CN113009783A - Device capable of preparing multi-stage microstructure - Google Patents
Device capable of preparing multi-stage microstructure Download PDFInfo
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- CN113009783A CN113009783A CN202110249538.6A CN202110249538A CN113009783A CN 113009783 A CN113009783 A CN 113009783A CN 202110249538 A CN202110249538 A CN 202110249538A CN 113009783 A CN113009783 A CN 113009783A
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- 239000000758 substrate Substances 0.000 claims abstract description 38
- 238000006073 displacement reaction Methods 0.000 claims abstract description 27
- 230000008878 coupling Effects 0.000 claims description 22
- 238000010168 coupling process Methods 0.000 claims description 22
- 238000005859 coupling reaction Methods 0.000 claims description 22
- 238000004026 adhesive bonding Methods 0.000 claims description 19
- 238000005520 cutting process Methods 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 12
- 239000003292 glue Substances 0.000 claims description 11
- 239000000919 ceramic Substances 0.000 claims description 6
- 238000004049 embossing Methods 0.000 claims description 6
- 239000010410 layer Substances 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 9
- 239000002356 single layer Substances 0.000 abstract description 6
- 238000002360 preparation method Methods 0.000 abstract description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 33
- 229910052763 palladium Inorganic materials 0.000 description 20
- UENWRTRMUIOCKN-UHFFFAOYSA-N benzyl thiol Chemical compound SCC1=CC=CC=C1 UENWRTRMUIOCKN-UHFFFAOYSA-N 0.000 description 11
- 238000003825 pressing Methods 0.000 description 5
- -1 benzyl palladium Chemical compound 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 241000196324 Embryophyta Species 0.000 description 1
- 241000270290 Gekkota Species 0.000 description 1
- 241001489698 Gerridae Species 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000001127 nanoimprint lithography Methods 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000003075 superhydrophobic effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- General Physics & Mathematics (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
The invention relates to a device capable of preparing a multistage microstructure, and belongs to the field of nanoimprint. The first liftable platform is fixed on a left side plate of the frame, the second liftable platform is fixed on a right side plate of the frame, the first fine adjustment device is fixed on the first liftable platform through screws, the second fine adjustment device is fixed on the second liftable platform through screws, the left side of the fixing frame is connected with the first liftable platform through screws, the right side of the fixing frame is connected with the second liftable platform through screws, the imprinting device is in sliding contact with the fixing frame through cylindrical buckles, the supporting table is fixed on the XY displacement platform through screws, and the XY displacement platform is fixed on a bottom plate of the frame through screws. The method has the advantages that the stacking precision is high, the microstructure on the smooth roll is in better linear contact with the planar substrate, and the stacking precision is improved; facilitating multilayer stacking: the single-layer microstructure embossed on the smooth roller can be stacked in different layers on the planar substrate, so that the preparation of the multi-stage microstructure is not limited by a device.
Description
Technical Field
The invention relates to the field of nanoimprint lithography, in particular to a device capable of preparing a multistage microstructure.
Background
It is well known that animals and plants can adapt and survive in various environments due to their own characteristic properties. For example, a water strider is able to crawl on water because of the presence of micron-structured villi on the foot; geckos are able to climb on walls because of the presence of hair-like bristles at the footplate; the lotus leaf has a self-cleaning effect because of the existence of a multi-stage structure on the surface, and the like. As described above, the functions of various living organisms are due to the existence of a multi-stage structure in different parts of the organism itself. At present, compared with a single-stage structure, a multi-stage structure prepared based on bionics has higher practicability, and can be widely applied to the aspects of optics, micro-nano fluid systems and the like.
Heretofore, methods for manufacturing multilevel microstructures mainly include electrochemical etching, photolithography, capillary force transfer, laser-assisted etching, and the like, however, these methods require complicated process parameters for control, and processing equipment is expensive, which limits the mass production and production of multilevel microstructures. Compared with other nano-scale technologies, the nano-imprinting technology has the advantages that the control requirement on process parameters is low, the processing process is simple and convenient, meanwhile, the nano-imprinting also has a good environmental effect, the use of a large amount of developing solution in the traditional photoetching technology is avoided, and the pollution to the environment is reduced.
Although multi-level microstructures have better properties than single-level microstructures, they suffer from problems of difficult stacking, high cost, low alignment accuracy, etc. The utility model discloses a can prepare super hydrophobic micro-structure's nanometer impression device utilizes roller pair roller impression in utility model's that publication No. CN 209879250U, has adopted the method that chemistry and nanometer impression combine, can once only produce double-deck stacked structure, and the course of working is simple and convenient, has practiced thrift the time of preparation. However, the device has some defects, namely, the angle deviation caused by the small angle inclination in the vertical direction of the substrate and the error generated by the deviation of the roller shaft from the central axis in the stacking process when the micro-structures are stacked, and the position of the roller of the device can not be adjusted, so that the prepared multi-level micro-structures are only limited to two layers, and a multi-layer micro-structure can not be prepared, and the device has certain limitation.
Disclosure of Invention
The invention provides a device capable of preparing a multi-level microstructure, which aims to solve the problem that the multi-level microstructure cannot be prepared at present.
The invention adopts the technical scheme that the device comprises a first lifting platform, a second lifting platform, a first fine adjustment device, a second fine adjustment device, a fixed frame, an imprinting device, a supporting table, an XY displacement platform and a frame, wherein the first lifting platform is fixed on a left side plate of the frame through screws, the second lifting platform is fixed on a right side plate of the frame through screws, the first fine adjustment device is fixed on the first lifting platform through screws, the second fine adjustment device is fixed on the second lifting platform through screws, the left side of the fixed frame is connected with the first lifting platform through screws, the right side of the fixed frame is connected with the second lifting platform through screws, the imprinting device is in sliding contact with the fixed frame through cylindrical buckles, the supporting table is fixed on the XY displacement platform through screws, and the XY displacement platform is fixed on a bottom.
The first lifting platform is the same as the second lifting platform in structure, and comprises a first stepping motor, a first coupler, a first ball screw, a first sliding table, a first guide rail and a first screw support seat, wherein the first stepping motor is fixed on the first screw support seat through a screw, the first stepping motor is connected with the first coupler, the first ball screw penetrates through a through hole of the first screw support seat and then is connected with the first coupler, the first sliding table is in threaded connection with the first ball screw, and the first sliding table is in sliding connection with the first guide rail.
The first fine adjustment device and the second fine adjustment device have the same structure, the first fine adjustment device comprises a first fixed frame, a first fixed block, a first straight beam type flexible hinge, a second straight beam type flexible hinge, a third straight beam type flexible hinge, a fourth straight beam type flexible hinge, a fifth straight beam type flexible hinge, a sixth straight beam type flexible hinge, a seventh straight beam type flexible hinge, a eighth straight beam type flexible hinge and a first piezoelectric ceramic, wherein the first fixed frame is fixed on a first sliding table of a first liftable platform through screws, the first straight beam type flexible hinge is fixedly connected between the first fixed frame and the first fixed block, the second straight beam type flexible hinge is fixedly connected between the first fixed frame and the first fixed block, the third straight beam type flexible hinge is fixedly connected between the first fixed frame and the first fixed block, the fifth straight beam type flexible hinge is fixedly connected between the first fixed frame and the first fixed block, the first fixed frame and the first fixed block are fixedly connected through the first straight beam type flexible hinge six, the second fixed frame and the first fixed block are fixedly connected through the second straight beam type flexible hinge seven, the first straight beam type flexible hinge eight is fixedly connected between the first fixed frame and the first fixed block, and the first piezoelectric ceramic is fixed in a groove in the first fixed frame.
The fixing frame comprises a first fixing plate, a second fixing plate, a third stepping motor and a third coupler, wherein the left side of the first fixing plate is fixed on the first fixing block on the first micro-adjusting device through screws, the second fixing plate is connected with the first fixing plate through screws, the third stepping motor is fixed on the first fixing plate through screws, and one end of the third coupler is connected with the third stepping motor.
The impressing device comprises a rotating shaft, a third fixed plate, a first cylindrical buckle, a second cylindrical buckle, a fourth fixed plate, a fifth fixed plate, a sixth fixed plate, a seventh fixed plate, a fourth stepping motor, a fourth coupler, a CCD camera, an impressing roller, a gluing device, a glue removing device, a first gear, a second gear, a smooth roller and a curing lamp, wherein the rotating shaft is fixed at the center of the third fixed plate, the first cylindrical buckle is fixedly connected with a groove on the right side of the third fixed plate, the second cylindrical buckle is fixedly connected with a groove on the right side of the third fixed plate, the fourth fixed plate is fixedly connected with the third fixed plate vertically, the fifth fixed plate is fixedly connected with the third fixed plate vertically, the seventh fixed plate is fixedly connected with the third fixed plate vertically, the fourth stepping motor is fixed on the fifth fixed plate through a screw, one end of the fourth coupler is connected, the left end of the embossing roller penetrates through a through hole in the fifth fixing plate to be connected with the first gear, the right end of the embossing roller penetrates through a through hole in the fourth fixing plate to be connected with the fourth coupler, the left end of the gluing device is fixed with the fifth fixing plate, the right end of the gluing device is fixed with the sixth fixing plate, the left end of the gluing device is fixed on the fifth fixing plate, the right end of the gluing device is fixed on the sixth fixing plate, the first gear is meshed with the second gear, the second gear is connected with the smooth roller, the smooth roller is placed in the through holes in the fifth.
The support platform comprises a heat treatment device, a planar substrate, a first cutting knife and a second cutting knife, wherein the heat treatment device is fixed right below a groove of the support platform, the planar substrate is placed in the groove of the support platform, the first cutting knife is placed in the groove on the left side of the planar substrate, and the second cutting knife is placed in the groove in front of the planar substrate.
The XY displacement platform comprises a stepping motor V, a coupling VI, a ball screw III, a ball screw IV, a sliding table III, a sliding table IV, a guide rail III, a guide rail IV, a screw support seat III and a screw support seat IV, wherein the stepping motor V is fixed on the screw support seat III through screws, the stepping motor V is connected with the coupling V, the ball screw III is connected with the coupling V after passing through a through hole of the screw support seat III, the sliding table III is connected with the ball screw III through threads, the guide rail III is fixed on the sliding table IV through screws, the stepping motor VI is fixed on the screw support seat IV through screws, the stepping motor VI is connected with the coupling VI, the ball screw IV is connected with the coupling VI after passing through a through hole of the screw support seat IV, the sliding table IV is connected with the ball screw IV through threads, and the sliding table IV is connected with the, the guide rail cross is fixed on the bottom plate of the frame through screws.
The rack comprises a bottom plate, a left side plate, a right side plate, a first rib plate, a second rib plate and a back beam, wherein the bottom plate is horizontally placed on the ground, one side of the left side plate is fixedly connected with the bottom plate, the other side of the left side plate is fixedly connected with the back beam, one side of the right side plate is fixedly connected with the bottom plate, the other side of the right side plate is fixedly connected with the back beam, the first rib plate is fixedly connected on the left side plate, and the second rib.
The invention has the following advantages:
1. the stacking precision is high: after the smooth roller is aligned with the planar substrate on the supporting table through X, Y displacement of the displacement platform, the stacking angle is adjusted through adjusting the fine adjustment device, so that the microstructure on the smooth roller is in better linear contact with the planar substrate, and the stacking precision is improved;
2. facilitating multilayer stacking: the height position of the smooth roller is changed by enabling the two liftable platforms to ascend or descend, so that the single-layer microstructure imprinted on the smooth roller can be stacked in different layers on the planar substrate, the preparation of the multi-stage microstructure is not limited by a device, and the preparation is more flexible.
Drawings
Fig. 1 is a schematic structural diagram of the present invention;
fig. 2 is a top view of the first liftable platform of the present invention;
FIG. 3 is a schematic structural diagram of a first micro-adjustment device of the present invention;
fig. 4 is a schematic structural view of the fixing frame of the present invention;
fig. 5 is a schematic structural view of the imprinting apparatus of the present invention;
fig. 6 is a partial sectional view of the imprinting apparatus of the present invention;
fig. 7 is a schematic structural view of the support frame of the present invention;
figure 8 is a partial cross-sectional view of the XY translation stage of the present invention;
fig. 9 is a schematic structural diagram of the rack of the present invention.
Detailed Description
As shown in fig. 1, the device comprises a first lifting platform 1, a second lifting platform 2, a first fine adjustment device 3, a second fine adjustment device 4, a fixed frame 5, an imprinting device 6, a supporting table 7, an X, Y displacement platform 8 and a frame 9, wherein the first lifting platform 1 is fixed on a left side plate 902 of the frame 9 through screws, the second lifting platform 2 is fixed on a right side plate 903 of the frame 9 through screws, the first fine adjustment device 3 is fixed on the first lifting platform 1 through screws, the second fine adjustment device 4 is fixed on the second lifting platform 2 through screws, the left side of the fixed frame 5 is connected with the first lifting platform 1 through screws, the right side of the fixed frame 5 is connected with the second lifting platform 2 through screws, the imprinting device 6 is in sliding contact with the fixed frame 5 through cylindrical buckles, the supporting table 7 is fixed on a X, Y displacement platform 8 through screws, the X, Y displacement platform 8 is fixed on a bottom plate 901 of, the frame 9 is horizontally placed on the ground.
As shown in fig. 2, the first liftable platform 1 and the second liftable platform 2 have the same structure, the first liftable platform 1 comprises a first stepping motor 101, a first coupler 102, a first ball screw 103, a first sliding table 104, a first guide rail 105 and a first screw support seat 106, wherein the first stepping motor 101 is fixed on the first screw support seat 106 through a screw, the first stepping motor 101 is connected with the first coupler 102, the first ball screw 103 passes through a through hole of the first screw support seat 106 and then is connected with the first coupler 102, the first sliding table 104 is in threaded connection with the first ball screw 103, and the first sliding table 104 is in sliding connection with the first guide rail 105.
As shown in fig. 3, the first fine adjustment device 3 and the second fine adjustment device 4 have the same structure, the first fine adjustment device 3 includes a first fixed frame 301, a first fixed block 302, a first straight beam type flexible hinge 303, a second straight beam type flexible hinge 304, a third straight beam type flexible hinge 305, a fourth straight beam type flexible hinge 306, a fifth straight beam type flexible hinge 307, a sixth straight beam type flexible hinge 308, a seventh straight beam type flexible hinge 309, an eighth straight beam type flexible hinge 310 and a first piezoelectric ceramic 311, wherein the first fixed frame 301 is fixed on the first sliding table 104 of the first liftable platform 1 by screws, the first straight beam type flexible hinge 303 is fixedly connected between the first fixed frame 301 and the first fixed block 302, the second straight beam type flexible hinge 304 is fixedly connected between the first fixed frame 301 and the first fixed block 302, the third straight beam type flexible hinge 305 is fixedly connected between the first fixed frame 301 and the first fixed block 302, the fourth straight beam type flexible hinge 306 is fixedly connected between the first fixed frame 301 and the first fixed block 302, the five straight beam type flexible hinges 307 are fixedly connected between the first fixing frame 301 and the first fixing block 302, the six straight beam type flexible hinges 308 are fixedly connected between the first fixing frame 301 and the first fixing block 302, the seven straight beam type flexible hinges 309 are fixedly connected between the first fixing frame 301 and the first fixing block 302, the eight straight beam type flexible hinges 310 are fixedly connected between the first fixing frame 301 and the first fixing block 302, and the first piezoelectric ceramic 311 is fixed in a groove in the first fixing frame 301.
As shown in fig. 4, the fixing frame 5 includes a first fixing plate 501, a second fixing plate 502, a third stepping motor 503 and a third coupling 504, wherein the left side of the first fixing plate 501 is fixed on the first fixing block 302 on the first micro-adjustment device 3 through a screw, the second fixing plate 502 is connected with the first fixing plate 501 through a screw, the third stepping motor 503 is fixed on the first fixing plate 501 through a screw, and one end of the third coupling 504 is connected with the third stepping motor 503.
As shown in fig. 5 and 6, the pressing device 6 includes a rotating shaft 601, a third fixing plate 602, a first cylindrical fastener 60201, a second cylindrical fastener 60202, a fourth fixing plate 603, a fifth fixing plate 604, a sixth fixing plate 605, a seventh fixing plate 606, a fourth stepping motor 607, a fourth coupling 608, a CCD camera 609, a pressing roller 610, a gluing device 611, a glue removing device 612, a first gear 613, a second gear 614, a smooth roller 615, and a curing lamp 61501, wherein the rotating shaft 601 is fixed in the center of the third fixing plate 602, the rotating shaft 601 is used for connecting with the third coupling 504 of the fixing frame 5, the first cylindrical fastener 60201 is fixedly connected to the right groove of the third fixing plate 602, the second cylindrical fastener 60202 is fixedly connected to the right groove of the third fixing plate 602, the fourth fixing plate 603 is vertically fixedly connected to the third fixing plate 602, the fifth fixing plate 604 is vertically fixedly connected to the third fixing plate 602, the sixth fixing plate 605 is, a fourth stepping motor 607 is fixed on a fifth fixing plate 604 through screws, one end of a fourth coupling 608 is connected with the fourth stepping motor 607, the other end of the fourth coupling 608 is connected with a pressing roller 610, a CCD camera 609 is fixed in a groove on a third fixing plate 602, the left end of the pressing roller 610 penetrates through a through hole on the fifth fixing plate 604 to be connected with a first gear 613, the right end of the pressing roller 610 penetrates through a through hole on the fourth fixing plate 603 to be connected with the fourth coupling 608, the left end of a gluing device 611 is fixed with the fifth fixing plate 604, the right end of the gluing device 611 is fixed with a sixth fixing plate 605, the left end of the gluing device 612 is fixed on the fifth fixing plate 604, the right end of the gluing device is fixed on the sixth fixing plate 605, the first gear 613 is meshed with a second gear 614, the second gear 614 is.
As shown in fig. 7, the supporting stage 7 includes a heat treatment device 701, a planar substrate 702, a first cutting blade 703 and a second cutting blade 704, wherein the heat treatment device 701 is fixed right below a recess of the supporting stage, the planar substrate 702 is placed in the recess of the supporting stage, the first cutting blade 703 is placed in a recess on the left side of the planar substrate 702, and the second cutting blade 704 is placed in a recess in front of the planar substrate 702.
As shown in fig. 8, the X, Y displacement platform 8 includes a fifth stepping motor 801, a sixth stepping motor 802, a fifth coupling 803, a sixth coupling 804, a third ball screw 805, a fourth ball screw 806, a third sliding table 807, a fourth sliding table 808, a third guide rail 809, a fourth guide rail 810, a third screw support 811 and a fourth screw support 812, wherein the fifth stepping motor 801 is fixed on the third screw support 811 by screws, the fifth stepping motor 801 is connected with the fifth coupling 803, the third ball screw 805 passes through a through hole of the third screw support 811 and then is connected with the fifth coupling 803, the third sliding table 807 is connected with the third ball screw 805 by threads, the third sliding table 807 is connected with the third guide rail 809 by screws, the third guide rail 809 is fixed on the fourth sliding table 808 by screws, the sixth stepping motor 802 is fixed on the fourth screw support 812 by screws, the sixth stepping motor 802 is connected with the sixth coupling 804, the fourth ball screw 806 passes through a through hole of the fourth screw support 812 and then is, the sliding table IV 808 is in threaded connection with the ball screw IV 806, the sliding table IV 808 is in sliding connection with the guide rail IV 810, and the guide rail IV 810 is fixed on the bottom plate 901 of the rack 9 through screws.
As shown in fig. 9, the rack includes a bottom plate 901, a left side plate 902, a right side plate 903, a first rib plate 904, a second rib plate 905, and a back beam 906, wherein the bottom plate 901 is horizontally placed on the ground, one side of the left side plate 902 is fixedly connected to the bottom plate 901, the other side of the left side plate 902 is fixedly connected to the back beam 906, one side of the right side plate 903 is fixedly connected to the bottom plate 901, the other side of the right side plate 903 is fixedly connected to the back beam 906, the first rib plate 904 is fixedly connected to the left side plate 902, and the.
The working principle is as follows:
stacking single-layer microstructures: controlling X, Y displacement platform 8 to make the axis of the smooth roller 615 on the impression device 6 parallel to the back side of the plane substrate 702 on the support platform 7 in the same vertical plane, and the lengths of the two lines are equal, then starting the glue coating device 611, then starting the stepping motor 607 to drive the impression roller 610 to rotate, engaging the gear 613 at the left end of the impression roller 610 with the gear 614 to drive the smooth roller 615 to rotate, starting to uniformly coat the benzyl palladium mercaptide on the smooth roller 615, simultaneously impressing the microstructure on the impression roller 610 onto the benzyl palladium mercaptide on the smooth roller 615, turning on the curing lamp 61501 to cure the benzyl palladium mercaptide, lowering the lifting platform 1 and the platform 2 simultaneously to make the microstructure on the smooth roller 615 contact with the plane substrate 702 on the support platform 7, at this time, the smooth roller 615 just rotates 180 degrees from the position where the smooth roller 615 contacts with the impression roller 610, starting the micro-adjusting device 3 and the micro-adjusting device 4, the microstructure on the smooth roller 615 is contacted with the planar substrate 702 on the support table 7 more closely, the X, Y displacement platform 8 is controlled to feed backwards, the microstructure on the smooth roller 615 is stacked on the planar substrate 702 on the support table 7, when the microstructure is fed to the opposite side of the rear side of the planar substrate 702, the single-layer microstructure is obtained, the X, Y displacement platform 8 is continuously fed to enable the first cutting knife 703 to be contacted with the smooth roller 615 so as to cut off the palladium benzyl mercaptan, then the first micro-adjustment device 3 and the second micro-adjustment device 4 are closed, the gluing device 611 is closed, the fourth stepping motor 607 is closed, the curing lamp 61501 is closed, the heat treatment device 701 on the support table 7 is started to carry out high-temperature heat treatment on the planar substrate 702 on the support table 7, the palladium benzyl mercaptan is converted into the metal palladium, the first lifting platform 1 and the second lifting platform 2 are controlled to lift up, so that, and starting the glue removing device 612 to remove the residual benzyl mercaptan palladium on the smooth roll 615, and closing the glue removing device 612 after the removal is finished.
Stacking the double-layer microstructures: controlling X, Y displacement of the displacement platform 8 to enable the axis of the smooth roller 615 on the imprinting device 6 to be parallel to the connecting line of the midpoints of the left side and the right side of the planar substrate 702 on the supporting platform 7 in the same vertical plane, controlling the three stepping motors 503 to enable the imprinting device 6 to rotate 90 degrees clockwise, controlling X, Y displacement of the displacement platform 8 to enable the axis of the smooth roller 615 on the imprinting device 6 to be parallel to the right side of the planar substrate 702 on the supporting platform 7 in the same vertical plane, enabling the lengths of the two lines to be equal, then starting the glue coating device 611, then starting the four stepping motors 607 to drive the imprinting roller 610 to rotate, enabling the first gear 613 and the second gear 614 at the left end of the imprinting roller 610 to be meshed to drive the smooth roller 615 to rotate, starting to uniformly coat benzyl mercaptan palladium on the smooth roller 615, and simultaneously enabling microstructures on the imprinting roller 610 to be imprinted on the benzyl mercaptan palladium on the smooth roller 615, turning on a curing lamp 61501 to cure the palladium benzyl mercaptide, simultaneously descending a first liftable platform 1 and a second liftable platform 2, starting to rotate a smooth roller 615 by 180 degrees from a position tangent to the smooth roller 615 and an embossing roller 610, then contacting the microstructure on the smooth roller 615 with the single-layer microstructure on the planar substrate 702 on the supporting table 7, starting a first fine adjusting device 3 and a second fine adjusting device 4 to enable the microstructure on the smooth roller 615 to be more closely contacted with the single-layer microstructure on the planar substrate 702 on the supporting table 7, controlling X, Y to displace a platform 8 to feed to the right, stacking the microstructure on the smooth roller 615 onto the microstructure on the planar substrate 702 on the supporting table 7, finishing stacking when the microstructure is fed to the opposite side of the left side of the planar substrate 702 to obtain a double-layer microstructure 704, continuously feeding a platform 8 with X, Y to enable a second cutting knife to be contacted with the smooth roller 615 to cut off the palladium benzyl mercaptide, and then closing the first micro-adjusting device 3 and the second micro-adjusting device 4, closing the gluing device 611, closing the fourth stepping motor 607, closing the curing lamp 61501, starting the heat treatment device 701 on the support table 7 to perform high-temperature heat treatment on the planar substrate 702 on the support table 7, converting palladium benzyl mercaptan into metal palladium, controlling the first lifting platform 1 and the second lifting platform 2 to ascend, enabling the smooth roller 615 on the imprinting device 6 to ascend, starting the glue removing device 612 to remove residual palladium benzyl mercaptan on the smooth roller 615, and closing the glue removing device 612 after the removal is finished.
Stacking three layers of microstructures: controlling X, Y displacement of a displacement platform 8 to enable the axis of a smooth roller 615 on the imprinting device 6 to be parallel to a connecting line of the middle points of the front side and the back side of a planar substrate 702 on a supporting platform 7 in the same vertical plane, controlling a three-step motor 503 to rotate the imprinting device 7 clockwise by 90 degrees, controlling X, Y displacement of the displacement platform 8 to enable the axis of the smooth roller 615 on the imprinting device 6 to be parallel to the back side of the planar substrate 702 on the supporting platform 7 in the same vertical plane, enabling the lengths of the two lines to be equal, then starting a gluing device 611, then starting a four-step motor 607 to drive an imprinting roller 610 to rotate, enabling a first gear 613 and a second gear 614 at the left end of the imprinting roller 610 to be meshed to drive the smooth roller 615 to rotate, starting to evenly coat the benzylmercaptane palladium on the smooth roller 615, and simultaneously enabling microstructures on the imprinting roller 610 to be imprinted on the benzylmercaptane on the smooth roller 615, turning on a curing lamp 61501 to cure the palladium benzyl mercaptide, simultaneously descending a first liftable platform 1 and a second liftable platform 2, starting to rotate a smooth roller 615 by 180 degrees from a position tangent to the smooth roller 615 and an embossing roller 610, then contacting the microstructure on the smooth roller 615 with a double-layer microstructure on a planar substrate 702 on a supporting table 7, starting a first fine adjusting device 3 and a second fine adjusting device 4 to enable the microstructure on the smooth roller 615 to be more closely contacted with the double-layer microstructure on the planar substrate 702 on the supporting table 7, controlling X, Y to move a platform 8 to feed backwards, stacking the microstructure on the smooth roller 615 onto the microstructure on the planar substrate 702 on the supporting table 7, finishing stacking when the microstructure is fed to the opposite side of the rear side of the planar substrate 702 to obtain a three-layer microstructure, continuously feeding a X, Y to enable a first cutting knife 703 to be contacted with the smooth roller 615 to cut off the palladium benzyl mercaptide, and then closing the first micro-adjusting device 3 and the second micro-adjusting device 4, closing the gluing device 611, closing the fourth stepping motor 607, closing the curing lamp 61501, starting the heat treatment device 701 on the support table 7 to perform high-temperature heat treatment on the planar substrate 702 on the support table 7, converting palladium benzyl mercaptan into metal palladium, controlling the first lifting platform 1 and the second lifting platform 2 to ascend, enabling the smooth roller 615 on the imprinting device 6 to ascend, starting the glue removing device 612 to remove residual palladium benzyl mercaptan on the smooth roller 615, and closing the glue removing device 612 after the removal is finished.
Preparing a multi-stage microstructure: the desired multi-level microstructure can be obtained by repeating the above process.
Claims (8)
1. An apparatus for making a multi-level microstructure, comprising: including liftable platform one, liftable platform two, fine setting device one, fine setting device two, the mount, the impression device, a supporting bench, XY displacement platform and frame, wherein liftable platform one passes through the fix with screw on the left side board of frame, liftable platform two passes through the fix with screw on the right side board of frame, fine setting device one passes through the fix with screw on liftable platform one, fine setting device two passes through the fix with screw on liftable platform two, the mount left side is passed through the screw and is connected with liftable platform one, the right side is passed through the screw and is connected with liftable platform two, the impression device passes through cylinder buckle and mount sliding contact, a supporting bench passes through the fix with screw on XY displacement platform, XY displacement platform passes through the fix with screw on the bottom plate of frame.
2. The apparatus of claim 1, wherein: the first lifting platform is the same as the second lifting platform in structure, and comprises a first stepping motor, a first coupler, a first ball screw, a first sliding table, a first guide rail and a first screw support seat, wherein the first stepping motor is fixed on the first screw support seat through a screw, the first stepping motor is connected with the first coupler, the first ball screw penetrates through a through hole of the first screw support seat and then is connected with the first coupler, the first sliding table is in threaded connection with the first ball screw, and the first sliding table is in sliding connection with the first guide rail.
3. The apparatus of claim 1, wherein: the first fine adjustment device and the second fine adjustment device have the same structure, the first fine adjustment device comprises a first fixed frame, a first fixed block, a first straight beam type flexible hinge, a second straight beam type flexible hinge, a third straight beam type flexible hinge, a fourth straight beam type flexible hinge, a fifth straight beam type flexible hinge, a sixth straight beam type flexible hinge, a seventh straight beam type flexible hinge, a eighth straight beam type flexible hinge and a first piezoelectric ceramic, wherein the first fixed frame is fixed on a first sliding table of a first liftable platform through screws, the first straight beam type flexible hinge is fixedly connected between the first fixed frame and the first fixed block, the second straight beam type flexible hinge is fixedly connected between the first fixed frame and the first fixed block, the third straight beam type flexible hinge is fixedly connected between the first fixed frame and the first fixed block, the fifth straight beam type flexible hinge is fixedly connected between the first fixed frame and the first fixed block, the first fixed frame and the first fixed block are fixedly connected through the first straight beam type flexible hinge six, the second fixed frame and the first fixed block are fixedly connected through the second straight beam type flexible hinge seven, the first straight beam type flexible hinge eight is fixedly connected between the first fixed frame and the first fixed block, and the first piezoelectric ceramic is fixed in a groove in the first fixed frame.
4. The apparatus of claim 1, wherein: the fixing frame comprises a first fixing plate, a second fixing plate, a third stepping motor and a third coupler, wherein the left side of the first fixing plate is fixed on the first fixing block on the first micro-adjusting device through screws, the second fixing plate is connected with the first fixing plate through screws, the third stepping motor is fixed on the first fixing plate through screws, and one end of the third coupler is connected with the third stepping motor.
5. The apparatus of claim 1, wherein: the impressing device comprises a rotating shaft, a third fixed plate, a first cylindrical buckle, a second cylindrical buckle, a fourth fixed plate, a fifth fixed plate, a sixth fixed plate, a seventh fixed plate, a fourth stepping motor, a fourth coupler, a CCD camera, an impressing roller, a gluing device, a glue removing device, a first gear, a second gear, a smooth roller and a curing lamp, wherein the rotating shaft is fixed at the center of the third fixed plate, the first cylindrical buckle is fixedly connected with a groove on the right side of the third fixed plate, the second cylindrical buckle is fixedly connected with a groove on the right side of the third fixed plate, the fourth fixed plate is fixedly connected with the third fixed plate vertically, the fifth fixed plate is fixedly connected with the third fixed plate vertically, the seventh fixed plate is fixedly connected with the third fixed plate vertically, the fourth stepping motor is fixed on the fifth fixed plate through a screw, one end of the fourth coupler is connected, the left end of the embossing roller penetrates through a through hole in the fifth fixing plate to be connected with the first gear, the right end of the embossing roller penetrates through a through hole in the fourth fixing plate to be connected with the fourth coupler, the left end of the gluing device is fixed with the fifth fixing plate, the right end of the gluing device is fixed with the sixth fixing plate, the left end of the gluing device is fixed on the fifth fixing plate, the right end of the gluing device is fixed on the sixth fixing plate, the first gear is meshed with the second gear, the second gear is connected with the smooth roller, the smooth roller is placed in the through holes in the fifth.
6. The apparatus of claim 1, wherein: the support platform comprises a heat treatment device, a planar substrate, a first cutting knife and a second cutting knife, wherein the heat treatment device is fixed right below a groove of the support platform, the planar substrate is placed in the groove of the support platform, the first cutting knife is placed in the groove on the left side of the planar substrate, and the second cutting knife is placed in the groove in front of the planar substrate.
7. The apparatus of claim 1, wherein: the XY displacement platform comprises a stepping motor V, a coupling VI, a ball screw III, a ball screw IV, a sliding table III, a sliding table IV, a guide rail III, a guide rail IV, a screw support seat III and a screw support seat IV, wherein the stepping motor V is fixed on the screw support seat III through screws, the stepping motor V is connected with the coupling V, the ball screw III is connected with the coupling V after passing through a through hole of the screw support seat III, the sliding table III is connected with the ball screw III through threads, the guide rail III is fixed on the sliding table IV through screws, the stepping motor VI is fixed on the screw support seat IV through screws, the stepping motor VI is connected with the coupling VI, the ball screw IV is connected with the coupling VI after passing through a through hole of the screw support seat IV, the sliding table IV is connected with the ball screw IV through threads, and the sliding table IV is connected with the, the guide rail cross is fixed on the bottom plate of the frame through screws.
8. The apparatus of claim 1, wherein: the rack comprises a bottom plate, a left side plate, a right side plate, a first rib plate, a second rib plate and a back beam, wherein the bottom plate is horizontally placed on the ground, one side of the left side plate is fixedly connected with the bottom plate, the other side of the left side plate is fixedly connected with the back beam, one side of the right side plate is fixedly connected with the bottom plate, the other side of the right side plate is fixedly connected with the back beam, the first rib plate is fixedly connected on the left side plate, and the second rib.
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| CN202110249538.6A CN113009783A (en) | 2021-03-06 | 2021-03-06 | Device capable of preparing multi-stage microstructure |
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| CN202110249538.6A CN113009783A (en) | 2021-03-06 | 2021-03-06 | Device capable of preparing multi-stage microstructure |
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