs to the field of micro-optical processing, and particularly relates to a method for processing blazed gratings based on a gravitational field.
Background
In the field of micro-optical machining, blazed gratings are generally manufactured by means of diamond cutting or direct writing lithography. Diamond cutting can only process on the surface of softer metal and other materials, and has the defects of insufficient processing precision, higher surface roughness, shorter service life of a cutting head and the like. The direct-write photoetching adopts laser beam variable dose gray level exposure to form a quasi-continuous surface-shaped micro-relief in a photoresist layer, and has the defects of low processing efficiency, high cost, limited material selection and the like.
Disclosure of Invention
In order to overcome the defects of the existing blazed grating processing technology, the invention provides a method for processing a blazed grating based on a gravitational field.
The technical scheme adopted by the invention for solving the technical problems is as follows:
the invention relates to a method for processing blazed grating based on gravity field, which is divided into 4 steps of positioning side wall processing, glue solution pouring, inclined ultraviolet curing and film coating, wherein the device utilized by the method comprises a plane substrate, a positioning side wall, liquid ultraviolet glue, solid ultraviolet glue, an ultraviolet light source and a reflecting film layer; the method comprises the following steps: the plane substrate is used as a substrate supporting and positioning side wall and contains liquid ultraviolet glue, and the positioning side wall is precisely processed on the surface of the plane substrate in the modes of photoetching, etching, cutting, printing and the like. The plane substrate is inclined at a specific angle, the liquid ultraviolet glue is solidified by using an ultraviolet light source to form solid ultraviolet glue, and finally, a reflecting film layer is plated on the surface of the solid ultraviolet glue.
The flatness of the plane substrate is better than 10 μm, and the material selection includes but is not limited to glass, quartz, aluminum alloy, stainless steel and the like. The surface of the planar substrate is required to be clean and have a low surface roughness RMS of less than 100 nm.
The positioning side wall is positioned on the surface of the plane substrate and is parallel to the grating direction, and the material selection can be the substrate material per se, and can also be polymers including but not limited to SU-8 photoresist. The positioning side wall has submicron positioning accuracy, the positioning side wall is processed by a photoetching or mechanical cutting mode, the period of the positioning side wall is consistent with the design period of the blazed grating, the ratio of the height to the period is determined by the blazed angle, and the width is as small as possible within the process allowable range. It should be noted that the two sides of the planar substrate surface perpendicular to the grating direction also have sidewalls of the same height to prevent the liquid uv glue from overflowing.
The liquid ultraviolet glue is contained in a closed area formed by the plane substrate and the positioning side wall in a pouring mode, the liquid level of the liquid ultraviolet glue is flush with the upper surface of the positioning side wall, and the liquid ultraviolet glue is made of materials including but not limited to NOA61 ultraviolet glue. The liquid ultraviolet glue is reasonably selected or modified according to the surface characteristics of the positioning side wall, so that the wetting angle of the liquid ultraviolet glue is close to 90 degrees.
The liquid ultraviolet glue overflows the redundant glue solution along the inclined direction under the action of gravity after the plane substrate is inclined, the surface of the glue solution is always kept horizontal, and the inclined angle is determined by a blazed angle. And the inclined tool clamp is reasonably selected, a vibration source is isolated, and the liquid level of the glue solution is kept static. The wavelength of the ultraviolet light source is consistent with the absorption wavelength of the liquid ultraviolet glue, the typical absorption wavelength is 365nm, the uniformity of the illumination intensity of the light source is better than 90 percent, and the energy density is not lower than 10mW/cm2
The solid ultraviolet glue is formed by converting liquid ultraviolet glue, and molecular chains generate polymerization crosslinking reaction under ultraviolet illumination, and gradually change from liquid state to solid state. The liquid ultraviolet glue does not contain a solvent, and the volume and the surface shape of the liquid ultraviolet glue are not changed after the liquid ultraviolet glue is converted into the solid ultraviolet glue.
The reflecting film layer is formed by plating on the surface of the solid ultraviolet glue in a vacuum physical deposition mode, and the materials include, but are not limited to, gold, silver, aluminum, chromium, silicon and the like. The parameters of the reflecting film layer, such as material, thickness and the like, are determined by the design parameters of the blazed grating.
The method comprises the following working procedures: firstly, obtaining a planar substrate by means of mechanical polishing and the like, then processing a positioning side wall on the surface of the planar substrate by means of cutting, photoetching, printing and the like, then pouring liquid ultraviolet glue and obliquely carrying out ultraviolet curing, and finally plating a reflecting film layer on the surface of the solid ultraviolet glue.
Compared with the prior art, the invention has the advantages that:
(1) compared with diamond cutting, the invention can improve the smoothness of the processed surface, improve the processing precision of the micro-topography and overcome the problem of short service life of the cutting head.
(2) Compared with direct-write photoetching processing, the method has the advantages that the processing efficiency can be greatly improved, the processing precision of the micro-morphology is improved, and the processing cost is reduced.
Drawings
Fig. 1 is a schematic diagram of a method for processing a blazed grating based on a gravitational field, where fig. 1(a) is processing of a positioning side wall, fig. 1(b) is glue pouring, fig. 1(c) is oblique ultraviolet curing, and fig. 1(d) is coating.
The reference numbers in the figures mean: 1 is a plane substrate, 2 is a positioning side wall, 3-1 is liquid ultraviolet glue, 3-2 is solid ultraviolet glue, 4 is an ultraviolet light source, and 5 is a reflecting film layer.
Detailed Description
The present invention will be described in detail below with reference to the accompanying drawings and specific embodiments.
Examples
The invention relates to a method for processing blazed grating based on gravity field, which can be divided into 4 steps of positioning side wall processing, glue solution pouring, inclined ultraviolet curing and film coating, and comprises a planar substrate 1, a positioning side wall 2, liquid ultraviolet glue 3-1, solid ultraviolet glue 3-2, an ultraviolet light source 4 and a reflecting film layer 5; the plane substrate 1 is used as a substrate supporting and positioning side wall 2 and contains liquid ultraviolet glue 3-1, and the positioning side wall 2 is precisely machined on the surface of the plane substrate 1 in the modes of photoetching, etching, cutting, printing and the like. The planar substrate 1 is inclined at a specific angle, the liquid ultraviolet glue 3-1 is solidified by the ultraviolet light source 4 to form solid ultraviolet glue 3-2, and finally, a reflecting film layer is plated on the surface of the solid ultraviolet glue 3-2.
The flatness of the planar substrate 1 is better than 10 μm, and the material selection includes but is not limited to glass, quartz, aluminum alloy, stainless steel and the like. The surface of the planar substrate 1 is required to be clean and have a low surface roughness RMS of less than 100 nm.
The positioning side wall 2 is positioned on the surface of the planar substrate 1 and is parallel to the grating direction, and the material selection can be the substrate material itself, and can also be a polymer including but not limited to SU-8 photoresist. The positioning side wall 2 has submicron positioning accuracy, is processed by photoetching or mechanical cutting, the period of the positioning side wall is consistent with the design period of the blazed grating, the ratio of the height to the period is determined by the blazed angle, and the width is as small as possible within the process allowable range. It should be noted that, the two sides of the surface of the planar substrate 1 perpendicular to the grating direction also have the same height sidewall for preventing the liquid ultraviolet glue 3-1 from overflowing.
The liquid ultraviolet glue 3-1 is contained in a closed area formed by the plane substrate 1 and the positioning side wall 2 in a pouring mode, the liquid level is flush with the upper surface of the positioning side wall 2, and the material selection includes but is not limited to NOA61 ultraviolet glue. The liquid ultraviolet glue 3-1 is reasonably selected or modified according to the surface characteristics of the positioning side wall 2 to enable the wetting angle to be close to 90 degrees.
The liquid ultraviolet glue 3-1 overflows the redundant glue solution in the inclined direction under the action of gravity after the plane substrate 1 is inclined, the surface of the glue solution is always kept horizontal, and the inclined angle is determined by a blazed angle. And the inclined tool clamp is reasonably selected, a vibration source is isolated, and the liquid level of the glue solution is kept static. The wavelength of the ultraviolet light source 4 is consistent with the absorption wavelength of the liquid ultraviolet glue 3-1, the typical absorption wavelength is 365nm, the uniformity of the illumination of the light source is better than 90 percent, and the energy density is not lower than 10mW/cm2
The solid ultraviolet glue 3-2 is formed by converting liquid ultraviolet glue 3-1, and molecular chains generate polymerization crosslinking reaction under ultraviolet illumination, and gradually change from liquid state to solid state. The liquid ultraviolet glue 3-1 does not contain solvent, and the volume and the surface shape do not change after being converted into the solid ultraviolet glue 3-2.
The reflecting film layer 5 is formed by plating on the surface of the solid ultraviolet glue 3-2 in a vacuum physical deposition mode, and the materials include, but are not limited to, gold, silver, aluminum, chromium, silicon and the like. The parameters of the reflecting film layer 5, such as material and thickness, are determined by the design parameters of the blazed grating.
The working process of the invention is as follows:
firstly, obtaining a planar substrate 1 by means of mechanical polishing and the like, then processing a positioning side wall 2 on the surface of the planar substrate by means of cutting, photoetching, printing and the like, then pouring liquid ultraviolet glue 3-1, carrying out inclined ultraviolet curing under an ultraviolet light source 4, and finally plating a reflecting film layer 5 on the surface of the solid ultraviolet glue 3-2.
Although the embodiments of the present invention have been described above in order to facilitate the understanding of the present invention by those skilled in the art, it is to be understood that the present invention is not limited to the scope of the embodiments, and it will be apparent to those skilled in the art that various changes may be made without departing from the spirit and scope of the invention as defined and defined by the appended claims, and all matters produced by the invention using the inventive concept are to be protected.

Claims (7)

1. A method for processing blazed grating based on gravity field is characterized in that the method can be divided into 4 steps of positioning side wall processing, glue solution pouring, inclined ultraviolet curing and film coating, and a device utilized by the method comprises a plane substrate (1), a positioning side wall (2), liquid ultraviolet glue (3-1), solid ultraviolet glue (3-2), an ultraviolet light source (4) and a reflecting film layer (5); the method comprises the following steps: the plane substrate (1) is used as a substrate to support and position the side wall (2) and contain liquid ultraviolet glue (3-1), the side wall (2) is precisely processed and positioned on the surface of the plane substrate (1) in a photoetching, etching, cutting and/or printing mode, the plane substrate (1) is inclined at a specific angle, the liquid ultraviolet glue (3-1) is solidified by using an ultraviolet light source (4) to form the solid ultraviolet glue (3-2), and finally a reflecting film layer is plated on the surface of the solid ultraviolet glue (3-2).
2. A method for fabricating blazed grating based on gravity field according to claim 1, wherein the flatness of the planar substrate (1) is better than 10 μm, the material is selected from glass, quartz, aluminum alloy and stainless steel, and the surface of the planar substrate (1) is required to be clean and have low surface roughness RMS less than 100 nm.
3. The method for processing the blazed grating based on the gravitational field as claimed in claim 1, wherein the positioning sidewall (2) is located on the surface of the planar substrate (1) and parallel to the grating direction, the material can be the substrate material itself, or the polymer can include SU-8 photoresist, the positioning sidewall (2) has sub-micron positioning accuracy, the positioning sidewall is processed by lithography or mechanical cutting, the period of the positioning sidewall coincides with the design period of the blazed grating, the ratio of the height to the period is determined by the blazed angle, the width is as small as possible within the process tolerance range, and it is noted that the sidewall with the same height is respectively located on both sides of the surface of the planar substrate (1) perpendicular to the grating direction for preventing the liquid ultraviolet glue (3-1) from overflowing.
4. The method for processing the blazed grating based on the gravitational field as claimed in claim 1, wherein the liquid uv-glue (3-1) is contained in a closed area defined by the planar substrate (1) and the positioning side wall (2) by casting, the liquid level is flush with the upper surface of the positioning side wall (2), the material selection comprises NOA61 uv-glue, and the wetting angle of the liquid uv-glue (3-1) is reasonably selected or modified to be close to 90 ° according to the surface characteristics of the positioning side wall (2).
5. The method for processing the blazed grating based on the gravity field as claimed in claim 1, wherein the liquid ultraviolet glue (3-1) overflows the excessive glue solution in the inclined direction under the action of gravity after the plane substrate (1) is inclined, the surface of the glue solution is always kept horizontal, the inclined angle is determined by the blazed angle, an inclined tool fixture is reasonably selected, a vibration source is isolated, the liquid level of the glue solution is kept static, the wavelength of the ultraviolet light source (4) is consistent with the absorption wavelength of the liquid ultraviolet glue (3-1), the typical absorption wavelength is 365nm, the uniformity of the light source illumination is better than 90%, and the energy density is not lower than 10mW/cm2
6. The method for processing the blazed grating based on the gravitational field as recited in claim 1, wherein the solid uv-gel (3-2) is converted from a liquid uv-gel (3-1), molecular chains undergo a polymerization crosslinking reaction under uv illumination, gradually change from a liquid state to a solid state, the liquid uv-gel (3-1) does not contain a solvent, and the volume and the surface shape do not change after being converted into the solid uv-gel (3-2).
7. The method for processing the blazed grating based on the gravitational field as claimed in claim 1, wherein the reflective film layer (5) is formed by plating on the surface of the solid ultraviolet glue (3-2) in a vacuum physical deposition manner, the material comprises gold, silver, aluminum, chromium, and silicon, and the parameters of the reflective film layer (5) such as the material and the thickness are determined by the design parameters of the blazed grating.
CN202110363795.2A 2021-04-02 2021-04-02 Method for processing blazed grating based on gravity field Pending CN113031141A (en)

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