CN113028920B

CN113028920B - Blasthole arrangement method and device, electronic equipment and storage medium

Info

Publication number: CN113028920B
Application number: CN202110243177.4A
Authority: CN
Inventors: 衣忠强; 唐瑶; 特日格乐; 赵风岭; 朱钰琳; 杨冰; 张伟; 李仁强; 舒承兴; 阎树东
Original assignee: China Railway Ninth Bureau Group No1 Construction Co ltd
Current assignee: China Railway Ninth Bureau Group No1 Construction Co ltd
Priority date: 2021-03-05
Filing date: 2021-03-05
Publication date: 2023-02-28
Anticipated expiration: 2041-03-05
Also published as: CN113028920A

Abstract

The embodiment of the invention provides a blasthole arrangement method, a blasthole arrangement device, electronic equipment and a storage medium, wherein the method comprises the following steps: acquiring a blast hole arrangement parameter table, wherein the blast hole arrangement parameter table is established according to a preset format; modeling is carried out in a three-dimensional space to obtain a blasthole arrangement base mold, wherein the blasthole arrangement base mold comprises a tunnel secondary lining contour line; and calculating to obtain a blasthole arrangement model according to the blasthole arrangement parameter table and the tunnel secondary lining contour line, wherein the blasthole arrangement model and the blasthole arrangement parameter table have a parameter link relation, so that when parameters in the blasthole arrangement parameters are changed, the blasthole arrangement model is correspondingly changed. The blast hole arrangement parameters and the three-dimensional model can be linked, the three-dimensional model can directly map the blast hole arrangement, and in the modification process, the modified three-dimensional model can be automatically generated only by modifying the blast hole arrangement parameters, so that the mapping efficiency of the blast hole arrangement is improved.

Description

Blasthole arrangement method and device, electronic equipment and storage medium

Technical Field

The invention relates to the field of tunnel blasting, in particular to a blasthole arrangement method and device, electronic equipment and a storage medium.

Background

In the basic construction of highways, railways and the like, the highway often meets with mountains, at the moment, a tunnel excavation mode is usually adopted for passing, and in the process of tunnel excavation, blasting means are used for assisting excavation so as to improve the speed of excavation engineering. Moreover, in the existing mode, different blasting schemes need to be designed for different mountains, different blasting parameters corresponding to the different blasting schemes need to participate in each tunnel blasting, a corresponding blast hole layout drawing is formed after the blasting parameters are obtained through drawing, the drawing process is troublesome, the drawing efficiency is low, when the drawing process needs to be modified, the modified image needs to be drawn again, and the drawing efficiency is lower.

Disclosure of Invention

The embodiment of the invention provides a blasthole arrangement method, which can automatically generate a blasthole arrangement diagram on the basis of a three-dimensional model through a blasthole arrangement parameter table.

In a first aspect, an embodiment of the present invention provides a blasthole arrangement method, where the method includes:

acquiring a blast hole arrangement parameter table, wherein the blast hole arrangement parameter table is established according to a preset format;

modeling is carried out in a three-dimensional space to obtain a blasthole arrangement base mold, wherein the blasthole arrangement base mold comprises a tunnel secondary lining contour line;

and calculating to obtain a blasthole arrangement model according to the blasthole arrangement parameter table and the tunnel secondary lining contour line, wherein the blasthole arrangement model and the blasthole arrangement parameter table have a parameter link relation, so that when parameters in the blasthole arrangement parameters change, the blasthole arrangement model correspondingly changes.

Optionally, the parameters in the parameter table for arranging the blastholes are divided into length parameters, slope rate parameters and angle parameters according to unit categories, and each parameter has a corresponding key and value.

Optionally, the length parameter includes: the blast hole arrangement model is obtained by calculation according to the blast hole arrangement parameter table and the tunnel secondary lining contour line, and comprises the following steps:

on the blast hole arrangement base die, taking the tunnel secondary lining contour line as a reference, taking the peripheral hole center line and the secondary lining distance as offsets to obtain a peripheral hole center line, taking the baseplate hole center line and the secondary lining distance as offsets to obtain a baseplate hole center line, taking the excavation surface and the secondary lining distance as offsets to obtain a tunnel excavation contour line, carrying out parameter link on the peripheral hole center line, the secondary lining distance and the peripheral hole center line during offset, carrying out parameter link on the baseplate hole center line, the secondary lining distance and the baseplate hole center line, and carrying out parameter link on the excavation surface, the secondary lining distance and the tunnel excavation contour line;

drawing a cut area range on the blasthole arrangement base mold according to the cut area action width and the cut area action height, and performing parameter linkage on the cut area action width and the cut area action height and the cut area range;

and calculating to obtain a blast hole arrangement model based on the peripheral hole central lines, the bottom plate hole central lines, the cut area range and the tunnel excavation contour line.

Optionally, the length parameter further includes: the blast hole arrangement model is obtained by calculation based on the peripheral hole center line, the bottom plate hole center line, the cut area range and the tunnel excavation contour line, and comprises the following steps:

according to the peripheral eye center line, the bottom plate eye center line and the tunnel excavation contour line, combining the peripheral eye distance, the peripheral eye diameter, the peripheral eye depth, the bottom plate eye distance, the bottom plate eye diameter, the bottom plate eye depth and the blast hole distance, calculating the number of the peripheral eyes and the number of the bottom plate eyes according to a preset first writing rule;

and arranging the peripheral holes and the bottom plate holes on the blast hole arrangement base model based on the number of the peripheral holes and the number of the bottom plate holes to obtain a blast hole arrangement model.

Optionally, the length parameter further includes: the method comprises the following steps of setting a base mold for arranging the peripheral holes and the bottom plate holes in the blasthole based on the number of the peripheral holes and the number of the bottom plate holes to obtain a blasthole arrangement model, wherein the method comprises the following steps:

stretching the blast hole arrangement base die along the tunnel excavation contour line to obtain a tunnel excavation entity;

linking the depth of the blasthole and the diameter of the blasthole on the tunnel excavation entity, and obtaining a first blasthole outline according to the difference of the tunnel excavation entity;

taking the center line of the peripheral holes and the center line of the bottom plate holes as paths, taking the first shot hole outline as an object, linking the number of the peripheral holes, the number of the bottom plate holes and the distance between the shot holes in an array mode, and arranging the peripheral holes and the bottom plate holes on the shot hole arrangement base die to obtain a first arrangement model;

and performing auxiliary calculation on the first arrangement model to obtain a blast hole arrangement model.

Optionally, the length parameter further includes: the method comprises the following steps of obtaining a first arrangement model, wherein the first arrangement model comprises a peripheral eye resistance line, a bottom plate eye resistance line, an auxiliary eye distance, an auxiliary eye diameter and an auxiliary eye depth, the first blasthole outline comprises a peripheral eye outline and a bottom plate eye outline, and the auxiliary calculation is carried out on the first arrangement model to obtain a blasthole arrangement model, and the method comprises the following steps:

respectively offsetting the contour of the peripheral eye and the contour of the bottom plate eye to obtain a first layer of auxiliary eye center line, and linking the offset distance of the contour of the peripheral eye with the peripheral eye resistance line, wherein the offset distance of the contour of the bottom plate eye is linked with the bottom plate eye resistance line;

calculating the number of the first layer of auxiliary eyes according to a preset second writing rule by combining the auxiliary eye distance, the auxiliary eye diameter, the auxiliary eye depth and the blast hole distance;

drawing a second shot hole outline by the number difference of the first layer of auxiliary eyes, and arranging the first layer of auxiliary eyes in an array;

shifting the center line of the first layer of auxiliary eyes, linking the shift distance of the center line of the first layer of auxiliary eyes with an auxiliary eye resistance line, drawing the center lines of the remaining auxiliary eyes, and calculating the remaining auxiliary eyes;

arranging auxiliary eyes on the first arrangement model to obtain a second arrangement model;

and carrying out post-processing on the second arrangement model to obtain a blast hole arrangement model.

Optionally, the length parameter further includes: vertical interval of undercutting blasthole, undercutting blasthole horizontal spacing, undercutting blasthole and central plane interval, undercutting blasthole diameter and the undercutting blasthole degree of depth, the angle parameter includes undercutting blasthole and facade contained angle, it is right the second arranges the model and carries out the aftertreatment, obtains the blasthole and arranges the model, includes:

obtaining a cutting area according to the link parameters of the cutting area range, drawing a blasthole arrangement sketch on the second arrangement model, and calculating a difference to draw a third blasthole outline;

adding text parameters of the cut areas, wherein the text parameters comprise the types of the cut areas;

and performing correlation correspondence on the text parameters of the slotting region according to a preset third writing rule, and adding form control to control the text parameters of the slotting region.

In a second aspect, an embodiment of the present invention further provides a blasthole arrangement apparatus, including:

the system comprises an acquisition module, a processing module and a processing module, wherein the acquisition module is used for acquiring a blast hole arrangement parameter table which is established according to a preset format;

the modeling module is used for modeling in a three-dimensional space to obtain a blasthole arrangement base mold, and the blasthole arrangement base mold comprises a tunnel secondary lining contour line;

and the processing module is used for calculating to obtain a blasthole arrangement model according to the blasthole arrangement parameter table and the tunnel secondary lining contour line, and the blasthole arrangement model and the blasthole arrangement parameter table have a parameter link relation so that when parameters in the blasthole arrangement parameters are changed, the blasthole arrangement model is correspondingly changed.

In a third aspect, an embodiment of the present invention provides an electronic device, including: the shot hole arrangement method comprises the following steps of storing the shot hole arrangement information, storing the shot hole arrangement information in the storage, storing the computer program on the storage, and running the computer program on the processor.

In a fourth aspect, the present invention provides a computer-readable storage medium, on which a computer program is stored, where the computer program, when executed by a processor, implements the steps in the method for arranging blastholes provided by the embodiment of the present invention.

In the embodiment of the invention, a blast hole arrangement parameter table is obtained, and the blast hole arrangement parameter table is established according to a preset format; modeling is carried out in a three-dimensional space to obtain a blasthole arrangement base mold, wherein the blasthole arrangement base mold comprises a tunnel secondary lining contour line; and calculating to obtain a blasthole arrangement model according to the blasthole arrangement parameter table and the tunnel secondary lining contour line, wherein the blasthole arrangement model and the blasthole arrangement parameter table have a parameter link relation, so that when parameters in the blasthole arrangement parameters change, the blasthole arrangement model correspondingly changes. The blast hole arrangement parameters and the three-dimensional model can be linked, the three-dimensional model can directly map the blast hole arrangement, and in the modification process, the modified three-dimensional model can be automatically generated only by modifying the blast hole arrangement parameters, so that the mapping efficiency of the blast hole arrangement is improved.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the prior art descriptions will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.

FIG. 1a is a flow chart of a method of arranging blastholes according to an embodiment of the invention;

FIG. 1b is a schematic illustration of a blasthole arrangement provided by an embodiment of the invention;

FIG. 1c is a schematic diagram of a parameter table for blasthole arrangement according to an embodiment of the present invention;

FIG. 2 is a detailed flowchart of a step 103 according to an embodiment of the present invention;

FIG. 3 is a flowchart illustrating a step 203 according to an embodiment of the present invention;

FIG. 4 is a detailed flowchart of a step 303 provided by the embodiment of the present invention;

FIG. 5 is a flowchart illustrating a detailed procedure of step 403 according to an embodiment of the present invention;

FIG. 6a is a detailed flowchart of a step 506 provided by the embodiment of the present invention;

FIG. 6b is a schematic cross-sectional view of a plunge cut blasthole provided in accordance with an embodiment of the invention;

FIG. 7 is a schematic structural diagram of a blasthole arrangement apparatus provided by an embodiment of the invention;

fig. 8 is a schematic structural diagram of an electronic device according to an embodiment of the present invention.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1a, fig. 1a is a flowchart of a blasthole arrangement method according to an embodiment of the present invention, as shown in fig. 1a, including the following steps:

101. and acquiring a blast hole arrangement parameter table.

In the embodiment of the invention, the shot hole arrangement parameter table is established according to a preset format.

Further, the parameters in the parameter table for arranging the blastholes are divided into length parameters, slope rate parameters and angle parameters according to unit categories, and each parameter has a corresponding key and value. The key may be an ID and/or a name of the parameter, the value refers to a specific numerical value corresponding to the parameter, and the corresponding value may be found by the key in the parameter table for blasthole arrangement.

In tunnel blasting, it is necessary to arrange blastholes according to a designed blasthole arrangement diagram, which includes the shape and size of the tunnel and the distribution of blastholes. As shown in fig. 1b, fig. 1b is a schematic diagram of a blasthole arrangement provided by an embodiment of the invention. The blastholes are divided into peripheral holes, baseplate holes, auxiliary holes and undercut blastholes according to the distribution positions, wherein the peripheral holes are distributed on the inner edge of the tunnel profile secondary lining, the baseplate holes are distributed on the inner edge of the bottom of the tunnel profile secondary lining, the undercut blastholes are distributed in the middle area (the middle area is also called an undercut area) of the tunnel plane, and the auxiliary holes are distributed in the area between the undercut holes and the peripheral holes (and the baseplate holes).

Specifically, as shown in fig. 1c, fig. 1c is a schematic diagram of a parameter table for blasthole arrangement provided by an embodiment of the present invention, where a preset format of the parameter table includes an ID of a parameter, a name of the parameter, a value of the parameter, and a unit of the parameter. The ID of the above parameters may be numbers or letters or a combination of numbers and letters. The names of the parameters comprise length, elevation, angle, longitudinal slope ratio, initial mileage, ending mileage, distance between an excavation surface and two linings, distance between a central line of a peripheral eye and two linings, distance between a central line of a bottom plate eye and two linings, action width of a cutting area, action height of the cutting area, distance between the peripheral eye, diameter of the peripheral eye, depth of the bottom plate eye, diameter of the bottom plate eye, distance between the bottom plate eye and the central plane, diameter of an auxiliary eye, depth of the auxiliary eye, resistance line of the peripheral eye, resistance line of the bottom plate eye, resistance line of the auxiliary eye, vertical distance of the cutting blasthole, horizontal distance of the cutting blasthole, distance between the cutting blasthole and the central plane, included angle 1 between the cutting blasthole and the vertical plane, included angle 2 between the cutting blasthole and the vertical plane, included angle 3 between the cutting blasthole and the vertical plane, depth 1, depth of the cutting blasthole 2, depth of the cutting blasthole 3 and diameter of the cutting blasthole. The value of the parameter is a specific numerical value of each parameter, and the unit of the parameter is a corresponding measurement unit, and can be meter (m), centimeter (cm), degree (deg) and specific value unit (ul).

102. And modeling in a three-dimensional space to obtain a shot hole arrangement base model.

In the embodiment of the invention, the blasthole arrangement base mold comprises a tunnel secondary lining contour line, and a ring of concrete lining is additionally arranged in the primary support of the tunnel secondary lining and generally used as a safety reserve. The tunnel lining contour line can be understood as an inner contour line of the tunnel. The basic model for arranging the blastholes is a solid model, and the shape of the basic model for arranging the blastholes is the same as the shape of the cross section of the tunnel.

103. And calculating to obtain a blast hole arrangement model according to the blast hole arrangement parameter table and the tunnel secondary lining contour line.

In the embodiment of the present invention, the blasthole arrangement model and the blasthole arrangement parameter table have a parameter link relationship, so that when parameters in the blasthole arrangement parameters change, the blasthole arrangement model changes correspondingly. The three-dimensional space can be any three-dimensional modeling space of three-dimensional software capable of linking parameters, and preferably, the three-dimensional space is the three-dimensional modeling space in the Inventor three-dimensional modeling software. In the Inventor three-dimensional modeling software, the shot hole arrangement parameter table can be linked into a three-dimensional modeling space through fx parameters. Specifically, the list of shot hole arrangement parameters can be linked into the three-dimensional modeling space of the Inventor through the "fx parameter" - "link".

Specifically, the blast hole arrangement parameter table includes length, elevation, angle, longitudinal slope ratio, starting mileage, ending mileage, distance between an excavation surface and two liners, distance between a center line of peripheral holes and two liners, distance between a center line of bottom plate holes and two liners, action width of a cutting area, action height of a cutting area, distance between peripheral holes, diameter of peripheral holes, depth of peripheral holes, distance between bottom plate holes, diameter of bottom plate holes, depth of bottom plate holes, distance of auxiliary holes, diameter of auxiliary holes, depth of auxiliary holes, resistance line of peripheral holes, resistance line of bottom plate holes, resistance line of auxiliary holes, vertical distance of cutting blast holes, horizontal distance of cutting blast holes, distance between cutting blast holes and center plane, included angle 1 of cutting blast holes and vertical plane, included angle 2 of cutting blast holes and vertical plane, included angle 3 of cutting blast holes and vertical plane, depth 1 of cutting blast holes, depth 2 of cutting blast holes, depth 3 of cutting blast holes, and diameter of cutting blast holes. The position distribution of the peripheral holes on the blast hole arrangement base die can be determined according to the distance between the central line of the peripheral holes and the two liners, the distance between the peripheral holes, the diameter of the peripheral holes, the depth of the peripheral holes and the resistance line of the peripheral holes. The position distribution of the bottom plate holes on the blast hole arrangement base die can be determined according to the distance between the center line of the bottom plate holes and the two substrates, the distance between the bottom plate holes, the diameter of the bottom plate holes, the depth of the bottom plate holes and the resistance line of the bottom plate holes. The position distribution of the cut blastholes on the blasthole arrangement base die can be determined according to the cutting surface, the distance between two linings, the cutting area acting width, the cutting area acting height, the vertical distance of the cut blastholes, the horizontal distance of the cut blastholes, the distance between the cut blastholes and a central plane, the cut blastholes and a vertical plane included angle 1, the cut blastholes and a vertical plane included angle 2, the cut blastholes and a vertical plane included angle 3, the cut blasthole depth 1, the cut blasthole depth 2, the cut blasthole depth 3 and the cut blasthole diameter. The position distribution of the auxiliary holes on the blasthole arrangement base die can be determined according to the auxiliary hole distance, the auxiliary hole diameter, the auxiliary hole depth and the auxiliary hole resistance line, so that a blasthole arrangement model can be obtained according to the position distribution of peripheral holes on the blasthole arrangement base die, the position distribution of bottom plate holes on the blasthole arrangement base die, the position distribution of undercut blastholes on the blasthole arrangement base die and the position distribution of the auxiliary holes on the blasthole arrangement base die.

And linking each parameter in the blasthole arrangement parameter table with a blasthole entity (comprising a peripheral eye entity, an auxiliary eye entity, a bottom plate eye entity and a cut blasthole entity) in the blasthole arrangement model so as to enable the blasthole entity in the blasthole arrangement model in the three-dimensional modeling space to change along with the change of the parameter value in the blasthole arrangement parameter table.

It should be noted that the method for arranging blastholes provided by the embodiment of the present invention may be applied to devices such as a mobile phone, a monitor, a computer, and a server, which may perform blasthole arrangement.

Optionally, the length parameter includes: as shown in fig. 2, fig. 2 is a specific flowchart of step 103 provided in an embodiment of the present invention, and specifically, step 103 specifically includes the following steps:

201. on a blast hole arrangement base die, taking a tunnel secondary lining contour line as a reference, taking a peripheral hole center line and a secondary lining distance as offsets to obtain a peripheral hole center line, taking a bottom plate hole center line and the secondary lining distance as offsets to obtain a bottom plate hole center line, taking an excavation surface and the secondary lining distance as offsets to obtain a tunnel excavation contour line, carrying out parameter linking on the peripheral hole center line, the secondary lining distance and the peripheral hole center line during the offsets, carrying out parameter linking on the bottom plate hole center line, the secondary lining distance and the bottom plate hole center line, and carrying out parameter linking on the excavation surface, the secondary lining distance and the tunnel excavation contour line.

In the embodiment of the present invention, the central line of the peripheral eye refers to a connecting line of centers of the peripheral eyes, and if the peripheral eye is circular, the central line of the peripheral eye refers to a connecting line of centers of the peripheral eyes, and the distance from the center of each peripheral eye to the tunnel secondary lining is defined by the distance between the central line of the peripheral eye and the tunnel secondary lining.

The central line of the baseplate hole refers to a connecting line of the centers of the baseplate holes, if the baseplate hole is circular, the central line of the baseplate hole refers to a connecting line of the centers of the baseplate holes, and the distance from the center of each baseplate hole to the two-substrate tunnel is limited through the distance between the central line of the baseplate hole and the two substrates.

The excavation surface refers to a blasting surface, can also be called a tunnel excavation area on a section plane, and is represented as a tunnel excavation contour line on a blasthole arrangement base mold.

202. Drawing the range of the cutting area on the blast hole arrangement base die according to the action width and the action height of the cutting area, and performing parameter link on the action width and the action height of the cutting area and the range of the cutting area.

In the embodiment of the invention, the central point of the tunnel excavation plane where the tunnel excavation contour line is located can be used as the central point of the cut area range, and the cut area range can be drawn on the blast hole arrangement base mold according to the cut area action width and the cut area action height.

203. And calculating to obtain a blast hole arrangement model based on the central lines of the peripheral holes, the central lines of the bottom plate holes, the range of the cut area and the tunnel excavation contour line.

In the embodiment of the present invention, the positional distribution of the peripheral holes may be determined based on the central line of the peripheral holes, the positional distribution of the peripheral holes may be determined based on the central line of the floor holes, the positional distribution of the cutting blastholes may be determined based on the cutting area range, and the positional distribution of the auxiliary holes may be calculated from the positional distribution of the peripheral holes and the positional distribution of the cutting blastholes, thereby obtaining the blasthole arrangement model.

Further, the length parameter further includes: as shown in fig. 3, fig. 3 is a specific flowchart of step 203 according to an embodiment of the present invention, and specifically, step 203 includes the following steps:

301. according to the center lines of the peripheral holes, the center line of the bottom plate holes and the contour line of tunnel excavation, the number of the peripheral holes and the number of the bottom plate holes are calculated through a preset first writing rule by combining the distance between the peripheral holes, the diameter of the peripheral holes, the depth of the peripheral holes, the distance between the bottom plate holes, the diameter of the bottom plate holes, the depth of the bottom plate holes and the distance between blast holes.

In an embodiment of the present invention, the preset first writing rule may be an iogic writing rule in an inventory, and specifically, the number of the peripheral eyes calculated by the first writing rule may be: the number of peripheral eye intervals = Fix (L1/peripheral eye interval), and the number of peripheral eyes = the number of peripheral eye intervals +1, where L1 is the length of the peripheral eye center line (arc length of the peripheral eye center line). The number of the holes of the bottom plate calculated by the first writing rule may be: the number of the bottom plate holes is = Fix (L2/peripheral hole interval), and the number of the bottom plate holes is = the number of the bottom plate holes +1, wherein L2 is the length of the center line of the bottom plate holes.

302. And arranging the peripheral holes and the bottom plate holes on the blast hole arrangement base model based on the number of the peripheral holes and the number of the bottom plate holes to obtain a blast hole arrangement model.

In the embodiment of the invention, the midpoint of the diameter of the peripheral hole is positioned on the central line of the peripheral hole, and the excavation depth of the peripheral hole in the blast hole arrangement basic die is determined by the depth of the peripheral hole. And the middle point of the diameter of the bottom plate hole is positioned on the central line of the bottom plate hole, and the hole digging depth of the bottom plate hole in the blast hole arrangement base die is determined according to the depth of the bottom plate hole. And then calculating the position distribution of the auxiliary holes according to the position distribution of the peripheral holes and the position distribution of the cut blast holes to obtain a blast hole arrangement model.

Further, the length parameter further includes: as shown in fig. 4, fig. 4 is a specific flowchart of a step 303 according to an embodiment of the present invention, and specifically, the step 303 specifically includes the following steps:

401. and stretching along the tunnel excavation contour line on the base mold with the blastholes arranged to obtain a tunnel excavation entity.

In the embodiment of the present invention, the tunnel excavation contour line may be stretched according to the length parameter to obtain the tunnel excavation entity, for example, if the length parameter has a value of 5m, the tunnel excavation contour line is used as a closed solid line to stretch, so as to obtain the tunnel excavation entity with a length of 5 m. The base model for arranging the blastholes can be a plane sketch for arranging the blastholes and can also be a three-dimensional sketch for arranging the blastholes.

402. And linking the blast hole depth and the blast hole diameter on the tunnel excavation entity, and obtaining a first blast hole profile according to the difference of the tunnel excavation entity.

In an embodiment of the present invention, the depth of the blasthole includes a depth of a peripheral hole and a depth of a bottom plate hole, and a difference is obtained in a tunnel excavation entity to obtain a profile of the peripheral hole and a profile of the bottom plate hole as a first blasthole profile.

403. And taking the central line of the peripheral holes and the central line of the bottom plate holes as paths, taking the first shot hole outline as an object, linking the number of the peripheral holes, the number of the bottom plate holes, the distance between the peripheral holes and the distance between the bottom plate holes in an array mode, and arranging the peripheral holes and the bottom plate holes on the shot hole arrangement base die to obtain a first arrangement model.

In the embodiment of the invention, the central line of the peripheral eyes can be used as a path, the peripheral eye profiles are arrayed by taking the number of the peripheral eyes as the number, all the peripheral eye profiles are obtained, and the peripheral eye spacing error is kept within 5 mm. And (3) taking the central line of the bottom plate holes as a path, arraying the bottom plate hole profiles by taking the number of the bottom plate holes as the number, obtaining all the bottom plate hole profiles, and keeping the distance error of the bottom plate holes within 5mm, thereby realizing the arrangement of the peripheral holes and the bottom plate holes on the blast hole arrangement basic model and obtaining a first arrangement model.

404. And performing auxiliary calculation on the first arrangement model to obtain a blast hole arrangement model.

In an embodiment of the present invention, the auxiliary calculation includes an auxiliary eye calculation.

Specifically, the length parameter further includes: as shown in fig. 5, fig. 5 is a specific flowchart of step 403 provided by an embodiment of the present invention, and specifically, the step 403 includes the following steps:

501. and respectively offsetting the contour of the peripheral eye and the contour of the bottom plate eye to obtain a center line of the first layer of auxiliary eye, linking the offset distance of the contour of the peripheral eye with the peripheral eye resisting line, and linking the offset distance of the contour of the bottom plate eye with the bottom plate eye resisting line.

In the embodiment of the invention, in the contour of the peripheral hole, the distance from the center of gravity of the charge to the free surface is called a peripheral hole resistance line, and the free surface is also called a free surface and can be regarded as the end surface of a tunnel excavation entity, namely the surface of a blasted medium in contact with air. In the bottom plate eye resistance line, the distance from the center of gravity of the charge to the free surface is called the peripheral bottom plate resistance line. And equivalently, shifting the contour of the peripheral eye according to the value of the peripheral eye resistance line, shifting the contour of the bottom plate eye according to the value of the bottom plate eye resistance line, and taking the shifted line as the center line of the first layer of auxiliary eye. The auxiliary eyes may include a plurality of layers, and the centers of the auxiliary eyes of the first layer are distributed on the center line of the auxiliary eyes of the first layer.

502. And calculating the number of the first layer of auxiliary eyes according to a preset second writing rule by combining the auxiliary eye distance, the auxiliary eye diameter, the auxiliary eye depth and the blast hole distance.

In this embodiment of the present invention, the second writing rule may be an ibogic writing rule in an Inventor, and specifically, the number of auxiliary eyes in the first layer calculated by the second writing rule may be: the number of auxiliary eyes in the first layer = Fix (L3/peripheral eye distance) +1, where L3 is the length of the center line of the auxiliary eyes in the first layer.

503. And drawing a second shot hole outline by calculating the difference of the numbers of the first layer of auxiliary eyes, and arranging the first layer of auxiliary eyes in an array.

In the embodiment of the invention, the difference of the tunnel excavation entity can be obtained according to the depth of the first layer of auxiliary eyes and the diameter of the first layer of auxiliary eyes, and the first layer of auxiliary eye outline is obtained and used as the second shot eye outline. And (3) taking the central line of the first layer of auxiliary eyes as a path, arraying the first layer of auxiliary eye outlines by taking the number of the first layer of auxiliary eyes as the number to obtain all the first layer of auxiliary eye outlines, and keeping the distance error of the first layer of auxiliary eyes within 5 mm.

504. And shifting the center line of the first layer of auxiliary eyes, linking the shift distance of the center line of the first layer of auxiliary eyes with the auxiliary eye resistance line, drawing the center lines of the remaining auxiliary eyes, and calculating the remaining auxiliary eyes.

In the embodiment of the invention, in the profile of the auxiliary eye, the distance from the center of gravity of the charge to the free surface is called as an auxiliary eye resisting line, the center line of the second layer of auxiliary eye is obtained by offsetting the center line of the first layer of auxiliary eye by one auxiliary eye resisting line, the difference is calculated in the tunnel excavation entity according to the depth of the second layer of auxiliary eye and the diameter of the second layer of auxiliary eye, the profile of the second layer of auxiliary eye is obtained, the center line of the second layer of auxiliary eye is taken as a path, the number of the second layer of auxiliary eyes is taken as the number, the profiles of the second layer of auxiliary eye are arrayed, all the profiles of the second layer of auxiliary eye are obtained, and the distance error of the second layer of auxiliary eye is kept within 5 mm. Repeating the above shifting process can obtain the remaining auxiliary eye center line, and repeating the above array process can obtain the remaining auxiliary eye entity.

505. And arranging the auxiliary eyes on the first arrangement model to obtain a second arrangement model.

In an embodiment of the present invention, the first arrangement model includes a peripheral eye contour and a floor eye contour, and the second arrangement model includes a peripheral eye contour, a floor eye contour, and an auxiliary eye contour. The peripheral eye contour may be referred to as a peripheral eye hollow solid, the floor eye contour may be referred to as a floor eye hollow solid, and the auxiliary eye contour may be referred to as a floor eye hollow solid.

506. And carrying out post-processing on the second arrangement model to obtain a blasthole arrangement model.

In an embodiment of the present invention, the post-processing is to add a cutting blasthole to the second layout model, and the length parameter further includes: specifically, as shown in fig. 6a, fig. 6a is a specific flow chart of step 506 provided by an embodiment of the present invention, and specifically, the step 506 specifically includes the following steps:

601. and drawing a blasthole layout sketch on the second layout model according to the link parameters of the range of the undermining area to obtain the undermining area, and calculating a difference to draw a third blasthole outline.

In an embodiment of the present invention, the link parameters of the cut area range include: vertical spacing of the cut blastholes, horizontal spacing of the cut blastholes, spacing between the cut blastholes and the central plane, diameter of the cut blastholes, depth of the cut blastholes and included angle between the cut blastholes and the vertical plane. And drawing a blasthole arrangement sketch on the second arrangement model according to the action width and the action height of the cutting area, so as to obtain the cutting area on the second arrangement model.

And drawing a third blasthole outline according to the vertical distance of the cutting blastholes, the horizontal distance of the cutting blastholes, the distance between the cutting blastholes and the central plane, the diameter of the cutting blastholes, the depth of the cutting blastholes, the included angle between the cutting blastholes and the vertical plane and the difference of the second layout model. The third bore profile may be referred to as a plunge bore profile or a plunge bore hollow solid.

602. And adding text parameters of the slotting region.

In an embodiment of the present invention, the text parameters include types of the cut regions and corresponding parameters and values. The types of the undercut regions may be divided according to angles, and specifically may be divided according to an included angle between the undercut blasthole and the vertical plane, for example, as shown in fig. 6b, fig. 6b is a schematic cross-sectional view of an undercut blasthole provided in an embodiment of the present invention, and in fig. 6b, the included angle between the undercut blasthole and the vertical plane includes: the cutting blast hole and the vertical face included angle 1 (included angle range 72-73 degrees), the cutting blast hole and the vertical face included angle 2 (included angle range 69.5-70.5 degrees), the cutting blast hole and the vertical face included angle 3 (included angle range 67.5-68.5 degrees), the cutting blast hole depth is different according to different cutting blast holes and vertical face included angles, and the cutting blast hole and the vertical face included angle 1 correspond to the cutting blast hole depth 1 (4000 mm), the cutting blast hole depth 2 (2300 mm) and the cutting blast hole depth 3 (1600 mm).

603. And performing correlation correspondence on the text parameters of the cut area through a preset third writing rule, and adding form control to control the text parameters of the cut area.

In an embodiment of the present invention, the third writing rule may be an iogic writing rule in an inventory, and the third writing rule may be a rule that a vertical distance between the cutting blastholes, a horizontal distance between the cutting blastholes, and a number of the cutting blastholes satisfy distribution in a cutting area.

Referring to fig. 7, fig. 7 is a schematic structural diagram of a blasthole arrangement apparatus provided by an embodiment of the present invention, and as shown in fig. 7, the apparatus includes:

an obtaining module 701, configured to obtain a parameter table for blasthole arrangement, where the parameter table is established according to a preset format;

the modeling module 702 is configured to perform modeling in a three-dimensional space to obtain a blasthole arrangement base mold, where the blasthole arrangement base mold includes a tunnel secondary lining contour line;

the processing module 703 is configured to calculate to obtain a blasthole arrangement model according to the blasthole arrangement parameter table and the tunnel secondary lining contour line, where the blasthole arrangement model and the blasthole arrangement parameter table have a parameter link relationship, so that when parameters in the blasthole arrangement parameters change, the blasthole arrangement model changes correspondingly.

Optionally, the length parameter includes: the distance between the central line of the peripheral hole and the two liners, the distance between the central line of the bottom plate hole and the two liners, the distance between the excavated surface and the two liners, the acting width of the cutting area, and the acting height of the cutting area, the processing module 703 is further configured to perform the following steps:

Optionally, the length parameter further includes: peripheral eye spacing, peripheral eye diameter, peripheral eye depth, floor eye spacing, floor eye diameter, floor eye depth, blasthole spacing, the processing module 703 being further configured to perform the steps of:

according to the peripheral eye center lines, the bottom plate eye center lines and the tunnel excavation contour lines, combining the peripheral eye distance, the peripheral eye diameter, the peripheral eye depth, the bottom plate eye distance, the bottom plate eye diameter, the bottom plate eye depth and the blast hole distance, calculating the number of peripheral eyes and the number of bottom plate eyes according to a preset first writing rule;

Optionally, the length parameter further includes: the depth of the blasthole, the diameter of the blasthole, the processing module 703 is further configured to perform the following steps:

Optionally, the length parameter further includes: a peripheral eye resistance line, a bottom plate eye resistance line, an auxiliary eye distance, an auxiliary eye diameter, an auxiliary eye depth, wherein the first blasthole profile comprises a peripheral eye profile and a bottom plate eye profile, and the processing module 703 is further configured to perform the following steps:

respectively offsetting the contour of the peripheral eye and the contour of the baseplate eye to obtain a first layer of auxiliary eye center line, and linking the offset distance of the contour of the peripheral eye with a peripheral eye resisting line, wherein the offset distance of the contour of the baseplate eye is linked with a baseplate eye resisting line;

calculating the number of the first layer of auxiliary holes according to a preset second writing rule by combining the auxiliary hole distance, the auxiliary hole diameter, the auxiliary hole depth and the blast hole distance;

shifting the center line of the first layer of auxiliary eyes, linking the shift distance of the center line of the first layer of auxiliary eyes with auxiliary eye resistance lines, drawing the center lines of the remaining auxiliary eyes, and calculating the remaining auxiliary eyes;

and carrying out post-processing on the second arrangement model to obtain a blasthole arrangement model.

Optionally, the length parameter further includes: vertical interval of plunge cut porthole, the horizontal interval of plunge cut porthole, plunge cut porthole and central plane interval, plunge cut porthole diameter and plunge cut porthole degree of depth, the angle parameter includes plunge cut porthole and facade contained angle, processing module 703 still is used for carrying out following step:

adding text parameters of the cut area, wherein the text parameters comprise the type of the cut area;

and performing correlation correspondence on the text parameters of the cutting area through a preset third writing rule, and adding form control to control the text parameters of the cutting area.

It should be noted that the blasthole arrangement device provided by the embodiment of the present invention may be applied to a mobile phone, a monitor, a computer, a server, and other devices that can perform blasthole arrangement.

The blasthole arrangement device provided by the embodiment of the invention can realize each process realized by the blasthole arrangement method in the method embodiment, and can achieve the same beneficial effects. To avoid repetition, further description is omitted here.

Referring to fig. 8, fig. 8 is a schematic structural diagram of an electronic device according to an embodiment of the present invention, as shown in fig. 8, including: a memory 802, a processor 801, and a computer program stored on the memory 802 and executable on the processor 801, wherein:

the processor 801 is used for calling the computer program stored in the memory 802, and executing the following steps:

acquiring a blasthole arrangement parameter table, wherein the blasthole arrangement parameter table is established according to a preset format;

and calculating to obtain a blasthole arrangement model according to the blasthole arrangement parameter table and the tunnel secondary lining contour line, wherein the blasthole arrangement model and the blasthole arrangement parameter table have a parameter link relation, so that when parameters in the blasthole arrangement parameters are changed, the blasthole arrangement model is correspondingly changed.

Optionally, the length parameter includes: the calculation performed by the processor 801 according to the blasthole arrangement parameter table and the tunnel secondary lining contour line to obtain a blasthole arrangement model includes:

Optionally, the length parameter further includes: the calculation performed by the processor 801 based on the peripheral eye center line, the bottom plate eye center line, the cut area range, and the tunnel excavation contour line to obtain the shot hole arrangement model includes:

Optionally, the length parameter further includes: the obtaining of the blasthole arrangement model by the processor 801, based on the number of the peripheral holes and the number of the bottom plate holes, arranging the peripheral holes and the bottom plate holes in the blasthole arrangement base model includes:

on the base mold with the blast holes arranged, stretching along the tunnel excavation contour line to obtain a tunnel excavation entity;

linking the blast hole depth and the blast hole diameter on the tunnel excavation entity, and obtaining a first blast hole profile according to the difference of the tunnel excavation entity;

Optionally, the length parameter further includes: the peripheral eye resistance line, the bottom plate eye resistance line, the auxiliary eye distance, the auxiliary eye diameter, and the auxiliary eye depth, where the first blasthole profile includes a peripheral eye profile and a bottom plate eye profile, and the processor 801 performs the auxiliary calculation on the first arrangement model to obtain a blasthole arrangement model, including:

Optionally, the length parameter further includes: vertical interval of plunge cut porthole, the horizontal interval of plunge cut porthole, plunge cut porthole and central plane interval, plunge cut porthole diameter and plunge cut porthole degree of depth, the angle parameter includes plunge cut porthole and facade contained angle, and treater 801 carries out right the model is arranged to the second carries out the aftertreatment, obtains the porthole and arranges the model, includes:

obtaining a cutting area according to the link parameters of the cutting area range, drawing a blasthole arrangement sketch on the second arrangement model, and drawing a third blasthole outline by calculating a difference;

It should be noted that the electronic device may be a device that can be applied to a cell phone, a monitor, a computer, a server, and the like that can perform the shot hole arrangement.

The electronic device provided by the embodiment of the invention can realize each process realized by the shot hole arrangement method in the method embodiment, can achieve the same beneficial effects, and is not repeated here for avoiding repetition.

The embodiment of the present invention further provides a computer-readable storage medium, where a computer program is stored, and when the computer program is executed by a processor, the computer program implements each process of the blasthole arrangement method provided in the embodiment of the present invention, and can achieve the same technical effect, and in order to avoid repetition, the computer program is not described herein again.

It will be understood by those skilled in the art that all or part of the processes of the methods of the embodiments described above can be implemented by a computer program, which can be stored in a computer-readable storage medium, and when executed, can include the processes of the embodiments of the methods described above. The storage medium may be a magnetic disk, an optical disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), or the like.

The above disclosure is only for the purpose of illustrating the preferred embodiments of the present invention, and it is therefore to be understood that the invention is not limited by the scope of the appended claims.

Claims

1. A method of arranging blastholes, comprising the steps of:

acquiring a blasthole arrangement parameter table, wherein the blasthole arrangement parameter table is established according to a preset format, parameters in the blasthole arrangement parameter table are divided into length parameters, slope rate parameters and angle parameters according to unit categories, each parameter has a corresponding key and a value, and the length parameters comprise: the distance between the central line of the peripheral holes and the two liners, the distance between the central line of the bottom plate holes and the two liners, the distance between an excavation surface and the two liners, the action width of the undercut region and the action height of the undercut region, wherein the central line of the peripheral holes refers to the connection line of the centers of all the peripheral holes, the central line of the bottom plate holes refers to the connection line of the centers of all the bottom plate holes, and the excavation surface refers to the blasting surface;

modeling is carried out in a three-dimensional space to obtain a blasthole arrangement base mold, wherein the blasthole arrangement base mold comprises a tunnel secondary lining contour line, the blasthole arrangement base mold is a solid model, and the shape of the blasthole arrangement base mold is the same as the shape of the section of the tunnel;

on the blast hole arrangement base die, taking the tunnel secondary lining contour line as a reference, taking the peripheral hole center line and the secondary lining distance as offsets to obtain a peripheral hole center line, taking the baseplate hole center line and the secondary lining distance as offsets to obtain a baseplate hole center line, taking the excavation surface and the secondary lining distance as offsets to obtain a tunnel excavation contour line, carrying out parameter link on the peripheral hole center line, the secondary lining distance and the peripheral hole center line during offset, carrying out parameter link on the baseplate hole center line, the secondary lining distance and the baseplate hole center line, and carrying out parameter link on the excavation surface, the secondary lining distance and the tunnel excavation contour line; drawing an undercut area range on the blasthole arrangement base die according to the undercut area action width and the undercut area action height by taking the central point of the tunnel excavation plane where the tunnel excavation contour line is located as the central point of the undercut area range, and performing parameter link on the undercut area action width and the undercut area action height and the undercut area range; and calculating to obtain a three-dimensional blast hole arrangement model based on the peripheral hole central lines, the bottom plate hole central lines, the cut area range and the tunnel excavation contour line, wherein the blast hole arrangement model and the blast hole arrangement parameter table have a parameter link relation, so that when parameters in the blast hole arrangement parameters change, the blast hole arrangement model correspondingly changes.

2. The method of claim 1, wherein the length parameter further comprises: the blast hole distribution model is obtained by calculation based on the peripheral hole central line, the bottom plate hole central line, the cut area range and the tunnel excavation contour line, and comprises the following steps:

according to the peripheral eye center line, the bottom plate eye center line and the tunnel excavation contour line, calculating the number of peripheral eyes and the number of bottom plate eyes through a preset first writing rule by combining the peripheral eye distance, the peripheral eye diameter, the peripheral eye depth, the bottom plate eye distance, the bottom plate eye diameter and the bottom plate eye depth;

3. The method according to claim 2, wherein said arranging the peripheral holes and the floor holes in said blast hole arrangement base model based on said number of peripheral holes and said number of floor holes to obtain a blast hole arrangement model, comprises:

linking the depth of the peripheral holes, the depth of the bottom plate holes, the diameter of the peripheral holes and the diameter of the bottom plate holes on the tunnel excavation entity, and obtaining a first blasthole profile according to the difference of the tunnel excavation entity;

taking the central line of the peripheral holes and the central line of the bottom plate holes as paths, taking the first contour of the blastholes as an object, linking the number of the peripheral holes, the number of the bottom plate holes, the distance between the peripheral holes and the distance between the bottom plate holes in an array manner, and arranging the peripheral holes and the bottom plate holes on the blasthole arrangement base die to obtain a first arrangement model;

4. The method of claim 3, wherein the length parameter further comprises: the method comprises the following steps of obtaining a blast hole arrangement model by carrying out auxiliary calculation on a first arrangement model, wherein the blast hole arrangement model comprises a peripheral hole resistance line, a bottom plate hole resistance line, an auxiliary hole distance, an auxiliary hole diameter and an auxiliary hole depth, the first blast hole profile comprises a peripheral hole profile and a bottom plate hole profile, and the blast hole arrangement model comprises the following steps:

calculating the number of the first layer of auxiliary eyes according to a preset second writing rule by combining the auxiliary eye distance, the auxiliary eye diameter and the auxiliary eye depth;

drawing a second borehole contour through the number difference of the first layer of auxiliary eyes, and arranging the first layer of auxiliary eyes in an array;

5. The method of claim 4, wherein the length parameter further comprises: vertical interval of plunge cut porthole, plunge cut porthole horizontal spacing, plunge cut porthole and central plane interval, plunge cut porthole diameter and plunge cut porthole degree of depth, the angle parameter includes plunge cut porthole and facade contained angle, it is right the model is arranged to the second and carries out the aftertreatment, obtains the porthole and arranges the model, includes:

drawing a blasthole arrangement sketch on the second arrangement model according to the link parameters of the range of the cut area to obtain a cut area, and calculating a difference to draw a third blasthole outline;

6. A blasthole arrangement apparatus for carrying out the method of any one of claims 1 to 5, comprising:

the system comprises an acquisition module, a processing module and a display module, wherein the acquisition module is used for acquiring a blasthole arrangement parameter table, the blasthole arrangement parameter table is established according to a preset format, parameters in the blasthole arrangement parameter table are divided into length parameters, slope rate parameters and angle parameters according to unit categories, each parameter has a corresponding key and a value, and the length parameters comprise: the distance between the central line of the peripheral holes and the two liners, the distance between the central line of the bottom plate holes and the two liners, the distance between an excavated surface and the two liners, the action width of the cut area and the action height of the cut area are defined, wherein the central line of the peripheral holes refers to the connection line of the centers of all the peripheral holes, the central line of the bottom plate holes refers to the connection line of the centers of all the bottom plate holes, and the excavated surface refers to an explosion surface;

the modeling module is used for modeling in a three-dimensional space to obtain a three-dimensional blasthole arrangement base mold, the blasthole arrangement base mold comprises a tunnel secondary lining contour line, the blasthole arrangement base mold is a solid model, and the shape of the blasthole arrangement base mold is the same as the shape of the section of the tunnel;

the processing module is used for obtaining a peripheral hole central line by taking the tunnel secondary lining contour line as a reference, obtaining a bottom plate hole central line by taking the bottom plate hole central line and the secondary lining space as offsets, obtaining a tunnel excavation contour line by taking the excavation surface and the secondary lining space as offsets, carrying out parameter link on the peripheral hole central line, the secondary lining space and the peripheral hole central line during offset, carrying out parameter link on the bottom plate hole central line, the secondary lining space and the bottom plate hole central line, and carrying out parameter link on the excavation surface, the secondary lining space and the tunnel excavation contour line; drawing an undercut area range on the blasthole arrangement base die according to the undercut area action width and the undercut area action height by taking the central point of the tunnel excavation plane where the tunnel excavation contour line is located as the central point of the undercut area range, and performing parameter link on the undercut area action width and the undercut area action height and the undercut area range; and calculating to obtain a three-dimensional blasthole arrangement model based on the peripheral hole central lines, the bottom plate hole central lines, the cut area range and the tunnel excavation contour line, wherein the blasthole arrangement model and the blasthole arrangement parameter table have a parameter link relation, so that when parameters in the blasthole arrangement parameters change, the blasthole arrangement model correspondingly changes.

7. An electronic device, comprising: memory, a processor and a computer program stored on the memory and executable on the processor, the processor implementing the steps in the method of blasthole arrangement according to any of claims 1 to 5 when executing the computer program.

8. A computer-readable storage medium, having stored thereon a computer program which, when being executed by a processor, carries out the steps of a method of collaring as claimed in any one of claims 1 to 5.