CN112921279A

CN112921279A - Closed baffle structure

Info

Publication number: CN112921279A
Application number: CN202110373738.2A
Authority: CN
Inventors: 战永刚; 金小桃; 战捷; 汤兆胜; 尹强
Original assignee: Shenzhen Sanbundle Coating Technology Co ltd
Current assignee: Shenzhen Sanbundle Coating Technology Co ltd
Priority date: 2021-04-07
Filing date: 2021-04-07
Publication date: 2021-06-08

Abstract

The invention discloses a closed baffle structure, which comprises a baffle, an observation tube, a support frame and a driving mechanism, wherein the baffle is a cylindrical structure with an opening at the bottom end and a closed top end, an opening is formed in the side wall of the baffle and is connected with one end of the observation tube, the observation tube is fixed on the support frame, and the power output end of the driving mechanism is connected to the support frame to drive the support frame to lift and rotate. After the baffle plate structure is applied to an electron gun film coating device, the evaporation source can be completely sealed when the film material is pre-melted, the conditions of serious dirt around a crucible and substrate pollution are avoided, and the baffle plate structure is also provided with an observation cylinder which can observe the melt state of the film material in real time when the baffle plate is buckled. When the invention is used for the coating equipment of the double electron guns, the mutual pollution of the coating materials of the two crucibles can be prevented.

Description

Closed baffle structure

Technical Field

The invention relates to the technical field of vacuum coating processes and equipment manufacturing, in particular to a closed baffle structure.

Background

The electron gun coating process generally has a pre-melting procedure of coating materials before coating. In the process of melting, although a baffle plate shields an evaporation source, the baffle plate matched with the existing electron gun coating machine only shields the upper part of a crucible, and some film material gas particles still move out around, or the film material particles collide and reflect with the baffle plate or a lining plate to pollute peripheral parts, and the substrate to be coated on a workpiece rack can be polluted by collision or reflection.

Therefore, it is necessary to design a baffle to completely enclose the focal spot position of the electron beam to solve the above problem.

Disclosure of Invention

The invention provides a closed baffle structure. The baffle structure can completely seal the peripheral space of the electron beam focal spot position when the film material is pre-melted, so that the serious pollution at the periphery of a crucible and the pollution of a substrate are avoided, and the observation cylinder is arranged on the baffle, so that the condition of the film material at the focal spot of an electron gun can be observed in real time.

The invention provides a closed baffle structure, which comprises a baffle, an observation tube, a support frame and a driving mechanism, wherein the baffle is a cylindrical structure with an opening at the bottom end and a closed top end, an opening is formed in the side wall of the baffle, the opening is connected with one end of the observation tube, the observation tube is fixed on the support frame, and the power output end of the driving mechanism is connected to the support frame to drive the support frame to lift and rotate.

Further, the size of the opening is the same as the size and the shape of the inner cross section of the observation cylinder, and the observation cylinder is connected with the baffle plate in a welding mode at the opening.

Furthermore, the support frame is triangular, the observation cylinder is fixed on the triangular oblique edge of the support frame, and the other end of the observation cylinder points to the observation window of the film plating machine.

Further, the drive mechanism includes: the vacuum chamber comprises a telescopic driver, a connecting plate and a rotary driver, wherein the telescopic driver is fixed on a bottom plate of the vacuum chamber, the power output end of the telescopic driver is connected to the connecting plate, and the rotary driver is fixed on the connecting plate.

Further, the power output end of the rotary driver penetrates through the connecting plate and the bottom plate of the vacuum chamber to be connected with the supporting frame.

Furthermore, the telescopic driver is a telescopic motor or a telescopic cylinder, and the rotary driver is a rotary motor or a rotary cylinder. The telescopic driver and the rotary driver are in communication connection with a film plating machine control system.

Furthermore, a dynamic sealing element is arranged between the power output end of the rotary driver and the bottom plate of the vacuum chamber, and the dynamic sealing element is an oil seal or a magnetic fluid sealing element.

The vacuum chamber is characterized by further comprising a lining plate and a surrounding cylinder, wherein the lining plate is fixed on a bottom plate of the vacuum chamber and is provided with an excavated hole, and the excavated hole is positioned above an area from an anode hole of the electron gun to the position of an electron beam focal spot; the surrounding cylinder is fixed on the circumference of the digging hole and covers the digging hole.

The technical scheme of the invention is as follows: when the melting material is needed, the baffle is lowered and buckled on the surrounding barrel through a driving mechanism, and the baffle, the surrounding barrel and the lining plate together completely seal the position of an electron beam focal spot. When coating is needed, the baffle can be opened, namely, the baffle is lifted by a driving mechanism and rotated by a certain angle to leave the upper part of the crucible.

By adopting the scheme, the closed baffle structure has the following beneficial effects:

the closed baffle structure replaces the existing baffle structure, can totally-enclosed shield the electron beam focal spot position, and avoids the film material particles from moving out from the gaps around the crucible to pollute peripheral parts and a substrate to be plated during melting.

Drawings

Fig. 1 is a schematic view of a closed baffle structure of the present invention.

Fig. 2 is a top view of the enclosed baffle structure of the present invention (with the backing plate in perspective).

Fig. 3 is a side schematic view of the initial position of the enclosed baffle structure of the present invention.

Fig. 4 is a side schematic view of an intermediate position of the enclosed baffle structure of the present invention.

FIG. 5 is a schematic side view of the blocking position of the closed baffle structure of the present invention.

The reference numbers in the drawings are as follows:

10-baffle 20-observation cylinder 21-coating machine observation window 30-support frame

40-drive mechanism 41-telescopic driver 42-connecting plate

43-rotary drive 60-electron beam focal spot position 80-vacuum chamber

90-dynamic sealing element 100-lining plate 101-digging hole 102-surrounding cylinder

200-crucible 300-electron gun 301-electron gun anode hole

Detailed Description

The present embodiment will be described in detail below with reference to the accompanying drawings and specific embodiments.

Referring to fig. 1-2, the present invention provides a closed baffle structure, which includes a baffle 10, an observation tube 20, a support frame 30 and a driving mechanism 40, in this embodiment, the baffle 10 is a cylindrical structure with an open bottom end and a closed top end, when the baffle falls down, the opening covers the enclosure 102, the top surface of the baffle is in tight contact with the upper end of the enclosure, the baffle 10, the enclosure 102 and the lining plate 100 completely close the electron beam focal spot, no gap exists around the baffle, and the film material particles cannot move out from the periphery.

The side wall of the baffle 10 is provided with an opening 11, the opening 11 is welded with one end of the observation tube 20, the observation tube 20 is fixed on the triangular oblique edge of the support frame 30, so that the observation tube 20 forms an angle with the horizontal line, and the observation tube 20 is just pointed to the observation window 21 of the film coating machine, so that an operator can observe the condition of a film material on an electron beam focal spot position 60 through the observation tube 20 from the observation window 21 of the film coating machine, and can adjust the deflection magnetic field parameters and the crucible position at any time.

The power output end of the driving mechanism 40 is connected to the supporting frame 30 to drive the supporting frame 30 to lift and rotate. The drive mechanism 40 includes: a telescopic driver 41, a connecting plate 42 and a rotary driver 43. In this embodiment, the telescopic actuator 41 is a telescopic cylinder, and the rotary actuator 43 is a rotary cylinder. The telescopic driver 41 is fixed on the lower surface of the vacuum chamber bottom plate, and the power output end of the telescopic driver is connected to the connecting plate 42 to drive the connecting plate 42 to move up and down. The rotary driver 43 is fixed on the connecting plate 42, the connecting plate 42 and the vacuum chamber bottom plate are respectively provided with an opening, and the power output end 44 of the rotary driver 43, which is used as the power output end of the whole driving mechanism 40, penetrates through the opening of the connecting plate 42 and the opening of the vacuum chamber bottom plate and is connected with the support frame 30 in the vacuum chamber. At the opening of the vacuum chamber bottom plate, the power output end 44 is sealed with a dynamic seal 90, and the dynamic seal 90 is a pair of oil seals in this embodiment.

Preferably, the closed baffle structure of the present embodiment further includes: liner 100, enclosure 102. The lining plate 100 is fixed on a bottom plate of the vacuum chamber and is provided with a dug hole 101, and the dug hole 101 is positioned above an area from an anode hole of the electron gun to the position of an electron beam focal spot. The surrounding tube 102 is fixed on the digging hole 101 for a circle and covers the digging hole 101. The lining board 100 of the present embodiment is made of stainless steel, and may be made of other heat-resistant materials. The cutout 101 is circular as shown in fig. 2. The enclosure 102 is a stainless steel cylinder, which may be made of other heat-resistant materials, and has a port diameter larger than the diameter of the excavation 101 and smaller than the diameter of the bottom end of the baffle 10, and the bottom end of the enclosure 102 is welded to the lining plate 100. The cutout 101 is located above the area of the electron gun anode hole 301 to the position of the electron beam focal spot 60.

The steps of the coating operation by using the closed baffle of the invention are as follows:

step 1, melting:

when the crucible is filled with the coating material, the baffle 10 is in the initial position of opening, as shown in fig. 3, and after the filling is finished, the coating machine control device sends a command to control the rotary driver 43 to operate, so as to drive the supporting frame 30 to rotate rightwards by 90 degrees, and thus the baffle 10 is rotated to the middle position above the enclosure 102, as shown in fig. 4. The control device sends out an instruction again to control the telescopic driver 41 to operate, so as to drive the support frame 30 to move downwards, so that the baffle 10 descends until the top surface of the baffle contacts the upper port of the enclosure 102, at this time, as shown in fig. 5, the baffle 10 reaches a shielding position, so as to completely shield the electron beam focal spot position 60 exposed out of the lining plate hole 101, and when the vacuum degree of the vacuum chamber meets the requirement, the electron gun 300 is started to start the melt operation.

Step 2, coating film

After the melt is finished, the control device of the film plating machine controls the telescopic driver 41 to make the baffle plate 10 ascend and reach the middle position of fig. 4 again, the control device controls the rotary driver 43 to make the baffle plate 10 rotate to the initial position of fig. 3 again, the electron gun is started, and the film plating operation is carried out on the workpiece.

It is worth mentioning that when the coater has 2 electron guns, the melting material of one electron gun can prevent the coating material in the crucible of the other electron gun from being polluted.

In the description of the present invention, it is to be understood that the terms "upper", "lower", and the like, indicate orientations and positional relationships shown in the drawings of the present invention, are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be taken as limiting the present invention.

In summary, the present invention provides a closed electron gun baffle structure, which can completely close an evaporation source when a film material is pre-melted, thereby avoiding the occurrence of serious contamination around a crucible and substrate contamination, and the baffle structure is further provided with an observation tube for observing the pre-melting condition of the film material in real time. When the baffle plate structure is used on a film coating device with double electron guns, the mutual pollution of the film materials of the two crucibles can be prevented. The baffle auxiliary device is simple and convenient in design and easy to realize, solves the problem of serious pollution when the baffle auxiliary device in the prior art is used for pre-melting the membrane material, has a large application market, and is worth popularizing and using vigorously.

The present invention is not limited to the above preferred embodiments, and any modifications, equivalent substitutions and improvements made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. The utility model provides a closed baffle structure, its characterized in that includes baffle, an observation section of thick bamboo, support frame and actuating mechanism, the baffle is a bottom opening top inclosed tubular structure, be equipped with an trompil on the lateral wall of baffle, the trompil is connected an observation section of thick bamboo one end, it is fixed in to observe a section of thick bamboo on the support frame, actuating mechanism's power take off end is connected to on the support frame, the drive the support frame goes up and down and rotates.

2. The enclosed baffle structure of claim 1, wherein the opening is the same size and shape as the inner cross-sectional size of the observation cylinder, and the observation cylinder is welded to the baffle at the opening.

3. The enclosed baffle structure of claim 1 wherein the support frame is triangular, the observation cylinder is fixed to the triangular bevel of the support frame, and the other end of the observation cylinder is directed toward the observation window of the coater.

4. The enclosed baffle structure of claim 1, wherein the drive mechanism comprises: the vacuum chamber comprises a telescopic driver, a connecting plate and a rotary driver, wherein the telescopic driver is fixed on a bottom plate of the vacuum chamber, the power output end of the telescopic driver is connected to the connecting plate, and the rotary driver is fixed on the connecting plate.

5. The enclosed baffle structure of claim 4 wherein a power take-off of the rotary drive is connected to the support bracket through the connecting plate and a bottom plate of the vacuum chamber.

6. The enclosed baffle structure of claim 4 wherein the telescopic actuator is a telescopic motor or a telescopic cylinder and the rotary actuator is a rotary motor or a rotary cylinder. The telescopic driver and the rotary driver are in communication connection with a film plating machine control system.

7. The enclosed baffle structure of claim 4, wherein a dynamic seal is provided between the power take-off of the rotary drive and the bottom plate of the vacuum chamber, the dynamic seal being an oil seal or a magnetic fluid seal.

8. The enclosed baffle structure of claim 1, further comprising a backing plate and a shroud, the backing plate being secured to the floor of the vacuum chamber and having a cutout located above the area from the anode hole of the electron gun to the focal spot location of the electron beam; the surrounding cylinder is fixed on the circumference of the digging hole and covers the digging hole.