CN112915654A - Semiconductor processing procedure exhaust gas treatment ware - Google Patents
Semiconductor processing procedure exhaust gas treatment ware Download PDFInfo
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- CN112915654A CN112915654A CN202110091425.8A CN202110091425A CN112915654A CN 112915654 A CN112915654 A CN 112915654A CN 202110091425 A CN202110091425 A CN 202110091425A CN 112915654 A CN112915654 A CN 112915654A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/56—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
- B01D46/0036—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions by adsorption or absorption
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
- B01D46/103—Curved filtering elements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
- B01D46/12—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces in multiple arrangements
- B01D46/121—V-type arrangements
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/56—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition
- B01D46/62—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition connected in series
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Treating Waste Gases (AREA)
Abstract
The invention discloses a waste gas processor for semiconductor process, which comprises a control valve, a base, an outlet, a conduit, a processing device, an inlet, an observation window, a machine body and a purification cavity, wherein when the waste gas processor is used, blades can be changed into a conical cylinder structure after being subjected to the impact air pressure of the waste gas, the waste gas can flow downwards under the action of the blades due to inertia, the gas is effectively and uniformly dispersed outwards to a flow dividing pipe through the matching of an inner gas guide port and an outer gas guide port, the guided gas is effectively prevented from flowing backwards upwards, a fine filter screen can generate certain shaking under the air pressure of the gas, the fine filter screen is supported through the mutual matching of an auxiliary plate and a support plate, so that the fine filter screen can stably fluctuate up and down, the particles clamped in pores of the fine filter screen can be effectively bounced up under the action of fluctuating up and down, the particles are prevented from being blocked on the fine filter screen, the treatment efficiency of the waste gas is improved.
Description
Technical Field
The invention relates to the field of semiconductors, in particular to a semiconductor process waste gas processor.
Background
With the progress of society, the process of industrialization also develops rapidly, and industrial production constantly develops and will discharge a large amount of industry residual gas in the atmosphere, and the semiconductor refers to the material that the electric conductivity is between conductor and insulator under the normal temperature, can produce acid-base gas and other organic waste gas in the preparation process, needs to carry out effective processing to the particulate matter in the waste gas, when handling waste gas, the place that needs the improvement:
when waste gas generated in semiconductor manufacturing is treated, a large amount of special gas can be generated in the manufacturing process of a semiconductor, in the process of treating the gas, a lot of solid particles with different particle size are carried in the process waste gas, and if the particle size of the particles is too large, the particles can be clamped on the pore size of the filter, so that the waste gas can not flow and filter on the filter normally, the circulation filterability of the waste gas is influenced, the waste gas can flow upwards along with the fluctuation of the gas in the treatment process, the treated gas flows back, the treated gas and the untreated waste gas are mixed together, and the treatment efficiency of the waste gas is reduced.
Disclosure of Invention
Aiming at the defects in the prior art, the invention is realized by the following technical scheme: the utility model provides a semiconductor processing procedure exhaust gas treatment ware, its structure includes control valve, base, export, pipe, processing apparatus, entry, observation window, organism, purification chamber, the control valve communicates with each other with the pipe, inside the one end that the control valve was kept away from to the pipe runs through and stretches into processing apparatus, processing apparatus installs inside the organism, organism one side is equipped with two observation windows of communicating with it, and the opposite side communicates with each other with the export, the organism communicates with each other with the entry towards processing apparatus's one end, the organism bottom communicates with each other with the purification chamber, the purification chamber communicates with each other with the export through the organism, purification chamber fixed connection is on the base.
As a further optimization of the invention, the treatment device comprises a separation filter assembly, a backflow prevention device, two flow guide arc plates, a cavity and an output port, wherein one end of the separation filter assembly is communicated with the output port, the other end of the separation filter assembly is provided with the backflow prevention device, one end of the backflow prevention device, which is far away from the separation filter assembly, is communicated with the flow guide arc plates, the two flow guide arc plates are buckled on two sides of the inner wall of the cavity, the bottom of the cavity is provided with the output port, and the cavity is arranged in the machine body.
As a further optimization of the invention, the backflow prevention device comprises wave elastic pieces, two collecting plates, a rotating disk, an air transmission port, three air guide superposed pieces and a flow dividing pipe, wherein the number of the wave elastic pieces is two, the air guide superposed pieces connected with the two wave elastic pieces are arranged between the two wave elastic pieces, the three air guide superposed pieces are parallelly buckled between the two wave elastic pieces, one end of each wave elastic piece is buckled with the collecting plate, the other end of each wave elastic piece is connected with the side wall of the flow dividing pipe, the two collecting plates are symmetrically connected to the two sides of the air transmission port, the rotating disk is arranged on the air transmission port, one end, far away from the wave elastic pieces, of the flow dividing pipe is provided with a filter isolating component, and the collecting plates are communicated with the flow guiding.
The invention further optimizes the content, the air guide stacking piece comprises a disc body, a dispersing guide piece, a connecting block and blades, the inner wall of the disc body is provided with the connecting block connected with the disc body, one end, far away from the disc body, of the connecting block is connected with the blades, the blades are provided with a plurality of blades, the blades are inserted and embedded on the connecting block in an annular mode at equal intervals, the dispersing guide piece is installed inside the connecting block, and the disc body is connected with the wave elastic piece.
As a further optimization of the invention, the dispersion guide piece comprises a partition block, an inner gas guide port, an outer gas guide port and a convex arc dividing plate, wherein one end of the partition block is attached to the outer wall of the outer gas guide port, the other end of the partition block is connected with a connecting block, the outer gas guide port is communicated with the inner gas guide port, and one end of the inner gas guide port, which is far away from the outer gas guide port, is connected with the convex arc dividing plate.
As a further optimization of the invention, the filter separation component comprises two movable fasteners, a fine filter element, a coarse filter screen, a shell and an activated carbon layer, wherein the two movable fasteners are clamped on two sides of the inner wall of the shell in parallel, one end of each movable fastener, which is far away from the shell, is connected with the fine filter element, one end of each fine filter element is provided with the coarse filter screen, the other end of each fine filter element is provided with the activated carbon layer, two ends of each coarse filter screen and the activated carbon layer are connected on two sides of the inner wall of the shell in parallel in a buckling mode, the bottom of the shell is communicated with an output port, and the coarse filter.
As a further optimization of the invention, the movable fastener comprises a pulling strip, a limiting block, an elastic part, triangular plates and a pulling block, wherein the pulling strip is arranged between the two triangular plates, the two triangular plates are connected through the pulling block, one end of the pulling block, far away from the triangular plates, is connected with the fine filter element, one end of the pulling strip, far away from the triangular plates, is connected to the middle position of the elastic part, two ends of the elastic part are fixedly connected with the limiting block, and the limiting block is clamped on the inner wall of the shell.
As a further optimization of the invention, the fine filtering element comprises an arc guard plate, an opening and closing top piece and a fine filtering net, wherein the opening and closing top piece is installed inside the arc guard plate, one end of the opening and closing top piece, which is far away from the arc guard plate, is in contact with the fine filtering net, two ends of the fine filtering net are respectively provided with a coarse filtering net and an active carbon layer, and the arc guard plate is connected with the pulling block.
As the further optimization of the invention, the opening and closing top piece comprises a limited expansion block, auxiliary plates, movable clamping strips and supporting plates, wherein the limited expansion block is arranged between the two auxiliary plates, the auxiliary plates are fixedly connected to the supporting plates, the two supporting plates are connected through the movable clamping strips, the auxiliary plates are connected with the arc protection plate, and the supporting plates are in contact with the fine filter screen.
Advantageous effects
The invention relates to a semiconductor process waste gas processor, which has the following beneficial effects:
1. the rotary disc, the gas transmission port, the gas guide stack and the flow dividing pipes are combined, the gas transmission port guides the waste gas downwards to the gas guide stack under the action of the rotary disc, the gas pressure of the waste gas received by the gas guide stack can change into spiral downwards rotation, the waste gas is effectively conveyed downwards to the flow dividing pipes, and the plurality of flow dividing pipes uniformly guide the waste gas outwards.
2. According to the invention, through the combined arrangement of the inner gas guide port, the outer gas guide port and the convex arc dividing plate, the waste gas flows downwards and vertically impacts on the convex arc dividing plate, the convex arc dividing plate is in a convex structure and is made of elastic materials, and the waste gas can be diffused outwards on the inner gas guide port and the outer gas guide port under the elastic action after being subjected to the pressure of the waste gas, so that the inner gas guide port and the outer gas guide port can be effectively and uniformly dispersed.
3. The exhaust gas flow control device is characterized in that the exhaust gas flow control device comprises a fine filter net, a limiting expansion block, a movable clamping strip and a support plate, wherein the limiting expansion block is arranged on the support plate, the movable clamping strip is arranged on the fine filter net, the support plate is arranged on the fine filter net, the limit expansion block is arranged on the fine filter net, the movable clamping strip is arranged on the support plate, the limit expansion block is matched with the movable clamping strip, and the support plate is arranged on the fine filter net.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
FIG. 1 is a schematic diagram of a semiconductor process exhaust gas treatment device according to the present invention;
FIG. 2 is a schematic view of the internal structure of the processing apparatus of the present invention.
FIG. 3 is a schematic cross-sectional view of the backflow preventer of the present invention.
FIG. 4 is a schematic top view of the gas directing stack of the present invention.
Fig. 5 is an enlarged structural diagram of a in fig. 4.
Fig. 6 is a schematic cross-sectional view of the filter assembly of the present invention.
Fig. 7 is a schematic top view of the movable fastener of the present invention.
Fig. 8 is an enlarged structural diagram of B in fig. 6.
Fig. 9 is a schematic cross-sectional view of the opening and closing top member of the present invention.
In the figure: control valve-1, base-2, outlet-3, conduit-4, processing device-5, inlet-6, observation window-7, machine body-8, purifying cavity-9, filter component-51, backflow preventer-52, guide arc plate-53, cavity-54, outlet-55, wave elastic piece-521, collecting plate-522, rotating disk-523, gas transmission port-524, gas guide stack-525, shunt tube-526, disk-251, dispersion guide piece-252, connecting block-253, connecting block-254, blade-255, partition block-W1, internal guide port-W2, external guide port-W3, convex arc dividing plate-W4, movable fastener-511, fine filter element-512, coarse filter screen-513, shell-514, active carbon layer-515, drawing strip-111, limiting block-112, elastic piece-113, triangle-114, drawing block-115, arc guard-121, open-close top piece-122, fine filtering net-123, limiting expansion block-X1, auxiliary plate-X2, movable clamping strip-X3 and supporting plate-X4.
Detailed Description
In order to make the technical means, the creation characteristics, the achievement purposes and the effects of the invention easy to understand, the invention is further described with the specific embodiments.
Example one
Referring to fig. 1, the present invention provides a technical solution: the utility model provides a semiconductor processing procedure exhaust gas treatment ware, its structure includes control valve 1, base 2, export 3, pipe 4, processing apparatus 5, entry 6, observation window 7, organism 8, purification chamber 9, control valve 1 communicates with each other with pipe 4, the one end that control valve 1 was kept away from to pipe 4 runs through inside stretching into processing apparatus 5, processing apparatus 5 installs inside organism 8, 8 one side of organism is equipped with two observation window 7 of communicating with it, and the opposite side communicates with each other with export 3, 8 one end of organism towards processing apparatus 5 communicates with each other with entry 6, 8 bottoms of organism communicate with each other with purification chamber 9, purification chamber 9 communicates with each other with export 3 through organism 8, purification chamber 9 fixed connection is on base 2.
Referring to fig. 2, the processing device 5 includes a separation filter assembly 51, a backflow prevention device 52, flow guide arc plates 53, a cavity 54, and an output port 55, one end of the separation filter assembly 51 is connected to the output port 55, the other end of the separation filter assembly is provided with the backflow prevention device 52, one end of the backflow prevention device 52, which is far away from the separation filter assembly 51, is connected to the flow guide arc plates 53, the flow guide arc plates 53 are provided with two flow guide arc plates 53, the two flow guide arc plates 53 are fastened to two sides of the inner wall of the cavity 54, the bottom of the cavity 54 is provided with the output port 55, and the cavity 54 is.
The flow guide arc plates 53 are used for being matched with the anti-backflow device 52, and the two flow guide arc plates 53 are of an inner buckling arc structure and can effectively guide the waste gas downwards to the anti-backflow device 52.
Referring to fig. 3, the backflow prevention device 52 includes wave elastic members 521, a collection plate 522, a rotating disc 523, an air delivery port 524, an air guide stack 525 and a diversion pipe 526, the wave elastic members 521 are provided with two, the air guide stack 525 connected with the two wave elastic members 521 is arranged between the two wave elastic members 521, the air guide stack 525 is provided with three air guide stacks 525, the three air guide stacks 525 are parallelly fastened between the two wave elastic members 521, one end of each wave elastic member 521 is fastened with the collection plate 522, the other end of each wave elastic member is connected with the side wall of the diversion pipe 526, the collection plate 522 is provided with two collection plates 522, the two collection plates 522 are symmetrically connected to two sides of the air delivery port 524, the rotating disc 523 is arranged on the air delivery port 524, one end of the diversion pipe 526, which is far away from the wave elastic members 521, is provided with a.
The collecting plates 522 are used for being matched with the gas transmission ports 524, the inner walls of the two collecting plates 522 are wavy, and the collecting plates can effectively separate waste gas after contacting the waste gas, prevent the waste gas from moving upwards in the flowing process, and effectively transmit the waste gas downwards through the gas transmission ports 524 under the rotating action of the rotating disc 523.
Referring to fig. 4, the air guide stack 525 includes a disk 251, a dispersion guide 252, a connection block 253, a connection block 254, and a blade 255, the connection block 254 connected to the disk 251 is disposed on an inner wall of the disk 251, one end of the connection block 254 away from the disk 251 is connected to the blade 255, the blade 255 is disposed in a plurality of blocks, the plurality of blades 255 are annularly inserted into the connection block 253 at equal intervals, the dispersion guide 252 is disposed inside the connection block 253, and the disk 251 is connected to the wave elastic member 521.
The connecting block 254 is used for matching with the blades 255, when the blades 255 receive impact air pressure of gas, the blades 255 rotate due to inertia, the gas is effectively gathered among the blades 255, and the blades 255 are overlapped, so that a certain interval exists among the blades 255, the gas can be effectively blocked, and the gas is prevented from flowing back inwards.
Referring to fig. 5, the dispersion guide 252 includes a partition W1, an inner air guide port W2, an outer air guide port W3, and a convex arc dividing plate W4, one end of the partition W1 is attached to the outer wall of the outer air guide port W3, the other end is connected to the connecting block 253, the outer air guide port W3 is connected to the inner air guide port W2, and the end of the inner air guide port W2 away from the outer air guide port W3 is connected to the convex arc dividing plate W4.
The convex arc separating plate W4 is used for being matched with the inner gas guide port W2 and the outer gas guide port W3, gas can rebound when impacting the convex arc separating plate W4, the gas is ejected outwards to the gas guide port W2 and the outer gas guide port W3, and waste gas is effectively led outwards.
Example two
Referring to fig. 1, the present invention provides a technical solution: the utility model provides a semiconductor processing procedure exhaust gas treatment ware, its structure includes control valve 1, base 2, export 3, pipe 4, processing apparatus 5, entry 6, observation window 7, organism 8, purification chamber 9, control valve 1 communicates with each other with pipe 4, the one end that control valve 1 was kept away from to pipe 4 runs through inside stretching into processing apparatus 5, processing apparatus 5 installs inside organism 8, 8 one side of organism is equipped with two observation window 7 of communicating with it, and the opposite side communicates with each other with export 3, 8 one end of organism towards processing apparatus 5 communicates with each other with entry 6, 8 bottoms of organism communicate with each other with purification chamber 9, purification chamber 9 communicates with each other with export 3 through organism 8, purification chamber 9 fixed connection is on base 2.
Referring to fig. 2, the processing device 5 includes a separation filter assembly 51, a backflow prevention device 52, flow guide arc plates 53, a cavity 54, and an output port 55, one end of the separation filter assembly 51 is connected to the output port 55, the other end of the separation filter assembly is provided with the backflow prevention device 52, one end of the backflow prevention device 52, which is far away from the separation filter assembly 51, is connected to the flow guide arc plates 53, the flow guide arc plates 53 are provided with two flow guide arc plates 53, the two flow guide arc plates 53 are fastened to two sides of the inner wall of the cavity 54, the bottom of the cavity 54 is provided with the output port 55, and the cavity 54 is.
The flow guide arc plates 53 are used for being matched with the anti-backflow device 52, and the two flow guide arc plates 53 are of an inner buckling arc structure and can effectively guide the waste gas downwards to the anti-backflow device 52.
Referring to fig. 6, the filter assembly 51 includes two movable fasteners 511, two fine filter elements 512, two coarse filters 513, a housing 514, and an activated carbon layer 515, the two movable fasteners 511 are parallelly fastened to two sides of the inner wall of the housing 514, one end of the movable fastener 511 away from the housing 514 is connected to the fine filter element 512, one end of the fine filter element 512 is provided with the coarse filter 513, the other end of the fine filter element 512 is provided with the activated carbon layer 515, two ends of the coarse filter 513 and the activated carbon layer 515 are fastened to two sides of the inner wall of the housing 514 in parallel, the bottom of the housing 514 is connected to an output port 55, and the coarse filter 513 is provided with a 526 shunt tube.
The coarse strainer 513 is used for being matched with the shunt pipes 526, the shunt pipes 526 enable the waste gas to be uniformly and effectively dispersed to the outside of the coarse strainer 513, and the coarse strainer 513 is of a wave-shaped structure and can treat the waste gas which is dispersed to the outside, so that the filtering effect of the waste gas is improved.
Referring to fig. 7, the movable fastener 511 includes a pulling strip 111, a limiting block 112, an elastic member 113, triangular plates 114, and a pulling block 115, the pulling strip 111 is disposed between the two triangular plates 114, the two triangular plates 114 are connected by the pulling block 115, one end of the pulling block 115 away from the triangular plates 114 is connected to the fine filtering element 512, one end of the pulling strip 111 away from the triangular plates 114 is connected to the middle position of the elastic member 113, two ends of the elastic member 113 are fixedly connected to the limiting block 112, and the limiting block 112 is clamped to the inner wall of the housing 514.
The elastic piece 113 is used for matching with the pull block 115, the pull block 115 is connected to the fine filter element 512, the fine filter element 512 is impacted by waste gas to generate certain fluctuation, the pull block 115 is pulled to drive the triangular plate 114 to move up and down by the fluctuation tension of the fine filter element 512, and the triangular plate 114 is pulled by the matching of the elastic piece 113, so that the fine filter element 512 can bounce up and down, and waste gas is effectively treated.
Referring to fig. 8, the fine filter element 512 includes an arc protection plate 121, an opening and closing top member 122, and a fine filter mesh 123, the opening and closing top member 122 is installed inside the arc protection plate 121, one end of the opening and closing top member 122 far away from the arc protection plate 121 contacts the fine filter mesh 123, two ends of the fine filter mesh 123 are respectively provided with a coarse filter mesh 513 and an activated carbon layer 515, and the arc protection plate 121 is connected to the pulling block 115.
Referring to fig. 9, the opening and closing top member 122 includes a limiting expansion block X1, an auxiliary plate X2, a movable clamping strip X3 and a supporting plate X4, the limiting expansion block X1 is disposed between two auxiliary plates X2, the auxiliary plate X2 is fixedly connected to the supporting plate X4, the two supporting plates X4 are connected through a movable clamping strip X3, the auxiliary plate X2 is connected to the arc protection plate 121, and the supporting plate X4 is in contact with the fine filter 123.
The auxiliary plate X2 is used for being matched with the support plate X4, the auxiliary plate X2 is buckled with the support plate X4, the fine filter net 123 is stressed to open and close, the support plate X4 can be expanded outwards along with the movement of the fine filter net 123, the auxiliary plate X2 is matched with the support plate X4 to push the arc protection plate 121, the position of the fine filter net 123 is effectively limited, and waste gas can be effectively treated by the fine filter net 123.
The working principle of the above technical solution is explained as follows:
when the waste gas treatment device is used, the control valve 1 is opened, waste gas is guided into the treatment device 5 through the inlet 6, sundries in the waste gas are treated through the treatment device 5, the treated waste gas flows downwards to the purification cavity 9, harmful substances in the waste gas are efficiently treated through the purification cavity 9, and the treated waste gas is output through the outlet 3, so that the waste gas treatment effect is effectively improved.
When waste gas generated in semiconductor manufacturing is treated, the waste gas generated in semiconductor manufacturing is collected, the collected waste gas is guided to the gas transmission port 524 through the inlet 6, the flow guide arc plate 53 is in a semi-circular arc structure and effectively assists the downward flowing of gas, the gas can slide down to the gas transmission port 524 due to inertia, the flowing of the waste gas is used as the power for rotating the rotating disc 523, the rotating disc 523 rotates to accelerate the flowing of the waste gas, the two collecting plates 522 assist the rotating disc 523 to guide the waste gas downward, the collecting plates 522 are in an inclined shape and have wave-shaped side walls, so that the waste gas is not easy to backflow when flowing downward, the waste gas can be effectively guided to the disc body 251 from the gas transmission port 524, the blades 255 on the disc body 251 can be changed into a conical cylinder structure due to spiral rotation of inertia after receiving the impact air pressure of the waste gas, the gas is guided downward to the convex arc separating plate W4, convex arc divides board W4 to adopt the atress principle of trampoline, the equal resilience force that can produce after receiving big pressure, convex arc divides board W4 upwards kick-backs with gas outdiffusion lead gas mouth W2 and lead on the gas mouth W3 outward, wave elastic component 521 can receive the effect of gas and play from top to bottom appears, gas can follow interior gas mouth W2 and the outer gas mouth W3 outflow of leading, lead gas mouth W2 and outer gas mouth W3 cooperation through interior and effectively with the even outside dispersion of gas to shunt tubes 526, effectively prevent the gaseous backward flow that makes progress of outflow, guarantee the circulation filterability of waste gas, can handle waste gas fast and stable.
The waste gas flows downwards from the shunt tubes 526 and is vertically conveyed downwards to the coarse screen 513, the coarse screen 513 is in a wave-shaped structure formed by a plurality of triangular structures, the waste gas dispersed by a plurality of shunt tubes 526 can be separated and treated, large particles in the waste gas can be quickly and effectively treated and removed, the removed waste gas can flow downwards to the fine screen 123, the fine screen 123 can generate certain vibration under the air pressure of the gas, the triangular plate 114 and the pull block 115 can be under the pulling force of the fine screen 123, the limiting block 112 can pull the triangular plate 114 downwards under the action of the elastic element 113, the auxiliary plate X2 is matched with the support plate X4 to support the fine screen 123, the support plate X4 can be outwards opened along with the fluctuation of the fine screen 123, the limit expansion block X1 is matched with the movable clamping strip X3 to inwards pull the support plate X4, and the fine screen 123 is prevented from being greatly deformed in the fluctuation process, make fine filter screen 123 fluctuation from top to bottom that can be stable, the card is held the particulate matter in fine filter screen 123 hole and can be received fluctuation from top to bottom effect and upwards bounce, guarantee that waste gas can be stable circulate on fine filter screen 123, improve the circulation filterability of waste gas, through fine filter screen 123 to waste gas high efficiency processing, waste gas can flow on activated carbon layer 515 after the processing, carry out adsorption treatment through activated carbon layer 515 to the harmful substance in the waste gas, waste gas after the absorption flows to purification chamber 9 inside through delivery outlet 55, carry out purification treatment through purification chamber 9 to waste gas, waste gas after the processing discharges out through export 3, improve the treatment effeciency of waste gas.
In summary, the invention adopts a new semiconductor process waste gas processor formed by combining a control valve, a base, an outlet, a guide pipe, a processing device, an inlet, an observation window, a machine body and a purification cavity, the blades can be changed into a conical cylinder structure after being impacted by waste gas, the waste gas can flow downwards under the action of the blades due to inertia, the gas can be uniformly dispersed outwards to a flow dividing pipe through the matching of an inner gas guide port and an outer gas guide port, the guided gas can be effectively prevented from flowing back upwards, the fine filter net can generate certain shaking under the gas pressure of the gas, the fine filter net can be supported through the mutual matching of an auxiliary plate and a supporting plate, the fine filter net can stably fluctuate up and down, the particles clamped in the pores of the fine filter net can be effectively bounced upwards under the action of fluctuating up and down, the particles can be prevented from being blocked on the fine filter net, and the circulation of the, the treatment efficiency of the waste gas is improved.
While there have been shown and described what are at present considered the fundamental principles and essential features of the invention and its advantages, it will be apparent to those skilled in the art that the invention is not limited to the details of the foregoing exemplary embodiments, but is capable of other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (8)
1. The utility model provides a semiconductor processing procedure exhaust gas treatment ware, its structure includes control valve (1), base (2), export (3), pipe (4), processing apparatus (5), entry (6), observation window (7), organism (8), purifies chamber (9), its characterized in that:
the catheter (4) is communicated with the control valve (1) and the processing device (5), the processing device (5) is installed inside the machine body (8), the machine body (8) is provided with an observation window (7) and an outlet (3), the machine body (8) is communicated with the inlet (6) and the purification cavity (9), the purification cavity (9) is communicated with the outlet (3) through the machine body (8), and the purification cavity (9) is fixedly connected to the base (2);
processing apparatus (5) are including separating to strain subassembly (51), anti-return device (52), water conservancy diversion arc board (53), cavity (54), delivery outlet (55), separate to strain subassembly (51) and delivery outlet (55), anti-return device (52) and meet, anti-return device (52) and water conservancy diversion arc board (53) are put through mutually, water conservancy diversion arc board (53) lock joint is on cavity (54), cavity (54) bottom is equipped with delivery outlet (55), cavity (54) are installed inside organism (8).
2. The semiconductor processing waste gas processor as claimed in claim 1, wherein: anti-reflux device (52) are including wave bullet spare (521), collect board (522), rotary disk (523), gas transmission mouth (524), gas guide and fold piece (525), shunt tubes (526), wave bullet spare (521) and gas guide are folded piece (525) and are met, wave bullet spare (521) link to each other with collecting board (522), shunt tubes (526), it connects on gas transmission mouth (524) to collect board (522), be equipped with rotary disk (523) on gas transmission mouth (524), be equipped with on shunt tubes (526) and separate and strain subassembly (51), it switches on with water conservancy diversion arc board (53) to collect board (522).
3. The semiconductor processing waste gas processor defined in claim 2, wherein: the air guide stack (525) comprises a disc body (251), a dispersing guide piece (252), a connecting block (253), a connecting block (254) and a blade (255), the disc body (251) is buckled with the connecting block (254), the connecting block (254) is connected with the blade (255), the blade (255) is inserted and embedded in the connecting block (253), the dispersing guide piece (252) is installed inside the connecting block (253), and the disc body (251) is connected with the wave elastic piece (521).
4. The semiconductor processing waste gas processor as claimed in claim 3, wherein: the dispersion guide piece (252) comprises a partition block (W1), an inner air guide port (W2), an outer air guide port (W3) and a convex arc separating plate (W4), wherein the partition block (W1) is connected with the outer air guide port (W3) and a connecting block (253), the outer air guide port (W3) is communicated with the inner air guide port (W2), and the inner air guide port (W2) is connected with the convex arc separating plate (W4).
5. The semiconductor processing waste gas processor as claimed in claim 1, wherein: separate and strain subassembly (51) including activity fastener (511), fine filtration component (512), coarse strainer (513), casing (514), activated carbon layer (515), activity fastener (511) joint is on casing (514), activity fastener (511) meet with fine filtration component (512), fine filtration component (512) both ends are equipped with coarse strainer (513), activated carbon layer (515) respectively, casing (514) and delivery outlet (55) switch-on mutually, be equipped with shunt tubes (526) on coarse strainer (513).
6. The semiconductor processing waste gas processor defined in claim 5, wherein: the movable fastener (511) comprises a pulling strip (111), a limiting block (112), an elastic part (113), a triangular plate (114) and a pulling block (115), the triangular plate (114) is connected with the pulling strip (111) and the pulling block (115), the pulling block (115) is connected with the fine filtering element (512), the pulling strip (111) is connected onto the elastic part (113), the elastic part (113) is fixedly connected with the limiting block (112), and the limiting block (112) is clamped on the inner wall of the shell (514).
7. The semiconductor processing waste gas processor defined in claim 6, wherein: the fine filtering element (512) comprises an arc protection plate (121), a stretching and closing top piece (122) and a fine filtering net (123), wherein the stretching and closing top piece (122) is installed inside the arc protection plate (121), the stretching and closing top piece (122) is in contact with the fine filtering net (123), two ends of the fine filtering net (123) are respectively provided with a coarse filtering net (513) and an activated carbon layer (515), and the arc protection plate (121) is connected with a pulling block (115).
8. The semiconductor processing waste gas processor defined in claim 7, wherein: the opening and closing top piece (122) comprises a limited expansion block (X1), an auxiliary plate (X2), a movable clamping strip (X3) and a supporting plate (X4), wherein the limited expansion block (X1) is connected to the auxiliary plate (X2), the auxiliary plate (X2) is fixedly connected to the supporting plate (X4), the supporting plate (X4) is connected with the movable clamping strip (X3), the auxiliary plate (X2) is connected with an arc protection plate (121), and the supporting plate (X4) is connected with a fine filter screen (123).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110091425.8A CN112915654A (en) | 2021-01-23 | 2021-01-23 | Semiconductor processing procedure exhaust gas treatment ware |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110091425.8A CN112915654A (en) | 2021-01-23 | 2021-01-23 | Semiconductor processing procedure exhaust gas treatment ware |
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| Publication Number | Publication Date |
|---|---|
| CN112915654A true CN112915654A (en) | 2021-06-08 |
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ID=76165248
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110091425.8A Withdrawn CN112915654A (en) | 2021-01-23 | 2021-01-23 | Semiconductor processing procedure exhaust gas treatment ware |
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| CN (1) | CN112915654A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113911602A (en) * | 2021-10-15 | 2022-01-11 | 招远市环境卫生管理中心 | Sanitation garbage truck self-cleaning equipment |
-
2021
- 2021-01-23 CN CN202110091425.8A patent/CN112915654A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113911602A (en) * | 2021-10-15 | 2022-01-11 | 招远市环境卫生管理中心 | Sanitation garbage truck self-cleaning equipment |
| CN113911602B (en) * | 2021-10-15 | 2022-07-12 | 招远市环境卫生管理中心 | Sanitation garbage truck self-cleaning equipment |
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Application publication date: 20210608 |