LU500742B1 - A Method of Blasthole Arrangement, and Its Device, Electronic Equipment, and Storage Medium - Google Patents

A Method of Blasthole Arrangement, and Its Device, Electronic Equipment, and Storage Medium Download PDF

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Publication number
LU500742B1
LU500742B1 LU500742A LU500742A LU500742B1 LU 500742 B1 LU500742 B1 LU 500742B1 LU 500742 A LU500742 A LU 500742A LU 500742 A LU500742 A LU 500742A LU 500742 B1 LU500742 B1 LU 500742B1
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Prior art keywords
blasthole
holes
arrangement
model
blasthole arrangement
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LU500742A
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French (fr)
Inventor
Chengxing Shu
Changshi Zhao
Wei Zhang
Zhongqiang Yi
Xiang Gao
Renqiang Li
Yao Tang
Yulin Zhu
Terigele Dai
Shudong Yan
Bing Yang
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The First Construction Of China Railway No 9 Group Co Ltd
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Priority to LU500742A priority Critical patent/LU500742B1/en
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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F42AMMUNITION; BLASTING
    • F42DBLASTING
    • F42D3/00Particular applications of blasting techniques
    • F42D3/04Particular applications of blasting techniques for rock blasting
    • EFIXED CONSTRUCTIONS
    • E21EARTH OR ROCK DRILLING; MINING
    • E21DSHAFTS; TUNNELS; GALLERIES; LARGE UNDERGROUND CHAMBERS
    • E21D9/00Tunnels or galleries, with or without linings; Methods or apparatus for making thereof; Layout of tunnels or galleries
    • E21D9/006Tunnels or galleries, with or without linings; Methods or apparatus for making thereof; Layout of tunnels or galleries by making use of blasting methods

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  • Engineering & Computer Science (AREA)
  • Mining & Mineral Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Geology (AREA)
  • General Engineering & Computer Science (AREA)
  • Processing Or Creating Images (AREA)

Abstract

The embodiments of the present invention provided a method of blasthole arrangement, and its device, electronic equipment, and storage medium. The said method comprises: getting a parameter list of the blasthole arrangement, wherein, the said parameter list of the blasthole arrangement is established according to a preset format; then, completing modeling in a three-dimensional space, and thus a foundation model of the blasthole arrangement can be obtained. In addition, the said foundation model of the blasthole arrangement includes the contour line of the secondary lining of tunnel; and then a blasthole arrangement model can be obtained by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel. Furthermore, there is a parameter link relationship between the said blasthole arrangement model and the said parameter list of the blasthole arrangement, so that the said blasthole arrangement model would change accordingly with the change of parameters of the said parameter list of the blasthole arrangement. Besides, the drawings of the blasthole arrangement can be drawn directly through the 3D model by linking the parameters of the blasthole arrangement with the 3D model. Moreover, for the process of modification, a modified 3D model can be generated automatically just by modifying the parameters of the blasthole arrangement, and thus, the efficiency of drawing papers of the blasthole arrangement can be improved.

Description

A Method of Blasthole Arrangement, and Its Device, Electronic Equipment, and Storage Medium Technical Field
[0001] The present invention relates to the field of tunnel blasting, particularly to a method of blasthole arrangement, and its device, electronic equipment and storage medium. Background Technology
[0002] For constructing infrastructures such as highways and railways, etc, it is inevitable to be obstructed by high mountains. In this case, excavating tunnel is the frequently used method to pass through. However, during the process of tunnel excavation, the method blasting would be required to assist excavation, and further to accelerate the speed of excavation. Moreover, for the existing methods, different blasting schemes which correspond to different blasting parameters, need to be designed for different types of mountains, so that plenty of designers are required to draw the corresponding blasthole arrangement drawing based on the obtained blasting parameters for each task. This would not only make the drawing of papers complicated, but also result in low efficiency of drawing papers. In addition, if the modification is required, it cannot help re-drawing the drawings according to the modified images, which would further hurt the efficiency of drawing. Summary of the Invention
[0003] The embodiments of the present invention provided a method of blasthole arrangement, which can generate a blasthole arrangement drawing automatically based on a three-dimensional model and by virtue of a parameter list of the blasthole arrangement.
[0004] Firstly, the embodiment of the present invention provided a method of blasthole arrangement, which comprises:
[0005] Getting a parameter list of the blasthole arrangement, wherein, the said parameter list of the blasthole arrangement is established according to a preset format;
[0006] Completing modeling in a three-dimensional space, and thus a foundation model of the blasthole arrangement can be obtained. In addition, the said foundation model of the blasthole arrangement includes the contour line of the secondary lining of tunnel;
[0007] Then, a blasthole arrangement model can be obtained by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel. Furthermore, there is a parameter link relationship between the said blasthole arrangement model and the said parameter list of the blasthole arrangement, so that the said model of blasthole arrangement would change accordingly with the change of parameters of the said parameter list of the blasthole arrangement.
[0008] Optionally, the parameters of the said parameter list of the blasthole arrangement are divided into length parameters, slope ratio parameters and angle parameters according to the category of units, and each parameter has a corresponding key and value. 1
[0009] Optionally, the said length parameters comprise: the distance between the center lines drR20742 periphery holes and the secondary lining, the distance between the center lines of the lifters and the secondary lining, the distance between the excavation face and the secondary lining, the working width of the cut area, and the working height of the cut area. Thus, the blasthole arrangement model can be obtained by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel, wherein, the specific steps comprise:
[0010] Based on the said foundation model of blasthole arrangement, obtaining the center lines of the periphery holes by taking the said contour lines of the secondary lining of tunnel as the reference, and taking the distance between the said center lines of the periphery holes and the secondary lining as the offset, and obtaining the center lines of the lifters by taking the distance between the said center lines of the lifters and secondary lining as offset, as well as obtaining the excavation contour line of tunnel by taking the distance between the said excavation face and the secondary lining as the offset. Furthermore, the parameter linking of the distance between the said center lines of the periphery holes and the secondary lining with the said center lines of the periphery holes shall be done when the offset occurs, and the parameter linking of the distance between the said lifters and the secondary lining with the said lifters shall be done, as well as the parameter linking of the distance between the said excavation face and the secondary lining with the said excavation contour line of tunnel shall be done;
[0011] According to the said working width of the cut area and the said working height of the cut area, drawing the scope of the cut area based on the said foundation model of the blasthole arrangement. Meanwhile, the parameter linking of the said working width of the cut area with the said working height of the cut area shall be done;
[0012] Obtaining the blasthole arrangement model by calculating and based on the said center lines of the periphery holes, the said center lines of the lifters, the said scope of the cut area, and the said excavation contour line of tunnel.
[0013] Optionally, the said length parameters further comprise: the spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter and the spacing between the blastholes. Furthermore, the blasthole arrangement model can be obtained by calculating based on the said center lines of the periphery holes, the said center lines of the lifters, the said scope of the cut area, and the said excavation contour line of tunnel, wherein, the specific steps comprise:
[0014] Calculating the number of periphery holes and the number of lifters as per the pre-defined first rules for writing and by combining the said spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter and the spacing between the blastholes, based on the said center lines of the periphery holes, the said center lines of the lifters, and the said excavation contour line of tunnel;
[0015] Obtaining the blasthole arrangement model by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement and based on the number of the said peripheral 40 holes and the number of lifters. 2
[0016] Optionally, the said length parameters further comprise: the depth of the blasthole and {90742 diameter of the blasthole. Furthermore, the blasthole arrangement model can be obtained by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement and based on the number of the said peripheral holes and the number of lifters, wherein, the specific steps comprise:
[0017] Based on the said foundation model of blasthole arrangement, obtaining the entity for tunnel excavation by stretching along the said excavation contour line of tunnel;
[0018] Linking the said excavation contour line of tunnel with the said depth of the blasthole and the said diameter of the blasthole, and thus, the first contour of the blastholes can be obtained by calculating difference based on the said entity for tunnel excavation;
[0019] Linking the number of the said periphery holes, the number of the said lifters and the spacing between the blastholes in an array by taking the said center lines of the periphery holes and the said center lines of the lifters as the path, and taking the said first contour of the blastholes as the object.
Furthermore, the first arrangement model can be obtained by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement;
[0020] Completing auxiliary calculation on the said first arrangement model, and thus, the blasthole arrangement model can be obtained.
[0021] Optionally, the said length parameter further comprises: the burden of the periphery hole, the burden of the lifter, the burden of the satellite hole, the spacing between the satellite holes, the diameter of the satellite hole, and the depth of the satellite hole. In addition, the said first contour of the blastholes comprises the contour of the periphery hole and the contour of the lifter. Thus, the blasthole arrangement model can be obtained by completing auxiliary calculation on the said first arrangement model, wherein, the specific steps comprise:
[0022] Obtaining the center lines of the first layer satellite holes b y offsetting the said contour of the periphery holes and the said contour of the lifters respectively, then, linking the offset distance of the said contour of the periphery hole with the burden of the periphery hole, as well as linking the offset distance of the said contour of the lifter with the burden of the lifter;
[0023] Calculating the number of the first layer satellite holes as per the pre-defined second rules for writing and by combining the said spacing between the satellite holes, the diameter of the satellite hole, the depth of the satellite hole, and the spacing between the blastholes;
[0024] Drawing the second contour of the blastholes by calculating the difference of the number of the first layer satellite holes, and then, arranging the first layer satellite holes in an array;
[0025] Then, linking the offset distance between the said center lines of the first layer satellite holes with the burdens of the satellite holes by offsetting the said first layer satellite holes; and thus, the remaining center lines of the satellite holes can be drawn and the remaining satellite holes can be figured out;
[0026] After that, the second arrangement model can be obtained by arranging the satellite holes on the said first arrangement model,
[0027] Thu, the blasthole arrangement model can be obtained after completing post-processing on 40 the said second arrangement model.
3
[0028] Optionally, the said length parameters further comprise: the vertical spacing between thbRO742 holes, the horizontal spacing between the cut holes, the distance between the cut holes and the central plane, the diameter of the cut hole, and the depth of the cut hole. In addition, the said angle parameters comprise the included angle between the cut hole and the elevation, and thus, the blasthole arrangement model can be obtained after completing post-processing on the said second arrangement model, wherein, the specific steps comprise:
[0029] Obtaining the cut area according to the link parameters of the said scope of the cut area, then, drawing a sketch of the blasthole arrangement on the second arrangement model, as well as drawing the third contour of the blastholes by calculating the difference;
[0030] Adding text parameters of the cut area, and the said text parameter includes the types of the cut area;
[0031] Conducting incidence correspondence among the text parameters of the said cut area as per the pre-defined third rules for writing, and then adding form control to control the text parameters of the said cut area.
[0032] Secondly, the embodiment of the present invention provided a blasthole arrangement device, and the said device comprises:
[0033] An acquisition module, which is utilized to get a parameter list of the blasthole arrangement, and the said parameter list of the blasthole arrangement is established according to a preset format;
[0034] A modeling module, which is utilized to complete modeling in a three-dimensional space, and thus, a foundation model of the blasthole arrangement can be obtained, and the said foundation model of the blasthole arrangement includes the contour line of the secondary lining of tunnel,
[0035] A processing module, which is utilized to obtain a blasthole arrangement model by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel. Furthermore, there is a parameter link relationship between the said blasthole arrangement model and the said parameter list of the blasthole arrangement, so that the said blasthole arrangement model would change accordingly with the change of parameters of the said parameter list of the blasthole arrangement.
[0036] Thirdly, the embodiment of the present invention provided an electronic device, which comprises: a memory, a processor, and a computer program which is stored on the said memory and can be run on the processor. Furthermore, the said processor would execute the computer program to accomplish the steps of the method of blasthole arrangement described in the embodiment of the present invention.
[0037] Finally, the embodiment of the present invention provided a computer-readable storage medium. Wherein, there is a computer program is stored on the said computer-readable storage medium. Thus, the steps of the method of blasthole arrangement described in the embodiment of the present invention can be accomplished by executing the said computer program by the processor.
[0038] For the embodiment of the present invention, a parameter list of the blasthole arrangement can be get, wherein, the said parameter list of the blasthole arrangement is established according to 40 a preset format; then, complete modeling in a three-dimensional space, and thus a foundation 4 model of the blasthole arrangement can be obtained. In addition, the said foundation model or#R80742 blasthole arrangement includes the contour line of the secondary lining of tunnel; and then a blasthole arrangement model can be obtained by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel. Furthermore, there is a parameter link relationship between the said blasthole arrangement model and the said parameter list of the blasthole arrangement, so that the said blasthole arrangement model would change accordingly with the change of parameters of the said parameter list of the blasthole arrangement. Besides, the drawings of the blasthole arrangement can be drawn directly through the 3D model by linking the parameters of the blasthole arrangement with the 3D model. Moreover, for the process of modification, a modified 3D model can be generated automatically just by modifying the parameters of the blasthole arrangement, and thus, the efficiency of drawing papers of the blasthole arrangement can be improved. Brief Description of the Drawings
[0039] For the purpose of describing the embodiments of the present invention or the technical schemes of the prior art more clearly, the text below will describe the accompanying drawings need to be used in the embodiments or the prior art briefly. It is obviously that the drawings described herein are only some embodiments of the present invention, for those of ordinary skill in the art, other drawings can be obtained based on these drawings without paying creative labor.
[0040] Figure 1 is a flowchart of a method of blasthole arrangement provided by the embodiment of the present invention;
[0041] Figure 1a is a schematic diagram of a blasthole arrangement provided by the embodiment of the present invention;
[0042] Figure 1b is a schematic diagram of a parameter list of the blasthole arrangement provided by the embodiment of the present invention;
[0043] Figure 2 is a specific flowchart of step 103 provided by the embodiment of the present invention;
[0044] Figure 3 is a specific flowchart of step 203 provided by the embodiment of the present invention;
[0045] Figure 4 is a specific flowchart of step 303 provided by the embodiment of the present invention;
[0046] Figure 5 is a specific flowchart of step 403 provided by the embodiment of the present invention;
[0047] Figure 6 is a specific flowchart of step 506 provided by the embodiment of the present invention;
[0048] Figure 6a is a cross-sectional schematic diagram of a cut hole provided by the embodiment of the present invention;
[0049] Figure 7 is a structural schematic diagram of a blasthole arrangement device provided by the embodiment of the present invention; 40 [0050] Figure 8 is a structural schematic diagram of an electronic device provided by the 5 embodiment of the present invention. LU500742 Detailed Description of the Presently Preferred Embodiments
[0051] The text below will describe the technical schemes of the embodiments of the present invention clearly and completely in conjunction with accompanying drawings of the embodiments of the present invention. It is obviously that the described embodiments are only a part of the embodiments of the present invention, rather than all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without paying creative labor shall fall within the protection scope of the present invention.
[0052] Referring to figure 1, which is a flowchart of a method of blasthole arrangement provided by the embodiment of the present invention showed that it comprises the following steps:
[0053] 101. Get a parameter list of the blasthole arrangement.
[0054] For the embodiment of the present invention, the aforesaid parameter list of the blasthole arrangement is established according to a preset format.
[0055] Further, the parameters of the aforesaid parameter list of the blasthole arrangement are divided into length parameters, slope parameters and included angle parameters according to the category of units, and each parameter has a corresponding key and value. In addition, the aforesaid key can be the ID and/or name of the parameter, and the aforesaid value refers to the specific value corresponding to the parameter. In the parameter list of the blasthole arrangement, the corresponding value can be found through the key.
[0056] It should be noted that during the process of tunnel blasting, it is necessary to arrange blastholes according to the design drawing of the blasthole arrangement, wherein, the drawing of the blasthole arrangement comprises the shape and size of the tunnel, and the distribution of the blastholes. As shown in figure 1a, which is a schematic diagram of a blasthole arrangement provided by the embodiment of the present invention. According to the different distribution locations, the blastholes can be divided into peripheral holes, lifters, auxiliary holes and cut holes. Wherein, the distribution locations of the aforesaid peripheral holes are distributed on the inner edge of the contour of secondary lining of tunnel, and the distribution locations of the aforesaid lifters are distributed at the bottom and on the inner edge of the secondary lining of the tunnel. In addition, the distribution locations of the aforesaid cut holes are distributed in the middle area of the plane of tunnel (wherein, the middle area is also called as the cut area), and the distribution locations of the aforesaid satellite holes are distributed in the area located between the cut holes and the peripheral holes (and the lifters).
[0057] Specifically, as shown in figure 1b, which is a schematic diagram of a parameter list of the blasthole arrangement provided by the embodiment of the present invention. Wherein, the preset format of the aforesaid parameter list of the blasthole arrangement comprises the ID of the parameter, the name of the parameter, and the value of the parameter as well as the unit of the parameter. In addition, the aforesaid IDs of the parameters can be numbers or letters or a combination of numbers and letters. The aforesaid names of the parameters comprise the length, 40 the elevation, the angle, the longitudinal slope ratio, the starting mileage, the ending mileage, the 6 distance between the excavation surface and the secondary lining, the distance between the céniRpo742 line of periphery hole and the secondary lining, the distance between the center line of lifter and the secondary lining, the width of the cut area, the height of the cut area, the spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter, the spacing between the satellite holes, the diameter of the satellite hole, the depth of the satellite hole, the burden of the periphery hole, the burden of the lifter, the burden of the satellite hole, the vertical spacing between the cut holes, the horizontal spacing between the cut holes, the distance between the cut hole and the center plane, the included angle 1 between the cut hole and the elevation, the included angle 2 between the cut hole and the elevation, the included angle 3 between the cut hole and the elevation, the depth of the cut hole 1, the depth of the cut hole 2, the depth of the cut hole, 3, and the diameter of the cut hole. In addition, the value of the aforesaid parameter can be a specific value of each parameter, and the unit of the aforesaid parameter can be a corresponding unit of measurement, which can be meter (m), centimeter (cm), degree (deg), or unit of ratio (ul).
[0058] 102. Obtain a foundation model of the blasthole arrangement by modeling in a three-dimensional space.
[0059] For the embodiment of the present invention, the aforesaid foundation model of the blasthole arrangement includes the contour line of the secondary lining of tunnel. Wherein, the secondary lining of tunnel refers to building a circle of concrete lining inside the initial support, which is usually served as a safety reserve. The aforesaid contour line of the secondary lining of tunnel can be understood as the contour line of the inner surface of tunnel. The aforesaid foundation model of the blasthole arrangement is a solid model, and the shape of the aforesaid foundation model of the blasthole arrangement is the same as the cross-sectional shape of the tunnel.
[0060] 103. Obtain a blasthole arrangement model by calculating according to the parameter list of the blasthole arrangement and the contour line of the secondary lining of tunnel.
[0061] For the embodiment of the present invention, there is a parameter link relationship between the aforesaid blasthole arrangement model and the aforesaid parameter list of the blasthole arrangement, so that the aforesaid blasthole arrangement model would change accordingly with the change of parameters of the aforesaid parameter list of the blasthole arrangement. In addition, the aforesaid three-dimensional space can be any three-dimensional modeling space established by a three-dimensional software which can link parameters. Preferably, the aforesaid three-dimensional space can be a 3D modeling space established by the Inventor 3D modeling software. For the Inventor 3D modeling software, the aforesaid parameter list of the blasthole arrangement would be linked into the 3D modeling space through the fxp arameter. Specifically, the parameter list of the blasthole arrangement can be linked into the 3D modeling space established by the Inventor through “fx parameter”-"link”.
[0062] Specifically, the aforesaid parameter list of the blasthole arrangement comprises the length, the elevation, the angle, the longitudinal slope ratio, the starting mileage, the ending mileage, the distance between the excavation surface and secondary lining, the distance between the center line 40 of periphery hole and the secondary lining, the distance between the center line of lifter and the 7 secondary lining, the width of the cut area, the height of the cut area, the spacing betweert #80742 periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter, the spacing between the satellite holes, the diameter of the satellite hole, the depth of the satellite hole, the burden of the periphery hole, the burden of the lifter, the burden of the satellite hole, the vertical spacing between the cut holes, the horizontal spacing between the cut holes, the distance between the cut hole and the center plane, the included angle 1 between the cut hole and the elevation, the included angle 2 between the cut hole and the elevation, the included angle 3 between the cut hole and the elevation, the depth of the cut hole 1, the depth of the cut hole 2, the depth of the cut hole, 3, and the diameter ofthe cut hole. In addition, the locations of the periphery holes distributed on the foundation model of the blasthole arrangement can be determined according to the distance between the center lines of the periphery holes and the secondary lining, the spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, and the burden of the periphery hole. The locations of the lifters distributed on the foundation model of the blasthole arrangement can be determined according to the distance between the center lines of the lifters and the secondary lining, the spacing between the lifters, the diameter of the lifter, the depth of the lifter, and the burden of the lifter. Furthermore, the locations of the cut holes distributed on the foundation model of the blasthole arrangement can be determined according to the distance between the excavation surface and secondary lining, the working width of the cut area, the working height of the cut area, the vertical spacing between the cut holes, the horizontal spacing between the cut holes, the distance between the cut holes and the center plane, the included angle 1 between the cut hole and the elevation, the included angle 2 between the cut hole and the elevation, the included angle 3 between the cut hole and the elevation, the depth of the cut hole 1, the depth of the cut hole 2, the depth of the cut hole, 3, and the diameter of the cut hole. Meanwhile, the locations of the satellite holes distributed on the foundation model of the blasthole arrangement can be determined according to the spacing between the satellite holes, the diameter of the satellite hole, the depth of the satellite hole, and the burden of the satellite hole, and thus, the blasthole arrangement model can be obtained according to the locations of the periphery holes distributed on the foundation model of the blasthole arrangement, the locations of the lifters distributed on the foundation model of the blasthole arrangement, the locations of the cut holes distributed on the foundation model of the blasthole arrangement and the locations of the satellite holes distributed on the foundation model of the blasthole arrangement.
[0063] Each parameter of the parameter list of the blasthole arrangement shall be linked with the entities of blastholes in the blasthole arrangement model (which comprises the entity of the periphery hole, the entity of the satellite hole, the entity of the lifter, and the entity of the cut hole), so that the entities of blastholes in the blasthole arrangement model established in a three-dimensional modeling space would change with the change of values of the parameters of the parameter list of the blasthole arrangement would change with the blasthole arrangement model.
[0064] For the embodiment of the present invention, a parameter list of the blasthole arrangement 40 can be get, wherein, the said parameter list of the blasthole arrangement is established according to 8 a preset format; then, complete modeling in a three-dimensional space, and thus a foundbt390742 model of the blasthole arrangement can be obtained. In addition, the said foundation model of the blasthole arrangement includes the contour line of the secondary lining of tunnel; and then a blasthole arrangement model can be obtained by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel. Furthermore, there is a parameter link relationship between the said blasthole arrangement model and the said parameter list of the blasthole arrangement, so that the said blasthole arrangement model would change accordingly with the change of parameters of the said parameter list of the blasthole arrangement. Besides, the drawings of the blasthole arrangement can be drawn directly through the 3D model by linking the parameters of the blasthole arrangement with the 3D model. Moreover, for the process of modification, a modified 3D model can be generated automatically just by modifying the parameters of the blasthole arrangement, and thus, the efficiency of drawing papers of the blasthole arrangement can be improved.
[0065] It should be noted that the method of blasthole arrangement provided by the embodiment of the present invention is applicable to devices including mobile phones, monitors, computers, and servers, etc., which can complete blasthole arrangement.
[0066] Optionally, the aforesaid length parameters comprise: the distance between the center lines of the periphery holes and the secondary lining, the distance between the center lines of the lifters and the secondary lining, the distance between the excavation face and the secondary lining, the working width of the cut area, and the working height of the cut area. As shown in figure 2, which is a specific flowchart of step 103 provided by the embodiment of the present invention, comprises the following steps specifically:
[0067] 201. Based on the foundation model of blasthole arrangement, obtaining the center lines of the periphery holes by taking the contour lines of the secondary lining of tunnel as the reference, and taking the distance between the center lines of the periphery holes and the secondary lining as the offset, and obtaining the center lines of the lifters by taking the distance between the center lines of the lifters and secondary lining as offset, as well as obtaining the excavation contour line of tunnel by taking the distance between the excavation face and the secondary lining as the offset. Furthermore, the parameter linking of the distance between the center lines of the periphery holes and the secondary lining with the center lines of the periphery holes shall be done when the offset occurs, and the parameter linking of the distance between the lifters and the secondary lining with the lifters shall be done, as well as the parameter linking of the distance between the excavation face and the secondary lining with the excavation contour line of tunnel shall be done.
[0068] For the embodiment of the present invention, the aforesaid center lines of the periphery holes refer to the lines connected to the center of each periphery hole. If the periphery hole is a circular, the center line of the periphery hole refers to the line connected to the center of the circle of each periphery hole. Furthermore, the distance between the center line of each periphery hole and the secondary lining of tunnel can be determined based on the distance between the center lines of the periphery holes and the secondary lining. 40 [0069] The aforesaid center lines of the lifters refer to the lines connected to the center of each lifter. 9
If the lifter is a circular, the center line of the lifter refers to the line connected to the center or#R80742 circle of each lifter. Furthermore, the distance between the center line of each lifter and the secondary lining of tunnel can be determined based on the distance between the center lines of the lifters and the secondary lining.
[0070] The aforesaid excavation face refers to a blasting face, which can also be referred to as the excavation area of tunnel on the cut plane, which is embodied as the excavation contour line of tunnel on the foundation model of the blasthole arrangement.
[0071] 202. According to the working width of the cut area and the working height of the cut area, drawing the scope of the cut area based on the foundation model of the blasthole arrangement. Meanwhile, the parameter linking of the working width of the cut area with the working height of the cut area shall be done.
[0072] For the embodiment of the present invention, taking the center point of the excavation plane of tunnel on which the excavation contour line of tunnel located as the center point of the cut area, and then, drawing the scope of the cut area based on the foundation model of the blasthole arrangement according to the working width of the cut area and the working height of the cut area.
[0073] 203. Obtaining the blasthole arrangement model by calculating and based on the center lines of the periphery holes, the center lines of the lifters, the scope of the cut area, and the excavation contour line of tunnel.
[0074] For the embodiment of the present invention, the location distribution of the periphery holes can be determined based on the aforesaid center lines of the periphery holes, the location distribution of the lifters can be determined based on the aforesaid center lines of the lifters, and the location distribution of the cut holes can be determined based on the aforesaid center lines of the cut holes. Thus, the blasthole arrangement model can be obtained by calculating the location distribution of the satellite holes based on the location distribution of the periphery holes and the location distribution of the cut holes.
[0075] Further, the said length parameters further comprise: the spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter, and the spacing between the blastholes. As shown in figure 3, which is a specific flowchart of step 203 provided by the embodiment of the present invention comprises the following steps specifically:
[0076] 301 Calculating the number of periphery holes and the number of lifters as per the pre-defined first rules for writing and by combining the spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter and the spacing between the blastholes, based on the center lines of the periphery holes, the center lines of the lifters, and the excavation contour line of tunnel;
[0077] For the embodiment of the present invention, the aforesaid pre-defined first rules for writing may be an iLogic rules for writing of the Inventor. Specifically, the aforesaid process of calculating the number of periphery holes as per the first rules for writing is as follows: the number of intervals 40 between periphery holes =Fix (L1/ spacing between periphery holes), the number of periphery holes 10
= the number of intervals between periphery holes +1, wherein, L1 represents the length of #300742 center line of the periphery hole (i.e., the arc length of the center line of the periphery hole). The aforesaid process of calculating the number of lifters as per the first rules for writing is as follows: the number of intervals between lifters =Fix (L2/ spacing between lifters), the number of lifters = the number of intervals between lifters +1, wherein, L2 represents the length of the center line of the lifter.
[0078] 302. Obtaining the blasthole arrangement model by arranging peripheral holes and lifters on the foundation model of blasthole arrangement and based on the number of the peripheral holes and the number of lifters.
[0079] For the embodiment of the present invention, the midpoints of the aforesaid diameter of the periphery holes are located on the said center lines of the periphery holes, and the depth of periphery holes to be dug on the foundation model of the blasthole arrangement can be determined according to the aforesaid depth of the periphery hole. The midpoints of the aforesaid diameter of the lifters are located on the said center lines of the lifters, and the depth of lifters to be dug on the foundation model of the blasthole arrangement can be determined according to the aforesaid depth of the lifter. Thus, the blasthole arrangement model can be obtained by calculating the location distribution of the satellite holes based on the location distribution of the periphery holes and the location distribution of the cut holes.
[0080] Further, the said length parameters further comprise: the depth of the blasthole and the diameter of the blasthole. As shown in figure 4, which is a specific flowchart of step 303 provided by the embodiment of the present invention comprises the following steps specifically;
[0081] 401. Based on the foundation model of blasthole arrangement, obtaining the entity for tunnel excavation by stretching along the excavation contour line of tunnel,
[0082] For the embodiment of the present invention, the entity for tunnel excavation can be obtained by stretching the excavation contour line of tunnel according to the length parameter. For example, if the value of the length parameter is 5m, the excavation contour line of tunnel would be stretched as a closed solid line, thus, the entity for tunnel excavation with a length of 5m can be obtained. Moreover, the aforesaid foundation model of the blasthole arrangement can be a plane sketch of the blasthole arrangement, or a three-dimensional sketch of the blasthole arrangement.
[0083] 402. Link the blasthole depth and the blasthole diameter on the entity for tunnel excavation, and obtain the first contour of the blastholes according to the difference of the entity for tunnel excavation.
[0084] For the embodiment of the present invention, the aforesaid depth of the blasthole comprises the depth of the periphery hole and the depth of the lifter. Thus, the contour of the periphery hole and the contour of the lifter, which would be served as the first contour of the blasthole can be obtained by calculating the difference of the entity for tunnel excavation.
[0085] 403. Linking the number of the periphery holes, the number of the lifters, the spacing between the periphery holes and the spacing between the lifters in an array by taking the center lines of the periphery holes and the center lines of the lifters as the path, and taking the first contour 40 of the blastholes as the object. Thus, the first arrangement model can be obtained by arranging 11 peripheral holes and lifters on the foundation model of blasthole arrangement. LU500742
[0086] For the embodiment of the present invention, the contour of all periphery holes can be obtained by arraying the contour of the periphery holes based on taking the center lines of the periphery holes as the path, and the number of the periphery holes as the quantity. Wherein, the error of spacing between the periphery holes shall be kept within 5 mm. Meanwhile, the contour of all lifters can be obtained by arraying the contour of the lifters based on taking the center lines of the lifters as the path, and the number of the lifters as the quantity. Wherein, the error of spacing between the lifters shall be kept within 5 mm. Thus, the arrangement of the periphery holes and the lifters on the foundation model of blasthole arrangement can be accomplished, and further, the first arrangement model can be obtained.
[0087] 404. Completing auxiliary calculation on the first arrangement model, and thus, the blasthole arrangement model can be obtained.
[0088] For the embodiment of the present invention, the aforesaid auxiliary calculation includes the calculation of satellite holes.
[0089] Specifically, the aforesaid length parameter further comprises: the burden of the periphery hole, the burden of the lifter, the burden of the satellite hole, the spacing between the satellite holes, the diameter of the satellite hole, and the depth of the satellite hole. In addition, the first contour of the blastholes comprises the contour of the periphery hole and the contour of the lifter. As shown in figure 5, which is a specific flowchart of step 403 provided by the embodiment of the present invention comprises the following steps specifically:
[0090] 501. Obtaining the center lines of the first layer satellite holes by offsetting the contour of the periphery holes and the contour of the lifters respectively, then, linking the offset distance of the contour of the periphery hole with the burden of the periphery hole, as well as linking the offset distance of the contour of the lifter with the burden of the lifter;
[0091] For the embodiment of the present invention, in the contour of the periphery hole, the distance from the center of gravity of charging to the free surface is referred to as the burden of the periphery hole. Furthermore, the aforesaid free surface is also referred to as free face, which can be deemed as the end surface of the entity for tunnel excavation, i.e., the surface where the blasting medium to be blasted is exposed to the air. Furthermore, in view of the burden of the lifter, the distance from the center of gravity of charging to the free surface is referred to as the burden of the lifter, which is equivalent to offsetting the contour of the periphery holes according to the values of the burdens of the periphery holes, and offsetting the contour of the lifters according to the values of the burdens of the lifters. In addition, the offset line shall be deemed as the center lines of the first layer satellite holes. Furthermore, the satellite holes can include multiple layers, and the centers of the first layer satellite holes are all distributed on the center lines of the first layer satellite holes.
[0092] 502. Calculating the number of the first layer satellite holes as per the pre-defined second rules for writing and by combining the spacing between the satellite holes, the diameter of the satellite hole, the depth of the satellite hole, and the spacing between the blastholes.
[0093] For the embodiment of the present invention, the aforesaid pre-defined second rules for 40 writing may be an iLogic rules for writing of the Inventor. Specifically, the aforesaid process of 12 calculating the number of the first layer satellite holes as per the second rules for writing (390742 follows: the number of the first layer satellite holes =Fix (L3/ spacing between periphery holes) +1, wherein, L3 represents the length of the first layer satellite holes.
[0094] 503. Drawing the second contour of the blastholes by calculating the difference of the number of the first layer satellite holes, and then, arranging the first layer satellite holes in an array.
[0095] For the embodiment of the present invention, the contour of the first layer satellite holes, which would be served as the second contour of the blasthole can be obtained by calculating the difference of the entity for tunnel excavation based on the depth of the first layer satellite hole and the diameter of the first layer satellite hole. In addition, the contour of the first layer satellite holes can be obtained by arraying the contour of the first layer satellite holes based on taking the center lines of the first layer satellite holes as the path, and the number of the first layer satellite holes as the quantity. Wherein, the error of spacing between the first layer satellite holes shall be kept within 5 mm.
[0096] 504. Linking the offset distance between the said center lines of the first layer satellite holes with the burdens of the satellite holes by offsetting the said first layer satellite holes, and thus, the remaining center lines of the satellite holes can be drawn and the remaining satellite holes can be figured out.
[0097] For the embodiment of the present invention, in the contour of the satellite holes, the distance from the center of gravity of charging to the free surface is referred to as the burden of the satellite hole. Furthermore, the center lines of the second layer satellite holes can be obtained by offsetting the center lines of the first layer satellite holes by one burden of the satellite hole. Then, the contour of the second layer satellite holes can be obtained by calculating the difference of the entity for tunnel excavation based on the depth of the second layer satellite hole and the diameter of the second layer satellite hole. Thus, all contour of the second layer satellite holes can be obtained by arraying the contour of the second layer satellite holes based on taking the center lines of the second layer satellite holes as the path, and the number of the second layer satellite holes as the quantity. Wherein, the error of spacing between the second layer satellite holes shall be kept within 5 mm. After that, the remaining center lines of the satellite holes can be obtained by repeating the aforesaid offset process, and the remaining entities of the satellite holes can be obtained by repeating the aforesaid array process.
[0098] 505. Obtaining the second arrangement model by arranging the satellite holes on the first arrangement model.
[0099] For the embodiment of the present invention, the aforesaid first arrangement model comprises the contour of the periphery holes and the contour of the lifters. In addition, the aforesaid second arrangement model comprises the contour of the periphery holes, the contour of the lifters and the contour of satellite holes. It should be noted that the aforesaid contour of the periphery hole can also be referred to as a hollow entity of the periphery hole, and the aforesaid contour of the lifter can also be referred to as a hollow entity of the lifter, as well as the aforesaid contour of the satellite hole can also be referred to as a hollow entity of the satellite hole. 40 [0100] 506. Obtaining the blasthole arrangement model after completing post-processing on the 13 said second arrangement model. LUS00742
[0101] For the embodiment of the present invention, the aforesaid post-processing refers to adding cut holes to the second arrangement model, wherein, the said length parameters further comprise: the vertical spacing between the cut holes, the horizontal spacing between the cut holes, the distance between the cut holes and the central plane, the diameter of the cut hole, and the depth of the cut hole. In addition, the said angle parameters comprise the included angle between the cut hole and the elevation. As shown in figure 6, which is a specific flowchart of step 506 provided by the embodiment of the present invention comprises the following steps specifically:
[0102] 601. Drawing a sketch of the blasthole arrangement on the second arrangement model according to the link parameters of the scope of the cut area, and thus the cut area can be obtained. After that, draw the third contour of the blastholes by calculating the difference;
[0103] For the embodiment of the present invention, the link parameters of the aforesaid scope of the cut area range comprise: the vertical spacing between the cut holes, the horizontal spacing between the cut holes, the distance between the cut holes and the central plane, the diameter of the cut hole, the depth of the cut hole and the included angle between the cut hole and the elevation. Then, drawing the sketch of blasthole arrangement on the second arrangement model according to the working width of the cut area and the working height of the cut area, and thus, the cut area located on the second arrangement model can be obtained.
[0104] Drawing the third contour of the blastholes by calculating the difference of the second arrangement model based on the vertical spacing between the cut holes, the horizontal spacing between the cut holes, the distance between the cut holes and the central plane, the diameter of the cut hole, the depth of the cut hole and the included angle between the cut hole and the elevation. Furthermore, the aforesaid third contour of the blastholes can be referred to as the contour of the cut holes or hollow entities of the cut holes.
[0105] 602. Adding a text parameter of the cut area.
[0106] For the embodiment of the present invention, the aforesaid text parameters comprise the types and the corresponding parameters and values of the cut areas. Wherein, the types of the aforesaid cut areas can be divided according to angles, which can be divided based on the included angle between the aforesaid cut hole and the elevation. For example, as shown in figure 6a, which is a cross-sectional schematic diagram of a cut hole provided by the embodiment of the present invention. Specifically, in figure 6a, the included angles between the aforesaid cut holes and the elevation comprise: the included angle 1 between the cut hole and the elevation (wherein, the range of the included angle is between 72 degrees and 73 degrees), the included angle 2 between the cut hole and the elevation (wherein, the range of the included angle is between 69.5 degrees and 70.5 degrees), and the included angle 3 between the cut hole and the elevation (wherein, the range of the included angle is between 67.5 degrees and 68.5 degrees). Furthermore, the depth of the aforesaid cut hole varies with the different included angles between the cut holes and the elevation, wherein, the included angle 1 between the cut hole and the elevation corresponds to the depth of cut hole 1 (4000mm), or the depth of cut hole 2 (2300mm), or the depth of cut hole 3 (1600mm). 40 [0107] 603. Conducting incidence correspondence among the text parameters of the said cut area 14 as per the pre-defined third rules for writing, and then adding form control to control thelt£340742 parameters of the said cut area.
[0108] For the embodiment of the present invention, the aforesaid third rules for writing can be the iLogic rules for writing of the Inventor, and the aforesaid third rules for writing may be a rule that the vertical spacing between the cut holes, the horizontal spacing between cut holes, and the number of cut holes are distributed within the scope of the cut area.
[0109] Referring to figure 7, which is a structural schematic diagram of a blasthole arrangement device provided by the embodiment of the present invention showed the said device that comprises:
[0110] An acquisition module 701, which is utilized to get a parameter list of the blasthole arrangement, and the said parameter list of the blasthole arrangement is established according to a preset format;
[0111] A modeling module 702, which is utilized to complete modeling in a three-dimensional space, and thus, a foundation model of the blasthole arrangement can be obtained, and the said foundation model of the blasthole arrangement includes the contour lines of the secondary lining of tunnel;
[0112] A processing module 703, which is utilized to obtain a blasthole arrangement model by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel. Furthermore, there is a parameter link relationship between the said blasthole arrangement model and the said parameter list of the blasthole arrangement, so that the said blasthole arrangement model would change accordingly with the change of parameters of the said parameter list of the blasthole arrangement.
[0113] Optionally, the parameters of the said parameter list of the blasthole arrangement are divided into length parameters, slope ratio parameters and angle parameters according to the category of units, and each parameter has a corresponding key and value.
[0114] Optionally, the said length parameters comprise: the distance between the center lines of the periphery holes and the secondary lining, the distance between the center lines of the lifters and the secondary lining, the distance between the excavation face and the secondary lining, the working width of the cut area, and the working height of the cut area. Furthermore, the said processing module 703 can be utilized to complete the following steps:
[0115] Based on the said foundation model of blasthole arrangement, obtain the center lines of the periphery holes by taking the said contour lines of the secondary lining of tunnel as the reference, and taking the distance between the said center lines of the periphery holes and the secondary lining as the offset, and obtain the center lines of the lifters by taking the distance between the said center lines of the lifters and secondary lining as offset, as well as obtaining the excavation contour line of tunnel by taking the distance between the said excavation face and the secondary lining as the offset. Furthermore, the parameter linking of the distance between the said center lines of the periphery holes and the secondary lining with the said center lines of the periphery holes shall be done when the offset occurs, and the parameter linking of the distance between the said lifters and the secondary lining with the said lifters shall be done, as well as the parameter linking of the 40 distance between the said excavation face and the secondary lining with the said excavation 15 contour line of tunnel shall be done; LU500742
[0116] According to the said working width of the cut area and the said working height of the cut area, draw the scope of the cut area based on the said foundation model of the blasthole arrangement. Meanwhile, the parameter linking between the said working width of the cut area, the said working height of the cut area and the said scope of the cut area shall be done;
[0117] Obtain the blasthole arrangement model by calculating and based on the said center lines of the periphery holes, the said center lines of the lifters, the said scope of the cut area, and the said excavation contour line of tunnel.
[0118] Optionally, the said length parameters further comprise: the spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter and the spacing between the blastholes. Furthermore, the said processing module 703 can be utilized to complete the following steps:
[0119] Calculate the number of periphery holes and the number of lifters as per the pre-defined first rules for writing and by combining the said spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter and the spacing between the blastholes, based on the said center lines of the periphery holes, the said center lines of the lifters, and the said excavation contour line of tunnel;
[0120] Obtain the blasthole arrangement model by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement and based on the number of the said peripheral holes and the number of lifters.
[0121] Optionally, the said length parameters further comprise: the depth of the blasthole and the diameter of the blasthole. Furthermore, the said processing module 703 can be utilized to complete the following steps:
[0122] Based on the said foundation model of blasthole arrangement, obtain the entity for tunnel excavation by stretching along the said excavation contour line of tunnel;
[0123] Link the said excavation contour line of tunnel with the said depth of the blasthole and the said diameter of the blasthole, and thus, the first contour of the blastholes can be obtained by calculating difference based on the said entity for tunnel excavation;
[0124] Link the number of the said periphery holes, the number of the said lifters and the spacing between the blastholes in an array by taking the said center lines of the periphery holes and the said center lines of the lifters as the path, and taking the said first contour of the blastholes as the object. Furthermore, the first arrangement model can be obtained by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement;
[0125] Complete auxiliary calculation on the said first arrangement model, and thus, the blasthole arrangement model can be obtained.
[0126] Optionally, the said length parameter further comprises: the burden of the periphery hole, the burden of the lifter, the burden of the satellite hole, the spacing between the satellite holes, the diameter of the satellite hole, and the depth of the satellite hole. In addition, the said first contour of 40 the blastholes comprises the contour of the periphery hole and the contour of the lifter. Furthermore, 16 the said processing module 703 can be utilized to complete the following steps: LU500742
[0127] Obtain the center lines of the first layer satellite holes b y offsetting the said contour of the periphery holes and the said contour of the lifters respectively, then, linking the offset distance of the said contour of the periphery hole with the burden of the periphery hole, as well as linking the offset distance of the said contour of the lifter with the burden of the lifter;
[0128] Calculate the number of the first layer satellite holes as per the pre-defined second rules for writing and by combining the said spacing between the satellite holes, the diameter of the satellite hole, the depth of the satellite hole, and the spacing between the blastholes;
[0129] Draw the second contour of the blastholes by calculating the difference of the number of the first layer satellite holes; and then, arrange the first layer satellite holes in an array;
[0130] Link the offset distance between the said center lines of the first layer satellite holes with the burdens of the satellite holes by offsetting the said first layer satellite holes, and thus, the remaining center lines of the satellite holes can be drawn and the remaining satellite holes can be figured out.
[0131] Obtain the second arrangement model by arranging the satellite holes on the said first arrangement model;
[0132] Obtain the blasthole arrangement model after completing postprocessing on the said second arrangement model.
[0133] Optionally, the said length parameters further comprise: the vertical spacing between the cut holes, the horizontal spacing between the cut holes, the distance between the cut holes and the central plane, the diameter of the cut hole, and the depth of the cut hole. In addition, the said angle parameters comprise the included angle between the cut blasthole and the elevation. Furthermore, the said processing module 703 can be utilized to complete the following steps:
[0134] Obtain the cut area according to the link parameters of the said scope of the cut area, then, draw a sketch of the blasthole arrangement on the second arrangement model, as well as draw the third contour of the blastholes by calculating the difference;
[0135] Add text parameters of the cut area, and the said text parameter includes the types of the cut area;
[0136] Conduct incidence correspondence among the text parameters of the said cut area as per the pre-defined third rules for writing, and then adding form control to control the text parameters of the said cut area.
[0137] It should be noted that the method of blasthole arrangement provided by the embodiment of the present invention is applicable to devices including mobile phones, monitors, computers, and servers, etc., which can complete blasthole arrangement.
[0138] The electronic device provided by the embodiment of the present invention can accomplish each process that realized by the method of blasthole arrangement described in the aforesaid embodiment, and can achieve the same beneficial effects. Toa void repetition, no more detailed description would be referred to herein.
[0139] Referring to figure 8, which is a structural schematic diagram of an electronic device provided by the embodiment of the present invention. As shown in figure 8, it comprises: a memory 40 802, a processor 801, and a computer program which is stored on the said memory 802 and can be 17 run on the Inventor software, wherein: LU500742
[0140] The Inventor software is responsible for calling the computer program stored in the memory 802, and then executing the following steps:
[0141] Get a parameter list of the blasthole arrangement, wherein, the said parameter list of the blasthole arrangement is established according to a preset format;
[0142] Complete modeling in a three-dimensional space, and thus a foundation model of the blasthole arrangement can be obtained. In addition, the said foundation model of the blasthole arrangement includes the contour lines of the secondary lining of tunnel;
[0143] Obtain a blasthole arrangement model by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel. Furthermore, there is a parameter link relationship between the said blasthole arrangement model and the said parameter list of the blasthole arrangement, so that the said blasthole arrangement model would change accordingly with the change of parameters of the said parameter list of the blasthole arrangement.
[0144] Optionally, the parameters of the said parameter list of the blasthole arrangement are divided into length parameters, slope ratio parameters and angle parameters according to the category of units, and each parameter has a corresponding key and value.
[0145] Optionally, the said length parameters comprise: the distance between the center lines of the periphery holes and the secondary lining, the distance between the center lines of the lifters and the secondary lining, the distance between the excavation face and the secondary lining, the working width of the cut area, and the working height of the cut area. Thus, the blasthole arrangement model can be obtained by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel, wherein, the specific steps comprise:
[0146] Based on the said foundation model of blasthole arrangement, obtaining the center lines of the periphery holes by taking the said contour lines of the secondary lining of tunnel as the reference, and taking the distance between the said center lines of the periphery holes and the secondary lining as the offset, and obtaining the center lines of the lifters by taking the distance between the said center lines of the lifters and secondary lining as offset, as well as obtaining the excavation contour line of tunnel by taking the distance between the said excavation face and the secondary lining as the offset. Furthermore, the parameter linking of the distance between the said center lines of the periphery holes and the secondary lining with the said center lines of the periphery holes shall be done when the offset occurs, and the parameter linking of the distance between the said lifters and the secondary lining with the said lifters shall be done, as well as the parameter linking of the distance between the said excavation face and the secondary lining with the said excavation contour line of tunnel shall be done;
[0147] According to the said working width of the cut area and the said working height of the cut area, drawing the scope of the cut area based on the said foundation model of the blasthole arrangement. Meanwhile, the parameter linking between the said working width of the cut area, the said working height of the cut area and the said scope of the cut area shall be done; 40 [0148] Obtaining the blasthole arrangement model by calculating and based on the said center lines 18 of the periphery holes, the said center lines of the lifters, the said scope of the cut area, and the 4R80742 excavation contour line of tunnel.
[0149] Optionally, the said length parameters further comprise: the spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter and the spacing between the blastholes. Furthermore, the Inventor software would execute the operation related to the said center lines of the periphery holes, the said center lines of the lifters, the said scope of the cut area, and the said excavation contour line of tunnel, and thus, the blasthole arrangement model can be obtained by calculating, wherein, the specific steps comprise:
[0150] Calculating the number of periphery holes and the number of lifters as per the pre-defined first rules for writing and by combining the said spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter and the spacing between the blastholes, based on the said center lines of the periphery holes, the said center lines of the lifters, and the said excavation contour line of tunnel;
[0151] Obtaining the blasthole arrangement model by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement and based on the number of the said peripheral holes and the number of lifters.
[0152] Optionally, the said length parameters further comprise: the depth of the blasthole and the diameter of the blasthole. Furthermore, the Processor 801 would execute the operation related to the number of the said peripheral holes and the number of lifters, and thus, the blasthole arrangement model can be obtained by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement, wherein, the specific steps comprise:
[0153] Based on the said foundation model of blasthole arrangement, obtaining the entity for tunnel excavation by stretching along the said excavation contour line of tunnel;
[0154] Linking the said excavation contour line of tunnel with the said depth of the blasthole and the said diameter of the blasthole, and thus, the first contour of the blastholes can be obtained by calculating difference based on the said entity for tunnel excavation;
[0155] Linking the number of the said periphery holes, the number of the said lifters and the spacing between the blastholes in an array by taking the said center lines of the periphery holes and the said center lines of the lifters as the path, and taking the said first contour of the blastholes as the object. Furthermore, the first arrangement model can be obtained by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement;
[0156] Completing auxiliary calculation on the said first arrangement model, and thus, the blasthole arrangement model can be obtained.
[0157] Optionally, the said length parameter further comprises: the burden of the periphery hole, the burden of the lifter, the burden of the satellite hole, the spacing between the satellite holes, the diameter of the satellite hole, and the depth of the satellite hole. In addition, the said first contour of the blastholes comprises the contour of the periphery hole and the contour of the lifter. Furthermore, 40 the Processor 801 would execute the operation related to the auxiliary calculation on the said first 19 arrangement model, and thus, the blasthole arrangement model can be obtained, wherein #780742 specific steps comprise:
[0158] Obtaining the center lines of the first layer satellite holes b y offsetting the said contour of the periphery holes and the said contour of the lifters respectively, then, linking the offset distance of the said contour of the periphery hole with the burden of the periphery hole, as well as linking the offset distance of the said contour of the lifter with the burden of the lifter;
[0159] Calculating the number of the first layer satellite holes as per the pre-defined second rules for writing and by combining the said spacing between the satellite holes, the diameter of the satellite hole, the depth of the satellite hole, and the spacing between the blastholes;
[0160] Drawing the second contour of the blastholes by calculating the difference of the number of the first layer satellite holes, and then, arranging the first layer satellite holes in an array;
[0161] Linking the offset distance between the said center lines of the first layer satellite holes with the burdens of the satellite holes by offsetting the said first layer satellite holes, and thus, the remaining center lines of the satellite holes can be drawn and the remaining satellite holes can be figured out.
[0162] Obtaining the second arrangement model by arranging the satellite holes on the said first arrangement model;
[0163] Obtaining the blasthole arrangement model after completing postprocessing on the said second arrangement model.
[0164] Optionally, the said length parameters further comprise: the vertical spacing between the cut holes, the horizontal spacing between the cut holes, the distance between the cut holes and the central plane, the diameter of the cut hole, and the depth of the cut hole. In addition, the said angle parameters comprise the included angle between the cut blasthole and the elevation, and thus, the Processor 801 would execute the operation related to the postprocessing on the said second arrangement model, then, the blasthole arrangement model can be obtained, wherein, the specific steps comprise:
[0165] Obtaining the cut area according to the link parameters of the said scope of the cut area, then, drawing a sketch of the blasthole arrangement on the second arrangement model, as well as drawing the third contour of the blastholes by calculating the difference;
[0166] Adding text parameters of the cut area, and the said text parameter includes the types of the cut area;
[0167] Conducting incidence correspondence among the text parameters of the said cut area as per the pre-defined third rules for writing, and then adding form control to control the text parameters of the said cut area.
[0168] It should be noted that the method of blasthole arrangement provided by the embodiment of the present invention is applicable to devices including mobile phones, monitors, computers, and servers, etc., which can complete blasthole arrangement.
[0169] The electronic device provided by the embodiment of the present invention can accomplish each process that realized by the method of blasthole arrangement described in the aforesaid 40 embodiment, and can achieve the same beneficial effects. Toa void repetition, no more detailed 20 description would be referred to herein. LU500742
[0170] The embodiments of the present invention also provided a computer-readable storage medium, and there is a computer program is stored on the computer-readable storage medium. Thus, each process of the method of blasthole arrangement provided by the embodiment of the present invention can be accomplished by executing the computer program by the processor, and the same technical effect can be achieved. Toavoid repetition, no more detailed description would be referred to herein.
[0171] Those of ordinary skill in the art can understand that all or part of the processes of the method adopted by the aforesaid embodiments can be implemented by instructing relevant hardware through a computer program, and the said program can be stored in a computer-readable storage medium. The execution of the program would include the processes of the embodiments of the aforesaid methods. Wherein, the said storage medium can be a magnetic disk, an optical disc, a read-only memory (Read-Only Memory, ROM), or a random-access memory (Random Access Memory, RAM for short), etc.
[0172] The above are only described the preferred embodiments of the present invention, which shall not be used to limit the scope of claims of the present invention. Thus, any equivalent variations made according to the claims of the present invention shall fall within the scope of the present invention.
21

Claims (10)

CLAIMS - LU500742
1. A method of blasthole arrangement, characterized in that comprising the following steps: Getting a parameter list of the blasthole arrangement, wherein, the said parameter list of the blasthole arrangement is established according to a preset format; Completing modeling in a three-dimensional space, and thus a foundation model of the blasthole arrangement can be obtained. In addition, the said foundation model of the blasthole arrangement includes the contour line of the secondary lining of tunnel; and then a blasthole arrangement model can be obtained by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel. Furthermore, there is a parameter link relationship between the said blasthole arrangement model and the said parameter list of the blasthole arrangement, so that the said model of blasthole arrangement would change accordingly with the change of parameters of the said parameter list of the blasthole arrangement.
2. The method as described in claim 1, characterized in that the parameters of the said parameter list of the blasthole arrangement are divided into length parameters, slope ratio parameters and angle parameters according to the category of units, and each parameter has a corresponding key and value.
3. The method as described in claim 2, characterized in that the said length parameters comprise: the distance between the center lines of the periphery holes and the secondary lining, the distance between the center lines of the lifters and the secondary lining, the distance between the excavation face and the secondary lining, the working width of the cut area, and the working height of the cut area. Thus, the blasthole arrangement model can be obtained by calculating according to the said parameter list of the blasthole arrangement and the said contour lines of the secondary lining of tunnel, wherein, the specific steps comprise: Based on the said foundation model of blasthole arrangement, obtaining the center lines of the periphery holes by taking the said contour lines of the secondary lining of tunnel as the reference, and taking the distance between the said center lines of the periphery holes and the secondary lining as the offset, and obtaining the center lines of the lifters by taking the distance between the said center lines of the lifters and secondary lining as offset, as well as obtaining the excavation contour line of tunnel by taking the distance between the said excavation face and the secondary lining as the offset. Furthermore, the parameter linking of the distance between the said center lines of the periphery holes and the secondary lining with the said center lines of the periphery holes shall be done when the offset occurs, and the parameter linking of the distance between the said lifters and the secondary lining with the said lifters shall be done, as well as the parameter linking of the distance between the said excavation face and the secondary lining with the said excavation contour line of tunnel shall be done.
According to the said working width of the cut area and the said working height of the cut area, drawing the scope of the cut area based on the said foundation model of the blasthole arrangement. Meanwhile, the parameter linking of the said working width of the cut area with the said working height of the cut area shall be done; 40 Obtaining the blasthole arrangement model by calculating and based on the said center lines of 22
CLAIMS - LU500742 the periphery holes, the said center lines of the lifters, the said scope of the cut area, and the said excavation contour line of tunnel.
4. The method as described in claim 3, characterized in that the said length parameters further comprise: the spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter and the spacing between the blastholes. Furthermore, the blasthole arrangement model can be obtained by calculating based on the said center lines of the periphery holes, the said center lines of the lifters, the said scope of the cut area, and the said excavation contour line of tunnel, wherein, the specific steps comprise: Calculating the number of periphery holes and the number of lifters as per the pre-defined first rules for writing and by combining the said spacing between the periphery holes, the diameter of the periphery hole, the depth of the periphery hole, the spacing between the lifters, the diameter of the lifter, the depth of the lifter and the spacing between the blastholes, based on the said center lines of the periphery holes, the said center lines of the lifters, and the said excavation contour line of tunnel; Obtaining the blasthole arrangement model by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement and based on the number of the said peripheral holes and the number of lifters.
5. The method as described in claim 4, characterized in that the said length parameters further comprise: the depth of the blasthole and the diameter of the blasthole. Furthermore, the blasthole arrangement model can be obtained by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement and based on the number of the said peripheral holes and the number of lifters, wherein, the specific steps comprise: Based on the said foundation model of blasthole arrangement, obtaining the entity for tunnel excavation by stretching along the said excavation contour line of tunnel; Linking the said excavation contour line of tunnel with the said depth of the blasthole and the said diameter of the blasthole, and thus, the first contour of the blastholes can be obtained by calculating difference based on the said entity for tunnel excavation; Linking the number of the said periphery holes, the number of the said lifters and the spacing between the blastholes in an array by taking the said center lines of the periphery holes and the said center lines of the lifters as the path, and taking the said first contour of the blastholes as the object. Furthermore, the first arrangement model can be obtained by arranging peripheral holes and lifters on the said foundation model of blasthole arrangement; Completing auxiliary calculation on the said first arrangement model, and thus, the blasthole arrangement model can be obtained.
6. Theme thod as described in claim 5, characterized in that the said length parameter further comprises: the burden of the periphery hole, the burden of the lifter, the burden of the satellite hole, the spacing between the satellite holes, the diameter of the satellite hole, and the depth of the satellite hole. In addition, the said first contour of the blastholes comprises the contour of the 40 periphery hole and the contour of the lifter. Thus, the blasthole arrangement model can be obtained 23
CLAIMS - LU500742 by completing auxiliary calculation on the said first arrangement model, wherein, the specific steps comprise: Obtaining the center lines of the first layer satellite holes by offsetting the said contour of the periphery holes and the said contour of the lifters respectively, then, linking the offset distance of the said contour of the periphery hole with the burden of the periphery hole, as well as linking the offset distance of the said contour of the lifter with the burden of the lifter; Calculating the number of the first layer satellite holes as per the pre-defined second rules for writing and by combining the said spacing between the satellite holes, the diameter of the satellite hole, the depth of the satellite hole, and the spacing between the blastholes; Drawing the second contour of the blastholes by calculating the difference of the number of the first layer satellite holes, and then, arranging the first layer satellite holes in an array; then, linking the offset distance between the said center lines of the first layer satellite holes with the burdens of the satellite holes by offsetting the said first layer satellite holes, and thus, the remaining center lines of the satellite holes can be drawn and the remaining satellite holes can be figured out. After that, the second arrangement model can be obtained by arranging the satellite holes on the said first arrangement model; and further, the blasthole arrangement model can be obtained after completing post-processing on the said second arrangement model.
7. The method as described in claim 6, characterized in that the said length parameters further comprise: the vertical spacing between the cut holes, the horizontal spacing between the cut holes, the distance between the cut holes and the central plane, the diameter of the cut hole, and the depth of the cut hole. In addition, the said angle parameters comprise the included angle between the cut hole and the elevation, and thus, the blasthole arrangement model can be obtained after completing post-processing on the said second arrangement model, wherein, the specific steps comprise: Drawing a sketch of the blasthole arrangement on the second arrangement model according to the link parameters of the said scope of the cut area, and thus the cut area can be obtained. After that, draw a third contour of the blastholes by means of the differencing; Adding text parameters of the cut area, and the said text parameter includes the types of the cut area; Conducting incidence correspondence among the text parameters of the said cut area as per the pre-defined third rules for writing, and then adding form control to control the text parameters of the said cut area.
8. A blasthole arrangement device, characterized in that the said device comprises: An acquisition module, which is utilized to get a parameter list of the blasthole arrangement, and the said parameter list of the blasthole arrangement is established according to a preset format; A modeling module, which is utilized to complete modeling in a three-dimensional space, and thus, a foundation model of the blasthole arrangement can be obtained, and the said foundation model of the blasthole arrangement includes the contour line of the secondary lining of tunnel, A processing module, which is utilized to obtain a blasthole arrangement model by calculating 40 according to the said parameter list of the blasthole arrangement and the said contour lines of the 24
CLAIMS - LU500742 secondary lining of tunnel. Furthermore, there is a parameter link relationship between the said blasthole arrangement model and the said parameter list of the blasthole arrangement, so that the said blasthole arrangement model would change accordingly with the change of parameters of the said parameter list of the blasthole arrangement.
9. An electronic device, characterized in that comprising: a memory, a processor, and a computer program which is stored on the said memory and can be run on the processor. Furthermore, the said processor would execute the computer program to accomplish the steps of the method of blasthole arrangement as described in any one of claims 1 to 7.
10. A computer-readable storage medium, characterized in that there is a computer program is stored on the computer-readable storage medium. Thus, the steps of the method of blasthole arrangement as described in any one of claims 1 to 7 can be accomplished by executing the said computer program by the processor.
LU500742A 2021-10-18 2021-10-18 A Method of Blasthole Arrangement, and Its Device, Electronic Equipment, and Storage Medium LU500742B1 (en)

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LU500742A LU500742B1 (en) 2021-10-18 2021-10-18 A Method of Blasthole Arrangement, and Its Device, Electronic Equipment, and Storage Medium

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LU500742A LU500742B1 (en) 2021-10-18 2021-10-18 A Method of Blasthole Arrangement, and Its Device, Electronic Equipment, and Storage Medium

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LU500742B1 true LU500742B1 (en) 2022-04-19

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